EP1402228A1 - Interferometersystem, verfahren zum aufnehmen eines interferogramms und verfahren zum bereitstellen und herstellen eines objekts mit einer soll-oberfläche - Google Patents
Interferometersystem, verfahren zum aufnehmen eines interferogramms und verfahren zum bereitstellen und herstellen eines objekts mit einer soll-oberflächeInfo
- Publication number
- EP1402228A1 EP1402228A1 EP02735425A EP02735425A EP1402228A1 EP 1402228 A1 EP1402228 A1 EP 1402228A1 EP 02735425 A EP02735425 A EP 02735425A EP 02735425 A EP02735425 A EP 02735425A EP 1402228 A1 EP1402228 A1 EP 1402228A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- radiation
- interference
- interferogram
- frequency
- detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
- G01B9/02004—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using frequency scans
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
- G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
- G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02059—Reducing effect of parasitic reflections, e.g. cyclic errors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02062—Active error reduction, i.e. varying with time
- G01B9/02067—Active error reduction, i.e. varying with time by electronic control systems, i.e. using feedback acting on optics or light
- G01B9/02069—Synchronization of light source or manipulator and detector
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
- G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
Definitions
- Interferometer system method for recording an interferogram and method for providing and producing an object with a target surface
- the present invention relates to an interferometer system and a method for recording an interferogram.
- the interferometer system and the method are preferably used to determine topological properties of an object surface from the interferogram by evaluating the recorded interferogram.
- the invention further relates to a method for providing and producing an object with a target surface, deviations between the target surface and an actual surface of the object being determined from an interferogram and the object being made available or reworked depending on these deviations.
- Interferometer systems are traditionally used, among other things, to determine the topological properties of an object surface.
- a known reference surface and an object surface to be measured are illuminated with coherent radiation, and an object wave field reflected by the object surface and a reference wave field reflected by the reference surface are, for example, superimposed on a screen, so that an interference pattern arises there.
- a difference in the optical path from reference surface to screen and object surface to screen can be determined from the interference pattern, from which topological differences between the object surface and the reference surface can then be determined.
- Two techniques are used to determine such path differences with an interferometer system:
- FPI fringe pattern interferometry
- R.A. Jones and P.L. Kadakia "An Automated Interferogram Technique", Applied Optics, Vol. 7, pp. 1477-1482 (1968); Zanoni, U.S. Patent No. 4,159,522. June 26, 1979, and Zanoni, U.S. Patent No. 4,169,980, published October 2, 1979.
- phase measuring interferometry where the phase difference between the two wavefronts for each pixel of a detector is calculated from several interference patterns, the multiple interference patterns being recorded by generating different phase differences in them.
- PMI phase measuring interferometry
- B (0) to B (3) are the intensities of the individual images at the corresponding pixel.
- This known method for determining path differences is less suitable if there is a further surface in the interferometer system which also reflects a wave field which interferes with the wave fields reflected by the reference surface and the object surface.
- the resulting interference pattern is then of a particularly complex nature. This case occurs, for example, when a surface of a transparent plate with two essentially plane-parallel surfaces is to be measured.
- the invention is based on an interferometer system which comprises a reference surface, an object surface, a radiation source for illuminating the reference surface and the object surface with radiation of an adjustable frequency and a spatially resolving radiation detector.
- the radiation source, the reference surface, the object surface and the detector are arranged in such a way that a reference wave field reflected by the reference surface overlaps with an object wave field reflected by the object surface to form an interference pattern with location-dependent intensity distribution, which is imaged on the detector.
- the interference pattern formed by superimposing the reference wave field and the object wave field is disturbed by an interference wave field also superimposed with these wave fields, which is reflected by an interference interference area which is illuminated by the radiation source together with the reference area or the object area.
- the invention is characterized by an integrator in order to average a plurality of interference patterns, which are recorded at different frequencies of the radiation emitted by the radiation source.
- the generated interferogram is created in such a way that for each location of the interferogram an average is formed from the intensities of the individual interference patterns at this location.
- the averaging is preferably a weighted averaging.
- Values of the weights for the weighted averaging and / or values of the different radiation frequencies are preferably set as a function of the distance of the interference interference surface from the object surface or from the reference surface. These values are preferably set in such a way that an influence of the interference wave front on the interferogram is largely averaged out. It then has the middle
- the interferogram formed from a plurality of interference patterns has a shape or intensity distribution which roughly corresponds to how the wave fronts of the wave fronts reflected by the object surface and the reference surface would produce alone if the interference interference surface were not present in the interferometer system.
