EP0951366A1 - Method for making a sonoprobe - Google Patents
Method for making a sonoprobeInfo
- Publication number
- EP0951366A1 EP0951366A1 EP98954528A EP98954528A EP0951366A1 EP 0951366 A1 EP0951366 A1 EP 0951366A1 EP 98954528 A EP98954528 A EP 98954528A EP 98954528 A EP98954528 A EP 98954528A EP 0951366 A1 EP0951366 A1 EP 0951366A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- manufacturing
- dielectric film
- layer
- acoustic probe
- probe according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 26
- 239000000523 sample Substances 0.000 claims abstract description 22
- 239000000463 material Substances 0.000 claims abstract description 15
- 239000010410 layer Substances 0.000 claims description 31
- 238000001465 metallisation Methods 0.000 claims description 24
- 238000004519 manufacturing process Methods 0.000 claims description 22
- 239000011347 resin Substances 0.000 claims description 21
- 229920005989 resin Polymers 0.000 claims description 21
- 239000002184 metal Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 238000005530 etching Methods 0.000 claims description 12
- 238000000151 deposition Methods 0.000 claims description 6
- 239000000853 adhesive Substances 0.000 claims description 5
- 230000001070 adhesive effect Effects 0.000 claims description 5
- 230000004807 localization Effects 0.000 claims description 5
- 239000012790 adhesive layer Substances 0.000 claims description 4
- 238000002679 ablation Methods 0.000 claims description 2
- 239000004020 conductor Substances 0.000 abstract description 2
- 239000000919 ceramic Substances 0.000 description 5
- 230000000873 masking effect Effects 0.000 description 4
- 238000003754 machining Methods 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000000608 laser ablation Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000007790 scraping Methods 0.000 description 2
- 238000002604 ultrasonography Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
- B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
- B06B1/06—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
- B06B1/0607—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using multiple elements
- B06B1/0622—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using multiple elements on one surface
- B06B1/0629—Square array
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
- B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
- B06B1/06—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0058—Laminating printed circuit boards onto other substrates, e.g. metallic substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S29/00—Metal working
- Y10S29/001—Method or apparatus involving adhesive
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
- Y10T156/1056—Perforating lamina
- Y10T156/1057—Subsequent to assembly of laminae
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49005—Acoustic transducer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49165—Manufacturing circuit on or in base by forming conductive walled aperture in base
Definitions
- the present invention relates to methods for manufacturing acoustic probes comprising a set of transmitting and / or receiving elements obtained by cutting from a large transducer block. Such probes are currently used in particular in applications such as ultrasound.
- the invention relates more particularly to the means enabling electrical connections to be made between the transducer elements and the electronic devices connected to them. It facilitates the manufacture of transducers comprising a large number of elements arranged in particular in a two-dimensional arrangement.
- vias are then machined collectively in the film at the location of the elementary transducers to be interconnected.
- the connections are then made by lines etched in a metallic layer deposited on the film and in the vias. These lines are made at the level of the ceramic as well as at its periphery, so there is a flat connection on the surface of the ceramic, extended by a flexible connection which can be folded over the edges of the ceramic in a minimum of size.
- Such a method makes it possible to produce acoustically discrete connectors which can conform to geometries which are sometimes complex (curved probes and of small bulk). Nevertheless, the step of producing fine tracks with a fine pitch is carried out on a product at the end of the process and therefore of high added value and comprising critical zones for the etching of the tracks at the transition between flexible parts (flex) and rigid parts. (ceramic).
- the invention provides a connection method using a dielectric film type circuit on which the interconnection lines are produced before assembly on the active elements of the probe.
- this circuit can advantageously include interconnection lines on both sides.
- the subject of the invention is a method of manufacturing an acoustic probe comprising an interconnection circuit and elementary transducers produced in a blade of piezoelectric material comprising metallizations relating to the elementary transducers, characterized in that it comprises the following steps:
- the suitable localization method can be the focusing of an ablation laser.
- the adapted localization method can comprise the use of a mask.
- the conductive tracks are produced on the underside of the dielectric film, the adhesive layer being in contact with this underside and the layer of piezoelectric material.
- a metal mask can advantageously be produced on the surface of the dielectric film, for the subsequent step of etching the vias.
- the electrical contact between a conductive track and the metallization of the associated piezoelectric material is obtained by localized deposition of a conductive material which can be a metallic layer etched by masking or a conductive resin.
- the electrical contact between a conductive track and the metallization of associated piezoelectric material can be obtained by successive deposits of a metallization layer and a layer of masking resin, then etching to leave no layer of metallization only at the level of the vias.
- the upper face of the dielectric film comprises metal tracks.
- the etching can advantageously be carried out through a mechanical mask after having covered the upper face comprising the conductive tracks with a resin.
- the step of making electrical contact between a conductive track and the metallization of associated piezoelectric material can be carried out by depositing a layer of metal, then etching to leave the conductive layer only at the bottom. vias as will be explained later.
- FIG. 1 illustrates a first example of a flexible circuit comprising conductive tracks on the underside, used in an acoustic probe according to the invention
- FIG. 2a to 2f illustrate different steps of an example of a manufacturing method according to the invention using the flexible circuit illustrated in Figure 1;
- FIG. 3a and 3b illustrate a first example of resumption of electrical contact in vias, used in the method according to the invention
- FIG. 4a to 4d illustrate a second example of resumption of electrical contact in the vias, used in the method according to the invention
- FIG. 5 illustrates an embodiment in which 7 strips of piezoelectric elements are interconnected on 4 channels;
- FIG. 6 illustrates a second example of a flexible circuit comprising conductive tracks on the upper face, used in an acoustic probe according to the invention
- FIG. 7a to 7d illustrate different stages of an example of a manufacturing process according to the invention, using the flexible circuit illustrated in Figure 6;
- the method according to the invention initially comprises producing conductive tracks on a dielectric film which will constitute the interconnection circuit.
- a dielectric film which will constitute the interconnection circuit.
- it may be a flexible polymer film of the polyimide film type.
- the flexible circuit 11 comprises on a so-called lower face PI interconnection tracks (for example made of gilded copper) corresponding to level 1 of FIG. 1a and on a so-called upper face a metallic plane (for example in copper) 14 in which are made openings intended subsequently for the selective machining of dielectric film and corresponding to level 2 of FIG. 1.
- the superposition of levels 1 and 2 of FIG. 1a shows that voluntarily several openings are defined Ol superimposed on the same PI conductive track. This constitutes better security for the resumption of electrical contacts and also allows adjustment of the acoustic impedances as a function of the number of vias which may be produced in the dielectric film constituting the flexible circuit.
