EP1222677A2 - Electron impact ion source - Google Patents

Electron impact ion source

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Publication number
EP1222677A2
EP1222677A2 EP00982966A EP00982966A EP1222677A2 EP 1222677 A2 EP1222677 A2 EP 1222677A2 EP 00982966 A EP00982966 A EP 00982966A EP 00982966 A EP00982966 A EP 00982966A EP 1222677 A2 EP1222677 A2 EP 1222677A2
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EP
European Patent Office
Prior art keywords
electron
electron beam
ion source
vacuum
electron impact
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EP00982966A
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German (de)
French (fr)
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EP1222677B1 (en
Inventor
Günter ZSCHORNACK
Vladimir Petrovich Ovsyannikov
Frank Grossmann
Oleg Konstantinovich Koulthachev
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Technische Universitaet Dresden
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Technische Universitaet Dresden
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Definitions

  • the invention relates to an electron impact ion source according to the preamble of claim 1.
  • the electron impact ion source allows the generation of highly charged ions, their extraction, serves as a source of UV, NUN, infrared rays and of characteristic X-ray radiation of highly charged ions
  • the system consists of an electron gun, several cylindrical drift tubes, an electron collector, an extractor, a focusing magnet system and a system for generating ultra-high vacuum conditions in the system
  • the electron beam creates an ion trap in the central part of the system, which holds the ions in the radial direction due to their space charge forces.
  • the ions that are generated in the electron beam by electron impact ionization are generated by positive potentials at the ends of the drift tube structures according to ED Donets, USSR Inventors Certificate ⁇ o 248860, March 16, 1967, Bull OIPOTZ ⁇ o 23 (1969) 65
  • the uploaded ions obtained can be extracted from the ion trap along the trap axis by lowering the trap potential at the last drift tubes.
  • characteristic X-rays and other long-wave electromagnetic radiation emitted by the stored ions are in the meridian plane of the magnet system and perpendicular to it Radiated source axis
  • the maximum achievable ion charge is a function of the ionization factor j ⁇ , i.e. the product of the electron current density j and the ion residence time ⁇ in the electron beam.
  • the process that limits the achievement of the highest charge states is essentially the charge reversal processes of multiply charged ions on residual gas atoms.Therefore, devices based on the method described generate charged ions that Enable formation of a high-density electron beam under ultra high vacuum conditions
  • cryogenic technology in conjunction with superconducting technology is used in EBIT systems.
  • Superconducting Helmholtz coils with induction of the magnetic field from 3T to 5T are used here to focus the electron beam over the length of the ion trap, which in known systems does not exceed 25 mm
  • the current density of the electron beam over the trap length is 2,000-5,000 A / cm 2 with a total length of the electron-optical system (cathode - electron collector) of more than 30 cm K the function of a powerful cryopump in the area of the ion trap to create a vacuum of> 10 "11 to 10 " 12 Torr
  • cryogenic and ultra-high vacuum technology have an additional limiting effect
  • a decrease in the electron current density to 200 to 500 A cm 2 leads to an increase in the time required to generate a certain ion charge state in the trap and thus to a decrease in the mean beam intensity for extracted multi-charged
  • Magnetic fields of the strength 0.2 T to 0.5 T are required, which can be generated by permanent magnet systems based on modern magnetic materials
  • the original cathode of the klystron with a maximum emissivity of 2.5 A / cm 2 is used.
  • the ultra-high vacuum in the system is achieved after heating at 300 ° C using standard technology with the combination of a turbomolecular and an ion getter pump
  • This system has a low electron current density in the beam (100 times lower than for superconducting EBIT). This is associated with a limitation to comparatively low ionic charge states such as Ar 16+
  • the maximum current intensity in the electron beam focused by a longitudinal magnetic field for Brillouin focusing can be obtained if the magnetic field disappears at the location of the cathode in one
  • the so-called Brillouin density of the electron flow is limited by thermal velocity components of the electrons as they exit the cathode (see also M Szilagyi, Electron and Ion Optics, Plenum Press, New York and London, 1988) and by aberrations in the anode lens for the aberrations is possible in the case of paraxial and laminar flows, ie for an electron gun with minimal divergence (compression) of the electron beam and thus for a maximally efficient cathode, ie for a cathode with maximum emission density
  • the object of the invention is to create an effective electron impact ion source (WEBIT) without any cryogenic components and without superconductivity technology for the receipt of charged ions, X-ray and VUV spectroscopy on these ions and the extraction of the charged ions from the trap for the purposes of various scientific , technological and technical applications
  • WEBIT electron impact ion source
  • the object is achieved in connection with the features mentioned in the preamble of claim 1 in that the device for the axially symmetrical focusing of the electron beam consists of at least two rings that are radially magnetized in opposite directions and each of the rings encloses the electron beam, two rings that are radially magnetized in opposite directions are connected to form a uniform magnet system by magnetic conductors, the closing magnetic field denying the
  • the cathode has a very high emissivity of> 25 A / cm 2 with a small cathode diameter, and a vacuum of 10 ⁇ 7 to 10 " ⁇ Torr in the area of the ions during the
  • Magnetized permanent magnet blocks are advantageously assembled into rings and enclosed by magnetic conductors made of soft magnetic material, so that radial magnetization results
  • the magnetized permanent magnet blocks cuboids made of hard magnetic materials such as Sm 5 Co or NdFeB are also advantageous, as a result of which the rings can be produced efficiently
  • the ion trap to be opened and closed advantageously consists of a three-part drift tube mounted on a high-voltage insulator.
  • a controllable acceleration potential is applied to the middle part and an adjustable trap potential is applied to the two outer parts
  • the middle part of the drift tubes is provided with a number of elongated holes or other suitable openings running along the axial electron beam, which enable efficient pumping in the area of the ion trap
  • a vacuum recipient with four flanges in which two flanges lying opposite one another form a first axis and two further flanges form a second axis, the first and second axes crossing, on the first axis electron gun, drift tubes, electron collector and Extractors are arranged in this order, and along the second axis on a flange High-voltage bushing for positioning the drift tubes in the course of the first axis and a vacuum pump can be connected to the other flange.
