EP1031638A1 - High purity aluminium foil for electrolytic capacitors - Google Patents
High purity aluminium foil for electrolytic capacitors Download PDFInfo
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- EP1031638A1 EP1031638A1 EP00420034A EP00420034A EP1031638A1 EP 1031638 A1 EP1031638 A1 EP 1031638A1 EP 00420034 A EP00420034 A EP 00420034A EP 00420034 A EP00420034 A EP 00420034A EP 1031638 A1 EP1031638 A1 EP 1031638A1
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/04—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon
Definitions
- the invention relates to thin sheets or strips of refined aluminum, of purity greater than 99.9%, which, after having undergone a pitting surface treatment ("etching") intended to increase their specific surface, are used in manufacturing anode of electrolytic capacitors, especially high capacitors voltage.
- etching pitting surface treatment
- Patent EP 0490574 of Showa Aluminum published in 1992, describes the concentration, at various contents, elements Fe, Cu, Zn, Mn, Ga, P, V, Ti, Cr, Ni, Ta, Zr, C, Be, Pb and In, i.e. at the interface between the surface oxide layer of the sheet and the body of the leaf, either in the oxide layer.
- concentration ratio of elements between the concentration zone and the core of the sheet, measured with the probe ionic, is between 1.2 and 30.
- the object of the invention is to improve the beneficial effect of the surface concentration of elements Pb, B and In on the puncture ability of thin aluminum sheets refined aluminum for electrolytic capacitors. It is based on the implementation evidence of the favorable effect of a homogeneous distribution of these 3 elements at the leaf area.
- FIG. 1 represents an example of an intensity profile obtained by ionic analysis for an element, on a logarithmic scale, as a function of the advance distance (in ⁇ m) perpendicular to the rolling direction of the sheet, and the determination maximum, minimum and average intensities required to calculate the ratio of dispersion.
- Figures 2a and 2b are micrographs illustrating the distribution of the bites after etching resulting respectively from a heterogeneous and homogeneous distribution of elements Pb, B and In on the surface of the sheet.
- the thin aluminum sheets used to manufacture the electrodes of electrolytic capacitors are obtained from refined aluminum of purity at less equal to 99.9%.
- the refining process used can be either a refining "3-layer" electrolytic, as described in patents FR 759588 and FR 832528, or a method by segregation as described in patent FR 1594154.
- the metal is then hot rolled, then cold rolled to the final thickness, which is around 0.1 mm.
- the dispersion ratio Rd (I max - I min ) / I avg is less than 5, and preferably 2, for each of the elements Pb, B and In.
- the intensities are measured using an ion analyzer of the SIMS (Secondary Ion Mass Spectrometry) type, by the so-called "step-scan" method.
- the advance step is 10 ⁇ m and the abraded area is a square of 250 ⁇ m side.
- the average signal intensity I avg for an element is obtained by calculating the arithmetic mean of the intensities measured on the profile.
- the upper limit intensity I max is the arithmetic mean of the maximum intensities obtained in the following manner: they are defined by the intensity at the second point of three consecutive analysis points having a maximum intensity on the second point. Only the maxima exceeding a threshold fixed slightly above the average intensity are retained.
- the lower limit intensity I min is the arithmetic mean of the intensities obtained when a minimum is observed on the second point of three successive analysis points, retaining only the intensities exceeding a certain threshold located slightly below of average intensity.
- This method is illustrated by the diagram in Figure 1, representing the profile intensity as a function of the distance traveled by the ion analyzer on the sample.
- the measurement points are represented by a small circle, and the points retained as minimum and maximum intensities are those surrounded by a square, which are located outside the band delimited by the two threshold lines.
- the abrasion conditions are stable after 125 ⁇ m of displacement.
- the first 125 microns of each lateral profile are therefore systematically ignored.
- the analysis depth is less than 0.1 ⁇ m.
- the measurements are carried out on several locations to obtain values reliable statistics.
- the average intensities were measured on each sample, maximum and minimum for each of the elements according to the method described above, and calculated the dispersion ratio Rd in each case.
