EP1192641A2 - System for manufacturing semiconductor products - Google Patents

System for manufacturing semiconductor products

Info

Publication number
EP1192641A2
EP1192641A2 EP00940172A EP00940172A EP1192641A2 EP 1192641 A2 EP1192641 A2 EP 1192641A2 EP 00940172 A EP00940172 A EP 00940172A EP 00940172 A EP00940172 A EP 00940172A EP 1192641 A2 EP1192641 A2 EP 1192641A2
Authority
EP
European Patent Office
Prior art keywords
plant according
transport container
carrier
gantry crane
transport
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP00940172A
Other languages
German (de)
French (fr)
Inventor
Ronald Huber
Rolf-Arno KLÄBSCH
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Infineon Technologies AG
Original Assignee
Infineon Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG filed Critical Infineon Technologies AG
Publication of EP1192641A2 publication Critical patent/EP1192641A2/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67733—Overhead conveying

Definitions

  • the invention relates to a system for the production of semiconductor products according to the preamble of claim 1.
  • Such systems can be designed in particular as a system for processing fields (DE 37 35 449 AI, US 5 803 932, US 5 443 346). These systems include a large number of manufacturing units with which different manufacturing processes are carried out. These manufacturing processes are, in particular, etching processes, wet chemical processes, diffusion processes and various cleaning processes such as, for example, C P process (Chemical Mechanical Polishing). One or more production units are provided for each of these processes.
  • the entire manufacturing process is subject to strict cleanliness requirements, so that the manufacturing units are arranged in a clean room or in a system of clean rooms.
  • the wafers are fed into the individual production units in cassettes in predetermined lot sizes via a transport system.
  • the cassettes are also transported away after processing these wafers via the transport system.
  • the transport system typically has a conveyor system which is designed, for example, in the form of roller conveyors.
  • the cassettes with the wafers are transported lying on the roller conveyors.
  • Such conveyor systems run in a line through the clean room.
  • the conveyor systems branch out in a suitable manner. This creates a more or less closed network of roller conveyors inside the clean room.
  • Handling systems can also be provided for loading and unloading the production units, which remove the cassettes from the roller conveyors or put them back on after processing.
  • a disadvantage of such transport systems is that a very large installation effort is necessary in order to obtain at least an approximately nationwide supply of cassettes in the clean room.
  • the network of roller conveyors must have a large number of branches. This means not only considerable material costs, since the roller conveyors have a large overall length in the entire clean room. The control effort for the network of roller conveyors is also considerable.
  • the manufacturing units are typically positioned according to the positions of the roller conveyors. This can lead to individual production units not being able to be arranged in a function-related manner to one another. Another disadvantage is that changes and extensions can only be carried out with great effort in such arrangements.
  • the object of the invention is to create a transport system for a system of the type mentioned at the outset, which ensures a supply of the production units with semiconductor products that is as extensive as possible.
  • the transport system for supplying the semiconductor products to the production units is designed as a gantry crane system which has at least one transport container which is guided above the production units and can be lowered towards the production units.
  • the gantry crane system or an arrangement of gantry crane systems is designed so that the transport container or containers can be moved over the entire clean room above the production units. As soon as a transport container is positioned above a production unit which is to be supplied with semiconductor products, the transport container is lowered precisely in front of the production unit, so that the semiconductor products can be removed from the transport container and fed directly to the production unit.
  • the main advantage of the transport system according to the invention is that the transport containers can be moved above the production units without being guided and can be lowered at any position in the clean room for loading or unloading the semiconductor products.
  • the installation effort for such a transport system is very low, which results in a reduction in the operating costs of the system.
  • Another advantage is that the transport containers can be positioned anywhere in the clean room. The transport times are very short due to the direct feeding of the transport container above the production units.
  • the production units can be arranged in the clean room according to their functionalities, regardless of the transport system. Likewise, changes in the arrangement of the production units in the clean room can be carried out in a simple manner, regardless of the transport system.
  • Figure 1 Top view of a system for processing wafers in a schematic representation.
  • FIG. 2 longitudinal section through the installation according to FIG. 1
  • FIGS. 1 and 2 schematically show a system for manufacturing semiconductor products, which in the present exemplary embodiment is a system for processing wafers.
  • a multiplicity of manufacturing units 2 are arranged in a clean room 1.
  • FIG. 1 shows only eight such manufacturing units 2.
  • the production units 2 can also be distributed over several clean rooms 1.
  • the manufacturing processes include in particular etching processes, wet chemical processes, diffusion processes and cleaning processes.
  • One or more manufacturing units 2 are provided for all manufacturing processes.
  • the manufacturing units 2 are installed in predetermined positions on the floor 3 of the clean room 1.
