EP0935778A1 - Direct positive lithographic plate - Google Patents

Direct positive lithographic plate

Info

Publication number
EP0935778A1
EP0935778A1 EP97910522A EP97910522A EP0935778A1 EP 0935778 A1 EP0935778 A1 EP 0935778A1 EP 97910522 A EP97910522 A EP 97910522A EP 97910522 A EP97910522 A EP 97910522A EP 0935778 A1 EP0935778 A1 EP 0935778A1
Authority
EP
European Patent Office
Prior art keywords
positive working
plate precursor
lithographic plate
coating
aryl alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP97910522A
Other languages
German (de)
French (fr)
Other versions
EP0935778B1 (en
Inventor
Peter Andrew Reath Bennett
John Andrew Hearson
Carole-Anne Smith
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Graphics Holding Inc
Original Assignee
Kodak Graphics Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Graphics Holding Inc filed Critical Kodak Graphics Holding Inc
Publication of EP0935778A1 publication Critical patent/EP0935778A1/en
Application granted granted Critical
Publication of EP0935778B1 publication Critical patent/EP0935778B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Definitions

  • This invention relates to the production of positive working lithographic plates.
  • Positive working lithographic plates are very widely manufactured and probably account for over half of all lithographic plates.
  • the photosensitive compositions used are comparatively simple and easy to manufacture, typically comprising an o-quinonediazide light sensitive component and a phenolic resin. Their processing after image-wise exposure is also simple. However, if the processing is not carried out according to the manufacturers instructions, such as the use of developing solutions which are stronger than that recommended or if temperature of the developing solution is too hot, there is a tendency for the developing solution to remove not only the exposed areas of the plate but also to attack the image areas in the non-exposed areas of the plate. This attack on the printing image areas produces a poor image and in many cases renders the plate unusable.
  • the use of strong developing solutions exacerbates the problem of image attack, as does developing times over 30 seconds as are often used in the processing of direct positive plates.
  • a positive working lithographic plate precursor comprising a support having a hydrophilic surface and a coating thereon comprising a positive working photosensitive composition and an aryl alkyl polysiloxane.
  • a positive working lithographic plate precursor comprising a support having a hydrophilic surface and a coating thereon comprising a positive working, photosensitive composition and an aryl alkyl polysiloxane at least part of which aryl alkyl polysiloxane is present as a thin layer at the uppermost surface of the plate precursor
  • a method of preparing a positive working lithographic plate precursor of the present invention comprising coating on a support having a hydrophilic surface a coating comprising in admixture a positive working photosensitive composition and an aryl alkyl polysiloxane
  • a preferred aryl alkyl polysiloxane useful in the present invention is a phenyl methyl polysiloxane
  • the aryl alkyl polysiloxane constitutes at least 0 3%, preferably at least 1%, preferably upto 50%, more preferably upto 10% by weight of the dry coating
  • a preferred weight range for the aryl alkyl polysiloxane may be expressed as 1 - 10% of the total dry coating weight
  • the preferred positive working photosensitive compositions of the present invention are those comprising an o-napthoquinone diazide as the light sensitive component Most preferably these are present either as sulphonic acid esters or as carboxyhc acid esters
  • o-quinone diazide compounds examples include U S Pat Nos 2,766, 118, 2,767,092, 2,772,972, 2,859, 1 12, 2,907,665, 3,046,110, 3,046, 1 1 1, 3,046, 1 15, 3,046, 1 18, 3,046, 119, 3,046, 120, 3,046, 121, 3,046, 122, 3,046, 123, 3,061,430, 3,102,809, 3, 106,465, 3,635,709 and 3,647,443 and these compounds may preferably be used in the invention
  • particularly preferred are o-naphthoqu onediazidosulfonates or o-naphthoquinonediazido carboxylates of aromatic hydroxyl compounds, o-naphthoquinonediazidosulfonic acid amides or o-naphthoquinonediazido-carboxylic acid amides of aromatic amine compounds, for instance
  • the preferred binder for the photosensitive composition is an alkali soluble resin.
  • alkali soluble resins are the condensation products from the interaction between phenol, C-alkyl substituted phenols (such as cresols and /?-tert-butyl-phenoI), diphenols (such as bisphenol-A) and aldehydes (such as formaldehyde).
  • Particularly useful in this invention are novolak resins, resole resins and novolak/resole resin mixtures.
  • the most preferred photosensitive composition comprises onapthoquinonediazide sulphonyl esters of a phenolic resin.
  • the photosensitive composition constitutes at least 50%, preferably at least 90%, preferably upto 99.7%, more preferably upto 99% by weight of the dry coating.
  • a preferred weight range for the photosensitive composition may be expressed as 90 - 99% of the total dry coating weight.
  • Suitable solvents for the coating solutions are, for example, the known glycol derivatives (such as 2-ethoxy ethanol and l-methoxy-propan-2-ol) and ketones (such as butanone) in common use for the manufacture of such photosensitive coatings.
  • the wet coated composition is dried at elevated temperatures to remove coating solvents. If drying temperature or drying time is too low then residual solvents can adversely effect the resulting developer resistance of the coating. If drying is too severe then unwanted reactions can occur in the drying film Preferably the coated compositions are dried between 100°C for 210 seconds and 130°C for 90 seconds
  • the aryl alkyl polysiloxane is laid down to a dry film weight of at least 0 02gm ; , preferably at least 0 05gm : , preferably upto 0 6gm 2 , more preferably upto 0 4gm 2
