EP1029117B1 - Method for separating layers from articles - Google Patents

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Publication number
EP1029117B1
EP1029117B1 EP98951155A EP98951155A EP1029117B1 EP 1029117 B1 EP1029117 B1 EP 1029117B1 EP 98951155 A EP98951155 A EP 98951155A EP 98951155 A EP98951155 A EP 98951155A EP 1029117 B1 EP1029117 B1 EP 1029117B1
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EP
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Prior art keywords
process according
acid
solution
layer
hydrogen peroxide
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EP98951155A
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German (de)
French (fr)
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EP1029117A1 (en
Inventor
Jan Hendrik Wijngaard
Hans Braendle
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Oerlikon Surface Solutions AG Pfaeffikon
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Unaxis Trading AG
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/14Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
    • C23G1/19Iron or steel

Definitions

  • DD 228 977 describes a process for stripping TiN layers, in particular for stripping on nickel substrates applied TiN layers. Thereby, the ones to be treated Parts for approx. 3 minutes at a temperature of approx. 70 ° C up to 80 ° C in a hydrogen peroxide solution with a content of 35 Ma% peroxide introduced, then rinsed in water, dried and then mulled. For stripping TiAlN layers this method is unsuitable because the Badly dissolves TiAlN in a hydrogen peroxide solution.
  • a process for the stripping of hard material layers various metal substrates is known from US 4,746,369.
  • the acidic decoating bath consists of hydrogen peroxide as an oxidizer and a phosphoric acid or nitric acid together.
  • the very low pH of the solution of less than 0.5 is for use on high speed steel substrates - HSS (High Speed Steel) - very disadvantageous.
  • DE 41 01 843 describes a process for the stripping of Hard material coated objects are known, wherein the objects with a solution containing tetra sodium diphosphate and hydrogen peroxide.
  • Typical are the hydrogen peroxide concentrations from 8 to 12% that relatively high tetra sodium diphosphate concentration from 8 to 12%, the high process temperature, at boiling temperature, and the high pH from 8 to 12.
  • the solution is about half of the initial volume evaporated - what at the high temperatures takes place relatively quickly - phosphating can already occur stripped surface occur. Titanium nitride and / or titanium nitride / carbide hard material layers.
  • DE 43 39 502 describes processes specific to layer material for stripping metal substrates, especially of Tungsten carbide substrates, known which hard material layers either from TiN, from TiCN or from TiAlN, or else from Layer systems made of TiN / TiAlN.
  • the solution bath settles, depending on the layer to be removed and while protecting the substrates, layer-specific a variety of components together.
  • High-speed steel is characterized by high carbon concentrations, up to 1.5%, and additions of strong carbide-forming elements such as chrome, molybdenum and tungsten Vanadium. Up to 12% cobalt is in some of the more complex ones Varieties included.
  • High-speed steel is so called because of its high hardness in high speed applications (see D.T. Llewellyn, Steel: Metallurgy and Application, Butterworth-Heihemann Ltd., Oxford 1992, p. 174).
  • a salt of a phosphoric acid, diphosphoric acid, Triphosphoric acid etc. is the phosphate "Calcium phosphate” a salt of phosphoric acid, “disodium dihydrogen phosphate” a salt of diphosphoric acid, further "penta-sodium triphosphate” a salt of triphosphoric acid Etc.
  • Phosphonate is a salt of a phosphonic acid, in particular an organic phosphonic acid, i.e. one Phosphonic acid with organic substituents understood.
  • the above-mentioned task is solved in that for the stripping of HSS substrates from a layer of TiAlN, at least a substance from the group of phosphates, phosphonates and phosphonic acids is used.
  • TiAlN dissolves in hydrogen peroxide solutions not even at elevated temperatures. Will the pH of the hydrogen peroxide solution by metering one Base, as raised by NaOH, to the alkaline range with pH ⁇ 7, then - according to the invention - in addition to those mentioned TiN and TiCN layers also dissolved TiAlN layers. It it was recognized that this is also the case at low process temperatures the case is.
  • alkaline hydrogen peroxide is the high process reliability with regard to corrosion of HSS material.
  • alkaline HSS behaves very noble in the media. So there is also then there is no risk of corrosion for the HSS substrate if longer Stripping times would have to be used.
  • the bath life is relative low, is usually between 1 and 3 batches what Of course, in certain cases it is quite sufficient.
  • This relatively short bath life is due to the limited Stability of polyphosphates.
  • the stability of polyphosphates is only moderate in alkaline solutions, in acidic solutions bad.
  • the polyphosphates are converted into orthophosphates by hydrolysis transferred for the stabilization of the peroxide solutions are far less effective.
  • the bath was heated to 60 ° C and 500 pieces of 12 mm HSS end mills, coated with a TiAlN layer in the solution brought in.
  • the tools were complete after 3 hours decoated and the bath temperature was stable at 60 ⁇ 2 ° C remained.
  • the temperature of the stripping solution was controlled by heating / cooling kept constant at about 60 ° C, and 500 Piece of 12mm HSS end mill, coated with a TiAlN layer, introduced into the solution. After three hours they were Tools completely stripped and the bath temperature was remained stable at 60 ⁇ 2 ° C. Several of the mentioned could Batches can be stripped in the same solution.
  • the advantage of the present invention is that it remains simple Solution composition, the simple process management and the short stripping time. At solution temperatures well below the boiling point can already be within can be stripped within a few hours. Regarding corrosion HSS substrates have a high level of security: Because the stripping solution alkaline, there is no corrosion of HSS instead of.
  • HSS substrates e.g. mixed with TiN, TiCN and / or TiAlN layers
  • a large number HSS substrates e.g. mixed with TiN, TiCN and / or TiAlN layers

