JPH0340380B2 - - Google Patents
Info
- Publication number
- JPH0340380B2 JPH0340380B2 JP19455282A JP19455282A JPH0340380B2 JP H0340380 B2 JPH0340380 B2 JP H0340380B2 JP 19455282 A JP19455282 A JP 19455282A JP 19455282 A JP19455282 A JP 19455282A JP H0340380 B2 JPH0340380 B2 JP H0340380B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- printing plate
- lithographic printing
- same manner
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000001875 compounds Chemical class 0.000 claims description 31
- 239000000203 mixture Substances 0.000 claims description 27
- 229920000642 polymer Polymers 0.000 claims description 13
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 239000007859 condensation product Substances 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 150000003461 sulfonyl halides Chemical class 0.000 claims description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 24
- 229920005989 resin Polymers 0.000 description 23
- 239000011347 resin Substances 0.000 description 23
- 239000000243 solution Substances 0.000 description 21
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 20
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 17
- 238000003786 synthesis reaction Methods 0.000 description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 16
- 229910052782 aluminium Inorganic materials 0.000 description 16
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- 239000000975 dye Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- -1 quinonediazide compound Chemical class 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 229960001755 resorcinol Drugs 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 4
- NTDQQZYCCIDJRK-UHFFFAOYSA-N 4-octylphenol Chemical compound CCCCCCCCC1=CC=C(O)C=C1 NTDQQZYCCIDJRK-UHFFFAOYSA-N 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 description 3
- HAGVXVSNIARVIZ-UHFFFAOYSA-N 4-chlorosulfonyl-2-diazonionaphthalen-1-olate Chemical compound C1=CC=C2C([O-])=C([N+]#N)C=C(S(Cl)(=O)=O)C2=C1 HAGVXVSNIARVIZ-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 206010012442 Dermatitis contact Diseases 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 3
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- RSWGJHLUYNHPMX-ONCXSQPRSA-N abietic acid Chemical compound C([C@@H]12)CC(C(C)C)=CC1=CC[C@@H]1[C@]2(C)CCC[C@@]1(C)C(O)=O RSWGJHLUYNHPMX-ONCXSQPRSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 238000001226 reprecipitation Methods 0.000 description 2
- 235000019795 sodium metasilicate Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 2
- 238000002211 ultraviolet spectrum Methods 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- DGXAGETVRDOQFP-UHFFFAOYSA-N 2,6-dihydroxybenzaldehyde Chemical compound OC1=CC=CC(O)=C1C=O DGXAGETVRDOQFP-UHFFFAOYSA-N 0.000 description 1
- JYXJUIJEYIELLT-UHFFFAOYSA-N 2-(2,6-dihydroxyphenyl)acetaldehyde Chemical compound OC1=CC=CC(O)=C1CC=O JYXJUIJEYIELLT-UHFFFAOYSA-N 0.000 description 1
- XBYTTXAEDHUVAH-UHFFFAOYSA-N 2-(4-butoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OCCCC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 XBYTTXAEDHUVAH-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- RGDDVTHQUAQTIE-UHFFFAOYSA-N 2-pentadecylphenol Chemical compound CCCCCCCCCCCCCCCC1=CC=CC=C1O RGDDVTHQUAQTIE-UHFFFAOYSA-N 0.000 description 1
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Polymers OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 1
- PTFIPECGHSYQNR-UHFFFAOYSA-N 3-Pentadecylphenol Chemical compound CCCCCCCCCCCCCCCC1=CC=CC(O)=C1 PTFIPECGHSYQNR-UHFFFAOYSA-N 0.000 description 1
- CXJAFLQWMOMYOW-UHFFFAOYSA-N 3-chlorofuran-2,5-dione Chemical compound ClC1=CC(=O)OC1=O CXJAFLQWMOMYOW-UHFFFAOYSA-N 0.000 description 1
- QZYCWJVSPFQUQC-UHFFFAOYSA-N 3-phenylfuran-2,5-dione Chemical compound O=C1OC(=O)C(C=2C=CC=CC=2)=C1 QZYCWJVSPFQUQC-UHFFFAOYSA-N 0.000 description 1
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 description 1