  • the production units 2 are operated by operating personnel via operating units (not shown).
  • the production units 2 each have a loading and unloading station 4, via which the wafers to be processed are introduced into the production unit 2 and removed therefrom after the processing.
  • the wafers are stored in cassettes and fed to the production units 2 via a transport system.
  • the transport system shown in the drawings consists of a gantry crane system.
  • the gantry crane system has two crane tracks 5 running above the production units 2.
  • the crane tracks 5 are each supported on supporting pillars 6, which are anchored in the floor 3 of the clean room 1.
  • two pillars 6 are shown, which carry a crane runway 5.
  • several support pillars 6 can also be provided.
  • the crane tracks 5 can also be attached to the ceiling of the clean room 1 as a suspended structure.
  • the crane tracks 5 run parallel to each other at a predetermined distance and each have the same length.
  • the crane tracks 5 are arranged opposite one another at a short distance from the longitudinal inner walls of the essentially rectangular clean room 1 and extend essentially over the entire length of the clean room 1.
  • a carrier 7 running transversely to the crane tracks 5 is mounted so that it can be moved in the crane tracks 5 with its longitudinal ends.
  • a transport container 8 for holding cassettes with wafers is fastened to the carrier 7, the transport container 8 being arranged to be movable in the longitudinal direction of the carrier 7.
  • Each running gear 9 expediently has a predetermined number of wheels or rollers, not shown. These rollers or wheels are guided in the crane tracks 5 in rail guides, also not shown.
  • the transport container 8 is fastened via a holding device 10, which can be extended in the vertical direction, to a chassis 11, which is movably mounted on the carrier 7.
  • the Holding device 10 can in particular have an extendable linkage or the like.
  • the chassis 11 on the carrier 7 also preferably has a predetermined number of rollers or wheels, not shown, which can be moved in the rail 7 in a rail guide, also not shown.
  • the transport container 8 can be moved along the carrier 7 by means of the chassis 11, and the transport container 8 can be moved in the vertical direction by means of the holding device 10.
  • a pivoting device 12 is provided between the holding device 10 and the transport container 8, by means of which the transport container 8 can be moved in the horizontal direction with respect to the holding device 10 for fine positioning.
  • NC controls are connected to a central control, also not shown, which takes over the overall control of the gantry crane system. Alternatively or additionally, individual functions of the control can be operated manually if required.
  • the gantry crane system according to the invention can be used to quickly and easily supply wafers to any production units 2 in the clean room 1.
  • the transport container 8 is filled with cassettes, in which wafers are located, from a storage, conveyor belt or the like (not shown).
  • the carrier 7 is then moved on the crane tracks 5 until it is at the level of the production unit 2 to be supplied.
  • the transport container 8 is moved above the production units 2. In this way, the transport of the wafers is not hindered by the arrangement of the manufacturing units 2.
  • the transport container 8 is then moved along the carrier 7 until the transport container 8 is above the production unit 2 to be supplied.
  • the carrier 7 and the transport container 8 can be moved simultaneously.
  • the transport container 8 Only after the transport container 8 is positioned above the production unit 2 to be supplied is the transport container 8 lowered by extending the holding device 10 until the transport container 8 is located directly in front of the loading and unloading station 4 of the production unit 2. During this lowering process of the transport container 8, fine positioning can also be carried out at the same time by automatic or manual activation of the swivel device 12. The wafers are then transported away in a corresponding manner.
  • the system can be supplied with wafers area-wide, the movement of the transport container 8 to the respective production unit 2 running above all production units 2, so that there is no positive guidance during the travel path of the transport container 8.
  • Encapsulations are used.
  • the trolleys 9, 11 preferably also have an encapsulation.
  • materials that do not outgas are expediently used for the moving parts of the trolleys 9, 11, in particular for the rollers or wheels, and for the support surfaces on the crane tracks 5 and on the support 7, on which the trolleys 9, 11 are guided and which are very abrasion resistant.
  • Particularly resistant plastics are particularly suitable for this.
  • the wafers are transported by means of a gantry crane system which extends over the entire clean room 1.
  • the floor plan of a clean room 1 can be designed not only at right angles, but also at an angle.
  • one or more storage systems for wafers such as stockers
  • These stores then form links between the individual gantry crane systems, since the transport containers 8 for loading and unloading wafers can be positioned thereon.
  • the gantry crane system can be expanded such that a plurality of carriers 7 with a transport container 8 are arranged to be movable on the crane tracks 5 of a gantry crane system.
  • the supports 7 are expediently arranged to be separately movable on the gantry crane system, the coordination of the travel paths being taken over by the central control.
  • the gantry crane system can be expanded such that a plurality of transport containers 8 arranged one behind the other are arranged to be movable on a carrier 7.
  • the transport containers 8 can then be positioned individually on different production units 2 or storage systems for loading and unloading.
  • the travel paths of the transport containers 8 are expediently coordinated on a carrier 7 via the central control.