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Detergent Compositions (AREA)

Description

Die vorliegende Erfindung betrifft ein Verfahren zum Entschichten von Körpern, versehen mit einer Hartstoffschicht aus einer Ti-Verbindung in einer alkalischen Lösung, enthaltend

  • Wasserstoffperoxid
  • mindestens eine Base
  • mindestens eine Säure und/oder ein Salz einer Säure.
The present invention relates to a method for stripping bodies, provided with a hard material layer composed of a Ti compound in an alkaline solution
  • hydrogen peroxide
  • at least one base
  • at least one acid and / or a salt of an acid.

Die DD 228 977 beschreibt ein Verfahren zum Entschichten von TiN-Schichten, insbesondere zum Entschichten von auf Nickelsubstraten aufgebrachten TiN-Schichten. Dabei werden die zu behandelnden Teile für ca. 3 Min. bei einer Temperatur von ca. 70°C bis 80°C in einer Wasserstoffperoxidlösung mit einem Gehalt von 35 Ma% Peroxid eingebracht, danach in Wasser gespült, getrocknet und anschliessend abgemullt. Für das Entschichten von TiAlN-Schichten ist dieses Verfahren ungeeignet, weil sich das TiAlN in einer Wasserstoffperoxidlösung schlecht löst.DD 228 977 describes a process for stripping TiN layers, in particular for stripping on nickel substrates applied TiN layers. Thereby, the ones to be treated Parts for approx. 3 minutes at a temperature of approx. 70 ° C up to 80 ° C in a hydrogen peroxide solution with a content of 35 Ma% peroxide introduced, then rinsed in water, dried and then mulled. For stripping TiAlN layers this method is unsuitable because the Badly dissolves TiAlN in a hydrogen peroxide solution.

Gemäss der GB 2 127 042 werden Titannitrid-Hartstoffschichten auf Substraten aus rostfreiem Stahl in wässriger Salpetersäure bei Temperaturen über 70°C entschichtet. Die Entschichtungszeit für eine 1 µm dicke Schicht beträgt, bei 70°C, ca. 50 Stunden. Diese äusserst lange Entschichtungszeit ist sehr nachteilig.According to GB 2 127 042, titanium nitride hard material layers on stainless steel substrates in aqueous nitric acid decoated at temperatures above 70 ° C. The stripping time for a 1 µm thick layer, at 70 ° C, about 50 hours. This extremely long stripping time is very disadvantageous.

Ein Verfahren für die Entschichtung von Hartstoffschichten auf verschiedenen Metallsubstraten ist aus der US 4 746 369 bekannt. Das saure Entschichtungsbad setzt sich aus Wasserstoffperoxid als Oxidator und einer Phosphorsäure oder Salpetersäure zusammen. Weiter kommen verschiedene oberflächenaktive Stoffe zur Anwendung. Der sehr niedrige pH-Wert der Lösung von weniger als 0,5 ist für die Anwendung auf Schnellarbeitsstahl-Substrate - HSS (High Speed Steel) - sehr nachteilig.A process for the stripping of hard material layers various metal substrates is known from US 4,746,369. The acidic decoating bath consists of hydrogen peroxide as an oxidizer and a phosphoric acid or nitric acid together. There are also various surface-active substances to use. The very low pH of the solution of less than 0.5 is for use on high speed steel substrates - HSS (High Speed Steel) - very disadvantageous.

