EP1194944B1 - Electron beam accelerator - Google Patents
Electron beam accelerator Download PDFInfo
- Publication number
- EP1194944B1 EP1194944B1 EP00943252A EP00943252A EP1194944B1 EP 1194944 B1 EP1194944 B1 EP 1194944B1 EP 00943252 A EP00943252 A EP 00943252A EP 00943252 A EP00943252 A EP 00943252A EP 1194944 B1 EP1194944 B1 EP 1194944B1
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- EP
- European Patent Office
- Prior art keywords
- exit window
- electron
- accelerator
- housing
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
- H01J5/02—Vessels; Containers; Shields associated therewith; Vacuum locks
- H01J5/06—Vessels or containers specially adapted for operation at high tension, e.g. by improved potential distribution over surface of vessel
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B55/00—Preserving, protecting or purifying packages or package contents in association with packaging
- B65B55/02—Sterilising, e.g. of complete packages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B55/00—Preserving, protecting or purifying packages or package contents in association with packaging
- B65B55/02—Sterilising, e.g. of complete packages
- B65B55/04—Sterilising wrappers or receptacles prior to, or during, packaging
- B65B55/10—Sterilising wrappers or receptacles prior to, or during, packaging by liquids or gases
- B65B55/103—Sterilising flat or tubular webs
Definitions
- Electron beams are used in many industrial processes such as for drying or curing inks, adhesives, paints and coatings. Electron beams are also used for liquid, gas and surface sterilization as well as to clean up hazardous waste.
- Conventional electron beam machines employed for industrial purposes include an electron beam accelerator which directs an electron beam onto the material to be processed.
- the accelerator has a large lead encased vacuum chamber containing an electron generating filament or filaments powered by a filament power supply. During operation, the vacuum chamber is continuously evacuated by vacuum pumps.
- the filaments are surrounded by a housing having a grid of openings which face a metallic foil electron beam exit window positioned on one side of the vacuum chamber.
- a high voltage potential is imposed between the filament housing and the exit window with a high voltage power supply. Electrons generated by the filaments accelerate from the filaments in an electron beam through the grid of openings in the housing and out through the exit window.
- An extractor power supply is typically included for flattening electric field lines in the region between the filaments and the exit window. This prevents the electrons in the electron beam from concentrating in the center of the beam as depicted in graph 1 of FIG. 1 , and instead, evenly disperses the electrons across the width of the beam as depicted in graph 2 of FIG. 1 .
- WO98 129895 discloses an electron accelerator as defined in the preamble of present claim 1.
- An electron accelerator with an electron beam exit window membrane is also disclosed in US 5483074 .
- the present invention provides an electron accelerator as defined in present claim 1 and a method of manufacturing an electron accelerator as defined in present claim 10.
- the present invention thereby provides a compact, less complex electron accelerator for an electron beam machine which allows the electon beam machine to be more easily maintained and does not require maintenance by personnel highly trained in vacuum technology and accelerator technology.
- a series of openings in the housing forms the electrons permeable region.
- the exit window membrane is preferably formed of titanium foil between about 8 to 10 microns thick and is supported by a support plate having a series of holes therethrough which allow the electrons to pass through.
- the configuration of the holes in the support plate are arrangable to vary electron permeability across the support plate for providing the electron beam with a desired variable intensity profile.
- the exit window has an outer edge which is either brazed, welded or bonded to the vacuum chamber to provide a gas tight seal therebetween.
- the vacuum chamber includes an elongate ceramic member.
- the elongate ceramic member is corrugated which allows higher voltages to be used.
- An annular spring member is coupled between the exit window and the corrugated ceramic member to compensate for different rates of expansion.
- the elongate ceramic member has a smooth surface and a metallic shell surrounds the ceramic member.
- the ceramic member includes a frustoconical hole which allows an electrical lead to extend through the frustoconical hole for supplying power to the electron generator.
- a flexible insulating plug surrounds the electrical lead and includes a frustoconical surface for sealing with the frustoconical hole.
- a retaining cap is secured to the shell for retaining the plug within the frustoconical bole.
- the present invention provides a compact replaceable modular electron beam accelerator.
- the entire accelerator is replaced when the filaments or the electron beam exit window require replacing, thus drastically reducing the down time of an electron beam machine.
- This also eliminates the need for personnel skilled in vacuum technology and electron accelerator technology for maintaining the machine.
- high voltage insulators do not need to be replaced on site.
- the inventive electron beam accelerator has less components and requires less power than conventional electron beam accelerators, making it less expensive, simpler, smaller and more efficient.
- the compact size of the accelerator makes it suitable for use in machines where space is limited such as in small printing presses, or for in line web sterilization and interstation curing.
- electron beam accelerator 10 not part of the present invention is a replaceable modular accelerator which is installed in an electron beam machine housing (not shown).
- Accelerator 10 includes an elongate generally cylindrical two piece outer shell 14 which is sealed at both ends. The proximal end of outer shell 14 is enclosed by a proximal end cap 16 which is welded to outer shell 14.
- Outer shell 14 and end cap 16 are each preferably made from stainless steel but alternatively can be made of other suitable metals.
- an electron beam exit window membrane 24 made of titanium foil which is brazed along edge 23 to a stainless steel distal end cap 20.
- End cap 20 is welded to outer shell 14.
- Exit window 24 is typically between about 6 to 12 microns thick with about 8 to 10 microns being the more preferred range.
- exit window 24 can be made of other suitable metallic foils such as magnesium, aluminum, beryllium or suitable non-metallic low density materials such as ceramics.
- exit window 24 can be welded or bonded to end cap 20.
- a rectangular support plate 22 having holes or openings 22a for the passage of electrons therethrough is bolted to end cap 20 with bolts 22b and helps support exit window 24.
- Support plate 22 is preferably made of copper for dissipating heat but alternatively can be made of other suitable metals such as stainless steel, aluminum or titanium.
- the holes 22a within support plate 22 are about 3.2mm (1/8 inch) in diameter and provide about an 80% opening for electrons to pass through exit window 24.
- End cap 20 includes a cooling passage 27 through which cooling fluid is pumped for cooling the end cap 20, support plate 22 and exit window 24.
- the cooling fluid enters inlet port 25a and exits outlet port 25b.
- the inlet 25a and outlet 25b ports mate with coolant supply and return ports on the electron beam machine housing.
- the coolant supply and return ports include "0" ring seals for sealing to the inlet 25a and outlet 25b ports.
- Accelerator 10 is about 0.30m (12 inches) in diameter by 0.51m (20 inches) long and about 23kg (50 pounds) in weight.
- a high voltage electrical connecting receptacle 18 for accepting the connector 12 of a high voltage power cable is mounted to end cap 16.
- the high voltage cable supplies accelerator 10 with power from a high voltage power supply 48 and a filament power supply 50.
- High voltage power supply 48 preferably provides about 100 kv but alternatively can be higher or lower depending upon the thickness of exit window 24.
- Filament power supply 50 preferably provides about 15 volts.
- Two electrical leads 26a/26b extend downwardly from receptacle 18 through a disk-shaped high voltage ceramic insulator 28 which divides accelerator 10 into an upper insulating chamber 44 and a lower vacuum chamber 46.
- Insulator 28 is bonded to outer shell 14 by first being brazed to an intermediate ring 29 made of material having an expansion coefficient similar to that of insulator 28 such as KOVAR®.
- the intermediate ring 29 can then be brazed to the outer shell 14.
