EP1535307B1 - Entladungsstrahlungsquelle insbesondere für uv-strahlung - Google Patents

Entladungsstrahlungsquelle insbesondere für uv-strahlung Download PDF

Info

Publication number
EP1535307B1
EP1535307B1 EP03761657.0A EP03761657A EP1535307B1 EP 1535307 B1 EP1535307 B1 EP 1535307B1 EP 03761657 A EP03761657 A EP 03761657A EP 1535307 B1 EP1535307 B1 EP 1535307B1
Authority
EP
European Patent Office
Prior art keywords
gas
radiation source
discharge space
source according
anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP03761657.0A
Other languages
English (en)
French (fr)
Other versions
EP1535307A2 (de
Inventor
Christophe Cachoncinlle
Rémi DUSSART
Claude Fleurier
Jean-Michel Pouvesle
Eric Robert
Raymond Viladrosa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Universite dOrleans
Original Assignee
Centre National de la Recherche Scientifique CNRS
Universite dOrleans
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Universite dOrleans filed Critical Centre National de la Recherche Scientifique CNRS
Publication of EP1535307A2 publication Critical patent/EP1535307A2/de
Application granted granted Critical
Publication of EP1535307B1 publication Critical patent/EP1535307B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/56—One or more circuit elements structurally associated with the lamp
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
    • H01J61/523—Heating or cooling particular parts of the lamp
    • H01J61/526—Heating or cooling particular parts of the lamp heating or cooling of electrodes

