EP0658783A2 - Guide d'onde optique plan en matière synthétique - Google Patents

Guide d'onde optique plan en matière synthétique Download PDF

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Publication number
EP0658783A2
EP0658783A2 EP95200388A EP95200388A EP0658783A2 EP 0658783 A2 EP0658783 A2 EP 0658783A2 EP 95200388 A EP95200388 A EP 95200388A EP 95200388 A EP95200388 A EP 95200388A EP 0658783 A2 EP0658783 A2 EP 0658783A2
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EP
European Patent Office
Prior art keywords
clad
optical waveguide
formula
core
optical
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Application number
EP95200388A
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German (de)
English (en)
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EP0658783A3 (fr
Inventor
Saburo Imamura
Tatsuo Izawa
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Nippon Telegraph and Telephone Corp
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Nippon Telegraph and Telephone Corp
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Publication of EP0658783A2 publication Critical patent/EP0658783A2/fr
Publication of EP0658783A3 publication Critical patent/EP0658783A3/fr
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/045—Light guides
    • G02B1/046—Light guides characterised by the core material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31609—Particulate metal or metal compound-containing
    • Y10T428/31612—As silicone, silane or siloxane

Definitions

  • the present invention relates to plastics optical waveguides, more particularly to a plate plastics optical waveguide useful as optical components such as optical couplers or multiplexers for optical communication or image transmission.
  • a base material for optical components or optical fibers generally inorganic substances such as silica glass and multicomponent glass are used because their propagation loss is low and their transmission band is wide.
  • Plastics optical materials used therefore have a good fabrication flexibility and the controllability of optical properties compared with inorganic optical materials, and therefore, much attention has been paid thereon with an expectation that optical waveguides having relatively good characteristics could be produced with ease using them.
  • Representative techniques for producing of plate plastics optical waveguides include a selective photopolymerization and a utilization of a photosensitive resin.
  • the selective photopolymerization method is a technique in which monomers contained in a polymer are selectively polymerized to change the refractive index to make a pattern-like optical waveguide. More particularly, at first a mask having a predetermined pattern is mounted on a polymer sheet or substrate composed of a transparent polymer such as polycarbonate which contains a low refractive index monomer such as methyl acrylate, and the sheet or substrate are irradiated with ultraviolet rays through the mask to selectively polymerize the low refractive index monomer in accordance with the pattern.
  • the photopolymerized portion of the polymer has a lower refractive index than the polymer matrix.
  • the polymer sheet is heated in vacuum to remove unreacted monomers which remain in areas unexposed with ultraviolet rays.
  • unexposed portion of the polymer consists of the high refractive index polymer alone.
  • a patterned sheet can be obtained in which a high refractive index portion serving as a core is formed in accordance with a predetermined pattern.
  • the patterned sheet is sandwiched by a clad composed of a low refractive index polymer to produce an objective optical part.
  • a photosensitive polymer is pattern-wise exposed to a light to cause cross linking selectively, followed by development to remove unexposed portion to obtain a core pattern. More particularly, at first a polymer serving as a clad is coated on a substrate by dipping or spin coating. A polymer such as polyurethane containing a photosensitive cross linking agent is coated on the clad in the same manner as above. Then, the coated polymer is irradiated with ultraviolet rays through patterened mask to selectively crosslink the polymer. Next, the substrate is immersed in a solvent to remove unexposed portion to obtain a core having a predetermined pattern. Finally, a clad material is provided on the core by dipping, spin coating or laminating to form a clad, thus an objective optical part is produced.
  • a film for transmitting a light is of a good quality and patterns formed by microprocessing have a high reliability. That is, it is preferred that the material of the film itself show as low as possible an optical loss, and the thickness and refractive index of the film made of the material can be controlled with a high precision. And further, smoothness of side walls of the core, dimension stability and reproducibility are important factors for the microprocessing of the waveguide fabrication.
  • optical parts produced by the selective photopolymerization method and the method using a photosensitive polymer, respectively show a relatively low optical loss at a shorter wavelength (0.48 to 1.1 ⁇ m).
