EP0893947A1 - Method for surface treatment of copper or copper alloys - Google Patents
Method for surface treatment of copper or copper alloys Download PDFInfo
- Publication number
- EP0893947A1 EP0893947A1 EP98113593A EP98113593A EP0893947A1 EP 0893947 A1 EP0893947 A1 EP 0893947A1 EP 98113593 A EP98113593 A EP 98113593A EP 98113593 A EP98113593 A EP 98113593A EP 0893947 A1 EP0893947 A1 EP 0893947A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- copper
- aminotetrazole
- resin
- aqueous solution
- derivative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 52
- 238000000034 method Methods 0.000 title claims abstract description 52
- 239000010949 copper Substances 0.000 title claims abstract description 38
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 38
- 229910000881 Cu alloy Inorganic materials 0.000 title claims description 8
- 238000004381 surface treatment Methods 0.000 title description 4
- 229920005989 resin Polymers 0.000 claims abstract description 38
- 239000011347 resin Substances 0.000 claims abstract description 38
- 239000007864 aqueous solution Substances 0.000 claims abstract description 35
- ULRPISSMEBPJLN-UHFFFAOYSA-N 2h-tetrazol-5-amine Chemical compound NC1=NN=NN1 ULRPISSMEBPJLN-UHFFFAOYSA-N 0.000 claims abstract description 33
- 230000009477 glass transition Effects 0.000 claims abstract description 17
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical compound NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 claims abstract description 11
- JSIAIROWMJGMQZ-UHFFFAOYSA-N 2h-triazol-4-amine Chemical class NC1=CNN=N1 JSIAIROWMJGMQZ-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000011248 coating agent Substances 0.000 claims abstract description 5
- 238000000576 coating method Methods 0.000 claims abstract description 5
- 239000003822 epoxy resin Substances 0.000 claims description 10
- 229920000647 polyepoxide Polymers 0.000 claims description 10
- 229920001955 polyphenylene ether Polymers 0.000 claims description 4
- 239000004642 Polyimide Substances 0.000 claims description 3
- 229920001721 polyimide Polymers 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 abstract description 5
- 230000001070 adhesive effect Effects 0.000 abstract description 5
- 239000011889 copper foil Substances 0.000 description 14
- 230000000694 effects Effects 0.000 description 12
- 238000002845 discoloration Methods 0.000 description 10
- 238000012360 testing method Methods 0.000 description 9
- 238000005530 etching Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- -1 another prepreg Substances 0.000 description 2
- 229940106691 bisphenol a Drugs 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000003021 water soluble solvent Substances 0.000 description 2
- WGPNLKPTYJCEKI-UHFFFAOYSA-N 1-ethyltetrazol-5-amine Chemical compound CCN1N=NN=C1N WGPNLKPTYJCEKI-UHFFFAOYSA-N 0.000 description 1
- GTKOKCQMHAGFSM-UHFFFAOYSA-N 1-methyltetrazol-5-amine Chemical compound CN1N=NN=C1N GTKOKCQMHAGFSM-UHFFFAOYSA-N 0.000 description 1
- ZGHVPBISEIPFJS-UHFFFAOYSA-N 2-(tetrazol-1-yl)ethanamine Chemical compound NCCN1C=NN=N1 ZGHVPBISEIPFJS-UHFFFAOYSA-N 0.000 description 1
- SMTGVJNPFRLURH-UHFFFAOYSA-N 4-ethyltriazol-1-amine Chemical compound CCC1=CN(N)N=N1 SMTGVJNPFRLURH-UHFFFAOYSA-N 0.000 description 1
- PSTGSSGTRNEEBA-UHFFFAOYSA-N 4-methyltriazol-1-amine Chemical compound CC1=CN(N)N=N1 PSTGSSGTRNEEBA-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 206010042674 Swelling Diseases 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000805 composite resin Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- XEMZLVDIUVCKGL-UHFFFAOYSA-N hydrogen peroxide;sulfuric acid Chemical compound OO.OS(O)(=O)=O XEMZLVDIUVCKGL-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001983 poloxamer Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000002639 sodium chloride Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/18—Fireproof paints including high temperature resistant paints
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
- C23F11/149—Heterocyclic compounds containing nitrogen as hetero atom
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/65—Additives macromolecular
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
Definitions
- the present invention relates to a method for surface treatment of copper or copper alloys (hereinafter collectively referred to as "copper”), which is useful in applications such as the manufacture of printed circuit boards.