Gemäss der DE 41 10 595 wird vorgeschlagen, Hartstoffschichten von Werkzeugoberflächen in einer durch Komplexbildner stabilisierten Wasserstoffperoxid-Lösung durchzuführen, wobei als Komplexbildner Kalium-Natrium-Tartrat-Tetrahydrat oder Natrium-Gluconat verwendet wird. Dadurch werden einerseits TiAlN-Schichten nicht mit befriedigender Geschwindigkeit entschichtet, anderseits ergeben die eingesetzten Stabilisatoren nur eine beschränkt stabilisierende Wirkung.According to DE 41 10 595, hard material layers are proposed of tool surfaces in a stabilized by complexing agents Perform hydrogen peroxide solution, using as a complexing agent Potassium sodium tartrate tetrahydrate or sodium gluconate is used. On the one hand, this results in TiAlN layers not decoated at a satisfactory speed, on the other hand, the stabilizers used result in only one limited stabilizing effect.

Aus der DE 41 01 843 ist ein Verfahren zum Entschichten von mit Hartstoffschichten beschichteten Gegenständen bekannt, wobei die Gegenstände mit einer Lösung, enthaltend Tetra-Natrium-Diphosphat und Wasserstoffperoxid, behandelt werden. Typisch sind die Wasserstoffperoxid-Konzentrationen von 8 bis 12 %, die relativ hohe Tetra-Natrium-Diphosphat-Konzentration von 8 bis 12 %, die hohe Prozesstemperatur, bei Siedetemperatur, und der hohe pH-Wert von 8 bis 12. Ist die Lösung auf etwa die Hälfte des Ausgangsvolumens eingedampft - was bei den hohen Temperaturen relativ rasch erfolgt - kann eine Phosphatierung der bereits entschichteten Oberfläche auftreten. Es werden Titannitrid- und/oder Titannitrid/Karbid-Hartstoffschichten entschichtet.DE 41 01 843 describes a process for the stripping of Hard material coated objects are known, wherein the objects with a solution containing tetra sodium diphosphate and hydrogen peroxide. Typical are the hydrogen peroxide concentrations from 8 to 12% that relatively high tetra sodium diphosphate concentration from 8 to 12%, the high process temperature, at boiling temperature, and the high pH from 8 to 12. The solution is about half of the initial volume evaporated - what at the high temperatures takes place relatively quickly - phosphating can already occur stripped surface occur. Titanium nitride and / or titanium nitride / carbide hard material layers.

Aus der DE 43 39 502 sind schichtmaterialspezifische Verfahren zum Entschichten von Metallsubstraten, insbesondere auch von Hartmetallsubstraten, bekannt, welche Hartstoffschichten entweder aus TiN, aus TiCN oder aus TiAlN aufweisen, oder aber von Schichtsystemen aus TiN/TiAlN. DE 43 39 502 describes processes specific to layer material for stripping metal substrates, especially of Tungsten carbide substrates, known which hard material layers either from TiN, from TiCN or from TiAlN, or else from Layer systems made of TiN / TiAlN.

Dabei wird eine alkalische Lösung mit Wasserstoffperoxid, mindestens einer Base sowie mindestens einem Salz von Mono- und Dikarbonsäuren eingesetzt.An alkaline solution with hydrogen peroxide, at least a base and at least one salt of mono- and Dicarboxylic acids used.

Es setzt sich das Lösungsbad, je nach zu entfernender Schicht und unter Schonung der Substrate, schichtmaterialspezifisch aus einer Vielzahl von Komponenten zusammen.The solution bath settles, depending on the layer to be removed and while protecting the substrates, layer-specific a variety of components together.

Aus Patent Abstract of Japan, vol. 017, no 468 (C-1102), 26. August 1993 ist es bekannt, TiN zu entschichten mittels einer wässrigen Lösung aus 1 - 20 Gew.% einer oder mehrerer Arten hydrokarbonatartiger Alkalisalze organischer Säuren, 2 - 15 Gew.% Alkalisalz von Ethyldiaminessigsäure und 0,1 - 0,5 Gew.% Alkalihydroxid, 0,05 - 0,5 Gew.% Alkalisalz von Thioglycolsäure und 3 - 7 Gew.% Wasserstoffperoxid.From Patent Abstract of Japan, vol. 017, no 468 (C-1102), 26. August 1993 it is known to decoat TiN using a aqueous solution of 1 - 20% by weight of one or more species hydrocarbonate-like alkali salts of organic acids, 2 - 15 % By weight alkali salt of ethyldiamine acetic acid and 0.1-0.5% by weight Alkali hydroxide, 0.05-0.5% by weight alkali salt of thioglycolic acid and 3-7% by weight hydrogen peroxide.