- the flexible circuit 13 comprising conductive tracks PI is laminated on a metallized layer of piezoelectric material 13.
- piezoelectric material 13 may be a piezoelectric PZT blade, metallized, in which saw cuts T
- FIG. 2a shows for this purpose the flexible circuit affixed to the piezoelectric plate.
- the metallic plane is not shown in Figure 2a to allow the conductive tracks PI to appear.
- the vias are then machined in the dielectric film, above each piezoelectric element to be connected.
- the machining is carried out through the mask present on the flexible circuit by laser ablation or by reactive ion etching, so part of the conductive track as well as the metallization of the transducer to be connected are exposed at the bottom of each via, as illustrated in Figure 2b.
- This step can be carried out in several ways and in particular according to the two variants described below.
- the resumption of the contacts is directly carried out using a thermosetting conductive resin.
- the dielectric film 11 and the metallization of the piezoelectric element form a reservoir above the points to be connected.
- the deposit of conductive resin 17 can therefore be self-positioned by simply scraping the surface of the. probe ( Figure 3a corresponding to a sectional view along the axis AA of Figure 1).
- the resumption of contacts is carried out by collective metallization, using a metal layer 15 (FIG. 4a).
- the metal deposited at the bottom of the vias makes the electrical connection between the conductive track and the metallization present at the bottom of the via.
- a masking resin 16 is then deposited which allows, by photolithography process, to define a resin mask for selectively etching the metal layer 15 and thus isolating each via (FIG. 4b). By photolithography, it is then possible to eliminate the surface while preserving a protective layer at the bottom of each via (FIG. 4c).
- FIG. 2c illustrates a configuration in which the electrical contact is ensured by pads of conductive resin 17.
- the upper Lii blade has a metallized surface Pli so as to reconstitute a continuity of ground plane ( Figure 2e).
- FIG. 5 illustrates an embodiment in which 7 symmetrical bands are interconnected on 4 ways.
- the piezoelectric elements are materialized by the dotted lines.
- this configuration allows the definition of piezoelectric elements of width and of the order of 480 ⁇ m and a track width e p of the order of 50 ⁇ m.
- the flexible circuit comprises conductive tracks on the upper face (level 2) and a ground plane P opposite side on the so-called lower face (level 1).
- the dielectric film 21 comprises on its upper face the conductive tracks PI and on its lower face the ground plane P with opening provided at the location of the transducer elements, as illustrated in FIG. 6.
- the dielectric film 21 is laminated on the layer of piezoelectric material 23 comprising cutouts T
- a resin layer is laminated over the dielectric film 21 and its conductive tracks PI. The machining of the vias is then obtained by laser ablation through a mechanical mask 24 (FIG. 7b).
- contact resumption can be carried out by collective metallization or by the use of a conductive resin, as illustrated in FIG. 7c.
- a layer of metal is deposited on the etched resin layer 26 and on the vias.
- the metal deposited at the bottom of the vias makes the electrical connection between the line and the metallization of the associated piezoelectric element.
- the resumption of contacts can be obtained by filling the vias using a thermosetting conductive resin 27.
- the deposition of conductive resin can thus be self-positioning by a simple scraping of the surface of the probe.
- a flexible circuit is produced with conductive tracks on level 1 and on level 2 corresponding respectively to the upper and lower surfaces of the dielectric film.
- Level 2 can also advantageously include a plan of mass P2.
- the process steps for making the vias and the contact resumption can be similar to those described in the second example process.
- the advantage of such a flexible circuit configuration lies in the increase in the density of the interconnections on the transducers by using a second level of connection.
- FIGS. 8a to 8d illustrate an embodiment in which 5 symmetrical bands can be connected on 3 channels.
- the conductive tracks of the upper level 1 are referenced PH, the conductive tracks of the lower level are referenced PI2.
- this configuration allows the definition of the width of piezoelectric elements ej of the order of 250 ⁇ m with a width of via e v of the order of 130 ⁇ m and a width of tracks e p of the order of 50 ⁇ m.
- Figures 8b, 8c and 8d respectively represent the sections of Figure 6a along the planes BB, CC, DD.
- the dielectric film 31 includes upper metal tracks PH and lower metal tracks PI2.
- the vias are filled with conductive resin 37; the dielectric film 31 is laminated on the layer of piezoelectric material 33, by means of a layer of adhesive 32.
- the resin 36 necessary for the process steps, has been maintained.
Abstract
The invention concerns a method for making a multielement sonoprobe, which consists in using a flexible circuit (11) comprising strip conductors (Pi) on at least one of its surfaces, assembling said circuit on a plate made of piezoelectric material (13) (comprising metallized tabs) (Mi), producing via holes through the flexible circuit to direct said metallized tabs (Mi) and producing contacts at the vias. The invention is applicable in probes used in earth resource survey.
Description
PROCEDE DE FABRICATION D'UNE SONDE ACOUSTIQUE METHOD FOR MANUFACTURING AN ACOUSTIC PROBE
La présente invention se rapporte aux procédés de fabrication de sondes acoustiques comprenant un ensemble d'éléments émetteurs et/ou récepteurs obtenus par découpe à partir d'un bloc transducteur de grande taille. De telles sondes sont actuellement utilisées notamment dans des applications telles que l'échographie.The present invention relates to methods for manufacturing acoustic probes comprising a set of transmitting and / or receiving elements obtained by cutting from a large transducer block. Such probes are currently used in particular in applications such as ultrasound.
L'invention concerne plus particulièrement les moyens permettant de réaliser les connexions électriques entre les éléments transducteurs et les dispositifs électroniques qui y sont reliés. Elle permet de faciliter la fabrication de transducteurs comportant un grand nombre d'éléments disposés notamment selon un arrangement bidimensionnel.The invention relates more particularly to the means enabling electrical connections to be made between the transducer elements and the electronic devices connected to them. It facilitates the manufacture of transducers comprising a large number of elements arranged in particular in a two-dimensional arrangement.
Parmi les procédés connus de connectique pour sonde d'échographie bidimensionnelle, un procédé décrit par la demanderesse dans la demande de brevet français publiée sous le n° 2 702 309 propose d'utiliser un film polymère mince laminé sur une céramique piézoélectrique métallisée.Among the known methods of connection for a two-dimensional ultrasound probe, a method described by the applicant in the French patent application published under No. 2,702,309 proposes using a thin polymer film laminated on a metallized piezoelectric ceramic.