- resins having glass transition temperatures are harder than conventional epoxy resins, and exhibit less adhesion to a copper foil as they possess a fewer number of polar groups. Therefore, when such a material is subjected to severe conditions such as a pressure cooker test where the material is humidified followed by heating, separation occurs between the resin and the copper foil to reveal the shortcomings mentioned.
- the present invention has been made in consideration of the above circumstances and has its objective in providing for a method for bonding a resin which has a high glass transition temperature but low affinity to copper surfaces, with a copper surface with sufficient adhesive strength.
- a method of treating a copper surface to be bonded with resins having a glass transition temperature of 150°C or higher which comprises coating the copper surface with an aqueous solution containing at least 0.05% (all percentage figures hereinafter referred to are in % by weight, unless otherwise specified) of aminotetrazole or a derivative thereof (hereinafter referred to as the first aqueous solution), or with an aqueous solution containing at least 0.05% of aminotetrazole or a derivative thereof, at least 0.1% of aminotriazole or a derivative thereof (hereinafter referred to as the second aqueous solution).
- the object of the surface treatment method in the present invention is a copper surface to be coated with a resin having a glass transition temperature of 150°C or higher as determined by the TMA method in accordance with the procedures specified in JIS C 6481.
- the above copper surface may be roughened by a method such as an etching method (microetching method), electroplating method, electroless plating method, oxidizing method (black oxide, brown oxide), oxidation-reduction method, brush polishing method, or jet scrubbing method.
- etching method microetching method
- electroplating method electroless plating method
- oxidizing method black oxide, brown oxide
- oxidation-reduction method brush polishing method
- jet scrubbing method jet scrubbing method.
- MEC Etch Bond CZ-5480 and CZ-8100 microetching agents manufactured by MEC Co., Ltd.
- the copper surfaces as described above are coated with an aqueous solution containing at least 0.05% of aminotetrazole or an aminotetrazole derivative (the first aqueous solution), or an aqueous solution containing at least 0.05% of aminotetrazole or an aminotetrazole derivative and at least 0.1% of compounds aminotriazole or an aminotriazole derivative (the second aqueous solution).
- aminotetrazole derivatives examples include 1-methyl-5-aminotetrazole, 1-ethyl-5-aminotetrazole, ⁇ -benzyl-5-aminotetrazole, ⁇ -benzyl-5-aminotetrazole, and 1-( ⁇ -aminoethyl) tetrazole, other substituent groups may be contained as long as the desired effect of the present invention is exhibited.
- the derivatives may be in the form of hydrates as well.
- aminotetrazole or aminotetrazole derivatives mentioned above aminotetrazole or those having short-chain alkyl groups are preferred. These aminotetrazole and aminotetrazole derivatives may be used either individually or in combinations of two or more.
- the concentration of the aminotetrazole or aminotetrazole derivatives in the first aqueous solution is at least 0.05%, preferably between 0.1 to 5%, and more preferably, between 0.1 to 3%. If the concentration is below 0.05%, the effect in improving adhesiveness to the above-mentioned resins becomes insufficient. On the other hand, while there is no particular upper limit, a concentration higher than 5% will not lead to added improvement effects but only harm the economics of the process.
- the first aqueous solution may further contain appropriate amounts of water-soluble solvents such as alcohol, nonionic surfactants such as polyethers, ethylene oxide-propylene oxide copolymers (Pluronic types), and amino type polyethers, metal salts such as sodium sulfate, ammonium sulfate, ammonium chloride, and sodium chloride, or ammonia.
- water-soluble solvents such as alcohol, nonionic surfactants such as polyethers, ethylene oxide-propylene oxide copolymers (Pluronic types), and amino type polyethers, metal salts such as sodium sulfate, ammonium sulfate, ammonium chloride, and sodium chloride, or ammonia.
- aminotriazole or aminotriazole derivatives do not harm adhesiveness of the resins but instead improve it, since they are formulated together with aminotetrazole or aminotetrazole derivatives.
- use of aminotriazole or aminotriazole derivatives enables the provision of copper surfaces with excellent thermal resistance as well as moisture resistance.
- aminotetrazole or aminotetrazole derivative for the second aqueous solution compounds similar to those in the first aqueous solution are used.