- the plurality of frequencies for generating the plurality of interference patterns are set in succession over a period of time that corresponds to an exposure time interval of a camera that records the interference patterns. This results in a particularly simple design of the integrator, since it is formed by the camera itself.
- FIG. 1 shows an embodiment of an interferometer system according to the invention
- FIG. 2 shows a diagram for explaining different frequencies of radiation emitted by a radiation source in FIG. 1 to generate interference patterns
- FIG. 3 shows a time dependency of the radiation emitted by the radiation source in FIG. 1, 4 shows a diagram which gives an interferogram intensity as a function of an optical path difference for an interference pattern generated by the interferometer system of FIG. 1 when the frequencies are set according to FIGS. 2 and 3,
- FIG. 5 shows an interferogram modulation as a function of an optical path difference in the interferometer system of FIG. 1, as results from a further time-dependent setting of the frequencies of the radiation source,
- FIG. 6 shows a frequency distribution corresponding to FIG. 2 of the radiation emitted by the radiation source
- FIG. 7 shows a representation of the interferogram intensity corresponding to FIG. 4 as a function of the optical path length difference when using the frequency distribution shown in FIG. 6,
- FIG. 8 shows a partial view of a further embodiment of the interferometer system according to the invention.
- FIG. 9 shows a partial view of yet another embodiment of the interferometer system according to the invention.
- FIG. 1 shows a Fizeau interferometer system 1 for measuring a surface 5 of a plane-parallel plate 3.
- the plate 3 is held in a holder 4, which can be displaced relative to a reference surface 23 via a motor drive 6.
- the interferometer system 1 comprises a light source 9 which emits a beam 11 of coherent light with adjustable wave length or frequency emitted.
- the light source 9 is a so-called ECDL source, a diode laser with an adjustable external cavity ("External Cavity Diode Laser").
- Such an ECDL radiation source is described, for example, in the article "Widely Tunable External Cavity Diode Lasers” by Tim Day, Michael Brownell and I-Fan Wu. Corresponding sources can be obtained from New Focus, Inc., 1275 Reamwood Avenue, Sunnyvale, CA 94089, USA.
- the beam 11 emitted by the source 9 is focused by a lens 13 onto a rotating screen or diffuser 15 to suppress spatial coherence of the radiation.
- the lens 15 rotates about an axis of rotation, not shown in Figure 1.
- the beam 11 'extending through it passes through a semitransparent mirror 17 and is then parallelized after sufficient processing by a collimator 19, which can comprise one or more lenses.
- the then parallelized beam 11 "passes through a glass plate 21, the surface 23 facing away from the collimator 19 forms the reference surface for measuring the surface 5 of the plane-parallel plate 3.
- the reference surface 23 is made as flat as possible.
- a surface 25 of the collimator 19 Plate 21 extends at an angle to the reference surface 23 so that radiation reflected by this surface 25 is not reflected back into itself and contributes to interference.
- Radiation reflected back from the reference surface 23 is collimated again by the collimator 19, strikes the semitransparent mirror 17 and is imaged by this after passing through an aperture 27 and an eyepiece 29 onto a radiation-sensitive layer 31 of a CCD camera 33.
- One passing through the reference surface 23 Part of the beam 11 strikes the surface 5 of the plane-parallel plate 3 to be measured.
- the surface 5 to be measured is oriented as orthogonally as possible to the direction of the parallel beam 11 ′′.
- a part of the radiation striking the surface 5 to be measured is in turn reflected back, passes through the plate 21 again, is likewise focused by the collimator 19 and is imaged on the radiation-sensitive surface 31.
- the radiation-sensitive layer 31 of the camera 33 thus forms a screen on which the radiation reflected by the reference surface 23 and the surface 5 to be measured are measured reflected radiation interferes.
- One purpose of the interferometer arrangement 1 is to detect the interference pattern generated by the interfering superposition of the radiation reflected by the reference surface 23 and the radiation reflected by the surface 5 to be measured.
- the plate 3 is, however, a plane-parallel plate, that is to say the surface 5 of the plate 3 to be measured and one other rear surface 7 of the plate 3 opposite it extend essentially parallel to one another.
