EP1068778A1 - Plasma torch with a microwave transmitter - Google Patents
Plasma torch with a microwave transmitterInfo
- Publication number
- EP1068778A1 EP1068778A1 EP99920621A EP99920621A EP1068778A1 EP 1068778 A1 EP1068778 A1 EP 1068778A1 EP 99920621 A EP99920621 A EP 99920621A EP 99920621 A EP99920621 A EP 99920621A EP 1068778 A1 EP1068778 A1 EP 1068778A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- plasma torch
- waveguide
- torch according
- electrode
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004020 conductor Substances 0.000 claims abstract description 36
- 230000008878 coupling Effects 0.000 claims abstract description 33
- 238000010168 coupling process Methods 0.000 claims abstract description 33
- 238000005859 coupling reaction Methods 0.000 claims abstract description 33
- 229910001369 Brass Inorganic materials 0.000 claims description 9
- 239000010951 brass Substances 0.000 claims description 9
- 239000012212 insulator Substances 0.000 claims description 7
- 229910000765 intermetallic Inorganic materials 0.000 claims 1
- 239000000725 suspension Substances 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 abstract 1
- 210000002381 plasma Anatomy 0.000 description 39
- 239000007789 gas Substances 0.000 description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- 238000000034 method Methods 0.000 description 11
- 230000008569 process Effects 0.000 description 11
- 238000006880 cross-coupling reaction Methods 0.000 description 10
- 239000010453 quartz Substances 0.000 description 7
- 230000008901 benefit Effects 0.000 description 5
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 229910002110 ceramic alloy Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910002109 metal ceramic alloy Inorganic materials 0.000 description 1
- 239000000078 metal ceramic alloy Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Definitions
- the invention relates to a plasma torch with a microwave transmitter according to the preamble of the claims, which is intended, for example, for coating surfaces and for generating radicals.
- Cyclotron frequency to that of the microwave generator.
- An electrodeless microwave gas discharge is used.
- the device must be cooled when it is in operation.
- These plasma generators have a complex structure and are limited in their dimensions.
- the technical effort for microwave discharge systems is high. No large powers can be transmitted and it cannot be seen that high density plasmas are stable in the case of large powers.
- Microwave transmitter unit is attached to one end of a rectangular waveguide.
- the microwaves generated run through the waveguide and meet at its other end a quartz glass insert through which a special gas flows.
- the flow comes about through a negative pressure maintained in the recipient.
- a microwave is created by the microwave energy, which flows through the quartz glass insert into the recipient.
- the process is characterized in that it has no electrodes.
- the quartz glass insert is not suitable for large-scale continuous operation. Because of the undesirably high temperatures, melting phenomena occur on it, or complex cooling devices have to be provided in addition.
- the glass can be destroyed during assembly or disassembly and due to the thermal expansion of the metal components.
- this arrangement is not suitable for matching the impedance and for achieving a low-reflection hollow waveguide.
- the invention is therefore based on the object of creating a plasma torch which generates a plasma in the region close to normal pressure with high densities.
- High performance should be able to be transferred.
- the plasma torch should be characterized by stable combustion and efficient use of microwave power. Avoid resulting quartz tubes or quartz domes for generating the plasma.
- a plasma torch which is overall simple in construction is to be created.
- the coaxial conductor is directed transversely in a cross coupling or parallel to the waveguide in an axial coupling, that is to say whether its longitudinal axes preferably form a right angle with one another or whether their longitudinal axes essentially coincide with one another.
- the plasma torch contains a vacuum chamber and a magnetron, which generates a field strength sufficient for plasma formation even within the val um chamber.
- a recipient adjoining the coaxial conductor is under a pressure of 100 Pa to 10 kPa, which is suitable for the formation of the plasma. A high degree of efficiency is achieved regardless of the type of coupling.
- the plasma torch according to the invention manages without cooling and magnetic coils.
