EP1477684A1 - Molekular, Turbomolekular oder Hybridpumpe mit intergriertem Ventil - Google Patents

Molekular, Turbomolekular oder Hybridpumpe mit intergriertem Ventil Download PDF

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Publication number
EP1477684A1
EP1477684A1 EP04291161A EP04291161A EP1477684A1 EP 1477684 A1 EP1477684 A1 EP 1477684A1 EP 04291161 A EP04291161 A EP 04291161A EP 04291161 A EP04291161 A EP 04291161A EP 1477684 A1 EP1477684 A1 EP 1477684A1
Authority
EP
European Patent Office
Prior art keywords
molecular
turbomolecular
shutter
pump
hybrid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP04291161A
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English (en)
French (fr)
Other versions
EP1477684B1 (de
Inventor
Jean-Pierre Desbiolles
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel Lucent SAS
Original Assignee
Alcatel CIT SA
Alcatel SA
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Filing date
Publication date
Application filed by Alcatel CIT SA, Alcatel SA filed Critical Alcatel CIT SA
Publication of EP1477684A1 publication Critical patent/EP1477684A1/de
Application granted granted Critical
Publication of EP1477684B1 publication Critical patent/EP1477684B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D27/00—Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps

Definitions

  • the present invention relates to gas pumping systems for establishing and regulating a suitable vacuum in a process chamber such as a chamber used in particular in the semiconductor industry.
  • MEMS mechanical microelectronics
  • the vacuum line of a process chamber generally includes a secondary pump, of molecular, turbomolecular or hybrid type, connected to the chamber outlet with the interposition of an isolation valve, and which pumped back into a connecting pipe connected to the inlet of a primary pump the outlet of which discharges at atmospheric pressure.
  • a isolation valve at the outlet of the secondary pump.
  • Controlling the pressure in the process chamber requires provide means for modifying the pumping conditions in the vacuum line, to adapt them to the successive stages of the processes.
  • we controlled the pressure in the process chambers by operating a control valve placed directly at the outlet of the process chamber, in upstream of the secondary pump.
  • a problem then is the risk of fouling of the regulating valve by the pumped gases, and the risk of retrograde pollution from the control valve to the process chamber during steps subsequent processes.
  • WO 99/04325 describes in particular this solution consisting in providing a regulating valve connected to the input of the primary pump not speed-controlled, while providing an injection of neutral gas upstream of the control valve.
  • the problem proposed by the present invention is both to reduce appreciably the risks of fouling of the control valve and the risks of retro pollution diffused from the control valve to the processes, without significantly degrading the pressure regulation conditions in the process room.
  • a rapid response from pressure regulation means during transitions between successive stages processes is also proposed.
  • the invention makes it possible to reduce the resulting bulk. the presence of the control valve itself.
  • the idea which is the basis of the invention is to integrate the valve regulation to the structure of the secondary pump, providing a structure particular valve whose shutter acts directly on a radial orifice of outlet in the cylindrical peripheral wall of the pump.
  • a molecular type secondary pump is provided, turbomolecular or hybrid with an output stage, and the shutter acts directly on the radial outlet orifice provided in the cylindrical peripheral wall of this stage of exit.
  • control valve is placed as close as possible to the pump secondary, which is itself closest to the process chamber, reducing thus the reaction time to upstream disturbances in the atmosphere of the process chamber.
  • the invention also benefits from the natural heating of the pump secondary, which heats the integrated valve and thus reduces the risk of deposits and condensation of the gases pumped on the parts of the control valve.
  • the invention provides a pump molecular, turbomolecular or hybrid, comprising an output stage having a cylindrical peripheral wall and a radial outlet orifice passing through the wall cylindrical device; the pump according to the invention further comprises a valve regulation and / or integrated insulation having an annular shutter coaxial with passage light which cooperates directly with the radial exit outlet of the stage outlet to achieve shutter and / or regulation.