- aminotriazole derivatives for example, 3-amino-5-methyltriazole, 3-amino-5-ethyltriazole, or the like can be mentioned. However, other substituent groups may be contained as long as the desired effect of the present invention is exhibited.
- These aminotriazole or aminotriazole derivatives may be used either individually or in combinations of two or more in the second aqueous solution.
- the concentration of aminotetrazole and/or aminotetrazole derivatives in the second aqueous solution is at least 0.05%, preferably between 0.1 to 5%, and more preferably, between 0.3 to 3%. If the concentration is below 0.05%, the effect in improving adhesiveness to the above-mentioned resins becomes insufficient. Further, although there is no particular upper limit, a concentration higher than 5% will not lead to added improvement effects but only harm the economics of the process.
- the concentration of aminotriazole and/or aminotriazole derivatives in the second aqueous solution is at least 0.1%, preferably between 0.3 to 5%, and more preferably, between 0.3 to 3%. If the concentration is below 0.1%, the effects in improving the thermal resistance and the moisture resistance of the copper surfaces become insufficient. While there is no particular upper limit, a concentration higher than 5% will not lead to added improvement effects but only harm the economics of the process.
- a satisfactory process for example, comprises coating the copper surface using techniques such as a spray (shower) method or a dipping method, followed by rinsing with water and drying.
- the method in the present invention enables improving adhesiveness to copper surfaces of resins having high glass transition temperatures. Therefore, it is extremely useful in the manufacture of printed circuit boards such as so-called "thin type multi-layer printed circuit boards" that are built with four or more layers of substrates, each having a thickness of 0.1 mm or less, or those for use with semiconductor packages.
- one side of a printed circuit board having copper circuitry patterns on both sides is coated first with a resin and heat-cured (the copper circuitry pattern on the other side being uncoated as yet), and then the other side is coated with the resin and heat-cured.
- Applying the second aqueous solution on such an occasion provides the uncoated copper surface with excellent surface protection by imparting heat resistance and moisture resistance.
- the excellent surface protection effect is also available when the bonding of copper and a resin is performed under high temperature.
- use of the method in the present invention also enables attaining higher peel strength for conventional epoxy resins such as bisphenol-A type epoxy resin or novolak type epoxy resin having a glass transition temperature lower than 150°C, and if the second aqueous solution is used in addition, provides extra heat resistance and moisture resistance as well.
- Exterior copper surfaces of copper-plated laminates for printed circuit boards were etched to a depth of approximately 3 ⁇ m using MEC Etch Bond CZ-8100 (manufactured by MEC Co., Ltd.). The etching depth was calculated from the weight of copper removed, surface area, and the density of the copper. Subsequently, the above etched laminates were immersed in aqueous solutions prepared with the composition as listed in Table 1, for 15 seconds at 20°C, rinsed with water, and then dried. Treatment with the aqueous solution was not carried out for the Comparative Example 1.
- the resultant laminates were then allowed to degrade for 2 hours under conditions of 121°C, a 100% relative humidity, and 2-atmosphere pressure, immersed subsequently in molten solder at 260°C, and inspected for inter-layer peeling between the resin and the copper surface (lifting of the copper foil from the resin).
- the evaluation results are given in Table 1, where ⁇ denotes no lifting at all, ⁇ denotes occurrence of slight lifting (minute spot-like swellings), X denotes much lifting, and X X, very much lifting.
- electrolytic copper foils were etched to a depth of approximately 3 ⁇ m using MEC Etch Bond CZ-8100 (manufactured by MEC Co., Ltd.). The foils were then immersed in aqueous solutions prepared with the composition as listed in Table 1 for 15 seconds at 20°C, rinsed with water, and then dried.
- the surface of the electrolytic copper foils was etched, treated with aqueous solutions with the composition as listed in Table 1, rinsed with water, and then dried.
- the resultant copper foils were then heated to 130°C for 1 hour and inspected for surface discoloration.
- the evaluation results are given in Table 1, where ⁇ denotes no discoloration, ⁇ denotes minor discoloration, X, major discoloration, and X X, severe discoloration.
- the surface of the electrolytic copper foils was etched, treated with aqueous solutions with the composition as listed in Table 1, rinsed with water, and then dried.