- part of the radiation 11, which passes through the area 5 to be measured, is likewise thrown back into itself by the rear surface 7 of the plate 3 and is imaged on the radiation-sensitive layer 31.
- the radiation reflected by the reference surface 23 interferes with the radiation reflected by the surface 5 to be measured, whereby there is an optical path length difference 2-C Q between them
- the radiation interferes with the radiation-sensitive layer 31 radiation reflected from the reference surface 23 with the radiation from the back surface.
- 7 of the plane-parallel plate 3 reflects radiation, with an optical path length difference 2-C2 therebetween, and there further interferes with the radiation reflected from the surface 5 of the plate 3 to be measured with the radiation reflected from its rear surface 7, with an optical path length difference in between of 2-C ] _.
- the interference pattern which arises on the radiation-sensitive layer 31 is thus very complicated and difficult to evaluate.
- the camera 33 supplies the data, which represent a radiation intensity distribution on the radiation-sensitive surface 31, to a computer 37 via a data line 35.
- the computer 37 in turn generates a representation of the interference pattern on the radiation-sensitive layer 31 on a display device 39, in which FIG 1, an interference pattern with a plurality of symbolic strips 40 is only indicated schematically.
- the computer 37 also stores the data and also carries out an evaluation of the interference pattern in order to determine from this level differences between the reference surface 23 and the surface 5 to be measured or the topology of the surface 5 to be measured.
- the interferometer system 1 further comprises a controller 41, which is supplied and released by the computer 37 with a control line 43 with frequency data and which then, on the one hand, sets the frequency of the radiation 11 to be emitted by the source 9 as a function of time Trigger signal 48 received by the camera 33, which is also fed to the computer 37 via a line 47.
- a controller 41 which is supplied and released by the computer 37 with a control line 43 with frequency data and which then, on the one hand, sets the frequency of the radiation 11 to be emitted by the source 9 as a function of time Trigger signal 48 received by the camera 33, which is also fed to the computer 37 via a line 47.
- a method for operating the interferometer system 1 is described below, with a thickness of 74 mm being assumed for the plate 3, so that taking into account the refractive index of the glass of the plate 3 gives an optical path difference 2- ⁇ _ of 214.39mm.
- the controller 41 first sets the frequency of the radiation source 9 to a first frequency with a value f- ⁇ f via line 45 and starts the integration of the CCD camera 33 via line 47, so that the interference pattern, which is caused by the three Surfaces 23, 5 and 7 of reflected wave fronts are generated when illuminated with radiation of frequency f- ⁇ f, onto which radiation-sensitive surface 31 of camera 33 falls and the corresponding radiation intensity is integrated there.
- the controller 41 sets the source 9 to a second higher frequency f, so that the interference pattern generated at this frequency falls on the radiation-sensitive layer 31 and the corresponding radiation intensities as a second interference pattern during the integration time of the camera 33 there to be integrated to the intensities of the first interference pattern.
- the controller 41 sets the frequency of the radiation source 9 to an even higher third
- Frequency with the value f + ⁇ f so that the interference pattern generated at this third frequency also falls on the light collecting surface 31 within the integration time of the camera and the intensities of the third interference pattern are added to the intensities of the first and second interference patterns.
- the illumination with the third frequency f + ⁇ f lasts 3.75 seconds, ' and then the controller 41, via line 47, causes the integration time of the camera 33 to end, and the data which has fallen on the light collecting surface 31 during the integration time Represent light intensity depending on the location, are read out via line 35 to computer 37.
- the integration time of the I5msec camera described above was selected in the exemplary embodiment in order to obtain a good quality image at the given laser power. Depending on the available laser energy and other boundary conditions, other integration times can also be set.
- FIG. 2 shows the spectral power density in arbitrary units as a function of the wave number k of the radiation from the source 9. It can be seen that the three different frequencies are illuminated with the relative weights 0.5, 1 and 0.5.
- This spectral power density distribution can be represented as a formula as follows:
- ⁇ o 632.8nm was chosen.
- the radiation source 9 can be set to this value of the wavelength, and this setting has the advantage that, apart from the radiation source, a structure and components can be selected for the interferometer system as are known from interferometers operated with conventional He-Ne lasers.
