EP1107859A1 - Procede de fabrication de gabarits matrices optiques au moyen de lumiere incoherente - Google Patents

Procede de fabrication de gabarits matrices optiques au moyen de lumiere incoherente

Info

Publication number
EP1107859A1
EP1107859A1 EP99921859A EP99921859A EP1107859A1 EP 1107859 A1 EP1107859 A1 EP 1107859A1 EP 99921859 A EP99921859 A EP 99921859A EP 99921859 A EP99921859 A EP 99921859A EP 1107859 A1 EP1107859 A1 EP 1107859A1
Authority
EP
European Patent Office
Prior art keywords
photoresist
film
exposing
features
photosensitive medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP99921859A
Other languages
German (de)
English (en)
Other versions
EP1107859A4 (fr
Inventor
Gajendra D. Savant
Stephen A. Kupiec
Joanna L. Jannson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Physical Optics Corp
Original Assignee
Physical Optics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/137,397 external-priority patent/US6303276B1/en
Application filed by Physical Optics Corp filed Critical Physical Optics Corp
Publication of EP1107859A1 publication Critical patent/EP1107859A1/fr
Publication of EP1107859A4 publication Critical patent/EP1107859A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/06—Processes or apparatus for producing holograms using incoherent light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements

Definitions

  • This invention pertains to an improved, faster and more reliable method for generating random pattern apertures in a master suitable for manufacturing light shaping diffusers and similar optical components.
  • a photosensitive medium 4 such as photoresist
  • the diffuser 3 may be a ground glass, holographic, lenticular or acetate diffuser, or a diffuser itself previously recorded in the recording set-up of Figure 1.
  • the surface structures which remain in the photosensitive medium 4 after processing are exploited.
  • the photosensitive medium After the photosensitive medium has been exposed for a suitable length of time, it is processed to make a master.
  • a first generation submaster or replica made of epoxy or other plastic resin may then be made from the master by applying epoxy to the surface of the master, uniformly spreading the epoxy out on the master, and then separating the epoxy from the master after the epoxy has been cured.
  • Successive generations of submasters are typically made from the previous generation submaster using the above process. Each successive generation submaster exhibits a change (usually a reduction) in the aspect ratio of the surface structure features due to shrinkage.
  • the prior art processes outlined above have a number of practical shortcomings.
  • the overall size of diffusers capable of being produced is limited by the intensity of the lasers available and the sensitivity of the photosensitive media.
  • prior art systems typically require a coherent light source capable of providing very high energy density on the order of 2.7 joules/ cm 2 to generate a suitable exposure.
  • large masters have been assembled from a number of smaller submasters placed next to one another in an attempt to make a larger, seamless master as shown in Figure 2. With this approach however, it has been difficult to avoid discontinuities and seams from appearing along the edges where the submasters are joined.
  • Light output orientation from the diffuser is inversely proportional to speckle size and orientation within the diffuser.
  • speckle size must be decreased to one third.
  • a method of making large, seamless masters that is not susceptible to vibration and is faster and less expensive would be of great benefit.
  • a primary object of the present invention is to provide an improved method for generating masters having a plurality of randomly distributed speckle suitable for making light shaping diffusers. Another object of the invention is to provide a simple and reliable method for generating large, seamless masters. Another object of the invention is to provide a method for generating masters that is not sensitive to vibration and movement and which yields perfectly uniform and repeatable large scale light shaping diffusers at low cost. Another object of the invention is to provide a method for generating masters in which the angular spread of light output from a light shaping diffuser may be controlled without requiring the use of numerous successive generations of submasters to arrive at a desired angular spread.
  • a film is exposed to either an actual speckle pattern or one generated by computer.
  • the film may be exposed in several ways including in a standard coherent laser set up as in Figure 1 where the film replaces the photosensitive medium 4 or by a computer driven imagesetter driven by a random sequence of numbers which exposes the film randomly with dots.
  • the film is then developed, placed in contact with a photosensitive medium such as standard photoresist, and exposed to incoherent light which exposes the photosensitive medium to the speckle pattern in the film.