  • they show a high optical loss as high as 0.5 to 10 dB/cm in an infrared region (1.3 to 1.55 ⁇ m), utilized in optical communication at present, because of higher harmonics of infrared vibrational absorptions due to the carbon-to-hydrogen bonds constituting the plastics, and therefore they are unsuitable for practical use.
  • the both methods are simpler and easier than production of glass optical waveguides.
  • the selective photopolymerization method has some problems, among others, that the content of the monomer varies depending on the conditions of evaporation of the solvent to cause subtle fluctuation of the refractive index difference.
  • the method using a photosensitive polymer has a problem that resolution is poor and that protrusions and depressions tend to occur on the surface of the optical waveguide due to swelling upon development. These are the reasons why the conventional plastics optical waveguides show high optical losses.
  • the present invention has been made in order to obviate the above-described defects of the conventional plastics optical waveguides.
  • a plate plastics optical waveguide comprises: a core portion composed of a polymer containing a deuterium atom or a halogen atom, and a clad portion surrounding the core portion and composed of a polymer having a refractive index lower than a refractive index of the core portion.
  • the core portion may be composed of a deuterated or halogenated polyacrylate having a repeating unit represented by the following formula (I): wherein each of X1 and X2 is a deuterium atom or a halogen atom; R1 is selected from the group consisting of a deuterium atom, a CD3 group and a halogen atom; and R2 is a halogenated or deuterated alkyl group of formula: C n Y 2n-1 (where Y is a halogen atom or a deuterium atom; n is one integer of 1 to 5).
  • formula (I) wherein each of X1 and X2 is a deuterium atom or a halogen atom; R1 is selected from the group consisting of a deuterium atom, a CD3 group and a halogen atom; and R2 is a halogenated or deuterated alkyl group of formula: C n Y 2n-1 (where Y
  • the core portion may be composed of a copolymer of deuterated or halogenated acrylates, the copolymer may have at least two different repeating units represented by the foregoing formula (I), respectively:
  • the core portion may be composed of a deuterated or halogenated polysiloxane having a repeating unit represented by the following formula (II) or (III): wherein each of R3 and R4 is a group of formula C n Y 2n+1 (where Y is a halogen atom or a deuterium atom; n is one integer of 1 to 5) or C6Y5.
  • the core portion may be composed of a copolymer of deuterated or halogenated siloxanes, the copolymer may have at least two different repeating units represented by the foregoing formula (II), respectively, or at least two different repeating units represented by the foregoing formula (III), respectively: the core portion may be composed of the copolymer having the foregoing repeated units (II) and (III).
  • the clad portion may be composed a polymer having a deuterium atom or a halogen atom.
  • the clad portion may be composed a deuterated or halogenated polyacrylate having a repeating unit represented by the following formula (I): wherein each of X1 and X2 is a deuterium atom or a halogen atom; R1 is selected from the group consisting of a heavy hydrogen atom, a CD3 group and a halogen atom; and R2 is a halogenated or deuterated alkyl group of formula: C n Y 2n-1 (where Y is a halogen atom or a deuterium atom; n is one integer of 1 to 5).
  • formula (I) wherein each of X1 and X2 is a deuterium atom or a halogen atom; R1 is selected from the group consisting of a heavy hydrogen atom, a CD3 group and a halogen atom; and R2 is a halogenated or deuterated alkyl group of formula: C n Y 2n-1 (where Y is
  • the clad portion may be composed of copolymer of a deuterated or halogenated acrylates, the copolymer may have at least two different repeating units represented by the foregoing formula (I), respectively:
  • the clad portion may be composed of a deuterated or halogenated polysiloxane having a repeating unit represented by the following formula (II) or (III): wherein each of R3 and R4 is a group of formula C n Y 2n+1 (where Y is a halogen atom or a heavy hydrogen atom; n is one integer of 1 to 5) or C6Y5.
  • the clad portion may be composed of a copolymer of deuterated or halogenated siloxanes, the copolymer may have at least two different repeating units represented by the foregoing formula (II), respectively, or at least two different repeating units represented by the foregoing formula (III), respectively: the clad portion may be composed of a copolymer having the foregoing repeated units (II) and (III).
  • a plate plastics optical waveguide comprises: a substrate, a lower clad portion made of a first polymer and provided on the substrate; a core portion made of a homopolymer or copolymer of dueterated or halogenated acrylates or deuterated or halogenated siloxanes provided on the lower clad portion; and an upper clad portion made of the first polymer, the upper clad portion being provided on the core portion and surrounding the core portion together with the lower clad portion.
