EP1025512A4 - Systeme et procede logiciels permettant d'etendre les classifications et les attributs dans l'analyse de la production - Google Patents

Systeme et procede logiciels permettant d'etendre les classifications et les attributs dans l'analyse de la production

Info

Publication number
EP1025512A4
EP1025512A4 EP98956236A EP98956236A EP1025512A4 EP 1025512 A4 EP1025512 A4 EP 1025512A4 EP 98956236 A EP98956236 A EP 98956236A EP 98956236 A EP98956236 A EP 98956236A EP 1025512 A4 EP1025512 A4 EP 1025512A4
Authority
EP
European Patent Office
Prior art keywords
classifications
new
attributes
namespace
classification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP98956236A
Other languages
German (de)
English (en)
Other versions
EP1025512A1 (fr
Inventor
Manoj Hardikar
Steve Zhou
Richard Shiflett
Ashok Kulkarni
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/958,780 external-priority patent/US6097887A/en
Priority claimed from US08/958,288 external-priority patent/US6233719B1/en
Application filed by KLA Tencor Corp filed Critical KLA Tencor Corp
Publication of EP1025512A1 publication Critical patent/EP1025512A1/fr
Publication of EP1025512A4 publication Critical patent/EP1025512A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06QINFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00Administration; Management
    • G06Q10/06Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F40/00Handling natural language data
    • G06F40/20Natural language analysis
    • G06F40/205Parsing
    • G06F40/226Validation
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F40/00Handling natural language data
    • G06F40/20Natural language analysis
    • G06F40/279Recognition of textual entities
    • G06F40/284Lexical analysis, e.g. tokenisation or collocates

Landscapes

  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Business, Economics & Management (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Economics (AREA)
  • Entrepreneurship & Innovation (AREA)
  • Human Resources & Organizations (AREA)
  • Strategic Management (AREA)
  • Computational Linguistics (AREA)
  • Audiology, Speech & Language Pathology (AREA)
  • Artificial Intelligence (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Game Theory and Decision Science (AREA)
  • General Business, Economics & Management (AREA)
  • Tourism & Hospitality (AREA)
  • Quality & Reliability (AREA)
  • Operations Research (AREA)
  • Marketing (AREA)
  • Educational Administration (AREA)
  • Development Economics (AREA)
  • General Factory Administration (AREA)
  • User Interface Of Digital Computer (AREA)
  • Image Generation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

La présente invention concerne un système logiciel qui est utilisé pour étendre les attributs de classification dans l'analyse de données de production. L'éditeur de formule (810) permet à l'utilisateur de créer un cadre de formule (820). La formule est appliquée au cadre de fichier (830) via les modules d'application (840), et à l'aide du cadre de l'interface utilisateur graphique (850), une page (860) est produite en format Windows. Le cadre de formule (820) assure également la fonction d'interface avec le service d'ordonnancement et d'événements (870), permettant de la sorte l'exécution et la publication automatiques des analyses des données de production à des moments déterminés dans le futur. Le logiciel fonctionne avec une plus grande souplesse dans un environnement Windows orienté objet car il permet à l'utilisateur d'ajouter des classifications de défauts par entraînement et largage à l'aide de la souris. Lors de l'exécution d'une classification typologique, une carte de production est filtrée de façon que les données non relatives aux défauts sont supprimées en fonction de la classification choisie, ce qui rend alors l'attribut de défaut facilement visible.
EP98956236A 1997-10-27 1998-10-27 Systeme et procede logiciels permettant d'etendre les classifications et les attributs dans l'analyse de la production Withdrawn EP1025512A4 (fr)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US08/958,780 US6097887A (en) 1997-10-27 1997-10-27 Software system and method for graphically building customized recipe flowcharts
US958288 1997-10-27
US958780 1997-10-27
US08/958,288 US6233719B1 (en) 1997-10-27 1997-10-27 System and method for analyzing semiconductor production data
PCT/US1998/022735 WO1999022310A1 (fr) 1997-10-27 1998-10-27 Systeme et procede logiciels permettant d'etendre les classifications et les attributs dans l'analyse de la production

Publications (2)

Publication Number Publication Date
EP1025512A1 EP1025512A1 (fr) 2000-08-09
EP1025512A4 true EP1025512A4 (fr) 2005-01-19

Family

ID=27130396

Family Applications (2)