  • the speckle structure in the photosensitive medium is then used as a master to create subsequent submasters and ultimately the final diffuser product.
  • the film is exposed in an imagesetter according to a pseudorandom sequence obtained from a maximum length shift register, which may be implemented in hardware or software.
  • the pseudorandom sequence is used by the raster image processor of an imagesetter to control the random distribution of laser or radiation generated features or "dots" on the film.
  • the dots so exposed on the film may be made to resemble the speckle recorded in a standard set-up as in Figure 1.
  • a highly sensitive millimask film may be exposed in a standard coherent laser set-up where the millimask film replaces the usual photosensitive medium.
  • speckle are recorded in the film in a shorter time, with less susceptibility to vibration, and with greater resolution.
  • the film from either of the above methods may be reduced (or enlarged) using standard photo reduction techniques.
  • the reduced or enlarged film may then be contact copied onto a photosensitive medium such as photoresist or the like or used in a stepper to create yet a second film having dots of even smaller size, which in turn may be contact copied with incoherent light onto photoresist or the like or used in the stepper to expose photoresist in the stepper.
  • film may be avoided altogether by coating the drum in a modified imagesetter with a photosensitive medium such as photoresist and exposing it with the imagesetter laser. Standard etching techniques are then used to etch away the unexposed photoresist on the drum and then etch the drum itself with the random dot pattern. The drum is then used to emboss or stamp an epoxy or other layer on a plastic or other sheet in preferably a continuous process.
  • a photosensitive medium such as photoresist
  • Standard etching techniques are then used to etch away the unexposed photoresist on the drum and then etch the drum itself with the random dot pattern.
  • the drum is then used to emboss or stamp an epoxy or other layer on a plastic or other sheet in preferably a continuous process.
  • collimated UV, excimer or electron beam sources may be used to expose a sandwich of photoresist on chrome on glass in accordance with a pseudorandom dot pattern.
  • the unexposed photoresist is etched away and then the chrome is etched away to create the dot pattern in the chrome.
  • Diffusers manufactured by the method of the present invention can be made large enough to be used in front and back projection screens, fluorescent light screens, highway and advertising signs, and the like. Additional benefits of the present invention include inexpensive and rapid turnaround (approximately 48 hours from the initial concept to making of a master); use of inexpensive incoherent light sources such as a standard arc lamp to expose the photoresist material; insensitivity to vibration and movement; obtaining a perfectly uniform and repeatable large scale diffuser; obtaining large elliptical and circular diffusers thereby permitting angular outputs of any number of shapes; the ability to create unique diffuser patterns such as patterns exhibiting a linear or circular gradient, or variable direction elliptical features. Other benefits and advantages of the methods of the present invention will be readily apparent to those of ordinary skill in the art.
  • FIG. 1 illustrates a prior art method of recording a photosensitive medium with speckle
  • FIG. 2 illustrates a prior art method for making large masters from a number of submasters
  • FIG. 3 illustrates a side view of an imagesetter suitable for carrying out the methods according to the present invention
  • FIG. 4A illustrates a regular, periodic grating of rectangular apertures
  • FIG. 4B illustrates the diffraction pattern that results from illuminating this grating with white light
  • FIG. 5 A illustrates a regular, periodic grating of circular apertures
  • FIG. 5B illustrates the diffraction pattern resulting from illuminating the diffraction pattern of Fig. 5 A with white light
  • FIG. 6A illustrates a random array of rectangular apertures
  • FIG. 6B illustrates the resulting white light diffraction pattern
  • FIG. 7A illustrates a random array of circular apertures
  • FIG. 7B illustrates the resulting white light diffraction pattern, a series of concentric rings surrounding a white central disk
  • FIG. 8 illustrates a functional diagram of an apparatus suitable for generating the pseudorandom sequence according to the present invention
  • FIG. 9 illustrates contact copying of a film on photoresist
  • FIG. 10 illustrates a standard laser recording set-up using millimask film
  • FIG. 11 illustrates a photoreduction of film
  • FIG. 12 illustrates a stepper mask
  • FIG. 13 illustrates 9° ⁇ 90° angular spectrum output increase due to a lOx dot size reduction
  • FIG. 14 illustrates a recording set-up to change the shape of an angular output using an anamorphic lens in a stepper
