EP0821813A4 - Modified poly(maleic anhydride-co-styrene) and related polymers as a base for color filters - Google Patents

Modified poly(maleic anhydride-co-styrene) and related polymers as a base for color filters

Info

Publication number
EP0821813A4
EP0821813A4 EP96913794A EP96913794A EP0821813A4 EP 0821813 A4 EP0821813 A4 EP 0821813A4 EP 96913794 A EP96913794 A EP 96913794A EP 96913794 A EP96913794 A EP 96913794A EP 0821813 A4 EP0821813 A4 EP 0821813A4
Authority
EP
European Patent Office
Prior art keywords
styrene
base
maleic anhydride
color filters
modified poly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP96913794A
Other languages
German (de)
French (fr)
Other versions
EP0821813A1 (en
Inventor
Michael J Pfeiffer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Brewer Science Inc
Original Assignee
Brewer Science Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brewer Science Inc filed Critical Brewer Science Inc
Publication of EP0821813A1 publication Critical patent/EP0821813A1/en
Publication of EP0821813A4 publication Critical patent/EP0821813A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
EP96913794A 1995-04-17 1996-04-15 Modified poly(maleic anhydride-co-styrene) and related polymers as a base for color filters Withdrawn EP0821813A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US431403 1982-09-30
US43140395A 1995-04-17 1995-04-17
PCT/US1996/005192 WO1996033445A1 (en) 1995-04-17 1996-04-15 Modified poly(maleic anhydride-co-styrene) and related polymers as a base for color filters

Publications (2)

Publication Number Publication Date
EP0821813A1 EP0821813A1 (en) 1998-02-04
EP0821813A4 true EP0821813A4 (en) 1998-08-26

Family

ID=23711792

Family Applications (1)

Application Number Title Priority Date Filing Date
EP96913794A Withdrawn EP0821813A4 (en) 1995-04-17 1996-04-15 Modified poly(maleic anhydride-co-styrene) and related polymers as a base for color filters

Country Status (5)

Country Link
EP (1) EP0821813A4 (en)
JP (1) JPH11504128A (en)
KR (1) KR19990007801A (en)
AU (1) AU5664196A (en)
WO (1) WO1996033445A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9713074D0 (en) 1997-06-21 1997-08-27 Cambridge Display Tech Ltd Electrically-conducting colour filters for use in organic light-emitting displays
US5998090A (en) * 1997-12-01 1999-12-07 Brewer Science, Inc. High optical density ultra thin organic black matrix system
JP3742366B2 (en) * 2002-07-26 2006-02-01 独立行政法人物質・材料研究機構 Color wheel forming method
JP4408380B2 (en) 2003-08-20 2010-02-03 富士フイルム株式会社 Negative curable composition, negative color filter and method for producing the same
KR100820525B1 (en) 2005-06-16 2008-04-07 엘지이노텍 주식회사 Method for manufacturing color wheel of using projector
US7550199B2 (en) * 2006-07-31 2009-06-23 E.I. Du Pont De Nemours And Company Copolymers for stain resistance
JP5932435B2 (en) * 2012-03-29 2016-06-08 サカタインクス株式会社 Blue pigment dispersion composition for color filter and blue pigment dispersion resist composition for color filter containing the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0675375A (en) * 1992-08-26 1994-03-18 Sony Corp Color resist material
EP0627663A1 (en) * 1993-05-28 1994-12-07 Nippon Oil Co. Ltd. Substrate having light-shielding layer, method for forming same and liquid crystal display device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS574012A (en) * 1980-06-09 1982-01-09 Canon Inc Production of color filter
US4822718A (en) * 1982-09-30 1989-04-18 Brewer Science, Inc. Light absorbing coating
ATE157465T1 (en) * 1987-01-12 1997-09-15 Brewer Science Inc LIGHT FILTER FOR MICROELECTRONICS
DE69123327T2 (en) * 1990-06-06 1997-04-10 Okuno Chem Ind Co COLOR FILTER COATING MATERIAL FOR LIQUID CRYSTAL DISPLAY, COLOR FILTER MATERIAL, FORMATION OF A COATING AND PRODUCTION OF A COLOR FILTER
JPH06123967A (en) * 1992-08-26 1994-05-06 Fuji Photo Film Co Ltd Photopolymerizable composition, color filter using the same and its production
US5445919A (en) * 1993-06-14 1995-08-29 Fuji Photo Film Co., Ltd. Photopolymerizable composition

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0675375A (en) * 1992-08-26 1994-03-18 Sony Corp Color resist material
EP0627663A1 (en) * 1993-05-28 1994-12-07 Nippon Oil Co. Ltd. Substrate having light-shielding layer, method for forming same and liquid crystal display device

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Section Ch Week 9416, Derwent World Patents Index; Class A89, AN 94-129205, XP002065153 *
See also references of WO9633445A1 *

Also Published As

Publication number Publication date
JPH11504128A (en) 1999-04-06
KR19990007801A (en) 1999-01-25
WO1996033445A1 (en) 1996-10-24
EP0821813A1 (en) 1998-02-04
AU5664196A (en) 1996-11-07

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