Abstract

The invention relates to a system for manufacturing semiconductor products in at least one clean room (1). A gantry crane system is provided as a transport system for conveying the semiconductor products to the manufacturing units (2). Said gantry crane system has at least one transport container (8), which is guided above the manufacturing units (2) and can be lowered down to said manufacturing units (2).

Description

Beschreibungdescription
Anlage zur Fertigung von HalbleiterproduktenPlant for the production of semiconductor products
Die Erfindung betrifft eine Anlage zur Fertigung von Halbleiterprodukten gemäß dem Oberbegriff des Anspruchs 1.The invention relates to a system for the production of semiconductor products according to the preamble of claim 1.
Derartige Anlagen können insbesondere als Anlage zur Bearbeitung von afern ausgebildet sein (DE 37 35 449 AI, US 5 803 932, US 5 443 346) . Diese Anlagen umfassen eine Vielzahl von Fertigungseinheiten, mit welchen unterschiedliche Fertigungsprozesse durchgeführt werden. Bei diesen Fertigungsprozessen handelt es sich insbesondere um Ätzprozesse, Naßchemieverfahren, Diffusionsprozesse sowie diverse Reinigungsverfahren wie zum Beispiel C P-Verfahren (Chemical Mechanical Polishing) . Für jeden dieser Prozesse sind eine oder mehrere Fertigungseinheiten vorgesehen.Such systems can be designed in particular as a system for processing fields (DE 37 35 449 AI, US 5 803 932, US 5 443 346). These systems include a large number of manufacturing units with which different manufacturing processes are carried out. These manufacturing processes are, in particular, etching processes, wet chemical processes, diffusion processes and various cleaning processes such as, for example, C P process (Chemical Mechanical Polishing). One or more production units are provided for each of these processes.
Der gesamte Fertigungsprozeß unterliegt strengen Reinheitsan- forderungen, so daß die Fertigungseinheiten in einem Reinraum oder in einem System von Reinräumen angeordnet sind.The entire manufacturing process is subject to strict cleanliness requirements, so that the manufacturing units are arranged in a clean room or in a system of clean rooms.
Die Wafer werden in Kassetten in vorbestimmten Losgrößen über ein Transportsystem den einzelnen Fertigungseinheiten zuge- führt. Auch der Abtransport der Kassetten nach Bearbeitung dieser Wafer erfolgt über das TransportSystem.The wafers are fed into the individual production units in cassettes in predetermined lot sizes via a transport system. The cassettes are also transported away after processing these wafers via the transport system.
Das Transportsystem weist typischerweise ein Fördersystem auf, welches beispielsweise in Form von Rollenförderern aus- gebildet ist. Die Kassetten mit den Wafern werden dabei auf den Rollenförderern aufliegend transportiert.The transport system typically has a conveyor system which is designed, for example, in the form of roller conveyors. The cassettes with the wafers are transported lying on the roller conveyors.
Derartige Fördersysteme verlaufen linienförmig durch den Reinraum. Um die Zuführung der Kassetten mit den Wafern zu den Fertigungseinheiten zu gewährleisten, verzweigen die Fördersysteme in geeigneter Weise. Auf diese Weise entsteht ein mehr oder weniger geschlossenes Netzwerk von Rollenförderern innerhalb des Reinraums. Zur Be- und Entladung der Fertigungseinheiten können zudem Handlingssyteme vorgesehen sein, welche die Kassetten von den Rollenförderern abnehmen oder nach Bearbeitung wieder auf diese auflegen.Such conveyor systems run in a line through the clean room. In order to ensure the supply of the cassettes with the wafers to the production units, the conveyor systems branch out in a suitable manner. This creates a more or less closed network of roller conveyors inside the clean room. Handling systems can also be provided for loading and unloading the production units, which remove the cassettes from the roller conveyors or put them back on after processing.
Nachteilig bei derartigen Transportsystemen ist, daß ein sehr großer Installationsaufwand notwendig ist, um wenigstens eine annähernd flächendeckende Versorgung von Kassetten im Reinraum zu erhalten. Das Netzwerk von Rollenförderern muß hierzu eine Vielzahl von Verzweigungen aufweisen. Dies bedeutet, nicht nur erhebliche Materialkosten, da die Rollenförderer im gesamten Reinraum eine große Gesamtlänge aufweisen. Vielmehr ist auch der Steuerungsaufwand für das Netzwerk der Rollenförderer erheblich.A disadvantage of such transport systems is that a very large installation effort is necessary in order to obtain at least an approximately nationwide supply of cassettes in the clean room. For this purpose, the network of roller conveyors must have a large number of branches. This means not only considerable material costs, since the roller conveyors have a large overall length in the entire clean room. The control effort for the network of roller conveyors is also considerable.
Doch selbst wenn das Netzwerk der Rollenförderer fein verzweigt ausgelegt ist, gelingt dennoch keine flächendeckende Versorgung von Kassetten im Reinraum.But even if the network of roller conveyors is finely branched, there is still no comprehensive supply of cassettes in the clean room.
Um diesem Nachteil zu begegnen, werden die Fertigungseinheiten typischerweise entsprechend der Lagen der Rollenförderer positioniert. Dies kann dazu führen, daß einzelne Fertigungseinheiten nicht funktionsgerecht zueinander angeordnet werden können. Zudem ist nachteilig, daß bei derartigen Anordnungen Änderungen und Erweiterung nur mit großem Aufwand durchgeführt werden können.To counter this disadvantage, the manufacturing units are typically positioned according to the positions of the roller conveyors. This can lead to individual production units not being able to be arranged in a function-related manner to one another. Another disadvantage is that changes and extensions can only be carried out with great effort in such arrangements.
Der Erfindung liegt die Aufgabe zugrunde, für eine Anlage der eingangs genannten Art ein Transportsystem zu schaffen, wel- ches eine möglichst flächendeckende Versorgung der Fertigungseinheiten mit Halbleiterprodukten gewährleistet .The object of the invention is to create a transport system for a system of the type mentioned at the outset, which ensures a supply of the production units with semiconductor products that is as extensive as possible.
Zur Lösung dieser Aufgabe sind die Merkmale des Anspruchs 1 vorgesehen. Vorteilhafte Ausführungsformen und zweckmäßige Weiterbildungen der Erfindung sind in den Unteransprüchen beschrieben. Erfindungsgemäß ist das Transportsystem für die Zuführung der Halbleiterprodukte zu den Fertigungseinheiten als Portalkrananlage ausgebildet, welche wenigstens einen oberhalb der Fertigungseinheiten geführten und zu den Fertigungseinheiten hin absenkbaren Transportbehälter aufweist.The features of claim 1 are provided to achieve this object. Advantageous embodiments and expedient developments of the invention are described in the subclaims. According to the invention, the transport system for supplying the semiconductor products to the production units is designed as a gantry crane system which has at least one transport container which is guided above the production units and can be lowered towards the production units.
