EP0506552B1 - Method of treating for instance a substrate surface by projecting a plasma flow and apparatus for carrying out the method - Google Patents

Method of treating for instance a substrate surface by projecting a plasma flow and apparatus for carrying out the method Download PDF

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Publication number
EP0506552B1
EP0506552B1 EP92400803A EP92400803A EP0506552B1 EP 0506552 B1 EP0506552 B1 EP 0506552B1 EP 92400803 A EP92400803 A EP 92400803A EP 92400803 A EP92400803 A EP 92400803A EP 0506552 B1 EP0506552 B1 EP 0506552B1
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EP
European Patent Office
Prior art keywords
chamber
ejection nozzle
slit
outlet
coating
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EP92400803A
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German (de)
French (fr)
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EP0506552A1 (en
Inventor
Martin Hermann Lang
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Agence Spatiale Europeenne
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Agence Spatiale Europeenne
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • B05B7/22—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc
    • B05B7/222—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc
    • B05B7/226—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc the material being originally a particulate material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles

Definitions

  • the present invention relates to a method for treating for example the surface of a substrate by projection of a plasma flow, of the type consisting in creating an electric arc in a chamber between a cathode and an anode, in introducing an inert gas into the chamber so that it is ionized as it passes through the electric arc to form a plasma at high temperature, and to eject the plasma outside the chamber through an ejection nozzle whose orifice outlet is slotted.
  • the aforementioned technique by plasma spraying offers certain advantages, in particular that of being able to reach high temperatures (of the order of 5,000 to 15,000 ° C ) and to obtain specific energy densities which make it possible to melt any material which has a stable melting phase. It is thus possible to apply in particular this technique to ceramics which have high melting points.
  • the plasma projection devices currently used have limited possibilities due to the constraints inherent in the principle of their operation, which allow only certain forms of projection, essentially conical, to be obtained between the outlet of the nozzle and the substrate to be put on.
  • the surface projected onto the substrate cannot have a polygonal, in particular rectangular, shape.
  • this article proposes a compromise which consists in giving a form of slit to the outlet orifice of the ejection nozzle and in providing two diametrically opposite inlets for injecting the pulverulent material inside the nozzle.
  • the invention aims in particular to perfect such a plasma spraying process in order to overcome the aforementioned drawbacks while providing other advantages.
  • the invention provides a method of the aforementioned type which is characterized in that it consists in creating an electric arc between the anode and the cathode along an axis substantially parallel to the axis of the outlet slot of the ejection nozzle.
  • the inert gas is introduced into the chamber in several radial directions relative to the axis of the electric arc.
  • the material constituting the coating to be deposited on the substrate is conveyed by a carrier gas, and it is either injected with the inside the ejection nozzle, or ejected at the outlet of the nozzle in a direction substantially parallel to the direction of the plasma flow at the outlet of the ejection nozzle.
  • the invention also relates to a device for implementing the method according to the invention of the type comprising at least one chamber with a cathode and an anode, means for creating an electric arc inside the chamber between the cathode and the anode, at least one inlet duct for an inert gas ionizable by the electric arc to form a high temperature plasma, an ejection nozzle with a slit-shaped outlet orifice and an inlet orifice which communicates with the room, device characterized in that the room is elongated with two end surfaces by which the cathode and the anode respectively protrude axially aligned with each other to create an electric arc along an axis substantially parallel to the axis of the outlet slot of the ejection nozzle.
  • inert gas inlet conduits open inside the chamber in several radial directions relative to the axis of the electric arc created between the cathode and the anode, these conduits opening into the chamber through orifices which are distributed over several rows aligned along the axis of the electric arc.
  • At least one inlet duct for the material in powder form opens either inside the ejection nozzle or outside of the latter in a direction substantially parallel to the direction of the plasma flow at the outlet of the ejection nozzle.
  • the improvements brought by the invention are capable of improving in particular this protective function, in particular thanks to the possibility which is offered to apply this spraying technique to materials with a high melting point.
