EP1428006B1 - Verfahren und vorrichtung zur scan-instrumentenkalibration - Google Patents

Verfahren und vorrichtung zur scan-instrumentenkalibration Download PDF

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Publication number
EP1428006B1
EP1428006B1 EP02749692A EP02749692A EP1428006B1 EP 1428006 B1 EP1428006 B1 EP 1428006B1 EP 02749692 A EP02749692 A EP 02749692A EP 02749692 A EP02749692 A EP 02749692A EP 1428006 B1 EP1428006 B1 EP 1428006B1
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European Patent Office
Prior art keywords
samples
specimen
determining
calibration
targets
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EP02749692A
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English (en)
French (fr)
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EP1428006A4 (de
EP1428006A2 (de
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Henri J. c/o Universitaire Louis Pasteur LEZEC
Christian R. Musil
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FEI Co
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FEI Co
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Priority claimed from US10/186,206 external-priority patent/US6770867B2/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/20—Resistors
    • H01L28/24—Resistors with an active material comprising a refractory, transition or noble metal, metal compound or metal alloy, e.g. silicides, oxides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/047—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/282—Determination of microscope properties
    • H01J2237/2826—Calibration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30433—System calibration
    • H01J2237/30438—Registration
    • H01J2237/30444—Calibration grids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam

Definitions

  • the present invention relates to the field of scanned beam microscopy, and in particular, to a method and apparatus for calibration of a scanned beam system.
  • Scanned beam microscopy systems including charged particle beam systems such as electron beam and focused ion beam (FIB) systems, are widely used in characterization or treatment of materials on a microscopic scale.
  • charged particle beam systems such as electron beam and focused ion beam (FIB) systems
  • FIB focused ion beam
  • LMIS gallium liquid metal ion sources
  • the beam of a scanning beam system typically scans the surface of a target specimen in a raster pattern.
  • This raster pattern may be used to produce an image of the surface of the target.
  • particles or photons are emitted from the immediate vicinity of beam impact.
  • a portion of these emissions are measured or collected using a suitable detector or collector that produces an output signal indicative of the intensity of the emission. This output signal is then processed to produce an observable image displayed on a conventional video monitor.
  • a typical application of scanning beam systems is for analysis and treatment of integrated circuits (IC).
  • IC integrated circuits
  • a focused ion beam is used to produce an image of the circuit. This image is then used in conjunction with circuit layout information to navigate the ion beam over the surface of the circuit to locate a specific element or feature of interest.
  • the beam current can be increased to cut into the circuit die and expose circuit features buried in layers.
  • the FIB system can then alter the exposed circuit by cutting conductive traces to break electrical connections or by depositing conductive material to provide new electrical connections.
  • This etching or deposition is caused by a physical or chemical reaction of the beam ions with the specimen and occurs at a rate that is largely dependent upon the constituent ions of the beam, the presence and type of etch enhancing or deposition precursor gases, and the beam current.
  • the beam dwell time is the duration of time the beam dwells in a specific location on the specimen.
  • the beam is typically controlled by digital electronics to scan across the specimen in a stepwise fashion from point to point, dwelling for a pre-determined time at each point.
  • the distance between the sample points at which the beam dwells is referred to as the pixel spacing or pitch.
  • a focused ion beam even at relatively low energy, will always cause some destructive etching of the specimen surface. Even an electron beam can alter the specimen, for example, through electron-beam induced chemical reactions that cause hydrocarbons residual in the vacuum chamber to stain the sample surface. Because a charged particle beam will invariably cause changes in the specimen surface, a long dwell time will alter the surface, thereby decreasing the accuracy of the surface characterization. Thus, careful control of the beam intensity and dwell time at each point in the scan is required.
  • the beam must be accurately focused and compensated for aberrations to provide a useful image of the specimen surface for visual or automated analysis.
  • a calibration specimen is prepared consisting of an etched region or region of deposited material to form a target of well-defined shape upon which to focus the beam.
  • the target shape will appear on a visual display in high contrast to the surrounding specimen surface.