Dabei ist die Portalkrananlage oder eine Anordnung von Portalkrananlagen so ausgelegt, daß damit der oder die Transportbehälter über den gesamten Reinraum oberhalb der Ferti- gungseinheiten verfahrbar sind. Sobald ein Transportbehälter oberhalb einer Fertigungseinheit, welche mit Halbleiterprodukten zu versorgen ist, positioniert ist, wird der Transportbehälter positionsgenau vor der Fertigungseinheit abgesenkt, so daß die Halbleiterprodukte aus dem Transportbehäl- ter entnommen und unmittelbar der Fertigungseinheit zugeführt werden können.The gantry crane system or an arrangement of gantry crane systems is designed so that the transport container or containers can be moved over the entire clean room above the production units. As soon as a transport container is positioned above a production unit which is to be supplied with semiconductor products, the transport container is lowered precisely in front of the production unit, so that the semiconductor products can be removed from the transport container and fed directly to the production unit.
Der wesentliche Vorteil des erfindungsgemäßen Transportsystems besteht darin, daß die Transportbehälter ohne Zwangsfüh- rung oberhalb der Fertigungseinheiten verfahrbar sind und an beliebigen Positionen im Reinraum zur Beladung oder Entladung der Halbleiterprodukte absenkbar sind.The main advantage of the transport system according to the invention is that the transport containers can be moved above the production units without being guided and can be lowered at any position in the clean room for loading or unloading the semiconductor products.
Der Installationsaufwand für ein derartiges Transportsystem ist dabei sehr gering, wodurch eine Senkung der Betriebskosten der Anlage erzielt wird. Ein weiterer Vorteil ist, daß die Transportbehälter an beliebigen Orten im Reinraum positionierbar sind. Dabei sind die Transportzeiten durch die direkte Zuführung des Transportbehälters oberhalb der Ferti- gungseinheiten sehr gering.The installation effort for such a transport system is very low, which results in a reduction in the operating costs of the system. Another advantage is that the transport containers can be positioned anywhere in the clean room. The transport times are very short due to the direct feeding of the transport container above the production units.
Schließlich ist vorteilhaft, daß die Fertigungseinheiten entsprechend ihrer Funktionalitäten unabhängig vom Transportsystem im Reinraum angeordnet werden können. Ebenso sind auch Veränderungen der Anordnung der Fertigungs- einheiten im Reinraum unabhängig vom Transportsystem auf einfache Weise durchführbar.Finally, it is advantageous that the production units can be arranged in the clean room according to their functionalities, regardless of the transport system. Likewise, changes in the arrangement of the production units in the clean room can be carried out in a simple manner, regardless of the transport system.
Die Erfindung wird im nachstehenden anhand der Zeichnungen erläutert. Es zeigen:The invention is explained below with reference to the drawings. Show it:
Figur 1: Draufsicht auf eine Anlage zur Bearbeitung von Wafern in schematischer Darstellung.Figure 1: Top view of a system for processing wafers in a schematic representation.
Figur 2 : Längsschnitt durch die Anlage gemäß Figur 1FIG. 2: longitudinal section through the installation according to FIG. 1
In den Figuren 1 und 2 ist schematisch eine Anlage zur Fertigung von Halbleiterprodukten dargestellt, wobei es sich im vorliegenden Ausführungsbeispiel um eine Anlage zur Bearbeitung von Wafern handelt . Zur Durchführung der für die Bearbeitung der Wafer erforderlichen Fertigungsprozesse sind in einem Reinraum 1 eine Vielzahl von Fertigungseinheiten 2 angeordnet. In Figur 1 sind der Übersichtlichkeit halber nur acht derartige Fertigungseinheiten 2 dargestellt. Alternativ können die Fertigungseinheiten 2 auch auf mehrere Reinräume 1 verteilt sein.FIGS. 1 and 2 schematically show a system for manufacturing semiconductor products, which in the present exemplary embodiment is a system for processing wafers. To carry out the manufacturing processes required for processing the wafers, a multiplicity of manufacturing units 2 are arranged in a clean room 1. For the sake of clarity, FIG. 1 shows only eight such manufacturing units 2. Alternatively, the production units 2 can also be distributed over several clean rooms 1.
Die Fertigungsprozesse umfassen insbesondere Ätzprozesse, Naßchemieverfahren, Diffusionsprozesse sowie Reinigungsverfahren. Für sämtliche Fertigungsprozesse sind eine oder mehrere Fertigungseinheiten 2 vorgesehen.The manufacturing processes include in particular etching processes, wet chemical processes, diffusion processes and cleaning processes. One or more manufacturing units 2 are provided for all manufacturing processes.
Die Fertigungseinheiten 2 sind in vorgegebenen Positionen auf dem Boden 3 des Reinraums 1 installiert. Die Fertigungseinheiten 2 werden über nicht dargestellte Bedieneinheiten vom Bedienpersonal bedient. Zudem weisen die Fertigungseinheiten 2 jeweils eine Be- und Entladestation 4 auf, über welche die zu bearbeitenden Wafer in die Fertigungseinheit 2 eingeführt und nach der Bearbeitung wieder aus dieser entnommen werden. Die Wafer werden in Kassetten gelagert über ein Transportsystem den Fertigungseinheiten 2 zugeführt . Das in den Zeichnungen dargestellte Transportsystem besteht aus einer Portal- krananlage. Die Portalkrananlage weist zwei oberhalb der Fer- tigungseinheiten 2 verlaufende Kranbahnen 5 auf. Die Kranbahnen 5 sind jeweils auf Stützpfeilern 6 gelagert, welche im Boden 3 des Reinraums 1 verankert sind. In Figur 2 sind zwei Stützpfeiler 6 dargestellt, welche eine Kranbahn 5 tragen. Je nach Länge der Kranbahn 5 können auch mehrere Stützpfeiler 6 vorgesehen sein. Alternativ können die Kranbahnen 5 auch als Hängekonstruktion an der Decke des Reinraums 1 befestigt sein.The manufacturing units 2 are installed in predetermined positions on the floor 3 of the clean room 1. The production units 2 are operated by operating personnel via operating units (not shown). In addition, the production units 2 each have a loading and unloading station 4, via which the wafers to be processed are introduced into the production unit 2 and removed therefrom after the processing. The wafers are stored in cassettes and fed to the production units 2 via a transport system. The transport system shown in the drawings consists of a gantry crane system. The gantry crane system has two crane tracks 5 running above the production units 2. The crane tracks 5 are each supported on supporting pillars 6, which are anchored in the floor 3 of the clean room 1. In Figure 2, two pillars 6 are shown, which carry a crane runway 5. Depending on the length of the crane runway 5, several support pillars 6 can also be provided. Alternatively, the crane tracks 5 can also be attached to the ceiling of the clean room 1 as a suspended structure.