Ausgehend vom letzterwähnten Verfahren ist es Aufgabe der vorliegenden Erfindung, ein Verfahren vorzuschlagen, mittels welchem TiAlN-Hartstoffschichten grossindustriell von Schnellarbeitsstahl-Substraten entschichtet werden könnenStarting from the last-mentioned method, it is the task of the present one Invention to propose a method by means of which Industrial TiAlN layers of high-speed steel substrates can be stripped

Definitionen:definitions: 1) Schnellarbeitsstahl: 1) high-speed steel:

Ein Schnellarbeitsstahl wird charakterisiert durch hohe Kohlenstoffkonzentrationen, bis zu 1,5 %, und Zusätze von stark karbidformenden Elementen wie Chrom, Molybden, Wolfram und Vanadium. Bis zu 12 % Kobalt ist in einigen der mehr komplexen Sorten enthalten.High-speed steel is characterized by high carbon concentrations, up to 1.5%, and additions of strong carbide-forming elements such as chrome, molybdenum and tungsten Vanadium. Up to 12% cobalt is in some of the more complex ones Varieties included.

Schnellarbeitsstahl wird so genannt, weil er seine hohe Härte bei Hochgeschwindigkeitsanwendungen behält (siehe D.T. Llewellyn, Steel: Metallurgy and Application, Butterworth-Heihemann Ltd., Oxford 1992, p. 174).High-speed steel is so called because of its high hardness in high speed applications (see D.T. Llewellyn, Steel: Metallurgy and Application, Butterworth-Heihemann Ltd., Oxford 1992, p. 174).

2) Phosphat: 2) phosphate:

Als Phosphat wird ein Salz einer Phosphorsäure, Diphosphorsäure, Triphosphorsäure etc. verstanden. Z.B. ist das Phosphat "Kalziumphosphat" ein Salz von Phosphorsäure, "Di-Natriumdihydrogenphosphat" ein Salz der Diphosphorsäure, weiter "Penta-Natriumtriphosphat" ein Salz der Triphosphorsäure etc.A salt of a phosphoric acid, diphosphoric acid, Triphosphoric acid etc. understood. For example, is the phosphate "Calcium phosphate" a salt of phosphoric acid, "disodium dihydrogen phosphate" a salt of diphosphoric acid, further "penta-sodium triphosphate" a salt of triphosphoric acid Etc.

3) Phosphonat: 3) Phosphonate:

Unter Phosphonat wird ein Salz einer Phosphonsäure, insbesondere einer organischen Phosphonsäure, d.h. einer Phosphonsäure mit organischen Substituenten, verstanden.Phosphonate is a salt of a phosphonic acid, in particular an organic phosphonic acid, i.e. one Phosphonic acid with organic substituents understood.

Die erwähnte Aufgabe wird dadurch gelöst, dass für die Entschichtung von HSS-Substraten von einer Schicht aus TiAlN, mindestens eine Substanz aus der Gruppe der Phosphate, Phosphonate und Phosphon-Säuren eingesetzt wird.The above-mentioned task is solved in that for the stripping of HSS substrates from a layer of TiAlN, at least a substance from the group of phosphates, phosphonates and phosphonic acids is used.

Dabei wird zusätzlich der Vorteil erwirkt, dass mittels dieser Lösung, wie bekannt, weiterhin TiN und TiCN gelöst werden, zusätzlich aber, erfindungsgemäss, TiAlN.The advantage is additionally obtained that by means of this Solution, as is known, TiN and TiCN continue to be solved, additionally but, according to the invention, TiAlN.

Im Gegensatz zu TiN und TiCN löst sich TiAlN in Wasserstoffperoxid-Lösungen auch bei erhöhten Temperaturen nicht. Wird der pH-Wert der Wasserstoffperoxid-Lösung durch Zudosierung einer Base, wie von NaOH, angehoben, bis in den alkalischen Bereich mit pH ≥ 7, dann werden - erfindungsgemäss - nebst den erwähnten TiN- und TiCN-Schichten auch TiAlN-Schichten gelöst. Es wurde erkannt, dass dies auch bei tiefen Prozesstemperaturen der Fall ist.In contrast to TiN and TiCN, TiAlN dissolves in hydrogen peroxide solutions not even at elevated temperatures. Will the pH of the hydrogen peroxide solution by metering one Base, as raised by NaOH, to the alkaline range with pH ≥ 7, then - according to the invention - in addition to those mentioned TiN and TiCN layers also dissolved TiAlN layers. It it was recognized that this is also the case at low process temperatures the case is.