  • Other solutions with more or fewer flanges are possible
  • the magnetic conductors advantageously pierce the vacuum recipient on both sides of the second axis parallel to the first axis and form a seat for the rings there.
  • the part of the magnetic conductor protruding into the vacuum recipient is angled in a 1-shape and magnetically short-circuited with the drift tubes
  • an electron gun with minimal divergence (compression) of the electron beam and thus with a maximally efficient cathode, i.e. a cathode with maximally high emission density, is used
  • the advantage of the invention is that highly charged ions can be generated efficiently without cryogenic technology
  • Fig. 1 is a schematic representation of the invention
  • Fig. 2 shows an advantageous embodiment of the invention in a schematic sectional view
  • FIG. 3 shows a section A-A corresponding to the representation in Fig. 2nd
  • FIG. 4 shows a detailed representation corresponding to FIG. 3
  • Electron gun 3 with cathode 14, three drift tubes 4, 15, 4, an electron collector 5, and an extractor 6 are arranged on axis 16 in this order.
  • Two oppositely radially magnetized rings 2 enclose axis 16 input and output of the drift tube structure 4, 15 and thus the electron beam that can be generated
  • the rings 2 contain a number of permanent magnet blocks 8, with which the rings 2 receive a radial magnetization.
  • an electron impact ion source which consists of a vacuum recipient 1, a magnetically focusing system 2, an electron gun 3, a drift tube structure 4, 15 mounted on a high-voltage insulator, and under certain circumstances the high-voltage insulator can be dispensed with, an electron collector 5 and an extractor 6.
  • pole shoes 7 made of soft magnetic material for field formation in the region of the ion trap are mounted in its interior
  • the magnetic field is generated by two rings 2 made of radially magnetized permanent magnet blocks 8, which are connected to one another by a system of magnetic conductors 7, 9 made of soft magnetic material.
  • the individual magnetic elements have the shape of simple cuboids, which makes it possible without difficulty to use modern hard magnetic materials such as To use Sm 5 Co or NdFeB
  • the rings 2 are located outside the vacuum recipient 1 and can therefore be dismantled during the time the device is heated to obtain ultra-high vacuums. This special feature of the system makes it possible to forego temperature limits in the heating process due to the relatively low Curie temperatures of modern hard magnetic materials
  • the distances between the location of the characteristic X-ray radiation or the VUV radiation and possible detectors as well as the distances to the required vacuum pumps can be kept to a minimum.As a result, the system has a maximum large solid angle (and thus has maximum detection effectiveness) during the registration of the characteristic X-ray radiation or the VUV radiation and a maximum pumping speed during vacuum generation
  • the electron gun 3 differs by its geometrical dimensions, here in particular by the cathode diameter, which is chosen with the aim of reducing the angular divergence of the electron beam and of achieving a paraxial current This is achieved through the use of highly effective emitting cathode materials, such as are known as monocrystalline boron-lanthanum cathodes
  • an electron current density of 200 A / cm 2 For comparison with known EBIT and EBIS systems, at least the following parameters are achieved: an electron current density of 200 A / cm 2 , an electron current of 50 mA and an electron energy of 30 keV
  • the compression level of the electron beam in the electron gun 3 is 4 (ie the ratio of the cathode radius to the radius of the electron beam in the cross-over is equal to 2).
  • the values given were for a Brillouin field value of 250 mT and for a cathode sensitivity of 25 A / cm 2 received

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Dental Preparations (AREA)
  • Luminescent Compositions (AREA)
  • Particle Accelerators (AREA)

Abstract

The invention provides an electron impact ion source for the generation of multiply- or super-highly-chared ions including an electron gun with cathode and anode for the creation and acceleration of electrons, a device for the axial-symmetric focussing of the electron beam, a device for introducing ionisable substances into an ion trap, which may be opened and closed, in the region of the axial-symmetric focussed electron beam, a device for destroying the electrons after they have passed the ion trap, and a device for creating a vacuum around the axial-symmetrically focussed electron beam and the ion trap within said beam. The device for the axial-symmetric focussing of the electron beam comprises at least two ring structures radially magnetized in opposing directions and each of these ring structures enclosed the electron beam. The two ring structures radially magnetized in opposing directions are connected by magnetic conductors to form a unified magnet system, whereby the closing magnetic field passes the ion residence zone in the ion trap. The cathode has a very high emissivity of >=25 A/cm<2 >with a small cathode diameter. A vacuum of from 10<-7 >to 10<-11 >Torr in the ion residence zone can be set while operating the electron impact ion source.