  • the coaxial annular shutter is placed inside the cylindrical peripheral wall in an annular space of discharge, pressing on the internal face of the radial outlet orifice.
  • the coaxial annular shutter is in support on the external face of the radial outlet orifice, and housed around the wall cylindrical device of the output stage.
  • the coaxial annular shutter can advantageously be biased in axial rotation by a motor to adjust the position of the light passage relative to the radial outlet orifice.
  • the rotation of the annular shutter coaxial displaces the passage light with respect to the radial exit orifice, and thus performs the control of the gas flow passing through the control valve and / or insulation.
  • the coaxial annular shutter may include a rack engaged on a gear driven in rotation by the motor.
  • the motor can advantageously be housed in an attached box radially against the cylindrical peripheral wall of the pump, with interposition seals.
  • the valve achieves a total tight sealing in position closed.
  • the coaxial annular shutter may include means sealing devices fitted to ensure the sealing of the shutter in the closed position.
  • the coaxial annular shutter can include a total shutter mounted radially movable on the shutter coaxial annular, and biased in radial displacement by means of displacement which press it against the periphery of the radial outlet orifice when is facing said radial outlet orifice, and which separate it from the peripheral wall cylindrical in its other angular positions.
  • the nitrogen injection can be carried out inside the housing containing the drive motor for the coaxial annular valve shutter which further protects the motor itself against any risk of pollution by pumped gases.
  • the passing light of the coaxial annular obturator a shape adapted to obtain a curve of appropriate conductance for stable and efficient regulation.
  • the shape of the passing light defines the variation of the conductance as a function of the angle of rotation of the coaxial annular shutter.
  • a pumping system comprising gases from a process chamber, comprising at least one secondary pump molecular, turbomolecular or hybrid with an output stage, and comprising at minus a regulation and / or isolation valve controlling the flow of gases pumps ; according to the invention, the regulation and / or isolation valve is integrated in the output stage as defined above.
  • the regulation and / or isolation valve can advantageously be driven by a motor and control means to achieve regulation of pressure upstream of the secondary pump.
  • a pump in a line of vacuum to control the vacuum of a process chamber 1, a pump is provided primary 2 which discharges at atmospheric pressure and whose suction is connected, by a connecting pipe 3, to the discharge 4 of a pump secondary 5, the suction 6 of which is connected to the process chamber 1.
  • the discharge 4 of the secondary pump 5 comprises, integrated in the secondary pump 5 itself, a control valve 7 associated with means 8 to control the regulation valve 7.
  • the regulating valve 7 can comprise a shutter mechanically movable by a motor constituting the means 8 to control the control valve 7.
  • the motor 8 can be controlled by control means 9 such as a microprocessor or a microcontroller.
  • control means 9 such as a microprocessor or a microcontroller.
  • the means of command 9 can receive a setpoint signal produced by a setpoint 10, and measurement signals produced for example by a pressure sensor 11 in the process chamber 1.
  • the pressure in the process chamber 1 can be controlled by the more or less large opening of the regulation valve 7, obtained by actuation of the motor 8.
  • a source of neutral gas 14, for example containing nitrogen, can advantageously be connected, by a pipe 15 and a valve control 16, to a box containing the motor 8, for injecting a neutral gas which propagates towards the inside of the output stage of the secondary pump 5 through the control valve 7.
  • the invention applies to secondary pumps which may be of the type molecular, turbomolecular or hybrid type.
  • the stator comprises a cylindrical peripheral wall around a inner stator skirt from which it is separated by an annular space of discharge.
  • a radial outlet orifice crosses the cylindrical peripheral wall and thus connects the external atmosphere with the annular space of discharge.
