EP1512178B1 - Halbleiterfilterschaltung - Google Patents

Halbleiterfilterschaltung Download PDF

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Publication number
EP1512178B1
EP1512178B1 EP03728777A EP03728777A EP1512178B1 EP 1512178 B1 EP1512178 B1 EP 1512178B1 EP 03728777 A EP03728777 A EP 03728777A EP 03728777 A EP03728777 A EP 03728777A EP 1512178 B1 EP1512178 B1 EP 1512178B1
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EP
European Patent Office
Prior art keywords
integrated filter
node
doped region
coupled
semiconductor substrate
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Expired - Lifetime
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EP03728777A
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English (en)
French (fr)
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EP1512178A1 (de
Inventor
Rene Escoffier
Jeffrey Pearse
Francine Y. Robb
Evgueniy Nikolov Stefanov
Peter J. Zdebel
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Semiconductor Components Industries LLC
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Semiconductor Components Industries LLC
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
    • H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
    • H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs

Definitions

  • the present invention relates in general to semiconductor devices and, more particularly, to low frequency filter networks formed on semiconductor substrates.
  • Wireless communications devices typically operate using both radio frequency (RF) signals and lower frequency audio signals.
  • RF radio frequency
  • cellular telephones transmit RF carrier signals that operate at frequencies of six gigahertz or more and are modulated with audio frequency voice information.
  • a microphone generates an audio frequency signal from the voice information which is amplified and used to modulate the RF carrier signal.
  • Most wireless communications devices use a low pass filter at the microphone input to suppress ambient RF carrier signals that may be "picked up" or detected by the microphone in order to avoid degrading the performance of the communications device by noisy operation, loop instability, or other effects that reduce the quality of the modulating audio signal.
  • the low pass filters have a passband in the audio range, i.e., less than about twenty kilohertz.
  • these audio filters are formed with discrete passive components because of the difficulty of forming the large component values that set the filters' low frequency passband.
  • the discrete filters add a substantial fabrication cost to a wireless device.
  • Integrated filters based on semiconductor technology have a lower cost but have not been practical because of the large die area needed to integrate audio frequency components while providing an adequate voltage capability.
  • Prior art document US 6,121,669 (California Micro Devices Corp) discloses a thin film protected capacitor structure comprising back-to-back diodes, for integrated RC or RLC networks.
  • Prior art document US 4,017,885 (Texas Instruments Inc) discloses a semiconductor capacitor which utilises the volume of the semiconductor substrate in which it is formed to provide increased capacitance.
  • Prior art document WO 98/56020 (Telefonaktiebolaget LM Ericsson) discloses a buried capacitor for semiconductor circuits.
  • Text book V. Prasad Kosali Engineering Electromagnetic Compatibility, 2001, IEEE Press, New York , discloses in Chapter 10 the principles of electromagnetic interference (EMI) filter design. The above objectives are achieved by an integrated filter according to claim 1.
  • FIG. 1 is a block diagram of a wireless communications device 3, including a microphone 4, an antenna 5, an oscillator 6, a power stage 7, a modulator 8, an audio amplifier 9 and a filter 10.
  • Communications device 3 converts voice information received through microphone 4 to an electrical input signal V IN at a lead 64 of filter 10, and produces an RF transmitter signal V KMIT at a power level of two watts or more for transmitting by antenna 5.
  • communications device 3 is configured as a cellular telephone that broadcasts transmitter signal V KMIT to, for example, a cellular base station.
  • Filter 10 is a low pass microphone line filter used to suppress RF components of input signal V IN from other circuitry of communications device 3 such as audio amplifier 9. That is, filter 10 passes the audio frequency components of input signal V IN while rejecting or attenuating RF components.
  • the audio components are generated by microphone 4 from voice information, while the RF components are produced by, for example, incident electromagnetic waves generated by antenna 5 at the V XMIT carrier frequency.