Description

ElektronenstoßionenquelleElectron impact ion source
Beschreibungdescription
Die Erfindung betrifft eine Elektronenstoßionenquelle gemäß dem Oberbegriff des Anspruchs 1 Die Elektronenstoßionenquelle erlaubt die Erzeugung hochgeladener Ionen, deren Extraktion, dient als Quelle von UV-, NUN-, Infrarotstrahlen und von charakteristischer Röntgenstrahlung hochgeladener IonenThe invention relates to an electron impact ion source according to the preamble of claim 1. The electron impact ion source allows the generation of highly charged ions, their extraction, serves as a source of UV, NUN, infrared rays and of characteristic X-ray radiation of highly charged ions
Bekannt sind Anlagen des Typs EBIT (Electron Beam Ion Trap) nach M A Levine, R E Marrs, J R Henderson, D A Knapp, M B Schneider, Physica Scripta, T22 (1988) 157, in denen vielfachgeladene Ionen in einem axialsymmetrischen Elektronenstrahl hoher Dichte erzeugt werden, der durch ein System aufeinanderfolgender Driftrohren unter Ultrahochvakuumbedingungen beschleunigt und durch supraleitende Heimholtzspulen fokussiert wirdSystems of the type EBIT (electron beam ion trap) according to MA Levine, RE Marrs, JR Henderson, DA Knapp, MB Schneider, Physica Scripta, T22 (1988) 157 are known in which multiply charged ions are generated in an axially symmetrical electron beam of high density, accelerated by a system of successive drift tubes under ultra-high vacuum conditions and focused by superconducting Heimholtz coils
Die Anlage besteht aus einer Elektronenkanone, mehreren zylindrischen Driftrohren, einem Elektronenkollektor, einem Extraktor, einem fokussierendem Magnetsystem und einem System zur Erzeugung von Ultrahochvakuumbedingungen in der AnlageThe system consists of an electron gun, several cylindrical drift tubes, an electron collector, an extractor, a focusing magnet system and a system for generating ultra-high vacuum conditions in the system
Der Elektronenstrahl erzeugt im mittleren Teil der Anlage eine Ionenfalle, welche die Ionen in radialer Richtung durch ihre Raumladungskrafte halt In axialer Richtung werden die Ionen, die im Elektronenstrahl durch Elektronenstoßionisation erzeugt werden, durch positive Potentiale an den Enden der Driftrohrenstrukturen entsprechend E D Donets, USSR Inventors Certificate Νo 248860, March 16, 1967, Bull OIPOTZ Νo 23 (1969) 65 gehaltenThe electron beam creates an ion trap in the central part of the system, which holds the ions in the radial direction due to their space charge forces.In the axial direction, the ions that are generated in the electron beam by electron impact ionization are generated by positive potentials at the ends of the drift tube structures according to ED Donets, USSR Inventors Certificate Νo 248860, March 16, 1967, Bull OIPOTZ Νo 23 (1969) 65
Die erhaltenen hochgeladenen Ionen können aus der lonenfalle längs der Fallenachse extrahiert werden, indem das Fallenpotential an der letzten Driftrohre abgesenkt wird Wahrend der Ionenspeicherung in der Falle wird von den gespeicherten Ionen emittierte charakteristische Röntgenstrahlung und andere langwellige elektromagnetische Strahlung in der Meridianebene des Magnetsystems und senkrecht zur Quellenachse abgestrahltThe uploaded ions obtained can be extracted from the ion trap along the trap axis by lowering the trap potential at the last drift tubes. During the ion storage in the trap, characteristic X-rays and other long-wave electromagnetic radiation emitted by the stored ions are in the meridian plane of the magnet system and perpendicular to it Radiated source axis
Die maximal erreichbare Ionenladung ist eine Funktion des Ionisationsfaktors jτ, d h des Produktes aus der Elektronenstromdichte j und der Ionenaufenthaltszeit τ im Elektronenstrahl der Falle Als für das Erreichen höchster Ladungszustande begrenzender Prozess wirken im wesentlichen Umladungsprozesse vielfachgeladener Ionen an Restgasatomen Daher müssen Gerate, die auf der Basis der beschriebenen Methode hochgeladene Ionen erzeugen, die Formierung eines hochdichten Elektronenstrahls unter Ultrahochvakuumbedingungen ermöglichenThe maximum achievable ion charge is a function of the ionization factor jτ, i.e. the product of the electron current density j and the ion residence time τ in the electron beam. The process that limits the achievement of the highest charge states is essentially the charge reversal processes of multiply charged ions on residual gas atoms.Therefore, devices based on the method described generate charged ions that Enable formation of a high-density electron beam under ultra high vacuum conditions
Zum Erreichen der genannten Ziele wird in EBIT-Anlagen kryogene Technik in Verbindung mit Supraleitungstechnik eingesetzt Supraleitende Helmholtzspulen mit Induktionen des magnetischen Feldes von 3T bis 5T werden hier zur Fokussierung des Elektronenstrahls über die Lange der Ionenfalle eingesetzt, wobei diese in bekannten Anlagen 25 mm nicht überschreitet Die Stromdichte des Elektronenstrahls betragt über die Fallenlange 2 000-5 000 A/cm2 bei einer Gesamtlange des elektronenoptischen Systems (Kathode - Elektronenkollektor) von mehr als 30 cm Das kryogene System erfüllt neben der Kryostatierung der supraleitenden Helmholtzspulen bei einer Temperatur von 4,2 K die Funktion einer leistungsfähigen Kryopumpe im Bereich der lonenfalle zur Erzeugung eines Vakuums von > 10"11 bis 10"12 TorrTo achieve the stated goals, cryogenic technology in conjunction with superconducting technology is used in EBIT systems. Superconducting Helmholtz coils with induction of the magnetic field from 3T to 5T are used here to focus the electron beam over the length of the ion trap, which in known systems does not exceed 25 mm The current density of the electron beam over the trap length is 2,000-5,000 A / cm 2 with a total length of the electron-optical system (cathode - electron collector) of more than 30 cm K the function of a powerful cryopump in the area of the ion trap to create a vacuum of> 10 "11 to 10 " 12 Torr