- the interferogram is the Fourier transform of the spectral power density
- the interferometer system 1 can be operated advantageously if the reflecting surfaces 23, 5, 7 are arranged relative to one another in such a way that the optical path difference 2-C] _ generated by the distance between the surface 5 to be measured and the rear surface 7 approximately coincides with the first minimum of the modulation, which is due to the distance between the reference surface 23 and the rear surface 7 of the Plate 3 generated path length difference 2-C2 coincides approximately with the second minimum of the modulation and the path length difference C Q generated by the distance between reference surface 23 and surface 5 to be measured coincides approximately with the second maximum of the modulation.
- the frequency change ⁇ f or wavenumber change ⁇ k is first determined as follows:
- the back surface 7 of the reference surface 23 then automatically results in the optical path length difference 2-C Q SO that it coincides approximately with the second maximum of the modulation according to FIG. 4.
- the interference caused by the rear surface 7 of the plate 3 is thus effectively averaged out by the weighted averaging carried out during the integration time of the camera 33, so that the interferogram obtained by averaging, apart from a constant light component, has only a stripe pattern, as is the case with the interference only the wavefront reflected by the reference surface 23 would arise with the wavefront reflected by the surface 5 to be measured.
- This comparatively simple and undisturbed interference pattern is then subjected to a known evaluation method for stripe patterns, to determine the topology of the area 5 to be measured.
- the operation of the interferometer system 1 is not limited to driving the frequency of the radiation source 9 with the time scheme shown in FIG. 3. As a variant, the possibility is discussed below of changing the frequency of the radiation source 9 with a sinusoidal time dependency.
- the interferogram intensity I let us first assume:
- k is the wave number of the radiation, which can be assumed to be approximately constant in this formula, x the optical path length difference, ⁇ Q an interferogram phase and V an interference contrast
- the interferogram phase then results from the sinusoidal change in frequency
- I (x, t) J 0 ⁇ 1 + V • cos ⁇ k • x - ⁇ Q -A • sin cot)
- the modulation period for the frequency change of the radiation is now set such that an integral multiple thereof corresponds to the integration time of the camera 33.
- the time-averaged interferogram is thus calculated
- J Q (A) is the 0 th order function of the phase modulation amplitude A. This function is shown in Figure 5.
- phase modulation amplitudes A for which interference between the wave fronts reflected by the surface 5 to be measured and the rear surface 7 of the plate 3 disappear.
- the ratio of the optical path differences is thus given by the first two zeros of the Bessel function J 0 (A):
- Equation (10) This contrast is sufficient to determine the position of the strips 40 and to be able to infer the topology of the area 5 to be measured from the evaluation of the strip pattern.
- the setting of the radiation frequency according to the scheme shown in FIG. 3 leads to a higher effective contrast.
- the case in which the radiation source 9 is controlled such that it has a Gaussian spectral power density shown in FIG. 6 will now be explained by way of example
- the interferogram intensity depends on the path length difference, as shown in FIG. 7. It can be seen from this that high interference contrasts can be achieved at short distances from the reference surface 23, while the contrast drops sharply at larger distances from the reference surface 23. This drop in contrast is so great that when the plate 3 is arranged close to the reference surface 23, interferences caused by the rear side 7 are averaged out and only interferences caused by the surface 5 to be measured contribute to the stripe pattern of the averaged interferogram.
- FIGS. 1 to 7 show a partial view of an interferometer system la, which is constructed similarly to the interferometer system shown in Figure 1. However, the interferometer system la is not used to measure a plane-parallel plate but a concentric meniscus lens 3a.
- an aplanar collimator 51 with a plurality of lenses 52 to 56 is provided, which focuses the parallel radiation 11 "a at a point 57, which at the same time is the center of curvature of surfaces 5a and 7a of the concentric ones Meniscus lens 3a.
- the interferometer system 1a otherwise corresponds to the interferometer system shown in FIG. 1 and is operated according to a method as was explained in connection with the interferometer system of FIG. 1.
- This means that the frequency of the radiation source is controlled as a function of time in such a way that interference which is caused by a surface that has not been measured, in particular the surface 7a, the concentric meniscus lens 3a or by other optically active components in the beam path, largely averages out over time.
- the areas 5a and 7a of the meniscus lens 3a can also be measured by reversing the lens, that is to say with its convex.
- Surface 7a facing collimator 51 and positioned in front of focus point 57 in the beam path.
- FIG. 9 shows a variant of the interferometer system shown in FIG. 8.