- the advantage of using a hollow waveguide instead of an AC waveguide is that the microwave power is coupled into the plasma not only in the vicinity of the nozzle, where the greatest field strengths occur, but via the hollow waves along the entire waveguide axis.
- This design enables a quasi-electrode-less coupling, which reduces the thermal load on the nozzle.
- the hollow electrode is advantageously designed as a truncated cone and fastened to a non-conductive intermediate piece which is connected to the coaxial conductor via a preferably disc-shaped holder.
- the nozzle is connected to a gas connection through the intermediate piece.
- the retaining washer is flanged to the coaxial conductor and the waveguide.
- the hollow electrode is advantageously designed as a truncated cone, the top surface of which faces the recipient. On this side, it has a nozzle, preferably screwed in and replaceable, which is inserted into its cavity and has four outlet openings for the process gas which are at regular intervals on a circle around the center of the outlet plane and in the outlet plane. This leads to an optimal conduction of the microwave to the outlet level (nozzle tip) and a more favorable energy input into the plasma flame.
- a nozzle suitable for high temperatures advantageously consists of a metallic-ceramic alloy.
- An electrically non-conductive insulator thermally insulates the space of the plasma flame from the coupling.
- the electrode is axially and possibly radially adjustable.
- a brass part and a second hissing piece advantageously connect the nozzle and the first intermediate piece to a gas connection.
- the brass part always guarantees the electromagnetic coupling of the waveguide and coaxial conductor.
- the waveguide, preferably a rectangular waveguide, of the cross coupling is provided with two screws.
- the tuning is advantageously carried out by changing its length. For this purpose it consists, for example, of two parts which can be telescopically pushed into one another, even during the process.
- One of the tubes can be provided with longitudinal slots and resilient tabs remaining between them.
- a microwave seal is advantageously provided in an annular gap located between the tubes in the overlap area.
- 1 is a cross coupling of a rectangular waveguide with a coaxial conductor in longitudinal section
- Fig. 2 shows an axial coupling of a circular waveguide with a
- Coaxial conductor in longitudinal section and Fig. 3 is an enlarged view of the front view of the nozzle.
- Fig. 1 is coupled to a rectangular waveguide 1 with a longitudinal axis XX, a cylindrical coaxial conductor 2 with a longitudinal axis YY via a coupling piece 3 near one of its ends so that the longitudinal axes XX and YY are directed at right angles to each other.
- the coupling piece 3 is bowl-shaped with a central opening 4 and a peripheral flange 5 and contains a receiving disk 6 for an intermediate piece 7 made of insulating material.
- the disc 6 is rigidly and tightly connected to the coupling piece 3 by means of a ring 8 screwed to the peripheral flange 5.
- the central opening 4 in the coupling piece 3 corresponds to an identical opening 9 in the rectangular waveguide 1, which is also surrounded by a flange 10 to which the coupling piece 3 is screwed.
- the ring 8 is the end part of a waveguide 20, which contains an insulator 11 and at the other end of which there is a recipient 12.
- Aufhahmerance 6, intermediate piece 7 and insulator 11 are made sufficiently solid and together form a gas-tight, thermally insulating, but microwave-permeable transition between the rectangular waveguide 1 and the waveguide 20.
- the intermediate piece 7 must have dielectric properties that a low-reflection waveguide on Ensure transition.
- a conical electrode 13 made of a metal-ceramic alloy is fastened to the intermediate piece 7 on its side facing the recipient 12 and, like the intermediate piece 7, has an axial passage 14 into which a nozzle 22 is fixed at the free end of the electrode 13 or used interchangeably, preferably screwed.
- the longitudinal axis of the electrode 13 coincides with the axis YY.
- the bushing 14 is followed by a brass part provided with an axial bore 15 16 with an insulating, the axial bore 15 continuing connector 17, which leads to a gas connection 18.
- the connector 17 is held by a flat support 19 which is tightly screwed to the rectangular waveguide 1.