Die Kranbahnen 5 verlaufen in vorgegebenem Abstand parallel zueinander und weisen jeweils dieselbe Länge auf. Dabei sind die Kranbahnen 5 einander gegenüberliegend in geringem Abstand zu den längsseitigen Innenwänden des im wesentlichen rechteckigen Reinraums 1 angeordnet und erstrecken sich im wesentlichen über die gesamte Länge des Reinraums 1.The crane tracks 5 run parallel to each other at a predetermined distance and each have the same length. The crane tracks 5 are arranged opposite one another at a short distance from the longitudinal inner walls of the essentially rectangular clean room 1 and extend essentially over the entire length of the clean room 1.
Ein quer zu den Kranbahnen 5 verlaufender Träger 7 ist mit seinen längsseitigen Enden in den Kranbahnen 5 verfahrbar gelagert. Am Träger 7 ist ein Transportbehälter 8 zur Aufnahme von Kassetten mit Wafern befestigt, wobei der Transportbehäl- ter 8 in Längsrichtung des Trägers 7 verfahrbar angeordnet ist .A carrier 7 running transversely to the crane tracks 5 is mounted so that it can be moved in the crane tracks 5 with its longitudinal ends. A transport container 8 for holding cassettes with wafers is fastened to the carrier 7, the transport container 8 being arranged to be movable in the longitudinal direction of the carrier 7.
Zur Führung des Trägers 7 in den Kranbahnen 5 ist an den längsseitigen Enden des Trägers 7 jeweils ein Fahrwerk 9 vor- gesehen. Zweckmäßigerweise weist jedes Fahrwerk 9 eine vorgegebene Anzahl von nicht dargestellten Rädern oder Rollen auf. Diese Rollen oder Räder sind in ebenfalls nicht dargestellten Schienenführungen in den Kranbahnen 5 geführt .To guide the girder 7 in the crane tracks 5, a trolley 9 is provided on the longitudinal ends of the girder 7. Each running gear 9 expediently has a predetermined number of wheels or rollers, not shown. These rollers or wheels are guided in the crane tracks 5 in rail guides, also not shown.
Der Transportbehälter 8 ist über eine in vertikaler Richtung ausfahrbare Haltevorrichtung 10 an einem Fahrwerk 11 befestigt, welches auf dem Träger 7 verfahrbar gelagert ist. Die Haltevorrichtung 10 kann insbesondere ein ausfahrbares Gestänge oder dergleichen aufweisen. Auch das Fahrwerk 11 am Träger 7 weist vorzugsweise eine vorgegebene Anzahl von nicht dargestellten Rollen oder Rädern auf, welche in einer ebenfalls nicht dargestellten Schienenführung im Träger 7 verfahrbar ist. Mittels des Fahrwerks 11 ist der Transportbehälter 8 längs des Trägers 7 verfahrbar, mittels der Haltevorrichtung 10 ist der Transportbehälter 8 in vertikaler Richtung verfahrbar.The transport container 8 is fastened via a holding device 10, which can be extended in the vertical direction, to a chassis 11, which is movably mounted on the carrier 7. The Holding device 10 can in particular have an extendable linkage or the like. The chassis 11 on the carrier 7 also preferably has a predetermined number of rollers or wheels, not shown, which can be moved in the rail 7 in a rail guide, also not shown. The transport container 8 can be moved along the carrier 7 by means of the chassis 11, and the transport container 8 can be moved in the vertical direction by means of the holding device 10.
Schließlich ist zwischen der Haltevorrichtung 10 und dem Transportbehälter 8 eine Schwenkvorrichtung 12 vorgesehen, mittels derer der Transportbehälter 8 zur Feinpositionierung in horizontaler Richtung bezüglich der Haltevorrichtung 10 verfahrbar ist.Finally, a pivoting device 12 is provided between the holding device 10 and the transport container 8, by means of which the transport container 8 can be moved in the horizontal direction with respect to the holding device 10 for fine positioning.
Der Verfahrweg des Transportbehälters 8 am Träger 7 sowie die Verfahrwege der Halte- 10 und Schwenkvorrichtung 12 werden über eine oder mehrere nicht dargestellte NC-Steuerungen ge- steuert. Die NC-Steuerungen sind an eine ebenfalls nicht dargestellte Zentralsteuerung angeschlossen, welche die Gesamtsteuerung der Portalkrananlage übernimmt. Alternativ oder zusätzlich können bei Bedarf einzelne Funktionen der Steuerung manuell betätigt werden.The travel of the transport container 8 on the carrier 7 and the travel of the holding and pivoting device 12 are controlled by one or more NC controls, not shown. The NC controls are connected to a central control, also not shown, which takes over the overall control of the gantry crane system. Alternatively or additionally, individual functions of the control can be operated manually if required.
Mit der erfindungsgemäßen Portalkrananlage können beliebig angeordnete Fertigungseinheiten 2 im Reinraum 1 schnell und einfach mit Wafern beliefert werden. Der Transportbehälter 8 wird hierzu aus einem nicht dargestellten Speicher, Förder- band oder dergleichen mit Kassetten, in welchen sich Wafer befinden, befüllt. Danach wird der Träger 7 an den Kranbahnen 5 solange verfahren, bis dieser sich auf der Höhe der zu beliefernden Fertigungseinheit 2 befindet. Dabei wird der Transportbehälter 8 oberhalb der Fertigungseinheiten 2 be- wegt. Auf diese Weise wird der Transport der Wafer durch die Anordnung der Fertigungseinheiten 2 nicht behindert. Anschließend wird der Transportbehälter 8 längs des Trägers 7 solange verfahren, bis sich der Transportbehälter 8 oberhalb der zu beliefernden Fertigungseinheit 2 befindet. Alternativ können der Träger 7 und der Transportbehälter 8 gleichzeitig verfahren werden. Erst nachdem der Transportbehälter 8 oberhalb der zu belieferenden Fertigungseinheit 2 positioniert ist, wird der Transportbehälter 8 durch Ausfahren der Haltevorrichtung 10 abgesenkt, bis sich der Transportbehälter 8 unmittelbar vor der Be- und Entladestation 4 der Fertigungs- einheit 2 befindet. Bei diesem Absenkvorgang des Transportbehälters 8 kann gleichzeitig noch eine Feinpositionierung durch automatisches oder manuelles Aktivieren der Schwenkvorrichtung 12 erfolgen. Der Abtransport der Wafer erfolgt anschließen in entsprechender Weise.The gantry crane system according to the invention can be used to quickly and easily supply wafers to any production units 2 in the clean room 1. For this purpose, the transport container 8 is filled with cassettes, in which wafers are located, from a storage, conveyor belt or the like (not shown). The carrier 7 is then moved on the crane tracks 5 until it is at the level of the production unit 2 to be supplied. The transport container 8 is moved above the production units 2. In this way, the transport of the wafers is not hindered by the arrangement of the manufacturing units 2. The transport container 8 is then moved along the carrier 7 until the transport container 8 is above the production unit 2 to be supplied. Alternatively, the carrier 7 and the transport container 8 can be moved simultaneously. Only after the transport container 8 is positioned above the production unit 2 to be supplied is the transport container 8 lowered by extending the holding device 10 until the transport container 8 is located directly in front of the loading and unloading station 4 of the production unit 2. During this lowering process of the transport container 8, fine positioning can also be carried out at the same time by automatic or manual activation of the swivel device 12. The wafers are then transported away in a corresponding manner.