  • the present invention provides for accurate calibration of a scanned beam system that overcomes limitations of the prior art.
  • a calibration specimen comprising an array of targets is sampled with a sample spacing that is greater than the spacing between the targets and an image is reconstructed from the samples.
  • the present invention enables achievement of very sharp beam focus and highly precise calibration without substantial degradation of the calibration specimen caused by closely spaced sampling. Slower scan speeds may be employed which provide an image of high contrast because of improved signal-to-noise ratio. Because the reconstructed image is composed of points spread at relatively large distances across the calibration specimen, beam aberrations and alignment errors are magnified and can be more readily corrected than when prior art calibration techniques are employed.
  • aliased image scanning technique of the present invention will magnify the effect of rotational misalignment of the calibration specimen with respect to the scan axes of the beam, enabling easier detection and correction of rotational misalignment. Also, conditions giving rise to a non-orthogonal relationship between the x-y axes of the image produced by the system are also magnified and can therefore be more easily detected and corrected. Further, beam stigmation effects are magnified for easier detection and correction.
  • the invention is particularly well suited for use with automatic focusing and other automatic beam adjustments because it is very clear when the proper focus and other compensations are achieved.
  • Figure 1 shows schematically a typical focused ion beam system used in a preferred embodiment of the invention.
  • Figure 2 shows a one-dimensional periodic spatial response function: a sine-squared function with a period, P, of 1 micro-meter ( ⁇ m).
  • Figure 3 shows a two-dimensional periodic spatial response function: a sine-squared function of x and y with a period, P, of 1 ⁇ m in each direction.
  • Figure 18 shows a plot of relative variation in apparent magnification versus a normalized error in target periodicity.
  • Figure 19 shows a one-dimensional periodic spatial response function: a sawtooth function with a period, P, of 1 ⁇ m.
  • Figure 20 shows a two-dimensional periodic spatial response function: a sawtooth function of x and y with a period, P, of 1 ⁇ m in each direction.
  • a calibration specimen that comprises an array of calibration targets.
  • the calibration specimen is sampled with a sample spacing that is greater than the spacing of the targets in the array.
  • a composite image is formed from these samples and displayed.
  • the calibration targets are preferably arranged into a two-dimensional array of targets with equally spaced rows and equally spaced columns.
  • the beam of the scanning beam system is scanned in a step-wise fashion to form a rectangular grid of sample points or pixels, one in each target.
  • the horizontal distance between sample points in a row of targets is slightly greater than the horizontal spacing of the targets in the row.
  • the sample taken from each target in a row is in a different horizontal position within the target than the horizontal position of the sample points within the other targets.
  • the vertical distance between each row of samples in a column of targets is slightly greater than the vertical spacing of the targets in the column.
  • the sample taken from each target in a column is in a different vertical position within the target than the vertical position of the sample points within the other targets.
  • the samples from each target are assembled to form an image of the target shape that is used to achieve calibration of the beam.
  • the beam may be scanned across each row successively or, alternatively, down each column successively.
  • Other sampling patterns and target patterns may be used, so long as the relative positions of each sample point and target location are defined so that an image of the shape may be formed from the samples.
  • Formation of the reconstructed image shape may be performed continually by repeatedly sampling the array of targets and displaying the sample points obtained by each complete scan of the specimen. This allows the operator to calibrate the system while visually monitoring the effect of his or her adjustments. Since the samples taken during a complete scan of the calibration specimen according to the methods of the present invention are widely spaced - much greater than the beam spot size - the cumulative particle dose at any point on the sample is greatly reduced, with a consequent reduction in specimen surface damage. Moreover, with suitable processing, the positions of each sample within each target can be different for each different complete scan of the calibration specimen so that the same point within a target is not sampled more than once in any set of complete scans of the array.
  • the present invention will be discussed in the context of use in a focused ion beam system for demonstrative purposes. However, it will be understood that the methods of the present invention may also be employed in other scanned systems, such as electron beam systems including scanning electron microscopes and scanning transmission electron microscopes, and scanning probe microscopes, such as scanning tunneling microscopes and atomic force microscopes.