- DZQQBMOSBPOYFX-UHFFFAOYSA-N 5-chlorosulfonyl-2-diazonionaphthalen-1-olate Chemical compound C1=CC=C2C([O-])=C([N+]#N)C=CC2=C1S(Cl)(=O)=O DZQQBMOSBPOYFX-UHFFFAOYSA-N 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 239000004135 Bone phosphate Substances 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- 241000978776 Senegalia senegal Species 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- 239000000981 basic dye Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 229940061607 dibasic sodium phosphate Drugs 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- ZLSPCFYPYRYKNF-UHFFFAOYSA-N formaldehyde;4-octylphenol Chemical compound O=C.CCCCCCCCC1=CC=C(O)C=C1 ZLSPCFYPYRYKNF-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- RCHKEJKUUXXBSM-UHFFFAOYSA-N n-benzyl-2-(3-formylindol-1-yl)acetamide Chemical compound C12=CC=CC=C2C(C=O)=CN1CC(=O)NCC1=CC=CC=C1 RCHKEJKUUXXBSM-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- WBHQBSYUUJJSRZ-UHFFFAOYSA-M sodium bisulfate Chemical compound [Na+].OS([O-])(=O)=O WBHQBSYUUJJSRZ-UHFFFAOYSA-M 0.000 description 1
- 229910000342 sodium bisulfate Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- VKFFEYLSKIYTSJ-UHFFFAOYSA-N tetraazanium;phosphonato phosphate Chemical compound [NH4+].[NH4+].[NH4+].[NH4+].[O-]P([O-])(=O)OP([O-])([O-])=O VKFFEYLSKIYTSJ-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 1
- 125000004953 trihalomethyl group Chemical group 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
Description
本発明は平版印刷版の製造に適する感光性組成
物に関するものである。更に詳しくはo−キノン
ジアジド化合物とアルカリ可溶性の高分子化合物
からなる感光性組成物に関するものである。平版
印刷は水と油とが本質的に混り合わない性質を巧
みに利用した印刷方式であり、印刷版面は水を受
容して油性インキを反撥する領域と水を反撥して
油性インキを受容する性質が要求され、このよう
な性質が強いもの程良質の印刷物が作り易い。従
来かかる性質を良化せしめるため露光後の製版工
程において画像表面に現像インキを塗つてインキ
受容性(感脂性)を改善する方式が行われてき
た。しかしその方法は製版工程を複雑にし現像イ
ンキで被覆するため時間と手数がかかつた。
この目的のためにo−キノンジアジド化合物を
含有する感光性組成物中に置換フエノールアルデ
ヒド樹脂を特にターシヤーリーブチルフエノー
ル・ホルムアルデヒド樹脂を添加する方法が特開
昭50−125806号明細書に示された。ターシヤーリ
ーブチルフエノール・ホルムアルデヒド樹脂を添
加することによつてたしかに無添加の場合と比較
して画像部の感脂性は向上したが反面現像後の非
画像部に感光性組成物の一部が残り易くなつた。
特に脱脂綿、スポンジ等に、現像液をしみ込ませ
印刷版をこすつて現像する場合は非画像部に部分
的に感光性組成物が残り、外観をそこねるばかり
ではなく、しばしばスカミングが発生した。かか
る欠点を解決する方法として特開昭50−36206号
公報にターシヤリーブチルフエノール・ホルムア
ルデヒド樹脂等のアルカリ水溶液に不溶の樹脂と
o−キノンジアジドのスルホニルクロライドとを
縮合させて得られる感光性樹脂を用いる方法が提
案された。しかしながら、o−キノンジアジドの
スルホニルクロライドと縮合させる樹脂がアルカ
リ水溶液に不溶のため、感度が低下する等の問題
があつた。
従つて本発明の目的はインキ受容性(感脂性)
の富んだ画像を与える感光性組成物を提供するこ
とである。本発明の他の目的は、感度が高く、現
像後、非画像部に感光性組成物が残りにくく、ス
カミングの生じにくい感光性組成物を提供するこ
とである。
本発明者らは、上記目的を達成するため、種々
研究を重ねた結果、o−キノンジアジドのスルホ
ニルクロライドの如きスルホニルハライドと下記
一般式()で示される構造を有する高分子化合
物との縮合生成物を含有することを特徴とする感
光性組成物が上記の目的を達成することを見出し
た。
(式中、R1,R2は各々水素原子又は炭素数1
〜4個の低級アルキル基、R3は炭素数4〜15の
アルキル基又は炭素数4〜15のシクロアルキル
基、R4,R5は各々、水素原子、炭素数1〜3個
の低級アルキル基又はハロゲン原子を示し、xは
10〜90モル%を示す。)
一般式()で示される高分子化合物は、
で示される構成成分のため現像液(アルカリ水溶
液)に溶解するので本発明は特開昭50−36206号
公報の発明とは本質的に異なる。また、特公昭49
−24361号公報にはフエノール、クレゾールおよ
びキシレノールの中から選ばれた低級フエノール
の少くとも一種と、一般式
The present invention relates to a photosensitive composition suitable for producing lithographic printing plates. More specifically, the present invention relates to a photosensitive composition comprising an o-quinonediazide compound and an alkali-soluble polymer compound. Lithographic printing is a printing method that skillfully takes advantage of the property that water and oil essentially do not mix.The printing plate surface has two areas: one area that accepts water and repels oil-based ink, and the other area that repels water and accepts oil-based ink. The stronger these properties are, the easier it is to produce high-quality printed matter. Conventionally, in order to improve these properties, a method has been used in which developing ink is applied to the image surface in the plate-making process after exposure to improve ink receptivity (oil sensitivity). However, this method complicated the plate-making process and required time and effort since the plate was coated with developing ink. For this purpose, a method of adding a substituted phenolic aldehyde resin, particularly a tertiary-butylphenol formaldehyde resin, to a photosensitive composition containing an o-quinonediazide compound was disclosed in JP-A-50-125806. The addition of tertiary butylphenol formaldehyde resin certainly improves the oil sensitivity of the image area compared to the case without the addition, but on the other hand, a portion of the photosensitive composition tends to remain in the non-image area after development. Summer.