Die ausgesprochen anspruchsvollen technischen Parameter derartiger Anlagen führen zu komplexen, technisch schwierigen und sehr teuren Anlagen Zusatzlich begrenzend wirken die erforderliche kryogene und UltrahochvakuumtechnikThe extremely demanding technical parameters of such systems lead to complex, technically difficult and very expensive systems. The required cryogenic and ultra-high vacuum technology have an additional limiting effect
Eine Absenkung der Elektronenstromdichte auf 200 bis 500 A cm2 fuhrt zu einer Erhöhung der zur Erzeugung eines bestimmten Ionenladungszustandes erforderlichen Zeit in der Falle und damit zu einer Verringerung der mittleren Strahlintensitat für extrahierte vielfachgeladeneA decrease in the electron current density to 200 to 500 A cm 2 leads to an increase in the time required to generate a certain ion charge state in the trap and thus to a decrease in the mean beam intensity for extracted multi-charged
Ionen, die aber durch eine Vergrößerung des Elektronengesamtstroms kompensiert werden kannIons, which can be compensated for by increasing the total electron current
Zur Formierung von Elektronenstrahlen mit den oben angegebenen Dichten sind fokussierendeTo form electron beams with the densities specified above are focusing
Magnetfelder der Starke 0,2 T bis 0,5 T erforderlich, die von Permanentmagnetsystemen auf der Basis moderner magnetischer Materialien erzeugt werden könnenMagnetic fields of the strength 0.2 T to 0.5 T are required, which can be generated by permanent magnet systems based on modern magnetic materials
Der Einsatz moderner Vakuumtechnik ermöglicht es, Ultrahochvakua im Druckbereich bisThe use of modern vacuum technology enables ultra high vacuums in the pressure range up to
1717
10" Torr ohne kryogene Technik zu erreichen10 " Torr without cryogenic technology
Dies führte zum Bau einer sogenannten MICRO-EBIT, wie in H Khodja, J P Briand, Physica Scripta, T71 (1997) 113 beschrieben Die grundlegende Idee der Konstruktion dieser Anlage besteht darin, daß ein kompaktes, industriell gefertigtes Klystron zur Erzeugung einer Ionenfalle des EBIT-Typs genutzt wird Das fokussierende magnetische Feld, welches die radialen Abmaße des Elektronenstrahls im Bereich der lonenfalle begrenzt, wird von zwei C- formigen Permanentmagneten erzeugt, die eine magnetische Induktion der Starke 0,25 T liefern Zur Generierung des Elektronenstrahls wird die Originalkathode des Klystrons mit einer maximalen Emissivitat von 2,5 A/cm2 genutzt Das Ultrahochvakuum in der Anlage wird nach einem Ausheizen bei 300 °C nach Standardtechnologie mit der Kombination von je einer Turbomolekular- und einer Ionengetterpumpe erreichtThis led to the construction of a so-called MICRO-EBIT, as described in H Khodja, JP Briand, Physica Scripta, T71 (1997) 113. The basic idea of the construction of this system is that a compact, industrially manufactured klystron is used to generate an ion trap for the EBIT -Types is used The focussing magnetic field, which limits the radial dimensions of the electron beam in the area of the ion trap, is generated by two C-shaped permanent magnets, which magnetically induce the strength of 0.25 T. deliver To generate the electron beam, the original cathode of the klystron with a maximum emissivity of 2.5 A / cm 2 is used.The ultra-high vacuum in the system is achieved after heating at 300 ° C using standard technology with the combination of a turbomolecular and an ion getter pump
In der MICRO-EBIT wurden Ar16+ Ionen nach einer Ionisationszeit von 1,2 s nachgewiesen, d h es wurde ein Ionisationsfaktor von etwa MO20 cm"2 erreicht, was einer Elektronen- stromdichte von 14 A/cm2 entsprichtAr 16+ ions were detected in the MICRO-EBIT after an ionization time of 1.2 s, ie an ionization factor of approximately MO 20 cm "2 was achieved, which corresponds to an electron current density of 14 A / cm 2
Diese Anlage weist eine niedrige Elektronenstromdichte im Strahl (100 mal geringer als für supraleitende EBIT) auf Damit verbunden ist eine Beschrankung auf vergleichsweise geringe Ionenladungszustande wie Ar16+ This system has a low electron current density in the beam (100 times lower than for superconducting EBIT). This is associated with a limitation to comparatively low ionic charge states such as Ar 16+
Die ungeeignete Wahl einer Kathode mit vergleichsweise geringer Emissivitat und damit verbunden die Verwendung einer Elektronenkanone mit einer relativ großen elektrostatischen Divergenz des Elektronenstrahls ist ein weiterer entscheidender NachteilThe unsuitable choice of a cathode with comparatively low emissivity and the associated use of an electron gun with a relatively large electrostatic divergence of the electron beam is a further decisive disadvantage
Wie aus S I Molokovski, A D Suschkov, Intensive Elektronen- und Ionenstrahlen, Vieweg Verlag, Wiesbaden, 1999 bekannt ist, kann die maximale Stromstarke im durch ein magnetisches Langsfeld fokussierten Elektronenstrahl für Brillouinsche Fokussierung erhalten werden, wenn das Magnetfeld am Ort der Kathode verschwindet In einem solchen System ist die sogenannte Brillouindichte des Elektronenflusses durch thermische Geschwindigkeitskomponenten der Elektronen bei ihrem Austreten aus der Kathode (siehe auch M Szilagyi, Electron and Ion Optics, Plenum Press, New York and London, 1988) und durch Aberrationen in der Anodenlinse begrenzt Ein minimaler Wert für die Aberrationen ist für den Fall paraxialer und laminarer Flusse möglich, d h für eine Elektronenkanone mit minimaler Divergenz (Kompression) des Elektronenstrahls und somit für eine maximal effiziente Kathode, d h für eine Kathode mit maximal hoher EmissionsdichteAs is known from SI Molokovski, AD Suschkov, Intensive Electron and Ion Beams, Vieweg Verlag, Wiesbaden, 1999, the maximum current intensity in the electron beam focused by a longitudinal magnetic field for Brillouin focusing can be obtained if the magnetic field disappears at the location of the cathode in one In such a system, the so-called Brillouin density of the electron flow is limited by thermal velocity components of the electrons as they exit the cathode (see also M Szilagyi, Electron and Ion Optics, Plenum Press, New York and London, 1988) and by aberrations in the anode lens for the aberrations is possible in the case of paraxial and laminar flows, ie for an electron gun with minimal divergence (compression) of the electron beam and thus for a maximally efficient cathode, ie for a cathode with maximum emission density