  • FIG. 15 is a drawing of a film-less recording set-up using photoresist on a metal drum
  • FIG. 16 is a drawing of a continuous or discrete drum press
  • FIG. 17 is a drawing of an electron beam or excimer laser recording set- up.
  • One preferred embodiment of the present invention utilizes an imagesetter to generate a high resolution mask for making a master.
  • Imagesetters are well known in the photolithography arts for their ability to generate high resolution masks on photographic film and are typically used for high resolution color printing.
  • Imagesetters suitable for use in the present invention include those produced by Agfa and Hellinetronic.
  • An imagesetter typically includes a supply of unexposed film, a recording support surface or holder, e.g. , a drum, for supporting the material during exposure, and an image exposing system for forming the image to be recorded based on instructions from a dedicated raster image processor or "RIP. "
  • the image exposing system employs one or more lasers or other radiation beam sources.
  • the film typically a Kodak 2000 series film, or the like, is scanned and exposed by the beam and a latent image is formed on the material. The film is then removed from the imagesetter for subsequent processing.
  • Fig. 3 depicts an imagesetter 10.
  • Film 12 is held by support surface 14 which may be a capstan roller as shown in Fig. 3, a flat plate, a cylindrical drum platen, or other support surface.
  • a scanning exposure system 16 for exposure of the film comprises a light or radiation source 18 such as a laser mounted a fixed distance away from support surface 14, an optical system 20 for focusing a beam 22 emitted from light source 18 and a beam deflecting apparatus for scanning the beam across the material 12.
  • the scanning exposure system is moved along line C-C of the drum 14 by a precision linear drive mechanism while the film 12 is held in place.
  • the lasers or other light or radiation source are illuminated to expose areas of the film, according to instructions provided by the RIP.
  • the basic feature to be recorded on the film is referred to as a "dot," although features are not necessarily circular and may be elliptical, rectangular or other shape. Larger features, such as elliptical structures, can be reproduced by combining multiple adjacent dots. Dots correspond to the "speckle" of the prior art and may be combined as necessary to achieve a diffuser having the desired angular output. Whether or not a dot appears at a particular location on the master is determined by a pseudorandom sequence described below.
  • Figure 4A shows a regular, periodic grating of rectangular apertures.
  • Figure 4B shows the diffraction pattern that results from illuminating this grating with white light.
  • Figure 5A shows a regular, periodic grating of circular apertures.
  • Figure 5B shows the resulting diffraction pattern. Because of the regular periodicity of these grating patterns, each emergent light wave bears a fixed phase relationship to the others. Thus, as can be seen, there are certain directions in which the light waves constructively and destructively interfere, resulting in a diffraction pattern. A goal in making a diffuser is to avoid such diffraction patterns so that the light output is uniformly diffuse.
  • Figure 6A shows a random array of rectangular apertures.
  • Figure 6B shows the resulting white light diffraction pattern.
  • Figure 7A shows a random array of circular apertures.
  • Figure 7B shows the resulting white light diffraction pattern, a series of concentric rings surrounding a white central disk.
  • a random array of apertures results in a diffraction pattern that is much more diffuse that the pattern output from the periodic arrays. There is still, however, a diffraction pattern.
  • the pattern results from the use of a white light source that is somewhat coherent. If a completely incoherent light source is used the diffraction pattern will be uniformly diffuse. Alternatively, blurring of the apertures to remove sharp edges will also eliminate the pattern.
  • the mask required for making a diffuser preferably will have random and disordered features that have no sharp edges.
  • Such a pattern may be obtained from an imagesetter by generating a mask code based on a pseudorandom sequence of sufficient length such that it does not repeat itself over an area equal to the size of the mask.
  • the pseudorandom sequence is generated by a maximum length shift register which may be implemented in software or hardware.
  • a functional diagram of a hardware implementation is shown in Figure 8 which includes shift register 80 and OR gate 90 connected in a feedback configuration.
  • the maximum length shift register is implemented in software so that stock imagesetter RIPs may be utilized rather than custom built hardware.
  • a hardware implementation is preferable where speed is most important since hardware can be optimized for a particular application and is therefore generally faster.