  • electron beam systems including scanning electron microscopes and scanning transmission electron microscopes, and scanning probe microscopes, such as scanning tunneling microscopes and atomic force microscopes.
  • a focused ion beam system 8 includes an evacuated envelope 10 having an upper neck portion 12 within which are located a liquid metal ion source 14 and a focusing column 16 including extractor electrodes and an electrostatic optical system.
  • Ion beam 18 passes from source 14 through column 16 and between electrostatic deflection mechanism schematically indicated at 20 toward specimen 22, which comprises, for example, a semiconductor device positioned on movable X-Y stage 24 within lower chamber 26.
  • An ion pump 28 is employed for evacuating neck portion 12.
  • the chamber 26 is evacuated with turbo-molecular and mechanical pumping system 30 under the control of vacuum controller 32.
  • the vacuum system provides within chamber 26 a vacuum of between approximately 1x10 -7 Torr and 5x10 -4 Torr. If an etch-assisting or an etch-retarding gas is used, the chamber background pressure is typically about 1x10 -5 Torr.
  • High voltage power supply 34 is connected to liquid metal ion source 14 as well as to appropriate electrodes in focusing column 16 for forming an approximately 1 keV to 60 keV ion beam 18 and directing the same downwardly.
  • Deflection controller and amplifier 36 operated in accordance with a prescribed pattern provided by pattern generator 38, is coupled to deflection plates 20 whereby beam 18 may be controlled to trace out a corresponding pattern on the upper surface of specimen 22.
  • the deflection plates are placed before the final lens, as is well known in the art.
  • the source 14 typically provides a metal ion beam of gallium, although other ion sources, such as a multi-cusp or other plasma ion source, can be used.
  • the source typically is capable of being focused into a sub-one-tenth micron wide beam at specimen 22 for either modifying the surface 22 by ion milling, enhanced etch, material deposition, or for the purpose of imaging the surface 22.
  • a charged particle multiplier 40 used for detecting secondary ion or electron emission for imaging is connected to video circuit and amplifier 42, the latter supplying drive for video monitor 44 also receiving deflection signals from controller 36.
  • the location of charged particle multiplier 40 within chamber 26 can vary in different embodiments.
  • a preferred charged particle multiplier 40 can be coaxial with the ion beam and include a hole for allowing the ion beam to pass.
  • a scanning electron microscope 41, along with its power supply and controls 45, are optionally provided with the FIB system 8.
  • a fluid delivery system 46 optionally extends into lower chamber 26 for introducing and directing a gaseous vapor toward sample 22.
  • a door 60 is opened for inserting specimen 22 on stage 24 which may be heated or cooled, and also for servicing the reservoir 50.
  • the door is interlocked so that it cannot be opened if the system is under vacuum.
  • the high voltage power supply provides an appropriate acceleration voltage to electrodes in ion beam column 16 for energizing and focusing ion beam 18.
  • material is sputtered, that is physically ejected, from the sample.
  • Focused ion beam systems are commercially available, for example, from FEI Company, Hillsboro, Oregon, the assignee of the present application.
  • Signals applied to deflection controller and amplifier 36 cause the focused ion beam to move within a target area to be imaged or milled according to a pattern controlled by pattern generator 38.
  • the beam converges in the plane of the specimen in a circle.
  • the beam may converge before or after the sample plane causing the image to be unfocussed.
  • the beam may exhibit stigmatic effects.
  • the beam may be more elliptical than circular.
  • the scan gain may be different in each of the orthogonal scan directions so that in one direction the image appears "stretched".
  • the scanned beam system must therefore be calibrated to eliminate or at least minimize these errors.
  • a scanned beam system will provide control elements to achieve calibration. For example, an electrostatic lens system is provided to cause the beam to converge at the correct focal point and a stigmator is provided to adjust for stigmation effects.
  • a calibration specimen that contains a well defined target or pattern formed of etched or deposited regions of the specimen to create an image of high visual contrast to the surrounding specimen surface.
  • a typical calibration specimen may comprise a sequence of parallel lines etched into the specimen.