- the capacity of the capacitors produced was then measured from the pitted samples according to the following method: the aluminum sheets are electrolysed in a solution containing 5% HCl and 15% H 2 SO 4 with a direct current density of 200 mA / cm 2 for 60 s at 85 ° C. The leaves are then immersed in a 5% HCl solution for 8 min. The oxide is formed at a voltage of 450 V in a solution of ammonium borate. The capacity is measured in ⁇ F / cm 2 , but then reduced as a percentage relative to a refined reference sheet. The results obtained are collated in Table 1. Ech. Pb (ppm) B (ppm) In (ppm) Rd Pb Rd B Rd In Cap.
Abstract
Description
L'invention concerne les feuilles ou bandes minces en aluminium raffiné, de pureté supérieure à 99,9%, qui, après avoir subi un traitement de surface de piqûration (" etching ") destiné à augmenter leur surface spécifique, sont utilisées à la fabrication d'anodes de condensateurs électrolytiques, notamment de condensateurs haute tension.The invention relates to thin sheets or strips of refined aluminum, of purity greater than 99.9%, which, after having undergone a pitting surface treatment ("etching") intended to increase their specific surface, are used in manufacturing anode of electrolytic capacitors, especially high capacitors voltage.
De nombreux travaux ont été réalisés pour étudier l'effet de certains éléments à l'état de traces dans l'aluminium sur la densité de pores obtenues au traitement d'etching et la capacité du condensateur fabriqué à partir de feuilles de cet aluminium. Le rôle du plomb, de l'indium et du bore a été particulièrement mis en évidence.Many works have been carried out to study the effect of certain elements in the state traces in aluminum on the density of pores obtained during the etching treatment and the capacitance of the capacitor made from sheets of this aluminum. The role of lead, indium and boron were particularly highlighted.
L'effet du plomb est mentionné pour la première fois dans le brevet US 3997339 de Siemens, publié en 1976, qui décrit l'influence de l'antimoine, du baryum et du zinc entre 5 et 220 ppm, du plomb et du bismuth jusqu'à 0,5 ppm et du calcium et du chrome jusqu'à 2 ppm. La demande de brevet JP 58-42747 de Toyo Aluminium mentionne le rôle favorable pour la piqûration d'une teneur en indium de 0,1 à 1 ppm L'article de K. Arai, T. Suzuki et T. Atsumi " Effect of Trace Elements on Etching of Aluminum Electrolytic Capacitor Foil " Journal of the Electrochemical Society, juillet 1985, étudie l'influence de traces de bismuth et de bore sur la morphologie de l'etching et la capacité.The effect of lead is mentioned for the first time in US Patent 3,997,339 to Siemens, published in 1976, which describes the influence of antimony, barium and zinc between 5 and 220 ppm, lead and bismuth up to 0.5 ppm and calcium and chromium up to 2 ppm. Toyo Aluminum's patent application JP 58-42747 mentions the favorable role for pitting an indium content of 0.1 to 1 ppm The article by K. Arai, T. Suzuki and T. Atsumi "Effect of Trace Elements on Etching of Aluminum Electrolytic Capacitor Foil "Journal of the Electrochemical Society, July 1985, studies the influence of traces of bismuth and boron on the morphology of stretching and capacity.
Certains travaux ont montré que, pour être pleinement efficaces, les éléments favorables doivent être concentrés dans une zone proche de la surface. Ainsi, la demande de brevet JP 57-194516-A de Toyo Aluminium, publiée en 1982, met en évidence l'effet bénéfique sur l'aptitude à l'etching d'une concentration, à une valeur comprise entre 50 et 2000 ppm, de la teneur en plomb, bismuth et/ou indium dans la zone superficielle située jusqu'à une profondeur de 0,1 µm.Some studies have shown that, to be fully effective, the elements favorable should be concentrated in an area close to the surface. So the Toyo Aluminum patent application JP 57-194516-A, published in 1982, sets out evidence of the beneficial effect on the stretching ability of a concentration, at a value between 50 and 2000 ppm, the content of lead, bismuth and / or indium in the surface area located to a depth of 0.1 µm.