  • ShiftRegister (ShiftRegister ⁇ mask) > > 1)
  • ShiftRegister > > 1; return 0;
  • feature size and shape determine the angular output pattern of light from a light shaping diffuser.
  • the angular distribution of light is governed by the Fresnel diffraction equations.
  • Elliptical features having aligned axes are frequently used to shape the output pattern of a light shaping diffuser.
  • Elliptical features having major axes horizontally aligned will produce an output pattern that is oblong in the vertical direction, i.e. , rotated by 90° with respect to the major axis of the elliptical diffuser features.
  • a complete disclosure of how to record speckle to generate a desired angular distribution of light from a light shaping diffuser is contained in the U.S. patents identified in the Discussion of the Related Art, and are incorporated herein by reference. iii. Determining the Number of Features
  • Each basic feature may be represented by one binary bit.
  • Basic feature size is determined by several factors.
  • the programming language that describes the printing process determines the precision with which printing instructions can be expressed.
  • a PostScript point is 352.78 microns. Calculations can be carried out to 0.0001 of a PostScript point, or 0.035 microns. This level of precision is sufficient for any optical applications of the present invention. Other printing programming languages may be employed provided they are capable of expressing features with sufficient precision, as would be apparent to one of skill in the art.
  • feature size is also limited by diffraction and lens aberrations, as will be appreciated by those of ordinary skill in the art.
  • the number of features for a master of a given area is determined as follows:
  • a pseudorandom sequence of sufficient length so that features are randomly distributed may be determined by the following equation:
  • Bits In 2 Bits In 2 where Bits is the number of bits in the maximum length shift register needed to generate the random sequence of sufficient size to cover the entire area of film to be exposed without repeating. A register of 128 bits in length is generally sufficient for any practical application. iv. Generating the Master
  • the film can be developed by any standard developing technique to arrive at a negative.
  • the negative serves as the mask 23 in a standard contact copy process by placing it onto photoresist 24 or like photosensitive medium.
  • the photoresist 24 is typically on a substrate such as a photolithographic plate 25 made of glass, although a suitable plastic material could also be used.
  • the mask 23 is securely affixed to the photolithographic plate 25 by clamps, a cover sheet, or by a vacuum as generally shown in Figure 9.
  • the mask/photoresist plate combination is then exposed to a source of incoherent light 26 which exposes the photoresist plate with the mask pattern as also shown in Figure 9.
  • this light source is an uncollimated UV light source in the wavelength range of 365 to 400 nm with an output power of 300 to 500 watts.
  • the source should be uniformly bright and diffuse, and be of the same size as the sheet of film to be exposed.
  • a large fluorescent lamp is a good example of a diffuse light source of sufficient size.
  • a smaller light source may be used if it is scanned uniformly over the surface to be exposed.
  • a diffuse light source will cause a blurring of boundaries between light and dark sections. It is desirable that these boundaries be blurred because features with very sharp edges will yield non-diffuse light with a diffraction pattern such as the bull's-eye or ringed pattern as shown in Figure 7B.
  • a suitably diffuse light source is not available, there are several other ways to obtain feature blurring.
  • One way is to make successive generation masters from the first generation master to eliminate the sharp edges of the features.
  • the imagesetter can be adjusted to be slightly out of focus.
  • Another possible way to blur feature edges is by linear chemical processing of the film and/or of the photoresist. Linear processing involves shifting the strength of the developer such that a linear variation between black and white is obtained.
  • a master according to the present invention is made by using the recording setup of Figure 10 but recording the speckle on a semiconductor flat film 31 such as 8E56 millimask, in place of the photoresist/glass plate of Figure 1.
  • the film may be exposed with coherent light, such as laser light from laser 28, and passed through a diffuser 30. Because the film 31 is so sensitive, only several seconds of exposure are required as opposed to many minutes in the case of photoresist.
  • the resulting film may be utilized as a mask in a standard contact copy process as was seen in Figure 9 to copy the features onto a photoresist plate by exposure to incoherent ultraviolet light in the manner described above.