In particular, when absorbent cotton, sponge, etc. are soaked with a developer and developed by rubbing the printing plate, the photosensitive composition remains partially in the non-image area, which not only spoils the appearance but also often causes scumming. As a method for solving this problem, Japanese Patent Application Laid-open No. 50-36206 discloses the use of a photosensitive resin obtained by condensing a resin insoluble in an alkaline aqueous solution such as a tertiary butylphenol formaldehyde resin with a sulfonyl chloride of o-quinonediazide. A method was proposed. However, since the resin to be condensed with the sulfonyl chloride of o-quinonediazide is insoluble in the alkaline aqueous solution, there were problems such as a decrease in sensitivity. Therefore, the object of the present invention is to improve ink receptivity (oil sensitivity).
An object of the present invention is to provide a photosensitive composition that provides an image rich in color. Another object of the present invention is to provide a photosensitive composition that has high sensitivity, does not easily leave the photosensitive composition in non-image areas after development, and is unlikely to cause scumming. In order to achieve the above object, the present inventors have conducted various studies and found that a condensation product of a sulfonyl halide such as the sulfonyl chloride of o-quinonediazide and a polymer compound having a structure represented by the following general formula () It has been found that a photosensitive composition characterized by containing the above objects achieves the above object. (In the formula, R 1 and R 2 are each a hydrogen atom or a carbon number 1
~4 lower alkyl groups, R 3 is an alkyl group having 4 to 15 carbon atoms or a cycloalkyl group having 4 to 15 carbon atoms, R 4 and R 5 are each a hydrogen atom, lower alkyl having 1 to 3 carbon atoms represents a group or a halogen atom, x is
Shows 10-90 mol%. ) The polymer compound represented by the general formula () is The present invention is essentially different from the invention disclosed in JP-A-50-36206 because the constituent components represented by are soluble in a developer (alkaline aqueous solution). Also, special public service in 1977
-24361 Publication describes at least one type of lower phenol selected from phenol, cresol and xylenol, and the general formula
【式】(式
中、Rは10〜20の炭化水素基)で表わされる高級
フエノールの少くとも一種とホルムアルデヒドと
の共縮合物にキノンジアジド化合物を反応させて
得た感光性樹脂が開示されている。しかしながら
該発明は同一ベンゼン環に2つ水酸基を有する多
価フエノール類についた炭化水素基が、高級(炭
素数10〜20)である所に特徴があり、本発明は同
一ベンゼン環に1つ水酸基を有するフエノール類
に比較的高級な炭化水素基がある所に特徴があ
る。その上両発明の目的とする所も異なつている
ので本質的に両発明は異なつたものといえる。
一般式()においてR1,R2は各々水素原子
又は炭素数1〜4個の低級アルキル基であり、好
ましくは水素原子、メチル基、エチル基、より好
ましくは水素原子である。R3は炭素数4〜15の
アルキル基又は炭素数4〜15のシクロアルキル基
であり、好ましい例としてターシヤリーブチル
基、ターシヤリーオクチル基、ノルマルオクチル
基、シクロヘキシル基、ペンタデシル基等が挙げ
られる。R4,R5は、水素原子、炭素数1〜3個
の低級アルキル基又はハロゲン原子であり、好ま
しくは、メチル基、エチル基、塩素原子、水素原
子であるが、より好ましくは、水素原子である。
xは10〜90モル%であり、好ましくは20〜70モル
%である。また一般式()で示される高分子化
合物の分子量は本発明の目的とする使途に有効に
供するためには分子量が約500〜10000のものが使
用可能であるが好ましくは約800〜4000のものが
適当である。
本発明における一般式()で示される高分子
化合物はつぎのようにして合成される。すなわ
ち、レゾルシンと、4−ターシヤリーブチルフエ
ノール、4−ノルマルオクチルフエノール、4−
ペンタデシルフエノール等のフエノール類をモル
比で1対9から9対1の比率で混合したものとホ
ルムアルデヒド、アセトン、アセトアルデヒド、
メチルエチルケトン等のアルデヒドケトン類を単
独もしくはアルコール、ジオキサン等の溶媒に溶
解し、塩酸、しゆう酸等の酸または水酸化ナトリ
ウム・アンモニア水等のアルカリを触媒として、
アルデヒド又はケトン類の量をレゾルシンとフエ
ノール類の混合物1モル部に対し0.85〜1.0モル
部を用いて縮合させることにより目的の高分子化
合物が得られる。この際フエノール類及びアルデ
ヒド・ケトン類は相互に組合せ自由であり、さら
に2種以上を混ぜて共縮合させても良い。
本発明に使用されるo−キノンジアジドのスル
ホニルクロライド化合物としては、例えば1,2
−ベンゾキノン−2−ジアジド−4−スルホニル
クロライド、1,2−ナフトキノン−2−ジアジ
ド−4−スルホニルクロライド、1,2−ナフト
キノン−2−ジアジド−5−スルホニルクロライ
ドなどがある。
o−キノンジアジドのスルホニルクロライドの
如きスルホニルハライドと前記一般式()で示
される高分子化合物との縮合生成物は次のように
して合成される。すなわち、o−キノンジアジド
の例えばスルホニルクロライドと該高分子化合物
とを、ジオキサン、メチルエチルケトン、テトラ
ヒドロフラン、ジメチルホルムアミド(DMF)
等のような溶剤に溶解し、室温あるいは40〜50℃
に加熱撹拌下、炭酸ナトリウム等のアルカリを加
えることによつて容易にエステル化される。一般
式()で表わされる高分子化合物に対する酸ク
ロライドの反応比率は重量比で1:0.1〜1:2
の割合のものが使用可能であるが、最適の比率は
1:0.3〜1:1である。本発明におけるo−キ
ノンジアジド化合物と一般式()で示される高
分子化合物との縮合生成物の代表的な合成例を示
す。
合成例 1
レゾルシン110g、p−n−オクチルフエノー
ル206gを1,4−ジオキサン500mlに溶解し、こ
れに37%ホルマリン162gを撹拌しながら添加し
た。更に触媒として5N塩酸1mlを加え、突沸し
ないように注意しながらゆるやかに加熱還流させ
た。5時間後、反応混合物を冷水3に投入し析
出した淡黄色樹脂を別、乾燥した結果、306g
が得られた。光散乱法により、この樹脂の分子量
を測定したところ約2200であつた。
この樹脂17gをメチルエチルケトン/DMF
(5/1)60mlに溶解させ、別途用意した1,2
−ナフトキノン−2−ジアジド−5−スルホニル
クロライド17gのメチルエチルケトン/DMF
(5/1)90ml溶液に添加した。1時間室温にて
撹拌した後トリエチルアミンを6.4g滴下し、更
に水5mlを加え、トリエチルアミンにて反応系の
PHを6.0〜6.5に調整した。この反応溶液を撹拌し
ながら、冷水1.2に投入し、析出した黄色粉末
を取した。再沈にて精製した後、乾燥した結
果、27gが得られた。UVスペクトルより算出し
た樹脂の単位骨格当りのエステル化率は44%であ
つた。
合成例 2
レゾルシン132g、m−ペンタデシルフエノー
ル243gを1,4−ジオキサン500mlに溶解し、こ
れに37%ホルマリン162gを撹拌しながら添加し
た。更に触媒として5N塩酸1mlを加え、突沸し
ないように注意しながらゆるやかに加熱還流させ
た。5時間後、反応混合物を冷水3に投入し析
出した淡黄色樹脂を別、乾燥した結果、310g
が得られた。光散乱法によりこの樹脂の分子量を
測定したところ約1500であつた。
この樹脂20gをメチルエチルケトン/DMF