Le brevet EP 0490574 de Showa Aluminium, publié en 1992, décrit la concentration, à des teneurs diverses, des éléments Fe, Cu, Zn, Mn, Ga, P, V, Ti, Cr, Ni, Ta, Zr, C, Be, Pb et In, soit à l'interface entre la couche d'oxyde superficielle de la feuille et le corps de la feuille, soit dans la couche d'oxyde. Le rapport de concentration des éléments entre la zone de concentration et le coeur de la feuille, mesuré à la sonde ionique, est compris entre 1,2 et 30.Patent EP 0490574 of Showa Aluminum, published in 1992, describes the concentration, at various contents, elements Fe, Cu, Zn, Mn, Ga, P, V, Ti, Cr, Ni, Ta, Zr, C, Be, Pb and In, i.e. at the interface between the surface oxide layer of the sheet and the body of the leaf, either in the oxide layer. The concentration ratio of elements between the concentration zone and the core of the sheet, measured with the probe ionic, is between 1.2 and 30.
Le brevet US 5128836 de Sumitomo Light Metal, publié en 1992, décrit la concentration de Pb, Bi et/ou In, à une teneur comprise entre 10 et 1000 ppm, dans une zone sous-superficielle comprise entre 0,1 et 0,2 µm de profondeur. Les méthodes proposées pour favoriser la migration en surface des divers éléments sont soit des traitements thermiques, par exemple un recuit final dans des conditions particulières, soit des dépôts physiques comme la pulvérisation cathodique ou l'implantation ionique.US Patent 5128836 to Sumitomo Light Metal, published in 1992, describes the concentration of Pb, Bi and / or In, at a content between 10 and 1000 ppm, in a sub-superficial zone between 0.1 and 0.2 µm deep. The proposed methods to promote surface migration of the various elements are either heat treatments, for example a final annealing under conditions particular physical deposits such as sputtering or ion implantation.
Enfin, il est connu que de faibles capacités sont obtenues lorsque la piqûration n'est pas homogène à la surface de la feuille. Le lien entre ces hétérogénéités de piqûration et la répartition en surface des éléments comme Pb, Bi ou In n'est cependant pas clairement établi, comme le montrent les articles de W. LIN et al. " The Effect of Lead Impurity on the DC-Etching Behaviour of Aluminum Foil for Electrolytic Capacitor Usage" Corrosion Science, vol. 38, n° 6, 1996, pp. 889-907, et " The Effect of Indium Impurity on the DC-Etching Behaviour of Aluminum Foil for Electrolytic Capacitor Usage ", Corrosion Science, vol.39, n° 9, 1997, pp.1531-1543.Finally, it is known that low capacities are obtained when the puncture is not not homogeneous on the leaf surface. The link between these pitting heterogeneities and the surface distribution of elements like Pb, Bi or In is however not clearly established, as shown by the articles by W. LIN et al. "The Effect of Lead Impurity on the DC-Etching Behavior of Aluminum Foil for Electrolytic Capacitor Usage "Corrosion Science, vol. 38, n ° 6, 1996, pp. 889-907, and" The Effect of Indium Impurity on the DC-Etching Behavior of Aluminum Foil for Electrolytic Capacitor Usage ", Corrosion Science, vol.39, n ° 9, 1997, pp.1531-1543.
L'invention a pour but d'améliorer l'effet bénéfique de la concentration en surface des éléments Pb, B et In sur l'aptitude à la piqûration des feuilles minces en aluminium aluminium raffiné pour condensateurs électrolytiques. Elle repose sur la mise en évidence de l'effet favorable d'une répartition homogène de ces 3 éléments à la surface de la feuille.The object of the invention is to improve the beneficial effect of the surface concentration of elements Pb, B and In on the puncture ability of thin aluminum sheets refined aluminum for electrolytic capacitors. It is based on the implementation evidence of the favorable effect of a homogeneous distribution of these 3 elements at the leaf area.
L'invention a pour objet une feuille mince en aluminium raffiné de pureté supérieure à 99,9% d'aluminium, destinée à la fabrication d'anodes de condensateurs électrolytiques, comportant l'un au moins des éléments Pb, B et In à une teneur moyenne totale (en poids) comprise entre 0,1 et 10 ppm (de préférence entre 0,5 et 5 ppm), pour laquelle la répartition de ces 3 éléments dans la zone superficielle de profondeur 0,1 µm est telle que leur intensité de signal obtenue par analyse ionique présente un rapport de dispersion : Rd = (Imax - Imin)/Imoyen inférieur à 5, et de préférence à 2.The subject of the invention is a thin sheet of refined aluminum with a purity greater than 99.9% of aluminum, intended for the manufacture of anodes of electrolytic capacitors, comprising at least one of the elements Pb, B and In at a total average content (by weight) of between 0.1 and 10 ppm (preferably between 0.5 and 5 ppm), for which the distribution of these 3 elements in the surface area of depth 0.1 µm is such that their intensity signal obtained by ionic analysis has a dispersion ratio: Rd = (I max - I min ) / I mean less than 5, and preferably 2.