  • the exposure time can be as long as necessary without concern for stability problems encountered in prior art methods. Consequently, extremely long exposure times may be used making it possible to record deep aspect ratio structures in the photoresist.
  • a photoreduction technique may be used as shown in Figure 11.
  • an exposed film 32 is created using the techniques above or other suitable techniques.
  • the film is then developed and placed in a standard photoreduction camera 34 to reduce the size of the dots recorded on the film.
  • the film may then be contact copied onto photoresist or the like as shown in Figure 9. Additionally, the reduced film may then be used as a mask in a stepper as seen in Figure 12 to expose a second film which is reduced (or enlarged) yet again.
  • the second film may then be contact copied onto photoresist or the like.
  • the stepper with the first or second film as a mask, could be used to expose photoresist by stepping the film along discrete portions of the photoresist and exposing the photoresist at each step.
  • a stepper consists of an ultraviolet light source 36 with a shutter, a large mask 37, typically five times actual size, a 5x reduction lens 38 and a precision x-y movable stage 40.
  • the photoresist 39 is placed on the stage and the stage is then moved and the shutter opened to expose selected areas of the photoresist to the UV light in "steps" through the mask 37.
  • aperture size determines the angular spread of light output from a diffuser
  • photoreduction can also be used to change the angular spread of the diffuser without the necessity of recording a new master.
  • the photoreduction of feature size will result in a proportionate increase in angular output or spread.
  • a photoreduction of feature size by lOx will result in a lOx angular increase.
  • a lOx reduction will increase the angular output to 90°. In this way, the angular spread of a master may be adjusted by photoreduction or enlargement.
  • the shape of the features may also be changed by using an anamorphic lens in the stepper to distort the magnification in either the horizontal or vertical direction.
  • an anamorphic lens in the stepper to distort the magnification in either the horizontal or vertical direction.
  • the feature size and shape can be obtained from a single mask thus greatly simplifying the process of making custom light shaping diffusers which previously required modifying the recording set up of Figure 1 each time a master with different characteristics was required.
  • a modified imagesetter is used to record the dot pattern representing speckle described above directly onto the surface of a metal drum covered with a layer of photoresist, instead of recording features on a film that has been secured to the surface of a drum.
  • the photoresist covered drum 41 is exposed by lasers 42 scanning the entire drum in an imagesetter 43.
  • the drum 41 is then removed from the imagesetter 43 and is processed by standard etching techniques.
  • photoresist developer is first used to etch the unexposed photoresist down to the surface of the drum.
  • the unexposed surfaces are then further etched with nitric acid to etch the pattern into the metal.
  • the photoresist is then removed using a solvent.
  • the resulting drum 44 is a master that can be used for embossing a seamless light shaping diffuser of unlimited length.
  • the diffuser can be embossed into an epoxy 45 or other plastic resin which is affixed to a plastic substrate 46.
  • the drum 44 is rolled over the substrate 45 coated with epoxy 45 to obtain an imprint of the diffuser and expose to UV light source 47 to cure the epoxy.
  • Light source 47 is an uncollimated UV light source in the wavelength range of 365 to 400 nm with an output power of 300 to 500 watts.
  • UV excimer laser or an electron beam as the light source.
  • feature sizes as small as approximately 7 microns may be obtained.
  • an electron beam may be used to obtain even smaller dot sizes approaching less than 1 micron.
  • this process involves taking a sheet of glass 50, depositing a first layer of chrome 49 on the glass then depositing a layer of photoresist 48 on top of the chrome 49.
  • a UV excimer laser 51 and/or electron beam source can be used to record computer generated pseudorandom features into the photoresist.
  • the pseudorandom features are generated in a maximum length shift register as described above which is used to modulate the source 51 as it exposes the photoresist 48. Then, using standard processing, the unexposed photoresist is etched away and a further etching is performed using nitric acid or the like to etch into the layer of chrome metal. The remaining photoresist is then washed away with a solvent. The resulting dot size is considerably smaller than with the film process outlined above; however, the excimer laser or electron beam units are rather expensive.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Holo Graphy (AREA)