Die Aufgabe der Erfindung besteht in der Schaffung einer effektiven Elektronenstoßionenquelle (WEBIT) ohne jegliche kryogene Komponenten und ohne Supraleitungstechnik für den Erhalt hochgeladener Ionen, der Röntgen- und VUV-Spektroskopie an diesen Ionen und der Extraktion der hochgeladenen Ionen aus der Falle zum Zwecke unterschiedlichster wissenschaftlicher, technologischer und technischer AnwendungenThe object of the invention is to create an effective electron impact ion source (WEBIT) without any cryogenic components and without superconductivity technology for the receipt of charged ions, X-ray and VUV spectroscopy on these ions and the extraction of the charged ions from the trap for the purposes of various scientific , technological and technical applications
Erfindungsgemaß wird die Aufgabe in Verbindung mit dem im Oberbegriff des Anspruchs 1 genannten Merkmalen dadurch gelost, daß die Einrichtung zur axialsymmetrischen Fokussierung des Elektronenstrahles aus wenigstens zwei gegenläufig radial magnetisierten Ringen besteht und jeder der Ringe den Elektronenstrahl umschließt, je zwei gegenläufig radial magnetisierte Ringe zu einem einheitlichen Magnetsystem durch magnetische Leiter verbunden sind, wobei das sich schließende Magnetfeld denAccording to the invention the object is achieved in connection with the features mentioned in the preamble of claim 1 in that the device for the axially symmetrical focusing of the electron beam consists of at least two rings that are radially magnetized in opposite directions and each of the rings encloses the electron beam, two rings that are radially magnetized in opposite directions are connected to form a uniform magnet system by magnetic conductors, the closing magnetic field denying the
Aufenthaltsbereich der Ionen in der Falle durchdringt, die Kathode eine sehr hohe Emissivitat von > 25 A/cm2 bei kleinem Kathodendurchmesser aufweist, und ein Vakuum von 10 ~7 bis 10 "π Torr im Aufenthaltsbereich der Ionen wahrend desPenetration area of the ions in the trap, the cathode has a very high emissivity of> 25 A / cm 2 with a small cathode diameter, and a vacuum of 10 ~ 7 to 10 "π Torr in the area of the ions during the
Betriebs der Quelle einstellbar istOperation of the source is adjustable
Vorteilhaft sind magnetisierte Permanentmagnetblocke zu Ringen zusammengefügt und durch magnetische Leiter aus weichmagnetischem Material umschlossen, so daß sich eine radiale Magnetisierung ergibtMagnetized permanent magnet blocks are advantageously assembled into rings and enclosed by magnetic conductors made of soft magnetic material, so that radial magnetization results
Weiter vorteilhaft sind die magnetisierten Permanentmagnetblocke Quader aus hartmagnetischen Materialien wie Sm5Co oder NdFeB, wodurch sich die Ringe rationell herstellen lassenThe magnetized permanent magnet blocks cuboids made of hard magnetic materials such as Sm 5 Co or NdFeB are also advantageous, as a result of which the rings can be produced efficiently
Die zu öffnende und zu schließende lonenfalle besteht vorteilhaft aus einer auf einem Hochspannungsisolator montierten dreigeteilten Driftrohre An den mittleren Teil ist ein steuerbares Beschleunigungspotential und die beiden äußeren Teile ein einstellbares Fallenpotential gelegtThe ion trap to be opened and closed advantageously consists of a three-part drift tube mounted on a high-voltage insulator. A controllable acceleration potential is applied to the middle part and an adjustable trap potential is applied to the two outer parts
Zur Erzeugung eines maximalen Vakuums in der Ionisationszone ist der mittlere Teil der Driftrohre mit einer Anzahl von entlang des axialen Elektronenstrahls verlaufenden Langlochern oder anderen geeigneten Offnungen versehen, die ein effizientes Pumpen im Bereich der lonenfalle ermöglichenTo create a maximum vacuum in the ionization zone, the middle part of the drift tubes is provided with a number of elongated holes or other suitable openings running along the axial electron beam, which enable efficient pumping in the area of the ion trap
Bei einer vorteilhaft ausgestalteten Elektronenstoßionenquelle ist ein Vakuumrezipient mit vier Flanschen vorgesehen, bei dem zwei sich gegenüberliegende Flansche eine erste Achse bilden und zwei weitere Flansche eine zweite Achse bilden, wobei erste und zweite Achse sich kreuzen, auf der ersten Achse Elektronenkanone, Driftrohre, Elektronenkollektor und Extraktor in dieser Reihenfolge angeordnet sind, und entlang der zweiten Achse an einem Flansch eine Hochspannungsdurchführung zur Positionierung der Driftrohre im Verlauf der ersten Achse und an dem anderen Flansch eine Vakuumpumpe anschließbar ist Andere Losungen mit mehr oder weniger Flanschen sind möglichIn an advantageously configured electron impact ion source, a vacuum recipient with four flanges is provided, in which two flanges lying opposite one another form a first axis and two further flanges form a second axis, the first and second axes crossing, on the first axis electron gun, drift tubes, electron collector and Extractors are arranged in this order, and along the second axis on a flange High-voltage bushing for positioning the drift tubes in the course of the first axis and a vacuum pump can be connected to the other flange. Other solutions with more or fewer flanges are possible