- a reference surface 23a is not provided on a separate reference plate but on a precisely manufactured surface of the lens 56b of an aplanar collimator 51 facing the test object.
- the interferometer system lb is also used to measure a concentric meniscus lens.
- other time dependencies can also be selected which have proven to be favorable. It is important here that interference effects, which are caused by surfaces that are not to be measured, are at least partially averaged out over time.
- the interferometer system has been previously described as a Fizeau interferometer. However, it is also possible to use alternative types of interferometers, such as a Michelson interferometer set-up or a Twyman Green interferometer set-up.
- the CCD camera was used as an integrator for weighted averaging of the interference patterns generated at different lighting frequencies.
- other camera types which have an integration time to which the sequence of the lighting frequencies set one after the other is coordinated.
- a pixel is understood to mean a resolution unit of the digitized interference image, which is given, among other things, by the camera system.
- the averaging in the computer can in this case also for group-pen of pixels, that is, with a resolution, 'the less be carried out as the camera resolution.
- a method for recording the interferogram is advantageously used in a method for providing of an object or in a method for producing an object with a predetermined target surface.
- the plane-parallel plate explained in connection with FIG. 1 is to be manufactured with high precision, it is placed in the beam path of the interferometer system and an interferogram is recorded using the method described above. From the interferogram, deviations of surface 5 from the planned target shape are determined. Postprocessing is planned from these deviations. In particular, these deviations are used to determine locations on the surface 5 where postprocessing, in particular by further material removal, is to take place. After the post-processing has been carried out, an interferogram may be recorded again and further post-processing may be carried out. If it emerges from the recorded interferogram that deviations between the shape of the surface 5 and the plan desired shape are less than a predetermined dimension, the plate is provided or delivered.
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Abstract
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Application Number | Priority Date | Filing Date | Title |
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DE10130902 | 2001-06-27 | ||
DE10130902A DE10130902A1 (de) | 2001-06-27 | 2001-06-27 | Interferometersystem, Verfahren zum Aufnehmen eines Interferogramms und Verfahren zum Bereitstellen und Herstellen eines Objekts mit einer Soll-Oberfläche |
PCT/EP2002/007080 WO2003002933A1 (de) | 2001-06-27 | 2002-06-26 | Interferometersystem, verfahren zum aufnehmen eines interferogramms und verfahren zum bereitstellen und herstellen eines objekts mit einer soll-oberfläche |
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EP02735425A Withdrawn EP1402228A1 (de) | 2001-06-27 | 2002-06-26 | Interferometersystem, verfahren zum aufnehmen eines interferogramms und verfahren zum bereitstellen und herstellen eines objekts mit einer soll-oberfläche |
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US (1) | US7002694B2 (de) |
EP (1) | EP1402228A1 (de) |
JP (1) | JP2004530905A (de) |
DE (1) | DE10130902A1 (de) |
WO (1) | WO2003002933A1 (de) |
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US7436520B1 (en) | 2005-01-18 | 2008-10-14 | Carl Zeiss Smt Ag | Method of calibrating an interferometer optics and of processing an optical element having an optical surface |
CN100552375C (zh) * | 2005-01-27 | 2009-10-21 | 4D技术公司 | 同时相移的斐索干涉仪 |
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JP5149486B2 (ja) * | 2005-05-18 | 2013-02-20 | 株式会社ミツトヨ | 干渉計、形状測定方法 |
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WO2017034670A1 (en) * | 2015-08-21 | 2017-03-02 | Artur Olszak | Time-multiplexed spectrally controlled interferometry |
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2001
- 2001-06-27 DE DE10130902A patent/DE10130902A1/de not_active Withdrawn
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2002
- 2002-06-26 JP JP2003508872A patent/JP2004530905A/ja active Pending
- 2002-06-26 EP EP02735425A patent/EP1402228A1/de not_active Withdrawn
- 2002-06-26 WO PCT/EP2002/007080 patent/WO2003002933A1/de active Application Filing
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2003
- 2003-12-24 US US10/743,792 patent/US7002694B2/en not_active Expired - Fee Related
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See references of WO03002933A1 * |
Also Published As
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US20040190002A1 (en) | 2004-09-30 |
JP2004530905A (ja) | 2004-10-07 |
DE10130902A1 (de) | 2003-01-16 |
WO2003002933A1 (de) | 2003-01-09 |
US7002694B2 (en) | 2006-02-21 |
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