EP1579034A1 - Appareil, systeme et procede anti-corrosion et anti-encrassement a base de semi-conducteur - Google Patents

Appareil, systeme et procede anti-corrosion et anti-encrassement a base de semi-conducteur

Info

Publication number
EP1579034A1
EP1579034A1 EP03808972A EP03808972A EP1579034A1 EP 1579034 A1 EP1579034 A1 EP 1579034A1 EP 03808972 A EP03808972 A EP 03808972A EP 03808972 A EP03808972 A EP 03808972A EP 1579034 A1 EP1579034 A1 EP 1579034A1
Authority
EP
European Patent Office
Prior art keywords
parameter
filter
corrosion
coating
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP03808972A
Other languages
German (de)
English (en)
Other versions
EP1579034A4 (fr
Inventor
Farshad KHORRAMI
David B. Dowling
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Semiconductor International Ltd
Original Assignee
Applied Semiconductor International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/291,770 external-priority patent/US6811681B2/en
Application filed by Applied Semiconductor International Ltd filed Critical Applied Semiconductor International Ltd
Publication of EP1579034A1 publication Critical patent/EP1579034A1/fr
Publication of EP1579034A4 publication Critical patent/EP1579034A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F13/00—Inhibiting corrosion of metals by anodic or cathodic protection
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F13/00—Inhibiting corrosion of metals by anodic or cathodic protection
    • C23F13/02—Inhibiting corrosion of metals by anodic or cathodic protection cathodic; Selection of conditions, parameters or procedures for cathodic protection, e.g. of electrical conditions
    • C23F13/04—Controlling or regulating desired parameters

Definitions

  • Cathodic protection is used to reduce the corrosion of the metal surface by providing it with enough cathodic current to make its anodic dissolution rate become negligible (for examples, see Pryor, U.S. Patent No. 3,574,801 ; Wasson U.S. Patent No. 3,864,234; Maes
  • Figure 3 is a representation of a layered semiconductor/metal composition. When doped with zinc, the anti-corrosion capabilities of the semiconductor material for steel
  • the above-identified Dowling patents and application are at least directed to systems and devices for controlling corrosion comprising semiconductive coatings and a corrosive noise controlling system that includes a filter.
  • the corrosive noise controlling system includes an adjustable filter which may be adjusted based on feedback signals corresponding to the corrosive noise present in the coating.
  • the performance of the corrosive noise reducing system of the Dowlin patents and application varies in accordance with the system's internal filter, which in its simplest form is essentially a capacitor.
  • the Dowling patents and application also disclose combining the semiconductive coating with various passive and active filters.
  • the semiconductor coating acts somewhat as a resistor, which is in parallel with the system's internal filter.
  • Fig. 2 is a representation of corrosion noise in protected metal and in a semiconductor coating
  • the ECU may also access data stored in a local data archive (not shown) or in a remote archive accessible via the antenna 881, other wireless communication mechanism or even wired connection, such as a network.
  • the ECU control circuit 899 is configured to change a filter characteristic of the controllable filter 898, such that the frequency-dependent impedance of the controllable filter 898 is changed depending on the mode of the operation of the ECU control circuit 899. It is also to be appreciated that the present invention is not limited to this specific configuration, as will be appreciated by one of ordinary skill in the control system art.
  • Figure 9 is a block diagram of an embodiment of the present invention and includes an ECU 897 containing a controllable filter 898 and an ECU control circuit 899.
  • One key to the anti -corrosion method and system of the present invention is the measurement of corrosive noise generated by the entire system (including, but not limited to, the substrate, coating and filter components) and minimizing that noise by application of an electronic filter.
  • the effect of the ECU upon semiconductive coating as well as overall performance was measured during the 249-day test period ( Figure 6).
  • the zinc release rates decreased over time in both conditions as the coating "aged.”
  • the use of ECUs showed significantly greater reductions in zinc release rates, the extent of which are dependent on the duty cycle used to adjust or alternatively switch the filter in and out of the circuit.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Prevention Of Electric Corrosion (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Testing Resistance To Weather, Investigating Materials By Mechanical Methods (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)

Abstract

L'invention concerne un appareil, un système, un procédé et un produit de programme informatique destinés à lutter contre la corrosion d'une structure conductrice en contact avec un milieu corrosif et recouverte d'un revêtement semi-conducteur, la corrosion étant maîtrisée par un filtre réglable (898) et une unité de commande électronique (899) conçue pour traiter au moins un paramètre stocké ou mesuré.
EP03808972A 2002-10-17 2003-10-17 Appareil, systeme et procede anti-corrosion et anti-encrassement a base de semi-conducteur Withdrawn EP1579034A4 (fr)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US271734 1981-06-08
US291770 1988-12-29
US27173402A 2002-10-17 2002-10-17
US10/291,770 US6811681B2 (en) 2002-11-12 2002-11-12 Semiconductive corrosion and fouling control apparatus, system, and method
PCT/US2003/029133 WO2004035865A1 (fr) 2002-10-17 2003-10-17 Appareil, systeme et procede anti-corrosion et anti-encrassement a base de semi-conducteur