Selon cet art antérieur, des vias sont ensuite usinés de façon collective dans le film à l'emplacement des transducteurs élémentaires à interconnecter. Les connexions sont alors réalisées par des lignes gravées dans une couche métallique déposée sur le film et dans les vias. Ces lignes sont réalisées au niveau de la céramique ainsi qu'à sa périphérie, on dispose donc d'une connectique plane à la surface de la céramique, prolongée par une connectique souple pouvant se rabattre sur les bords de la céramique dans un minium d'encombrement.According to this prior art, vias are then machined collectively in the film at the location of the elementary transducers to be interconnected. The connections are then made by lines etched in a metallic layer deposited on the film and in the vias. These lines are made at the level of the ceramic as well as at its periphery, so there is a flat connection on the surface of the ceramic, extended by a flexible connection which can be folded over the edges of the ceramic in a minimum of size.
Un tel procédé permet de réaliser une connectique acoustiquement discrète pouvant se conformer à des géométries parfois complexes (sondes courbes et de faible encombrement). Néanmoins, l'étape de réalisation des pistes fines à pas fin est réalisée sur un produit en fin de procédé et donc à forte valeur ajoutée et comportant des zones critiques pour la gravure des pistes à la transition entre parties souples (flex) et parties rigides (céramique).Such a method makes it possible to produce acoustically discrete connectors which can conform to geometries which are sometimes complex (curved probes and of small bulk). Nevertheless, the step of producing fine tracks with a fine pitch is carried out on a product at the end of the process and therefore of high added value and comprising critical zones for the etching of the tracks at the transition between flexible parts (flex) and rigid parts. (ceramic).
Pour pallier ces inconvénients, l'invention propose un procédé de connectique utilisant un circuit de type film de diélectrique sur lequel les lignes d'interconnexion sont réalisées avant assemblage sur les éléments actifs de la sonde. Comme il sera explicité ultérieurement, ce circuit peut
avantageusement comprendre des lignes d'interconnexion sur les deux faces.To overcome these drawbacks, the invention provides a connection method using a dielectric film type circuit on which the interconnection lines are produced before assembly on the active elements of the probe. As will be explained later, this circuit can advantageously include interconnection lines on both sides.
Plus précisément, l'invention a pour objet un procédé de fabrication d'une sonde acoustique comprenant un circuit d'interconnexion et des transducteurs élémentaires réalisés dans une lame de matériau piézoélectrique comprenant des metallisations relatives aux transducteurs élémentaires, caractérisé en ce qu'il comprend les étapes suivantes :More specifically, the subject of the invention is a method of manufacturing an acoustic probe comprising an interconnection circuit and elementary transducers produced in a blade of piezoelectric material comprising metallizations relating to the elementary transducers, characterized in that it comprises the following steps:
- la réalisation de pistes conductrices sur au moins l'une des faces d'un film diélectrique (11, 21 , 31 ) ; - le collage dudit film diélectrique comportant des pistes conductrices sur une couche (13, 23, 33) de matériau piézoélectrique comprenant des metallisations, par une couche de colle diélectrique (12, 22, 32) ;- The production of conductive tracks on at least one of the faces of a dielectric film (11, 21, 31); - bonding of said dielectric film comprising conductive tracks on a layer (13, 23, 33) of piezoelectric material comprising metallizations, by a layer of dielectric adhesive (12, 22, 32);
- la réalisation de vias à travers le film diélectrique (11, 21 , 31) et la couche de colle diélectrique (12, 22, 32) au moyen d'un procédé de localisation adaptée de manière à réaliser simultanément des vias débouchant d'une part sur une piste conductrice et d'autre part sur une metallisation associée ;- making vias through the dielectric film (11, 21, 31) and the dielectric adhesive layer (12, 22, 32) by means of a localization process adapted so as to simultaneously produce vias emerging from a on a conductive track and on the other hand on an associated metallization;
- la réalisation de contacts électriques entre une piste conductrice (PI, PH, PI2) et la metallisation de matériau piézoélectrique associé (mi). Selon une première variante de l'invention, le procédé de localisation adaptée peut être la focalisation d'un laser d'ablation.- making electrical contacts between a conductive track (PI, PH, PI2) and the metallization of associated piezoelectric material (mi). According to a first variant of the invention, the suitable localization method can be the focusing of an ablation laser.
Selon une seconde variante de l'invention, le procédé de localisation adaptée peut comprendre l'utilisation d'un masque.According to a second variant of the invention, the adapted localization method can comprise the use of a mask.
Selon une variante de l'invention, les pistes conductrices sont réalisées sur la face inférieure du film diélectrique, la couche de colle étant en contact avec cette face inférieure et la couche de matériau piézoélectrique. Selon cette variante, un masque métallique peut avantageusement être réalisé à la surface du film diélectrique, pour l'étape ultérieure de gravure des vias.According to a variant of the invention, the conductive tracks are produced on the underside of the dielectric film, the adhesive layer being in contact with this underside and the layer of piezoelectric material. According to this variant, a metal mask can advantageously be produced on the surface of the dielectric film, for the subsequent step of etching the vias.
Il est également possible d'utiliser un masque mécanique indépendant.It is also possible to use an independent mechanical mask.
De manière générale, le contact électrique entre une piste conductrice et la metallisation du matériau piézoélectrique associé est
obtenu par dépôt localisé d'un matériau conducteur qui peut être une couche métallique gravée par masquage ou une résine conductrice.Generally, the electrical contact between a conductive track and the metallization of the associated piezoelectric material is obtained by localized deposition of a conductive material which can be a metallic layer etched by masking or a conductive resin.
Selon une variante, le contact électrique entre une piste conductrice et la metallisation de matériau piézoélectrique associé, peut être obtenu par dépôts successifs d'une couche de metallisation et d'une couche de résine de masquage, puis gravure pour ne laisser de la couche de metallisation qu'au niveau des vias.According to a variant, the electrical contact between a conductive track and the metallization of associated piezoelectric material can be obtained by successive deposits of a metallization layer and a layer of masking resin, then etching to leave no layer of metallization only at the level of the vias.