  • the present invention provides for sampling a specimen containing an array of targets etched or deposited thereon with spacing between samples that is greater than the spacing between targets in the array.
  • the targets are preferably of substantially identical shape and size and are equally spaced in each of the two orthogonal axes in the plane of the specimen.
  • the spacing between each target is P x
  • the target spacing is P y .
  • the spacing between sample points in the x-direction is greater than the target spacing in the x-direction.
  • the x-directed spacing between samples is nP x + dx where n is an integer and dx ⁇ P x .
  • the spacing between sample points in the y-direction is greater than the target spacing in the y-direction.
  • the y-directed spacing between samples is mP y + dy where m is an integer and dy ⁇ P y .
  • each target is sampled at a different point there within.
  • These samples are then assembled to construct an image of the specimen. Because the sample points are widely spaced apart a finely detailed image can be formed without the rapid degradation of the specimen associated with dense sampling of the specimen. Thus, the calibration specimen will remain stable for a much greater period of time. Moreover, longer dwell times and slower scans can be employed without degrading the specimen, resulting in a high signal-to-noise ratio. This in turn results in an image of high contrast with respect to the background. Further, because the sample points forming the image are distributed over a much larger field of view, an image that is a more sensitive function of beam focus, stigmation, and alignment is obtained, thus enabling the operator to achieve a very fine calibration of the system.
  • the method of the present invention can be better understood by modeling the one-dimensional spatial response of a specimen of an array of targets to a scanned beam microscope as a periodic function, f , of period P .
  • f might describe a relative secondary-electron emission intensity signal at each sample point of the specimen in response to the beam.
  • f might be proportional to the relative reflectivity of the specimen at each sample point.
  • the scanned beam will sample the specimen with a sample pitch, ds , that is small compared to the target periodicity, P , to provide a fine image of the targets in the specimen.
  • ds P / Q, where Q is the number of samples per period.
  • the beam samples the specimen with a finite number of samples, N , where in a typical system N is 256,512, or 1024.
  • P 1 ⁇ m
  • the N samples taken of the specimen are mapped to an identical number of pixels in the display of video monitor 44.
  • a gray scale is used to show the intensity of the signal received at each sample point.
  • the graph of intensity appears as in Figure 4 .
  • the corresponding 2-dimensional image is shown in Figure 5 with equal pitch, ds, and period, P , in both the x and y directions.
  • M A is the same as the magnification obtained from the conventional method. This is explained as follows. In aliased image scanning, each successive sample along the scanning axis lands one incremental distance, ds, further relative to the beginning of each period.
  • P A P E + ⁇ P .
  • P E 1 ⁇ m
  • ⁇ P P E /100.
  • P A 1.01 ⁇ m.
  • the increased sensitivity to the difference between the actual periodicity of the specimen and the expected periodicity used to pick ds ' facilitates the use of the technique for highly accurate beam calibration. Since the change in the apparent magnification is so pronounced, it can be measured, and the value of ⁇ P can be derived there from.
  • Q P A ds - ⁇ ⁇ P
  • the length, L A of one reconstructed period on the display is Qdp, where dp is the display pitch, assumed in the example given above to be 300 ⁇ m.
  • the difference between actual and expected periodicity, ⁇ P can be determined by counting the number of reconstructed periods displayed.
  • P A the actual periodicity of the target function
  • P E the expected periodicity
  • ⁇ P P A -P E
  • N P N S N A ⁇ ⁇ P
  • the method of aliased image scanning can also be advantageously employed to detect rotational misalignment between the axes of the periodic specimen pattern and the axes of the scan field.
  • the expected numerical value of ⁇ ' for the present example is 5.5 degrees, which corresponds well with the rotation observed in Figure 31 .
  • the present invention can also be advantageously employed to detect and correct for non-orthogonal conditions arising from non-orthogonality of the target pattern of the specimen, or non-orthogonality of the scan beam, or both.
  • a small non-orthogonal condition is observable upon close examination of the image. The difficulty of observation of this error makes compensation for orthogonal conditions difficult.