- the upper chamber 44 is evacuated and then filled with an insulating medium such as SF 6 gas but alternatively can be filled with oil or a solid insulating medium.
- the gaseous and liquid insulating media can be filled and drained through shut off valve 42.
- An electron generator 31 is positioned within vacuum chamber 46 and preferably consists of three 8 inch long filaments 32 ( FIG. 4 ) made of tungsten which are electrically connected together in parallel. Alternatively, two filaments 32 can be employed.
- the electron generator 31 is surrounded by a stainless steel filament housing 30.
- Filament housing 30 has a series of grid like openings 34 along a planar bottom 33 and a series of openings 35 along the four sides of housing 30.
- the filaments are preferably positioned within housing 30 about midway between bottom 33 and the top of housing 30. Openings 35 do not extend substantially above filaments 32.
- Electrical lead 26a and line 52 electrically connect filament housing 30 to high voltage power supply 48.
- Electrical lead 26b passes through a hole 30a in filament housing 30 to electrically connect filaments 32 to filament power supply 50.
- the exit window 24 is electrically grounded to impose a high voltage potential between filament housing 30 and exit window 24.
- An inlet 39 is provided on vacuum chamber 46 for evacuating vacuum chamber 46.
- Inlet 39 includes a stainless steel outer pipe 36 which is welded to outer shell 14 and a sealable copper tube 38 which is brazed to pipe 36. Once vacuum chamber 46 is evacuated, pipe 38 is cold welded under pressure to form a seal 40 for hermetically sealing vacuum chamber 46.
- accelerator 10 is mounted to an electron beam machine, and electrically connected to connector 12.
- the housing of the electron beam machine includes a lead enclosure which surrounds accelerator 10.
- Filaments 32 are heated up to about 4200°F by electrical power from filament power supply 50 (AC or DC) which causes free electrons to form on filaments 32.
- filament power supply 50 AC or DC
- the high voltage potential between the filament housing 30 and exit window 24 imposed by high voltage power supply 48 causes the free electrons 56 on filaments 32 to accelerate from the filaments 32 in an electron beam 58 out through openings 34 in housing 30 and the exit window 24 ( FIG. 4 ).
- the side openings 35 create small electric fields around the openings 35 which flatten the high voltage electric field lines 54 between the filaments 32 and the exit window 24 relative to the plane of the bottom 33 of housing 30.
- By flattening electric field lines 54 electrons 56 of electron beam 58 exit housing 30 through openings 34 in a relatively straight manner rather than focusing towards a central location as depicted by graph 1 of FIG. 1 .
- the narrower higher density electron beam of graph 1 of FIG. 1 is undesirable because it will burn a hole through exit window 24.
- FIG. 5 depicts housing 30 with side openings 35 omitted.
- electric field lines 54 arch upwardly. Since electrons 56 travel about perpendicularly to the electric field lines 54, the electrons 56 are focused in a narrow electron beam 57. In contrast, as seen in FIG. 4 , the electric field lines 54 are flat allowing the electrons 56 to travel in a wider substantially non-focusing electron beam 58. Accordingly, while conventional accelerators need to employ an extractor power supply at high voltage to flatten the high voltage electric field lines for evenly dispersing the electrons across the electric beam, the present invention is able to accomplish the same results in a simple and inexpensive manner by means of the openings 35.
- accelerator 10 When the filaments 32 or exit window 24 need to be replaced, the entire accelerator 10 is simply disconnected from the electron beam machine housing and replaced with a new accelerator 10.
- the new accelerator 10 is already preconditioned for high voltage operation and, therefore, the down time of the electron beam machine is merely minutes. Since only one part needs to be replaced, the operator of the electron beam machine does not need to be highly trained in vacuum technology and accelerator technology maintenance. In addition, accelerator 10 is small enough and light enough in weight to be replaced by one person.
- the old accelerator is preferably sent to another location such as a company specializing in vacuum technology.
- the vacuum chamber 46 is opened by removing the exit window 24 and support plate 22.
- housing 30 is removed from vacuum chamber 46 and the filaments 32 are replaced. If needed, the insulating medium within upper chamber 44 is removed through valve 42. The housing 30 is then remounted back in vacuum chamber 46.
- Support plate 22 is bolted to end cap 20 and exit window 24 is replaced.
- the edge 23 of the new exit window 24 is brazed to end cap 20 to form a gas tight seal therebetween. Since exit window 24 covers the support plate 22, bolts 22b and bolt holes, it serves the secondary function of sealing over the support plate 22 without any leaks, "O"-rings or the like.
- Copper tube 38 is removed and a new copper tube 38 is brazed to pipe 36.
- the exit window 24 can be easily made 8 to 10 microns thick or even as low as 6 microns thick. The reason for this is that dust or other contaminants are prevented from accumulating on exit window 24 between the exit window 24 and the support plate 22. Such contaminants will poke holes through an exit window 24 having a thickness under 12.5 microns.
- electron beam exit windows in conventional accelerators must be 12.5 to 15 microns thick because they are assembled at the site in dusty conditions during maintenance. An exit window 12.5 to 15 microns thick is thick enough to prevent dust from perforating the exit window. Since the present invention exit window 24 is typically thinner than exit windows on conventional accelerators, the power required for accelerating electrons through the exit window 24 is considerably less.
- accelerator 10 is more efficient than conventional accelerators.
- the lower voltage also allows the accelerator 10 to be more compact in size and allows a disk-shaped insulator 28 to be used which is smaller than the cylindrical or conical insulators employed in conventional accelerators.
- the reason accelerator 10 can be more compact then conventional accelerators is that the components of accelerator 10 can be closer together due to the lower voltage.
- the controlled clean environment within vacuum chamber 46 allows the components to be even closer together.
- Conventional accelerators operate at higher voltages and have more contaminants within the accelerator which requires greater distances between components to prevent electrical arcing therebetween. In fact, contaminants from the vacuum pumps in conventional accelerators migrate into the accelerator during use.
- the vacuum chamber 46 is then evacuated through inlet 39 and tube 38 is hermetically sealed by cold welding. Once vacuum chamber 46 is sealed, vacuum chamber 46 remains under a permanent vacuum without requiring the use of an active vacuum pump. This reduces the complexity and cost of operating the present invention accelerator 10.
- the accelerator 10 is then preconditioned for high voltage operation by connecting the accelerator 10 to an electron beam machine and gradually increasing the voltage to burn off any contaminants within vacuum chamber 46 and on exit window 24. Any molecules remaining within the vacuum chamber 46 are ionized by the high voltage and/or electron beam and are accelerated towards housing 30. The ionized molecules collide with housing 30 and become trapped on the surfaces of housing 30, thereby further improving the vacuum.
- the vacuum chamber 46 can also be evacuated while the accelerator 10 is preconditioned for high voltage operation. The accelerator 10 is disconnected from the electron beam machine and stored for later use.
- FIG. 6 depicts a system 64 including three accelerators 10a, 10b and 10c which are staggered relative to each other to radiate the entire width of a moving product 62 with electron beams 60. Since the electron beam 60 of each accelerator 10a, 10b, 10c is narrower than the outer diameter of an accelerator, the accelerators cannot be positioned side-by-side. Instead, accelerator 10b is staggered slightly to the side and backwards relative to accelerators 10a and 10c along the line of movement of the product 62 such that the ends of each electron beam 60 will line up with each other in the lateral direction. As a result, the moving product 62 can be accumulatively radiated by the electron beams 60 in a step-like configuration as shown. Although three accelerators have been shown, alternatively, more than three accelerators 10 can be staggered to radiate wider products or only two accelerators 10 can be staggered to radiate narrower products.