Selon une autre variante de l'invention, la face supérieure du film diélectrique comprend des pistes métalliques. Dans ce cas, la gravure peut avantageusement être réalisée à travers un masque mécanique après avoir recouvert la face supérieure comprenant les pistes conductrices d'une résine. Après gravure des vias, l'étape de réalisation de contact électrique entre une piste conductrice et la metallisation de matériau piézoélectrique associé, peut être effectuée par dépôt d'une couche de métal, puis gravure pour ne laisser de la couche conductrice qu'au fond des vias comme il sera explicité ultérieurement.According to another variant of the invention, the upper face of the dielectric film comprises metal tracks. In this case, the etching can advantageously be carried out through a mechanical mask after having covered the upper face comprising the conductive tracks with a resin. After etching the vias, the step of making electrical contact between a conductive track and the metallization of associated piezoelectric material, can be carried out by depositing a layer of metal, then etching to leave the conductive layer only at the bottom. vias as will be explained later.
De manière générale, la reprise des contacts électriques peut être effectuée par remplissage des vias par une résine conductrice, plutôt que par dépôt d'une couche de metallisation puis gravure de cette couche. L'invention sera mieux comprise et d'autres avantages apparaîtront à la lecture de la description qui va suivre, donnée à titre non limitatif et grâce aux figures annexées parmi lesquelles :In general, the resumption of electrical contacts can be carried out by filling the vias with a conductive resin, rather than by depositing a layer of metallization and then etching this layer. The invention will be better understood and other advantages will appear on reading the description which follows, given without limitation and thanks to the appended figures among which:
- la figure 1 illustre un premier exemple de circuit souple comprenant des pistes conductrices en face inférieure, utilisé dans une sonde acoustique selon l'invention ;- Figure 1 illustrates a first example of a flexible circuit comprising conductive tracks on the underside, used in an acoustic probe according to the invention;
- les figures 2a à 2f illustrent différentes étapes d'un exemple de procédé de fabrication selon l'invention utilisant le circuit souple illustré en figure 1 ;- Figures 2a to 2f illustrate different steps of an example of a manufacturing method according to the invention using the flexible circuit illustrated in Figure 1;
- les figures 3a et 3b illustrent un premier exemple de reprise de contact électrique dans les vias, utilisé dans le procédé selon l'invention ;- Figures 3a and 3b illustrate a first example of resumption of electrical contact in vias, used in the method according to the invention;
- les figures 4a à 4d illustrent un deuxième exemple de reprise de contact électrique dans les vias, utilisé dans le procédé selon l'invention ;
- la figure 5 illustre une réalisation dans laquelle 7 bandes d'éléments piézoélectriques sont interconnectées sur 4 voies ;- Figures 4a to 4d illustrate a second example of resumption of electrical contact in the vias, used in the method according to the invention; - Figure 5 illustrates an embodiment in which 7 strips of piezoelectric elements are interconnected on 4 channels;
- la figure 6 illustre un second exemple de circuit souple comprenant des pistes conductrices en face supérieure, utilisé dans une sonde acoustique selon l'invention ;- Figure 6 illustrates a second example of a flexible circuit comprising conductive tracks on the upper face, used in an acoustic probe according to the invention;
- les figures 7a à 7d illustrent différentes étapes d'un exemple de procédé de fabrication selon l'invention, utilisant le circuit souple illustré en figure 6 ;- Figures 7a to 7d illustrate different stages of an example of a manufacturing process according to the invention, using the flexible circuit illustrated in Figure 6;
- les figures 8a à 8d illustrent une réalisation dans laquelle 5 bandes d'éléments piézoélectriques sont interconnectées sur 3 voies. De manière générale, le procédé selon l'invention comprend dans un premier temps la réalisation de pistes conductrices sur un film diélectrique qui constituera le circuit d'interconnexion. Avantageusement, il peut s'agir d'un film souple en polymère de type film de polyimide.- Figures 8a to 8d illustrate an embodiment in which 5 strips of piezoelectric elements are interconnected on 3 channels. In general, the method according to the invention initially comprises producing conductive tracks on a dielectric film which will constitute the interconnection circuit. Advantageously, it may be a flexible polymer film of the polyimide film type.
Selon un premier exemple de procédé, le circuit souple 11 comprend sur une face dite inférieure des pistes d'interconnexion PI (par exemple en cuivre doré) correspondant au niveau 1 de la figure 1a et sur une face dite supérieure un plan métallique (par exemple en cuivre) 14 dans lequel sont réalisées des ouvertures destinées ultérieurement à l'usinage sélectif de film diélectrique et correspondant au niveau 2 de la figure 1. La superposition des niveaux 1 et 2 de la figure 1a met en évidence que volontairement on définit plusieurs ouvertures Ol superposées à une même piste conductrice PI. Ceci constitue une meilleure sécurité pour la reprise des contacts électriques et permet également un ajustement des impédances acoustiques en fonction de nombre de vias qui pourront être réalisés dans le film diélectrique constitutif du circuit souple.According to a first example of a method, the flexible circuit 11 comprises on a so-called lower face PI interconnection tracks (for example made of gilded copper) corresponding to level 1 of FIG. 1a and on a so-called upper face a metallic plane (for example in copper) 14 in which are made openings intended subsequently for the selective machining of dielectric film and corresponding to level 2 of FIG. 1. The superposition of levels 1 and 2 of FIG. 1a shows that voluntarily several openings are defined Ol superimposed on the same PI conductive track. This constitutes better security for the resumption of electrical contacts and also allows adjustment of the acoustic impedances as a function of the number of vias which may be produced in the dielectric film constituting the flexible circuit.
Le circuit souple 13 comportant des pistes conductrices PI est laminé sur une couche métallisée de matériau piézoélectrique 13. Typiquement, il peut s'agir d'une lame piézoélectrique PZT, métallisée, dans laquelle ont été réalisées préalablement des traits de scie T| permettant d'isoler des metallisations Mi et qui permettront ultérieurement d'individualiser les éléments piézoélectriques. La figure 2a représente à cet effet le circuit souple apposé sur la lame piézoélectrique. Pour des
questions de représentation plus aisée le plan métallique n'est pas représenté en figure 2a pour laisser figurer les pistes conductrices PI.The flexible circuit 13 comprising conductive tracks PI is laminated on a metallized layer of piezoelectric material 13. Typically, it may be a piezoelectric PZT blade, metallized, in which saw cuts T | allowing to isolate metallizations Mi and which will make it possible later to individualize the piezoelectric elements. FIG. 2a shows for this purpose the flexible circuit affixed to the piezoelectric plate. For some easier representation issues the metallic plane is not shown in Figure 2a to allow the conductive tracks PI to appear.