- the resultant copper foils were then allowed to stand under conditions of 50°C and 95% relative humidity for 18 hours, and inspected for surface discoloration.
- the evaluation results are given in Table 1, where ⁇ denotes no discoloration, ⁇ denotes minor discoloration, X, major discoloration, and X X, severe discoloration.
- the present invention provides for a method for bonding a resin which has a high glass transition temperature but low affinity to copper surfaces with a copper surface with sufficient adhesive strength, resulting in a copper-resin composite that has excellent heat and moisture resistance together with adhesive strength.
- the present invention is suitable for the manufacture of printed circuit boards for which heat resistance is particularly required.
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Laminated Bodies (AREA)
- Chemical Treatment Of Metals (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
Abstract
A method for bonding a resin which has a high glass
transition temperature but low affinity to copper surfaces
with a copper surface with sufficient adhesive strength.
The method comprises coating the copper surfaces with an
aqueous solution containing at least 0.05% of aminotetrazole
or an aminotetrazole derivative, or an aqueous solution
containing at least 0.05% of aminotetrazole or an
aminotetrazole derivative and at least 0.1% of aminotriazole
or an aminotriazole derivative.
Description
The present invention relates to a method for surface
treatment of copper or copper alloys (hereinafter
collectively referred to as "copper"), which is useful in
applications such as the manufacture of printed circuit
boards.
Up to now, conventional printed circuit boards used
extensively in electronic appliances have been built on an
FR-4 grade base material, such as a lamination of a copper
foil, a prepreg, a circuit board for internal layer, another
prepreg, and a copper foil, overlaid in that order. However,
due to the rapidly accelerating trend in recent years toward
packing numerous electronic components tightly onto a board,
thermal resistances that cannot be met by the FR-4 grade
materials are being required since such components tend to
heat up. Meanwhile, as the frequency of electronic signals
passing through a printed circuit board becomes higher and
higher, the base material is required to have reduced levels
of dielectric loss tangent as well as dielectric constant.
Accordingly, instead of ordinary bisphenol-A resin
or novolak type epoxy resin as the impregnating resin for
prepregs, use of resins with higher glass transition
temperatures such as heat-resistant epoxy resin,
bismaleimide-triazine resin, polyphenylene ether, or
polyimide is becoming popular for improving the heat
resistance and the high frequency properties of a printed
circuit board. Further, utilization of these highly heat
resistant materials is also increasing as an inter-layer
insulating material for manufacturing a printed circuit
board via a build-up process. On the other hand, these resins
with high heat resistance, i.e. resins having glass
transition temperatures (as determined by the TMA method;
applicable throughout this specification) of 150°C or higher,
are harder than conventional epoxy resins, and exhibit less
adhesion to a copper foil as they possess a fewer number
of polar groups. Therefore, when such a material is subjected
to severe conditions such as a pressure cooker test where
the material is humidified followed by heating, separation
occurs between the resin and the copper foil to reveal the
shortcomings mentioned.
As a solution to the above problems, for example, a
method is disclosed in Japanese Patent Application Laid-Open
No. 6035/1994 wherein the surface of a copper foil on which
a prepreg is to be applied is first oxidized, then reduced,
and treated further with an aminosilane coupling agent.
However, since the silane coupling agent applied on the
copper surface tends to be washed away in a cleaning process,
it cannot be used for a continuos printed circuit board
manufacturing process based on a horizontal type conveyor
system for which water cleaning is an integral part.
Also, in another method disclosed in Japanese Patent
Application Laid-Open No. 266241/1986, the surface of a
copper foil to which a prepreg is to be applied is first
oxidized, then reduced, and treated further with an
aminotriazole solution or the like. However, as pointed out
in Japanese Patent Application Laid-Open No. 258870/1995,
it has become clear that the aminotriazole treatment is far
from beneficial but detrimental to resin adhesion to the
copper surface.
The present invention has been made in consideration
of the above circumstances and has its objective in providing
for a method for bonding a resin which has a high glass
transition temperature but low affinity to copper surfaces,
with a copper surface with sufficient adhesive strength.