  • the first polymer constituting the lower and upper clad portions may be composed of homopolymer or copolymer of deuterated or halogenated acrylates or deuterated or halogenated siloxanes.
  • the most important factor for optical loss of plastics is higher harmonics of infrared vibrational absorption due to the carbon-to-hydrogen bonds constituting the plastics:
  • the hydrogen atoms in the structure of the plastics are substituted with a halogen atom such as fluorine, chlorine and iodine or a deuterium atom in order to reduce the higher harmonics due to the carbon-to-hydrogen bonds and shift them to a longer wavelength region.
  • a halogen atom such as fluorine, chlorine and iodine or a deuterium atom
  • Such optical waveguides as described above can be produced by providing a substrate, forming a plastics film on the substrate, further forming a pattern of photoresist on the plastics film by lithography, and dry etching the substrate in an oxygen- or fluorine-containing gas using the patterned photoresist as a mask. More particularly, a photoresist is coated on a sheet of polymer to be processed and irradiated with actinic rays such as ultraviolet rays, electron beams, and X rays pattern-wise or image-wise. Next, the polymer sheet is immersed in a solvent to develop it to obtain a pattern. The resulting pattern is used as a mask when the underlying polymer is subjected to reactive dry etching in a fluorine- or oxygen-containing gas in order to transfer the pattern to the polymer sheet.
  • a clad material is coated on a substrate 1 to form a layer-like clad 2 (Fig. 1A).
  • a core material composed of an organic polymer is coated on the clad 2 to form a core layer 3 (Fig. 1B).
  • a silicone-based photoresist 4 is coated on the core layer 3, and exposed to actinic rays through a mask 5, followed by development to obtain a mask pattern (Fig. 1D).
  • a clad material 7 which has the same composition as the clad 2 is coated or laminated thereon (Fig. 1G).
  • This production method is advantageous in that patterns of a high resolution and high dimension stability with steep and smooth side walls by the use of reactive ion etching can be obtained in fewer steps with excellent reproducibility.
  • optical waveguides are designed to propagate light in the core utilizing difference in refractive index between their cores and clads.
  • difference in refractive index can be generated by the use of different types of plastics in the core and clad, respectively.
  • the refractive index of the core and/or clad can be controlled by the content of fluorine in the polymer or polymers.
  • Fig. 2 illustrates variation of the refractive index of a copolymer of a deuterated heptafluoroisopropyl methacrylate with a deuterated methyl methacrylate depending on the fluorine content in the polymer.
  • lines A and B indicate refractive indices for lights at wavelengths of 0.6328 ⁇ m and 1.5230 ⁇ m, respectively. In the both cases, the refractive indices decrease linearly with increase of the fluorine content.
  • a monomer mixture composed of 20% by mole of heptafluoroisopropyl methacrylate d-5, which is a monomer whose five hydrogen atoms were each substituted with a deuterium atom, and 80% by mole of perdeuteromethyl methacrylate, which is a monomer all the hydrogen atoms of that were each substituted with a deuterium atom, was polymerized using 2,2'-azobisisobutyronitrile (AIBN) as a polymerization initiator to obtain a copolymer (refractive index: n 1.46).
  • AIBN 2,2'-azobisisobutyronitrile
  • an optical waveguide was produced using the copolymer as a core material and the homopolymer as a clad material as follows.
  • the two polymers were dissolved separately in 1,3-bis(trifluoromethyl)benzene to obtain two solutions, i.e., a core component polymer solution and a clad component polymer solution.
  • the clad component polymer solution was coated to form a layer having a dry thickness of about 10 ⁇ m on a silicon substrate.
  • the coated substrate was heated to 90°C to dry the coated layer, and then the core component polymer solution was coated on the clad component polymer to have a dry thickness of about 8 ⁇ m.
  • a silicone-based photoresist was coated on the core component polymer.
  • the thus-coated substrate was exposed to actinic rays and developed to form a resist pattern.
  • reactive ion etching with oxygen gas was performed to remove the core component polymer other than the pattern portion to give a linear, rectangular pattern of a size of 50 mm long, 8 ⁇ m wide and 8 ⁇ m high.
  • the photoresist thus obtained was immersed in an alkali solution to peel off the photoresist.
  • a clad layer was coated which had the same composition as the underlying clad layer (lower clad layer) to form an upper clad layer.
  • the thickness of upper clad layer on the core was 10 ⁇ m.
  • the optical waveguide thus obtained was irradiated with light at one end thereof and amount of light launched from the other end was measured. From the results of the measurement the optical loss of the optical waveguide was calculated.
  • Fig. 3 illustrates dependence of the optical loss on the wavelength of light used.