Vorteilhaft durchstechen bei einer derartigen Ausführung die magnetischen Leiter parallel zur ersten Achse den Vakuumrezipienten beidseits der zweiten Achse und bilden dort einen Aufsitz für die Ringe Der in den Vakuumrezipienten ragende Teil der magnetischen Leiter ist 1-formig abgewinkelt und mit der Driftrohre magnetisch kurzgeschlossenIn such an embodiment, the magnetic conductors advantageously pierce the vacuum recipient on both sides of the second axis parallel to the first axis and form a seat for the rings there. The part of the magnetic conductor protruding into the vacuum recipient is angled in a 1-shape and magnetically short-circuited with the drift tubes
Mit der erfindungsgemaßen Elektronenstoßionenquelle ist ein minimaler Wert der Aberrationen für paraxiale und laminare Flusse möglich Dazu wird eine Elektronenkanone mit minimaler Divergenz (Kompression) des Elektronenstrahls und somit mit maximal effizienter Kathode, d h eine Kathode mit maximal hoher Emissionsdichte, eingesetztWith the electron impact ion source according to the invention, a minimum value of the aberrations for paraxial and laminar flows is possible. For this purpose, an electron gun with minimal divergence (compression) of the electron beam and thus with a maximally efficient cathode, i.e. a cathode with maximally high emission density, is used
Somit besteht der Vorteil der Erfindung darin, daß hochstgeladene Ionen ohne kryogene Technik auf effiziente Weise erzeugt werden könnenThus, the advantage of the invention is that highly charged ions can be generated efficiently without cryogenic technology
Die Erfindung wird nachfolgend an Ausführungsbeispielen naher erläutert In den zugehörigen Zeichnungen zeigenThe invention is explained in more detail below using exemplary embodiments. The accompanying drawings show
Fig 1 eine schematische Darstellung der ErfindungFig. 1 is a schematic representation of the invention
Fig 2 eine vorteilhafte Ausfuhrung der Erfindung in schematisch geschnittener DarstellungFig. 2 shows an advantageous embodiment of the invention in a schematic sectional view
Fig 3 einen Schnitt A-A entsprechend der Darstellung in Fig 23 shows a section A-A corresponding to the representation in Fig. 2nd
Fig 4 eine Detaildarstellung entsprechend Fig 34 shows a detailed representation corresponding to FIG. 3
In der Fig 1 ist die Erfindung schematisch dargestellt Auf der Achse 16 sind Elektronenkanone 3 mit Kathode 14, drei Driftrohren 4, 15, 4, ein Elektronenkollektor 5, und ein Extraktor 6 in dieser Reihenfolge angeordnet Zwei gegenläufig radial magnetisierte Ringe 2 umschließen die Achse 16 eingangs und ausgangs der Driftrohrenstruktur 4,15 und somit den erzeugbaren Elektronenstrahl Die Ringe 2 enthalten eine Anzahl von Permanentmagnetblocken 8, mit denen die Ringe 2 eine radiale Magnetisierung erhalten Zwischen den Enden der Driftrohrenstruktur 4,15 und den Ringen 2 sind innere Polschuhe angeordnet, mit denen über die Driftrohrenstruktur 4,15 geschlossene magnetische Kreise 13 erzeugt werden In der Fig 2 ist eine erfindungsgemäße Elektronenstoßionenquelle dargestellt, die aus einem Vakuumrezipienten 1, einem magnetisch fokussierenden System 2, einer Elektronenkanone 3, aus einer auf einen Hochspannungsisolator montierten Driftrohrenstruktur 4,15, wobei unter bestimmten Umstanden auf den Hochspannungsisolator verzichtet werden kann, einem Elektronenkollektor 5 und einem Extraktor 6 besteht Im Vakuumrezipienten 1 sind in seinem Inneren Polschuhe 7 aus weichmagnetischem Material zur Feldformierung im Bereich der lonenfalle montiertThe invention is shown schematically in FIG. 1. Electron gun 3 with cathode 14, three drift tubes 4, 15, 4, an electron collector 5, and an extractor 6 are arranged on axis 16 in this order. Two oppositely radially magnetized rings 2 enclose axis 16 input and output of the drift tube structure 4, 15 and thus the electron beam that can be generated The rings 2 contain a number of permanent magnet blocks 8, with which the rings 2 receive a radial magnetization. Between the ends of the drift tube structure 4, 15 and the rings 2, inner pole pieces are arranged, with which are generated via the drift tube structure 4.15 closed magnetic circles 13 2 shows an electron impact ion source according to the invention, which consists of a vacuum recipient 1, a magnetically focusing system 2, an electron gun 3, a drift tube structure 4, 15 mounted on a high-voltage insulator, and under certain circumstances the high-voltage insulator can be dispensed with, an electron collector 5 and an extractor 6. In the vacuum recipient 1, pole shoes 7 made of soft magnetic material for field formation in the region of the ion trap are mounted in its interior
Das Magnetfeld wird von zwei Ringen 2 aus radial magnetisierten Permanentmagnetblocken 8 erzeugt, die miteinander durch ein System magnetischer Leiter 7,9 aus weichmagnetischem Material verbunden sind Die einzelnen magnetischen Elemente haben die Form einfacher Quader, was es ohne Schwierigkeiten möglich macht, moderne hartmagnetische Materialien wie Sm5Co oder NdFeB zu nutzenThe magnetic field is generated by two rings 2 made of radially magnetized permanent magnet blocks 8, which are connected to one another by a system of magnetic conductors 7, 9 made of soft magnetic material. The individual magnetic elements have the shape of simple cuboids, which makes it possible without difficulty to use modern hard magnetic materials such as To use Sm 5 Co or NdFeB
Die Ringe 2 befinden sich außerhalb des Vakuumrezipienten 1 und können daher wahrend der Zeit einer Ausheizung des Gerätes zum Erhalt von Ultrahochvakua demontiert werden Diese Besonderheit der Anlage ermöglicht es, auf Temperaturbegrenzungen im Ausheizprozeß wegen der relativ niedrigen Curietemperaturen moderner hartmagnetischer Materialien zu verzichtenThe rings 2 are located outside the vacuum recipient 1 and can therefore be dismantled during the time the device is heated to obtain ultra-high vacuums.This special feature of the system makes it possible to forego temperature limits in the heating process due to the relatively low Curie temperatures of modern hard magnetic materials