- FIGs. 7 and 8 depict another preferred method of electrically connecting leads 26a and 26b to filament housing 30 and filaments 32.
- Lead 26a is fixed to the top of filament housing 30.
- Three filament brackets 102 extend downwardly from the top of filament housing 30.
- a filament mount 104 is mounted to each bracket 102.
- An insulation block 110 and a filament mount 108 are mounted to the opposite side of filament housing 30.
- the filaments 32 are mounted to and extend between filament mounts 104 and 108.
- a flexible lead 106 electrically connects lead 26b to filament mount 108.
- Filament brackets 102 have a spring-like action which compensate for the expansion and contraction of filaments 32 during use.
- a cylindrical bracket 112 supports housing 30 instead of leads 26a/26b.
- filament arrangement 98 depicts a series of filaments 97 which are positioned side-by-side and electrically connected together in parallel by two electrical leads 96. Filament arrangement 98 is also employed to increase the width of the electron beam.
- accelerator 70 is another embodiment not forming part of the present invention. Accelerator 70 produces an electron beam which is directed at a 90° angle to the electron beam produced by accelerator 10. Accelerator 70 differs from accelerator 10 in that filaments 78 are parallel to the longitudinal axis A of the vacuum chamber 88 rather than perpendicular to the longitudinal axis A.
- exit window 82 is positioned on the outer shell 72 of the vacuum chamber 88 and is parallel to the longitudinal axis A. Exit window 82 is supported by support plate 80 which is mounted to the side of outer shell 72.
- An elongated filament housing 75 surrounds filaments 78 and includes a side 76 having grid openings 34 which are perpendicular to longitudinal axis A.
- Accelerator 70 is suitable for radiating wide areas with an electron beam without employing multiple staggered accelerators and is suitable for use in narrow environments. Accelerator 70 can be made up to about 3 to 4 feet long and can be staggered to provide even wider coverage.
- accelerator 100 is a preferred embodiment of the present invention.
- Accelerator 100 includes a generally cylindrical outer shell 102 formed of ceramic material having a vacuum chamber 104 therein.
- Outer shell 102 has a closed proximal end 106 and an open distal end 118 opposite thereof.
- the external surface of outer shell 102 includes a series of corrugations 102a which allows accelerator 100 to run at higher voltages than if outer shell 102 were smooth.
- the open end 118 has a region with a smooth outer surface.
- a metallic end cap 110 surrounds and covers the smooth open distal end 118 of outer shell 102 to enclose vacuum chamber 104.
- End cap 110 is brazed to an intermediate annular metallic spring 108 which in turn is brazed to outer shell 102, thereby sealing vacuum chamber 104.
- Spring 108 allows the ceramic outer shell 102 and end cap 110 to expand and contract at different rates in radial as well axial directions while maintaining a gas tight seal therebetween. Spring 108 accomplishes this by spacing the end cap 110 slightly apart from outer shell 102 as well as being formed of resilient material.
- Spring 108 includes an annular inner V-shaped ridge 108a, the inner leg thereof brazed to outer shell 102.
- An annular outer flange 108b extends radially outward from the V-shaped ridge 108a and is brazed to end cap 110.
- End cap 110 includes an outer annular wall 112 and an inner annular wall 114 with an annular gap 116 formed therebetween into which the open distal end 118 of outer shell 102 extends. Gap 116 is larger than the wall thickness of end 118 allowing end 118 to be spaced apart from the sides and bottom of gap 116, thereby forming a space or passageway around end 118 as depicted by gaps 116a, 116b and 116c to connect vacuum chamber 104 with inlet 39. This allows vacuum chamber 104 to be evacuated via inlet 39. Inlet 39 is brazed or welded to, and extends through the outer annular wall 112 of end cap 110. End cap 110 also includes a support plate 22 with holes 22a extending therethrough.
- An exit window 24 is bonded over support plate 22 to end cap 112 typically under heat and pressure or brazing or welding.
- a cover plate 120 having a central opening 120a covers and protects exit window 24.
- End cap 110 has a cooling passage 27 which is similar to that depicted in FIG. 2 .
- end cap 110 is depicted as a single piece, end cap 110 can alternatively be formed of multiple pieces.
- support plate 22 and annular wall 114 can be separate components.
- annular wall 114 can be omitted.
- Filament housing 30 is positioned within vacuum chamber 104 just below the closed proximal end 106 of outer shell 102. Electrical leads 26a/26b extend through and are sealed to end 106 of outer shell 102. Filament housing 30 and electron generator 31 are similar to that depicted in FIG. 2 . Although openings 35 are depicted in filament housing 30, alternatively openings 35 can be omitted.
- accelerator 130 is another preferred accelerator of the present invention.
- Accelerator 130 includes a metallic outer shell 122 surrounding a ceramic inner shell 124 having a smooth external surface.
- the open end 118 of inner shell 124 preferably extends to support plate 22 thereby forming an annular wall 136 of ceramic material between the vacuum chamber 134 and outer shell 122.
- distal end 118 can terminate before reaching support plate 22.
- Inner shell 124 has a frustoconical opening 124a extending through proximal end 119 opposite to distal end 118.
- An electrical lead 128 having a connector 138 extends through frustoconical hole 124a for providing power to filament housing 30 and electron generator 31 via electrical leads 26a/26b.
- Filament housing 30 and electron generator 31 are similar to that in accelerator 100 ( FIG. 12 ).
- Electrical lead 128 also extends through the central opening 126a of a flexible polymeric insulating plug 126.
- Insulating plug 126 includes a mating frustoconical outer surface 126b for sealing with the frustoconical hole 124a.
- a retaining cap 140 secured to outer shell 122 exerts a compressive axial force on plug 126 which compresses plug 126 against the converging surfaces of frustoconical hole 124a and squeezes plug 126 around electrical lead 128 for sealing between electrical lead 128 and inner shell 124.
- plug 126 is made of ethylene propylene rubber with an electrical resistance of 10 14 to 10 15 ohms-cm.
- inner shell 124 preferably has an electrical resistance of 10 14 ohms-cm.
- FIG. 14 depicts a preferred filament 32 for the electron generator 31 employed in accelerators 100 and 130 ( FIGs. 12 and 13 ).
- Filament 32 is formed with a series of curves into a generally W shape. This allows filament 32 to expand and contract during operation without requiring the support of resilient or spring-loaded components.
- the ends of filament 32 can be bent in a hair pin turn as shown in FIG. 14 for insertion through openings or slots within electrical leads 26a and 26b. If desired, more than one filament 32 can be employed.
- the holes 22a of support plate 22 within accelerators 100 and 130 can have a pattern of holes 142 that is filled or plugged such that the resultant electron beam emitted has a variable intensity profile across the beam.
- the holes 22a can be arranged within support plate 22 during manufacture to produce the desired pattern. Although a particular pattern 142 has been depicted, any desirable pattern can be formed.
- an extension nozzle 144 can be secured to accelerators 100 and 130 ( FIGs. 12 and 13 ). In such a situation, the exit window 24 would be positioned at the far end of nozzle 144. Nozzle 144 allows insertion within narrow openings such as cups and bottles for sterilization therein.