  • the optical loss of the optical waveguide was 0.1 dB/cm or less at a wavelength of 1.3 ⁇ m.
  • An optical waveguide was produced using the same two polymers as used in Example 1 but by a different method. That is, the two polymers were separately dissolved in 1,3-bis(trifluoromethyl)benzene to obtain two polymer solutions, i.e., a clad component polymer solution and a core component polymer solution.
  • the clad component polymer solution was coated on a silicon substrate to form a clad layer having a dry thickness of about 15 ⁇ m .
  • a silicone photoresist was coated on the clad and exposed to actinic rays and developed.
  • the thus-treated coated substrate was subjected to reactive ion etching with oxygen gas to provide in the clad a groove of 8 ⁇ m wide and 6 ⁇ m deep.
  • the photoresist was peeled off and the core component polymer solution was coated on the etched clad to form a layer having a dry thickness of 10 ⁇ m. Then, back etching was carried out by reactive ion etching with oxygen gas to remove the core component polymer outside the groove. Finally, the same clad component polymer solution as that used for making the first, i.e., lower, clad layer was coated thereon.
  • an optical waveguide was obtained which had a core with a linear rectangular pattern of 50 mm long, 8 ⁇ m wide and 6 ⁇ m high.
  • a light with a wavelength of 1.3 ⁇ m was inputted from one end of the optical waveguide and amount of light launched from the other end was measured and the optical loss of the optical waveguide was calculated based on the results of the measurement.
  • the optical waveguide had an optical loss of 0.1 dB/cm or less.
  • the two polymers were separately dissolved in methyl isobutyl ketone to obtain two solutions, i.e., a clad component polymer solution and a core component polymer solution.
  • the clad component polymer solution was coated on a silicon substrate to form a clad layer having a dry thickness of about 10 ⁇ m.
  • the core component polymer solution was coated on the clad component polymer to a layer having a dry thickness of about 8 ⁇ m.
  • a thick silicone-based photoresist was coated on the core component polymer to form a pattern.
  • Reactive ion etching with a mixed gas composed CF4 + H2 was performed using the photoresist as a mask to process the core portion to have a linear rectangular pattern of a size of 50 mm long, 8 ⁇ m wide and 8 ⁇ m high. After peeling off the photoresist, finally the same clad component polymer solution as that of the first, i.e., lower, clad was coated on the core portion.
  • the optical waveguide had an optical loss of 0.1 dB/cm or less for each wavelength and proved that it can be used for the production of various optical circuits satisfactorily.
  • the two polymers were separately dissolved in methyl isobutyl ketone to obtain two solutions, i.e., a clad component polymer solution and a core component polymer solution.
  • the clad component polymer solution was coated on a silicon substrate to form a clad layer having a dry thickness of about 10 ⁇ m.
  • a fluorine-containing polymer was coated on the clad component polymer to form a layer having a dry thickness of about 9 ⁇ m.
  • a silicone-based photoresist was coated on the fluorine-containing polymer to form a pattern.
  • Reactive ion etching with a mixed gas composed of CF4 + H2 was performed using the photoresist as a mask to process the clad portion to have a linear rectangular depth pattern of a size of 50 mm long, 8 ⁇ m wide and 9 ⁇ m depth.
  • the core component polymer solution was poured in the groove formed in the etched clad portion.
  • the fluorine-containing polymer was removed by dissolving with a solvent to obtain a core pattern.
  • the same clad component polymer solution as that of the first, i.e., lower, clad was coated on the core portion.
  • the optical waveguide had an optical loss of 0.1 dB/cm or less for each wavelength.
  • the two polymers were separately dissolved in methyl isobutyl ketone to obtain two solutions, i.e., a clad component polymer solution and a core component polymer solution.
  • a clad component polymer solution was coated on a silicon substrate to form a clad layer having a dry thickness of about 10 ⁇ m.
  • the core component polymer was coated on the clad component polymer to form a layer having a dry thickness of about 8 ⁇ m.
  • a thick photoresist layer was formed on the core component polymer to form a pattern.
  • Reactive ion etching with a mixed gas composed of CF4 + H2 was performed using the photoresist as a mask to process the core portion to have a linear rectangular pattern of a size of 50 mm long, 8 ⁇ m wide and 8 ⁇ m high. After peeling off the photoresist, finally the same clad component polymer solution as that of the first, i.e., lower, clad was coated on the core portion.
  • the optical waveguide had an optical loss of 0.1 dB/cm or less for each wavelength.