- the cylindrical waveguide 20 and the electrode 13 together form a coaxial conductor 2.
- the frustoconical electrode 13 is located in a corresponding recess 21 in the insulator 11 so that the nozzle 22 protrudes beyond the insulator 11 on the recipient side.
- the rectangular waveguide 1 is provided at the other end with a magnetron 23, from which microwaves are generated and transmitted through the conductor 1. Two screws (steps) 24 are used to influence the microwaves on the coupling.
- the microwaves generated by the magnetron 23 pass through the conductor 1 and are matched to the coupling by the screws 24.
- the cross coupling consists of a coupling pin which is essentially identical to the electrode 13 with which it projects into the circular waveguide 20 and forms the coaxial line with it.
- the coupling pin 13 has the task of guiding the process gas and letting a plasma or a plasma flame 25 arise at the opening of the nozzle 22.
- the gas is fed into the coupling pin from the outer gas connection 18 via the bores 15 in the connecting piece 17 made of Teflon and in the brass part 16, and the passage 14 in the intermediate piece 7 likewise made of Teflon.
- the brass part 16 also ensures good coupling of the microwave.
- the electrode 13 is fastened in an insulated manner in the coaxial conductor 2 by the connecting piece 7.
- the geometry of the electrode 13 is optimally matched to the process requirements. It ensures maximum dielectric strength. What is important for the operation is its favorable length, which can be changed by the bushing 14 which can be adjusted by means of a thread in the electrode 13. Their cross-section is selected so that the coaxial conductor 2 ensures optimal conduction of the electromagnetic wave and the highest field strength occurs at the nozzle tip. This is very important because the plasma ignites at the point of greatest field strength.
- the nozzle 22 is made of a special material. She consists of a composite material that has ceramic components and is metallically conductive.
- the ceramic fulfills the task of thermal insulation of the plasma cloud from the electrode 13.
- the plasma can be operated up to a pressure of 35 kPa.
- a significantly larger mass throughput can thus be achieved.
- This is a great advantage in order to be able to generate many more reaction partners in a corresponding process.
- This makes it possible to greatly reduce process times due to the significantly increased mass throughput.
- Another advantage of this burner is that these parameters can also be achieved with air as the process gas. This eliminates all expensive additional gases, such as noble gases (argon).
- an air-cooled magnetron 23 connected to a control unit 26 is attached to a base plate 30 with a fan 27, a temperature monitor 28 and a heating transformer 29.
- the magnetron 23 for generating the microwaves has a power of 2 kW and emits electromagnetic waves with a fixed frequency of 2.45 GHz and a wavelength of 12.24 cm. Its output can be regulated linearly between 10% and 100% of the maximum output by the control unit 26.
- the temperature monitor with the thermal switch is connected to the resonator of the magnetron 23. At a temperature of 120 ° C it switches off the magnetron for safety reasons.
- the base plate 30 is fastened to a round hollow conductor 31 which has an inner tube 32 with a diameter of 100 mm and a wall thickness of 2 mm and an outer tube 33 with a diameter of 104 mm and a wall thickness of 2 mm.
- the tubes 32, 33 are very well fitted into one another and are telescopically displaceable. They can be fixed to one another with a clamping screw 34.
- the outer tube 33 is provided to produce a certain pressure when moving with longitudinal slots 35, only one of which can be seen, so that resilient tabs are formed on the outer tube 33 between the slots 35, which press slightly against the inner tube and prevent unwanted displacement of both tubes 32 , 33 prevent each other as far as possible even when the clamping is released. At the same time, this improves the electrical contact between the tubes 32, 33, and it - 8th -
- a microwave seal 36 for example in the form of a metal gauze, can be inserted into the annular gap between the two tubes 32, 33.