Da sich die Portalkrananlage über den gesamten Reinraum 1 erstreckt, kann die Versorgung der Anlage mit Wafern flächendeckend erfolgen, wobei die Bewegung des Transportbehälters 8 zu der jeweiligen Fertigungseinheit 2 oberhalb sämtlicher Fertigungseinheiten 2 verläuft, so daß keine Zwangsführung während des Verfahrwegs des Transportbehälters 8 vorliegt.Since the gantry crane system extends over the entire clean room 1, the system can be supplied with wafers area-wide, the movement of the transport container 8 to the respective production unit 2 running above all production units 2, so that there is no positive guidance during the travel path of the transport container 8.
Zur Erfüllung der Reinheits- und Sicherheitsanforderungen im Reinraum 1 weisen sämtliche Antriebe der Portalkrananlage ei- ne Kapselung auf, wobei vorzugsweise explosionsgeschützteIn order to meet the cleanliness and safety requirements in clean room 1, all drives of the gantry crane system have an encapsulation, preferably explosion-protected
Kapselungen verwendet werden. Zudem weisen vorzugsweise auch die Fahrwerke 9, 11 eine Kapselung auf.Encapsulations are used. In addition, the trolleys 9, 11 preferably also have an encapsulation.
Schließlich werden zweckmäßigerweise für die bewegten Teile der Fahrwerke 9, 11, insbesondere für die Rollen oder Räder, sowie für die Auflageflächen an den Kranbahnen 5 und an dem Träger 7, auf welchen die Fahrwerke 9, 11 geführt sind, Materialien verwendet, welche nicht ausgasen und welche sehr abriebfest sind. Insbesondere kommen hierfür besonders wider- standsfähige Kunststoffe in Frage. Durch diese Maßnahmen ist gewährleistet, daß die bewegten Teile der Portalkrananlage keine oder nahezu keine Partikel absondern, welche die Reinraumatmosphäre beeinträchtigen könnten.Finally, materials that do not outgas are expediently used for the moving parts of the trolleys 9, 11, in particular for the rollers or wheels, and for the support surfaces on the crane tracks 5 and on the support 7, on which the trolleys 9, 11 are guided and which are very abrasion resistant. Particularly resistant plastics are particularly suitable for this. These measures ensure that the moving parts of the gantry crane system emit no or almost no particles that could impair the clean room atmosphere.
Bei dem in den Figuren 1 und 2 dargestellten Ausführungsbeispiel erfolgt der Transport der Wafer mittels einer Portalkrananlage, welche sich über den gesamten Reinraum 1 erstreckt .In the exemplary embodiment illustrated in FIGS. 1 and 2, the wafers are transported by means of a gantry crane system which extends over the entire clean room 1.
Bei besonders großen Reinräumen 1 muß eine derartige Portal- krananlage eine erhebliche Spannweite aufweisen, was zu statischen Problemen bei der Installation der Portalkrananlage führen kann. Zudem kann in Abweichung des Ausführungsbei- spiels gemäß Figur 1 der Grundriß eines Reinraums 1 nicht nur rechtwinklig, sondern auch verwinkelt ausgebildet sein.In the case of particularly large clean rooms 1, such a gantry crane system must have a considerable span, which can lead to static problems when installing the gantry crane system. In addition, in deviation from the exemplary embodiment according to FIG. 1, the floor plan of a clean room 1 can be designed not only at right angles, but also at an angle.
In derartigen Fällen ist es zweckmäßig, eine Mehrfachanordnung von nebeneinander und / oder hintereinander angeordneten Portalkrananlagen vorzusehen, um eine flächendeckende Versorgung mit Wafern zu gewährleisten.In such cases, it is expedient to provide a multiple arrangement of gantry crane systems arranged side by side and / or one behind the other in order to ensure a widespread supply with wafers.
Bei derartigen Anordnungen ist es zweckmäßig an den Grenzlinien zwischen zwei Portalkrananlagen einen oder mehrere Spei- chersysteme für Wafer, wie zum Beispiel Stocker vorzusehen. Diese Speicher bilden dann Bindeglieder zwischen den einzelnen Portalkrananlagen, da an diesen jeweils die Transportbehälter 8 zur Be- und Entladung von Wafern positioniert werden können.In such arrangements, it is expedient to provide one or more storage systems for wafers, such as stockers, at the boundary lines between two gantry crane systems. These stores then form links between the individual gantry crane systems, since the transport containers 8 for loading and unloading wafers can be positioned thereon.
In einer vorteilhaften Ausführungsform kann die Portalkrananlage dahingehend erweitert werden, daß auf den Kranbahnen 5 einer Portalkrananlage mehrere Träger 7 mit einem Transportbehälter 8 verfahrbar angeordnet sind. Zweckmäßigerweise sind die Träger 7 an der Portalkrananlage jeweils separat verfahrbar angeordnet, wobei die Koordination der Verfahrwege von der ZentralSteuerung übernommen wird.In an advantageous embodiment, the gantry crane system can be expanded such that a plurality of carriers 7 with a transport container 8 are arranged to be movable on the crane tracks 5 of a gantry crane system. The supports 7 are expediently arranged to be separately movable on the gantry crane system, the coordination of the travel paths being taken over by the central control.
In einer weiteren vorteilhaften Ausfuhrungsform kann die Portalkrananlage dahingehend erweitert werden, daß an einem Träger 7 mehrere hintereinander angeordnete Transportbehälter 8 verfahrbar angeordnet sind.In a further advantageous embodiment, the gantry crane system can be expanded such that a plurality of transport containers 8 arranged one behind the other are arranged to be movable on a carrier 7.
Die Transportbehälter 8 können dann einzeln jeweils an unterschiedlichen Fertigungseinheiten 2 oder Speichersystemen zur Be- und Entladung positioniert werden. Zweckmäßigerweise erfolgt die Koordination der Verfahrwege der Transportbehälter 8 an einem Träger 7 über die Zentralsteuerung. The transport containers 8 can then be positioned individually on different production units 2 or storage systems for loading and unloading. The travel paths of the transport containers 8 are expediently coordinated on a carrier 7 via the central control.