Bevorzugterweise kommen folgende spezifische Verfahrensführungen alternativ oder in Kombination zum Einsatz:

  • Als Phosphat wird di-Natriumdihydrogenpyrophosphat, Na2H2P2O7 und/oder penta-Natriumtriphosphat (Na5P3O10) bevorzugt eingesetzt;
  • Als Phosphon-Säure wird bevorzugterweise Aminotri(methylenphosphonsäure) und/oder 1-Hydroxyethan (1,1-diphosphonsäure) eingesetzt. Dabei werden diese Phosphonsäuren als solche direkt in die Lösung eingebracht. Dies gilt generell für den Einsatz von Phosphonaten, Phosphaten und Phosphonsäuren. Dabei hat es sich mindestens vorläufig gezeigt, dass der Einsatz der 1-Hydroxyethan(1,1-diphosphonsäure) besonders geeigneter ist.
  • Die Prozesstemperatur des Lösungsbades wird, gegebenenfalls durch Heizen und/oder Kühlen, auf 20°C bis 80°C gehalten (die Bereichsgrenzen sind eingeschlossen);
  • Die Peroxidkonzentration wird zwischen 5 und 50 Gew.% gewählt (die Bereichsgrenzen sind eingeschlossen);
  • Die Konzentration von Phosphat und/oder Phosphonat und/oder Phosphon-Säure wird zwischen 0,1 und 10 Gew.% gewählt (die Bereichsgrenzen sind eingeschlossen);
  • Es können auch grössere Lösungsbadvolumina, z.B. ≥ 50 l oder gar ≥ 100 1, stabil betrieben werden;
  • Die Lösung besteht vorzugsweise aus destilliertem Wasser, Wasserstoffperoxid, der erwähnten Base, beispielsweise NaOH, und den erwähnten Phosphaten und/oder Phosphonaten und/oder Phosphon-Säuren, mindestens in weitaus überwiegendem Anteil.
The following specific procedures are preferably used alternatively or in combination:
  • Disodium dihydrogen pyrophosphate, Na 2 H 2 P 2 O 7 and / or penta sodium triphosphate (Na 5 P 3 O 10 ) is preferably used as the phosphate;
  • Aminotri (methylenephosphonic acid) and / or 1-hydroxyethane (1,1-diphosphonic acid) is preferably used as the phosphonic acid. These phosphonic acids are introduced directly into the solution as such. This generally applies to the use of phosphonates, phosphates and phosphonic acids. It has been shown, at least for the time being, that the use of 1-hydroxyethane (1,1-diphosphonic acid) is particularly suitable.
  • The process temperature of the solution bath is kept at 20 ° C. to 80 ° C., optionally by heating and / or cooling (the range limits are included);
  • The peroxide concentration is chosen between 5 and 50% by weight (the range limits are included);
  • The concentration of phosphate and / or phosphonate and / or phosphonic acid is selected between 0.1 and 10% by weight (the range limits are included);
  • Larger solution bath volumes, for example ≥ 50 l or even ≥ 100 1, can also be operated stably;
  • The solution preferably consists of distilled water, hydrogen peroxide, the base mentioned, for example NaOH, and the aforementioned phosphates and / or phosphonates and / or phosphonic acids, at least in a predominant proportion.

Dadurch wird eine schichtmaterialspezifische und komplexe Lösungszusammensetzung umgangen und die Möglichkeit geschaffen, jede der erwähnten Hartstoffschichten - erfindungsgemäss eben auch TiAlN - von HSS-Substraten mit derselben Lösung zu entschichten. Im weiteren entfällt der sehr grosse apparative Aufwand, der betrieben werden muss, wenn ein alkalisches Wasserstoffperoxid-Bad mit einem pH-Wert von 8 bis 12 im Siedetemperatur-Bereich betrieben wird. Auch entfällt dank der tiefen Prozesstemperaturen, bei denen das erfindungsgemässe Lösungsbad betreibbar ist, die Phosphatierungsgefahr, welche, bei hohen Prozesstemperaturen im Siedetemperaturbereich, durch schnelles Eindampfen besteht.This creates a layer-specific and complex solution composition bypassed and created the opportunity each of the hard material layers mentioned - according to the invention also TiAlN - to coat HSS substrates with the same solution. In addition, the very large expenditure on equipment is eliminated, which must be operated when an alkaline hydrogen peroxide bath with a pH of 8 to 12 in the boiling temperature range is operated. Also eliminated thanks to the deep Process temperatures at which the solution bath according to the invention is operable, the risk of phosphating, which, at high Process temperatures in the boiling temperature range, thanks to fast Evaporation exists.