The above objective is achieved in the present
invention, by a method of treating a copper surface to be
bonded with resins having a glass transition temperature
of 150°C or higher, which comprises coating the copper
surface with an aqueous solution containing at least 0.05%
(all percentage figures hereinafter referred to are in %
by weight, unless otherwise specified) of aminotetrazole
or a derivative thereof (hereinafter referred to as the first
aqueous solution), or with an aqueous solution containing
at least 0.05% of aminotetrazole or a derivative thereof,
at least 0.1% of aminotriazole or a derivative thereof
(hereinafter referred to as the second aqueous solution).
Other objects, features and advantages of the
invention will hereinafter become more readily apparent from
the following description.
The object of the surface treatment method in the
present invention is a copper surface to be coated with a
resin having a glass transition temperature of 150°C or
higher as determined by the TMA method in accordance with
the procedures specified in JIS C 6481.
For further improvement in adhesiveness with the
resin, the above copper surface may be roughened by a method
such as an etching method (microetching method),
electroplating method, electroless plating method,
oxidizing method (black oxide, brown oxide), oxidation-reduction
method, brush polishing method, or jet scrubbing
method. Specific examples of the above-mentioned etching
method include a method using MEC Etch Bond CZ-5480 and
CZ-8100 (microetching agents manufactured by MEC Co., Ltd.),
or the like, in addition to etching methods using a sulfuric
acid - hydrogen peroxide type etching agent, persulfuric
acid salt type etching agent, copper chloride type etching
agent, or iron chloride type etching agent.
While there are no limitations for the abovementioned
resins with a glass transition temperature of
150°C or higher, examples of such resins used for printed
circuit boards include heat-resistant epoxy resin,
bismaleimide-triazine resin, polyphenylene ether, and the
like. Furthermore, the method in the present invention can
give excellent effects even when the resin to be bonded has
a glass transition temperature exceeding 200°C and therefore
shows difficulty in obtaining sufficient adhesive strength.
In the surface treatment method of the present
invention, the copper surfaces as described above are coated
with an aqueous solution containing at least 0.05% of
aminotetrazole or an aminotetrazole derivative (the first
aqueous solution), or an aqueous solution containing at
least 0.05% of aminotetrazole or an aminotetrazole
derivative and at least 0.1% of compounds aminotriazole or
an aminotriazole derivative (the second aqueous solution).
First, the following describes the first aqueous
solution.
While examples of such an aminotetrazole derivative
mentioned above include 1-methyl-5-aminotetrazole, 1-ethyl-5-aminotetrazole,
α-benzyl-5-aminotetrazole, β-benzyl-5-aminotetrazole,
and 1-(β-aminoethyl) tetrazole,
other substituent groups may be contained as long as the
desired effect of the present invention is exhibited. The
derivatives may be in the form of hydrates as well. Among
the aminotetrazole or aminotetrazole derivatives mentioned
above, aminotetrazole or those having short-chain alkyl
groups are preferred. These aminotetrazole and
aminotetrazole derivatives may be used either individually
or in combinations of two or more.
The concentration of the aminotetrazole or
aminotetrazole derivatives in the first aqueous solution
is at least 0.05%, preferably between 0.1 to 5%, and more
preferably, between 0.1 to 3%. If the concentration is below
0.05%, the effect in improving adhesiveness to the
above-mentioned resins becomes insufficient. On the other
hand, while there is no particular upper limit, a
concentration higher than 5% will not lead to added
improvement effects but only harm the economics of the
process.
To assist dissolving of aminotetrazole or other
compounds in water or to provide for a uniform treatment
of the copper surfaces, the first aqueous solution may
further contain appropriate amounts of water-soluble
solvents such as alcohol, nonionic surfactants such as
polyethers, ethylene oxide-propylene oxide copolymers
(Pluronic types), and amino type polyethers, metal salts
such as sodium sulfate, ammonium sulfate, ammonium chloride,
and sodium chloride, or ammonia.
Next, the second aqueous solution is described.
When the second aqueous solution is used, unlike the
results disclosed in Japanese Patent Application Laid-Open
No. 258870/1995, aminotriazole or aminotriazole
derivatives do not harm adhesiveness of the resins but
instead improve it, since they are formulated together with
aminotetrazole or aminotetrazole derivatives. In addition
to this effect, use of aminotriazole or aminotriazole
derivatives enables the provision of copper surfaces with
excellent thermal resistance as well as moisture resistance.