Application Number Title Priority Date Filing Date
EP98956236A Withdrawn EP1025512A4 (fr) 1997-10-27 1998-10-27 Systeme et procede logiciels permettant d'etendre les classifications et les attributs dans l'analyse de la production
EP98955139A Withdrawn EP1025511A4 (fr) 1997-10-27 1998-10-27 Systeme et procede logiciels pour la creation graphique d'organigrammes personnalises de recettes

Family Applications After (1)

Application Number Title Priority Date Filing Date
EP98955139A Withdrawn EP1025511A4 (fr) 1997-10-27 1998-10-27 Systeme et procede logiciels pour la creation graphique d'organigrammes personnalises de recettes

Country Status (3)

Country Link
EP (2) EP1025512A4 (fr)
JP (2) JP4375900B2 (fr)
WO (2) WO1999022311A1 (fr)

Families Citing this family (40)

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US6999614B1 (en) 1999-11-29 2006-02-14 Kla-Tencor Corporation Power assisted automatic supervised classifier creation tool for semiconductor defects
US6528818B1 (en) 1999-12-14 2003-03-04 Kla-Tencor Test structures and methods for inspection of semiconductor integrated circuits
US6636064B1 (en) 1999-12-14 2003-10-21 Kla-Tencor Dual probe test structures for semiconductor integrated circuits
US6633174B1 (en) 1999-12-14 2003-10-14 Kla-Tencor Stepper type test structures and methods for inspection of semiconductor integrated circuits
US6566885B1 (en) 1999-12-14 2003-05-20 Kla-Tencor Multiple directional scans of test structures on semiconductor integrated circuits
US6433561B1 (en) 1999-12-14 2002-08-13 Kla-Tencor Corporation Methods and apparatus for optimizing semiconductor inspection tools
US6771806B1 (en) 1999-12-14 2004-08-03 Kla-Tencor Multi-pixel methods and apparatus for analysis of defect information from test structures on semiconductor devices
US6524873B1 (en) 1999-12-14 2003-02-25 Kla-Tencor Continuous movement scans of test structures on semiconductor integrated circuits
US7179661B1 (en) 1999-12-14 2007-02-20 Kla-Tencor Chemical mechanical polishing test structures and methods for inspecting the same
US6445199B1 (en) 1999-12-14 2002-09-03 Kla-Tencor Corporation Methods and apparatus for generating spatially resolved voltage contrast maps of semiconductor test structures
US7655482B2 (en) 2000-04-18 2010-02-02 Kla-Tencor Chemical mechanical polishing test structures and methods for inspecting the same
US6995393B2 (en) 2000-08-25 2006-02-07 Kla-Tencor Technologies Corporation Apparatus and methods for semiconductor IC failure detection
US7067335B2 (en) 2000-08-25 2006-06-27 Kla-Tencor Technologies Corporation Apparatus and methods for semiconductor IC failure detection
JP2002154074A (ja) 2000-11-16 2002-05-28 Makita Corp 電動工具の照明装置
US6861666B1 (en) 2001-10-17 2005-03-01 Kla-Tencor Technologies Corporation Apparatus and methods for determining and localization of failures in test structures using voltage contrast
US7349872B2 (en) 2001-12-18 2008-03-25 Rosemount, Inc. Method for comparing and selecting process control apparatus
US7175503B2 (en) 2002-02-04 2007-02-13 Kla-Tencor Technologies Corp. Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current device
US6774648B1 (en) 2002-05-23 2004-08-10 Kla-Tencor Technologies Corporation Apparatus and methods for optically detecting defects in voltage contrast test structures
JP4118703B2 (ja) * 2002-05-23 2008-07-16 株式会社日立ハイテクノロジーズ 欠陥分類装置及び欠陥自動分類方法並びに欠陥検査方法及び処理装置
US6898545B2 (en) 2002-06-28 2005-05-24 Agilent Technologies Inc Semiconductor test data analysis system
US7968354B1 (en) 2002-10-04 2011-06-28 Kla-Tencor Technologies Corp. Methods for correlating backside and frontside defects detected on a specimen and classification of backside defects
US7027143B1 (en) 2002-10-15 2006-04-11 Kla-Tencor Technologies Corp. Methods and systems for inspecting reticles using aerial imaging at off-stepper wavelengths
US7379175B1 (en) 2002-10-15 2008-05-27 Kla-Tencor Technologies Corp. Methods and systems for reticle inspection and defect review using aerial imaging
US7123356B1 (en) 2002-10-15 2006-10-17 Kla-Tencor Technologies Corp. Methods and systems for inspecting reticles using aerial imaging and die-to-database detection
US6952653B2 (en) * 2003-04-29 2005-10-04 Kla-Tencor Technologies Corporation Single tool defect classification solution
US7570796B2 (en) 2005-11-18 2009-08-04 Kla-Tencor Technologies Corp. Methods and systems for utilizing design data in combination with inspection data
JP4825021B2 (ja) * 2006-02-28 2011-11-30 株式会社日立ハイテクノロジーズ レポートフォーマット設定方法、レポートフォーマット設定装置、及び欠陥レビューシステム
KR101841897B1 (ko) 2008-07-28 2018-03-23 케이엘에이-텐코어 코오포레이션 웨이퍼 상의 메모리 디바이스 영역에서 검출된 결함들을 분류하기 위한 컴퓨터-구현 방법들, 컴퓨터-판독 가능 매체, 및 시스템들
JP5683473B2 (ja) 2008-10-22 2015-03-11 ダウ コーニング コーポレーションDow Corning Corporation パーソナルケア組成物におけるアミノ官能末端ブロックシリコーンポリエーテルコポリマー
US9170211B2 (en) 2011-03-25 2015-10-27 Kla-Tencor Corp. Design-based inspection using repeating structures
US9087367B2 (en) 2011-09-13 2015-07-21 Kla-Tencor Corp. Determining design coordinates for wafer defects
US9189844B2 (en) 2012-10-15 2015-11-17 Kla-Tencor Corp. Detecting defects on a wafer using defect-specific information
US9053527B2 (en) 2013-01-02 2015-06-09 Kla-Tencor Corp. Detecting defects on a wafer
US9134254B2 (en) 2013-01-07 2015-09-15 Kla-Tencor Corp. Determining a position of inspection system output in design data space
US9311698B2 (en) 2013-01-09 2016-04-12 Kla-Tencor Corp. Detecting defects on a wafer using template image matching
KR102019534B1 (ko) 2013-02-01 2019-09-09 케이엘에이 코포레이션 결함 특유의, 다중 채널 정보를 이용한 웨이퍼 상의 결함 검출
US9865512B2 (en) 2013-04-08 2018-01-09 Kla-Tencor Corp. Dynamic design attributes for wafer inspection
US9310320B2 (en) 2013-04-15 2016-04-12 Kla-Tencor Corp. Based sampling and binning for yield critical defects
CN104793372B (zh) * 2015-05-12 2018-01-19 武汉精测电子技术股份有限公司 不同产线液晶模组的缺陷等级判定方法
US20170091706A1 (en) * 2015-09-25 2017-03-30 Hand Held Products, Inc. System for monitoring the condition of packages throughout transit