  • a preferred weight range for the aryl alkyl polysiloxane may be expressed as 0 05 - 0 4 gm ⁇ dry film weight
  • the aryl alkyl polysiloxane composition can be applied to the photosensitive layer by various means such as spraying Suitably the composition is coated onto the photosensitive layer
  • the base which can be used as the support having a hydrophilic surface is preferably an aluminium plate which has undergone the usual anodic, graining and post-anodic treatments well known in the lithographic art for enabling a photosensitive composition to be coated thereon and for the surface of the support to function as a printing background.
  • Another base material which may be used in the method of the present invention is a plastics material base or a treated paper base as used in the photographic industry.
  • a particularly useful plastics material base is polyethylene terephthalate which has been subbed to render its surface hydrophilic. Also a so-called resin coated paper which has been corona discharge treated can also be used.
  • the photosensitive compositions of the invention may contain other ingredients such as stabilising additives, colourants, colour change additives, additional polymeric binders etc. as are present in many lithographic plate compositions.
  • Resin A Rutaphen LB6564 - a phenol/cresol novolak resin marketed by Bakelite, U.K.
  • Resin B Rutaphen LB744 - a cresol novolak resin marketed by Bakelite, UK.
  • Dye A Ethyl Violet (basic violet 4, C.I. 42600) as supplied by Aldrich Chemical Company of Gillingham, England.
  • Dye B Victoria Blue BO (basic blue 7, C.I. 42595) as supplied by Aldrich Chemical Company of Gillingham, England.
  • Siloxane A Silikophen P50X, a solution of a phenyl methyl siloxane as supplied by Tego Chemie Service GmbH of Essen, Germany.
  • Siloxane B Silikophen P70 MPA, a solution of a phenyl methyl siloxane as supplied by Tego Chemie Service GmbH of Essen, Germany.
  • NQD A Dihydroxybenzophenone bis 2, 1,5 naphthoquinonediazide ester as supplied by A.H.Marks Ltd., of Bradford, England
  • NQD B Diazo RO825, a naphthoquinonediazide - resin ester as supplied by Rohner AG of Pratteln, Switzerland.
  • Developer B An aqueous developing solution Goldstar, as supplied by Horsell Graphic Industries Ltd, Leeds, UK.
  • Developer D An aqueous developing solution containing sodium metasilicate pentahydrate at a concentration of 10% w/w.
  • Developer E An aqueous developing solution of 2.5 % w/w potassium hydroxide.
  • Solvent B l-methoxypropan-2-ol Assessment of Plates.
  • a plate was cut into a disc with an area of 100cm 2
  • the sample was immersed in developer at a 20°C for 120 seconds, removed, placed in a beaker of water, then the plate surface wiped with a damp piece of cotton wool to remove any loose coating.
  • the disc was rinsed with water and dried
  • the sample was weighed then the remaining coating was removed by immersion in acetone
  • the plate was dried once again and re-weighed
  • the amount of coating lost in the developer, as a percentage of the original film weight was calculated using a reference film weight from a disc taken adjacently from the sample
  • the figures quoted are the percentage of coating film weight removed by the developer Higher values indicate the more attack suffered by the coating
  • the colour of a plate was measured using a Minolta CR-331 Chromameter as supplied by Minolta Camera Co Ltd of Osaka, Japan
  • the plate was then placed in a tray and developer A at 20°C poured over the plate
  • the developer was gently agitated by moving the tray for 60 seconds
  • the plate was removed from the tray, rinsed with water and dried
  • the colour of the plate was then re-measured using the Chromameter
  • the change in L value was calculated The greater the change in L value, the more coating that was lost during the development process Assessment 5 : Coating colour difference in developer A.
  • a plate was partly immersed in a beaker of developer D at 20°C for 1 minute, removed, rinsed and dried.
  • the colour of the plate both where developer had met the plate and where no developer had met the plate was measured using a Chromameter.
  • the difference in L value was calculated. The greater the change in L value, the more coating that was lost during the immersion in developer.
  • a plate was image-wise exposed using a Montakop lightframe as supplied by Siegfried Theimer GmbH, Bad Homburg, Germany, using a Stouffer control strip. The plate was then developed by pouring developer C at 20°C over the plate and wiping with cotton wool for 1 minute. The plate was then rinsed with water and dried. The readings on the control strip were recorded to determine the amount of exposure required to give a clear 3 reading on the Stouffer control strip. The results were recorded as the number of light units. Results differing less than 15% would be considered to be within experimental error.
  • the formulations prepared in step 1 were each applied to a substrate of 0.3 mm sheet of aluminium that had been electrograined and anodised and post-anodically treated with an aqueous solution of an inorganic phosphate.
  • the coating solutions were coated onto the substrate by means of a wire wound bar using a K303 coater as supplied by R.K. Print Coat Instruments Ltd. of Royston, England.
  • the solution concentration was selected to provide the specified dry film compositions with a coating weight of approximately 2.0gm "2 after drying at 130 °C for 80 seconds in a Mathis Labdryer LTE oven (as supplied by Werner Mathis AG, Zurich, Switzerland) Results:
  • Step 1 Preparation of coating solution.
  • a solution of Siloxane A was prepared at 3% w/w by adding Siloxane A to xylene and stirring. This solution was applied to an Alphapos III positive working printing plate as supplied by Horsell Graphic Industries Ltd. by means of the coating method of example I to provide a dry film weight of 0.35 gm "2 . An Alphapos III plate without the Siloxane coating was used as comparative example C5.