Claims

Patentansprüche claims
1. Anlage zur Fertigung von Halbleiterprodukten insbesondere von Wafern, mit einer Anordnung von Fertigungseinheiten in wenigstens einem Reinraum, dadurch gekennzeichnet, daß als Transportsystem für die Zuführung der Halbleiterprodukte zu den Fertigungseinheiten (2) eine Portalkrananlage vorgesehen ist, welche wenigstens einen oberhalb der Fertigungseinheiten (2) geführten und zu den Fertigungseinheiten (2) hin absenkbaren Transportbehälter (8) aufweist.1. Plant for the production of semiconductor products, in particular wafers, with an arrangement of production units in at least one clean room, characterized in that a gantry crane system is provided as a transport system for supplying the semiconductor products to the production units (2), which at least one above the production units ( 2) guided and to the manufacturing units (2) lowerable transport container (8).
2. Anlage nach Anspruch 1, dadurch gekennzeichnet, daß die Portalkrananlage zwei oberhalb der Fertigungseinheiten (2) parallel zueinander verlaufende Kranbahnen (5) auf- weist, und daß ein quer zu den Kranbahnen (5) verlaufender Träger (7) mit seinen längsseitigen Enden in den Kranbahnen (5) verfahrbar gelagert ist, wobei am Träger (7) der Transportbehälter (8) verfahrbar gelagert ist.2. Installation according to claim 1, characterized in that the gantry crane system has two crane tracks (5) running parallel to one another above the production units (2), and in that a carrier (7) extending transversely to the crane tracks (5) has its longitudinal ends is movably supported in the crane tracks (5), the transport container (8) being movably supported on the carrier (7).
3. Anlage nach Anspruch 2, dadurch gekennzeichnet, daß der Träger (7) an seinen längsseitigen Enden jeweils ein Fahrwerk (9) aufweist.3. Plant according to claim 2, characterized in that the carrier (7) has a chassis (9) at its longitudinal ends.
4. Anlage nach Anspruch 2, dadurch gekennzeichnet, daß jede Kranbahn (5) eine Schienenführung für das Fahrwerk4. Plant according to claim 2, characterized in that each crane runway (5) has a rail guide for the chassis
(9) aufweist.(9).
5. Anlage nach einem der Ansprüche 2 - 4, dadurch gekennzeichnet, daß die Kranbahnen (5) auf Stützpfeilern (6) gelagert sind.5. Plant according to one of claims 2-4, characterized in that the crane tracks (5) are supported on supporting pillars (6).
6. Anlage nach einem der Ansprüche 2 - 5, dadurch gekennzeichnet, daß der Transportbehälter (8) längs des Trägers (7) verfahrbar angeordnet ist.6. Plant according to one of claims 2-5, characterized in that the transport container (8) along the carrier (7) is arranged to be movable.
7 . Anlage nach Anspruch 6 , d a d u r c h g e k e n n z e i c h n e t , daß der Träger ( 7 ) eine Schienenführung aufweist , in welcher ein Fahrwerk (11) geführt ist, an welchem der Transportbehälter (8) gehalten ist.7. System according to claim 6, characterized in that the carrier (7) has a rail guide in which a carriage (11) is guided on which the transport container (8) is held.
8. Anlage nach Anspruch 7, dadurch gekennzeichnet, daß der Transportbehälter (8) über eine in vertikaler Richtung ausfahrbare Haltevorrichtung (10) am Fahrwerk (11) befestigt ist.8. Plant according to claim 7, characterized in that the transport container (8) via a vertically extendable holding device (10) is attached to the chassis (11).
9. Anlage nach Anspruch 8, dadurch gekennzeichnet, daß zwischen der Haltevorrichtung (10) und dem Transportbehälter (8) eine Schwenkvorrichtung (12) vorgesehen ist, mittels derer der Transportbehälter (8) zur Feinpositionierung in horizontaler Richtung bezüglich der Haltevorrichtung (10) verfahrbar ist.9. Plant according to claim 8, characterized in that between the holding device (10) and the transport container (8) a swivel device (12) is provided, by means of which the transport container (8) for fine positioning in the horizontal direction with respect to the holding device (10) can be moved is.
10. Anlage nach einem der Ansprüche 2 - 9, dadurch gekennzeichnet, daß der Verfahrweg des Transportbehälters (8) am Träger (7) mittels einer NC-Steuerung steuerbar ist.10. Plant according to one of claims 2-9, characterized in that the travel of the transport container (8) on the carrier (7) can be controlled by means of an NC control.
11. Anlage nach einem der Ansprüche 1 - 10, dadurch gekennzeichnet, daß die Antriebe für die Portalanlage eine Kapselung aufweisen.11. Plant according to one of claims 1-10, characterized in that the drives for the portal system have an encapsulation.
12. Anlage nach Anspruch 11, dadurch gekennzeichnet, daß die Antriebe explosionsgeschützte Kapselungen aufweisen.12. Plant according to claim 11, characterized in that the drives have explosion-proof encapsulations.
13. Anlage nach einem der Ansprüche 3 - 12, dadurch gekennzeichnet, daß die Fahrwerke (9, 11) eine Kapselung aufweisen.13. Plant according to one of claims 3-12, characterized in that the trolleys (9, 11) have an encapsulation.
14. Anlage nach einem der Ansprüche 3 - 13, dadurch gekennzeichnet, daß die Fahrwerke (9, 11) und die Auflageflächen für die Fahrwerke (9, 11) auf den Kranbahnen (5) und dem Träger (7) aus abriebfesten, nicht ausgasenden Materia- lien bestehen. 14. Installation according to one of claims 3-13, characterized in that the trolleys (9, 11) and the bearing surfaces for the trolleys (9, 11) on the crane tracks (5) and the carrier (7) made of wear-resistant, not outgassing Materials exist.
15. Anlage nach einem der Ansprüche 1 - 14, dadurch gekennzeichnet, daß die Portalkrananlage über eine Zentralsteuerung gesteuert ist.15. Plant according to one of claims 1-14, characterized in that the gantry crane system is controlled via a central control.
16. Anlage nach einem der Ansprüche 1 - 15, dadurch gekennzeichnet, daß sich die Portalkrananlage über die gesamte Fläche des Reinraums (1) erstreckt.16. Plant according to one of claims 1-15, characterized in that the gantry crane system extends over the entire area of the clean room (1).
17. Anlage nach einem der Ansprüche 1 - 16, dadurch ge- kennzeichnet, daß in einem Reinraum (1) eine Mehrfachanordnung von nebeneinander und / oder hintereinander angeordneten Portalkrananlagen vorgesehen ist.17. Plant according to one of claims 1-16, characterized in that a multiple arrangement of gantry crane systems arranged side by side and / or one behind the other is provided in a clean room (1).
18. Anlage nach einem der Ansprüche 1 - 17, dadurch ge- kennzeichnet, daß auf den Kranbahnen (5) einer Portal- krananlage mehrere Träger (7) mit einem Transportbehälter (8) verfahrbar angeordnet sind.18. Plant according to one of claims 1-17, characterized in that several carriers (7) with a transport container (8) are arranged to be movable on the crane tracks (5) of a gantry crane system.
19. Anlagen nach Anspruch 18, dadurch gekennzeich- net, daß die Träger (7) an einer Portalkrananlage jeweils separat verfahrbar angeordnet sind.19. Plants according to claim 18, characterized in that the supports (7) are each arranged separately movable on a gantry crane system.
20. Anlage nach einem der Ansprüche 1 - 19, dadurch gekennzeichnet, daß an einem Träger (7) mehrere hinterein- ander angeordnete Transportbehälter (8) verfahrbar angeordnet sind.20. Plant according to one of claims 1 - 19, characterized in that a plurality of transport containers (8) arranged one behind the other are arranged to be movable on a carrier (7).
21. Anlage nach Anspruch 20, dadurch gekennzeichnet, daß die Transportbehälter (8) an einem Träger (7) jeweils se- parat verfahrbar angeordnet sind. 21. Plant according to claim 20, characterized in that the transport containers (8) on a carrier (7) are each arranged separately movable.
EP00940172A 1999-05-07 2000-05-05 System for manufacturing semiconductor products Withdrawn EP1192641A2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19921246A DE19921246C2 (en) 1999-05-07 1999-05-07 Plant for the production of semiconductor products
DE19921246 1999-05-07
PCT/DE2000/001453 WO2000068975A2 (en) 1999-05-07 2000-05-05 System for manufacturing semiconductor products

Publications (1)

Publication Number Publication Date
EP1192641A2 true EP1192641A2 (en) 2002-04-03

Family

ID=7907412

Family Applications (1)

Application Number Title Priority Date Filing Date
EP00940172A Withdrawn EP1192641A2 (en) 1999-05-07 2000-05-05 System for manufacturing semiconductor products

Country Status (7)