- the present invention electron accelerator is suitable for liquid, gas (such as air), or surface sterilization as well as for sterilizing medical products, food products, hazardous medical wastes and cleanup of hazardous wastes. Other applications include ozone production, fuel atomization and chemically bonding or grafting materials together.
- the present invention electron accelerator can be employed for curing inks, coatings, adhesives and sealants.
- materials such as polymers can be cross linked under the electron beam to improve structural properties.
- the series of openings 35 in the filament housings form a passive electrical field line shaper for shaping electrical field lines, in particular, a flattener for flattening electrical field lines.
- the term "passive" meaning that the electrical field lines are shaped without a separate extractor power supply.
- electrical field lines can be shaped by employing multiple filaments.
- partitions or passive electrodes can be positioned between the filaments for further shaping electrical field lines. Multiple filaments, partitions or passive electrodes can be employed as flatteners for flattening electrical field lines as well as other shapes.
- end caps and filament housings are preferably made of stainless steel, alternatively, other suitable metals can be employed such as titanium, copper or KOVAR®.
- End caps 16 and 20 are usually welded to outer shell 14 but alternatively can be brazed.
- the holes 22a in support plate 22 can be non-circular in shape such as slots.
- the dimensions of filaments 32 and the outer diameter of accelerator 10 can be varied depending upon the application at hand. Also, other suitable materials can be used for insulator 28 such as glass.
- the thickness of a titanium exit window is preferably under 12.5 microns (between 6 and 12 microns), the thickness of the exit window can be greater than 12.5 microns for certain applications if desired.
- high voltage power supply 49 should provide about 100 kv to 150 kv.
- the thickness of the exit window can be made thicker than a corresponding titanium exit window while achieving the same electron beam characteristics.
- the accelerators are preferably cylindrical in shape but can have other suitable shapes such as rectangular or oval cross sections. Once the present invention accelerator is made in large quantities to be made inexpensively, it can be used as a disposable unit. Receptacle 18 of accelerators 10 and 70 can be positioned perpendicular to longitudinal axis A for space constraint reasons.
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Abstract
Description
- Electron beams are used in many industrial processes such as for drying or curing inks, adhesives, paints and coatings. Electron beams are also used for liquid, gas and surface sterilization as well as to clean up hazardous waste.
- Conventional electron beam machines employed for industrial purposes include an electron beam accelerator which directs an electron beam onto the material to be processed. The accelerator has a large lead encased vacuum chamber containing an electron generating filament or filaments powered by a filament power supply. During operation, the vacuum chamber is continuously evacuated by vacuum pumps. The filaments are surrounded by a housing having a grid of openings which face a metallic foil electron beam exit window positioned on one side of the vacuum chamber. A high voltage potential is imposed between the filament housing and the exit window with a high voltage power supply. Electrons generated by the filaments accelerate from the filaments in an electron beam through the grid of openings in the housing and out through the exit window. An extractor power supply is typically included for flattening electric field lines in the region between the filaments and the exit window. This prevents the electrons in the electron beam from concentrating in the center of the beam as depicted in
graph 1 ofFIG. 1 , and instead, evenly disperses the electrons across the width of the beam as depicted ingraph 2 ofFIG. 1 . - The drawback of employing electron beam technology in industrial situations is that conventional electron beam machinery is complex and requires personnel highly trained in vacuum technology and accelerator technology for maintaining the machinery. For example, during normal use, both the filaments and the electron beam exit window foil must be periodically replaced. Such maintenance must be done on site because the accelerator is very large and heavy (typically 20 inches to 30 inches in diameter by 4 feet to 6 feet long and thousands of pounds).
- Replacement of the filaments and exit window requires the vacuum chamber to be opened, causing contaminants to enter. This results in long down times because once the filaments and exit window foil are replaced, the accelerator must be evacuated and then conditioned for high voltage operation before the accelerator can be operated. Conditioning requires the power from the high voltage power supply to be gradually raised over time to burn off contaminants within the vacuum chamber and on the surface of the exit window which entered when the vacuum chamber was opened. This procedure can take anywhere between two hours and ten hours depending on the extent of the contamination Half the time, leaks in the exit window occur which must be remedied, causing the time of the procedure to be further lengthened. Finally, every one or two years, a high voltage insulator in the accelerator is replaced, requiring disassembly of the entire accelerator. The time required for this procedure is about 2 to 4 days. As a result, manufacturing processes requiring election beam radiation can be greatly disrupted when filaments, electron beam exit window foils and high voltage insulators need to be replaced.
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WO98 129895 present claim 1. An electron accelerator with an electron beam exit window membrane is also disclosed inUS 5483074 . - The present invention provides an electron accelerator as defined in
present claim 1 and a method of manufacturing an electron accelerator as defined inpresent claim 10. - The present invention thereby provides a compact, less complex electron accelerator for an electron beam machine which allows the electon beam machine to be more easily maintained and does not require maintenance by personnel highly trained in vacuum technology and accelerator technology.
- In preferred embodiments, a series of openings in the housing forms the electrons permeable region. The exit window membrane is preferably formed of titanium foil between about 8 to 10 microns thick and is supported by a support plate having a series of holes therethrough which allow the electrons to pass through. The configuration of the holes in the support plate are arrangable to vary electron permeability across the support plate for providing the electron beam with a desired variable intensity profile. Topically, the exit window has an outer edge which is either brazed, welded or bonded to the vacuum chamber to provide a gas tight seal therebetween.
- The vacuum chamber includes an elongate ceramic member. In one preferred embodiments the elongate ceramic member is corrugated which allows higher voltages to be used. An annular spring member is coupled between the exit window and the corrugated ceramic member to compensate for different rates of expansion.
- In another preferred embodiment, the elongate ceramic member has a smooth surface and a metallic shell surrounds the ceramic member. The ceramic member includes a frustoconical hole which allows an electrical lead to extend through the frustoconical hole for supplying power to the electron generator. A flexible insulating plug surrounds the electrical lead and includes a frustoconical surface for sealing with the frustoconical hole. A retaining cap is secured to the shell for retaining the plug within the frustoconical bole.
- The present invention provides a compact replaceable modular electron beam accelerator. The entire accelerator is replaced when the filaments or the electron beam exit window require replacing, thus drastically reducing the down time of an electron beam machine. This also eliminates the need for personnel skilled in vacuum technology and electron accelerator technology for maintaining the machine. In addition, high voltage insulators do not need to be replaced on site. Furthermore, the inventive electron beam accelerator has less components and requires less power than conventional electron beam accelerators, making it less expensive, simpler, smaller and more efficient. The compact size of the accelerator makes it suitable for use in machines where space is limited such as in small printing presses, or for in line web sterilization and interstation curing.
- The foregoing and other objects, features and advantages of the invention will be apparent from the following more particular description of preferred embodiments of the invention, as illustrated in the accompanying drawings in which like reference characters refer to the same parts throughout the different views. The drawings are not necessarily to scale, emphasis instead being placed upon illustrating the principles of the invention.