Abstract

There is described a positive working lithographic plate precursor comprising a support having a hydrophilic surface and a coating thereon comprising a positive working photosensitive composition and an aryl alkyl polysiloxane. Such precursors exhibit a reduced tendency to developer attack of the image obtained after image-wise exposure under aggressive development whilst significantly reducing any accompanying loss of sensitivity in less aggressive developers and development conditions.

Description

DIRECT POSITIVE LITHOGRAPHIC PLATE This invention relates to the production of positive working lithographic plates.
Positive working lithographic plates are very widely manufactured and probably account for over half of all lithographic plates. The photosensitive compositions used are comparatively simple and easy to manufacture, typically comprising an o-quinonediazide light sensitive component and a phenolic resin. Their processing after image-wise exposure is also simple. However, if the processing is not carried out according to the manufacturers instructions, such as the use of developing solutions which are stronger than that recommended or if temperature of the developing solution is too hot, there is a tendency for the developing solution to remove not only the exposed areas of the plate but also to attack the image areas in the non-exposed areas of the plate. This attack on the printing image areas produces a poor image and in many cases renders the plate unusable. The use of strong developing solutions exacerbates the problem of image attack, as does developing times over 30 seconds as are often used in the processing of direct positive plates.
Common formulation means for decreasing attack by strong developers or through the use of conditions leading to over development, such as using phenolic resins with reduced alkali solubility, would normally lead to a reduction in plate sensitivity for the same plate under less aggressive development conditions. Accordingly methods to increase plate sensitivities, such as the use of speed enhancers, often result in reduced resistance to developer attack.
We have discovered a positive working lithographic plate precursor and methods of producing said precursor which exhibit a reduced tendency to developer attack of the image obtained after image-wise exposure under aggressive development whilst significantly reducing any accompanying loss of sensitivity in less aggressive developers and development conditions.
Therefore according to the present invention there is provided a positive working lithographic plate precursor comprising a support having a hydrophilic surface and a coating thereon comprising a positive working photosensitive composition and an aryl alkyl polysiloxane. According to a further aspect of the invention there is provided a positive working lithographic plate precursor comprising a support having a hydrophilic surface and a coating thereon comprising a positive working, photosensitive composition and an aryl alkyl polysiloxane at least part of which aryl alkyl polysiloxane is present as a thin layer at the uppermost surface of the plate precursor
According to a further aspect of the present invention there is provided a method of preparing a positive working lithographic plate precursor of the present invention comprising coating on a support having a hydrophilic surface a coating comprising in admixture a positive working photosensitive composition and an aryl alkyl polysiloxane
A preferred aryl alkyl polysiloxane useful in the present invention is a phenyl methyl polysiloxane
Suitably the aryl alkyl polysiloxane constitutes at least 0 3%, preferably at least 1%, preferably upto 50%, more preferably upto 10% by weight of the dry coating Thus a preferred weight range for the aryl alkyl polysiloxane may be expressed as 1 - 10% of the total dry coating weight
The preferred positive working photosensitive compositions of the present invention are those comprising an o-napthoquinone diazide as the light sensitive component Most preferably these are present either as sulphonic acid esters or as carboxyhc acid esters