  • a rotor with helical ribs is engaged coaxially in the interior space defined by the interior stator skirt and is rotated along the axis of the pump.
  • the rotor and the stator have stages of fins which overlap one another.
  • the output stage of such a molecular or hybrid pump 5 comprises a cylindrical peripheral wall 17, a coaxial internal skirt of stator 18 to helical inner ribs 19, and a Holweck rotor, not shown in the figures, which is engaged coaxially in the interior space 20 defined by the skirt inner stator 18 and which is rotated along the axis of the pump by a main engine not shown.
  • the secondary pump 5 is seen from its downstream face, from which the downstream sealing wall was removed to allow distinguish the internal parts of the pump.
  • the downstream face of the pump is closed by a tight disc-shaped wall, fixed to the wall cylindrical device 17 and defining a downstream chamber 21 (see in particular the figure 6).
  • the pumped gases are returned by the Holweck rotor to the downstream chamber 21 which itself communicates with an annular delivery space 22 located between the cylindrical peripheral wall 17 and the internal stator skirt 18.
  • the cylindrical peripheral wall 17 has a radial outlet orifice 23 through which the discharged gases escape from the annular discharge space 22.
  • valve According to the invention, a particular structure of the valve is provided. regulation whose closure element is directly adjacent to the radial orifice of outlet 23 in the cylindrical peripheral wall 17 of the Holweck stage of the pump Secondary 5.
  • control valve includes an annular shutter coaxial 24, cylindrical in shape, sealingly against one of the faces of the radial outlet orifice 23, comprising a passage lumen 25 (FIG. 5) on a portion of its periphery, and biased in axial rotation to position so adjustable said passage light 25 according to an angular orientation more or less aligned or offset from the radial outlet orifice 23 in order to adjust the conductance of the control valve.
  • Such a coaxial annular shutter 24 is illustrated in isolation in perspective in a particular embodiment in Figure 5.
  • the coaxial annular shutter 24 has a cylindrical shape, consisting of a continuous cylindrical wall 24a and limited by a circular edge upstream 24b and a circular downstream edge 24c.
  • a guide groove 24d is provided on the outer wall of the wall 24a, to cooperate with guide means which fix the axial position of the cylindrical annular shutter 24 in the body of pump.
  • the upstream circular edge 24b has a toothed portion 24e for cooperate with a drive pinion biased by a motor to drive in axial rotation of the coaxial annular shutter 24 in the pump body.
  • a passage light 25 can also be distinguished which, when the angular position of the coaxial annular shutter 24 places it facing the radial outlet orifice 23 (FIG. 6) of the pump, defines the open position valve, and which more or less closes the control valve when it is offset away from the radial outlet orifice 23.
  • the passage light is given 25 a suitable shape to obtain an appropriate conductance curve enabling stable and efficient regulation by position control angle of the coaxial annular shutter 24 around the axis of the pump.
  • FIG. 5 there is also a total shutter 26, radially movable on the coaxial annular shutter 24, to be stressed radially by means of radial displacement which will be described later.
  • the total shutter 26 has a front seal 26a to ensure a total tightness in closed position.
  • the coaxial annular shutter 24 is placed inside the annular delivery space 22, and is movable by axial rotation around the pump axis as illustrated by the double arrow 27 in Figure 2.
  • the coaxial annular shutter 24 is driven by the motor 8 placed in a housing 28 mounted radially on the cylindrical peripheral wall 17, as best seen in Figure 6.
  • the motor 8 drives a toothed wheel 29 which engages on the toothed part 24e of the upstream circular edge 24b of the coaxial annular shutter 24.
  • the housing 28 is mounted radially on the peripheral wall cylindrical 17 of the pump body with interposition of a seal front annular 30.
  • a second annular seal 31, with radial action, is also provided in the cylindrical peripheral wall 17 inside the orifice passage of the shaft carrying the toothed wheel 29.
  • the arrival of the pipe 15 can still be distinguished. injecting neutral gas into the housing 28 containing the engine 8.