- the outer tube 33 is provided at its end facing away from the magnetron 23 with a flange 37, via which the axial coupling takes place with an adjoining coaxial conductor 2, which has a common longitudinal axis X-Y with the circular waveguide 31. With this coupling, a longitudinal wave is coupled out into the coaxial conductor 2, and an axial electric field is created.
- the coaxial conductor 2 and also an adjoining recipient 12 have the same diameter or cross-section as the outer tube 33.
- the recipient 12 simultaneously fulfills the task of a waveguide which prevents the waves from spreading laterally and in this way microwave power over a considerable distance couples into the plasma 25 behind the nozzle 22 along the axis XY (likewise the axis YY in FIG. 1).
- the coaxial conductor 2 also has at its end facing the circular waveguide 31 a flange 38 which is adapted to the flange 37, is screwed to it and essentially forms a coupling piece which corresponds to the coupling piece 3 of FIG. 1.
- Both flanges 37, 38 encompass the periphery of a receiving disc 6 made of any material (aluminum, quartz glass) and hold it vacuum-tight and firmly.
- the inner conductor 39 of the coaxial line 2 is suspended in an electrically insulated manner via an intermediate piece 7 made of PTFE.
- Teflon has the advantage that it is easy to work with and guarantees permanent vacuum tightness.
- This vacuum feedthrough also fulfills the task of carrying out the microwave waves in the recipient 12 and the thermal insulation of the waveguide 32 from the hot plasma 25.
- the inner conductor 39 serves to couple the circular waveguide and recipient, the gas supply and the expansion of the gas via an electrode
- the electrode 13 screwed nozzle 22 into the recipient 12. Its position in the coaxial conductor 2 and its length are adjustable to match the microwave.
- the electrode 13 is fastened to the intermediate piece 7 and, like this, has a passage 14 for the gas supply.
- hose 14 can be a compressed air hose 40 made of PE (polyethylene) - 9 -
- Brass part (similar to Fig. 1) can be connected.
- Intermediate piece 7, electrode 13 and nozzle 22 form an antenna, the outer diameter of which is 20 mm. Its longitudinal axis coincides with the XY axis.
- the plasma 25 ignites at the nozzle 22 screwed in at the end of the antenna.
- a detachable connection between the electrode 13 and the nozzle 22 is important in order to be able to replace or replace the nozzle 22. Since the nozzle 22 is exposed to very high thermal loads, it is made of high-temperature resistant steel; For example, a metallic alloy with a maximum operating temperature of 1425 ° C is used. This material is characterized in that the nozzle 22 is metallically conductive and forms a ceramic surface under the influence of high temperatures, which can withstand the high temperatures.
- the nozzle 22 ensures a strong swirling of the plasma 25.
- four gas outlet openings 43 each having a diameter of 1 mm are provided in the outlet plane 41 of the nozzle 22, preferably in a regular arrangement on a circle 42.
- a thermal insulator 11 is arranged between the latter and the plasma flame 25, through which the electrode 13 with the nozzle 22 projects.
- the recipient 12 like the coaxial conductor 2, consists of a tube with a diameter of 104 mm, a wall thickness of 2 mm and a length of 300 mm. It can be provided with means, not shown, for temperature measurement, for pumping out and for monitoring the flame. Air can advantageously be used as the process gas. The operation of the plasma 25 is possible up to a pressure of 100 kPa. This enables an even greater mass throughput to be achieved.
- the axial coupling according to the invention is particularly well suited to generate the highest possible energy and many radicals in the recipient. Overall, the axial coupling according to the invention offers the following advantages: It enables efficient use of the microwave power. - It enables uncomplicated assembly. - 10 -
- the pipes 32, 33 can be mutually fixed with a clamp that encompasses both.
- a membrane bellows and interchangeable circular waveguide pieces can also be used to change the length of the circular waveguide 31.