La figure 1 représente un exemple de profil d'intensité obtenu par analyse ionique pour un élément, à l'échelle logarithmique, en fonction de la distance d'avance (en µm) perpendiculairement à la direction de laminage de la feuille, et la détermination des intensités maximale, minimale et moyenne nécessaires au calcul du rapport de dispersion.FIG. 1 represents an example of an intensity profile obtained by ionic analysis for an element, on a logarithmic scale, as a function of the advance distance (in µm) perpendicular to the rolling direction of the sheet, and the determination maximum, minimum and average intensities required to calculate the ratio of dispersion.
Les figures 2a et 2b sont des micrographies illustrant la répartition des piqûres après etching résultant respectivement d'une répartition hétérogène et homogène des éléments Pb, B et In en surface de la feuille.Figures 2a and 2b are micrographs illustrating the distribution of the bites after etching resulting respectively from a heterogeneous and homogeneous distribution of elements Pb, B and In on the surface of the sheet.
Les feuilles minces en aluminium utilisées pour la fabrication des électrodes de condensateurs électrolytiques sont obtenues à partir d'aluminium raffiné de pureté au moins égale à 99, 9%. Le procédé de raffinage utilisé peut être soit un raffinage électrolytique dit " 3 couches ", tel que décrit dans les brevets FR 759588 et FR 832528, soit un procédé par ségrégation tel que décrit dans le brevet FR 1594154. Le métal est ensuite laminé à chaud, puis à froid jusqu'à l'épaisseur finale, qui est de l'ordre de 0,1 mm. The thin aluminum sheets used to manufacture the electrodes of electrolytic capacitors are obtained from refined aluminum of purity at less equal to 99.9%. The refining process used can be either a refining "3-layer" electrolytic, as described in patents FR 759588 and FR 832528, or a method by segregation as described in patent FR 1594154. The metal is then hot rolled, then cold rolled to the final thickness, which is around 0.1 mm.
Il est connu que l'addition à l'aluminium de 0,1 à 10 ppm (en poids), et de préférence
0,5 à 5 ppm de plomb, de bore et/ou d'indium conduit à une amélioration de
l'aptitude à la piqûration de la feuille, et donc des caractéristiques électriques du
condensateur, et ce d'autant plus que ces éléments se concentrent à la surface de la
feuille, à une teneur comprise entre 10 et 1000 ppm dans la zone superficielle de
profondeur 1 µm. Cette concentration dans la zone superficielle est obtenue, selon
l'art antérieur, par un traitement final de recuit à une température comprise entre 400
et 600°C pendant une durée suffisante, généralement plusieurs heures.It is known that the addition to aluminum of 0.1 to 10 ppm (by weight), and preferably
0.5 to 5 ppm of lead, boron and / or indium leads to an improvement in
the puncture ability of the leaf, and therefore the electrical characteristics of the
capacitor, and all the more so since these elements are concentrated on the surface of the
leaf, at a content between 10 and 1000 ppm in the surface area of
Selon l'invention, le rapport de dispersion Rd = (Imax - Imin)/Imoy est inférieur à 5, et de préférence à 2, pour chacun des éléments Pb, B et In. Les intensités sont mesurées à l'aide d'un analyseur ionique du type SIMS (Secondary Ion Mass Spectrometry), par la méthode dite " step-scan ". Dans le mode utilisé, le pas d'avance est de 10 µm et la zone abrasée est un carré de 250 µm de côté. Ces paramètres sont bien adaptés à l'échelle des hétérogénéités observées à l'etching, comme le montre la figure 2.According to the invention, the dispersion ratio Rd = (I max - I min ) / I avg is less than 5, and preferably 2, for each of the elements Pb, B and In. The intensities are measured using an ion analyzer of the SIMS (Secondary Ion Mass Spectrometry) type, by the so-called "step-scan" method. In the mode used, the advance step is 10 µm and the abraded area is a square of 250 µm side. These parameters are well suited to the scale of heterogeneities observed at stretching, as shown in Figure 2.