  • the present invention may also be advantageously employed to detect and correct for anisotropic conditions arising from differences in scale factors in the x and y directions, whether arising from the condition of the specimen or lack of correct beam calibration.
  • ⁇ a relative stretch of the x-axis by a factor, ⁇
  • the pronounced effect obtained by aliased image scanning enables detection and correction of even very small anisotropic conditions.
  • the method of aliased image scanning may be employed to achieve very fine calibration because of error magnification, enabling the operator to calibrate for changes in working height, irregularities in scan gain, non-orthogonal conditions, rotational misalignment, beam focus eccentricities and other aberrant conditions.
  • the methods of the present invention are well suited for scanned beam system calibration.
  • the sampling pitch must be very small compared to the target features to be resolved. This restriction is removed without loss of resolution in aliased image scanning where a sample pitch greater than the periodicity of the targets in an array is used. The resulting increase between successive beam positions minimizes the area dose per image scan. This leads to reduced target damage, allowing for longer dwell times, an increase in the number of acquisition frames, and higher beam currents.
  • aliased image scanning increases the observability of misalignment, scaling, and rotation errors, which allows for calibration of the scanned beam system with much higher precision.
  • the large magnification of errors achieved by the present invention also makes the aliased image scanning techniques particularly suitable for automated calibration of the system operating under the direction of software.
  • sampling points and targets shown in the figures is but one embodiment for implementing the present invention.
  • Other sampling patterns and target patterns may be used, so long as the relative positions of each sample point and target location are defined so that an image of the shape may be constructed from points on each of the target samples. Formation of the image shape may be performed continually by repeatedly sampling the array of targets and displaying the samples obtained by each complete scan of the specimen. This allows the operator to make adjustments while visualizing the effect of his or her adjustments. Since the samples taken during a complete scan of the calibration specimen according to the methods of the present invention are widely spaced, the large particle dosages that are destructive of the surface to be imaged does not occur.
  • the positions of each sample within each target can be different for each different complete scan of the calibration specimen so that the same point within a target is not sampled more than once in any set of complete scans of the array.
  • the targets are preferably of substantially identical size and shape this is not especially critical for large arrays of small targets.
  • an aliased image calibration specimen comprising an array of targets for calibration of a scanned beam system as described above may be etched or deposited on a wafer during the process of etching or deposition of integrated circuitry structure on the wafer. In this way, a calibration specimen is automatically provided with each wafer submitted for subsequent scanned beam processing. This allows for focusing and calibration without loading a separate calibration specimen and then replacing it with the wafer to be deposited or etched.
  • the methods of the present invention described above assist the operator of a scanned beam system to achieve highly accurate beam focus, stigmation correction and rotational alignment. Further, the methods may be employed to increase the accuracy and reliability of algorithms designed to achieve automated beam focus, automated stigmation correction and automated rotational alignment, and other aberrant effects.

Claims (30)

  1. Verfahren zur Kalibrierung eines Rasterstrahlsystems mit den Schritten:
    Abtasten einer Kalibrierprobe mit einem Rasterstrahlsystem, wobei die Probe ein Array von Targets mit einem Abstand zwischen Abtastungen aufweist, der größer als ein Abstand zwischen Targets im Array ist, wobei das Abtasten aufweist: Scannen mit einem Strahl des Rasterstrahlsystems, um ein Muster von Abtastungen zu bilden, wobei jede Abtastung einem Target im Array von Targets entspricht;
    Zusammenführen der Abtastungen von jedem abgetasteten Target, um ein Bild des Arrays von Targets zu erzeugen; und
    Erhalten von Kalibrierinformationen von den zusammengeführten Abtastungen über die Kalibrierung des Rasterstrahlsystems.
  2. Verfahren nach Anspruch 1, wobei der Schritt des Erhaltens von Informationen von den Abtastungen ferner den Schritt des Bestimmens eines Ausmaßes aufweist, in dem ein Brennpunkt eines Strahls von einem erwarteten Punkt abweicht.