(5/1)60mlに溶解させ、別途用意した1,2
−ナフトキノン−2−ジアジド−5−スルホニル
クロライド20gのメチルエチルケトン/DMF
(5/1)90ml溶液に添加した。1時間、室温に
て撹拌した後、トリエチルアミンを7.5g滴下し、
更に水5mlを加え、トリエチルアミンにて反応系
のPHを6.0〜6.5に調整した。この反応溶液を撹拌
しながら、冷水1.2に投入し、析出した黄色粉
末を取した。再沈にて精製した後、乾燥した結
果31gが得られた。UVスペクトルより算出した
樹脂の単位骨格当りのエステル化率は52%であつ
た。
本発明におけるo−キノンジアジド化合物の感
光性組成物中に占める量は0.1〜50重量%でより
好ましくは0.5〜20重量%であり最も好ましくは
0.5〜5重量%である。
本発明の感光性組成物中には感光性成分として
本発明におけるo−キノンジアジド化合物だけを
用いても良いが、公知のo−ナフトキノンジアジ
ド化合物とともに用いた方が好ましい。
公知のo−ナフトキノンジアジド化合物として
は、特公昭43−28403号公報に記載されている1,
2−ナフトキノン−2−ジアジド−5−スルホニ
ルクロライドとピロガロール−アセトン樹脂との
エステルであるものが最も好ましい。その他の好
適な公知のオルトキノンジアジド化合物として
は、米国特許第3046120号および同第3188210号明
細書中に記載されている1,2−ジアゾナフトキ
ノンスルホン酸クロライドとフエノール−ホルム
アルデヒド樹脂とのエステルがある。その他本発
明に使用できる公知のo−ナフトキノンジアジド
化合物としては、特開昭47−5303号、同昭48−
63802号、同昭48−63803号、同昭48−96575号、
同昭49−38701号、同昭48−13354号、特公昭41−
11222号、同昭45−9610号、同昭49−17481号など
の各公報、米国特許第2797213号、同第3454400
号、同第3544323号、同第3573917号、同第
3674495号、同第3785825号、英国特許第1227602
号、同第1251345号、同第1267005号、同第
1329888号、同第1330932号、ドイツ特許第854890
号などの各明細書中に記載されているものをあげ
ることができる。
本発明の感光性組成物中に占めるo−キノンジ
アジド化合物の量は公知のものと、本発明におけ
るものとの合計で10〜50重量%でより好ましくは
20〜40重量%である。
本発明の組成物中には、フエノールホルムアル
デヒド樹脂、クレゾールホルムアルデヒド樹脂、
フエノール変性キシレン樹脂、ポリヒドロキシス
チレン、ポリハロゲン化ヒドロキシスチレン等、
公知のアルカリ可溶性の高分子化合物を含有させ
ることができる。かかるアルカリ可溶性の高分子
化合物は全組成物の90重量%以下の添加量で用い
られる。
本発明の組成物中には、感度を高めるために環
状酸無水物、露光後直ちに可視像を得るための焼
出し剤、画像着色剤として染料やその他のフイラ
ーなどを加えることができる。環状酸無水物とし
ては米国特許第4115128号明細書に記載されてい
るように無水フタル酸、テトラヒドロ無水フタル
酸、ヘキサヒドロ無水フタル酸、3,6−エンド
オキシ−Δ4−テトラヒドロ無水フタル酸、テト
ラクロル無水フタル酸、無水マレイン酸、クロル
無水マレイン酸、α−フエニル無水マレイン酸、
無水コハク酸、ピロメリツト酸等がある。これら
の環状酸無水物を全組成物中の1から15重量%含
有させることによつて感度を最大3倍程度に高め
ることができる。露光後直ちに可視像を得るため
の焼出し剤としては露光によつて酸を放出する感
光性化合物と塩を形成し得る有機染料の組合せを
代表としてあげることができる。具体的には特開
昭50−36209号公報、特開昭53−8128号公報に記
載されているo−ナフトキノンジアジド−4−ス
ルホン酸ハロゲニドと塩形成性有機染料の組合せ
や特開昭53−36223号公報、特開昭54−74728号公
報に記載されているトリハロメチル化合物と塩形
成性有機染料の組合せをあげることができる。画
像の着色剤として前記の塩形成性有機染料以外に
他の染料も用いることができる。塩形成性有機染
料を含めて好適な染料として油溶性染料および塩
基染料をあげることができる。具体的には、オイ
ルイエロー#101、オイルイエロー#130、オイル
ピンク#312、オイルグリーンBG、オイルブル
ーBOS、オイルブルー#603、オイルブラツク
BY、オイルブラツクBS、オイルブラツクT−
505(以上、オリエント化学工業株式会社製)、ク
リスタルバイオレツト(CI 42555)、メチルバイ
オレツト(CI42535)、ローダミンB(CI45170B)、
マラカイトグリーン(CI 42000)、メチレンブル
ー(CI 52015)などをあげることができる。
本発明の組成物は、上記各成分を溶解する溶媒
に溶かして支持体上に塗布する。ここで使用する
溶媒としては、エチレンジクロライド、シクロヘ
キサノン、メチルエチルケトン、エチレングリコ
ールモノメチルエーテル、エチレングリコールモ
ノエチルエーテル、2−メトキシエチルアセテー
ト、トルエン、酢酸エチルなどがあり、これらの
溶媒を単独あるいは混合して使用する。そして、
上記成分中の濃度(固形分)は、2〜50重量%で
ある。また、塗布量は用途により異なるが、例え
ば感光性平版印刷版についていえば一般的に固形
分として0.5〜3.0g/m2が好ましい。塗布量が少
なくなるにつれ感光性は大になるが、感光膜の物
性は低下する。
本発明の感光性組成物を用いて平版印刷版を製
造する場合、その支持体としては、親水化処理し
たアルミニウム板、たとえばシリケート処理アル
ミニウム板、陽極酸化アルミニウム板、砂目立て
したアルミニウム板、シリケート電着したアルミ
ニウム板があり、その他亜鉛板、ステンレス板、
クローム処理鋼板、親水化処理したプラスチツク
フイルムや紙を上げることができる。
本発明の感光性組成物にたいする現像液として
は、珪酸ナトリウム、珪酸カリウム、水酸化ナト
リウム、水酸化カリウム、水酸化リチウム、第三
リン酸ナトリウム、第二リン酸ナトリウム、第三
リン酸アンモニウム、第二リン酸アンモニウム、
メタ珪酸ナトリウム、重炭酸ナトリウム、アンモ
ニア水などのような無機アルカリ剤の水溶液が適
当であり、それらの濃度が0.1〜10重量%、好ま
しくは0.5〜5重量%になるように添加される。
また、該アルカリ性水溶液には、必要に応じ界
面活性剤やアルコールなどのような有機溶媒を加
えることもできる。
つぎに、実施例をあげて本発明をさらに詳細に
説明する。なお、下記実施例におけるパーセント
は、他に指定のない限り、すべて重量%である。
実施例 1
厚さ0.24mmの2Sアルミニウム板を80℃に保つた
第3燐酸ナトリウムの10%水溶液に3分間浸漬し
て脱脂し、ナイロンブラシで砂目立てした後アル
ミン酸ナトリウムで約10秒間エツチングして、硫
酸水素ナトリウム3%水溶液でデスマツト処理を
行つた。このアルミニウム板を20%硫酸中で電流
密度2A/dにおいて2分間陽極酸化を行いア
ルミニウム板()を作製した。
このアルミニウム板()に次の感光液〔A〕
を塗布し、100℃で2分間乾燥して、感光性平版
印刷版〔A〕を作製した。
感光液 〔A〕
1,2−ナフトキノン−2−ジアジド−5−ス
ルホニルクロライドとクレゾール−ホルムアル
デヒド樹脂とのエステル化物 0.80g
合成例1で得られた化合物 0.10g
クレゾール−ホルムアルデヒド樹脂 1.9g
油溶性染料(CI42595) 0.04g
1,2−ナフトキノン−2−ジアジド−4−ス
ルホニルクロライド 0.02g
メチルセロソルブ 20g
メチルエチルケトン 20g
感光性平版印刷版〔A〕の塗布重量は2.5g/
m2であつた。この感光性平版印刷版〔A〕の感光
層上に線画および網点画像のポジ透明原画を密着
して、30アンペアのカーボンアーク灯で70cmの距
離から露光を行なつた。
露光された感光性平版印刷版〔A〕を4%メタ
ケイ酸ナトリウム水溶液を含ませたスポンジでこ
すつて現像した所、非画像部は、きれいに感光層
が除去された。水洗後、14゜Be′アラビアガム溶液
を版面に塗布しバフドライした。3日置版後、平
版印刷機に取付け印刷機の始動と同時に給紙を開
始して印刷した所、5〜6枚目でインキは画像部
に完全に着肉し、汚れのない良好な印刷物が得ら
れた。
比較例 1
実施例1の感光液〔A〕で「合成例1で得られ
た化合物」のかわりにp−n−オクチルフエノー
ルホルムアルデヒド樹脂を用いた感光液〔B〕を
実施例1と同様な方法でアルミニウム板(I)上
に塗布し、感光性平版印刷版〔B〕を作製した。
この感光性平版印刷版〔B〕は実施例1と同様
な方法で露光、現像を行うと非画像部にむらにな
つて感光層の一部が残つた。
実施例1と同様な方法で印刷した所、感光性平
版印刷版〔A〕と同等のインキ着肉性を示したが
印刷物の非画像部の一部に汚れが生じた。
比較例 2
実施例1の感光液〔A〕で、「合成例1で得ら
れた化合物」を除き、「1,2−ナフトキノン−
2−ジアジド−5−スルホニルクロライドとクレ
ゾール−ホルムアルデヒド樹脂とのエステル化
物」を0.80gから0.90gにした感光液〔C〕を実
施例1と同様な方法でアルミニウム板(I)上に
塗布し、感光性平版印刷版〔C〕を作製した。
この感光性平版印刷版〔C〕を実施例1と同様
に製版、印刷を行つた所、刷り出しから20〜30枚
目でようやく画像部にインキが完全に着肉した。
比較例 3
実施例1の感光液〔A〕で「合成例1で得られ
た化合物」のかわりに「p−n−オクチルフエノ
ールホルムアルデヒド樹脂と、1,2−ナフトキ
ノン−2−ジアジド−5−スルホニルクロライド
とのエステル化物」を用いた感光液〔D〕を実施
例1と同様な方法でアルミニウム板(I)上に塗
布し、感光性平版印刷版〔D〕を作製した。
この感光性平版印刷版〔D〕は実施例1と同様