L'intensité moyenne de signal Imoy pour un élément est obtenue en calculant la moyenne arithmétique des intensités mesurées sur le profil. L'intensité de limite haute Imax est la moyenne arithmétique des intensités maximales obtenues de la manière suivante : elles sont définies par l'intensité au second point de trois points d'analyse consécutifs présentant une intensité maximum sur le second point. On ne retient que les maxima dépassant un seuil fixé légèrement au-dessus de l'intensité moyenne. De même, l'intensité de limite basse Imin est la moyenne arithmétique des intensités obtenues lorsqu'on observe un minimum sur le second point de trois points d'analyse successifs, en ne retenant que les intensités dépassant un certain seuil situé légèrement en dessous de l'intensité moyenne.The average signal intensity I avg for an element is obtained by calculating the arithmetic mean of the intensities measured on the profile. The upper limit intensity I max is the arithmetic mean of the maximum intensities obtained in the following manner: they are defined by the intensity at the second point of three consecutive analysis points having a maximum intensity on the second point. Only the maxima exceeding a threshold fixed slightly above the average intensity are retained. Similarly, the lower limit intensity I min is the arithmetic mean of the intensities obtained when a minimum is observed on the second point of three successive analysis points, retaining only the intensities exceeding a certain threshold located slightly below of average intensity.
Cette méthode est illustrée par le diagramme de la figure 1, représentant le profil d'intensité en fonction de la distance parcourue par l'analyseur ionique sur l'échantillon. Les points de mesure sont représentés par un petit cercle, et les points retenus comme intensités minimales et maximales sont ceux entourés d'un carré, qui se situent à l'extérieur de la bande délimitée par les deux lignes de seuil.This method is illustrated by the diagram in Figure 1, representing the profile intensity as a function of the distance traveled by the ion analyzer on the sample. The measurement points are represented by a small circle, and the points retained as minimum and maximum intensities are those surrounded by a square, which are located outside the band delimited by the two threshold lines.
La distribution des éléments Pb, B et In selon l'invention est obtenue par un procédé comportant les étapes suivantes :
- coulée, avec vibration mécanique du marais, d'une plaque en aluminium raffiné de pureté supérieure à 99,9% avec une teneur totale en Pb + B + In comprise entre 0,1 et 10 ppm,
- homogénéisation à une température supérieure à 580°C d'une durée supérieure à 20 h,
- laminage à chaud et éventuellement à froid jusqu'à une épaisseur comprise entre 8 et 3 mm,
- recuit intermédiaire à une température supérieure à 400°C d'une durée comprise entre 1 et 100 h, de préférence sous gaz neutre,
- laminage à froid jusqu'à une épaisseur comprise entre 0,115 et 0,18 mm,
- recuit de restauration entre 200 et 280°C d'une durée de 1 à 80 h,
- laminage à froid final jusqu'à une épaisseur comprise entre 0,085 et 0,125 mm,
- recuit final entre 540 et 600°C d'une durée de 1 à 50 h.
- casting, with mechanical vibration of the marsh, of a refined aluminum plate of purity greater than 99.9% with a total content of Pb + B + In between 0.1 and 10 ppm,
- homogenization at a temperature above 580 ° C for a duration of more than 20 h,
- hot and possibly cold rolling to a thickness of between 8 and 3 mm,
- intermediate annealing at a temperature above 400 ° C. for a period of between 1 and 100 h, preferably under neutral gas,
- cold rolling to a thickness between 0.115 and 0.18 mm,
- restoration annealing between 200 and 280 ° C with a duration of 1 to 80 h,
- final cold rolling to a thickness between 0.085 and 0.125 mm,
- final annealing between 540 and 600 ° C lasting from 1 to 50 h.