Definitions

  • the invention relates to a source of radiation, and in particular a radiation source in the ultraviolet or extreme ultraviolet spectral range.
  • One field of application of the invention relates to the production of ultraviolet radiation used in the manufacture by lithography of integrated circuits.
  • circuits having component parts with dimensions of less than 70 nanometers by using sources of ultraviolet radiation, hence the need to reduce the wavelength of the ultraviolet radiation produced by them to less than for example at 13.5 nanometers.
  • synchrotron sources laser-generated radiation sources
  • electro-discharge sources There are several types of sources that can emit in the extreme ultraviolet range: synchrotron sources, laser-generated radiation sources, and electro-discharge sources.
  • the discharge occurs between an anode and a cathode in a space filled with gas.
  • the discharge excites gas molecules that emit radiation to de-energize.
  • One of the disadvantages of the discharge radiation sources is their small amount of radiated energy.
  • the invention aims to obtain a source of radiation by discharge to increase the amount of radiated energy.
  • the subject of the invention is a radiation source according to claim 1.
  • the inventors have discovered that in known sources the connection of the conduit for introducing the gas into the discharge space at the cathode was the cause of the appearance of a large number of discharges in the gas located in the conduit of introduction and not in the discharge space, thus decreasing the amount of radiated energy.
  • the patent application EP 0887836 A discloses a reaction chamber device generating a gas discharge.
  • the number of parasitic electric discharges in the gas in the introduction conduit is reduced or even eliminated, which increases the number of discharges taking place in the discharge space and consequently the amount of radiated energy.
  • the source 1 of radiation comprises an anode 2 and a cathode 3, both electrically conductive and separated from each other by a space 4 of electric discharge.
  • the anode 2 is for example formed by a generally cylindrical circular metal piece of longitudinal axis 5, while the cathode 3 is for example formed by a metal piece in the form of a cap, having a central portion 6 in the form of a pot cylindrical circular axis 5, the bottom 7 is facing the discharge space 4 and whose open portion is connected to an annular portion 8 of axis 5.
  • the anode and / or the cathode are conductive materials having a high melting point, for example tungsten thorium, for example 3%.
  • the discharge space 4 is for example formed by a capillary directed along the axis 5 and delimited transversely to the axis 5 by an electrically insulating disc 9 mounted between the bottom 7 of the part 6 and the anode 2.
  • the anode 2 comprises at its center a frustoconical hole 10, for example with a half-angle at the apex equal to 25 °, whose small base is connected to the discharge space 4 and whose large base 11, remote from the discharge space 4 and the disc 9, opens outwards to allow the radiation emitted by the discharge to pass through. the space 4.
  • the bottom 7 of the cathode 3 also comprises a frustoconical hole 12, for example with an apex half-angle equal to 25 °, whose small base is connected to the discharge space 4 and whose large base is directed towards the annular portion 8.
  • the holes 10 and 12 may also be cylindrical axis 5.
  • the disc 9 is for example ceramic and a longitudinal thickness of 0.1 to 40 mm and for example equal to 10 mm.
  • An electrically conductive ring 5 and pin 5 is fixed around the central portion 6, away from the annular portion 8, electrically insulating from the portion 6.
  • a plurality of charge storage capacitors 14 is disposed around the central portion 6 being connected by their first electrical terminal 15 to the annular portion 8 and their second electrical terminal 16 to the ring 13.
  • the ring 13 is connected to a part of its remote side on the terminal connection side 16, to a conductor 17 connected to a first electrical terminal 18 of one or more switching capacitors 19 connected by its or their second electrical terminal 20 to a conducting ring 21, for example made of steel, at the center of which is mounted the anode 2, the anode 2 being in electrical contact with the inner face 22 of the ring 21 by means of a contact piece 23.
  • the electric circuit for creating discharges in the space 4 is for example of the Blumlein type, as is known.
  • electrical switching means not shown for interconnecting them, these comprising for example a thyratron or other suitable switch and being for example controlled by an external generator delivering current pulses at repetition frequencies ranging from 1 Hz to 10 kHz, in particular from 1 Hz to 5 kHz, and for example equal to 1 kHz.
  • a voltage source for example a continuous source of a value up to 30 kV or pulsed at a frequency between 0, 1 and 1 kHz and for example equal to 1 kHz.
  • charge storage capacitors 14 each of a value of 4 nF capable of withstanding 20 kV. However, any number of capacitors 14 may be provided for an overall capacitance of between a few nF and a few tens of nF, and for example a single capacitor 14.