As aminotetrazole or aminotetrazole derivative for
the second aqueous solution, compounds similar to those in
the first aqueous solution are used. As preferred
aminotriazole derivatives, for example, 3-amino-5-methyltriazole,
3-amino-5-ethyltriazole, or the like can
be mentioned. However, other substituent groups may be
contained as long as the desired effect of the present
invention is exhibited. These aminotriazole or
aminotriazole derivatives may be used either individually
or in combinations of two or more in the second aqueous
solution.
The concentration of aminotetrazole and/or
aminotetrazole derivatives in the second aqueous solution
is at least 0.05%, preferably between 0.1 to 5%, and more
preferably, between 0.3 to 3%. If the concentration is below
0.05%, the effect in improving adhesiveness to the
above-mentioned resins becomes insufficient. Further,
although there is no particular upper limit, a concentration
higher than 5% will not lead to added improvement effects
but only harm the economics of the process.
The concentration of aminotriazole and/or
aminotriazole derivatives in the second aqueous solution
is at least 0.1%, preferably between 0.3 to 5%, and more
preferably, between 0.3 to 3%. If the concentration is below
0.1%, the effects in improving the thermal resistance and
the moisture resistance of the copper surfaces become
insufficient. While there is no particular upper limit, a
concentration higher than 5% will not lead to added
improvement effects but only harm the economics of the
process.
As with the first aqueous solution, appropriate
amounts of water-soluble solvents, nonionic surfactants,
metallic salts, or ammonia may also be added to the second
aqueous solution.
Also, there are no specific limitations for the method
of applying the above-mentioned first and second aqueous
solutions to the copper surfaces, where a satisfactory
process, for example, comprises coating the copper surface
using techniques such as a spray (shower) method or a dipping
method, followed by rinsing with water and drying.
As described above, the method in the present
invention enables improving adhesiveness to copper surfaces
of resins having high glass transition temperatures.
Therefore, it is extremely useful in the manufacture of
printed circuit boards such as so-called "thin type
multi-layer printed circuit boards" that are built with four
or more layers of substrates, each having a thickness of
0.1 mm or less, or those for use with semiconductor packages.
Additionally, there are occasions where one side of
a printed circuit board having copper circuitry patterns
on both sides is coated first with a resin and heat-cured
(the copper circuitry pattern on the other side being
uncoated as yet), and then the other side is coated with
the resin and heat-cured. Applying the second aqueous
solution on such an occasion provides the uncoated copper
surface with excellent surface protection by imparting heat
resistance and moisture resistance. The excellent surface
protection effect is also available when the bonding of
copper and a resin is performed under high temperature. These
effects become particularly noticeable when the copper
surface is roughened by processes such as microetching and
made ready for oxidation.
Furthermore, use of the method in the present
invention also enables attaining higher peel strength for
conventional epoxy resins such as bisphenol-A type epoxy
resin or novolak type epoxy resin having a glass transition
temperature lower than 150°C, and if the second aqueous
solution is used in addition, provides extra heat resistance
and moisture resistance as well.
Other features of the invention will become apparent
in the course of the following description of the exemplary
embodiments which are given for illustration of the
invention and are not intended to be limiting thereof.
Exterior copper surfaces of copper-plated laminates
for printed circuit boards were etched to a depth of
approximately 3 µm using MEC Etch Bond CZ-8100 (manufactured
by MEC Co., Ltd.). The etching depth was calculated from
the weight of copper removed, surface area, and the density
of the copper. Subsequently, the above etched laminates were
immersed in aqueous solutions prepared with the composition
as listed in Table 1, for 15 seconds at 20°C, rinsed with
water, and then dried. Treatment with the aqueous solution
was not carried out for the Comparative Example 1.
On the laminates prepared as above, two sheets of a
0.1 mm-thick prepreg (GHPL830 manufactured by Mitsubishi
Gas Chemical, Inc.) using bismaleimide-triazine resin with
a glass transition temperature of 170 - 220°C as the
impregnating resin were overlaid and pressed under heat.
The resultant laminates were then allowed to degrade
for 2 hours under conditions of 121°C, a 100% relative
humidity, and 2-atmosphere pressure, immersed subsequently
in molten solder at 260°C, and inspected for inter-layer
peeling between the resin and the copper surface (lifting
of the copper foil from the resin). The evaluation results
are given in Table 1, where ○ denotes no lifting at all,
▵ denotes occurrence of slight lifting (minute spot-like
swellings), X denotes much lifting, and X X, very much
lifting.