On réalise ensuite l'usinage des vias dans le film diélectrique, au- dessus de chaque élément piézoélectrique à connecter. L'usinage est réalisé au travers du masque présent sur le circuit souple par ablation laser ou par gravure ionique réactive, ainsi une partie de la piste conductrice ainsi que la metallisation du transducteur à connecter sont mises à nu au fond de chaque via, comme illustré en figure 2b.The vias are then machined in the dielectric film, above each piezoelectric element to be connected. The machining is carried out through the mask present on the flexible circuit by laser ablation or by reactive ion etching, so part of the conductive track as well as the metallization of the transducer to be connected are exposed at the bottom of each via, as illustrated in Figure 2b.
Il est à noter qu'il est également possible d'utiliser un masque mécanique positionné sur l'assemblage, en remplacement du plan métallique de masquage.It should be noted that it is also possible to use a mechanical mask positioned on the assembly, replacing the metal masking plane.
Lorsque les vias ont été réalisés on procède alors à la reprise des contacts électriques dans les vias.When the vias have been made, the electrical contacts in the vias are then resumed.
Cette étape peut être réalisée de plusieurs manières et notamment selon les deux variantes décrites ci-après.This step can be carried out in several ways and in particular according to the two variants described below.
Selon une première seconde variante, la reprise des contacts est directement effectuée en utilisant une résine conductrice thermodurcissable. Le film diélectrique 11 et la metallisation d'élément piézoélectrique forment un réservoir au-dessus des points à connecter. Le dépôt de résine conductrice 17 peut donc être autopositionne par un simple raclage de la surface de la. sonde (figure 3a correspondant à une vue en coupe selon l'axe AA de la figure 1 ).According to a first second variant, the resumption of the contacts is directly carried out using a thermosetting conductive resin. The dielectric film 11 and the metallization of the piezoelectric element form a reservoir above the points to be connected. The deposit of conductive resin 17 can therefore be self-positioned by simply scraping the surface of the. probe (Figure 3a corresponding to a sectional view along the axis AA of Figure 1).
Ensuite, la gravure sélective du métal de la couche 14 permet d'isoler les plots de connectique tout en éliminant les éventuelles traces de résine conductrice thermodurcissable en surface (figure 3b).Then, the selective etching of the metal of the layer 14 makes it possible to isolate the connection pads while eliminating any traces of conductive thermosetting resin on the surface (FIG. 3b).
Selon une deuxième variante, la reprise des contacts est effectuée par metallisation collective, à l'aide d'une couche métallique 15 (figure 4a). Le métal déposé au fond des vias réalise la connexion électrique entre la piste conductrice et la metallisation présente au fond du via. On procède alors au dépôt d'une résine de masquage 16 qui permet par procédé de photolithographie de définir un masque de résine pour graver sélectivement la couche de métal 15 et ainsi isoler chaque via (figure 4b).
Par photolithographie, il est alors possible d'éliminer la surface tout en conservant une couche de protection au fond de chaque via (figure 4c).According to a second variant, the resumption of contacts is carried out by collective metallization, using a metal layer 15 (FIG. 4a). The metal deposited at the bottom of the vias makes the electrical connection between the conductive track and the metallization present at the bottom of the via. A masking resin 16 is then deposited which allows, by photolithography process, to define a resin mask for selectively etching the metal layer 15 and thus isolating each via (FIG. 4b). By photolithography, it is then possible to eliminate the surface while preserving a protective layer at the bottom of each via (FIG. 4c).
On peut alors procéder à la gravure de la couche métallique 15 comme illustré en figure 4d de manière à obtenir le contact électrique entre une piste conductrice et une metallisation d'élément piézoélectrique associé.It is then possible to etch the metal layer 15 as illustrated in FIG. 4d so as to obtain electrical contact between a conductive track and a metallization of associated piezoelectric element.
La figure 2c illustre une configuration dans laquelle le contact électrique est assuré par des plots de résine conductrice 17.FIG. 2c illustrates a configuration in which the electrical contact is ensured by pads of conductive resin 17.
Pour individualiser les éléments transducteurs on peut avantageusement procéder à des traits de scie Ti selon des directions parallèles à l'axe AA représenté en figure 1 (voir figure 2d).To individualize the transducer elements, it is advantageously possible to make saw cuts Ti in directions parallel to the axis AA shown in FIG. 1 (see FIG. 2d).
On procède alors à l'assemblage de deux lames Li et Li2 d'adaptation acoustique, avec la lame piézoélectrique découpée 13. La lame Lii supérieure possède une surface métallisée Pli de manière à reconstituer une continuité de plan de masse (figure 2e).We then proceed to assemble two blades Li and Li2 of acoustic adaptation, with the cut piezoelectric blade 13. The upper Lii blade has a metallized surface Pli so as to reconstitute a continuity of ground plane (Figure 2e).
On procède enfin à des traits de scie Tj selon des directions perpendiculaires aux traits Ti (figure 2f).Finally, we proceed to saw cuts Tj in directions perpendicular to the lines Ti (FIG. 2f).
On obtient ainsi une matrice d'éléments piézoélectriques adressables par l'intermédiaire des sorties dites points chauds (pistes PI) et de la sortie plan de plan P. A titre d'exemple la figure 5 illustre une réalisation dans laquelle 7 bandes symétriques sont interconnectées sur 4 voies. Typiquement, les éléments piézoélectriques sont matérialisés par les traits pointillés. Typiquement, cette configuration permet la définition d'éléments piézoélectriques de largeur et de l'ordre de 480 μm et une largeur de piste ep de l'ordre de 50 μm.One thus obtains a matrix of piezoelectric elements addressable via the outputs known as hot spots (tracks PI) and the plane plane output P. By way of example FIG. 5 illustrates an embodiment in which 7 symmetrical bands are interconnected on 4 ways. Typically, the piezoelectric elements are materialized by the dotted lines. Typically, this configuration allows the definition of piezoelectric elements of width and of the order of 480 μm and a track width e p of the order of 50 μm.
Selon un second exemple de procédé, le circuit souple comprend des pistes conductrices sur la face supérieure (niveau 2) et un plan de masse P côté opposé sur la face dite inférieure (niveau 1 ).According to a second example of a method, the flexible circuit comprises conductive tracks on the upper face (level 2) and a ground plane P opposite side on the so-called lower face (level 1).
Dans ce cas de figure, le film de diélectrique 21 comprend sur sa face supérieure les pistes conductrices PI et sur sa face inférieure le plan de masse P avec ouverture prévue à l'emplacement des éléments transducteurs, comme illustré en figure 6.