Country Link
US (1) US20020119036A1 (en)
EP (1) EP1192641A2 (en)
JP (1) JP2002544662A (en)
KR (1) KR100452713B1 (en)
CN (1) CN1165965C (en)
DE (1) DE19921246C2 (en)
WO (1) WO2000068975A2 (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10103111A1 (en) * 2001-01-24 2002-08-01 Mattson Wet Products Gmbh Device for treating substrates
JPWO2003105216A1 (en) * 2002-06-07 2005-10-13 平田機工株式会社 Container transfer system
KR100541183B1 (en) * 2003-03-04 2006-01-11 삼성전자주식회사 Stocker and transfer system having the same
WO2007056443A2 (en) * 2005-11-07 2007-05-18 Brooks Automation, Inc. Reduced capacity carrier, transport, load port, buffer system
US7281623B1 (en) * 2006-04-18 2007-10-16 Aquest Systems Corporation Transport system including vertical rollers
US20070289843A1 (en) * 2006-04-18 2007-12-20 Barry Kitazumi Conveyor System Including Offset Section
KR101841753B1 (en) * 2006-08-18 2018-03-23 브룩스 오토메이션 인코퍼레이티드 Reduced capacity carrier, transport, load port, buffer system
US20080050208A1 (en) * 2006-08-25 2008-02-28 Barry Kitazumi High speed transporter including horizontal belt
JP4670808B2 (en) * 2006-12-22 2011-04-13 ムラテックオートメーション株式会社 Container transport system and measuring container
US7434678B1 (en) 2007-06-14 2008-10-14 Aquest Systems Corporation Systems and methods for transport through curved conveyance sections
WO2008130389A1 (en) * 2007-04-18 2008-10-30 Aquest Systems Corporation Integrated overhead transport system with stationary drive
US7441648B1 (en) 2007-06-14 2008-10-28 Aquest Systems Corporation Systems and methods for transport through curves
DE102009040555B4 (en) * 2009-09-08 2013-11-21 Grenzebach Maschinenbau Gmbh Method and device for archiving and / or temporarily storing glass panes in clean rooms
JP5777423B2 (en) * 2011-06-30 2015-09-09 ユニ・チャーム株式会社 Absorbent article manufacturing equipment
CN103063035A (en) * 2012-12-25 2013-04-24 苏占忠 Furnace charging conveyor for silicon carbide smelting furnaces
US9921493B2 (en) * 2013-11-14 2018-03-20 Taiwan Semiconductor Manufacturing Co., Ltd. Photolithography system, method for transporting photo-mask and unit therein
CN106185138B (en) * 2015-07-20 2018-06-01 亚洲硅业（青海）有限公司 A kind of closed silicon core automatic access device
DE102016120820A1 (en) * 2016-11-02 2018-05-03 Integrated Dynamics Engineering Gmbh Plant for the processing of semiconductor devices and lifting device
CN110451409A (en) * 2019-08-14 2019-11-15 濮阳职业技术学院 A kind of big data computer room cabinet body suspension apparatus

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3623506A1 (en) * 1986-07-09 1988-01-28 Mannesmann Ag GUIDE FOR AN INDUSTRIAL ROBOT
DE3735449A1 (en) * 1987-10-20 1989-05-03 Convac Gmbh MANUFACTURING SYSTEM FOR SEMICONDUCTOR SUBSTRATES
JPH0326480A (en) * 1989-06-21 1991-02-05 Mitsubishi Electric Corp Industrial robot device and robot teaching method therefor
JPH0616206A (en) * 1992-07-03 1994-01-25 Shinko Electric Co Ltd Transportation system inside clean room
ES2107700T3 (en) * 1993-03-24 1997-12-01 Hauni Maschinenbau Ag ROBOT ARM OF A SURFACE PORTICO ROBOT.
JPH07297258A (en) * 1994-04-26 1995-11-10 Tokyo Electron Ltd Carrying equipment of plate body
US6019564A (en) * 1995-10-27 2000-02-01 Advantest Corporation Semiconductor device transporting and handling apparatus
US5964561A (en) * 1996-12-11 1999-10-12 Applied Materials, Inc. Compact apparatus and method for storing and loading semiconductor wafer carriers
US5980183A (en) * 1997-04-14 1999-11-09 Asyst Technologies, Inc. Integrated intrabay buffer, delivery, and stocker system
JPH112657A (en) * 1997-06-13 1999-01-06 Advantest Corp Complex ic tester
US6579052B1 (en) * 1997-07-11 2003-06-17 Asyst Technologies, Inc. SMIF pod storage, delivery and retrieval system
DE19736698C2 (en) * 1997-08-22 2001-09-13 Kaspar Walter Maschf Kg Device for loading processing stations with printing cylinders
AU6016498A (en) * 1997-09-30 1999-04-23 Semitool, Inc. Semiconductor processing apparatus having linear conveyor system
US6604624B2 (en) * 1998-09-22 2003-08-12 Hirata Corporation Work conveying system
US6481558B1 (en) * 1998-12-18 2002-11-19 Asyst Technologies, Inc. Integrated load port-conveyor transfer system

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO0068975A2 *

Also Published As

Publication number Publication date
CN1350699A (en) 2002-05-22
KR20020010640A (en) 2002-02-04
WO2000068975A3 (en) 2001-04-05
DE19921246A1 (en) 2000-11-16
CN1165965C (en) 2004-09-08
KR100452713B1 (en) 2004-10-12
WO2000068975A2 (en) 2000-11-16
DE19921246C2 (en) 2003-06-12
US20020119036A1 (en) 2002-08-29
JP2002544662A (en) 2002-12-24

Similar Documents

Publication Publication Date Title
EP1192641A2 (en) System for manufacturing semiconductor products
DE19900804C2 (en) Conveyor system
EP2331436B1 (en) Process and apparatus to carry thin and large glass sheets.
EP1343709B2 (en) Facility for processing, especially painting objects, especially vehicle bodies
DE3705561C1 (en) Conveyor device
WO2002088007A1 (en) Conveyor device for transporting workpieces through a processing area for surface treatment of said workpieces
DE102013104423A1 (en) Vertical conveyor and method for loading and unloading piece goods
DE2755147A1 (en) CONVEYOR SYSTEM, IN PARTICULAR DRAG CHAIN CIRCULAR CONVEYORS
DE3234817C2 (en) High-bay warehouse
DE3335289C2 (en)
EP2484607A1 (en) Conveyor and conveying equipment with such conveyor
DE3826925C2 (en)
DE2722712A1 (en) DEVICE FOR TEMPORARY STORAGE OF TILES AND THE LIKE
EP0010548B1 (en) Intermittently operating direction changer rotatable in a horizontal plane
EP1681261A1 (en) Device for conveying and exchanging components of coating installations
AT407384B (en) COMMISSIONING WAREHOUSE
EP1988038B1 (en) Method for delivering and reciving workpieces onto a work surface
DE202008011686U1 (en) Device for transporting large-area thin glass plates
DE2727938C2 (en) Conveyor device with roller table and cross conveyor
DE102018010342A1 (en) Process for conveying workpieces
DE4017006A1 (en) Transport system for semiconductor wafer discs - uses feed channels supplied with filtered air transporting discs between clean rooms
DE3817745A1 (en) Apparatus for supplying a processing machine with rod-shaped material
DE112019005363T5 (en) Vacuum processing device
DE102018216377A1 (en) Conveying system and method for conveying workpieces
WO2023116975A1 (en) Conveying system, treatment system and method for treating workpieces

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20010924

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

AX Request for extension of the european patent

Free format text: AL;LT;LV;MK;RO;SI

RBV Designated contracting states (corrected)

Designated state(s): DE FR GB IE IT

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN

18W Application withdrawn

Effective date: 20050217