  • a neutral gas injection causes a neutral gas flow through the engine 8 in direction of the secondary pump 5, avoiding circulation of gas pumped from the secondary pump 5 to motor 8 to reduce the risk of pollution of the motor 8, and simultaneously ensuring a dilution of the gases in the Holweck stage, this which further reduces the risk of deposits.
  • the unidirectional flow of neutral gas is ensured by providing at least one calibrated axial hole passing through the toothed wheel 29.
  • the coaxial annular shutter 24 takes advantage of the heating at the exit of the stage Holweck, which reduces the risk of gas deposits being pumped onto the elements of the control valve. But above all, this position of the coaxial annular shutter 24 minimizes the high-pressure gas volume upstream of the shut-off valve regulation 7, thus improving the reaction capacity of the regulation.
  • control valve is shown in the position total shutter.
  • the coaxial annular shutter 24 is placed in an angular position such that the total shutter 26 is exactly in look of the radial outlet orifice 23.
  • the total shutter 26 is pressed against the inner face of cylindrical peripheral wall 17, along the entire periphery of the radial outlet orifice 23, and its annular seal 26a is plated against the periphery of the radial outlet orifice 23 to ensure a seal perfect.
  • FIG. 7 the secondary pump 5 has been illustrated in a state in which the control valve is in the fully open position.
  • the secondary pump 5 has been illustrated in diametral section. of Figure 6 in the partially open position, also shown in view from above in FIG. 9.
  • the coaxial annular shutter 24 is pivoted angularly by the motor to place the passage light 25 partially in face of the radial outlet orifice 23, which radial outlet orifice 23 is partially closed by the total shutter 26.
  • the valve is illustrated in half-open position.
  • the total shutter 26 is radially movable, to be spaced from the wall cylindrical device 17 in all the angular positions of the shutter coaxial annular 24 except in the fully closed position illustrated in the figure 6.
  • the total shutter 26 has an inner face 26b in ramp, with a thinner portion 26c and a thicker portion 26d.
  • the inner face 26b comes in radial support on rollers 32a and 32b, clearly visible in the sectional figures diametral.
  • the rollers such as the roller 32a are supported on the thinnest part 26c of the total closure flap 26, allowing the radial retraction of the total closure flap 26 towards the pump axis, away from the cylindrical peripheral wall 17.
  • the rollers such as the roller 32a are supported on the thinnest part 26c of the total closure flap 26, allowing the radial retraction of the total closure flap 26 towards the pump axis, away from the cylindrical peripheral wall 17.
  • the rollers such as the roller 32a are supported on the thickest part 26d of the total shutter 26, pushing the total shutter 26 towards the outside to press it against the cylindrical peripheral wall 17 according to the periphery of the radial outlet orifice 23, the seal 26a then ensuring sealing perfect.
  • Figure 3 illustrates in perspective the secondary pump 5 in the position of Figure 11: the total shutter 26 is slightly off-center by relative to the radial outlet orifice 23.
  • Figure 4 illustrates the secondary pump 5 in the half-open position illustrated in FIG. 8 and in FIG. 9.
  • the total shutter 26 is offset half the width of the radial outlet orifice 23, and we can also distinguish half of the passage light 25.
  • valve regulation provided with a total shutter 26, can also ensure the isolation valve function.
  • the coaxial annular shutter 24 comprises only a passage light 25, and has no total shutter 26.
  • the valve only fulfills the function of control valve, the complete closure of the valve not being leaktight.
  • the coaxial annular shutter 24 is disposed inside the pump, and comes in bearing against the inner face of the cylindrical peripheral wall 17 around the radial outlet orifice 23.
  • the coaxial annular shutter 24 can be placed at the exterior of the cylindrical peripheral wall 17, bearing on the edges of the orifice outlet radial 23.
EP04291161A 2003-05-13 2004-05-05 Molekular, Turbomolekular oder Hybridpumpe mit intergriertem Ventil Expired - Lifetime EP1477684B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0305724 2003-05-13
FR0305724A FR2854933B1 (fr) 2003-05-13 2003-05-13 Pompe moleculaire, turbomoleculaire ou hybride a vanne integree