Abstract

L'invention concerne des procédés améliorés permettant de produire des gabarits matrices de diffuseurs comportant une forme de tacheture distribuée de façon aléatoire. Ces gabarits matrices de diffuseurs sont indiquées pour fabriquer des diffuseurs de lumière sans solution de continuité en plusieurs tailles et à frais réduits. Ces procédés utilisent une source de lumière incohérente (26) qui est passée à travers un élément optique (29) et utilisée pour exposer, à travers un modèle de masque (23), une photorésine (24) appliquée sur un substrat approprié (25).
EP99921859A 1998-05-08 1999-05-07 Procede de fabrication de gabarits matrices optiques au moyen de lumiere incoherente Withdrawn EP1107859A4 (fr)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US137397 1987-12-23
US7502398A 1998-05-08 1998-05-08
US75023 1998-05-08
US09/137,397 US6303276B1 (en) 1998-05-08 1998-08-20 Method and apparatus for making optical master surface diffusers suitable for producing large format optical components
PCT/US1999/010249 WO1999058319A1 (fr) 1998-05-08 1999-05-07 Procede de fabrication de gabarits matrices optiques au moyen de lumiere incoherente

Publications (2)

Publication Number Publication Date
EP1107859A1 true EP1107859A1 (fr) 2001-06-20
EP1107859A4 EP1107859A4 (fr) 2006-04-19

Family

ID=26756344

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99921859A Withdrawn EP1107859A4 (fr) 1998-05-08 1999-05-07 Procede de fabrication de gabarits matrices optiques au moyen de lumiere incoherente

Country Status (3)

Country Link
EP (1) EP1107859A4 (fr)
JP (1) JP4458394B2 (fr)
WO (1) WO1999058319A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002032002A (ja) * 2000-07-14 2002-01-31 Kokusai Medicom Kk 固有符号を有するホログラムテープの製造方法
US6675863B1 (en) * 2000-09-07 2004-01-13 Physical Optics Corporation Seamless master and method of making same
KR100590519B1 (ko) * 2000-12-08 2006-06-15 삼성전자주식회사 3차원 표시장치의 홀로그램소자 제작용 디퓨저 제조방법및 이를 적용한 홀로그램 소자 제작방법
US7192692B2 (en) * 2003-09-11 2007-03-20 Bright View Technologies, Inc. Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers
US7190387B2 (en) * 2003-09-11 2007-03-13 Bright View Technologies, Inc. Systems for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam
GB2425069A (en) 2005-04-13 2006-10-18 Psi Global Ltd Emulsion separating
US20230176263A1 (en) * 2020-02-12 2023-06-08 Dexerials Corporation Pseudo random dot pattern and creation method of same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2854336A (en) * 1955-03-07 1958-09-30 Youngstown Arc Engraving Compa Method of forming a two-level photoengraved embossing plate or mold
DE2951207A1 (de) * 1978-12-26 1980-07-10 Canon Kk Verfahren zur optischen herstellung einer streuplatte
US4294782A (en) * 1979-04-10 1981-10-13 Jerome Bauer Method for substantially instantaneous liquid molding of an article
JPS57148728A (en) * 1981-03-11 1982-09-14 Canon Inc Diffusing plate
US5046793A (en) * 1989-05-26 1991-09-10 Litton Systems, Inc. Chromatically corrected directional diffusing screen
AU8282691A (en) * 1990-07-20 1992-02-18 McGrew, Steven P. Embossing tool
EP0479490A3 (en) * 1990-10-02 1992-08-12 Physical Optics Corporation Volume holographic diffuser
US5493327A (en) * 1993-06-04 1996-02-20 Minnesota Mining And Manufacturing Company Method and apparatus for producing image reproducing materials using photothermographic material sensitive to radiation in the red region and transparent to radiation in the ultraviolet range of the electromagnetic spectrum
IL106406A (en) * 1993-07-20 1997-03-18 Scitex Corp Ltd And Advanced V Automatic inspection of printing plates or cylinders
JPH08512003A (ja) * 1993-07-27 1996-12-17 フィジィカル オプティクス コーポレーション 光源の解体成形装置
US5759455A (en) * 1994-07-08 1998-06-02 Canon Kabushiki Kaisha Roller-shaped stamper for fabricating optical scales