- the quick, simple and precise adjustment of the length of the round waveguide is conducive to being able to adjust the diaphragm bellows in stages or continuously along a linear guide while the device according to the invention is in operation.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19814812 | 1998-04-02 | ||
DE19814812A DE19814812C2 (en) | 1998-04-02 | 1998-04-02 | Plasma torch with a microwave transmitter |
PCT/EP1999/002413 WO1999052332A1 (en) | 1998-04-02 | 1999-04-01 | Plasma torch with a microwave transmitter |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1068778A1 true EP1068778A1 (en) | 2001-01-17 |
EP1068778B1 EP1068778B1 (en) | 2003-01-29 |
Family
ID=7863378
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP99920621A Expired - Lifetime EP1068778B1 (en) | 1998-04-02 | 1999-04-01 | Plasma torch with a microwave transmitter |
Country Status (7)
Country | Link |
---|---|
US (1) | US6388225B1 (en) |
EP (1) | EP1068778B1 (en) |
AT (1) | ATE232042T1 (en) |
CA (1) | CA2327093A1 (en) |
DE (1) | DE19814812C2 (en) |
ES (1) | ES2192383T3 (en) |
WO (1) | WO1999052332A1 (en) |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7591957B2 (en) * | 2001-01-30 | 2009-09-22 | Rapt Industries, Inc. | Method for atmospheric pressure reactive atom plasma processing for surface modification |
US6660177B2 (en) * | 2001-11-07 | 2003-12-09 | Rapt Industries Inc. | Apparatus and method for reactive atom plasma processing for material deposition |
EP1361437A1 (en) * | 2002-05-07 | 2003-11-12 | Centre National De La Recherche Scientifique (Cnrs) | A novel biological cancer marker and methods for determining the cancerous or non-cancerous phenotype of cells |
US20060237398A1 (en) * | 2002-05-08 | 2006-10-26 | Dougherty Mike L Sr | Plasma-assisted processing in a manufacturing line |
US20060233682A1 (en) * | 2002-05-08 | 2006-10-19 | Cherian Kuruvilla A | Plasma-assisted engine exhaust treatment |
US7465362B2 (en) * | 2002-05-08 | 2008-12-16 | Btu International, Inc. | Plasma-assisted nitrogen surface-treatment |
US7638727B2 (en) * | 2002-05-08 | 2009-12-29 | Btu International Inc. | Plasma-assisted heat treatment |
US7494904B2 (en) * | 2002-05-08 | 2009-02-24 | Btu International, Inc. | Plasma-assisted doping |
US20060062930A1 (en) * | 2002-05-08 | 2006-03-23 | Devendra Kumar | Plasma-assisted carburizing |
US20060228497A1 (en) * | 2002-05-08 | 2006-10-12 | Satyendra Kumar | Plasma-assisted coating |
US7445817B2 (en) * | 2002-05-08 | 2008-11-04 | Btu International Inc. | Plasma-assisted formation of carbon structures |
US7497922B2 (en) * | 2002-05-08 | 2009-03-03 | Btu International, Inc. | Plasma-assisted gas production |
US20060057016A1 (en) * | 2002-05-08 | 2006-03-16 | Devendra Kumar | Plasma-assisted sintering |
US7560657B2 (en) * | 2002-05-08 | 2009-07-14 | Btu International Inc. | Plasma-assisted processing in a manufacturing line |
US6870124B2 (en) * | 2002-05-08 | 2005-03-22 | Dana Corporation | Plasma-assisted joining |
US7498066B2 (en) * | 2002-05-08 | 2009-03-03 | Btu International Inc. | Plasma-assisted enhanced coating |
US20050233091A1 (en) * | 2002-05-08 | 2005-10-20 | Devendra Kumar | Plasma-assisted coating |
