EP0840243A3 - Method capable of accurately simulating ion implantation at a high speed - Google Patents

Method capable of accurately simulating ion implantation at a high speed Download PDF

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Publication number
EP0840243A3
EP0840243A3 EP97119082A EP97119082A EP0840243A3 EP 0840243 A3 EP0840243 A3 EP 0840243A3 EP 97119082 A EP97119082 A EP 97119082A EP 97119082 A EP97119082 A EP 97119082A EP 0840243 A3 EP0840243 A3 EP 0840243A3
Authority
EP
European Patent Office
Prior art keywords
ion
implanted
renewed
ion implantation
implanted ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP97119082A
Other languages
German (de)
French (fr)
Other versions
EP0840243A2 (en
Inventor
Koichi Sawahata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Electronics Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Publication of EP0840243A2 publication Critical patent/EP0840243A2/en
Publication of EP0840243A3 publication Critical patent/EP0840243A3/en
Withdrawn legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00Computer-aided design [CAD]
    • G06F30/20Design optimisation, verification or simulation
    • G06F30/23Design optimisation, verification or simulation using finite element methods [FEM] or finite difference methods [FDM]
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2111/00Details relating to CAD techniques
    • G06F2111/08Probabilistic or stochastic CAD

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Evolutionary Computation (AREA)
  • General Engineering & Computer Science (AREA)
  • Geometry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)

Abstract

On simulating ion implantation on the basis of Monte Carlo method, a plurality of triangle meshes are produced to a polygonal substrate to be label serial numbers at a first step (S1). An ion is implanted as an implanted ion to the polygonal substrate at a second step (S2). At a third step (S3), the triangle meshes are checked in an ascending order until one of triangle meshes is found as a specific triangle mesh in which the implanted ion is positioned. Point defect concentration is extracted from the specific triangle mesh at a fourth step (S4). Random numbers are generated in order to calculate scattering of the implanted ion a fifth step (S5, S6). The point defect concentration is renewed into a renewed point defect concentration in the specific triangle mesh at a sixth step (S7). The energy, the position, and the travelling direction is renewed in the implanted ion at a seventh step (S8). The third to the seventh steps is repeated until the implanted ion stops in said polygonal substrate.
EP97119082A 1996-10-31 1997-10-31 Method capable of accurately simulating ion implantation at a high speed Withdrawn EP0840243A3 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP08289410A JP3102362B2 (en) 1996-10-31 1996-10-31 Ion implantation simulation method
JP28941096 1996-10-31
JP289410/96 1996-10-31

Publications (2)

Publication Number Publication Date
EP0840243A2 EP0840243A2 (en) 1998-05-06
EP0840243A3 true EP0840243A3 (en) 1999-10-27

Family

ID=17742888

Family Applications (1)

Application Number Title Priority Date Filing Date
EP97119082A Withdrawn EP0840243A3 (en) 1996-10-31 1997-10-31 Method capable of accurately simulating ion implantation at a high speed

Country Status (4)

Country Link
US (1) US5977551A (en)
EP (1) EP0840243A3 (en)
JP (1) JP3102362B2 (en)
KR (1) KR100286734B1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002025930A (en) * 2000-07-13 2002-01-25 Nec Corp Data table preparing method and recording medium
JP3787060B2 (en) 2000-09-11 2006-06-21 株式会社東芝 Monte Carlo ion implantation simulation method, Monte Carlo ion implantation simulator, recording medium storing a Monte Carlo ion implantation simulation program, and semiconductor device manufacturing method
US6735556B2 (en) 2001-06-15 2004-05-11 International Business Machines Corporation Real-time model evaluation
US7302376B2 (en) * 2002-08-15 2007-11-27 International Business Machines Corporation Device modeling for proximity effects
CN100428413C (en) * 2006-05-22 2008-10-22 中芯国际集成电路制造(上海)有限公司 Ion injection simulation method
JP2012043996A (en) * 2010-08-19 2012-03-01 Toshiba Corp Ion implantation simulation program
CN108517559B (en) * 2018-03-07 2020-12-29 电子科技大学 Method for auxiliary control of ion implantation time based on Monte Carlo simulation

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4800100A (en) * 1987-10-27 1989-01-24 Massachusetts Institute Of Technology Combined ion and molecular beam apparatus and method for depositing materials

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
LAUX S E: "On particle-mesh coupling in Monte Carlo semiconductor device simulation", IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS, OCT. 1996, IEEE, USA, vol. 15, no. 10, pages 1266 - 1277, XP000633878, ISSN: 0278-0070 *
LEITNER E ET AL: "3D TCAD at TU Vienna", 3-DIMENSIONAL PROCESS SIMULATION, 3-DIMENSIONAL PROCESS SIMULATION, ERLANGEN, GERMANY, 5 SEPT. 1995, 1995, Wien, Austria, Springer-Verlag, Austria, pages 136 - 161, XP002113075, ISBN: 3-211-82741-2 *
STIPPEL H ET AL: "Adaptive grid for Monte Carlo simulation of ion implantation", WORKSHOP ON NUMERICAL MODELING OF PROCESSES AND DEVICES FOR INTEGRATED CIRCUITS: NUPAD IV (CAT. NO.92TH0424-2), PROCEEDINGS OF 1992 IEEE WORKSHOP ON NUMERICAL MODELING OF PROCESSES AND DEVICES FOR INTEGRATED CIRCUITS: NUPAD IV, SEATTLE, WA, USA, 31 M, 1992, New York, NY, USA, IEEE, USA, pages 231 - 236, XP002113076, ISBN: 0-7803-0516-7 *

Also Published As

Publication number Publication date
KR100286734B1 (en) 2001-05-02
US5977551A (en) 1999-11-02
JPH10135145A (en) 1998-05-22
JP3102362B2 (en) 2000-10-23
EP0840243A2 (en) 1998-05-06
KR19980033339A (en) 1998-07-25

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