な方法で露光現像を行うと非画像部に感光層の一
部が残り、若干のむらが生じた。また、この感光
性平版印刷版〔D〕は、実施例1の感光性平版印
刷版〔A〕と同等の調子再現性を得ようとする
と、感光性平版印刷版〔A〕の露光時間の1.2倍
の露光時間を必要とした。
比較例 4
実施例1の感光液〔A〕で「合成例1で得られ
た化合物」のかわりに特開昭56−1045号公報の比
較例2に記載されている。「1,2−ナフトキノ
ン−2−ジアジド−5−スルホニルクロライドと
レゾルシン−アセトアルデヒド樹脂との縮合生成
物」を用いた感光液〔E〕および特開昭56−1044
号公報の比較例2に記載されている「1,2−ナ
フトキノン−2−ジアジド−5−スルホニルクロ
ライドとレゾルシン−ホルムアルデヒド樹脂との
縮合生成物」を用いた感光液〔F〕を実施例1と
同様に塗布しそれぞれ感光性平版印刷版〔E〕お
よび〔F〕を作製した。
これらの感光性平版印刷版〔E〕および〔F〕
を実施例1と同様に製版、印刷を行つた所、刷り
出しから、15〜20枚でようやく画像部にインキが
完全に着肉した。
比較例 5
実施例1における「合成例1で得られた化合
物」は、合成例1で示されているようにレゾルシ
ンとp−n−オクチルフエノールを等モル使用し
て合成される。レゾルシンとp−n−オクチルフ
エノールをモル比で5対95使用し、合成例1と同
様にして合成した化合物〔a〕および同様にモル
比で95対5使用して合成した化合物〔b〕を実施
例1の感光液〔A〕で「合成例1で得られた化合
物」のかわりに用いた感光液〔G〕および〔H〕
を実施例1と同様に塗布し、それぞれ感光性平版
印刷版〔G〕および〔H〕を作製した。
感光性平版印刷版〔G〕は実施例1と同様な方
法で露光、現像を行うと比較例2と同様に非画像
部にむらになつて感光層の一部が残つた。一方感
光性平版印刷版〔H〕は実施例1と同様な方法で
露光、現像を行つても非画像部のむらは生じなか
つたが実施例1と同様に印刷を行なつた所、着肉
性が悪く15〜20枚でようやく画像部にインキが完
全に着肉した。
実施例 2
実施例1のアルミニウム板(I)に次の感光液
〔I〕を塗布し、100℃で2分間乾燥して感光性平
版印刷版〔I〕を作製した。
感光液 〔I〕
1,2−ナフトキノン−2−ジアジド−5−ス
ルホニルクロライドとピロガロール−アセトン
樹脂とのエステル化物 0.80g
(米国特許第3635709号明細書実施例1に記載
されているもの)
合成例2で得られた化合物 0.10g
クレゾールホルムアルデヒド樹脂 1.9g
油溶性染料(CI 42595) 0.03g
無水フタル酸 0.2g
2−(p−ブトキシフエニル)−4,6−ビス
(トリクロルメチル)−s−トリアジン 0.02g
1,2−ナフトキノン−2−ジアジド−4−ス
ルホニルクロライド 0.02g
エチレンジクロライド 15g
メチルセロソルブ 8g
感光性平版印刷物〔I〕の塗布重量は2.5g/
m2であつた。この感光性平版印刷版〔I〕を実施
例1と同様に露光、現像した所、非画像部はきれ
いに感光層が除去された。実施例1と同様な方法
でガム引きし印刷した所、刷り出しから、4〜5
枚目でインキは画像部に完全に着肉し、汚れのな
い良好な印刷物が得られた。
比較例 6
実施例2の感光液〔I〕で「合成例2で得られ
た化合物」のかわりに、m−ペンタデシルフエノ
ール−ホルムアルデヒド樹脂を用いた感光液
〔J〕を実施例1と同様な方法でアルミニウム板
(I)上に塗布し、感光性平版印刷版〔J〕を作
製した。
この感光性平版印刷版〔J〕は実施例1と同様
な方法で、露光、現像を行うと非画像部にむらに
なつて感光層の一部が残つた。実施例1と同様な
方法で印刷した所、感光性平版印刷版〔I〕と同
等のインキ着肉性を示したが、印刷物の非画像部
の一部に汚れが生じた。
比較例 7
実施例2の感光液〔I〕で「合成例2で得られ
た化合物」を除き、「1,2−ナフトキノン−2
−ジアジド−5−スルホニルクロライドとピロガ
ロール−アセトン樹脂とのエステル化物」を0.80
gから0.90gにした感光液〔K〕を実施例1と同
様な方法でアルミニウム板(I)上に塗布し、感
光性平版印刷版〔K〕を作製した。
この感光性平版印刷版〔K〕を実施例1と同様
に製版、印刷を行つた所、刷り出しから、15〜20
枚でようやく画像部にインキが完全に着肉した。
比較例 8
実施例2の感光液〔I〕で「合成例2で得られ
た化合物」のかわりに、「m−ペンタジエンフエ
ノールホルムアルデヒド樹脂と1,2−ナフトキ
ノン−2−ジアジド−5−スルホニルクロライド
とのエステル化物」を用いた感光液〔L〕を実施
例1と同様な方法でアルミニウム板(I)上に塗
布し、感光性平版印刷版〔L〕を作製した。
この感光性平版印刷版〔L〕は、実施例1と同
様な方法で露光、現像を行うと非画像部に感光層
の一部が残り、若干のむらが生じた。また、この
感光性平版印刷版〔L〕は、実施例2の感光性平
版印刷版〔I〕と同等の調子再現性を得ようとす
ると感光性平版印刷版〔I〕の露光時間の1.2倍
の露光時間を必要とした。Disclosed is a photosensitive resin obtained by reacting a quinonediazide compound with a co-condensate of at least one higher phenol represented by the formula [Formula] (wherein R is a 10-20 hydrocarbon group) and formaldehyde. . However, the invention is characterized in that the hydrocarbon group attached to the polyhydric phenol having two hydroxyl groups on the same benzene ring is higher (10 to 20 carbon atoms); The phenols have a relatively high-grade hydrocarbon group. Furthermore, since the objectives of the two inventions are also different, it can be said that the two inventions are essentially different. In the general formula (), R 1 and R 2 each represent a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, preferably a hydrogen atom, a methyl group, or an ethyl group, and more preferably a hydrogen atom. R 3 is an alkyl group having 4 to 15 carbon atoms or a cycloalkyl group having 4 to 15 carbon atoms, and preferred examples thereof include tertiary butyl group, tertiary octyl group, normal octyl group, cyclohexyl group, pentadecyl group, etc. . R 4 and R 5 are a hydrogen atom, a lower alkyl group having 1 to 3 carbon atoms, or a halogen atom, preferably a methyl group, an ethyl group, a chlorine atom, or a hydrogen atom, and more preferably a hydrogen atom. It is.
x is 10 to 90 mol%, preferably 20 to 70 mol%. In addition, the molecular weight of the polymer compound represented by the general formula () may be approximately 500 to 10,000 in order to effectively serve the purpose of the present invention, but preferably approximately 800 to 4,000. is appropriate. The polymer compound represented by the general formula () in the present invention is synthesized as follows. That is, resorcin, 4-tert-butylphenol, 4-n-octylphenol, 4-
A mixture of phenols such as pentadecylphenol at a molar ratio of 1:9 to 9:1, formaldehyde, acetone, acetaldehyde,
Aldehyde ketones such as methyl ethyl ketone are dissolved alone or in a solvent such as alcohol or dioxane, and an acid such as hydrochloric acid or oxalic acid or an alkali such as sodium hydroxide or aqueous ammonia is used as a catalyst.