  3. Verfahren nach Anspruch 1, wobei der Schritt des Erhaltens von Informationen von den Abtastungen ferner den Schritt des Bestimmens eines Ausmaßes aufweist, in dem eine Position der Probe von einer erwarteten Position abweicht.
  4. Verfahren nach Anspruch 1, wobei der Schritt des Erhaltens von Informationen von den Abtastungen ferner den Schritt des Bestimmens eines Ausmaßes aufweist, in dem eine Targetperiodizität von einer erwarteten Targetperiodizität abweicht.
  5. Verfahren nach Anspruch 1, wobei der Schritt des Erhaltens von Informationen von den Abtastungen ferner den Schritt des Bestimmens eines Ausmaßes von fehlerhafter Rotationsjustierung der Probe aufweist.
  6. Verfahren nach Anspruch 1, wobei der Schritt des Erhaltens von Informationen von den Abtastungen ferner den Schritt des Bestimmens eines Ausmaßes von fehlerhafter Rotationsjustierung von Ablenkachsen des Strahls aufweist.
  7. Verfahren nach Anspruch 1, wobei der Schritt des Erhaltens von Informationen von den Abtastungen ferner den Schritt des Bestimmens einer Periodizität der Targets aufweist.
  8. Verfahren nach Anspruch 1, wobei der Schritt des Erhaltens von Informationen von den Abtastungen ferner den Schritt des Bestimmens eines Ausmaßes von Strahlnichtorthogonalität aufweist.
  9. Verfahren nach Anspruch 1, wobei der Schritt des Erhaltens von Informationen von den Abtastungen ferner den Schritt des Bestimmens eines Ausmaßes von Nichtorthogonalität eines Musters der Targets aufweist.
  10. Verfahren nach Anspruch 1, wobei der Schritt des Erhaltens von Informationen von den Abtastungen ferner den Schritt des Bestimmens eines Ausmaßes von Strahlanisotropie aufweist.
  11. Verfahren nach Anspruch 1, wobei der Schritt des Erhaltens von Informationen von den Abtastungen ferner den Schritt des Bestimmens eines Ausmaßes von Anisotropie eines Musters der Targets aufweist.
  12. Verfahren nach Anspruch 1, wobei das Array von Targets ein rechteckiges Array ist.
  13. Verfahren nach Anspruch 1, wobei der Abstand zwischen Abtastungen entlang einer Dimension des Arrays gleichmäßig ist.
  14. Verfahren nach Anspruch 1, wobei der Schritt des Erhaltens von Informationen von den Abtastungen ferner den Schritt des Beobachtens eines von den Abtastungen erzeugten Bilds aufweist.
  15. Verfahren nach Anspruch 1, wobei der Abstand zwischen Abtastungen iterativ eingestellt wird, um Informationen über die Kalibrierung des Systems zu erhalten.
  16. Verfahren nach Anspruch 1, wobei die Probe ferner einen integrierten Schaltungsaufbau aufweist.
  17. Verfahren nach Anspruch 1, ferner mit dem Schritt des Verwendens von Informationen über die Kalibrierung des Systems, um ein automatisiertes Strahlkalibriersystem zu bewerten.
  18. Rasterstrahlkalibriersystem, das aufweist:
    eine Kalibrierprobe für ein Rasterstrahlsystem, wobei die Probe ein Array von Targets aufweist;
    ein Strahlablenkteilsystem, das geeignet ist, die Probe mit einem Abstand zwischen Abtastungen abzutasten, der größer als ein Abstand zwischen Targets im Array ist,
    wobei das Abtasten aufweist: Scannen mit einem Strahl des Rasterstrahlsystems, um ein Muster von Abtastungen zu bilden, wobei jede Abtastung einem Target im Array von Targets entspricht; und
    ein Teilsystem, das geeignet ist:
    die Abtastungen von jedem abgetasteten Target zusammenzuführen, um ein Bild des Arrays von Targets zu erzeugen; und
    von den zusammengeführten Abtastungen abgeleitete Kalibrierinformationen über die Kalibrierung des Rasterstrahlsystems bereitzustellen.