The surfaces of electrolytic copper foils were etched
to a depth of approximately 3 µm using MEC Etch Bond CZ-8100
(manufactured by MEC Co., Ltd.). The foils were then immersed
in aqueous solutions prepared with the composition as listed
in Table 1 for 15 seconds at 20°C, rinsed with water, and
then dried.
On the copper foils prepared as above, two sheets of
the aforementioned prepregs using bismaleimide-triazine
resin as the impregnating resin were overlaid and pressed
under heat.
The copper foils on the resultant laminates were
inspected for peel-off strength in accordance with JIS C
6481. Results are given in Table 1.
As with the above peel-off test, the surface of the
electrolytic copper foils was etched, treated with aqueous
solutions with the composition as listed in Table 1, rinsed
with water, and then dried. The resultant copper foils were
then heated to 130°C for 1 hour and inspected for surface
discoloration. The evaluation results are given in Table
1, where ○ denotes no discoloration, ▵ denotes minor
discoloration, X, major discoloration, and X X, severe
discoloration.
As with the above peel-off test, the surface of the
electrolytic copper foils was etched, treated with aqueous
solutions with the composition as listed in Table 1, rinsed
with water, and then dried. The resultant copper foils were
then allowed to stand under conditions of 50°C and 95%
relative humidity for 18 hours, and inspected for surface
discoloration. The evaluation results are given in Table
1, where ○ denotes no discoloration, ▵ denotes minor
discoloration, X, major discoloration, and X X, severe
discoloration.
Except for using a 0.1 mm-thick FR-5 grade equivalent
prepreg (MCL-E-679, manufactured by Hitachi Chemical Co.,
Ltd.) based on heat-resistance epoxy resin with a glass
transition temperature of 173 - 183°C as the impregnating
resin, samples were prepared in the same manner as Examples
1 - 3 to conduct the inter-layer peel test and the peel-off
strength test. Results are given in Table 2. Treatment with
the aqueous solution was not carried out for the Comparative
Example 5.
The results shown in Tables 1 and 2 demonstrate that
the embodiment examples using the first or second aqueous
solution in the present invention can yield superior
inter-layer strength and peel-off strength, and in
particular, heat resistance and moisture resistance are
additionally obtained with the second aqueous solution.
As described in the above, the present invention
provides for a method for bonding a resin which has a high
glass transition temperature but low affinity to copper
surfaces with a copper surface with sufficient adhesive
strength, resulting in a copper-resin composite that has
excellent heat and moisture resistance together with
adhesive strength. The present invention is suitable for
the manufacture of printed circuit boards for which heat
resistance is particularly required.
Obviously, numerous modifications and variations of
the present invention are possible in light of the above
teachings. It is therefore to be understood that, within
the scope of the appended claims, the invention may be
practiced otherwise than as specifically described herein.
Claims (8)
- A method for treating a surface of copper or copper alloys to be bonded with a resin having a glass transition temperature of 150°C or higher as determined by the TMA method, the method comprising coating said surface of copper or copper alloy with an aqueous solution containing at least 0.05% by weight of aminotetrazole or an aminotetrazole derivative.
- The method according to claim 1, wherein the concentration of the aminotetrazole or aminotetrazole derivative is between 0.1 to 5% by weight.
- The method according to claim 1, wherein said resin having a glass transition temperature of 150°C or higher as determined by the TMA method is heat-resistant epoxy resin, polyimide, bismaleimide-triazine resin, or polyphenylene ether.
- The method according to claim 1, wherein said surface of copper or copper alloys is a roughened surface.
- A method for treating a surface of copper or copper alloys to be bonded with a resin having a glass transition temperature of 150°C or higher as determined by the TMA method, the method comprising coating said surface of copper or copper alloy with an aqueous solution containing at least 0.05% by weight of aminotetrazole or an aminotetrazole derivative and at least 0.1% by weight of aminotriazole or an aminotriazole derivative.
- The method according to claim 5, wherein the concentration of the aminotetrazole or aminotetrazole derivative is between 0.1 to 5% by weight and the concentration of the aminotriazole or aminotriazole derivative is between 0.3 to 5%.
- The method according to claim 5, wherein said resin having a glass transition temperature of 150°C or higher as determined by the TMA method is heat-resistant epoxy resin, polyimide, bismaleimide-triazine resin, or polyphenylene ether.