DE60223726T2 (en) * | 2002-05-08 | 2008-10-30 | Leonhard Kurz Stiftung & Co. Kg | METHOD OF DECORATING A BIG, THREE-DIMENSIONAL PLASTIC OBJECT |
US20040173316A1 (en) * | 2003-03-07 | 2004-09-09 | Carr Jeffrey W. | Apparatus and method using a microwave source for reactive atom plasma processing |
US7371992B2 (en) | 2003-03-07 | 2008-05-13 | Rapt Industries, Inc. | Method for non-contact cleaning of a surface |
US7304263B2 (en) * | 2003-08-14 | 2007-12-04 | Rapt Industries, Inc. | Systems and methods utilizing an aperture with a reactive atom plasma torch |
US7297892B2 (en) * | 2003-08-14 | 2007-11-20 | Rapt Industries, Inc. | Systems and methods for laser-assisted plasma processing |
US7091441B1 (en) * | 2004-03-19 | 2006-08-15 | Polytechnic University | Portable arc-seeded microwave plasma torch |
JP4109213B2 (en) * | 2004-03-31 | 2008-07-02 | 株式会社アドテック プラズマ テクノロジー | Coaxial microwave plasma torch |
WO2005098083A2 (en) * | 2004-04-07 | 2005-10-20 | Michigan State University | Miniature microwave plasma torch application and method of use thereof |
US7164095B2 (en) * | 2004-07-07 | 2007-01-16 | Noritsu Koki Co., Ltd. | Microwave plasma nozzle with enhanced plume stability and heating efficiency |
US7271363B2 (en) * | 2004-09-01 | 2007-09-18 | Noritsu Koki Co., Ltd. | Portable microwave plasma systems including a supply line for gas and microwaves |
WO2006127037A2 (en) * | 2004-11-05 | 2006-11-30 | Dana Corporation | Atmospheric pressure processing using microwave-generated plasmas |
US9681529B1 (en) * | 2006-01-06 | 2017-06-13 | The United States Of America As Represented By The Secretary Of The Air Force | Microwave adapting plasma torch module |
TW200742506A (en) | 2006-02-17 | 2007-11-01 | Noritsu Koki Co Ltd | Plasma generation apparatus and work process apparatus |
US8748785B2 (en) * | 2007-01-18 | 2014-06-10 | Amastan Llc | Microwave plasma apparatus and method for materials processing |
US20100074810A1 (en) * | 2008-09-23 | 2010-03-25 | Sang Hun Lee | Plasma generating system having tunable plasma nozzle |
US7921804B2 (en) * | 2008-12-08 | 2011-04-12 | Amarante Technologies, Inc. | Plasma generating nozzle having impedance control mechanism |
US20100201272A1 (en) * | 2009-02-09 | 2010-08-12 | Sang Hun Lee | Plasma generating system having nozzle with electrical biasing |
US8932435B2 (en) * | 2011-08-12 | 2015-01-13 | Harris Corporation | Hydrocarbon resource processing device including radio frequency applicator and related methods |
CN102530859B (en) * | 2011-12-29 | 2013-11-06 | 武汉凯迪工程技术研究总院有限公司 | External-heating-type microwave plasma gasification furnace and synthesis gas production method |
KR101967646B1 (en) * | 2012-03-21 | 2019-04-10 | 엘지전자 주식회사 | Microwave gas burner |
US10477665B2 (en) * | 2012-04-13 | 2019-11-12 | Amastan Technologies Inc. | Microwave plasma torch generating laminar flow for materials processing |
CN103269560B (en) * | 2013-05-03 | 2016-07-06 | 大连海事大学 | A kind of microwave liquid phase plasma generator |
CN103269561B (en) * | 2013-05-15 | 2016-01-06 | 浙江大学 | Waveguide direct-feed-type microwave plasma torch device |