Flansche 10 für die Ankopplung der Anlage an das System zur Erzeugung des erforderlichen Vakuums, die isolierte Vakuumdurchführung 11 zu den Driftrohren 4,15 und spektroskopische Fenster 12 zur Spektroskopie der charakteristischen Röntgenstrahlung bzw von VUV- Strahlung, die im mit Ionen beladenen Elektronenstrahl entsteht, befinden sich in der Meridianebene des Gerätes Daher können die Abstände zwischen dem Ort des Entstehens der charakteristischen Röntgenstrahlung bzw der VUV-Strahlung und möglichen Detektoren sowie die Abstände zu den erforderlichen Vakuumpumpen minimal gehalten werden Dies hat zur Folge, daß die Anlage einen maximal großen Raumwinkel (und damit maximale Nachweiseffektivitat) bei der Registration der charakteristischen Röntgenstrahlung bzw der VUV-Strahlung und eine maximal große Pumpgeschwindigkeit bei der Vakuumerzeugung aufweistFlanges 10 for coupling the system to the system for generating the required vacuum, the insulated vacuum feedthrough 11 to the drift tubes 4, 15 and spectroscopic windows 12 for the spectroscopy of the characteristic X-ray radiation or of VUV radiation which are produced in the electron beam loaded with ions in the meridian plane of the device.Therefore, the distances between the location of the characteristic X-ray radiation or the VUV radiation and possible detectors as well as the distances to the required vacuum pumps can be kept to a minimum.As a result, the system has a maximum large solid angle (and thus has maximum detection effectiveness) during the registration of the characteristic X-ray radiation or the VUV radiation and a maximum pumping speed during vacuum generation
Die Elektronenkanone 3 unterscheidet sich durch ihre geometrischen Abmaße, hier insbesondere durch den Kathodendurchmesser, der mit dem Ziel gewählt wird, die Winkeldivergenz des Elektronenstrahls zu verringern und einen paraxialen Strom zu erreichen Dies wird durch die Verwendung hocheffektiv emittierender Kathodenmaterialien erreicht, wie sie zum Beispiel als monokristalline Bor-Lanthan-Kathoden bekannt sindThe electron gun 3 differs by its geometrical dimensions, here in particular by the cathode diameter, which is chosen with the aim of reducing the angular divergence of the electron beam and of achieving a paraxial current This is achieved through the use of highly effective emitting cathode materials, such as are known as monocrystalline boron-lanthanum cathodes
Zum Vergleich mit bekannten EBIT und EBIS Anlagen werden mindestens die folgenden Parameter erreicht eine Elektronenstromdichte von 200 A/cm2, ein Elektronenstrom von 50 mA und eine Elektronenenergie von 30 keVFor comparison with known EBIT and EBIS systems, at least the following parameters are achieved: an electron current density of 200 A / cm 2 , an electron current of 50 mA and an electron energy of 30 keV
Die Kompressionsstufe des Elektronenstrahls in der Elektronenkanone 3 betragt 4 (d h das Verhältnis vom Kathodenradius zum Radius des Elektronenstrahls im Cross-Over ist gleich 2) Die angegebenen Werte wurden für einen Wert des Brillouinfeldes von 250 mT und für eine Kathodenemi ssivitat von 25 A/cm2 erhaltenThe compression level of the electron beam in the electron gun 3 is 4 (ie the ratio of the cathode radius to the radius of the electron beam in the cross-over is equal to 2). The values given were for a Brillouin field value of 250 mT and for a cathode sensitivity of 25 A / cm 2 received
Die folgende Tabelle zeigt die mit der erfindungsgemaßen Elektronenstoßionenquelle erhaltenen IonenThe following table shows the ions obtained with the electron impact ion source according to the invention
Tabelle 1 Table 1
* rontgenspektroskopisch nachgewiesen bei einer Elektronenenergie von 15 keV Bezugszeichenliste* detected by X-ray spectroscopy at an electron energy of 15 keV LIST OF REFERENCE NUMBERS
1 - Vakuumrezipient1 - vacuum recipient
2 - Ring2 - ring
3 - Elektronenkanone3 - electron gun
4 - Driftröhre, zur Realisierung der lonenfalle4 - drift tube, for realizing the ion trap
5 - Elektronenkollektor5 - electron collector
6 - Extraktor6 - extractor
7 - innerer Polschuh7 - inner pole piece
8 - Permanentmagnetblock8 - permanent magnet block
9 - magnetischer Leiter9 - magnetic conductor
10 - Flansch10 - flange
11 - isolierte Vakummdurchführung11 - insulated vacuum bushing
12 - spektroskopisches Fenster12 - spectroscopic window
13 - magnetischer Kreis13 - magnetic circuit
14 - Kathode14 - cathode
15 - zentrale Driftröhre15 - central drift tube
16 - Achse16 - axis
17 - Achse 17-axis

Claims

Patentansprücheclaims
1 Elektronenstoßionenquelle zur Erzeugung vielfach- oder hochstgeladener Ionen, bestehend aus einer Elektronenkanone mit Kathode und Anode zur Erzeugung und Beschleunigung von Elektronen, einer Einrichtung zur axial symmetrischen Fokussierung des Elektronenstrahles, Mitteln zur Einbringung von ionisierbaren Substanzen in eine zu öffnende und zu schließende lonenfalle im Bereich des axialsymmetrisch fokussierten Elektronentrahles, einer Einrichtung zur Vernichtung der Elektronen nach dem Durchgang durch die lonenfalle, sowie einer Einrichtung zur Erzeugung eines Vakuums um den axialsymmetrisch fokussierten Elektronenstrahl und die darin befindliche lonenfalle, dadurch gekennzeichnet, daß die Einrichtung zur axialsymmetrischen Fokussierung des Elektronenstrahles aus wenigstens zwei gegenläufig radial magnetisierten Ringstrukturen (2) besteht und jede der Ringstrukturen (2) den Elektronenstrahl umfaßt, je zwei gegenläufig radial magnetisierte Ringstrukturen (2) zu einem einheitlichen1 electron impact ion source for generating multiply or highly charged ions, consisting of an electron gun with cathode and anode for generating and accelerating electrons, a device for axially symmetric focusing of the electron beam, means for introducing ionizable substances into an ion trap to be opened and closed in the area of the axially symmetrically focused electron beam, a device for destroying the electrons after passing through the ion trap, and a device for generating a vacuum around the axially symmetrically focused electron beam and the ion trap located therein, characterized in that the device for axially symmetrical focusing of the electron beam from at least two there are oppositely radially magnetized ring structures (2) and each of the ring structures (2) comprises the electron beam, two oppositely radially magnetized ring structures (2) into one unit s