Les inventeurs émettent l'hypothèse que la vibration mécanique lors de la coulée et/ou la combinaison de traitements thermiques à une température plus élevée que ceux de l'art antérieur conduisent à une plus grande homogénéité de répartition des éléments Pb, B et In. Cette homogénéité de répartition de ces éléments conduit à une répartition plus homogène des piqûres après etching, comme le montre la comparaison des micrographies réalisées par microscopie électronique à balayage et représentées aux figures 2a (selon l'art antérieur) et 2b (selon l'invention).The inventors hypothesize that the mechanical vibration during casting and / or the combination of heat treatments at a higher temperature than those of the prior art lead to greater homogeneity of distribution of elements Pb, B and In. This homogeneity of distribution of these elements leads to a more homogeneous distribution of bites after etching, as shown in the comparison of micrographs produced by scanning electron microscopy and shown in Figures 2a (according to the prior art) and 2b (according to the invention).
8 échantillons de feuille d'aluminium raffiné de pureté 99,99% avec les éléments d'addition indiqués au tableau 1 ont été préparés de la manière suivante:
- coulée, avec vibration mécanique, d'une plaque et homogénéisation de cette plaque 30 h à 600°C
- laminage à chaud et à froid jusqu'à une épaisseur de 6 mm,
- recuit intermédiaire de 15 h à une température de 450°C sous argon,
- laminage à froid jusqu'à une épaisseur de 0,125 mm,
- recuit intermédiaire de 35 h à une température de 250°C,
- laminage à froid jusqu'à 0,1 mm,
- recuit final de 10 h à 580°C sous argon.
- casting, with mechanical vibration, of a plate and homogenization of this plate 30 h at 600 ° C
- hot and cold rolling to a thickness of 6 mm,
- intermediate annealing for 15 h at a temperature of 450 ° C. under argon,
- cold rolling to a thickness of 0.125 mm,
- 35-hour intermediate annealing at a temperature of 250 ° C,
- cold rolling up to 0.1 mm,
- final annealing of 10 h at 580 ° C under argon.
4 échantillons de comparaison ont été préparés avec un procédé connu, à savoir :
- coulée (sans vibration mécanique) d'une plaque et homogénéisation de 30 h 550°C
- laminage à chaud et à froid jusqu'à 6 mm,
- recuit intermédiaire de 40 h à une température de 200°C
- laminage à froid à une épaisseur de 0,1 mm
- recuit final de 10 h à 580°C sous argon
- casting (without mechanical vibration) of a plate and homogenization of 30 h 550 ° C
- hot and cold rolling up to 6 mm,
- 40-hour intermediate annealing at a temperature of 200 ° C
- cold rolling to a thickness of 0.1 mm
- final annealing of 10 h at 580 ° C under argon
On a mesuré la teneur des éléments Pb, B et In dans la zone superficielle à l'aide d'une sonde ionique IMS 5F de la société CAMECA avec les paramètres suivants:
- ion primaire: xénon
- tension d'accélération: 8,5 kV
- courant primaire: 30 nA
- taille du cratère : 250 x 250 µm
- taille du faisceau: 30 µm
- zone analysée : 2 x 2 µm
- pas de déplacement : 10 µm
- déplacement total : 500 µm
- primary ion: xenon
- acceleration voltage: 8.5 kV
- primary current: 30 nA
- crater size: 250 x 250 µm
- beam size: 30 µm
- analyzed area: 2 x 2 µm
- no displacement: 10 µm
- total displacement: 500 µm
Dans ces conditions, les conditions d'abrasion sont stables après 125 µm de déplacement. Les 125 premiers microns de chaque profil latéral sont donc systématiquement ignorés. La profondeur d'analyse est inférieure à 0,1 µm. Les mesures sont effectuées sur plusieurs localisations pour obtenir des valeurs statistiques fiables. On a mesuré sur chaque échantillon les intensités moyenne, maximale et minimale pour chacun des éléments selon la méthode décrite plus haut, et calculé le rapport de dispersion Rd dans chaque cas.Under these conditions, the abrasion conditions are stable after 125 μm of displacement. The first 125 microns of each lateral profile are therefore systematically ignored. The analysis depth is less than 0.1 µm. The measurements are carried out on several locations to obtain values reliable statistics. The average intensities were measured on each sample, maximum and minimum for each of the elements according to the method described above, and calculated the dispersion ratio Rd in each case.
