EP0903427A4 - Apparatus and method for producing crystals by the czochralski method and crystals produced by this method - Google Patents
Apparatus and method for producing crystals by the czochralski method and crystals produced by this methodInfo
- Publication number
- EP0903427A4 EP0903427A4 EP97902656A EP97902656A EP0903427A4 EP 0903427 A4 EP0903427 A4 EP 0903427A4 EP 97902656 A EP97902656 A EP 97902656A EP 97902656 A EP97902656 A EP 97902656A EP 0903427 A4 EP0903427 A4 EP 0903427A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- crystals
- czochralski
- producing
- produced
- crystals produced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/08—Germanium
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/42—Gallium arsenide
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/44—Gallium phosphide
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50898/96 | 1996-02-14 | ||
JP05089896A JP3533812B2 (en) | 1996-02-14 | 1996-02-14 | Crystal manufacturing apparatus by Czochralski method, crystal manufacturing method, and crystal manufactured by this method |
JP5089896 | 1996-02-14 | ||
PCT/JP1997/000359 WO1997030195A1 (en) | 1996-02-14 | 1997-02-12 | Apparatus and method for producing crystals by the czochralski method and crystals produced by this method |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0903427A1 EP0903427A1 (en) | 1999-03-24 |
EP0903427A4 true EP0903427A4 (en) | 2000-07-12 |
EP0903427B1 EP0903427B1 (en) | 2003-09-03 |
Family
ID=12871570
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP97902656A Expired - Lifetime EP0903427B1 (en) | 1996-02-14 | 1997-02-12 | Apparatus and method for producing crystals by the czochralski method and crystals produced by this method |
Country Status (6)
Country | Link |
---|---|
US (1) | US6071337A (en) |
EP (1) | EP0903427B1 (en) |
JP (1) | JP3533812B2 (en) |
KR (1) | KR100421125B1 (en) |
DE (1) | DE69724612T2 (en) |
WO (1) | WO1997030195A1 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19622664A1 (en) * | 1996-06-05 | 1997-12-11 | Wacker Siltronic Halbleitermat | Method and device for producing single crystals |
WO1999010570A1 (en) * | 1997-08-26 | 1999-03-04 | Sumitomo Metal Industries, Ltd. | High-quality silicon single crystal and method of producing the same |
JPH11349393A (en) * | 1998-06-03 | 1999-12-21 | Shin Etsu Handotai Co Ltd | Silicon single crystal wafer and production of silicon single crystal wafer |
DE69902911T2 (en) * | 1998-06-26 | 2003-01-16 | Memc Electronic Materials | RESISTANCE HEATING FOR A CRYSTAL GROWING DEVICE AND METHOD FOR USE THEREOF |
DE19912484A1 (en) * | 1999-03-19 | 2000-09-28 | Freiberger Compound Mat Gmbh | Device for the production of single crystals |
US6663709B2 (en) | 2001-06-26 | 2003-12-16 | Memc Electronic Materials, Inc. | Crystal puller and method for growing monocrystalline silicon ingots |
WO2004044276A1 (en) | 2002-11-12 | 2004-05-27 | Memc Electronic Materials, Inc. | A crystal puller and method for growing a monocrystalline ingot |
JP5439972B2 (en) * | 2009-06-19 | 2014-03-12 | 株式会社Sumco | Manufacturing method of large-diameter silicon single crystal |
CN102400210A (en) * | 2010-09-08 | 2012-04-04 | 北京有色金属研究总院 | Method for adjusting defects in Czochralski silicon single crystal |
CN112680784B (en) * | 2019-10-18 | 2023-12-26 | 中环领先(徐州)半导体材料有限公司 | Single crystal furnace and method for preparing crystal bar by using same |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0355833A2 (en) * | 1988-08-25 | 1990-02-28 | Shin-Etsu Handotai Company Limited | Method of producing compound semiconductor single crystal |
EP0504837A2 (en) * | 1991-03-20 | 1992-09-23 | Shin-Etsu Handotai Company Limited | Method and apparatus for producing silicon single crystal |
JPH0826881A (en) * | 1994-07-19 | 1996-01-30 | Toshiba Denko Kk | Device for pulling up silicon single crystal and container for pulling used therefor |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4824519A (en) * | 1987-10-22 | 1989-04-25 | Massachusetts Institute Of Technology | Method and apparatus for single crystal pulling downwardly from the lower surface of a floating melt |
JPH0524979A (en) * | 1991-07-18 | 1993-02-02 | Hitachi Cable Ltd | Apparatus for manufacturing compound semiconductor crystal |
JPH072594A (en) * | 1993-06-15 | 1995-01-06 | Japan Energy Corp | Apparatus for producing semiconductor crystal |
JP2822887B2 (en) * | 1994-06-16 | 1998-11-11 | 信越半導体株式会社 | Method for producing silicon single crystal with few crystal defects |
JPH0826879A (en) * | 1994-07-11 | 1996-01-30 | Furukawa Electric Co Ltd:The | Device for pulling up single crystal of compound semiconductor and production of single crystal of compound semiconductor |
JP3128795B2 (en) * | 1995-06-09 | 2001-01-29 | 信越半導体株式会社 | Crystal manufacturing apparatus and manufacturing method by Czochralski method |
JPH0940492A (en) * | 1995-07-27 | 1997-02-10 | Hitachi Cable Ltd | Production of single crystal and apparatus for production therefor |
-
1996
- 1996-02-14 JP JP05089896A patent/JP3533812B2/en not_active Expired - Lifetime
-
1997
- 1997-02-12 WO PCT/JP1997/000359 patent/WO1997030195A1/en active IP Right Grant
- 1997-02-12 EP EP97902656A patent/EP0903427B1/en not_active Expired - Lifetime
- 1997-02-12 DE DE69724612T patent/DE69724612T2/en not_active Expired - Lifetime
- 1997-02-12 KR KR10-1998-0706240A patent/KR100421125B1/en not_active IP Right Cessation
- 1997-02-12 US US09/125,339 patent/US6071337A/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0355833A2 (en) * | 1988-08-25 | 1990-02-28 | Shin-Etsu Handotai Company Limited | Method of producing compound semiconductor single crystal |
EP0504837A2 (en) * | 1991-03-20 | 1992-09-23 | Shin-Etsu Handotai Company Limited | Method and apparatus for producing silicon single crystal |
JPH0826881A (en) * | 1994-07-19 | 1996-01-30 | Toshiba Denko Kk | Device for pulling up silicon single crystal and container for pulling used therefor |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 05 31 May 1996 (1996-05-31) * |
Also Published As
Publication number | Publication date |
---|---|
DE69724612D1 (en) | 2003-10-09 |
KR19990082507A (en) | 1999-11-25 |
EP0903427B1 (en) | 2003-09-03 |
JPH09221380A (en) | 1997-08-26 |
US6071337A (en) | 2000-06-06 |
EP0903427A1 (en) | 1999-03-24 |
DE69724612T2 (en) | 2004-08-05 |
KR100421125B1 (en) | 2004-04-17 |
WO1997030195A1 (en) | 1997-08-21 |
JP3533812B2 (en) | 2004-05-31 |
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