Magnetsystem durch magnetische Leiter (7,9) verbunden sind, wobei das sich schließende Magnetfeld den Aufenthaltsbereich der Ionen in der lonenfalle durchdringt, die Kathode eine sehr hohe Emissivitat von > 25 A/cm2 bei kleinemMagnet system are connected by magnetic conductors (7,9), the closing magnetic field penetrating the area of the ion trap in the ion trap, the cathode a very high emissivity of> 25 A / cm 2 with small
Kathodendurchmesser aufweist, und ein Vakuum von 10 ~η bis 10 " Torr im Aufenthaltsbereich der Ionen wahrend desHas cathode diameter, and a vacuum of 10 ~ η to 10 "Torr in the area of the ions during the
Betriebs der Elektronenstoßionenquelle einstellbar istOperation of the electron impact ion source is adjustable
2 Elektronenstoßionenquelle nach Anspruch 1, dadurch gekennzeichnet, daß magnetisierte Permanentmagnetblocke (8) radial magnetisierte Ringe (2) bilden und durch magnetische Leiter (7,9) aus weichmagnetischem Material zu einem magnetischen Kreis (13) verbunden sind2 electron impact ion source according to claim 1, characterized in that magnetized permanent magnet blocks (8) form radially magnetized rings (2) and are connected by magnetic conductors (7, 9) made of soft magnetic material to form a magnetic circuit (13)
3 Elektronenstoßionenquelle nach Anspruch 2, dadurch gekennzeichnet, daß die magnetisierten Permanentmagnetblocke (8) Quader aus hartmagnetischen Materialien wie Sm5Co oder NdFeB bestehen 4 Elektronenstoßionenquelle nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, daß die radial magnetisierten Ringe (2) außerhalb der Einrichtung zur Erzeugung eines Vakuums abnehmbar angeordnet sind3 electron impact ion source according to claim 2, characterized in that the magnetized permanent magnet blocks (8) cuboids consist of hard magnetic materials such as Sm 5 Co or NdFeB 4 electron impact ion source according to one of claims 1 to 3, characterized in that the radially magnetized rings (2) are removably arranged outside the device for generating a vacuum
5 Elektronenstoßionenquelle nach einem der Ansprüche 1 bis 5, dadurch gekennzeichnet, daß die zu öffnende und zu schließende lonenfalle aus einer auf einem Hochspannungsisolator montierten dreigeteilten Driftrohre (4,15,4) besteht, wobei an den mittleren Teil (15) ein steuerbares Beschleunigungspotential und die beiden äußeren Potentiale ein einstellbares Fallenpotential legbar ist.5 electron impact ion source according to one of claims 1 to 5, characterized in that the ion trap to be opened and closed consists of a three-part drift tube (4, 15, 4) mounted on a high-voltage insulator, with a controllable acceleration potential at the central part (15) and an adjustable trap potential can be placed in the two outer potentials.
6 Elektronenstoßionenquelle nach Anspruch 5, dadurch gekennzeichnet, daß die zentrale Driftrohre (15) mit einer Anzahl von entlang des axialen Elektronenstrahls verlaufenden Langlochern versehen ist6 electron impact ion source according to claim 5, characterized in that the central drift tubes (15) is provided with a number of elongated holes extending along the axial electron beam
7 Elektronenstoßionenquelle nach einem der Ansprüche 1 bis 6, dadurch gekennzeichnet, daß ein Vakuumrezipient (1) mit vier Flanschen (10) vorgesehen ist, bei dem zwei sich gegenüberliegende Flansche eine erste Achse (16) bilden und zwei weitere Flansche eine zweite Achse (17) bilden, wobei erste und zweite Achse (16, 17) sich kreuzen, auf der ersten Achse (16) Elektronenkanone (3), Driftrohren (4, 15,4), Elektronenkollektor (5) und Extraktor (6) in dieser Reihenfolge angeordnet sind, und entlang der zweiten Achse (17) an einem Flansch eine Hochspannungsdurchführung (1 1) zur Positionierung der Driftrohren (4, 15,4) im Verlauf der ersten Achse (16) und an dem anderen Flansch (10) eine Vakuumpumpe anschließbar ist7 electron impact ion source according to one of claims 1 to 6, characterized in that a vacuum recipient (1) with four flanges (10) is provided, in which two opposite flanges form a first axis (16) and two further flanges form a second axis (17 ), the first and second axes (16, 17) intersecting, on the first axis (16) electron gun (3), drift tubes (4, 15,4), electron collector (5) and extractor (6) arranged in this order are, and along the second axis (17) on a flange a high-voltage bushing (1 1) for positioning the drift pipes (4, 15,4) in the course of the first axis (16) and on the other flange (10) a vacuum pump can be connected
8 Elektronenstoßionenquelle nach Anspruch 7, dadurch gekennzeichnet, daß die magnetischen Leiter (7) parallel zur ersten Achse (16) den Vakuumrezipienten (1) beidseits der zweiten Achse (17) durchstechen und einen Aufsitz für die Ringstrukturen (2) zwei bilden, und der in den Vakuumrezipienten (1) ragende Teil der magnetischen Leiter (7) 1- formig abgewinkelt ist und mit den Driftrohren (4) magnetisch kurzgeschlossen ist8 electron impact ion source according to claim 7, characterized in that the magnetic conductors (7) parallel to the first axis (16) pierce the vacuum recipient (1) on both sides of the second axis (17) and form a seat for the ring structures (2) two, and the in the vacuum recipient (1) protruding part of the magnetic conductor (7) is angled 1-shape and is magnetically short-circuited with the drift tubes (4)
Hierzu 4 Blatt Zeichnungen 4 sheets of drawings
EP00982966A 1999-10-08 2000-10-06 Electron impact ion source Expired - Lifetime EP1222677B1 (en)

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PCT/DE2000/003525 WO2001027964A2 (en) 1999-10-08 2000-10-06 Electron impact ion source

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DE10083121D2 (en) 2002-04-25
DE50015866D1 (en) 2010-04-01
WO2001027964A3 (en) 2002-03-14
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US6717155B1 (en) 2004-04-06
ATE458260T1 (en) 2010-03-15

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