Examples of particularly preferred o-quinone diazide compounds are disclosed in a variety of publications such as U S Pat Nos 2,766, 118, 2,767,092, 2,772,972, 2,859, 1 12, 2,907,665, 3,046,110, 3,046, 1 1 1, 3,046, 1 15, 3,046, 1 18, 3,046, 119, 3,046, 120, 3,046, 121, 3,046, 122, 3,046, 123, 3,061,430, 3,102,809, 3, 106,465, 3,635,709 and 3,647,443 and these compounds may preferably be used in the invention Among these, particularly preferred are o-naphthoqu onediazidosulfonates or o-naphthoquinonediazido carboxylates of aromatic hydroxyl compounds, o-naphthoquinonediazidosulfonic acid amides or o-naphthoquinonediazido-carboxylic acid amides of aromatic amine compounds, for instance, esters of benzoquιnone- 1, 2-dιazιdosulfonιc acid or naphthoquιnone-1,2- diazidosulfonic acid with polyhydroxyphenyl (hereinafter the term "ester" also include partial esters); esters of naphthoquinone-1,2- diazido-4-sulfonic acid or naphthoquinone-l,2-diazido-5-sulfonic acid with pyrogallol/acetone resins; esters of benzoquinone-1,2- diazidosulfonic acid or naphthoquinone-l,2-diazidosulfonic acid with novolak type phenol/formaldehyde resins or novalak type cresol/formaldehyde resins; amides of poly(p-aminostyrene) and naphthoquinone-1, 2-diazido-4-sulfonic acid or naphthoquinone-1,2- diazido-5-sulfonic acid; esters of poly(p-hydroxystyrene) and naphthoquinone- 1,2- diazido-5-sulfonic acid; esters of polyethylene glycol with naphthoquinone-l,2-diazido-4-sulfonic acid or naphthoquinone- 1 , 2-diazido 5-sulfonic acid: amides of polymeric amines with naphthoquinone- l,2-diazido-4-sulfonic.
The preferred binder for the photosensitive composition is an alkali soluble resin. Particularly useful as the alkali soluble resins are the condensation products from the interaction between phenol, C-alkyl substituted phenols (such as cresols and /?-tert-butyl-phenoI), diphenols (such as bisphenol-A) and aldehydes (such as formaldehyde). Particularly useful in this invention are novolak resins, resole resins and novolak/resole resin mixtures.
The most preferred photosensitive composition comprises onapthoquinonediazide sulphonyl esters of a phenolic resin.
Suitably the photosensitive composition constitutes at least 50%, preferably at least 90%, preferably upto 99.7%, more preferably upto 99% by weight of the dry coating. Thus a preferred weight range for the photosensitive composition may be expressed as 90 - 99% of the total dry coating weight.
Suitable solvents for the coating solutions are, for example, the known glycol derivatives (such as 2-ethoxy ethanol and l-methoxy-propan-2-ol) and ketones (such as butanone) in common use for the manufacture of such photosensitive coatings.
The wet coated composition is dried at elevated temperatures to remove coating solvents. If drying temperature or drying time is too low then residual solvents can adversely effect the resulting developer resistance of the coating. If drying is too severe then unwanted reactions can occur in the drying film Preferably the coated compositions are dried between 100°C for 210 seconds and 130°C for 90 seconds
According to a further preferred embodiment there is provided a method of preparing a positive working lithographic plate precursor according to the present invention comprising coating on a support having a hydrophilic surface a positive working photosensitive composition and applying an additional composition comprising an aryl alkyl polysiloxane on said photosensitive layer
Suitably the aryl alkyl polysiloxane is laid down to a dry film weight of at least 0 02gm ;, preferably at least 0 05gm : , preferably upto 0 6gm 2, more preferably upto 0 4gm 2 Thus a preferred weight range for the aryl alkyl polysiloxane may be expressed as 0 05 - 0 4 gm ~ dry film weight
The aryl alkyl polysiloxane composition can be applied to the photosensitive layer by various means such as spraying Suitably the composition is coated onto the photosensitive layer
Whilst the applicants do not wish to be limited by any theoretical explanation of how their invention operates it is believed that the presence of at least part of the aryl alkyl polysiloxane at the uppermost surface of the precursor is a key factor It is believed that during the first method of the present invention at least part of the aryl alkyl polysiloxane separates out of the coating and deposits thereon Thus resistance to developer attack is manifested particularly at the surface of the coating in all precursors of the present invention Dynamic contact angle studies (using a Cahn Dynamic Contact Angle Analyser) have clearly showed a marked effect on