  • An electrically insulating centering ring 24 is mounted between the ring 21 and the disc 9 around the anode 2. Front and at the center of the ring 21 is mounted a cylindrical piece 25 of axis 5, having an outer opening 26 allowing the radiation coming from the hole 10 to pass.
  • a discharge gas introduction pipe 30 into the discharge space 4 is mounted on the cathode 3, inside its central portion 6.
  • the gas introduction conduit 30 has a longitudinal wall 31 defining a space 32 cylindrical longitudinal circular gas passage, which ends on the one hand in a gas-tight manner to the hole 12 and which is closed on the other hand in a gas-tight manner by a plug 33 fixed in a gas-tight manner, for example screwed inside the wall 31.
  • An electrically insulating ring 34 is mounted against the annular portion 8, and is traversed at its center by the gas introduction conduit 30.
  • the rings 21 and 34 are fixed to each other by means of rods 35 arranged around the above-mentioned elements and electrically insulating, for example PVC.
  • Each rod 35 is fixed on the ring 34 and the ring 21 by screws 36, respectively 37 of longitudinal compression.
  • the rings 21 and 34 are compressed longitudinally towards each other by the rods 35 so that the connections between the gas introduction pipe 30 and the cathode 3, the cathode 3 and the discharge space 4, the discharge space 4 and the anode 2 are made gastight.
  • the wall 31 of the gas introduction duct 30 has a transverse through hole 41, which opens on the one hand into the gas passage space 32 and into which a connection 42 is inserted on the other hand in a gastight manner. a conduit 43 for supplying discharge gas.
  • the conduit 43 for supplying gas comprises a portion 44, remote from the connector 42 and connected to a fixed electrical potential.
  • the conduit 43 for supplying gas is connected, upstream of or at its portion 44, to a source 50 of discharge gas, for sending the gas through line 43, the fitting 42, the passage space 32 and the hole 12 in the discharge space 4.
  • the connector 42 is electrically conductive and metallic. The preloading of the storage capacitors 14 and then the adequate control of the switching means causes the appearance of an electric discharge in the gas present in the discharge space 4 and the emission of radiation therein to the hole 10 and the opening 26.
  • the gas is for example xenon, oxygen nitrogen, argon or krypton.
  • the gas is, for example, chosen to produce, by discharges, extreme ultraviolet radiation having a wavelength of between 10 and 50 nm and for example 13.5 nm.
  • the conduit 43 for supplying gas is such that it defines, between its portion 44 connected to the fixed potential and its portion 42 connected to the gas introduction conduit 30, an electrical impedance preventing the creation of electric discharges at the interior of the gas introduction conduit 30.
  • this fixed potential is at ground as the anode, while the cathode is at a potential lower than that of the mass, which advantageously allows to provide a cooling system by circulating any coolant in the body of the anode 2 or on the body thereof, whether the cooling fluid is electrically conductive or not.
  • the cooling system of the anode 2 comprises a recess 45 in the body thereof, in which circulates the cooling fluid.
  • the invention thus offers the possibility of using a coolant coolant, such as water, which conducts electricity and is cheap.
  • the cooling fluid may be or include water, air or oil.
  • the impedance formed by the gas supply conduit 43 between its part 42 and its part 44 comprises, for example, an electrical inductance, formed by the winding of the conduit 43 partially or entirely of electrically conducting material between its parts. and 44. This winding is for example formed by a little more than one turn of the conduit 43 from the portion 42 to the portion 44 around the conduit 30.
  • the conduit 43 is at a distance from the ring 34 and the others parts of the source 1, and is surrounded transversely and remotely by the rods 35 and the screws 36. The arrangement of the conduit 43 of remote gas supply and against the ring 34 reduces its bulk.
  • the winding of the gas supply conduit 43 is spiral, as shown in FIG. figure 3 , having its inner part 45 and radially close to the gas introduction conduit 30 closer to the ring 34 longitudinally than its radially outer portion 46 and remote from the conduit 30.
  • the electrical inductance formed by the gas supply conduit 43 has a value making it possible to annihilate the electric discharges in the gas introduction conduit 30.
  • the gas supply duct 43 makes it possible at the same time to prevent electric discharges from appearing in the gas introduction duct 30 and to supply gas to the latter, saving additional electrical components.
  • this efficiency is further increased by charging the storage capacitors 14 only immediately or shortly before each switching of the switching means.
  • This switching can be performed in single-shot mode or pulsed mode up to 10 kHz.