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FIG. 1 is a graph depicting the distribution of electrons in a focused electron beam superimposed over a graph depicting the distribution of electrons in an electron beam where the electrons are uniformly distributed across the width of the beam. -
FIG. 2 is a side sectional schematic drawing of an electron beam accelerator not forming part of the present invention. -
FIG. 3 is a schematic drawing showing the power connections of the accelerator ofFIG. 2 . -
FIG. 4 is an end sectional view of the filament housing showing electric field lines. -
FIG. 5 is an end sectional view of the filament housing showing electric field lines if theside openings 35 are omitted. -
FIG. 6 is a plan view of a system incorporating more than one electron beam accelerator. -
FIG. 7 is a side sectional schematic drawing of the filament housing showing another preferred method of electrically connecting the filaments. -
FIG. 8 is a bottom sectional schematic drawing ofFIG. 7 . -
FIG. 9 is a schematic drawing of another preferred filament arrangement. -
FIG. 10 is another schematic drawing of still another preferred filament arrangement. -
FIG. 11 is a side sectional view of another electron beam accelerator not forming part of the present invention. -
FIG. 12 is a side-sectional view of a preferred electron beam accelerator according to the present invention -
FIG. 13 is a side-sectional view of another preferred electron beam accelerator according to the present invention -
FIG. 14 is a bottom view of yet another preferred filament arrangement. -
FIG. 15 is a plan view of a support plate with a pattern of holes filled to produce an electron beam with a variable intensity profile across the beam. -
FIG. 16 is a side view of an extension nozzle. - Referring to
FIGs. 2 and3 ,electron beam accelerator 10 not part of the present invention is a replaceable modular accelerator which is installed in an electron beam machine housing (not shown). Accelerator 10 includes an elongate generally cylindrical two pieceouter shell 14 which is sealed at both ends. The proximal end ofouter shell 14 is enclosed by aproximal end cap 16 which is welded toouter shell 14.Outer shell 14 andend cap 16 are each preferably made from stainless steel but alternatively can be made of other suitable metals. - The distal end of
accelerator 10 is enclosed by an electron beamexit window membrane 24 made of titanium foil which is brazed alongedge 23 to a stainless steeldistal end cap 20.End cap 20 is welded toouter shell 14.Exit window 24 is typically between about 6 to 12 microns thick with about 8 to 10 microns being the more preferred range. Alternatively,exit window 24 can be made of other suitable metallic foils such as magnesium, aluminum, beryllium or suitable non-metallic low density materials such as ceramics. In addition,exit window 24 can be welded or bonded to endcap 20. Arectangular support plate 22 having holes oropenings 22a for the passage of electrons therethrough is bolted to endcap 20 withbolts 22b and helps supportexit window 24.Support plate 22 is preferably made of copper for dissipating heat but alternatively can be made of other suitable metals such as stainless steel, aluminum or titanium. Theholes 22a withinsupport plate 22 are about 3.2mm (1/8 inch) in diameter and provide about an 80% opening for electrons to pass throughexit window 24.End cap 20 includes acooling passage 27 through which cooling fluid is pumped for cooling theend cap 20,support plate 22 andexit window 24. The cooling fluid enters inlet port 25a and exitsoutlet port 25b. The inlet 25a andoutlet 25b ports mate with coolant supply and return ports on the electron beam machine housing. The coolant supply and return ports include "0" ring seals for sealing to the inlet 25a andoutlet 25b ports.Accelerator 10 is about 0.30m (12 inches) in diameter by 0.51m (20 inches) long and about 23kg (50 pounds) in weight. - A high voltage electrical connecting
receptacle 18 for accepting theconnector 12 of a high voltage power cable is mounted to endcap 16. The high voltagecable supplies accelerator 10 with power from a highvoltage power supply 48 and afilament power supply 50. Highvoltage power supply 48 preferably provides about 100 kv but alternatively can be higher or lower depending upon the thickness ofexit window 24.Filament power supply 50 preferably provides about 15 volts. Twoelectrical leads 26a/26b extend downwardly fromreceptacle 18 through a disk-shaped high voltageceramic insulator 28 which dividesaccelerator 10 into an upper insulatingchamber 44 and alower vacuum chamber 46.Insulator 28 is bonded toouter shell 14 by first being brazed to anintermediate ring 29 made of material having an expansion coefficient similar to that ofinsulator 28 such as KOVAR®. Theintermediate ring 29 can then be brazed to theouter shell 14. Theupper chamber 44 is evacuated and then filled with an insulating medium such as SF6 gas but alternatively can be filled with oil or a solid insulating medium. The gaseous and liquid insulating media can be filled and drained through shut offvalve 42. - An
electron generator 31 is positioned withinvacuum chamber 46 and preferably consists of three 8 inch long filaments 32 (FIG. 4 ) made of tungsten which are electrically connected together in parallel. Alternatively, twofilaments 32 can be employed. Theelectron generator 31 is surrounded by a stainlesssteel filament housing 30.Filament housing 30 has a series of grid likeopenings 34 along a planar bottom 33 and a series ofopenings 35 along the four sides ofhousing 30. The filaments are preferably positioned withinhousing 30 about midway between bottom 33 and the top ofhousing 30.Openings 35 do not extend substantially abovefilaments 32. -
Electrical lead 26a andline 52 electrically connectfilament housing 30 to highvoltage power supply 48.Electrical lead 26b passes through ahole 30a infilament housing 30 to electrically connectfilaments 32 tofilament power supply 50. Theexit window 24 is electrically grounded to impose a high voltage potential betweenfilament housing 30 andexit window 24. - An
inlet 39 is provided onvacuum chamber 46 for evacuatingvacuum chamber 46.Inlet 39 includes a stainless steelouter pipe 36 which is welded toouter shell 14 and asealable copper tube 38 which is brazed topipe 36. Oncevacuum chamber 46 is evacuated,pipe 38 is cold welded under pressure to form aseal 40 for hermetically sealingvacuum chamber 46. - In use,
accelerator 10 is mounted to an electron beam machine, and electrically connected toconnector 12. The housing of the electron beam machine includes a lead enclosure which surroundsaccelerator 10.Filaments 32 are heated up to about 4200°F by electrical power from filament power supply 50 (AC or DC) which causes free electrons to form onfilaments 32. The high voltage potential between thefilament housing 30 andexit window 24 imposed by highvoltage power supply 48 causes thefree electrons 56 onfilaments 32 to accelerate from thefilaments 32 in anelectron beam 58 out throughopenings 34 inhousing 30 and the exit window 24 (FIG. 4 ). - The
side openings 35 create small electric fields around theopenings 35 which flatten the high voltageelectric field lines 54 between thefilaments 32 and theexit window 24 relative to the plane of the bottom 33 ofhousing 30. By flatteningelectric field lines 54,electrons 56 ofelectron beam 58exit housing 30 throughopenings 34 in a relatively straight manner rather than focusing towards a central location as depicted bygraph 1 ofFIG. 1 . This results in abroad electron beam 58 about 2 inches wide by 8 inches long having a profile which is similar to that ofgraph 2 ofFIG. 1 . The narrower higher density electron beam ofgraph 1 ofFIG. 1 is undesirable because it will burn a hole throughexit window 24. To further illustrate the function ofside openings 35,FIG. 5 depictshousing 30 withside openings 35 omitted. As can be seen, withoutside openings 35,electric field lines 54 arch upwardly. Sinceelectrons 56 travel about perpendicularly to theelectric field lines 54, theelectrons 56 are focused in anarrow electron beam 57. In contrast, as seen inFIG. 4 , theelectric field lines 54 are flat allowing theelectrons 56 to travel in a wider substantiallynon-focusing electron beam 58. Accordingly, while conventional accelerators need to employ an extractor power supply at high voltage to flatten the high voltage electric field lines for evenly dispersing the electrons across the electric beam, the present invention is able to accomplish the same results in a simple and inexpensive manner by means of theopenings 35. - When the