Damit ist für wirtschaftliche und grossindustrielle Entschichtung die Möglichkeit gegeben, erfindungsgemäss Entschichtungsbäder mit grossen Volumina z.B. von über 50 l oder gar von über 100 l stabil zu betreiben. Es können damit grosse Mengen von hartstoffbeschichteten HSS-Substraten, wie beispielsweise Werkzeuge, innerhalb von einigen Stunden entschichtet werden.This is for economic and large-scale industrial decoating given the possibility of stripping baths according to the invention with large volumes e.g. of over 50 l or even over 100 l stable to operate. Large quantities of hard-coated HSS substrates, such as tools, can be stripped within a few hours.

Vorteil des alkalischen Wasserstoffperoxids ist die hohe Prozessicherheit mit Bezug auf Korrosion von HSS-Material. In alkalischen Medien verhält sich HSS sehr edel. Damit besteht auch dann keine Korrosionsgefahr für das HSS-Substrat, wenn längere Entschichtungszeiten einzusetzen wären.The advantage of alkaline hydrogen peroxide is the high process reliability with regard to corrosion of HSS material. In alkaline HSS behaves very noble in the media. So there is also then there is no risk of corrosion for the HSS substrate if longer Stripping times would have to be used.

Das Problem der Instabilität von alkalischen Wasserstoffperoxid-Lösungen, indem eine Autooxidation des Wasserstoffperoxids stattfindet, welche durch Metallionen katalysiert wird, die beim Entschichtungsvorgang in die Lösung freigesetzt werden, was wiederum zu Überhitzung und Überkochen des Entschichtungsbades führt, wird durch die Zudosierung mindestens eines Phosphates und/oder Phosphonates und/oder mindestens einer Phosphon-Säure als Stabilisator gelöst. Hinzukommend wird durch diesen Zusatz die Entschichtung beschleunigt. Durch diese Zudosierung wird die Badstabilität so verbessert, dass das Entschichtungsbad auch bei erhöhter Temperatur stabil betrieben werden könnte. Für die Aufrechterhaltung der Badtemperatur kann eine Heizung und/oder Kühlung vorgesehen sein, gegebenenfalls wird die Badtemperatur auf einen Sollwert geregelt, mit Heizung und/oder Kühlung als Stellglied.The problem of the instability of alkaline hydrogen peroxide solutions, by auto-oxidizing the hydrogen peroxide takes place, which is catalyzed by metal ions, the are released into the solution during the stripping process, which in turn leads to overheating and boiling over of the decoating bath leads by the addition of at least one phosphate and / or phosphonates and / or at least one Phosphonic acid dissolved as a stabilizer. It will be added by this addition accelerates the stripping. With this addition the bath stability is improved so that the decoating bath Stably operated even at elevated temperatures could be. For maintaining the bath temperature can heating and / or cooling may be provided, if necessary the bath temperature is regulated to a setpoint, with heating and / or cooling as an actuator.

Zum Wirkungsunterschied von Phosphaten und/oder Phosphonaten und/oder von Phosphon-Säure in der eingesetzten Lösung:The difference in effect of phosphates and / or phosphonates and / or of phosphonic acid in the solution used:

Bei Einsatz allein von Phosphat ist die Badstandzeit relativ gering, beträgt im Normalfall zwischen 1 und 3 Chargen, was selbstverständlich in gewissen Fällen durchaus ausreicht. Diese relativ geringe Badstandzeit beruht auf der doch beschränkten Stabilität von Polyphosphaten. Die Stabilität von Polyphosphaten in alkalischen Lösungen ist nur mässig, in sauren Lösungen schlecht. Durch Hydrolyse werden die Polyphosphate in Orthophosphate überführt, die für die Stabilisierung der Peroxidlösungen weit weniger wirksam sind.When using phosphate alone, the bath life is relative low, is usually between 1 and 3 batches what Of course, in certain cases it is quite sufficient. This relatively short bath life is due to the limited Stability of polyphosphates. The stability of polyphosphates is only moderate in alkaline solutions, in acidic solutions bad. The polyphosphates are converted into orthophosphates by hydrolysis transferred for the stabilization of the peroxide solutions are far less effective.