Landscapes

  • X-Ray Techniques (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Claims (16)

  1. Strahlungsquelle, aufweisend:
    eine Anode (2),
    eine Kathode (3, 8),
    einen Raum (4) für elektrische Entladung zwischen der Anode (2) und der Kathode (3),
    Mittel (13 bis 23) zum Erzeugen einer elektrischen Entladung innerhalb des Gases, welches in dem Entladungsraum (4) vorliegt, welche eine Emission von Strahlung nach außen verursacht,
    ein Teil (34), welches elektrisch isolierend gegenüber der Quellvorrichtung ist,
    einen Kanal (30) zum Einbringen von Gas in den Entladungsraum (4), wobei der Kanal (30) zum Einbringen von Gas elektrisch mit der Anode (2) oder der Kathode (3, 8) verbunden ist, durch einen Gaszuführungskanal (43) mit Gas versorgt wird, dadurch gekennzeichnet, dass der Gaszuführungskanal dazu eingerichtet ist, zwischen seinem mit dem Kanal (30) zum Einbringen von Gas verbundenen Teil (42) und einem anderen (44) seiner Teile, welches mit einem festen Potenzial verbunden ist, eine elektrische Impedanz auszubilden, und dass der Gaszuführungskanal (43) zwischen dem Teil (44), welcher mit dem festen Potenzial verbunden ist, und dem Teil (42), welcher mit dem Kanal (30) zum Einbringen von Gas verbunden ist, ein Material aufweist, welches elektrischen Strom leitet, und zu einer Spirale gegenüber dem elektrisch isolierenden Teil (34) und mit einem Abstand zu ihm aufgewickelt ist, um die Erzeugung von elektrischen Entladungen im Innern des Kanals (30) zum Einbringen von Gas zu verhindern.
  2. Strahlungsquelle gemäß Anspruch 1, dadurch gekennzeichnet, dass das feste Potenzial und die Anode (2) an der Masse sind und der Kanal (30) zum Einbringen von Gas elektrisch mit der Kathode (3, 8) verbunden ist.
  3. Strahlungsquelle gemäß einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass sie ferner ein Anodenkühlsystem (45) aufweist.
  4. Strahlungsquelle gemäß Anspruch 2 und 3, dadurch gekennzeichnet, dass das Anodenkühlsystem (45) ein Kühlfluid durch die oder auf der Anode (2) zirkuliert.
  5. Strahlungsquelle gemäß Anspruch 4, dadurch gekennzeichnet, dass das Kühlfluid Wasser aufweist.
  6. Strahlungsquelle gemäß Anspruch 4, dadurch gekennzeichnet, dass das Kühlfluid Luft aufweist.
  7. Strahlungsquelle gemäß Anspruch 4, dadurch gekennzeichnet, dass Kühlfluid Öl aufweist.
  8. Strahlungsquelle gemäß einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Mittel (13 bis 23) zum Erzeugen einer elektrischen Entladung im Entladungsraum (4) mindestens einen Ladungsspeicherkondensator (14) aufweisen, welcher mittels eines ersten Anschlusses (15) mit der Kathode (3, 8) und mittels eines zweiten Anschlusses (16) mit einem ersten Anschluss (17) mindestens eines Schaltkondensators (19), welcher mittels seines zweiten Anschlusses (20) mit der Anode (2) elektrisch verbunden ist, elektrisch verbunden ist, wobei die elektrischen Schaltmittel zwischen dem ersten und dem zweiten Anschluss (18, 20) des mindestens einen Schaltkondensators (19) und einer Ladespannungsquelle, welche zwischen dem ersten und dem zweiten Anschluss (18, 20) des mindestens einen Schaltkondensators (19) vorgesehen ist, vorgesehen ist.
  9. Strahlungsquelle gemäß Anspruch 8, dadurch gekennzeichnet, dass die Schaltmittel einen Schalter aufweisen, welcher auf Einzelschuss-Art gesteuert ist.
  10. Strahlungsquelle gemäß Anspruch 8, dadurch gekennzeichnet, dass die Schaltmittel einen Schalter aufweisen, welcher auf Pulsart mit einer Wiederholfrequenz von kleiner oder gleich 10 kHz gesteuert ist.
  11. Strahlungsquelle gemäß einem der Ansprüche 8 bis 10, dadurch gekennzeichnet, dass die Ladespannungsquelle und die Schaltmittel derart sind, dass der mindestens eine Ladungsspeicherkondensator (14) durch die Ladespannungsquelle kurz vor der Schaltung der Schaltmittel geladen wird.
  12. Strahlungsquelle gemäß einem der Ansprüche 8 bis 11, dadurch gekennzeichnet, dass eine Mehrzahl von Ladungsspeicherkondensatoren (14) vorgesehen ist, die Kathode (3, 8) einen ringförmigen Bereich (8) aufweist, welcher mit einem zentralen Bereich (6) verbunden ist, der mit dem Entladungsraum (4) verbunden ist, und die Ladungsspeicherkondensatoren (14) um den zentralen Bereich herum verteilt sind, indem sie mit ihrem ersten Anschluss (15) mit dem ringförmigen Bereich (8) und mit ihrem zweiten Anschluss (16) mit einem leitenden Ring (13), welcher elektrisch mit dem ersten Anschluss (18) des mindestens einen Schaltkondensators (19) verbunden ist, verbunden sind.
  13. Strahlungsquelle gemäß einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Anode (2) eine kegelstumpfförmige Öffnung (10) für einen Durchtritt von Strahlung, welche im Entladungsraum (4) emittiert wird, aufweist, wobei die Öffnung für einen Durchtritt der im Entladungsraum (4) emittierten Strahlung nach außen mit ihrer Deckfläche mit dem Entladungsraum (4) und mit ihrer Grundfläche in Richtung zur Außenseite verbunden ist.
  14. Strahlungsquelle gemäß einem der Ansprüche 1 bis 12, dadurch gekennzeichnet, dass die Anode (2) eine zentrale zylindrische Öffnung für einen Durchtritt von Strahlung, welche im Entladungsraum (4) emittiert wird, aufweist, wobei die Öffnung für einen Durchtritt der im Entladungsraum (4) emittierten Strahlung nach außen mit dem Entladungsraum (4) verbunden ist.
  15. Strahlungsquelle gemäß einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Kathode (3, 8) eine zentrale kegelstumpfförmige Öffnung (12) für einen Durchtritt von Gas aufweist, bei welcher die Deckfläche mit dem Entladungsraum verbunden ist, und bei welcher die Grundfläche mit dem Kanal (30) zum Einbringen von Gas verbunden ist.
  16. Strahlungsquelle gemäß einem der Ansprüche 1 bis 14, dadurch gekennzeichnet, dass die Kathode (3, 8) eine zentrale zylindrische Öffnung für einen Durchtritt von Gas aufweist, welche mit einem Teil mit dem Entladungsraum und mit dem anderen Teil mit dem Kanal (30) zum Einbringen von Gas verbunden ist.
EP03761657.0A 2002-06-28 2003-06-27 Entladungsstrahlungsquelle insbesondere für uv-strahlung Expired - Lifetime EP1535307B1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0208149A FR2841684B1 (fr) 2002-06-28 2002-06-28 Source de rayonnement, notamment ultraviolet a decharges
FR0208149 2002-06-28
PCT/FR2003/002002 WO2004003964A2 (fr) 2002-06-28 2003-06-27 Source de rayonnement, notamment ultraviolet, a decharges