filaments 32 orexit window 24 need to be replaced, theentire accelerator 10 is simply disconnected from the electron beam machine housing and replaced with anew accelerator 10. Thenew accelerator 10 is already preconditioned for high voltage operation and, therefore, the down time of the electron beam machine is merely minutes. Since only one part needs to be replaced, the operator of the electron beam machine does not need to be highly trained in vacuum technology and accelerator technology maintenance. In addition,accelerator 10 is small enough and light enough in weight to be replaced by one person. - In order to recondition the
old accelerator 10, the old accelerator is preferably sent to another location such as a company specializing in vacuum technology. First, thevacuum chamber 46 is opened by removing theexit window 24 andsupport plate 22. Next,housing 30 is removed fromvacuum chamber 46 and thefilaments 32 are replaced. If needed, the insulating medium withinupper chamber 44 is removed throughvalve 42. Thehousing 30 is then remounted back invacuum chamber 46.Support plate 22 is bolted to endcap 20 andexit window 24 is replaced. Theedge 23 of thenew exit window 24 is brazed to endcap 20 to form a gas tight seal therebetween. Sinceexit window 24 covers thesupport plate 22,bolts 22b and bolt holes, it serves the secondary function of sealing over thesupport plate 22 without any leaks, "O"-rings or the like.Copper tube 38 is removed and anew copper tube 38 is brazed topipe 36. These operations are performed in a controlled clean air environment so that contamination within vacuum chamber and onexit window 24 are substantially eliminated. - By assembling
accelerator 10 within a clean environment, theexit window 24 can be easily made 8 to 10 microns thick or even as low as 6 microns thick. The reason for this is that dust or other contaminants are prevented from accumulating onexit window 24 between theexit window 24 and thesupport plate 22. Such contaminants will poke holes through anexit window 24 having a thickness under 12.5 microns. In contrast, electron beam exit windows in conventional accelerators must be 12.5 to 15 microns thick because they are assembled at the site in dusty conditions during maintenance. An exit window 12.5 to 15 microns thick is thick enough to prevent dust from perforating the exit window. Since the presentinvention exit window 24 is typically thinner than exit windows on conventional accelerators, the power required for accelerating electrons through theexit window 24 is considerably less. For example, about 150 kv is required in conventional accelerators for accelerating electrons through an exit window 12.5 to 15 microns thick. In contrast, in the present invention, only about 80 kv to 125 kv is required for an exit window about 8 to 10 microns thick. - As a result, for a comparable electron beam,
accelerator 10 is more efficient than conventional accelerators. In addition, the lower voltage also allows theaccelerator 10 to be more compact in size and allows a disk-shapedinsulator 28 to be used which is smaller than the cylindrical or conical insulators employed in conventional accelerators. Thereason accelerator 10 can be more compact then conventional accelerators is that the components ofaccelerator 10 can be closer together due to the lower voltage. The controlled clean environment withinvacuum chamber 46 allows the components to be even closer together. Conventional accelerators operate at higher voltages and have more contaminants within the accelerator which requires greater distances between components to prevent electrical arcing therebetween. In fact, contaminants from the vacuum pumps in conventional accelerators migrate into the accelerator during use. - The
vacuum chamber 46 is then evacuated throughinlet 39 andtube 38 is hermetically sealed by cold welding. Oncevacuum chamber 46 is sealed,vacuum chamber 46 remains under a permanent vacuum without requiring the use of an active vacuum pump. This reduces the complexity and cost of operating thepresent invention accelerator 10. Theaccelerator 10 is then preconditioned for high voltage operation by connecting theaccelerator 10 to an electron beam machine and gradually increasing the voltage to burn off any contaminants withinvacuum chamber 46 and onexit window 24. Any molecules remaining within thevacuum chamber 46 are ionized by the high voltage and/or electron beam and are accelerated towardshousing 30. The ionized molecules collide withhousing 30 and become trapped on the surfaces ofhousing 30, thereby further improving the vacuum. Thevacuum chamber 46 can also be evacuated while theaccelerator 10 is preconditioned for high voltage operation. Theaccelerator 10 is disconnected from the electron beam machine and stored for later use. -
FIG. 6 depicts asystem 64 including threeaccelerators product 62 withelectron beams 60. Since theelectron beam 60 of eachaccelerator accelerator 10b is staggered slightly to the side and backwards relative toaccelerators product 62 such that the ends of eachelectron beam 60 will line up with each other in the lateral direction. As a result, the movingproduct 62 can be accumulatively radiated by theelectron beams 60 in a step-like configuration as shown. Although three accelerators have been shown, alternatively, more than threeaccelerators 10 can be staggered to radiate wider products or only twoaccelerators 10 can be staggered to radiate narrower products. -
FIGs. 7 and 8 depict another preferred method of electrically connectingleads housing 30 andfilaments 32.Lead 26a is fixed to the top offilament housing 30. Threefilament brackets 102 extend downwardly from the top offilament housing 30. Afilament mount 104 is mounted to eachbracket 102. Aninsulation block 110 and afilament mount 108 are mounted to the opposite side offilament housing 30. Thefilaments 32 are mounted to and extend between filament mounts 104 and 108. Aflexible lead 106 electrically connects lead 26b tofilament mount 108.Filament brackets 102 have a spring-like action which compensate for the expansion and contraction offilaments 32 during use. Acylindrical bracket 112 supportshousing 30 instead ofleads 26a/26b. - Referring to
FIG. 9 ,filament arrangement 90 is another preferred method of electrically connecting multiple filaments together in order to increase the width of the electron beam over that provided by a single filament.Filaments 92 are positioned side-by-side and electrically connected in series to each other by electrical leads 94. - Referring to
FIG. 10 ,filament arrangement 98 depicts a series offilaments 97 which are positioned side-by-side and electrically connected together in parallel by two electrical leads 96.Filament arrangement 98 is also employed to increase the width of the electron beam. - Referring to