The desired polymer compound can be obtained by condensing the aldehyde or ketone in an amount of 0.85 to 1.0 mol part per 1 mol part of the mixture of resorcinol and phenol. At this time, phenols and aldehydes/ketones can be freely combined with each other, and two or more types may be mixed and co-condensed. Examples of the sulfonyl chloride compound of o-quinonediazide used in the present invention include 1,2
Examples include -benzoquinone-2-diazide-4-sulfonyl chloride, 1,2-naphthoquinone-2-diazide-4-sulfonyl chloride, and 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride. A condensation product of a sulfonyl halide such as the sulfonyl chloride of o-quinonediazide and a polymer compound represented by the general formula () is synthesized as follows. That is, o-quinonediazide such as sulfonyl chloride and the polymer compound are mixed with dioxane, methyl ethyl ketone, tetrahydrofuran, dimethylformamide (DMF).
Dissolved in a solvent such as room temperature or 40~50℃
It is easily esterified by adding an alkali such as sodium carbonate to the mixture under heating and stirring. The reaction ratio of acid chloride to the polymer compound represented by the general formula () is 1:0.1 to 1:2 by weight.
can be used, but the optimum ratio is between 1:0.3 and 1:1. A typical synthesis example of the condensation product of the o-quinonediazide compound and the polymer compound represented by the general formula () in the present invention will be shown. Synthesis Example 1 110 g of resorcin and 206 g of p-n-octylphenol were dissolved in 500 ml of 1,4-dioxane, and 162 g of 37% formalin was added thereto with stirring. Further, 1 ml of 5N hydrochloric acid was added as a catalyst, and the mixture was gently heated to reflux while being careful not to cause bumping. After 5 hours, the reaction mixture was poured into cold water 3, and the precipitated pale yellow resin was separated and dried. As a result, 306 g
was gotten. The molecular weight of this resin was determined to be approximately 2,200 using a light scattering method. 17g of this resin was mixed with methyl ethyl ketone/DMF.
(5/1) 1 and 2 dissolved in 60ml and prepared separately
-Naphthoquinone-2-diazide-5-sulfonyl chloride 17g of methyl ethyl ketone/DMF
(5/1) Added to 90ml solution. After stirring at room temperature for 1 hour, 6.4g of triethylamine was added dropwise, 5ml of water was added, and the reaction system was quenched with triethylamine.
The pH was adjusted to 6.0-6.5. This reaction solution was poured into 1.2 liters of cold water while stirring, and the precipitated yellow powder was collected. After purification by reprecipitation and drying, 27 g was obtained. The esterification rate per unit skeleton of the resin calculated from the UV spectrum was 44%. Synthesis Example 2 132 g of resorcinol and 243 g of m-pentadecylphenol were dissolved in 500 ml of 1,4-dioxane, and 162 g of 37% formalin was added thereto with stirring. Further, 1 ml of 5N hydrochloric acid was added as a catalyst, and the mixture was gently heated to reflux while being careful not to cause bumping. After 5 hours, the reaction mixture was poured into cold water 3, and the precipitated pale yellow resin was separated and dried. As a result, 310 g
was gotten. The molecular weight of this resin was measured using a light scattering method and was found to be approximately 1,500. 20g of this resin was mixed with methyl ethyl ketone/DMF.
(5/1) 1 and 2 dissolved in 60ml and prepared separately
-Naphthoquinone-2-diazide-5-sulfonyl chloride 20g of methyl ethyl ketone/DMF
(5/1) Added to 90ml solution. After stirring at room temperature for 1 hour, 7.5g of triethylamine was added dropwise.
Furthermore, 5 ml of water was added, and the pH of the reaction system was adjusted to 6.0 to 6.5 with triethylamine. This reaction solution was poured into 1.2 liters of cold water while stirring, and the precipitated yellow powder was collected. After purification by reprecipitation, 31 g was obtained as a result of drying. The esterification rate per unit skeleton of the resin calculated from the UV spectrum was 52%. The amount of the o-quinonediazide compound in the present invention in the photosensitive composition is 0.1 to 50% by weight, more preferably 0.5 to 20% by weight, and most preferably
It is 0.5 to 5% by weight. Although the o-quinonediazide compound of the present invention alone may be used as a photosensitive component in the photosensitive composition of the present invention, it is preferable to use it together with a known o-naphthoquinonediazide compound. Known o-naphthoquinone diazide compounds include 1, which is described in Japanese Patent Publication No. 43-28403;
Most preferred is an ester of 2-naphthoquinone-2-diazido-5-sulfonyl chloride and pyrogallol-acetone resin. Other suitable known orthoquinone diazide compounds include esters of 1,2-diazonaphthoquinone sulfonic acid chloride and phenol-formaldehyde resins as described in U.S. Pat. Nos. 3,046,120 and 3,188,210. Other known o-naphthoquinone diazide compounds that can be used in the present invention include JP-A-47-5303 and JP-A-48-
No. 63802, No. 63803, No. 96575,
No. 49-38701, No. 13354 (1973), Special Publication No. 41-1973
Publications such as No. 11222, No. 45-9610, and No. 17481, U.S. Patent No. 2797213, U.S. Patent No. 3454400
No. 3544323, No. 3573917, No. 3573917, No. 3544323, No. 3573917, No.
No. 3674495, No. 3785825, British Patent No. 1227602
No. 1251345, No. 1267005, No. 1267005, No. 1251345, No. 1267005, No.
No. 1329888, No. 1330932, German Patent No. 854890
Examples include those listed in each specification, such as No. The amount of o-quinonediazide compounds in the photosensitive composition of the present invention is preferably 10 to 50% by weight in total of the known compounds and the compounds used in the present invention.
It is 20-40% by weight. In the composition of the present invention, phenol formaldehyde resin, cresol formaldehyde resin,
Phenol-modified xylene resin, polyhydroxystyrene, polyhalogenated hydroxystyrene, etc.
A known alkali-soluble polymer compound can be included. Such alkali-soluble polymer compound is used in an amount of 90% by weight or less of the total composition. The composition of the present invention may contain a cyclic acid anhydride to increase sensitivity, a print-out agent to obtain a visible image immediately after exposure, and a dye or other filler as an image coloring agent. Examples of the cyclic acid anhydride include phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, 3,6-endooxy- Δ4 -tetrahydrophthalic anhydride, and tetrachloro as described in US Pat. No. 4,115,128. Phthalic anhydride, maleic anhydride, chloromaleic anhydride, α-phenyl maleic anhydride,
Examples include succinic anhydride and pyromellitic acid. By containing these cyclic acid anhydrides in an amount of 1 to 15% by weight based on the total composition, sensitivity can be increased up to three times. Typical print-out agents for obtaining a visible image immediately after exposure include a combination of a photosensitive compound that releases an acid upon exposure and an organic dye that can form a salt. Specifically, the combination of o-naphthoquinonediazide-4-sulfonic acid halide and a salt-forming organic dye described in JP-A-50-36209 and JP-A-53-8128, and JP-A-53-8128. Combinations of trihalomethyl compounds and salt-forming organic dyes described in JP-A No. 36223 and JP-A-54-74728 can be mentioned. In addition to the above-mentioned salt-forming organic dyes, other dyes can also be used as image coloring agents. Suitable dyes include oil-soluble dyes and basic dyes, including salt-forming organic dyes. Specifically, oil yellow #101, oil yellow #130, oil pink #312, oil green BG, oil blue BOS, oil blue #603, oil black.
