EP1218763A4 - Systeme de mesure et de controle de densite electronique utilisant des modifications effectuees par plasma dans la frequence d'un oscillateur pour hyperfrequences - Google Patents

Systeme de mesure et de controle de densite electronique utilisant des modifications effectuees par plasma dans la frequence d'un oscillateur pour hyperfrequences

Info

Publication number
EP1218763A4
EP1218763A4 EP00947493A EP00947493A EP1218763A4 EP 1218763 A4 EP1218763 A4 EP 1218763A4 EP 00947493 A EP00947493 A EP 00947493A EP 00947493 A EP00947493 A EP 00947493A EP 1218763 A4 EP1218763 A4 EP 1218763A4
Authority
EP
European Patent Office
Prior art keywords
plasma
frequency
control system
electron density
density measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP00947493A
Other languages
German (de)
English (en)
Other versions
EP1218763A1 (fr
Inventor
Joseph T Verdeyen
Wayne L Johnson
Murray D Sirkis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of EP1218763A1 publication Critical patent/EP1218763A1/fr
Publication of EP1218763A4 publication Critical patent/EP1218763A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R19/00—Arrangements for measuring currents or voltages or for indicating presence or sign thereof
    • G01R19/0046—Arrangements for measuring currents or voltages or for indicating presence or sign thereof characterised by a specific application or detail not covered by any other subgroup of G01R19/00
    • G01R19/0061—Measuring currents of particle-beams, currents from electron multipliers, photocurrents, ion currents; Measuring in plasmas

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
EP00947493A 1999-07-20 2000-07-20 Systeme de mesure et de controle de densite electronique utilisant des modifications effectuees par plasma dans la frequence d'un oscillateur pour hyperfrequences Withdrawn EP1218763A4 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14487899P 1999-07-20 1999-07-20
US144878P 1999-07-20
PCT/US2000/019535 WO2001006268A1 (fr) 1999-07-20 2000-07-20 Systeme de mesure et de controle de densite electronique utilisant des modifications effectuees par plasma dans la frequence d'un oscillateur pour hyperfrequences

Publications (2)

Publication Number Publication Date
EP1218763A1 EP1218763A1 (fr) 2002-07-03
EP1218763A4 true EP1218763A4 (fr) 2005-02-02

Family

ID=22510543

Family Applications (1)

Application Number Title Priority Date Filing Date
EP00947493A Withdrawn EP1218763A4 (fr) 1999-07-20 2000-07-20 Systeme de mesure et de controle de densite electronique utilisant des modifications effectuees par plasma dans la frequence d'un oscillateur pour hyperfrequences

Country Status (6)

Country Link
EP (1) EP1218763A4 (fr)
JP (1) JP4339540B2 (fr)
KR (1) KR100712325B1 (fr)
CN (1) CN1162712C (fr)
TW (1) TW463531B (fr)
WO (1) WO2001006268A1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5138131B2 (ja) * 2001-03-28 2013-02-06 忠弘 大見 マイクロ波プラズマプロセス装置及びプラズマプロセス制御方法
US7214289B2 (en) 2001-10-24 2007-05-08 Tokyo Electron Limited Method and apparatus for wall film monitoring
US7164095B2 (en) 2004-07-07 2007-01-16 Noritsu Koki Co., Ltd. Microwave plasma nozzle with enhanced plume stability and heating efficiency
US7806077B2 (en) 2004-07-30 2010-10-05 Amarante Technologies, Inc. Plasma nozzle array for providing uniform scalable microwave plasma generation
US7189939B2 (en) 2004-09-01 2007-03-13 Noritsu Koki Co., Ltd. Portable microwave plasma discharge unit
US7271363B2 (en) 2004-09-01 2007-09-18 Noritsu Koki Co., Ltd. Portable microwave plasma systems including a supply line for gas and microwaves
CN102573257A (zh) * 2012-01-11 2012-07-11 西安电子科技大学 大面积均匀等离子体电子密度控制系统
KR101287059B1 (ko) * 2013-01-07 2013-07-23 주식회사 디제이피 광대역 주파수 검출기
CN104181172B (zh) * 2014-08-25 2016-05-25 西安近代化学研究所 一种固体推进剂燃烧喷焰自由电子浓度测试方法
CN114007321B (zh) * 2021-09-30 2024-07-09 中科等离子体科技(合肥)有限公司 一种大气压等离子体电子密度的诊断方法
CN114624256B (zh) * 2022-03-31 2023-07-25 核工业西南物理研究院 用于测量磁流体不稳定性模数的三维微波反射系统及方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3265967A (en) * 1965-06-08 1966-08-09 Mark A Heald Microwave plasma density measurement system
US5082517A (en) * 1990-08-23 1992-01-21 Texas Instruments Incorporated Plasma density controller for semiconductor device processing equipment
US5359282A (en) * 1990-11-16 1994-10-25 Nichimen Kabushiki Kaisha Plasma diagnosing apparatus
US5448173A (en) * 1991-10-31 1995-09-05 Nihon Kosyuha Kabushiki Kaisha Triple-probe plasma measuring apparatus for correcting space potential errors
US5471115A (en) * 1993-09-16 1995-11-28 Fujitsu Limited Method and apparatus for measuring electron density of plasma
US5760573A (en) * 1993-11-18 1998-06-02 Texas Instruments Incorporated Plasma density monitor and method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3952246A (en) * 1975-05-29 1976-04-20 The United States Of America As Represented By The United States Energy Research And Development Administration Plasma digital density determining device
US4899100A (en) * 1988-08-01 1990-02-06 The United States Of America As Represented By The United States Department Of Energy Microwave measurement of the mass of frozen hydrogen pellets
US5733820A (en) * 1995-04-27 1998-03-31 Sharp Kabushiki Kaisha Dry etching method
US5691642A (en) 1995-07-28 1997-11-25 Trielectrix Method and apparatus for characterizing a plasma using broadband microwave spectroscopic measurements

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3265967A (en) * 1965-06-08 1966-08-09 Mark A Heald Microwave plasma density measurement system
US5082517A (en) * 1990-08-23 1992-01-21 Texas Instruments Incorporated Plasma density controller for semiconductor device processing equipment
US5359282A (en) * 1990-11-16 1994-10-25 Nichimen Kabushiki Kaisha Plasma diagnosing apparatus
US5448173A (en) * 1991-10-31 1995-09-05 Nihon Kosyuha Kabushiki Kaisha Triple-probe plasma measuring apparatus for correcting space potential errors
US5471115A (en) * 1993-09-16 1995-11-28 Fujitsu Limited Method and apparatus for measuring electron density of plasma
US5760573A (en) * 1993-11-18 1998-06-02 Texas Instruments Incorporated Plasma density monitor and method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO0106268A1 *

Also Published As

Publication number Publication date
WO2001006268A8 (fr) 2001-03-29
CN1361867A (zh) 2002-07-31
TW463531B (en) 2001-11-11
JP4339540B2 (ja) 2009-10-07
WO2001006268A1 (fr) 2001-01-25
EP1218763A1 (fr) 2002-07-03
JP2003505668A (ja) 2003-02-12
KR20020020787A (ko) 2002-03-15
CN1162712C (zh) 2004-08-18
KR100712325B1 (ko) 2007-05-02

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