  19. System nach Anspruch 18, wobei das zum Bereitstellen von Informationen von den Abtastungen geeignete Teilsystem eine Abbildungsvorrichtung aufweist, die geeignet ist, ein Bild von den Abtastungen zu erzeugen.
  20. System nach Anspruch 18, wobei das zum Bereitstellen von Informationen von den Abtastungen geeignete Teilsystem einen Verarbeitungsschaltungsaufbau aufweist, der so beschaffen ist, dass er von den Abtastungen erhaltene Daten verarbeitet.
  21. System nach Anspruch 18, wobei das zum Bereitstellen von Informationen von den Abtastungen geeignete Teilsystem einen Verfahrensablauf zum Bestimmen eines Ausmaßes aufweist, in dem ein Brennpunkt eines Strahls von einem erwarteten Punkt abweicht.
  22. System nach Anspruch 18, wobei das zum Bereitstellen von Informationen von den Abtastungen geeignete Teilsystem einen Verfahrensablauf zum Bestimmen eines Ausmaßes aufweist, in dem eine Targetperiodizität von einer erwarteten Targetperiodizität abweicht.
  23. System nach Anspruch 18, wobei das zum Bereitstellen von Informationen von den Abtastungen geeignete Teilsystem einen Verfahrensablauf zum Bestimmen eines Ausmaßes aufweist, in dem eine Position der Probe von einer erwarteten Position abweicht.
  24. System nach Anspruch 18, wobei das zum Bereitstellen von Informationen von den Abtastungen geeignete Teilsystem einen Verfahrensablauf zum Bestimmen eines Ausmaßes von fehlerhafter Rotationsjustierung der Probe im Hinblick auf Ablenkachsen des Strahls aufweist.
  25. System nach Anspruch 18, wobei das zum Bereitstellen von Informationen von den Abtastungen geeignete Teilsystem einen Verfahrensablauf zum Bestimmen aufweist, wobei der Schritt des Erhaltens von Informationen von den Abtastungen ferner den Schritt des Bestimmens eines Ausmaßes von Strahlnichtorthogonalität aufweist.
  26. System nach Anspruch 18, wobei das zum Bereitstellen von Informationen von den Abtastungen geeignete Teilsystem einen Verfahrensablauf zum Bestimmen eines Ausmaßes von Nichtorthogonalität eines Musters der Targets aufweist.
  27. System nach Anspruch 18, wobei das zum Bereitstellen von Informationen von den Abtastungen geeignete Teilsystem einen Verfahrensablauf zum Bestimmen eines Ausmaßes von Strahlanisotropie aufweist.
  28. System nach Anspruch 18, wobei das zum Bereitstellen von Informationen von den Abtastungen geeignete Teilsystem einen Verfahrensablauf zum Bestimmen eines Ausmaßes von Anisotropie eines Musters der Targets aufweist.
  29. System nach Anspruch 18, wobei der Abstand zwischen Abtastungen iterativ eingestellt wird, um eine Verfeinerung der Kalibrierung des Systems zu erreichen.
  30. System nach Anspruch 18, wobei das System gemäß einem Algorithmus automatisiert ist, der geeignet ist, die Kalibrierung des Systems zu erreichen.
EP02749692A 2001-01-26 2002-06-28 Verfahren und vorrichtung zur scan-instrumentenkalibration Expired - Fee Related EP1428006B1 (de)

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US26447201P 2001-01-26 2001-01-26
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US264472P 2001-06-29
US186206 2002-06-27
US10/186,206 US6770867B2 (en) 2001-06-29 2002-06-27 Method and apparatus for scanned instrument calibration
PCT/US2002/020498 WO2003005396A2 (en) 2001-01-26 2002-06-28 Method and apparatus for scanned instrument calibration

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AU2002320188A8 (en) 2003-01-21
WO2003005396A8 (en) 2004-10-21
EP1428006A4 (de) 2009-09-02
WO2003005396A9 (en) 2004-06-17
AU2002320188A1 (en) 2003-01-21
EP1428006A2 (de) 2004-06-16
WO2003005396A2 (en) 2003-01-16

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