BY, Oil Black BS, Oil Black T-
505 (manufactured by Orient Chemical Industry Co., Ltd.), Crystal Violet (CI 42555), Methyl Violet (CI42535), Rhodamine B (CI45170B),
Examples include malachite green (CI 42000) and methylene blue (CI 52015). The composition of the present invention is applied onto a support after being dissolved in a solvent that dissolves each of the above components. Solvents used here include ethylene dichloride, cyclohexanone, methyl ethyl ketone, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, 2-methoxyethyl acetate, toluene, and ethyl acetate, and these solvents can be used alone or in combination. do. and,
The concentration (solid content) in the above components is 2 to 50% by weight. Further, although the coating amount varies depending on the application, for example, for photosensitive planographic printing plates, it is generally preferable to have a solid content of 0.5 to 3.0 g/m 2 . As the coating amount decreases, the photosensitivity increases, but the physical properties of the photosensitive film deteriorate. When producing a lithographic printing plate using the photosensitive composition of the present invention, the support may be a hydrophilized aluminum plate, such as a silicate-treated aluminum plate, an anodized aluminum plate, a grained aluminum plate, or a silicate plate. There is a coated aluminum plate, as well as zinc plate, stainless steel plate,
Examples include chromium-treated steel sheets, hydrophilized plastic films, and paper. Examples of developing solutions for the photosensitive composition of the present invention include sodium silicate, potassium silicate, sodium hydroxide, potassium hydroxide, lithium hydroxide, tribasic sodium phosphate, dibasic sodium phosphate, tribasic ammonium phosphate, ammonium diphosphate,
Aqueous solutions of inorganic alkaline agents such as sodium metasilicate, sodium bicarbonate, aqueous ammonia, etc. are suitable, and are added at a concentration of 0.1 to 10% by weight, preferably 0.5 to 5% by weight. Moreover, a surfactant and an organic solvent such as alcohol can be added to the alkaline aqueous solution as necessary. Next, the present invention will be explained in more detail by giving Examples. All percentages in the examples below are by weight unless otherwise specified. Example 1 A 2S aluminum plate with a thickness of 0.24 mm was degreased by immersing it in a 10% aqueous solution of tertiary sodium phosphate kept at 80°C for 3 minutes, grained with a nylon brush, and then etched with sodium aluminate for about 10 seconds. Then, desmut treatment was performed with a 3% aqueous solution of sodium hydrogen sulfate. This aluminum plate was anodized in 20% sulfuric acid at a current density of 2 A/d for 2 minutes to produce an aluminum plate ( ). Apply the following photosensitive liquid [A] to this aluminum plate ().
was coated and dried at 100°C for 2 minutes to prepare a photosensitive lithographic printing plate [A]. Photosensitive liquid [A] Esterified product of 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride and cresol-formaldehyde resin 0.80 g Compound obtained in Synthesis Example 1 0.10 g Cresol-formaldehyde resin 1.9 g Oil-soluble dye ( CI42595) 0.04g 1,2-naphthoquinone-2-diazide-4-sulfonyl chloride 0.02g Methyl cellosolve 20g Methyl ethyl ketone 20g The coating weight of the photosensitive lithographic printing plate [A] is 2.5g/
It was m2 . Positive transparent originals of line drawings and halftone dot images were brought into close contact with the photosensitive layer of this photosensitive lithographic printing plate [A], and exposure was carried out from a distance of 70 cm using a 30 ampere carbon arc lamp. When the exposed photosensitive lithographic printing plate [A] was developed by rubbing it with a sponge impregnated with a 4% aqueous sodium metasilicate solution, the photosensitive layer was completely removed from the non-image areas. After washing with water, a 14°Be′ gum arabic solution was applied to the plate surface and buff-dried. After leaving the plate for 3 days, I attached it to the lithographic printing machine and started feeding the paper at the same time as the printing machine started, and when printing, the ink was completely deposited on the image area on the 5th or 6th page, and a good, clean print was obtained. Obtained. Comparative Example 1 A photosensitive solution [B] was prepared using p-n-octylphenol formaldehyde resin instead of "the compound obtained in Synthesis Example 1" in the photosensitive solution [A] of Example 1 in the same manner as in Example 1. The mixture was coated on an aluminum plate (I) to prepare a photosensitive lithographic printing plate [B]. When this photosensitive lithographic printing plate [B] was exposed and developed in the same manner as in Example 1, some of the photosensitive layer remained unevenly in the non-image area. When printed in the same manner as in Example 1, the ink receptivity was comparable to that of photosensitive lithographic printing plate [A], but some non-image areas of the printed matter were smudged. Comparative Example 2 In the photosensitive solution [A] of Example 1, except for “the compound obtained in Synthesis Example 1”, “1,2-naphthoquinone-
A photosensitive solution [C] containing 0.80 g to 0.90 g of "esterified product of 2-diazide-5-sulfonyl chloride and cresol-formaldehyde resin" was applied onto an aluminum plate (I) in the same manner as in Example 1, A photosensitive planographic printing plate [C] was produced. This photosensitive lithographic printing plate [C] was plate-made and printed in the same manner as in Example 1, and the ink was completely deposited on the image area at the 20th to 30th sheet after printing. Comparative Example 3 In the photosensitive solution [A] of Example 1, "p-n-octylphenol formaldehyde resin and 1,2-naphthoquinone-2-diazide-5-sulfonyl" were used instead of "the compound obtained in Synthesis Example 1". A photosensitive solution [D] using "esterified product with chloride" was applied onto an aluminum plate (I) in the same manner as in Example 1 to prepare a photosensitive lithographic printing plate [D]. When this photosensitive lithographic printing plate [D] was exposed and developed in the same manner as in Example 1, a portion of the photosensitive layer remained in the non-image area, resulting in slight unevenness. In addition, in order to obtain the same tone reproducibility as the photosensitive planographic printing plate [A] of Example 1, this photosensitive planographic printing plate [D] has an exposure time of 1.2 times longer than that of the photosensitive planographic printing plate [A]. It required twice the exposure time. Comparative Example 4 In the photosensitive solution [A] of Example 1, "the compound obtained in Synthesis Example 1" was replaced by the compound described in Comparative Example 2 of JP-A-56-1045. Photosensitive liquid [E] using "condensation product of 1,2-naphthoquinone-2-diazido-5-sulfonyl chloride and resorcinol-acetaldehyde resin" and JP-A-1044-1988
The photosensitive solution [F] using the "condensation product of 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride and resorcinol-formaldehyde resin" described in Comparative Example 2 of the publication was prepared as Example 1. Photosensitive lithographic printing plates [E] and [F] were prepared by coating in the same manner. These photosensitive lithographic printing plates [E] and [F]