On a mesuré ensuite la capacité des condensateurs réalisés à partir des échantillons
piqûrés selon le procédé suivant: les feuilles d'aluminium sont électrolysées dans une
solution contenant 5% de HCl et 15% de H2SO4 avec une densité de courant continu
de 200 mA/cm2 pendant 60 s à 85°C. Les feuilles sont ensuite plongées dans une
solution à 5% HCl pendant 8 mn. La formation de l'oxyde est réalisée à une tension
de 450 V dans une solution de borate d'ammonium. La capacité est mesurée en
µF/cm2, mais ramenée ensuite en pourcentage par rapport à une feuille raffinée de
référence. Les résultats obtenus sont rassemblés au tableau 1.
On constate une amélioration de la capacité pour les échantillons 1 à 8, pour lesquels
le rapport de dispersion pour les 3 éléments considérés est inférieur à 5, par rapport
aux 4 échantillons 9 à 12, pour lesquels le rapport de dispersion est supérieur à 5 pour
l'un au moins des éléments.There is an improvement in capacity for
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9902386A FR2790008B1 (en) | 1999-02-23 | 1999-02-23 | REFINED ALLUMINUM SHEET FOR ELECTROLYTIC CAPACITORS |
FR9902386 | 1999-02-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1031638A1 true EP1031638A1 (en) | 2000-08-30 |
EP1031638B1 EP1031638B1 (en) | 2004-04-07 |
Family
ID=9542554
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP00420034A Expired - Lifetime EP1031638B1 (en) | 1999-02-23 | 2000-02-17 | High purity aluminium foil for electrolytic capacitors |
Country Status (10)
Country | Link |
---|---|
US (1) | US6471793B1 (en) |
EP (1) | EP1031638B1 (en) |
JP (1) | JP2000252170A (en) |
KR (1) | KR100696971B1 (en) |
CN (1) | CN1201350C (en) |
DE (1) | DE60009591T2 (en) |
FR (1) | FR2790008B1 (en) |
HK (1) | HK1028924A1 (en) |
RU (1) | RU2231847C2 (en) |
TW (1) | TWI233452B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2844810B1 (en) * | 2002-09-24 | 2004-11-05 | Pechiney Rhenalu | REFINED ALUMINUM SHEET OR STRIP FOR ELECTROLYTIC CAPACITORS |
JP2007046093A (en) * | 2005-08-09 | 2007-02-22 | Mitsubishi Alum Co Ltd | Aluminum foil for electrolytic capacitor electrode, and manufacturing method therefor |
JP5104525B2 (en) * | 2008-05-01 | 2012-12-19 | 日本軽金属株式会社 | Aluminum foil for electrolytic capacitors |
RU2748842C1 (en) * | 2020-06-01 | 2021-05-31 | Виктор Валентинович Стрелков | Aluminium condenser erbium-doped source foil |
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US3498765A (en) * | 1966-09-06 | 1970-03-03 | Aluminum Co Of America | Capacitor foil composed of alloys of aluminum and cadmium or indium |
JPH0462818A (en) * | 1990-06-25 | 1992-02-27 | Showa Alum Corp | Aluminum foil for electrolytic capacitor electrode |
EP0490574A1 (en) * | 1990-12-11 | 1992-06-17 | Showa Aluminum Kabushiki Kaisha | Aluminum foil as electrolytic condenser electrodes |
JPH05287465A (en) * | 1992-04-15 | 1993-11-02 | Mitsubishi Alum Co Ltd | Production of aluminum foil for electrolytic capacitor |
JPH06330213A (en) * | 1993-05-20 | 1994-11-29 | Mitsubishi Alum Co Ltd | Aluminum foil material for electrode of electrolytic condensor excellent in surface area scaling up effect |
JPH07150280A (en) * | 1993-12-01 | 1995-06-13 | Nippon Foil Mfg Co Ltd | Aluminum alloy foil for electrolytic capacitor electrode |
JPH083673A (en) * | 1994-06-15 | 1996-01-09 | Mitsubishi Alum Co Ltd | Aluminum foil for electrolytic capacitor and production of this aluminum foil |
JPH10140394A (en) * | 1996-11-05 | 1998-05-26 | Kobe Steel Ltd | Aluminum foil for electrolytic capacitor |
Family Cites Families (3)