Anders verhält sich dies bei den organischen Phosphonaten und Phosphon-Säuren. Im Vergleich zu anorganischen Polyphosphaten besitzen Phosphonate und Phosphon-Säuren eine sehr gute hydrolytische Stabilität. Dies ist auf die sehr hohe Stabilität der C-P-Bindungen der Phosphonate und Phosphon-Säuren zurückzuführen. Neben der erhöht stabilisierenden Wirkung, Erhöhung der Badstandzeit, bewirken Phosphonate und Phosphon-Säuren zudem eine weitere Beschleunigung der Entschichtungsreaktion.The situation is different for organic phosphonates and Phosphonic acids. Compared to inorganic polyphosphates have phosphonates and phosphonic acids very good hydrolytic Stability. This is due to the very high stability of the C-P bonds attributed to the phosphonates and phosphonic acids. In addition to the increased stabilizing effect, increasing the Bath service life, cause phosphonates and phosphonic acids a further acceleration of the stripping reaction.

Beispiel I:Example I:

Als Entschichtungsbad wurde folgende Lösung angesetzt:

  • 125 l Wasserstoffperoxid, 17,5 Gew.%
  • 1,25 kg Na5P3O10
  • 500 g NaOH
The following solution was used as the stripping bath:
  • 125 l hydrogen peroxide, 17.5% by weight
  • 1.25 kg Na 5 P 3 O 10
  • 500 g NaOH

Das Bad wurde auf 60°C aufgeheizt und 500 Stück 12 mm HSS-Schaftfräser, beschichtet mit einer TiAlN-Schicht, in die Lösung eingebracht. Nach 3 Std. waren die Werkzeuge vollständig entschichtet und die Badtemperatur war stabil auf 60 ± 2°C geblieben.The bath was heated to 60 ° C and 500 pieces of 12 mm HSS end mills, coated with a TiAlN layer in the solution brought in. The tools were complete after 3 hours decoated and the bath temperature was stable at 60 ± 2 ° C remained.

Beispiel II:Example II:

Es wurde folgende Entschichtungslösung angesetzt:

  • 125 l Wasserstoffperoxid, 17,5 Gew.%
  • 0,2 mol/l Aminotri-(methylenphosphonsäure)ATMP
  • 0,4 mol/l NaOH
The following decoating solution was used:
  • 125 l hydrogen peroxide, 17.5% by weight
  • 0.2 mol / l aminotri- (methylenephosphonic acid) ATMP
  • 0.4 mol / l NaOH

Die Temperatur der Entschichtungslösung wurde durch Heizen/Kühlen auf ca. 60°C konstant gehalten, und es wurden 500 Stück 12mm-HSS-Schaftfräser, beschichtet mit einer TiAlN-Schicht, in die Lösung eingebracht. Nach drei Stunden waren die Werkzeuge vollständig entschichtet, und die Badtemperatur war dabei stabil auf 60 ± 2°C geblieben. Es konnten mehrere der erwähnten Chargen in der gleichen Lösung entschichtet werden. The temperature of the stripping solution was controlled by heating / cooling kept constant at about 60 ° C, and 500 Piece of 12mm HSS end mill, coated with a TiAlN layer, introduced into the solution. After three hours they were Tools completely stripped and the bath temperature was remained stable at 60 ± 2 ° C. Several of the mentioned could Batches can be stripped in the same solution.

Verglichen mit dem Einsatz von Polyphosphaten gemäss Beispiel I konnte die Bandstandzeit um einen Faktor von 2 bis 4 verlängert werden.Compared to the use of polyphosphates according to Example I the belt life could be extended by a factor of 2 to 4 become.

Beispiel III:Example III

Es wurde folgende Entschichtungslösung angesetzt:

  • 125 l Wasserstoffperoxid, 17,5 Gew.%
  • 2 Gew.% 1-Hydroxyethan(1,1-diphosphonsäure)HEDP
  • 0,4 mol/l NaOH
The following decoating solution was used:
  • 125 l hydrogen peroxide, 17.5% by weight
  • 2% by weight 1-hydroxyethane (1,1-diphosphonic acid) HEDP
  • 0.4 mol / l NaOH

Betrieben und beladen gemäss Beispiel II ergaben sich, jedoch bei verkürzten Entschichtungszeiten, dieselben Resultate wie gemäss Beispiel II.Operated and loaded according to Example II resulted, however with shorter stripping times, the same results as according to example II.