  • Various plastics optical waveguides were produced in the same manner as in Example 1 or 2 using as a core and a clad polyacrylates having a repeating unit represented by the following formula (I) but having different compositions as shown in Table 1 : wherein each of X1 and X2 is a deuterium atom or a halogen atom; R1 is selected from the group consisting of a deuterium atom, a CD3 group and a halogen atom; and R2 is a halogenated or dueterated alkyl group of formula: C n Y 2n-1 (where Y is a halogen atom or a deuterium atom; n is one integer of/to 5).
  • Table 1 shows chemical structures of the polymers used as cores and clads of the optical waveguides and their optical losses for a light having a wavelength of 1.5 ⁇ m.
  • the optical loss of each optical waveguide was very low, i.e., as low as from 0.04 to 0.11 dB/cm.
  • Table 2 shows chemical structures of the polymers used as cores and clads of the optical waveguides and their optical losses for a light having a wavelength of 1.5 ⁇ m.
  • symbols II and III in the column of "Structure of Main Chain” correspond to the formulae (II) and (III), respectively.
  • the optical loss of each optical waveguide was very low, i.e., as low as from 0.05 to 0.11 dB/cm.
  • an optical waveguide was produced using the polyphenylsilsesquioxane as a core component polymer and the copolymer as a clad component polymer.
  • the two polymers were separately dissolved in methyl isobutyl ketone to obtain two solutions, i.e., a clad component polymer solution and a core component polymer solution.
  • a clad component polymer solution was coated on a silicon substrate to form a clad layer having a dry thickness of about 10 ⁇ m.
  • the core component polymer was coated on the clad component polymer to form a layer having a dry thickness of about 8 ⁇ m.
  • a thick photoresist layer was formed on the core component polymer to form a pattern.
  • Reactive ion etching with a mixed gas composed of CF4 + H2 was performed using the photoresist as a mask to process the core portion to have a linear rectangular pattern of a size of 50 mm long, 8 ⁇ m wide and 8 ⁇ m high. After peeling off the photoresist, finally the same clad component polymer solution as that of the first, i.e., lower, clad was coated on the core portion.
  • the optical waveguide had an optical loss of 0.1 dB/cm or less for each wavelength.
  • the two polymers were separately dissolved in methyl isobutyl ketone to obtain two solutions, i.e., a clad component polymer solution and a core component polymer solution.
  • a clad component polymer solution was coated on a silicon substrate to form a clad layer having a dry thickness of about 10 ⁇ m .
  • the core component polymer was coated on the clad component polymer to form a layer having a dry thickness of about 8 ⁇ m.
  • a thick photoresist layer was formed on the core component polymer to form a pattern.
  • Reactive ion etching with a mixed gas composed of CF4 + H2 was performed using the photoresist as a mask to process the core portion to have a linear rectangular pattern of a size of 50 mm long, 8 ⁇ m wide and 8 ⁇ m high. After peeling off the photoresist, finally the same clad component polymer solution as that of the first, i.e., lower, clad was coated on the core portion.
  • the optical waveguide had an optical loss of 0.1 dB/cm or less for each wavelength.
  • Plate plastics optical waveguides each including a clad portion composed of a polyacrylate having a repeating unit represented by the foregoing formula (I) and a core portion composed of a deuterated or halogenated polystryrene resine having a repeating unit represented by wherein Y is a halogen atom or deuterium, or polysiloxane having a repeated unit represented by the foregoing general formula (III).
  • Table 3 shows chemical structures of the polymers used as cores and clads of the optical waveguides and their optical losses for a light having a wavelength of 1.3 ⁇ m.
  • the optical loss of each optical waveguide was very low, i.e., as low as from 0.08 to 0.09 dB/cm.
  • Copolymers which have at least two different repeating units each represented by the foregoing formula (I), of deuterated or halogenated acrylates can be used as a material for the core portion and the clad portion.
  • copolymers having at least two different repeating units each represented by the foregoing formulae (II) and/or (III), of deuterated or halogenated siloxanes can be used as a material for the core portion and the clad portion.
  • the plate plastics optical waveguide of the present invention has superior light transmission characteristics in a region of from visible to near infrared region to the conventional ones.
  • the plate plastics optical waveguide of the present invention can be used as being connected to multicomponent glass or silica optical fiber without resort to light/electricity conversion or electricity/light conversion. Therefore, it has an advantage that optical parts produced by using the optical waveguide of the present invention can be used for constructing highly economical optical signal transmission systems such a local area network and the like.
EP95200388A 1989-09-27 1990-09-25 Guide d'onde optique plan en matière synthétique. Withdrawn EP0658783A3 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP249180/89 1989-09-27
JP24918089 1989-09-27
EP90310503A EP0420592B1 (fr) 1989-09-27 1990-09-25 Guide d'onde optique plan en matière synthétique