  • the RF components if not attenuated or suppressed, can have an amplitude sufficient to overload audio amplifier 9 or to cause signal distortion, noise, instability, or other undesirable effects on the performance of communications device 3.
  • Filter 10 has an output at a lead 65 for producing a filtered audio output signal V OUT .
  • Filter 10 is specified to pass audio frequency components of V IN while attenuating RF component frequencies by a factor of at least thirty decibels at a frequency of six gigahertz.
  • V OUT is substantially comprised of audio frequency components with few or no RF components.
  • Audio amplifier 9 amplifies output signal V OUT and produces an amplified audio signal V AUD .
  • Oscillator 6 generates an RF oscillator signal V OSC at the desired carrier frequency of transmitter signal V XMIT .
  • Modulator 8 modulates V OSC with V AUD and produces a modulated signal V MOD which is coupled to power stage 7 and amplified to produce transmitter signal V XMIT .
  • V XMIT has an RF carrier frequency of about six gigahertz.
  • FIG. 2 is a schematic diagram of filter 10, including a resistor 24, capacitors 21-22, a clamp diode 27 and an electrostatic discharge (ESD) device 20 that includes back to back diodes 17-18 and an inductor 74.
  • Input signal V IN has both audio frequency components and undesirable RF components.
  • Output 65 produces filtered output signal V OUT operating at audio frequencies with RF components attenuated or suppressed.
  • Filter 10 is configured for integrating on a semiconductor die to form an integrated circuit.
  • Diodes 17-18 of ESD device 20 comprise back to back zener or avalanche diodes formed as junctions in a semiconductor substrate as described below. Diodes 17-18 are referred to as back to back diodes because their common cathode (or, alternatively, common anode) arrangement results in one of them being reverse biased regardless of the polarity of V IN . ESD device 20 dissipates electrostatic energy in the form of high voltage peaks of short duration which could damage sensitive system components. In one embodiment, ESD device 20 is formed to comply with International Electrotechnical Commission standard IEC61000-4-2 level four. In the embodiment of FIG.
  • diodes 17-18 have their respective cathodes commonly connected as shown to break down symmetrically when the voltage amplitude at node 66 reaches about fourteen volts positive and/or fourteen volts negative.
  • diode 17 forward biases and diode 18 avalanches at about 13.3 volts
  • diode 18 forward biases and diode 17 avalanches at about 13.3 volts.
  • ESD device 20 may include back to back diodes formed with their anodes commonly connected, rather than their cathodes, to achieve a similar protective function.
  • Inductor 74 is formed as a planar spiral inductor to have a typical value in a range between 1-5 nanohenries. In one embodiment, inductor 74 is formed by patterning a standard metal interconnect layer.
  • the trench design provides capacitors 21-22 with a low equivalent series resistance, and therefore a high quality factor, which results in a low impedance and high quality filtering function at RF frequencies.
  • Resistor 24 is formed as a thin film resistor, typically with a low parasitic substrate capacitance for enhanced filter performance. Resistor 24 cooperates with capacitors 21-22 to establish a characteristic frequency response for filter 10.
  • resistor 24 is formed with doped polysilicon having a concentration selected to produce the specified resistance value in a small die area while providing a high level of control to maintain the resistances within a specified tolerance. In one embodiment, the value of resistor 24 is controlled to within plus or minus ten percent. In one embodiment, resistor 24 has a resistance of about fifty ohms and a temperature coefficient of resistance approaching zero.
  • Clamp diode 27 is an avalanche diode that breaks down to limit the voltage swing at lead 65 to avoid overloading the input stage of amplifier 9. Accordingly, clamp diode 27 also provides an ESD protection function at lead 65.
  • clamp diode 27 is formed with a structure similar to that of either diode 17 or diode 18, and therefore has similar characteristics, i.e., a breakdown voltage of about 13.3 volts.
  • FIG. 3 shows a cross-sectional view of filter 10 formed on a semiconductor substrate 11 and configured as an integrated filter circuit, showing inductor 74, resistor 24, ESD device 20, clamp diode 27 and capacitors 21-22.
  • a base layer 30 is formed with semiconductor material and heavily doped to function as a low resistance ground plane for filter 10.
