EP0924487A3 - Vacuum drying of semiconductor material - Google Patents

Vacuum drying of semiconductor material Download PDF

Info

Publication number
EP0924487A3
EP0924487A3 EP98124206A EP98124206A EP0924487A3 EP 0924487 A3 EP0924487 A3 EP 0924487A3 EP 98124206 A EP98124206 A EP 98124206A EP 98124206 A EP98124206 A EP 98124206A EP 0924487 A3 EP0924487 A3 EP 0924487A3
Authority
EP
European Patent Office
Prior art keywords
semiconductor material
vacuum drying
vacuum
prevail
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP98124206A
Other languages
German (de)
French (fr)
Other versions
EP0924487B1 (en
EP0924487A2 (en
Inventor
Wilhelm Schmidbauer
Hanns Dr. Wochner
Werner Ott
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wacker Chemie AG
Original Assignee
Wacker Chemie AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Chemie AG filed Critical Wacker Chemie AG
Publication of EP0924487A2 publication Critical patent/EP0924487A2/en
Publication of EP0924487A3 publication Critical patent/EP0924487A3/en
Application granted granted Critical
Publication of EP0924487B1 publication Critical patent/EP0924487B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum

Abstract

Vorrichtung zum Trocknen von Halbleiterbruchmaterial, dadurch gekennzeichnet, daß die Vorrichtung zumindest eine vakuumdichte Vorrichtung mit zumindest einer Aufnahmevorrichtung für Halbleiterbruchmaterial aufweist und daß in der Vorrichtung ein Vakuum herrschen kann.Device for drying broken semiconductor material, thereby characterized in that the device is at least a vacuum tight Device with at least one receiving device for Has semiconductor material and that in the device a vacuum can prevail.

EP98124206A 1997-12-19 1998-12-17 Vacuum drying of semiconductor material Expired - Lifetime EP0924487B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19756830 1997-12-19
DE19756830A DE19756830A1 (en) 1997-12-19 1997-12-19 Vacuum drying of semiconductor breakage

Publications (3)

Publication Number Publication Date
EP0924487A2 EP0924487A2 (en) 1999-06-23
EP0924487A3 true EP0924487A3 (en) 1999-07-07
EP0924487B1 EP0924487B1 (en) 2001-02-14

Family

ID=7852715

Family Applications (1)

Application Number Title Priority Date Filing Date
EP98124206A Expired - Lifetime EP0924487B1 (en) 1997-12-19 1998-12-17 Vacuum drying of semiconductor material

Country Status (4)

Country Link
US (1) US6170171B1 (en)
EP (1) EP0924487B1 (en)
JP (1) JPH11265875A (en)
DE (2) DE19756830A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7270706B2 (en) * 2004-10-04 2007-09-18 Dow Corning Corporation Roll crusher to produce high purity polycrystalline silicon chips
FR2920046A1 (en) * 2007-08-13 2009-02-20 Alcatel Lucent Sas METHOD FOR POST-PROCESSING A TRANSPORT MEDIUM FOR THE CONVEYAGE AND ATMOSPHERIC STORAGE OF SEMICONDUCTOR SUBSTRATES, AND POST-PROCESSING STATION FOR IMPLEMENTING SUCH A METHOD
CN101561218B (en) * 2008-04-16 2010-12-08 富葵精密组件(深圳)有限公司 Vacuum nitrogen oven
US8756826B2 (en) * 2010-11-30 2014-06-24 Mei, Llc Liquid coalescence and vacuum dryer system and method
DE102011004916B4 (en) 2011-03-01 2013-11-28 Wacker Chemie Ag Apparatus and method for drying polysilicon
US10240867B2 (en) 2012-02-01 2019-03-26 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
US10690413B2 (en) 2012-02-01 2020-06-23 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
US11713924B2 (en) 2012-02-01 2023-08-01 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
US9970708B2 (en) 2012-02-01 2018-05-15 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
US10876792B2 (en) 2012-02-01 2020-12-29 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
DE102012218748B4 (en) 2012-10-15 2014-02-13 Wacker Chemie Ag Drying polysilicon
US10088230B2 (en) 2012-11-08 2018-10-02 Tekdry International, Inc. Dryer for portable electronics
WO2014153007A1 (en) 2013-03-14 2014-09-25 Revive Electronics, LLC Methods and apparatuses for drying electronic devices

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63302521A (en) * 1987-06-02 1988-12-09 Mitsubishi Electric Corp Drier for semiconductor substrate
EP0421902A1 (en) * 1989-10-06 1991-04-10 Ultrasons Annemasse Vacuum drying process for various articles, and apparatus for carrying out the process
EP0423377A1 (en) * 1989-09-15 1991-04-24 International Business Machines Corporation Method of and apparatus for drying articles
EP0539607A1 (en) * 1991-05-24 1993-05-05 Nikku Industry Co., Ltd. Vacuum drying apparatus
US5263264A (en) * 1990-01-25 1993-11-23 Speedfam Clean System Company Limited Method and apparatus for drying wet work
US5732478A (en) * 1996-05-10 1998-03-31 Altos Engineering, Inc. Forced air vacuum drying

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4816081A (en) * 1987-02-17 1989-03-28 Fsi Corporation Apparatus and process for static drying of substrates
JPH0422125A (en) * 1990-05-17 1992-01-27 Fujitsu Ltd Wet treatment method for semiconductor wafer
JP2644912B2 (en) * 1990-08-29 1997-08-25 株式会社日立製作所 Vacuum processing apparatus and operating method thereof
US5331487A (en) * 1992-01-16 1994-07-19 International Business Machines Corporation Direct access storage device with vapor phase lubricant system and a magnetic disk having a protective layer and immobile physically bonded lubricant layer
US5301701A (en) * 1992-07-30 1994-04-12 Nafziger Charles P Single-chamber cleaning, rinsing and drying apparatus and method therefor
DE69420474T2 (en) * 1993-06-30 2000-05-18 Applied Materials Inc Process for rinsing and pumping out a vacuum chamber to ultra-high vacuum
US5791895A (en) * 1994-02-17 1998-08-11 Novellus Systems, Inc. Apparatus for thermal treatment of thin film wafer
US5551165A (en) * 1995-04-13 1996-09-03 Texas Instruments Incorporated Enhanced cleansing process for wafer handling implements

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63302521A (en) * 1987-06-02 1988-12-09 Mitsubishi Electric Corp Drier for semiconductor substrate
EP0423377A1 (en) * 1989-09-15 1991-04-24 International Business Machines Corporation Method of and apparatus for drying articles
EP0421902A1 (en) * 1989-10-06 1991-04-10 Ultrasons Annemasse Vacuum drying process for various articles, and apparatus for carrying out the process
US5263264A (en) * 1990-01-25 1993-11-23 Speedfam Clean System Company Limited Method and apparatus for drying wet work
EP0539607A1 (en) * 1991-05-24 1993-05-05 Nikku Industry Co., Ltd. Vacuum drying apparatus
US5732478A (en) * 1996-05-10 1998-03-31 Altos Engineering, Inc. Forced air vacuum drying

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 013, no. 139 (E - 738) 6 April 1989 (1989-04-06) *

Also Published As

Publication number Publication date
EP0924487B1 (en) 2001-02-14
DE59800476D1 (en) 2001-03-22
US6170171B1 (en) 2001-01-09
JPH11265875A (en) 1999-09-28
EP0924487A2 (en) 1999-06-23
DE19756830A1 (en) 1999-07-01

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