the surface of plates prepared according to the methods of the present invention A typical positive working lithographic printing plate precursor has advancing and receding contact angles in water of approximately 95° and 48° respectively Whereas a precursor provided bv either method of the present invention comprising, for example, a phenyl methyl polysiloxane has advancing and receding contact angles in water of approximately 95J and 67° respectively A surface of the same phenyl methyl polysiloxane alone provided on the same substrate has advancing and receding contact angles in water of approximately 95° and 67° respectively Thus a surface change has been affected on the precursor which provides a surface nature similar to that of the polysiloxane coated as a single component.
The base which can be used as the support having a hydrophilic surface is preferably an aluminium plate which has undergone the usual anodic, graining and post-anodic treatments well known in the lithographic art for enabling a photosensitive composition to be coated thereon and for the surface of the support to function as a printing background.
Another base material which may be used in the method of the present invention is a plastics material base or a treated paper base as used in the photographic industry. A particularly useful plastics material base is polyethylene terephthalate which has been subbed to render its surface hydrophilic. Also a so-called resin coated paper which has been corona discharge treated can also be used.
The photosensitive compositions of the invention may contain other ingredients such as stabilising additives, colourants, colour change additives, additional polymeric binders etc. as are present in many lithographic plate compositions.
The following Examples more particularly serve to illustrate various embodiments of the present invention described hereinabove.
Materials
The following products are referred to hereinafter:
Resin A : Rutaphen LB6564 - a phenol/cresol novolak resin marketed by Bakelite, U.K.
Resin B: Rutaphen LB744 - a cresol novolak resin marketed by Bakelite, UK.
Dye A : Ethyl Violet (basic violet 4, C.I. 42600) as supplied by Aldrich Chemical Company of Gillingham, England. Dye B : Victoria Blue BO (basic blue 7, C.I. 42595) as supplied by Aldrich Chemical Company of Gillingham, England.
Siloxane A: Silikophen P50X, a solution of a phenyl methyl siloxane as supplied by Tego Chemie Service GmbH of Essen, Germany.
Siloxane B: Silikophen P70 MPA, a solution of a phenyl methyl siloxane as supplied by Tego Chemie Service GmbH of Essen, Germany.
NQD A : Dihydroxybenzophenone bis 2, 1,5 naphthoquinonediazide ester as supplied by A.H.Marks Ltd., of Bradford, England
NQD B : Diazo RO825, a naphthoquinonediazide - resin ester as supplied by Rohner AG of Pratteln, Switzerland.
Developer A: Ozasol EP 260 Developer as supplied by Agfa - Gevaert, Wiesbaden, Germany
Developer B : An aqueous developing solution Goldstar, as supplied by Horsell Graphic Industries Ltd, Leeds, UK.
Developer C : An aqueous developing solution Greenstar, as supplied by Horsell Graphic
Industries Ltd, Leeds, UK.
Developer D : An aqueous developing solution containing sodium metasilicate pentahydrate at a concentration of 10% w/w.
Developer E : An aqueous developing solution of 2.5 % w/w potassium hydroxide.
Solvent A : 2-ethoxyethanol
Solvent B : l-methoxypropan-2-ol Assessment of Plates.
Assessment 1 Coating Weight Loss in developer A
A plate was cut into a disc with an area of 100cm2 The sample was immersed in developer at a 20°C for 120 seconds, removed, placed in a beaker of water, then the plate surface wiped with a damp piece of cotton wool to remove any loose coating. The disc was rinsed with water and dried The sample was weighed then the remaining coating was removed by immersion in acetone The plate was dried once again and re-weighed The amount of coating lost in the developer, as a percentage of the original film weight was calculated using a reference film weight from a disc taken adjacently from the sample The figures quoted are the percentage of coating film weight removed by the developer Higher values indicate the more attack suffered by the coating
Assessment 2 Coating Weight Loss in developer B
This was as assessment 1 but developer B was used instead of developer A, the dwell time was 60 seconds and the temperature of the developer was 25°C