  • base layer 30 has a doping concentration in a range between 10 16 and 10 21 atoms/centimeter 3 .
  • base layer 30 has a doping concentration in a range between 10 18 and 10 21 atoms/centimeter 3 .
  • base layer 30 may comprise monocrystalline silicon doped to provide a p-type conductivity and a doping concentration of about 2*10 20 atoms/centimeter 3 .
  • the low resistivity of base layer 30 provides an effective ground plane that attenuates parasitic signals that would otherwise propagate through base layer 30 along parasitic signal paths to produce crosstalk and degrade filter performance.
  • An epitaxial layer 31 is grown over base layer 30 and doped to have an n-type conductivity.
  • Epitaxial layer 31 forms a junction with base layer 30 to comprise diode 18, so the doping concentration of epitaxial layer 31 is selected to provide a specified avalanche voltage for diode 18 such as, for example, 13.3 volts.
  • Epitaxial layer 31 typically has a thickness in a range between two and ten micrometers. In one embodiment, epitaxial layer 31 is grown to a thickness of about 2.5 micrometers and a concentration of about 5*10 17 atoms/centimeter 3 .
  • a layer 32 is formed over epitaxial layer 31 to have an n-type conductivity.
  • a doped region 33 is formed by introducing p-type dopants from a surface 35 of substrate 11 to produce a junction that functions as diode 17.
  • the doping concentrations of epitaxial layer 32 and doped region 33 are selected to provide a specified avalanche voltage for diode 17 such as, for example, 13.3 volts.
  • layer 32 is an epitaxial layer grown to a thickness of about three micrometers and a concentration of about 1*10 17 atoms/centimeter 3
  • doped region 33 has a thickness of about one micrometer and a surface, concentration of about 6.0*10 19 atoms/centimeter 3 .
  • epitaxial layer 31 is grown to a thickness of about 5.5 micrometers and layer 32 is formed.by subjecting epitaxial layer 31 to a blanket p-type diffusion to reduce its effective concentration to set the breakdown voltage of diode 17 to the desired level. This diffusion step reduces the effective doping concentration of epitaxial layer 31 within a depth less than about three micrometers.
  • An isolation region or sinker 12 is formed as a ring around ESD device 20 with a p-type conductivity and a depth of about twenty micrometers to electrically isolate ESD device 20 from other components.
  • Sinker 12 is diffused through epitaxial layers 31-32 to provide an external electrical contact to base layer 30 at surface 35, which is facilitated by adding a doped region 36 using the processing steps used to form doped region 33.
  • doped region 36 has a p-type conductivity to electrically couple sinker 12 through doped region 36 to an interconnect trace connected to lead 62.
  • a channel stopper 34 is heavily doped to have an n-type conductivity and a depth of about three micrometers.
  • Channel stopper 34 surrounds doped region 33 and prevents surface 35 from inverting to form a channel that would result in a conduction path from doped region 33 to base layer 20.
  • channel stopper 34 increases ESD robustness of the device by ensuring the dissipation of lateral current flow injected during ESD event to avoid current filaments forming at surface 35.
  • dielectric regions 45 comprise silicon dioxide thermally grown to a thickness of about five hundred angstroms followed by a layer about one micrometer thick of deposited silicon dioxide.
  • Capacitor 21 is formed as a trench capacitor by etching semiconductor substrate 11 to a depth of about seven micrometers to form a plurality of trenches 40 within sinker 12 as shown.
  • a dielectric material is formed to line inner surfaces of trench 40 to form a dielectric liner 38.
  • the dielectric material includes silicon nitride formed to a thickness of about four hundred angstroms.
  • a conductive material such as doped polysilicon is deposited and etched to form a conductive region 37 that fills trench 40 to function as a first electrode of capacitor 21 with sinker 12 functioning as a second electrode.
  • Sinker 12 is coupled to lead 62 through shallow, heavily doped p-type contact region 36 that is formed with the processing steps used to form doped region 33.
  • Capacitor 22 is formed in a similar fashion.
  • Clamp diode 27 is formed by the junction of base layer 30 and epitaxial layer 31 and isolated from other components by surrounding it with sinker 12 as shown. Hence, clamp diode 27 has a breakdown characteristic similar to that of diode 18 in ESD device 20.
  • a standard integrated circuit metal layer is deposited and etched to form bonding pads 60 and 61, along with interconnect traces.
  • Inductor 74 is concurrently formed by patterning this standard integrated circuit metal layer.