FIG. 11 ,accelerator 70 is another embodiment not forming part of the present invention.Accelerator 70 produces an electron beam which is directed at a 90° angle to the electron beam produced byaccelerator 10.Accelerator 70 differs fromaccelerator 10 in thatfilaments 78 are parallel to the longitudinal axis A of thevacuum chamber 88 rather than perpendicular to the longitudinal axis A. In addition,exit window 82 is positioned on theouter shell 72 of thevacuum chamber 88 and is parallel to the longitudinal axisA. Exit window 82 is supported by support plate 80 which is mounted to the side ofouter shell 72. Anelongated filament housing 75 surroundsfilaments 78 and includes aside 76 havinggrid openings 34 which are perpendicular to longitudinal axis A. Theside openings 35 infilament housing 75 are perpendicular toopenings 34. Anend cap 74 closes the end of thevacuum chamber 88.Accelerator 70 is suitable for radiating wide areas with an electron beam without employing multiple staggered accelerators and is suitable for use in narrow environments.Accelerator 70 can be made up to about 3 to 4 feet long and can be staggered to provide even wider coverage. - Referring to
FIG. 12 ,accelerator 100 is a preferred embodiment of the present invention.Accelerator 100 includes a generally cylindricalouter shell 102 formed of ceramic material having avacuum chamber 104 therein.Outer shell 102 has a closedproximal end 106 and an opendistal end 118 opposite thereof. The external surface ofouter shell 102 includes a series of corrugations 102a which allowsaccelerator 100 to run at higher voltages than ifouter shell 102 were smooth. Theopen end 118 has a region with a smooth outer surface. Ametallic end cap 110 surrounds and covers the smooth opendistal end 118 ofouter shell 102 to enclosevacuum chamber 104. -
End cap 110 is brazed to an intermediate annularmetallic spring 108 which in turn is brazed toouter shell 102, thereby sealingvacuum chamber 104.Spring 108 allows the ceramicouter shell 102 andend cap 110 to expand and contract at different rates in radial as well axial directions while maintaining a gas tight seal therebetween.Spring 108 accomplishes this by spacing theend cap 110 slightly apart fromouter shell 102 as well as being formed of resilient material.Spring 108 includes an annular inner V-shapedridge 108a, the inner leg thereof brazed toouter shell 102. An annularouter flange 108b extends radially outward from the V-shapedridge 108a and is brazed to endcap 110.End cap 110 includes an outerannular wall 112 and an innerannular wall 114 with anannular gap 116 formed therebetween into which the opendistal end 118 ofouter shell 102 extends.Gap 116 is larger than the wall thickness ofend 118 allowingend 118 to be spaced apart from the sides and bottom ofgap 116, thereby forming a space or passageway aroundend 118 as depicted bygaps vacuum chamber 104 withinlet 39. This allowsvacuum chamber 104 to be evacuated viainlet 39.Inlet 39 is brazed or welded to, and extends through the outerannular wall 112 ofend cap 110.End cap 110 also includes asupport plate 22 withholes 22a extending therethrough. Anexit window 24 is bonded oversupport plate 22 to endcap 112 typically under heat and pressure or brazing or welding. Acover plate 120 having a central opening 120a covers and protectsexit window 24.End cap 110 has acooling passage 27 which is similar to that depicted inFIG. 2 . Althoughend cap 110 is depicted as a single piece,end cap 110 can alternatively be formed of multiple pieces. For example,support plate 22 andannular wall 114 can be separate components. In addition, if desired,annular wall 114 can be omitted. -
Filament housing 30 is positioned withinvacuum chamber 104 just below the closedproximal end 106 ofouter shell 102. Electrical leads 26a/26b extend through and are sealed to end 106 ofouter shell 102.Filament housing 30 andelectron generator 31 are similar to that depicted inFIG. 2 . Althoughopenings 35 are depicted infilament housing 30, alternativelyopenings 35 can be omitted. - Referring to
FIG. 13 ,accelerator 130 is another preferred accelerator of the present invention.Accelerator 130 includes a metallicouter shell 122 surrounding a ceramicinner shell 124 having a smooth external surface. Theopen end 118 ofinner shell 124 preferably extends to supportplate 22 thereby forming anannular wall 136 of ceramic material between thevacuum chamber 134 andouter shell 122. Alternatively,distal end 118 can terminate before reachingsupport plate 22.Inner shell 124 has afrustoconical opening 124a extending throughproximal end 119 opposite todistal end 118. Anelectrical lead 128 having aconnector 138 extends throughfrustoconical hole 124a for providing power to filamenthousing 30 andelectron generator 31 viaelectrical leads 26a/26b.Filament housing 30 andelectron generator 31 are similar to that in accelerator 100 (FIG. 12 ).Electrical lead 128 also extends through thecentral opening 126a of a flexible polymericinsulating plug 126. Insulatingplug 126 includes a mating frustoconicalouter surface 126b for sealing with thefrustoconical hole 124a. A retainingcap 140 secured toouter shell 122 exerts a compressive axial force onplug 126 which compresses plug 126 against the converging surfaces offrustoconical hole 124a and squeezes plug 126 aroundelectrical lead 128 for sealing betweenelectrical lead 128 andinner shell 124. Preferably, plug 126 is made of ethylene propylene rubber with an electrical resistance of 1014 to 1015 ohms-cm. Additionally,inner shell 124 preferably has an electrical resistance of 1014 ohms-cm. -
FIG. 14 depicts apreferred filament 32 for theelectron generator 31 employed inaccelerators 100 and 130 (FIGs. 12 and13 ).Filament 32 is formed with a series of curves into a generally W shape. This allowsfilament 32 to expand and contract during operation without requiring the support of resilient or spring-loaded components. The ends offilament 32 can be bent in a hair pin turn as shown inFIG. 14 for insertion through openings or slots withinelectrical leads filament 32 can be employed. - Referring to
FIG. 15 , if desired, theholes 22a ofsupport plate 22 withinaccelerators 100 and 130 (FIGs. 12 and13 ) can have a pattern ofholes 142 that is filled or plugged such that the resultant electron beam emitted has a variable intensity profile across the beam. Alternatively, instead of filling or pluggingholes 22a, theholes 22a can be arranged withinsupport plate 22 during manufacture to produce the desired pattern. Although aparticular pattern 142 has been depicted, any desirable pattern can be formed. - Referring to
FIG. 16 , if desired, anextension nozzle 144 can be secured toaccelerators 100 and 130 (FIGs. 12 and13 ). In such a situation, theexit window 24 would be positioned at the far end ofnozzle 144.Nozzle 144 allows insertion within narrow openings such as cups and bottles for sterilization therein. - The present invention electron accelerator is suitable for liquid, gas (such as air), or surface sterilization as well as for sterilizing medical products, food products, hazardous medical wastes and cleanup of hazardous wastes. Other applications include ozone production, fuel atomization and chemically bonding or grafting materials together. In addition, the present invention electron accelerator can be employed for curing inks, coatings, adhesives and sealants. Furthermore, materials such as polymers can be cross linked under the electron beam to improve structural properties.
- The series of
openings 35 in the filament housings form a passive electrical field line shaper for shaping electrical field lines, in particular, a flattener for flattening electrical field lines. The term "passive" meaning that the electrical field lines are shaped without a separate extractor power supply. In addition, electrical field lines can be shaped by employing multiple filaments. Furthermore, partitions or passive electrodes can be positioned between the filaments for further shaping electrical field lines. Multiple filaments, partitions or passive electrodes can be employed as flatteners for flattening electrical field lines as well as other shapes. - While this invention has been particularly shown and described with references to preferred embodiments thereof, it will be understood by those skilled in the art that various changes in form and details may be made within the scope of the invention as defined by the appended claims.
