EP0581311A3 - Alkali developable photosensitive resin composition. - Google Patents

Alkali developable photosensitive resin composition. Download PDF

Info

Publication number
EP0581311A3
EP0581311A3 EP19930112266 EP93112266A EP0581311A3 EP 0581311 A3 EP0581311 A3 EP 0581311A3 EP 19930112266 EP19930112266 EP 19930112266 EP 93112266 A EP93112266 A EP 93112266A EP 0581311 A3 EP0581311 A3 EP 0581311A3
Authority
EP
European Patent Office
Prior art keywords
resin composition
photosensitive resin
developable photosensitive
alkali developable
alkali
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP19930112266
Other languages
German (de)
French (fr)
Other versions
EP0581311A2 (en
Inventor
Seiji Arimatsu
Katsuji Konishi
Yoshifumi Ichinose
Takakazu Hase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Publication of EP0581311A2 publication Critical patent/EP0581311A2/en
Publication of EP0581311A3 publication Critical patent/EP0581311A3/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
EP19930112266 1992-07-31 1993-07-30 Alkali developable photosensitive resin composition. Withdrawn EP0581311A3 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP204933/92 1992-07-31
JP4204933A JPH0651505A (en) 1992-07-31 1992-07-31 Alkali-developable photosensitive resin composition

Publications (2)

Publication Number Publication Date
EP0581311A2 EP0581311A2 (en) 1994-02-02
EP0581311A3 true EP0581311A3 (en) 1994-11-17

Family

ID=16498763

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19930112266 Withdrawn EP0581311A3 (en) 1992-07-31 1993-07-30 Alkali developable photosensitive resin composition.

Country Status (3)

Country Link
US (1) US5397675A (en)
EP (1) EP0581311A3 (en)
JP (1) JPH0651505A (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9319961D0 (en) * 1993-09-28 1993-11-17 Horsell Plc Photopolymerisable composition
TW308628B (en) * 1995-12-27 1997-06-21 Toyowa Kogyo Kk A rodless power cylinder
US6025408A (en) * 1997-03-27 2000-02-15 First Chemical Corporation Liquid thioxanthone photoinitiators
JP4040217B2 (en) * 1998-08-14 2008-01-30 富士フイルム株式会社 Method for producing planographic printing plate and photosensitive resin composition
US6884561B2 (en) * 2000-01-12 2005-04-26 Anocoil Corporation Actinically imageable and infrared heated printing plate
JP2005250094A (en) * 2004-03-04 2005-09-15 Konica Minolta Medical & Graphic Inc Method for making lithographic printing plate
JP2005274694A (en) * 2004-03-23 2005-10-06 Konica Minolta Medical & Graphic Inc Method for making lithographic printing plate
JP4657899B2 (en) * 2005-11-30 2011-03-23 富士通株式会社 Resist pattern thickening material, resist pattern forming method, semiconductor device and manufacturing method thereof
US7833660B1 (en) 2006-09-07 2010-11-16 The United States Of America As Represented By The Secretary Of The Army Fluorohaloborate salts, synthesis and use thereof
US7820323B1 (en) 2006-09-07 2010-10-26 The United States Of America As Represented By The Secretary Of The Army Metal borate synthesis process
CN102285269A (en) * 2011-05-25 2011-12-21 乐凯华光印刷科技有限公司 Photopolymerization type lithographic plate main body

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0386780A2 (en) * 1989-03-10 1990-09-12 Nippon Paint Co., Ltd. Photosensitive composition

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3730783A1 (en) * 1987-09-13 1989-03-23 Hoechst Ag POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL THEREOF
US5229244A (en) * 1990-08-08 1993-07-20 E. I. Du Pont De Nemours And Company Dry processible photosensitive composition including photo-acid generator and optically clear polymer (co-polymer) blend that becomes tacky upon exposure to actinic radiation

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0386780A2 (en) * 1989-03-10 1990-09-12 Nippon Paint Co., Ltd. Photosensitive composition

Also Published As

Publication number Publication date
US5397675A (en) 1995-03-14
JPH0651505A (en) 1994-02-25
EP0581311A2 (en) 1994-02-02

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Legal Events

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