  • Other interconnect traces are represented schematically to simplify the figure.
  • Node 64 comprises a bonding structure shown as a metallic bump such as a solder bump or copper bump used for mounting filter 10 in a flip-chip fashion to a system circuit board (not shown).
  • the bonding structure may comprise a wire bond or other suitable structure for providing external electrical and/or mechanical connections.
  • X 64 2* ⁇ *(6.0*10 9 )*(0.1*10 -9 ) has a value of about four ohms.
  • Output signal V OUT is provided at node 65 through a structure similar to that of node 64.
  • the node 65 bonding structure has a parasitic inductance L 65 whose value is similar to the value of L 64 .
  • FIG. 3A is a top view of a portion of filter 10 showing inductor 74 formed around bonding pad 60.
  • inductor 74 is formed as a single winding that circumscribes the perimeter of bonding pad 60 and is spaced about twenty micrometers away.
  • inductor 74 may be formed as a planar spiral inductor having multiple windings.
  • Inductor 74 typically has an inductance in a range between one and five nanohenries.
  • Inductor 74 provides a smoothing function that flattens or integrates the voltage peaks of an ESD event, thereby improving the robustness of filter 10.
  • inductor 74 improves signal filtering by compensating for high frequency signal feedthrough due to parasitic inductances L 64 and L 65 described above.
  • FIG. 4 is a cross-sectional view of filter 10 in an alternate embodiment.
  • the previously described features have similar structures and operation, except that epitaxial layer 31 is grown to a thickness of about 5.5 micrometers.
  • Layer 32 is formed as a masked region of p-type conductivity that surrounds doped region 33.
  • region 32 has the same conductivity type but is more lightly doped than doped region 33, which has the effect of shifting the portion of diode 17 which breaks down to the bottom surface of layer 32 rather than side surfaces. This adjustment ensures that diode 17 has a large effective breakdown area and low impedance to dissipate the energy generated by an ESD event, thereby providing a high degree of reliability.
  • FIG. 5 is a cross sectional view of filter 10 in an example not forming part of the claimed invention in which base layer 30 is formed as a high resistivity material.
  • base layer 30 comprises lightly doped n-type monocrystalline silicon with an effective carrier concentration of 3*10 12 atoms/centimeter 3 and a resistivity of about one thousand ohm-centimeters.
  • Such a high resistivity improves the electrical isolation between adjacent components which reduces signal coupling through parasitic signal paths and improves filter performance.
  • P-type dopants are implanted through surface 35 and diffused into semiconductor substrate 11 to form well regions 51 and 54.
  • well regions 51 and 54 are formed to a depth of about fifteen micrometers.
  • Well regions 51 and 54 typically are doped to a lower concentration than sinkers 12 but the same thermal cycle is used to diffuse well regions 51 and 54 and sinkers 12 into substrate 11. The lower concentration of well regions 51 and 54 results in their being shallower than sinkers 12.
  • N-type dopants are introduced into substrate 11 through openings in dielectric region 45 to form doped regions 52-53 within well region 51 and a doped region 56 within well region 54.
  • Doped regions 52-53 form junctions with well region 51 that operate as back to back diodes 17-18, respectively, of ESD device 20.
  • the doping concentrations of well region 51 and doped regions 52-53 are adjusted to provide a predefined breakdown voltage to meet the specified performance of ESD device 20.
  • doped regions 52-53 are each formed with a rectangular shape to occupy an area of surface 35 which is about two hundred micrometers on a side. Note that because doped regions 52 and 53 are formed with the same processing steps the avalanche breakdown voltages and other performance parameters are symmetrical with respect to the polarity of the voltage on node 64.
  • doped region 56 and well region 54 form a junction that comprises clamp diode 27.
  • the present invention provides an integrated filter circuit that achieves a specified frequency selectivity while utilizing integrated circuit technology to achieve a small physical size and a low manufacturing cost.
  • a semiconductor substrate is formed with a trench that is lined with a dielectric layer.
  • a conductive material is used to fill the trench to provide a capacitance that filters an input signal.
  • Back to back diodes are formed in the substrate to avalanche when an electrostatic discharge voltage reaches a predetermined magnitude.