When plate making and printing were carried out in the same manner as in Example 1, the ink was completely deposited on the image area after 15 to 20 sheets had been printed. Comparative Example 5 The "compound obtained in Synthesis Example 1" in Example 1 is synthesized using equimolar amounts of resorcinol and pn-octylphenol as shown in Synthesis Example 1. Compound [a] was synthesized in the same manner as in Synthesis Example 1 using resorcinol and p-n-octylphenol in a molar ratio of 5:95, and compound [b] was synthesized in the same manner as in Synthesis Example 1 using resorcinol and p-n-octylphenol in a molar ratio of 95:5. Photosensitive liquids [G] and [H] used in place of "compound obtained in Synthesis Example 1" in photosensitive liquid [A] of Example 1
were coated in the same manner as in Example 1 to produce photosensitive lithographic printing plates [G] and [H], respectively. When the photosensitive lithographic printing plate [G] was exposed and developed in the same manner as in Example 1, as in Comparative Example 2, a portion of the photosensitive layer remained unevenly in the non-image area. On the other hand, when the photosensitive lithographic printing plate [H] was exposed and developed in the same manner as in Example 1, no unevenness occurred in the non-image area. However, after 15 to 20 prints, the ink was completely applied to the image area. Example 2 The following photosensitive solution [I] was applied to the aluminum plate (I) of Example 1 and dried at 100°C for 2 minutes to produce a photosensitive lithographic printing plate [I]. Photosensitive liquid [I] Esterified product of 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride and pyrogallol-acetone resin 0.80 g (as described in Example 1 of US Pat. No. 3,635,709) Synthesis example Compound obtained in step 2 0.10g Cresol formaldehyde resin 1.9g Oil-soluble dye (CI 42595) 0.03g Phthalic anhydride 0.2g 2-(p-butoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine 0.02g 1,2-naphthoquinone-2-diazide-4-sulfonyl chloride 0.02g Ethylene dichloride 15g Methyl cellosolve 8g Coating weight of photosensitive planographic print [I] is 2.5g/
It was m2 . When this photosensitive lithographic printing plate [I] was exposed and developed in the same manner as in Example 1, the photosensitive layer was completely removed from the non-image areas. Gum printing was performed in the same manner as in Example 1, and from the beginning of printing, 4 to 5
On the second sheet, the ink was completely applied to the image area, and a good print without stains was obtained. Comparative Example 6 In the photosensitive solution [I] of Example 2, a photosensitive solution [J] using m-pentadecylphenol-formaldehyde resin instead of "the compound obtained in Synthesis Example 2" was used in the same manner as in Example 1. A photosensitive lithographic printing plate [J] was prepared by coating an aluminum plate (I) using the following method. When this photosensitive lithographic printing plate [J] was exposed and developed in the same manner as in Example 1, a portion of the photosensitive layer remained unevenly in the non-image area. When printed in the same manner as in Example 1, it exhibited ink receptivity equivalent to that of photosensitive lithographic printing plate [I], but some non-image areas of the printed matter were smudged. Comparative Example 7 In the photosensitive solution [I] of Example 2, except for “the compound obtained in Synthesis Example 2”, “1,2-naphthoquinone-2
- esterified product of diazide-5-sulfonyl chloride and pyrogallol-acetone resin" at 0.80
The photosensitive solution [K], which was reduced in weight from g to 0.90 g, was applied onto an aluminum plate (I) in the same manner as in Example 1 to produce a photosensitive lithographic printing plate [K]. This photosensitive lithographic printing plate [K] was plate-made and printed in the same manner as in Example 1.
The ink was finally completely applied to the image area. Comparative Example 8 In the photosensitive solution [I] of Example 2, "m-pentadienephenol formaldehyde resin and 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride" were used instead of "the compound obtained in Synthesis Example 2". A photosensitive liquid [L] using the esterified product of 1 was applied onto an aluminum plate (I) in the same manner as in Example 1 to produce a photosensitive lithographic printing plate [L]. When this photosensitive lithographic printing plate [L] was exposed and developed in the same manner as in Example 1, a portion of the photosensitive layer remained in the non-image area, resulting in slight unevenness. In addition, in order to obtain the same tone reproducibility as the photosensitive planographic printing plate [I] of Example 2, this photosensitive planographic printing plate [L] has an exposure time that is 1.2 times longer than that of the photosensitive planographic printing plate [I]. required an exposure time of
Claims (1)
下記一般式()で示される構造を有する高分子
化合物との縮合生成物を含有することを特徴とす
る感光性組成物。 (式中、R1,R2は各々水素原子又は炭素数1
〜4個の低級アルキル基、R3は炭素数4〜15の
アルキル基又は炭素数4〜15のシクロアルキル
基、R4,R5は各々、水素原子、炭素数1〜3個
の低級アルキル基又はハロゲン原子を示し、xは
10〜90モル%を示す。)[Scope of Claims] 1. A photosensitive composition comprising a condensation product of a sulfonyl halide of o-quinonediazide and a polymer compound having a structure represented by the following general formula (). (In the formula, R 1 and R 2 are each a hydrogen atom or a carbon number 1
~4 lower alkyl groups, R 3 is an alkyl group having 4 to 15 carbon atoms or a cycloalkyl group having 4 to 15 carbon atoms, R 4 and R 5 are each a hydrogen atom, lower alkyl having 1 to 3 carbon atoms represents a group or a halogen atom, x is
Shows 10-90 mol%. )
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19455282A JPS5984238A (en) | 1982-11-08 | 1982-11-08 | Photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19455282A JPS5984238A (en) | 1982-11-08 | 1982-11-08 | Photosensitive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5984238A JPS5984238A (en) | 1984-05-15 |
JPH0340380B2 true JPH0340380B2 (en) | 1991-06-18 |
Family
ID=16326426
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19455282A Granted JPS5984238A (en) | 1982-11-08 | 1982-11-08 | Photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5984238A (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60143345A (en) * | 1983-12-30 | 1985-07-29 | Konishiroku Photo Ind Co Ltd | Positive type lighographic printing plate material |
JPS60164740A (en) * | 1984-02-06 | 1985-08-27 | Japan Synthetic Rubber Co Ltd | Positive type photosensitive resin composition |
EP0227487B1 (en) * | 1985-12-27 | 1992-07-15 | Japan Synthetic Rubber Co., Ltd. | Positive type radiation-sensitive resin composition |
JPH0654385B2 (en) * | 1986-01-27 | 1994-07-20 | 日本合成ゴム株式会社 | Positive type radiation sensitive resin composition |
JP2560266B2 (en) * | 1987-03-25 | 1996-12-04 | 日本合成ゴム株式会社 | Radiation-sensitive resin composition |
JP7221578B2 (en) * | 2020-01-24 | 2023-02-14 | 信越化学工業株式会社 | Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern forming method |
-
1982
- 1982-11-08 JP JP19455282A patent/JPS5984238A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5984238A (en) | 1984-05-15 |
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