Publications (2)

Publication Number Publication Date
EP1579034A1 true EP1579034A1 (fr) 2005-09-28
EP1579034A4 EP1579034A4 (fr) 2008-07-02

Family

ID=32109814

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03808972A Withdrawn EP1579034A4 (fr) 2002-10-17 2003-10-17 Appareil, systeme et procede anti-corrosion et anti-encrassement a base de semi-conducteur

Country Status (6)

Country Link
EP (1) EP1579034A4 (fr)
JP (1) JP5009502B2 (fr)
AU (1) AU2003276888B2 (fr)
CA (1) CA2502465C (fr)
EA (1) EA007147B1 (fr)
WO (1) WO2004035865A1 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7318889B2 (en) * 2005-06-02 2008-01-15 Applied Semiconductor International, Ltd. Apparatus, system and method for extending the life of sacrificial anodes on cathodic protection systems
WO2007120087A1 (fr) * 2006-04-19 2007-10-25 Volvo Technology Corporation Procédé permettant de prévoir l'effet d'un comportement de vieillissement d'un élément électrique et modèle de simulation permettant de simuler un tel comportement
RU2486288C2 (ru) * 2011-08-11 2013-06-27 Анатолий Александрович Анашкин Устройство для импульсной катодной защиты
EP2906735B1 (fr) 2012-10-11 2022-03-30 Sembcorp Marine Repairs & Upgrades Pte. Ltd. Système et méthode permettant de fournir une protection contre la corrosion à une structure métallique grâce à une onde électromagnétique variant dans le temps
RU2618968C1 (ru) * 2015-10-13 2017-05-11 Александр Петрович Молодцов Устройство для питания и автоматического регулирования выходного тока системы катодной защиты от коррозии металлоконструкций
RU170510U1 (ru) * 2016-07-28 2017-04-26 Федеральное государственное бюджетное образовательное учреждение высшего образования "Омский государственный университет путей сообщения" Автоматическая дренажная установка
RU2735162C1 (ru) * 2020-03-25 2020-10-28 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт автоматики им. Н.Л.Духова"(ФГУП "ВНИИА") Устройство для защиты объекта от воздействия космоса
RU2735223C1 (ru) * 2020-03-25 2020-10-28 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт автоматики им. Н.Л.Духова"(ФГУП "ВНИИА") Устройство для защиты объекта от воздействия космоса

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002006563A1 (fr) * 2000-07-18 2002-01-24 Applied Semiconductor, Inc. Procede et systeme permettant de prevenir l'encrassement et la corrosion de dispositifs biomedicaux et de structures
US6402933B1 (en) * 2001-06-08 2002-06-11 Applied Semiconductor, Inc. Method and system of preventing corrosion of conductive structures
WO2002101117A1 (fr) * 2001-06-08 2002-12-19 Applied Semiconductor, Inc. Systeme polymere a semi-conducteur, dispositifs equipes d'un tel systeme, et ses utilisations dans la lutte contre la corrosion

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6551491B2 (en) * 2000-06-02 2003-04-22 Applied Semiconductor, Inc. Method and system of preventing corrosion of conductive structures

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002006563A1 (fr) * 2000-07-18 2002-01-24 Applied Semiconductor, Inc. Procede et systeme permettant de prevenir l'encrassement et la corrosion de dispositifs biomedicaux et de structures
US6402933B1 (en) * 2001-06-08 2002-06-11 Applied Semiconductor, Inc. Method and system of preventing corrosion of conductive structures
WO2002101117A1 (fr) * 2001-06-08 2002-12-19 Applied Semiconductor, Inc. Systeme polymere a semi-conducteur, dispositifs equipes d'un tel systeme, et ses utilisations dans la lutte contre la corrosion

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
No further relevant documents disclosed *
See also references of WO2004035865A1 *

Also Published As

Publication number Publication date
EA007147B1 (ru) 2006-08-25
CA2502465C (fr) 2011-09-27
WO2004035865A9 (fr) 2004-06-17
EP1579034A4 (fr) 2008-07-02
CA2502465A1 (fr) 2004-04-29
AU2003276888B2 (en) 2008-04-17
AU2003276888A1 (en) 2004-05-04
EA200500665A1 (ru) 2005-10-27
JP2006503184A (ja) 2006-01-26
JP5009502B2 (ja) 2012-08-22
WO2004035865A1 (fr) 2004-04-29

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