Dans un second temps, on procède au laminage du film diélectrique 21 sur la couche de matériau piézoélectrique 23 comportant des découpes T|, par l'intermédiaire d'une couche de colle diélectrique 22 (figure 7a). On procède ensuite au laminage d'une couche de résine au-dessus du film diélectrique 21 et de ses pistes conductrices PI. L'usinage des vias est alors obtenu par ablation laser au travers d'un masque mécanique 24 (figure 7b).In this case, the dielectric film 21 comprises on its upper face the conductive tracks PI and on its lower face the ground plane P with opening provided at the location of the transducer elements, as illustrated in FIG. 6. In a second step, the dielectric film 21 is laminated on the layer of piezoelectric material 23 comprising cutouts T |, by means of a layer of dielectric adhesive 22 (FIG. 7a). Next, a resin layer is laminated over the dielectric film 21 and its conductive tracks PI. The machining of the vias is then obtained by laser ablation through a mechanical mask 24 (FIG. 7b).
De même que dans le premier exemple de procédé cité précédemment, la reprise de contact peut être effectuée par metallisation collective ou par l'utilisation d'une résine conductrice, comme illustré en figure 7c.As in the first example of the method mentioned above, contact resumption can be carried out by collective metallization or by the use of a conductive resin, as illustrated in FIG. 7c.
Dans le cas d'une metallisation collective, une couche de métal est déposée sur la couche de résine gravée 26 et sur les vias. Ainsi le métal déposé au fond des vias, réalise la connexion électrique entre la ligne et la metallisation de l'élément piézoélectrique associé. La gravure sélective du métal présent en surface, au travers d'un masque de résine permet d'isoler chaque via.In the case of collective metallization, a layer of metal is deposited on the etched resin layer 26 and on the vias. Thus the metal deposited at the bottom of the vias, makes the electrical connection between the line and the metallization of the associated piezoelectric element. Selective etching of the metal present on the surface, through a resin mask, isolates each via.
Selon une autre variante, la reprise des contacts peut être obtenue par remplissage des vias à l'aide d'une résine conductrice thermodurcissable 27. Le dépôt de résine conductrice peut ainsi être autopositionne par un simple raclage de la surface de la sonde.According to another variant, the resumption of contacts can be obtained by filling the vias using a thermosetting conductive resin 27. The deposition of conductive resin can thus be self-positioning by a simple scraping of the surface of the probe.
Il est également possible d'obtenir la reprise des contacts, par sérigraphie de plots de résine conductrice « à cheval » sur les pistes conductrices et sur les vias, permettant ainsi de s'affranchir du laminage de la couche de résine. De même que dans l'exemple précédent, on procède à l'assemblage de lame d'adaptation acoustique Lii et Li2 puis à la découpe des éléments par des traits de scie Ti et TJ (figure 7d). L'adressage des éléments transducteurs se fait ainsi par l'intermédiaire des sorties dites points chauds (pistes PI) et de la sortie plan de masse P.It is also possible to obtain the resumption of the contacts, by serigraphy of pads of conductive resin "astride" on the conductive tracks and on the vias, thus making it possible to dispense with the laminating of the layer of resin. As in the previous example, we proceed to assemble the acoustic adaptation blade Lii and Li2 and then cut the elements with saw cuts Ti and TJ (FIG. 7d). The addressing of the transducer elements is thus done via the so-called hot spot outputs (PI tracks) and the ground plane output P.
Selon un troisième exemple de procédé, on réalise un circuit souple avec des pistes conductrices sur le niveau 1 et sur le niveau 2 correspondant respectivement aux surfaces supérieure et inférieure du film diélectrique. Le niveau 2 peut comprendre en plus avantageusement un plan
de masse P2. Les étapes de procédé pour réaliser les vias et les reprises de contact peuvent être similaires à celles décrites dans le second exemple de procédé. L'intérêt d'une telle configuration de circuit souple, réside dans l'augmentation de la densité des interconnexions sur les transducteurs en utilisant un deuxième niveau de connectique. A titre d'exemple, les figures 8a à 8d illustrent une réalisation dans laquelle 5 bandes symétriques peuvent être connectées sur 3 voies. Les pistes conductrices du niveau supérieur 1 sont référencées PH, les pistes conductrices du niveau inférieur sont référencées PI2. Typiquement, cette configuration permet la définition de largeur d'éléments piézoélectriques ej de l'ordre de 250 μm avec une largeur de via ev de l'ordre de 130 μm et une largeur de pistes ep de l'ordre de 50 μm.According to a third example of a method, a flexible circuit is produced with conductive tracks on level 1 and on level 2 corresponding respectively to the upper and lower surfaces of the dielectric film. Level 2 can also advantageously include a plan of mass P2. The process steps for making the vias and the contact resumption can be similar to those described in the second example process. The advantage of such a flexible circuit configuration lies in the increase in the density of the interconnections on the transducers by using a second level of connection. By way of example, FIGS. 8a to 8d illustrate an embodiment in which 5 symmetrical bands can be connected on 3 channels. The conductive tracks of the upper level 1 are referenced PH, the conductive tracks of the lower level are referenced PI2. Typically, this configuration allows the definition of the width of piezoelectric elements ej of the order of 250 μm with a width of via e v of the order of 130 μm and a width of tracks e p of the order of 50 μm.
Les figures 8b, 8c et 8d représentent respectivement les coupes de la figure 6a selon les plans BB, CC, DD. Dans cette configuration, le film diélectrique 31 comprend des pistes métalliques supérieures PH et des pistes métalliques inférieures PI2. Les vias sont remplis de résine conductrice 37 ; le film diélectrique 31 est laminé sur la couche de matériau piézoélectrique 33, par l'intermédiaire d'une couche de colle 32. La résine 36, nécessaire aux étapes de procédé, a été maintenue.
Figures 8b, 8c and 8d respectively represent the sections of Figure 6a along the planes BB, CC, DD. In this configuration, the dielectric film 31 includes upper metal tracks PH and lower metal tracks PI2. The vias are filled with conductive resin 37; the dielectric film 31 is laminated on the layer of piezoelectric material 33, by means of a layer of adhesive 32. The resin 36, necessary for the process steps, has been maintained.