- For example, although particular embodiments of the present invention have been described to include multiple filaments, alternatively, only one filament can be employed. In addition, although the outer shells (except ceramic outer shell 102), end caps and filament housings are preferably made of stainless steel, alternatively, other suitable metals can be employed such as titanium, copper or KOVAR®. End caps 16 and 20 are usually welded to
outer shell 14 but alternatively can be brazed. Theholes 22a insupport plate 22 can be non-circular in shape such as slots. The dimensions offilaments 32 and the outer diameter ofaccelerator 10 can be varied depending upon the application at hand. Also, other suitable materials can be used forinsulator 28 such as glass. Although the thickness of a titanium exit window is preferably under 12.5 microns (between 6 and 12 microns), the thickness of the exit window can be greater than 12.5 microns for certain applications if desired. For exit windows having a thickness above 12.5 microns, high voltage power supply 49 should provide about 100 kv to 150 kv. If exit windows made of materials which are lighter than titanium such as aluminum are employed, the thickness of the exit window can be made thicker than a corresponding titanium exit window while achieving the same electron beam characteristics. The accelerators are preferably cylindrical in shape but can have other suitable shapes such as rectangular or oval cross sections. Once the present invention accelerator is made in large quantities to be made inexpensively, it can be used as a disposable unit.Receptacle 18 ofaccelerators
Claims (16)
- An electron accelerator comprising:a vacuum vessel comprising a vacuum chamber (104,134) therein;an electron beam exit window membrane (24) being formed of metallic foil (24) bonded in metal to metal contact with the vacuum vessel to provide a gas tight seal therebetween, the vacuum chamber being hermetically sealed to preserve a permanent self sustained vacuum therein;an electron generator (31) positioned in the vacuum chamber for generating electron; anda housing (30) surrounding the electron generator, the housing having an electron permeable region formed in the housing between the electron generator and the exit window membrane or allowing electrons to accelerate from the electron generator out the exit window membrane in an electron beam when a voltage potential is applied between the housing and the exit window membrane, characterized in that the vacuum vessel comprises an elongate ceramic member (102, 124) having a continuous ceramic annular wall portion with an open end,the electron beam exit window membrane (24) covers the open end and is supported by a support plate (22) and wherein the exit window membrane is over the support plate, and wherein the electron generator (31) positioned in the vacuum chamber is positioned within the continuous ceramic annular wall portion of the vacuum vessel.
- The accelerator of Claim 1 in which the elongate ceramic member is corrugated.
- The accelerator of Claim 2 further comprising an annular spring member (108) bonded to and between the exit window membrane and the ceramic member.
- The accelerator of Claim 1 in which the vacuum vessel further comprises a metallic shell (122) surrounding the ceramic member.
- The accelerator of Claim 4 in which the ceramic member includes a frustoconical hole (126a), the accelerator further comprising:an electrical lead (128) extending through the frustoconical hole for supplying power to the electron generator;a flexible insulating plug (126) surrounding the electrical lead, the plug including a frustoconical surface for sealing with the frustoconical hole; anda retaining cap (140) secured to the shell for retaining the plug within the frustoconical hole.
- The accelerator of Claim 1 in which the electron permeable region comprises a series of openings in the housing,
- The accelerator of Claim 1 in which the exit window membrane is formed of titanium foil having a thickness of between 8 to 10 microns.
- The accelerator of Claim 1 wherein the support plate (22) has a series of holes therethrough for allowing the electrons to pass through, the configuration of the holes being arrangable to select electrons permeability across the support plate for providing the electron beam with a variable intensity profile.
- The accelerator at claim 1 in which the exit window membrane is formed of titanium foil having a thickness of less than 12.5 microns.
- A method of assembling an electron accelerator comprising the steps of:providing a vacuum vessel comprising a vaccuum chamber (104, 134) therein and providing an electron beam exit window membrane being formed of metallic foil bonded in metal to metal contact with the vacuum vessel to provide a gas tight seal therebetween,the vacuum chamber being hermetically sealed to preserve a self sustained vacuum therein;providing an electron generator (31) positioned within the vacuum chamber; andsurrounding the electron generator with a housing (30), the housing having an electron permeable region formed in the housing between the electron generator and the exit window membrane for allowing electrons to accelerate from the electron generator out the exit window membrane in an electron beam when a voltage potential is applied between the housing and the exit window membrane, characterized in that the vacuum vessel comprises an elongate ceramic member (102, 124) having a continuous ceramic annular wall portion with an open end, the electron beam exit window membrane covering the open end and being supported by a support plate (22); and wherein the exit window membrane is over the support plate, and wherein the electron generator positioned in the vacuum chamber is positioned within the continuous ceramic annular wall portion of the vacuum vessel.
- The method of Claim (10) further comprising the step of providing the elongate ceramic member with corrugations.
- The method of Claim 11 further comprising the step of bonding an annular spring member (108) to and between the exit window membrane and the ceramic member.
- The method of Claim 10 further comprising the step of surrounding the ceramic member with a metallic shell (122).
- The method of Claim 13 in which the ceramic member includes a frustoconical hole(126a), the method further comprising the steps of:extending an electrical lead (128) through the frustoconical hole for supplying power to the electron generator;surrounding the electrical lead with a flexible insulating plug (126), the plug including a frustoconical surface for sealing with the frustoconical hole; andretaining the plug within the frustoconical hole with retaining cap (140) secured to the shell.
- The method of Claim 10, wherein the support plate has a series of holes therethrough for allowing the electrons to pass through, the configuration of the holes being arrangable to select electron permeability across the support plate for providing the electron beam with a variable intensity profile.
- The method at Claim 10 wherein the exit window membrane is formed of titanium foil having a thickness of less than 12.5 microns.
Priority Applications (1)
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EP10169963.5A EP2239755A3 (en) | 1999-07-09 | 2000-06-28 | Electron Beam Accelerator |
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US09/349,592 US6407492B1 (en) | 1997-01-02 | 1999-07-09 | Electron beam accelerator |
US349592 | 1999-07-09 | ||
PCT/US2000/017816 WO2001004924A1 (en) | 1999-07-09 | 2000-06-28 | Electron beam accelerator |
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EP00943252A Expired - Lifetime EP1194944B1 (en) | 1999-07-09 | 2000-06-28 | Electron beam accelerator |
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EP (2) | EP2239755A3 (en) |
JP (1) | JP4808879B2 (en) |
CN (1) | CN1369105A (en) |
AT (1) | ATE496387T1 (en) |
AU (1) | AU5774800A (en) |
BR (1) | BR0013191A (en) |
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JPH10232290A (en) * | 1997-02-20 | 1998-09-02 | Japan Atom Energy Res Inst | Manufacture of ceramics bellows |
JPH1130700A (en) * | 1997-05-15 | 1999-02-02 | Toyo Ink Mfg Co Ltd | Pattern forming method and pattern formed material |
-
2000
- 2000-06-28 JP JP2001509058A patent/JP4808879B2/en not_active Expired - Lifetime
- 2000-06-28 DE DE60045551T patent/DE60045551D1/en not_active Expired - Lifetime
- 2000-06-28 CN CN00811336A patent/CN1369105A/en active Pending
- 2000-06-28 EP EP10169963.5A patent/EP2239755A3/en not_active Ceased
- 2000-06-28 WO PCT/US2000/017816 patent/WO2001004924A1/en active Application Filing
- 2000-06-28 AT AT00943252T patent/ATE496387T1/en active
- 2000-06-28 AU AU57748/00A patent/AU5774800A/en not_active Abandoned
- 2000-06-28 EP EP00943252A patent/EP1194944B1/en not_active Expired - Lifetime
- 2000-06-28 BR BR0013191-1A patent/BR0013191A/en active Search and Examination
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US5483074A (en) * | 1995-01-11 | 1996-01-09 | Litton Systems, Inc. | Flood beam electron gun |
Also Published As
Publication number | Publication date |
---|---|
AU5774800A (en) | 2001-01-30 |
BR0013191A (en) | 2002-04-30 |
JP4808879B2 (en) | 2011-11-02 |
CN1369105A (en) | 2002-09-11 |
WO2001004924A1 (en) | 2001-01-18 |
EP1194944A1 (en) | 2002-04-10 |
JP2003504605A (en) | 2003-02-04 |
DE60045551D1 (en) | 2011-03-03 |
ATE496387T1 (en) | 2011-02-15 |
EP2239755A2 (en) | 2010-10-13 |
EP2239755A3 (en) | 2015-11-25 |
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