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JPS6047896B2 (en) * | 1981-09-08 | 1985-10-24 | 東洋アルミニウム株式会社 | Aluminum foil for electrolytic capacitors |
JP2627456B2 (en) * | 1990-03-08 | 1997-07-09 | 住友軽金属工業 株式会社 | Aluminum foil for electrolytic capacitors |
US5518823A (en) | 1990-12-11 | 1996-05-21 | Showa Aluminum Kabushiki | Aluminum foil as electrolytic condenser electrodes |
-
1999
- 1999-02-23 FR FR9902386A patent/FR2790008B1/en not_active Expired - Fee Related
-
2000
- 2000-02-11 TW TW089102333A patent/TWI233452B/en not_active IP Right Cessation
- 2000-02-14 US US09/504,040 patent/US6471793B1/en not_active Expired - Fee Related
- 2000-02-17 DE DE60009591T patent/DE60009591T2/en not_active Expired - Fee Related
- 2000-02-17 EP EP00420034A patent/EP1031638B1/en not_active Expired - Lifetime
- 2000-02-22 KR KR1020000008462A patent/KR100696971B1/en not_active IP Right Cessation
- 2000-02-22 RU RU2000104504/09A patent/RU2231847C2/en active
- 2000-02-23 JP JP2000045937A patent/JP2000252170A/en active Pending
- 2000-02-23 CN CNB001053876A patent/CN1201350C/en not_active Expired - Fee Related
- 2000-12-21 HK HK00108302A patent/HK1028924A1/en not_active IP Right Cessation
Patent Citations (8)
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---|---|---|---|---|
US3498765A (en) * | 1966-09-06 | 1970-03-03 | Aluminum Co Of America | Capacitor foil composed of alloys of aluminum and cadmium or indium |
JPH0462818A (en) * | 1990-06-25 | 1992-02-27 | Showa Alum Corp | Aluminum foil for electrolytic capacitor electrode |
EP0490574A1 (en) * | 1990-12-11 | 1992-06-17 | Showa Aluminum Kabushiki Kaisha | Aluminum foil as electrolytic condenser electrodes |
JPH05287465A (en) * | 1992-04-15 | 1993-11-02 | Mitsubishi Alum Co Ltd | Production of aluminum foil for electrolytic capacitor |
JPH06330213A (en) * | 1993-05-20 | 1994-11-29 | Mitsubishi Alum Co Ltd | Aluminum foil material for electrode of electrolytic condensor excellent in surface area scaling up effect |
JPH07150280A (en) * | 1993-12-01 | 1995-06-13 | Nippon Foil Mfg Co Ltd | Aluminum alloy foil for electrolytic capacitor electrode |
JPH083673A (en) * | 1994-06-15 | 1996-01-09 | Mitsubishi Alum Co Ltd | Aluminum foil for electrolytic capacitor and production of this aluminum foil |
JPH10140394A (en) * | 1996-11-05 | 1998-05-26 | Kobe Steel Ltd | Aluminum foil for electrolytic capacitor |
Non-Patent Citations (6)
Title |
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PATENT ABSTRACTS OF JAPAN vol. 016, no. 267 (E - 1217) 16 June 1992 (1992-06-16) * |
PATENT ABSTRACTS OF JAPAN vol. 018, no. 082 (C - 1164) 10 February 1994 (1994-02-10) * |
PATENT ABSTRACTS OF JAPAN vol. 1995, no. 02 31 March 1995 (1995-03-31) * |
PATENT ABSTRACTS OF JAPAN vol. 1995, no. 09 31 October 1995 (1995-10-31) * |
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 05 31 May 1996 (1996-05-31) * |
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 10 31 August 1998 (1998-08-31) * |
Also Published As
Publication number | Publication date |
---|---|
TWI233452B (en) | 2005-06-01 |
KR100696971B1 (en) | 2007-03-21 |
EP1031638B1 (en) | 2004-04-07 |
CN1264906A (en) | 2000-08-30 |
DE60009591T2 (en) | 2005-04-21 |
DE60009591D1 (en) | 2004-05-13 |
CN1201350C (en) | 2005-05-11 |
FR2790008A1 (en) | 2000-08-25 |
RU2231847C2 (en) | 2004-06-27 |
JP2000252170A (en) | 2000-09-14 |
KR20000058136A (en) | 2000-09-25 |
FR2790008B1 (en) | 2001-04-13 |
US6471793B1 (en) | 2002-10-29 |
HK1028924A1 (en) | 2001-03-09 |
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