Vorteil der vorliegenden Erfindung ist die einfach bleibende Lösungszusammensetzung, die einfach bleibende Prozessführung und die kurz bleibende Entschichtungszeit. Bei Lösungstemperaturen deutlich unterhalb des Siedepunktes kann schon innerhalb von wenigen Stunden entschichtet werden. Bezüglich Korrosion an HSS-Substraten besteht hohe Sicherheit: Weil die Entschichtungslösung alkalisch ist, findet keine Korrosion von HSS statt.The advantage of the present invention is that it remains simple Solution composition, the simple process management and the short stripping time. At solution temperatures well below the boiling point can already be within can be stripped within a few hours. Regarding corrosion HSS substrates have a high level of security: Because the stripping solution alkaline, there is no corrosion of HSS instead of.

Ein wesentlicher Vorteil ist weiter, dass im gleichen Arbeitsgang, d.h. mit derselben Entschichtungslösung, eine grosse Zahl von HSS-Substraten, z.B. gemischt mit TiN-, TiCN- und/oder TiAlN-Schichten, entschichtet werden können, u.a. indem hohe Volumina an Lösung, z.B. von über 50 l oder gar von über 100 l, mit wenig Aufwand stabil betrieben werden können.Another major advantage is that in the same operation, i.e. with the same decoating solution, a large number HSS substrates, e.g. mixed with TiN, TiCN and / or TiAlN layers, can be stripped, e.g. by high volumes of solution, e.g. over 50 l or even over 100 l, can be operated stably with little effort.

Claims (12)

  1. Process for decoating substrates fitted with a hard material layer of a Ti compound, in an alkaline solution comprising
    hydrogen peroxide
    at least one base
    at least one acid and/or a salt of an acid,
    characterised in that for decoating high speed steel substrates with at least one layer of TiAIN, the said acid and/or said salt contains a substance from the group consisting of phosphates, phosphonates, phosphonic acids.
  2. Process according to claim 1, characterised in that phosphonate is introduced into the solution as such and/or by the introduction of an organic phosphonic acid.
  3. Process according to claim 1 or claim 2, characterised in that aminotri-(methylene phosphonic acid) and/or preferably 1-hydroxyethane (1,1-diphosphonic acid) is used as a phosphonic acid.
  4. Process according to any of claims 1 to 3, characterised in that disodium dihydrogenpyrophosphate and/or Na2H2P2O7 and/or pentasodium triphosphate (Na5P3O10) is used as a phosphate.
  5. Process according to one of claims 1 or 2, characterised in that the solution temperature is held between 20°C and 80°C, both limits included.
  6. Process according to any of claims 1 to 3, characterised in that the hydrogen peroxide concentration is between 5 and 50 w.%, both limits included.
  7. Process according to any of claims 1 to 4, characterised in that the concentration of phosphate and/or phosphonate and/or phosphonic acid is held between 0.1 and 10 w.%, both limits included.
  8. Process according to any of claims 1 to 7, characterised in that a solution volume of at least 50 l is used, preferably at least 100 l.
  9. Decoating process according to any of claims 1 to 8, characterised in that as well as at least one TiAlN layer, at the same time a TiN layer and/or a TiCN layer is removed.
  10. Process according to any of claims 1 to 9, where the substrates are tools.
  11. Process according to claim 10, where the tools are cutting or forming tools.
  12. Process according to claim 11, where the tools are milling cutters, indexable inserts or embossing dies.
EP98951155A 1997-11-10 1998-11-09 Method for separating layers from articles Expired - Lifetime EP1029117B1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
CH258897 1997-11-10
CH258897 1997-11-10
CH140398 1998-07-01
CH140398 1998-07-01
PCT/CH1998/000479 WO1999024642A1 (en) 1997-11-10 1998-11-09 Method for separating layers from articles

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EP1029117B1 true EP1029117B1 (en) 2004-08-25

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ES (1) ES2226178T3 (en)
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DE59811875D1 (en) 2004-09-30
JP5295853B2 (en) 2013-09-18
EP1029117A1 (en) 2000-08-23
JP2001522943A (en) 2001-11-20
ES2226178T3 (en) 2005-03-16
US6432219B1 (en) 2002-08-13
WO1999024642A1 (en) 1999-05-20

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