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  • Filters And Equalizers (AREA)

Claims (6)

  1. Integriertes Filter zum Filtern eines Eingangssignals, welches Folgendes enthält:
    einen Eingang (64) zum Empfang eines Eingangssignals (VIN) des integrierten Filters,
    einen Knoten (66),
    einen ersten Kondensator (21), der zwischen dem Knoten (66) und einem Basisreferenzknoten geschaltet ist, um eine Kapazität zur Verfügung zu stellen, die die Frequenzantwort des Eingangssignals (VIN) modifiziert, um ein gefiltertes Signal zu erzeugen,
    einen Ausgang (65) des integrierten Filters, der ein Ausgangssignal (VOUT) des integrierten Filters bildet,
    einen Induktor (74), der zwischen dem Eingang (64) und dem Knoten (66) geschaltet ist,
    eine Schutzschaltung, die den Induktor (74) enthält, die an back to back Dioden (17, 18) geschaltet ist, um lawinenartig zu wirken, wenn eine Spannung an dem Knoten (66) eine bestimmte Größe erreicht, wobei eine erste Diode (17) der back to back Dioden mit dem Knoten (66) und die zweite Diode (18) mit dem Basisreferenzknoten gekoppelt ist,
    einen zweiten Kondensator (22), der zwischen dem Ausgang (65) und dem Basisreferenzknoten geschaltet ist,
    eine Klemmdiode (27), die parallel zum zweiten Kondensator (22) gekoppelt ist, und
    einen Widerstand (24), der zwischen dem Knoten (66) und dem Ausgang (65) geschaltet ist,
    wobei das integrierte Filter ferner ein Halbleitersubstrat (11) enthält, wobei das Halbleitersubstrat (11) eine Basisschicht (30) eines ersten Leitfähigkeitstyps und einer Dotierungskonzentration in einem Bereich zwischen 1018 und 1021 Atomen pro Kubikzentimeter enthält,
    wobei der erste Kondensator (21) einen ersten Graben in dem Halbleitersubstrat (11) enthält, und der Graben mit einer ersten dielektrischen Schicht (38) ausgebildet ist und ein erster Teil eines leitfähigen Materials (37) in dem ersten Graben (40) angeordnet ist,
    wobei die back to back Dioden (17, 18) in dem Halbleitersubstrat ausgebildet sind,
    wobei die zweite Diode (18) aus einem ersten Teil einer ersten dotierten Region (31, 32) eines zweiten Leitfähigkeitstyps geformt ist, die einen ersten Übergang mit der Basisschicht (30) bildet und die erste Diode (17) aus einer zweiten dotierten Region (33) gebildet ist, die den ersten Leitfähigkeitstyp aufweist, um einen zweiten Übergang mit dem ersten Teil der ersten dotierten Region (31, 32) zu bilden, wobei die zweite dotierte Region (33) mit dem Knoten (66) gekoppelt ist,
    wobei der Widerstand (24) als Dünnfilmtransistor ausgebildet ist,
    wobei der Induktor (74) als ebene Einrichtung auf der Oberfläche des Halbleitersubstrats (11) ausgebildet ist,
    wobei die Klemmdiode (27) durch den Übergang der Basisschicht (30) und
    einen zweiten Bereich der ersten dotierten Region (31, 32) gebildet ist, wobei die Klemmdiode von den anderen Komponenten durch eine erste Leitfähigkeitstyp-Senke um die Klemmdiode (27) isoliert ist, und
    wobei der zweite Kondensator (22) einen zweiten Graben auf dem Halbleitersubstrat bildet, wobei der zweite Graben mit einer zweiten dielektrischen Schicht ausgekleidet ist und ein zweiter Bereich des Leitfähigkeitsmaterials in dem zweiten Graben angeordnet ist.
  2. Integriertes Filter nach Anspruch 1, wobei die erste dotierte Region (31, 32) eine Epitaxialschicht aufweist, die auf der Basisschicht (30) gewachsen ist, und wobei die zweiten dotierte Region (33) von der Oberfläche der Exptaxialchicht diffundiert ist.
  3. Integriertes Filter nach Anspruch 2, wobei die zweite dotierte Region Folgendes enthält:
    einen ersten Teil, der eine erste Oberflächenkonzentration enthält und zu einer ersten Tiefe diffundiert ist, und
    ein zweiter Bereich, der eine zweite Oberflächenkonzentration hat, die kleiner als die erste Oberflächenkonzentration ist und zu einer zweiten Tiefe größer als die erste Tiefe diffundiert ist.
  4. Integriertes Filter nach Anspruch 2, bei dem Unreinheiten des ersten Leitfähigkeitstyps durch eine Oberfläche der Epitaxialschicht diffundiert sind, um eine effektive Dotierungskonzentration der Epitaxialschicht innerhalb einer Tiefe auf unter 3 Mikrometer zu reduzieren.
  5. Integriertes Filter nach Anspruch 1, wobei Gräben jeweils in den ersten Brunnenbereichen des Halbleitersubstrats ausgebildet sind, wobei die ersten Brunnenbereiche einen Leitfähigkeitstyp aufweisen.
  6. Drahtloses Kommunikationsgerät, welches Folgendes enthält:
    eine Leistungsstufe, die ein moduliertes Signal empfängt und ein Ausgangssignal des drahtlosen Kommunikationsgerätes aussendet,
    einen Modulator, der ein Funkfrequenzträgersignal mit einem Audiosignal moduliert, um das modulierte Signal zu erzeugen,
    ein Mikrofon zur Umwandlung von Sprachinformation in das Audiosignal, wobei das Mikrofon einen Teil des Ausgangssignals erhält, und
    ein integriertes Filter, das auf dem Halbleitersubstrat ausgebildet ist und
    zwischen dem Mikrofon und einer Leistungsstufe geschaltet ist, um die Radiofrequenzkomponenten des Ausgangssignals zu dämpfen, wobei das integrierte Filter nach einem der Ansprüche 1 - 5 ausgebildet ist.
EP03728777A 2002-06-11 2003-05-12 Halbleiterfilterschaltung Expired - Lifetime EP1512178B1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US166288 1988-03-10
US10/166,288 US6953980B2 (en) 2002-06-11 2002-06-11 Semiconductor filter circuit and method
PCT/US2003/014505 WO2003105228A1 (en) 2002-06-11 2003-05-12 Semiconductor filter circuit and method