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EP0295760A2 (fr) * 1987-01-27 1988-12-21 Tektronix Inc. Système et méthode d'édition de schémas-blocs

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US5802523A (en) * 1996-06-21 1998-09-01 Oracle Corporation Method and apparatus for reducing the memory required to store bind variable descriptors in a database

Patent Citations (1)

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Publication number Priority date Publication date Assignee Title
EP0295760A2 (fr) * 1987-01-27 1988-12-21 Tektronix Inc. Système et méthode d'édition de schémas-blocs

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
HUNT N: "IDF: A graphical data flow programming language for image processing and computer vision", PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON SYSTEMS, MAN, AND CYBERNETICS. LOS ANGELES, NOV. 4 - 7, 1990, NEW YORK, IEEE, US, 4 November 1990 (1990-11-04), pages 351 - 360, XP010038015, ISBN: 0-87942-597-0 *
KIYOSHI KOZUKA ET AL: "COMPONENT-BASED VISUAL PROGRAMMING ENVIRONMENT FOR COOPERATIVE SOFTWARE DEVELOPMENT", HITACHI REVIEW, HITACHI LTD. TOKYO, JP, vol. 45, no. 2, 1 April 1996 (1996-04-01), pages 75 - 80, XP000622838, ISSN: 0018-277X *
See also references of WO9922310A1 *

Also Published As

Publication number Publication date
JP2001521249A (ja) 2001-11-06
EP1025511A1 (fr) 2000-08-09
WO1999022311A1 (fr) 1999-05-06
EP1025511A4 (fr) 2002-09-11
WO1999022310A1 (fr) 1999-05-06
JP4375900B2 (ja) 2009-12-02
EP1025512A1 (fr) 2000-08-09
JP2004513402A (ja) 2004-04-30

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