Publications (2)

Publication Number Publication Date
EP1535307A2 EP1535307A2 (de) 2005-06-01
EP1535307B1 true EP1535307B1 (de) 2013-06-19

Family

ID=29725009

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03761657.0A Expired - Lifetime EP1535307B1 (de) 2002-06-28 2003-06-27 Entladungsstrahlungsquelle insbesondere für uv-strahlung

Country Status (6)

Country Link
US (1) US7420191B2 (de)
EP (1) EP1535307B1 (de)
JP (1) JP4485943B2 (de)
AU (1) AU2003258832A1 (de)
FR (1) FR2841684B1 (de)
WO (1) WO2004003964A2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080239262A1 (en) * 2007-03-29 2008-10-02 Asml Netherlands B.V. Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6566668B2 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with tandem ellipsoidal mirror units
JP3396399B2 (ja) * 1997-06-26 2003-04-14 シャープ株式会社 電子デバイス製造装置
US6621199B1 (en) * 2000-01-21 2003-09-16 Vortek Industries Ltd. High intensity electromagnetic radiation apparatus and method
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
TW518913B (en) * 2000-07-03 2003-01-21 Asml Netherlands Bv Radiation source, lithographic apparatus, and semiconductor device manufacturing method
TW503669B (en) * 2000-07-04 2002-09-21 Lambda Physik Ag Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it
JP4724930B2 (ja) * 2001-03-01 2011-07-13 ソニー株式会社 炭素質材料の製造方法及び製造装置
DE10151080C1 (de) * 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung

Also Published As

Publication number Publication date
WO2004003964A2 (fr) 2004-01-08
US20050285048A1 (en) 2005-12-29
AU2003258832A1 (en) 2004-01-19
US7420191B2 (en) 2008-09-02
WO2004003964A3 (fr) 2005-03-10
FR2841684B1 (fr) 2004-09-24
AU2003258832A8 (en) 2004-01-19
JP2005531923A (ja) 2005-10-20
JP4485943B2 (ja) 2010-06-23
FR2841684A1 (fr) 2004-01-02
EP1535307A2 (de) 2005-06-01

Similar Documents

Publication Publication Date Title
EP0662195B1 (de) Plasmamotor geringer länge mit geschlossenem elektronendrift
EP0650557B1 (de) Plasmatriebwerk mit geschlossener elektronenlaufbahn
FR2550681A1 (fr) Source d'ions a au moins deux chambres d'ionisation, en particulier pour la formation de faisceaux d'ions chimiquement reactifs
CA2370462C (fr) Cartouche pour torche a plasma et torche a plasma equipee
EP1535307B1 (de) Entladungsstrahlungsquelle insbesondere für uv-strahlung
EP0185226B1 (de) Gasdurchflusslaser und Funktionsweise eines solchen Lasers
FR2984028A1 (fr) Eclateur haute tension a amorcage par laser comportant une cathode en materiau refractaire poreux a charge photoemissive
FR2969371A1 (fr) Dispositif generateur d’ions a resonance cyclotronique electronique
EP4059319A1 (de) Lichtblitzgenerator
WO2010067306A2 (fr) Dispositif et procédé de génération d'un flux de plasma
FR2522879A1 (fr) Dispositif de generation de rayons x
FR2644286A1 (fr) Generateur de faisceau d'electrons et dispositifs electroniques utilisant un tel generateur
FR2595876A1 (fr) Tube pour generateur laser du type a gaz ionise
FR2890233A1 (fr) Lampe adaptee a la decontamination microbiologique
FR2984027A1 (fr) Eclateur dont la cathode est montee sur une resistance
FR2558994A1 (fr) Generateur laser a flux gazeux
FR2852189A1 (fr) Procede, generateur et tube a eclairs pour generer des uvc
FR2985366A1 (fr) Generateur d'ondes hyperfrequences et procede de generation d'une onde hyperfrequence associe
FR2554983A1 (fr) Cathode creuse pour laser a gaz et laser en faisant application
FR2554982A1 (fr) Cathode creuse pour laser a vapeur metallique et laser en faisant application
EP1732221A2 (de) Elektrische Hochspannungsquelle
FR2655493A1 (fr) Generateur de tres haute tension utilisant un multiplicateur de tension.
FR2588700A2 (fr) Generateur laser a flux gazeux et procede de fonctionnement de ce generateur
FR2715007A1 (fr) Commutateur pseudospark déclenché par décharge corona.
Losev et al. Large aperture excimer laser system

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20041223

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL LT LV MK

DAX Request for extension of the european patent (deleted)
17Q First examination report despatched

Effective date: 20101217

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 618068

Country of ref document: AT

Kind code of ref document: T

Effective date: 20130715

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: FRENCH

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 60344325

Country of ref document: DE

Effective date: 20130814

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130920

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130930

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 618068

Country of ref document: AT

Kind code of ref document: T

Effective date: 20130619

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130919

REG Reference to a national code

Ref country code: NL

Ref legal event code: VDEP

Effective date: 20130619

BERE Be: lapsed

Owner name: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNR

Effective date: 20130630

Owner name: UNIVERSITE D'ORLEANS

Effective date: 20130630

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20131021

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130703

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

REG Reference to a national code

Ref country code: IE

Ref legal event code: MM4A

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130630

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130630

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130627

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130630

26N No opposition filed

Effective date: 20140320

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 60344325

Country of ref document: DE

Effective date: 20140320

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20130619

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20030627

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130627

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 14

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 15

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20170821

Year of fee payment: 15

Ref country code: DE

Payment date: 20170821

Year of fee payment: 15

Ref country code: FR

Payment date: 20170821

Year of fee payment: 15

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 60344325

Country of ref document: DE

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20180627

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190101

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20180630

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20180627