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
EP90310503.9 Division 1990-09-25

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EP0658783A2 true EP0658783A2 (fr) 1995-06-21
EP0658783A3 EP0658783A3 (fr) 1997-02-26

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EP90310503A Expired - Lifetime EP0420592B1 (fr) 1989-09-27 1990-09-25 Guide d'onde optique plan en matière synthétique
EP95200386A Expired - Lifetime EP0658782B1 (fr) 1989-09-27 1990-09-25 Guide d'onde optique plan en matière synthétique
EP95200388A Withdrawn EP0658783A3 (fr) 1989-09-27 1990-09-25 Guide d'onde optique plan en matière synthétique.

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EP90310503A Expired - Lifetime EP0420592B1 (fr) 1989-09-27 1990-09-25 Guide d'onde optique plan en matière synthétique
EP95200386A Expired - Lifetime EP0658782B1 (fr) 1989-09-27 1990-09-25 Guide d'onde optique plan en matière synthétique

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US (1) US5062680A (fr)
EP (3) EP0420592B1 (fr)
KR (1) KR940000088B1 (fr)
CA (1) CA2026042C (fr)
DE (2) DE69029357T2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
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EP1845109A2 (fr) * 1999-06-21 2007-10-17 E.I. Du Pont de Nemours and Company Dispositifs optiques réalisés à partir de compositions fluorées durcissables par radiation

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US5170461A (en) * 1991-12-11 1992-12-08 Hoechst Celanese Corp. Polymeric electrooptic waveguide devices using a polymeric substrate
US5271083A (en) * 1992-07-27 1993-12-14 Motorola, Inc. Molded optical waveguide with contacts utilizing leadframes and method of making same
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JP3796775B2 (ja) * 1994-10-17 2006-07-12 住友電気工業株式会社 シリカガラスの高屈折率化の方法
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EP0658782A2 (fr) 1995-06-21
EP0420592A3 (en) 1992-03-04
DE69029357T2 (de) 1997-04-24
DE69029357D1 (de) 1997-01-23
EP0420592A2 (fr) 1991-04-03
EP0420592B1 (fr) 1996-12-11
KR910006740A (ko) 1991-04-29
CA2026042A1 (fr) 1991-03-28
EP0658783A3 (fr) 1997-02-26
KR940000088B1 (ko) 1994-01-05
EP0658782A3 (fr) 1995-12-06
EP0658782B1 (fr) 2000-05-24
DE69033555D1 (de) 2000-06-29
CA2026042C (fr) 1996-02-27
US5062680A (en) 1991-11-05
DE69033555T2 (de) 2001-01-18

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