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
No further relevant documents disclosed *
See also references of WO9958319A1 *

Also Published As

Publication number Publication date
EP1107859A4 (fr) 2006-04-19
WO1999058319A1 (fr) 1999-11-18
JP4458394B2 (ja) 2010-04-28
JP2002514776A (ja) 2002-05-21

Similar Documents

Publication Publication Date Title
JP5133954B2 (ja) マスター光学拡散体の作成方法
US6071652A (en) Fabricating optical elements using a photoresist formed from contact printing of a gray level mask
US7095484B1 (en) Method and apparatus for maskless photolithography
US6638667B2 (en) Fabricating optical elements using a photoresist formed using of a gray level mask
KR101060323B1 (ko) 네가티브 포토레지스트를 이용하여 기판을 통과하는미세구조의 마스터링을 위한 시스템과 그 방법 및 상기방법으로 제조한 미세구조 마스터
CN103080843B (zh) 用于印刷具有大焦深的周期图案的方法和设备
US4567123A (en) Diffusing plate
KR20040102089A (ko) 이미징 방법
JP3575860B2 (ja) ディフューザ製造方法およびディフューザ
JP4458394B2 (ja) 非干渉光を用いて光学マスターを作成する作成方法
US5764342A (en) Method and system for controlling the relative size of images formed in light-sensitive media
US4372649A (en) Extended area diffractive subtractive color filters
WO1989006596A1 (fr) Procede de fabrication d'une fine lentille
US8867135B2 (en) Non-attenuating light collimating articles for graphic arts
CA1116897A (fr) Micro-images a demi-teintes a grande resolution et methode d'obtention
KR950704720A (ko) 렌즈 어레이 사진석판노출장치와 그 방법(lens array photolithography)
KR100282810B1 (ko) 노광방법 및 장치
WO2004001508A2 (fr) Procede et dispositif de photolithographie sans masque
US20040096751A1 (en) Method for the manufacture of high-quality total internal reflection holograms
KR20060119873A (ko) 광 밸브 배열 및 광 수렴 배열을 이용한 광학 이미지 형성
WO1995023710A1 (fr) Materiau de dosage de la lumiere et procede de fabrication de ce materiau
JP3273139B1 (ja) 印刷用刷版の画素密度複数段順次露光方法及びその装置
JPH02173781A (ja) 像形成方法およびパターン転写方法
Nelson et al. Low cost paths to binary optics
JPH0511454A (ja) ホログラム描画装置

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20001118

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): DE FR GB

A4 Supplementary search report drawn up and despatched

Effective date: 20060302

RIC1 Information provided on ipc code assigned before grant

Ipc: G02B 5/32 20060101ALI20060227BHEP

Ipc: G03H 1/06 20060101AFI20060227BHEP

17Q First examination report despatched

Effective date: 20061004

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20070215