Publications (2)

Publication Number Publication Date
EP1512178A1 EP1512178A1 (de) 2005-03-09
EP1512178B1 true EP1512178B1 (de) 2011-09-21

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US (1) US6953980B2 (de)
EP (1) EP1512178B1 (de)
CN (1) CN1306611C (de)
AU (1) AU2003233500A1 (de)
WO (1) WO2003105228A1 (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI109641B (fi) * 2000-03-10 2002-09-13 Nokia Corp Mikrofonirakenne
US6984860B2 (en) * 2002-11-27 2006-01-10 Semiconductor Components Industries, L.L.C. Semiconductor device with high frequency parallel plate trench capacitor structure
ATE477629T1 (de) 2004-06-16 2010-08-15 Nxp Bv Passive verarbeitungsvorrichtung zur kopplung sowie zur zurückweisung von elektrostatischer entladung und funksignalen bei tonsignalpfaden einer elektronischen vorrichtung
US7262681B2 (en) 2005-02-11 2007-08-28 Semiconductor Components Industries, L.L.C. Integrated semiconductor inductor and method therefor
US7561391B2 (en) * 2005-12-20 2009-07-14 International Rectifier Corporation Input voltage sensing circuit
DE602007008841D1 (de) * 2006-02-10 2010-10-14 Nxp Bv Halbleiterbauelement und verfahren zu seiner herstellung
US7589392B2 (en) * 2006-06-16 2009-09-15 Semiconductor Components Industries, L.L.C. Filter having integrated floating capacitor and transient voltage suppression structure and method of manufacture
US7466212B2 (en) * 2006-06-16 2008-12-16 Semiconductor Components Industries, L. L. C. Semiconductor filter structure and method of manufacture
WO2008029361A1 (en) * 2006-09-06 2008-03-13 Nxp B.V. Integrated circuit and use thereof
US7863995B2 (en) * 2007-06-16 2011-01-04 Alpha & Omega Semiconductor Ltd. Methods of achieving linear capacitance in symmetrical and asymmetrical EMI filters with TVS
US7795987B2 (en) * 2007-06-16 2010-09-14 Alpha & Omega Semiconductor, Ltd. Methods of achieving linear capacitance in symmetrical and asymmetrical EMI filters with TVS
US7666751B2 (en) * 2007-09-21 2010-02-23 Semiconductor Components Industries, Llc Method of forming a high capacitance diode and structure therefor
US7579632B2 (en) * 2007-09-21 2009-08-25 Semiconductor Components Industries, L.L.C. Multi-channel ESD device and method therefor
US7538395B2 (en) * 2007-09-21 2009-05-26 Semiconductor Components Industries, L.L.C. Method of forming low capacitance ESD device and structure therefor
JP2009225100A (ja) * 2008-03-17 2009-10-01 Nec Electronics Corp 半導体集積回路及びコンデンサ・マイクロフォン
US7955941B2 (en) * 2008-09-11 2011-06-07 Semiconductor Components Industries, Llc Method of forming an integrated semiconductor device and structure therefor
US8089095B2 (en) 2008-10-15 2012-01-03 Semiconductor Components Industries, Llc Two terminal multi-channel ESD device and method therefor
US7812367B2 (en) * 2008-10-15 2010-10-12 Semiconductor Components Industries, Llc Two terminal low capacitance multi-channel ESD device
JP5239735B2 (ja) * 2008-10-22 2013-07-17 ソニー株式会社 データ通信装置、および通信データ制御方法
US8175541B2 (en) * 2009-02-06 2012-05-08 Rfaxis, Inc. Radio frequency transceiver front end circuit
US8073401B2 (en) * 2009-02-17 2011-12-06 Rfaxis, Inc. Multi mode radio frequency transceiver front end circuit with inter-stage matching circuit
US9231680B2 (en) * 2009-03-03 2016-01-05 Rfaxis, Inc. Multi-channel radio frequency front end circuit
US20100244981A1 (en) * 2009-03-30 2010-09-30 Oleksandr Gorbachov Radio frequency power divider and combiner circuit
US9142592B2 (en) 2009-04-09 2015-09-22 Infineon Technologies Ag Integrated circuit including ESD device
US8467738B2 (en) * 2009-05-04 2013-06-18 Rfaxis, Inc. Multi-mode radio frequency front end module
US8377757B2 (en) * 2010-04-30 2013-02-19 Shanghai Sim-Bcd Semiconductor Manufacturing Limited Device and method for transient voltage suppressor
DE102012014860A1 (de) 2012-07-26 2014-05-15 Infineon Technologies Ag ESD-Schutz
FR2994335A1 (fr) * 2012-08-01 2014-02-07 St Microelectronics Tours Sas Dispositif de protection d'un circuit integre contre des surtensions
CN105097794A (zh) * 2014-04-25 2015-11-25 中芯国际集成电路制造(上海)有限公司 Esd防护器件及其制作方法
US9704832B1 (en) * 2016-02-29 2017-07-11 Ixys Corporation Die stack assembly using an edge separation structure for connectivity through a die of the stack
EP3296727B1 (de) * 2016-09-19 2019-04-17 Murata Integrated Passive Solutions Gerät zur elektrischen stimulation und monitoring
CN109104173B (zh) * 2018-07-20 2022-05-10 上海华虹宏力半导体制造有限公司 一种射频开关esd系统
EP3858426A1 (de) * 2020-01-28 2021-08-04 Murata Manufacturing Co., Ltd. Biologische elektrodenschutzmodule und verfahren zu deren herstellung
CN114157257A (zh) * 2021-12-03 2022-03-08 电子科技大学 一种集成lc滤波器及其制造方法
WO2025192022A1 (ja) * 2024-03-15 2025-09-18 富士電機株式会社 半導体装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4017885A (en) * 1973-10-25 1977-04-12 Texas Instruments Incorporated Large value capacitor
WO1998056020A2 (en) * 1997-06-06 1998-12-10 Telefonaktiebolaget Lm Ericsson Method for arrangement of a buried capacitor, and a buried capacitor arranged according to said method
US6121669A (en) * 1995-11-28 2000-09-19 California Micro Devices Corporation Integrated RC filters