Publications (2)

Publication Number Publication Date
EP1477684A1 true EP1477684A1 (de) 2004-11-17
EP1477684B1 EP1477684B1 (de) 2007-11-07

Family

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EP04291161A Expired - Lifetime EP1477684B1 (de) 2003-05-13 2004-05-05 Molekular, Turbomolekular oder Hybridpumpe mit intergriertem Ventil

Country Status (6)

Country Link
US (1) US7311491B2 (de)
EP (1) EP1477684B1 (de)
JP (1) JP4560331B2 (de)
AT (1) ATE377711T1 (de)
DE (1) DE602004009857T2 (de)
FR (1) FR2854933B1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1739308B1 (de) * 2005-06-30 2008-06-18 VARIAN S.p.A. Vakuumpumpe
US20070256934A1 (en) * 2006-05-08 2007-11-08 Perata Michael R Apparatus and Method for Coating Substrates With Approximate Process Isolation
US8221098B2 (en) * 2009-03-09 2012-07-17 Honeywell International Inc. Radial turbomolecular pump with electrostatically levitated rotor
AT510406B1 (de) 2011-04-04 2012-04-15 Scheuch Gmbh Schlauchfilter zur reinigung staubbelasteter gase und injektordüse für ein solches schlauchfilter
US9267605B2 (en) 2011-11-07 2016-02-23 Lam Research Corporation Pressure control valve assembly of plasma processing chamber and rapid alternating process
GB2498816A (en) 2012-01-27 2013-07-31 Edwards Ltd Vacuum pump
DE102013207269A1 (de) * 2013-04-22 2014-10-23 Pfeiffer Vacuum Gmbh Statorelement für eine Holweckpumpstufe, Vakuumpumpe mit einer Holweckpumpstufe und Verfahren zur Herstellung eines Statorelements für eine Holweckpumpstufe
WO2018039578A1 (en) * 2016-08-26 2018-03-01 Applied Materials, Inc. Low pressure lift pin cavity hardware
US10559451B2 (en) * 2017-02-15 2020-02-11 Applied Materials, Inc. Apparatus with concentric pumping for multiple pressure regimes
US10655638B2 (en) * 2018-03-15 2020-05-19 Lam Research Corporation Turbomolecular pump deposition control and particle management

Citations (3)

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Publication number Priority date Publication date Assignee Title
EP0585911A1 (de) * 1992-09-03 1994-03-09 Matsushita Electric Industrial Co., Ltd. Zweistufige Trockenprimärpumpe
US5443368A (en) * 1993-07-16 1995-08-22 Helix Technology Corporation Turbomolecular pump with valves and integrated electronic controls
WO1999004325A1 (en) * 1997-07-15 1999-01-28 Leybold Vakuum Gmbh An apparatus and method for regulating a pressure in a chamber

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DE3410905A1 (de) * 1984-03-24 1985-10-03 Leybold-Heraeus GmbH, 5000 Köln Einrichtung zur foerderung von gasen bei subatmosphaerischen druecken
JPH02102385A (ja) * 1988-10-08 1990-04-13 Toyo Eng Corp 排気装置
FR2656658B1 (fr) * 1989-12-28 1993-01-29 Cit Alcatel Pompe a vide turbomoleculaire mixte, a deux arbres de rotation et a refoulement a la pression atmospherique.
DE19632375A1 (de) * 1996-08-10 1998-02-19 Pfeiffer Vacuum Gmbh Gasreibungspumpe
DE19634095A1 (de) * 1996-08-23 1998-02-26 Pfeiffer Vacuum Gmbh Eingangsstufe für eine zweiflutige Gasreibungspumpe
JP3038432B2 (ja) * 1998-07-21 2000-05-08 セイコー精機株式会社 真空ポンプ及び真空装置
JP3010529B1 (ja) * 1998-08-28 2000-02-21 セイコー精機株式会社 真空ポンプ、及び真空装置
FR2822200B1 (fr) * 2001-03-19 2003-09-26 Cit Alcatel Systeme de pompage pour gaz a faible conductivite thermique

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0585911A1 (de) * 1992-09-03 1994-03-09 Matsushita Electric Industrial Co., Ltd. Zweistufige Trockenprimärpumpe
US5443368A (en) * 1993-07-16 1995-08-22 Helix Technology Corporation Turbomolecular pump with valves and integrated electronic controls
WO1999004325A1 (en) * 1997-07-15 1999-01-28 Leybold Vakuum Gmbh An apparatus and method for regulating a pressure in a chamber

Also Published As

Publication number Publication date
EP1477684B1 (de) 2007-11-07
ATE377711T1 (de) 2007-11-15
DE602004009857T2 (de) 2008-08-28
US7311491B2 (en) 2007-12-25
JP2004340147A (ja) 2004-12-02
JP4560331B2 (ja) 2010-10-13
DE602004009857D1 (de) 2007-12-20
US20040228747A1 (en) 2004-11-18
FR2854933A1 (fr) 2004-11-19
FR2854933B1 (fr) 2005-08-05

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