- The method according to claim 5, wherein said surface of copper or copper alloys is a roughened surface.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP198788/97 | 1997-07-24 | ||
JP19878897A JP3909920B2 (en) | 1997-07-24 | 1997-07-24 | Surface treatment methods for copper and copper alloys |
Publications (1)
Publication Number | Publication Date |
---|---|
EP0893947A1 true EP0893947A1 (en) | 1999-01-27 |
Family
ID=16396926
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98113593A Withdrawn EP0893947A1 (en) | 1997-07-24 | 1998-07-21 | Method for surface treatment of copper or copper alloys |
Country Status (6)
Country | Link |
---|---|
US (1) | US6106899A (en) |
EP (1) | EP0893947A1 (en) |
JP (1) | JP3909920B2 (en) |
KR (1) | KR19990013818A (en) |
CN (1) | CN1191005C (en) |
TW (1) | TW514675B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2408277B1 (en) * | 2010-07-16 | 2016-02-17 | Schurter AG | Fuse element |
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KR100319389B1 (en) * | 1999-06-15 | 2002-01-09 | 김충섭 | Organogallium compound, process for the preparation thereof and preparation of gallium nitride film using same |
US7351353B1 (en) * | 2000-01-07 | 2008-04-01 | Electrochemicals, Inc. | Method for roughening copper surfaces for bonding to substrates |
DE10066028C2 (en) * | 2000-07-07 | 2003-04-24 | Atotech Deutschland Gmbh | Copper substrate with roughened surfaces |
JP4309602B2 (en) | 2001-04-25 | 2009-08-05 | メック株式会社 | Method for improving adhesion between copper or copper alloy and resin, and laminate |
DE10302596A1 (en) * | 2002-01-24 | 2003-08-28 | Shipley Company Marlborough | Treatment of metal surfaces with a modified oxide exchange compound |
JP2003257970A (en) * | 2002-02-27 | 2003-09-12 | Nec Electronics Corp | Semiconductor device and wiring structure of the same |
JP4721904B2 (en) * | 2004-02-05 | 2011-07-13 | Jx日鉱日石金属株式会社 | Metal surface treatment agent |
TW200533513A (en) * | 2004-03-25 | 2005-10-16 | Nippon Steel Chemical Co | Surface treatment method for copper foil and method for producing copper-coating laminated board |
TWI328622B (en) | 2005-09-30 | 2010-08-11 | Rohm & Haas Elect Mat | Leveler compounds |
JP4364252B2 (en) | 2007-04-02 | 2009-11-11 | メック株式会社 | Substrate manufacturing method and copper surface treating agent used therefor |
JP5571938B2 (en) * | 2009-11-17 | 2014-08-13 | 日本パーカライジング株式会社 | Copper material surface treatment method and copper material with surface treatment film |
CN103029169B (en) * | 2012-12-21 | 2016-01-20 | 深圳市柳鑫实业股份有限公司 | A kind of boring blind flange of PCB and manufacture method |
WO2015037085A1 (en) * | 2013-09-11 | 2015-03-19 | 四国化成工業株式会社 | Surface treatment agent for copper or copper alloy, and use thereof |
JP7092778B2 (en) * | 2017-09-22 | 2022-06-28 | 四国化成工業株式会社 | Tetrazolesilane compound, method for synthesizing the compound and its use |
EP3567993B1 (en) | 2018-05-08 | 2022-02-23 | Atotech Deutschland GmbH & Co. KG | A method for increasing adhesion strength between a surface of copper or copper alloy and an organic layer, and acidic aqueous non-etching protector solution |
CN111060530B (en) * | 2019-12-25 | 2022-05-13 | 广东生益科技股份有限公司 | Method for evaluating drilling quality of printed circuit board |
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EP2408277B1 (en) * | 2010-07-16 | 2016-02-17 | Schurter AG | Fuse element |
Also Published As
Publication number | Publication date |
---|---|
KR19990013818A (en) | 1999-02-25 |
JP3909920B2 (en) | 2007-04-25 |
CN1211896A (en) | 1999-03-24 |
JPH1143778A (en) | 1999-02-16 |
US6106899A (en) | 2000-08-22 |
CN1191005C (en) | 2005-02-23 |
TW514675B (en) | 2002-12-21 |
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