Claims
1. Procédé de fabrication d'une sonde acoustique comprenant un circuit d'interconnexion et des transducteurs élémentaires réalisés dans une lame de matériau piézoélectrique, caractérisé en ce qu'il comprend les étapes suivantes : - la réalisation de pistes conductrices sur au moins l'une des faces d'un film diélectrique (11, 21, 31) ;1. A method of manufacturing an acoustic probe comprising an interconnection circuit and elementary transducers produced in a blade of piezoelectric material, characterized in that it comprises the following steps: - the production of conductive tracks on at least the one of the faces of a dielectric film (11, 21, 31);
- le collage dudit film diélectrique comportant des pistes conductrices sur une couche (13, 23, 33) de matériau piézoélectrique comprenant des metallisations, par une couche de colle diélectrique (12, 22, 32) ;- bonding of said dielectric film comprising conductive tracks on a layer (13, 23, 33) of piezoelectric material comprising metallizations, by a layer of dielectric adhesive (12, 22, 32);
- la réalisation de vias à travers le film diélectrique (11 , 21 , 31 ) et la couche de colle diélectrique (12, 22, 32) au moyen d'un procédé de localisation adaptée de manière à réaliser simultanément des vias débouchant d'une part sur une piste conductrice et d'autre part sur une metallisation associée ;- making vias through the dielectric film (11, 21, 31) and the dielectric adhesive layer (12, 22, 32) by means of a localization process adapted so as to simultaneously produce vias emerging from a on a conductive track and on the other hand on an associated metallization;
- la réalisation de contacts électriques entre une piste conductrice (PI, PH, PI2) et la metallisation de matériau piézoélectrique associé (mi).- making electrical contacts between a conductive track (PI, PH, PI2) and the metallization of associated piezoelectric material (mi).
2. Procédé de fabrication d'une sonde acoustique selon la revendication 1 , caractérisé en ce qu'il comprend la réalisation de pistes conductrices sur la face dite inférieure du film diélectrique (11 , 21 , 31 ), la couche de colle (12, 22, 32) étant en contact avec cette face dite inférieure et la couche de matériau piézoélectrique (13, 23, 33).2. Method of manufacturing an acoustic probe according to claim 1, characterized in that it comprises the production of conductive tracks on the so-called lower face of the dielectric film (11, 21, 31), the adhesive layer (12, 22, 32) being in contact with this so-called lower face and the layer of piezoelectric material (13, 23, 33).
3. Procédé de fabrication d'une sonde acoustique selon l'une des revendications 1 ou 2, caractérisé en ce qu'il comprend la réalisation de pistes conductrices sur la face supérieure du film diélectrique (11 , 21 , 31).3. Method of manufacturing an acoustic probe according to one of claims 1 or 2, characterized in that it comprises the production of conductive tracks on the upper face of the dielectric film (11, 21, 31).
4. Procédé de fabrication d'une sonde acoustique selon la revendication 3, caractérisé en ce qu'il comprend la réalisation d'un plan de masse (P) au niveau de la face inférieure du film diélectrique. 4. A method of manufacturing an acoustic probe according to claim 3, characterized in that it comprises the production of a ground plane (P) at the level of the underside of the dielectric film.
5. Procédé de fabrication d'une sonde acoustique selon l'une des revendications 1 à 4, caractérisé en ce que le procédé de localisation adaptée est la focalisation d'un laser d'ablation.
5. Method for manufacturing an acoustic probe according to one of claims 1 to 4, characterized in that the suitable localization method is the focusing of an ablation laser.
6. Procédé de fabrication d'une sonde acoustique selon l'une des revendications 1 à 4, caractérisé en ce qu'il comprend l'utilisation d'un masque.6. Method of manufacturing an acoustic probe according to one of claims 1 to 4, characterized in that it comprises the use of a mask.
7. Procédé de fabrication d'une sonde acoustique selon la revendication 6, caractérisé en ce qu'il comprend la réalisation d'un masque métallique sur la face supérieure du film diélectrique (11, 21 , 31 ).7. A method of manufacturing an acoustic probe according to claim 6, characterized in that it comprises the production of a metal mask on the upper face of the dielectric film (11, 21, 31).
8. Procédé de fabrication d'une sonde acoustique selon la revendication 6, caractérisé en ce qu'il comprend la gravure du film diélectrique (11, 21, 31) et de la couche de colle diélectrique (12, 22, 32) au travers d'un masque mécanique, indépendant.8. A method of manufacturing an acoustic probe according to claim 6, characterized in that it comprises the etching of the dielectric film (11, 21, 31) and the layer of dielectric adhesive (12, 22, 32) through a mechanical mask, independent.
9. Procédé de fabrication d'une sonde acoustique selon l'une des revendications 1 à 8, caractérisé en ce que les contacts électriques entre une piste conductrice (PI, PH, PI2) et une metallisation (mi) sont réalisés par dépôt d'une couche métallique (15, 25), puis gravure locale de ladite couche métallique (15, 25).9. A method of manufacturing an acoustic probe according to one of claims 1 to 8, characterized in that the electrical contacts between a conductive track (PI, PH, PI2) and a metallization (mi) are made by depositing a metal layer (15, 25), then local etching of said metal layer (15, 25).
10. Procédé de fabrication d'une sonde acoustique selon l'une des revendications 1 à 9, caractérisé en ce que les contacts électriques entre une piste conductrice (PI, PH, PI2) et une metallisation (mi) sont réalisés par dépôt d'une résine conductrice dans les vias.