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5578860A (en) * 1995-05-01 1996-11-26 Motorola, Inc. Monolithic high frequency integrated circuit structure having a grounded source configuration
JPH09121138A (ja) * 1995-08-24 1997-05-06 Fujitsu Ltd フィルタ装置及びこれを用いた無線装置
US6140674A (en) * 1998-07-27 2000-10-31 Advanced Micro Devices, Inc. Buried trench capacitor
WO2001063672A2 (en) * 2000-02-22 2001-08-30 Formfactor, Inc. Integrated circuit interconnect system having matched impedance and capacitance

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4017885A (en) * 1973-10-25 1977-04-12 Texas Instruments Incorporated Large value capacitor
US6121669A (en) * 1995-11-28 2000-09-19 California Micro Devices Corporation Integrated RC filters
WO1998056020A2 (en) * 1997-06-06 1998-12-10 Telefonaktiebolaget Lm Ericsson Method for arrangement of a buried capacitor, and a buried capacitor arranged according to said method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
V. PRASAD KODALI: "Engineering Electromagnetic Compatibility", 2001, IEEE PRESS, NEW YORK, ISBN: 0-7803-4743-9 *

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US20030228848A1 (en) 2003-12-11
HK1079618A1 (en) 2006-04-07
CN1659705A (zh) 2005-08-24
AU2003233500A1 (en) 2003-12-22
EP1512178A1 (de) 2005-03-09
US6953980B2 (en) 2005-10-11
WO2003105228A1 (en) 2003-12-18
CN1306611C (zh) 2007-03-21

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