Assessment 3 Coating Weight Loss in developer B
This was as assessment 2 but the dwell time was increased to 120 seconds
Assessment 4 Coating colour difference in developer A
The colour of a plate was measured using a Minolta CR-331 Chromameter as supplied by Minolta Camera Co Ltd of Osaka, Japan The plate was then placed in a tray and developer A at 20°C poured over the plate The developer was gently agitated by moving the tray for 60 seconds The plate was removed from the tray, rinsed with water and dried The colour of the plate was then re-measured using the Chromameter The change in L value was calculated The greater the change in L value, the more coating that was lost during the development process Assessment 5 : Coating colour difference in developer A.
This was as assessment 4 but the dwell time in developer was 120 seconds.
Assessment 6 : Coating colour difference in developer D.
A plate was partly immersed in a beaker of developer D at 20°C for 1 minute, removed, rinsed and dried. The colour of the plate both where developer had met the plate and where no developer had met the plate was measured using a Chromameter. The difference in L value was calculated. The greater the change in L value, the more coating that was lost during the immersion in developer.
Assessment 7 : Coating colour difference in developer E.
This was as assessment 6 but using developer E.
Assessment 8 : Coating colour difference in developer D.
This was as assessment 6 but the immersion in developer D was for 2 minutes.
Assessment 9 • Coating colour difference in developer E.
This was as assessment 8 but using developer E.
Assessment 10 : Plate speed.
A plate was image-wise exposed using a Montakop lightframe as supplied by Siegfried Theimer GmbH, Bad Homburg, Germany, using a Stouffer control strip. The plate was then developed by pouring developer C at 20°C over the plate and wiping with cotton wool for 1 minute. The plate was then rinsed with water and dried. The readings on the control strip were recorded to determine the amount of exposure required to give a clear 3 reading on the Stouffer control strip. The results were recorded as the number of light units. Results differing less than 15% would be considered to be within experimental error.
Comparative Example Cl and Example 1
Step 1 - Preparation of formulation.
The formulations were prepared using the components described in the table below as follows: Dye A, Resin A & Resin B were each dissolved in solvent A. The appropriate amounts of each solution were combined with the other materials and the mixture stirred for 4 hours.
Step 2 - Preparation of Printing Plates
The formulations prepared in step 1 were each applied to a substrate of 0.3 mm sheet of aluminium that had been electrograined and anodised and post-anodically treated with an aqueous solution of an inorganic phosphate. The coating solutions were coated onto the substrate by means of a wire wound bar using a K303 coater as supplied by R.K. Print Coat Instruments Ltd. of Royston, England. The solution concentration was selected to provide the specified dry film compositions with a coating weight of approximately 2.0gm"2 after drying at 130 °C for 80 seconds in a Mathis Labdryer LTE oven (as supplied by Werner Mathis AG, Zurich, Switzerland) Results:
Comparative Example C2 and Examples 2 & 3.
Step 1 - Preparation of coating solution.
The formulations were prepared using the components described in the table below as follows: Resin A, Dye B and NQD B were each dissolved in solvent A. The appropriate amounts of each solution were combined and the mixture stirred for 4 hours.
Step 2 - Preparation of Printing Plates
The preparation of printing plates was as described in example 1. Results:
Comparative Example C4 and Example 4.
The procedure described above was followed but solvent A was replaced by solvent B and Siloxane A was replaced by Siloxane B.
Results:
Comparative Example C5 and Example 5.
A solution of Siloxane A was prepared at 3% w/w by adding Siloxane A to xylene and stirring. This solution was applied to an Alphapos III positive working printing plate as supplied by Horsell Graphic Industries Ltd. by means of the coating method of example I to provide a dry film weight of 0.35 gm"2. An Alphapos III plate without the Siloxane coating was used as comparative example C5.
Results:

Claims

Claims:
1 A positive working lithographic plate precursor comprising a support having a hydrophilic surface and a coating thereon comprising a positive working, photosensitive composition and an aryl alkyl polysiloxane
2 A positive working lithographic plate precursor according to claim 1 wherein at least part of said aryl alkyl polysiloxane is present as a thin layer at the uppermost surface of the plate precursor
3 A method of preparing a positive working lithographic plate precursor according to any preceding claim comprising coating on a support having a hydrophilic surface a coating comprising in admixture a positive working photosensitive composition and an aryl alkyl polysiloxane
4 A positive working lithographic plate precursor according to claim 1 wherein the aryl alkyl polysiloxane is a phenyl methyl polysiloxane
5 A method according to claim 3 wherein the aryl alkyl polysiloxane comprises 0 3 to
50% by weight of the dry coating weight
6 A method according to claim 3 wherein the aryl alkyl polysiloxane comprises 1 to 10% by weight of the dry coating weight
7 A positive working lithographic plate precursor according to claim 1 wherein the positive working photosensitive composition comprises an o-napthoquinonediazide component
8 A positive working lithographic plate precursor according to 7 wherein the onapthoquinonediazide component comprises a sulphonyl ester or a carboxylic acid ester
9. A positive working lithographic plate precursor according to claim 1 wherein the positive working photosensitive composition comprises an alkali soluble resin.
10. A positive working lithographic plate precursor according to claim 9 wherein the positive working photosensitive composition comprises a phenolic resin.
5 1 1. A positive working lithographic plate precursor according to claim 7 wherein the onapthoquinonediazide comprises a sulphonyl ester of a phenolic resin.
12. A method according to claim 3 wherein the photosensitive composition comprises 90 to 99% of the dry coating weight.
13. A method of preparing a positive working lithographic plate precursor according to 10 claim 1 comprising coating on a support having a hydrophilic surface a positive working photosensitive composition and applying an additional composition comprising an aryl alkyl polysiloxane on said photosensitive layer.
14. A method according to claim 13 wherein the aryl alkyl polysiloxane comprises a dry film weight of 0.02 to 0.6 gm'2.
15 15. A precursor or a method according to any preceding claim wherein the support having a hydrophilic surface comprises a treated aluminium plate.
EP97910522A 1996-10-31 1997-10-28 Direct positive lithographic plate Expired - Lifetime EP0935778B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB9622657.6A GB9622657D0 (en) 1996-10-31 1996-10-31 Direct positive lithographic plate
GB9622657 1996-10-31
PCT/GB1997/002962 WO1998019219A1 (en) 1996-10-31 1997-10-28 Direct positive lithographic plate

Related Child Applications (1)

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EP10185188.9 Division-Into 2010-10-01

Publications (2)

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EP0935778A1 true EP0935778A1 (en) 1999-08-18
EP0935778B1 EP0935778B1 (en) 2011-02-23

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US (1) US6420087B1 (en)
EP (1) EP0935778B1 (en)
JP (1) JP2001503872A (en)
DE (1) DE69740131D1 (en)
GB (1) GB9622657D0 (en)
WO (1) WO1998019219A1 (en)

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BRPI0611018B1 (en) * 2005-06-03 2017-03-07 American Dye Source Inc thermally reactive near-infrared absorption acetal copolymers, preparation methods and methods of use
US8932398B2 (en) 2009-10-29 2015-01-13 Mylan Group Gallotannic compounds for lithographic printing plate coating compositions

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JP2001503872A (en) 2001-03-21
GB9622657D0 (en) 1997-01-08
DE69740131D1 (en) 2011-04-07
WO1998019219A1 (en) 1998-05-07
EP0935778B1 (en) 2011-02-23
US6420087B1 (en) 2002-07-16

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