10. A method of manufacturing an acoustic probe according to one of claims 1 to 9, characterized in that the electrical contacts between a conductive track (PI, PH, PI2) and a metallization (mi) are made by depositing a conductive resin in the vias.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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FR9714049A FR2770932B1 (en) | 1997-11-07 | 1997-11-07 | METHOD FOR MANUFACTURING AN ACOUSTIC PROBE |
FR9714049 | 1997-11-07 | ||
PCT/FR1998/002372 WO1999024175A1 (en) | 1997-11-07 | 1998-11-05 | Method for making a sonoprobe |
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EP0951366A1 true EP0951366A1 (en) | 1999-10-27 |
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EP98954528A Withdrawn EP0951366A1 (en) | 1997-11-07 | 1998-11-05 | Method for making a sonoprobe |
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US (1) | US6729001B2 (en) |
EP (1) | EP0951366A1 (en) |
JP (1) | JP2001509901A (en) |
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CN (1) | CN1177654C (en) |
FR (1) | FR2770932B1 (en) |
WO (1) | WO1999024175A1 (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2806332B1 (en) * | 2000-03-14 | 2002-06-14 | Thomson Csf | UNIDIRECTIONAL ACOUSTIC SENSOR AND MANUFACTURING METHOD |
FR2810907B1 (en) * | 2000-06-30 | 2002-10-31 | Thomson Csf | METHOD FOR MANUFACTURING A MULTI-PIECE ACOUSTIC PROBE USING A NEW METHOD FOR PRODUCING ELECTRICAL MASS |
KR100394876B1 (en) * | 2001-06-05 | 2003-08-19 | 주식회사 나노위즈 | method of fabricating ultrasonic wave probe |
JP4503347B2 (en) * | 2004-04-28 | 2010-07-14 | 日本電波工業株式会社 | Manufacturing method of ultrasonic probe |
JP5023461B2 (en) * | 2005-09-27 | 2012-09-12 | 富士ゼロックス株式会社 | Piezoelectric element, droplet discharge head, droplet discharge apparatus, and method for manufacturing piezoelectric element |
US9184369B2 (en) | 2008-09-18 | 2015-11-10 | Fujifilm Sonosite, Inc. | Methods for manufacturing ultrasound transducers and other components |
EP3309823B1 (en) * | 2008-09-18 | 2020-02-12 | FUJIFILM SonoSite, Inc. | Ultrasound transducers |
US9173047B2 (en) | 2008-09-18 | 2015-10-27 | Fujifilm Sonosite, Inc. | Methods for manufacturing ultrasound transducers and other components |
KR101031010B1 (en) | 2008-10-29 | 2011-04-25 | 삼성메디슨 주식회사 | Pcb and probe therewith |
JP5056837B2 (en) * | 2009-12-21 | 2012-10-24 | 株式会社村田製作所 | Method for manufacturing piezoelectric device |
JP5863402B2 (en) * | 2011-11-09 | 2016-02-16 | 国立大学法人東北大学 | Electronic device mounting method and electronic device mounting body |
WO2017127050A1 (en) * | 2016-01-19 | 2017-07-27 | Sound Technology Inc. | Ultrasound transducer array interconnect |
US11600519B2 (en) * | 2019-09-16 | 2023-03-07 | International Business Machines Corporation | Skip-via proximity interconnect |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2929541A1 (en) * | 1979-07-20 | 1981-02-05 | Siemens Ag | ULTRASONIC CONVERTER ARRANGEMENT |
US4388136A (en) * | 1980-09-26 | 1983-06-14 | Sperry Corporation | Method of making a polyimide/glass hybrid printed circuit board |
US4840923A (en) * | 1986-04-30 | 1989-06-20 | International Business Machine Corporation | Simultaneous multiple level interconnection process |
JPS636885A (en) * | 1986-06-26 | 1988-01-12 | Daikin Ind Ltd | Manufacture of piezoelectric polymeric sheet with bimorph structure |
FR2605139A1 (en) | 1986-10-10 | 1988-04-15 | Europ Composants Electron | POLYMER FILM-TYPE CAPACITOR WITH HIGH TEMPERATURE STABILITY |
FR2627008B1 (en) | 1988-02-05 | 1990-06-08 | Europ Composants Electron | METHOD FOR IMPREGNATING ELECTROLYTIC CAPACITORS WITH TETRACYANOQUINODIMETHANE SALTS |
US5160779A (en) * | 1989-11-30 | 1992-11-03 | Hoya Corporation | Microprobe provided circuit substrate and method for producing the same |
US5091893A (en) * | 1990-04-05 | 1992-02-25 | General Electric Company | Ultrasonic array with a high density of electrical connections |
FR2666173A1 (en) | 1990-08-21 | 1992-02-28 | Thomson Csf | HYBRID INTERCONNECTION STRUCTURE FOR INTEGRATED CIRCUITS AND MANUFACTURING METHOD. |
FR2670021B1 (en) | 1990-12-04 | 1994-03-04 | Thomson Csf | PROCESS FOR PRODUCING MICROLENTILES FOR OPTICAL APPLICATIONS. |
FR2685080B1 (en) | 1991-12-17 | 1995-09-01 | Thomson Csf | MECHANICAL SENSOR COMPRISING A POLYMER FILM. |
FR2701602B1 (en) | 1993-02-12 | 1995-03-31 | Thomson Csf | Thermal detector comprising a thermal insulator made of expanded polymer. |
FR2702309B1 (en) * | 1993-03-05 | 1995-04-07 | Thomson Csf | Method for manufacturing a multi-element acoustic probe, in particular an ultrasound probe. |
US5785787A (en) * | 1994-05-23 | 1998-07-28 | General Electric Company | Processing low dielectric constant materials for high speed electronics |
US5655276A (en) * | 1995-02-06 | 1997-08-12 | General Electric Company | Method of manufacturing two-dimensional array ultrasonic transducers |
US5617865A (en) * | 1995-03-31 | 1997-04-08 | Siemens Medical Systems, Inc. | Multi-dimensional ultrasonic array interconnect |
FR2740933B1 (en) | 1995-11-03 | 1997-11-28 | Thomson Csf | ACOUSTIC PROBE AND METHOD FOR PRODUCING THE SAME |
FR2745973B1 (en) | 1996-03-08 | 1998-04-03 | Thomson Csf | MASS MEMORY AND METHOD FOR MANUFACTURING MASS MEMORY |
FR2756447B1 (en) | 1996-11-26 | 1999-02-05 | Thomson Csf | MULTIPLE ELEMENT ACOUSTIC PROBE COMPRISING A COMMON MASS ELECTRODE |
-
1997
- 1997-11-07 FR FR9714049A patent/FR2770932B1/en not_active Expired - Lifetime
-
1998
- 1998-11-05 EP EP98954528A patent/EP0951366A1/en not_active Withdrawn
- 1998-11-05 US US09/341,112 patent/US6729001B2/en not_active Expired - Lifetime
- 1998-11-05 CN CNB98801680XA patent/CN1177654C/en not_active Expired - Lifetime
- 1998-11-05 WO PCT/FR1998/002372 patent/WO1999024175A1/en not_active Application Discontinuation
- 1998-11-05 JP JP52560499A patent/JP2001509901A/en active Pending
- 1998-11-05 KR KR1019997006079A patent/KR20000069886A/en not_active Application Discontinuation
Non-Patent Citations (1)
Title |
---|
See references of WO9924175A1 * |
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FR2770932B1 (en) | 2001-11-16 |
CN1243461A (en) | 2000-02-02 |
US6729001B2 (en) | 2004-05-04 |
JP2001509901A (en) | 2001-07-24 |
US20020129477A1 (en) | 2002-09-19 |
CN1177654C (en) | 2004-12-01 |
KR20000069886A (en) | 2000-11-25 |
WO1999024175A1 (en) | 1999-05-20 |
FR2770932A1 (en) | 1999-05-14 |
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