KR101765271B1 (en) * | 2016-09-06 | 2017-08-04 | 이성주 | Hospital waste plasma incinerator |
DE102017130210A1 (en) | 2017-12-15 | 2019-06-19 | Hegwein GmbH | Plasma torch tip for a plasma torch |
DE102018100683A1 (en) | 2018-01-12 | 2019-07-18 | EMIL OTTO Flux- und Oberflächentechnik GmbH | Process for producing a solder |
ES2696227B2 (en) * | 2018-07-10 | 2019-06-12 | Centro De Investig Energeticas Medioambientales Y Tecnologicas Ciemat | INTERNAL ION SOURCE FOR LOW EROSION CYCLONES |
CN108901114B (en) * | 2018-07-27 | 2020-07-10 | 上海工程技术大学 | Plasma jet generating device |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3353060A (en) * | 1964-11-28 | 1967-11-14 | Hitachi Ltd | High-frequency discharge plasma generator with an auxiliary electrode |
FR2480552A1 (en) * | 1980-04-10 | 1981-10-16 | Anvar | PLASMA GENERATOR |
FR2533397A2 (en) * | 1982-09-16 | 1984-03-23 | Anvar | IMPROVEMENTS IN PLASMA TORCHES |
FR2616030A1 (en) * | 1987-06-01 | 1988-12-02 | Commissariat Energie Atomique | PLASMA ETCHING OR DEPOSITION METHOD AND DEVICE FOR IMPLEMENTING THE METHOD |
FR2616614B1 (en) * | 1987-06-10 | 1989-10-20 | Air Liquide | MICROWAVE PLASMA TORCH, DEVICE COMPRISING SUCH A TORCH AND METHOD FOR MANUFACTURING POWDER USING THE SAME |
DE3738352A1 (en) * | 1987-11-11 | 1989-05-24 | Technics Plasma Gmbh | FILAMENTLESS MAGNETRON ION BEAM SYSTEM |
DE3905303C2 (en) * | 1988-02-24 | 1996-07-04 | Hitachi Ltd | Device for generating a plasma by means of microwaves |
JP2805009B2 (en) * | 1988-05-11 | 1998-09-30 | 株式会社日立製作所 | Plasma generator and plasma element analyzer |
US4943345A (en) * | 1989-03-23 | 1990-07-24 | Board Of Trustees Operating Michigan State University | Plasma reactor apparatus and method for treating a substrate |
US5349154A (en) * | 1991-10-16 | 1994-09-20 | Rockwell International Corporation | Diamond growth by microwave generated plasma flame |
US5439154A (en) * | 1994-05-02 | 1995-08-08 | Delligatti; Anna | Diaper bag |
TW285746B (en) * | 1994-10-26 | 1996-09-11 | Matsushita Electric Ind Co Ltd | |
DE19511915C2 (en) * | 1995-03-31 | 1997-04-30 | Wu Jeng Ming Dipl Ing | Plasma torch with a microwave generator |
-
1998
- 1998-04-02 DE DE19814812A patent/DE19814812C2/en not_active Expired - Fee Related
-
1999
- 1999-04-01 US US09/647,631 patent/US6388225B1/en not_active Expired - Fee Related
- 1999-04-01 WO PCT/EP1999/002413 patent/WO1999052332A1/en active IP Right Grant
- 1999-04-01 AT AT99920621T patent/ATE232042T1/en not_active IP Right Cessation
- 1999-04-01 ES ES99920621T patent/ES2192383T3/en not_active Expired - Lifetime
- 1999-04-01 EP EP99920621A patent/EP1068778B1/en not_active Expired - Lifetime
- 1999-04-01 CA CA002327093A patent/CA2327093A1/en not_active Abandoned
Non-Patent Citations (1)
Title |
---|
See references of WO9952332A1 * |
Also Published As
Publication number | Publication date |
---|---|
US6388225B1 (en) | 2002-05-14 |
ES2192383T3 (en) | 2003-10-01 |
ATE232042T1 (en) | 2003-02-15 |
EP1068778B1 (en) | 2003-01-29 |
CA2327093A1 (en) | 1999-10-14 |
DE19814812C2 (en) | 2000-05-11 |
DE19814812A1 (en) | 1999-10-14 |
WO1999052332A1 (en) | 1999-10-14 |
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