  • the spraying technique as perfected by the invention is not limited to depositing a coating on a substrate, but it can also be used to modify the surface properties of various materials, such as for example to remove a layer of oxide on the surface of a material by a hot treatment of this surface.
  • the device for implementing the method as a heat source in welding devices or in plasma blowers for example.
  • the device as schematically represented in FIG. 1 makes it possible to implement a conventional spraying process for depositing a coating on a substrate by plasma spraying.
  • a copper anode 1 delimits a chamber 2, the two end surfaces of which form the inlet and the outlet of the chamber respectively.
  • the inlet of chamber 2 is flared outwards, and its outlet is extended by an ejection nozzle 3 with an outlet orifice 4 of circular section.
  • a cathode 5 in the form of a stick generally made of thoriated tungsten is axially aligned with the anode 1, with a free end which penetrates into the flared part forming the entrance to chamber 2.
  • a conduit 10 opens in the vicinity of the cathode 5 to introduce along the axis of chamber 2 an ionizable inert gas, such as Argon for example.
  • a conduit 12 opens radially into the ejection nozzle 3 to inject inside thereof a material in powder form conveyed by a carrier gas.
  • the device is supplemented by a direct current source 14 connected to the electrodes 1 and 5, cooling means (not shown) of the anode 1, and additional means for satisfying and optimizing the operating conditions necessary for the implementation.
  • a direct current source 14 connected to the electrodes 1 and 5, cooling means (not shown) of the anode 1, and additional means for satisfying and optimizing the operating conditions necessary for the implementation.
  • additional means for satisfying and optimizing the operating conditions necessary for the implementation such as for example the presence of a magnetic field to position, stabilize and tighten the plasma jet inside the chamber 2, this magnetic field being for example obtained by means of a coil 15 mounted around anode 1.
  • an electric arc is created between the cathode 5 and the anode 1
  • the inert gas is introduced coaxially with the electric arc and its passage through the latter causes its ionization thus creating a high temperature plasma inside the chamber 2.
  • This plasma flows inside the chamber 2 and is accelerated through the ejection nozzle 3.
  • the particles of the pulverulent material brought in through the conduit 12 are injected into the plasma jet flowing inside the nozzle 3, and they melt under the action of the high temperature of the plasma jet. The particles thus melted are ejected through the outlet orifice of the nozzle and projected onto the substrate 17 to form a coating layer 18.
  • FIGS. 2 and 3 The improvements made according to the invention are schematically illustrated in FIGS. 2 and 3.
  • the chamber 2 and the ejection nozzle 3 are no longer coaxially aligned as before, and the outlet orifice 4 of the nozzle is in the form of a slot. More specifically, the chamber 2 extends parallel to the outlet slot 4 of the ejection nozzle 3 and over a length substantially equal to that of the slot.
  • the ejection nozzle 3 is divergent and has in cross section a frusto-conical shape, with an inlet slot 6 which opens into the chamber 2 over the entire length thereof.
  • the chamber has two end surfaces or walls 2a and 2b respectively crossed by the anode 1 and the cathode 5. These two electrodes 1 and 5 are each in the form of a stick, and they are axially aligned with each other . In a similar way to the device represented in FIG. 1, the electrodes 1 and 5 are connected to a source of direct current, the chamber 2 is surrounded by a coil 15 and cooling means (not shown) surround the chamber 2.
  • the inert gas is introduced into the chamber 2 through a set of orifices 20 distributed around and along the chamber. More specifically, in the example considered here, at least three rows 20a, 20b and 20c of holes 20 are provided.
  • the rows 20a and 20b are diametrically opposite and located respectively on either side of the entry slot 6 of the ejection nozzle 3, while the row 20c is diametrically opposite this inlet slot.
  • the directions of introduction F1 of the inert gas into the chamber 2 and the direction F2 of the plasma outlet generally form a Greek cross with four branches (FIG. 3).
  • Each orifice 20 of the same row 20a, 20b and 20c is connected by a connecting conduit 21 to an intermediate conduit 22 which communicates with a main conduit 23 connected to a supply source (not shown) of inert gas.
  • conduits 12 which open into the ejection nozzle 3 to inject the pulverulent material there.
  • These conduits 12 are for example aligned in two opposite rows 12a and 12b which extend parallel to the outlet slot 4 of the ejection nozzle 4 (FIG. 2).
  • the device according to the invention generally uses all of the means necessary for implementing a conventional spraying process by plasma spraying, but according to different arrangements and forms.
  • the electric arc created between the electrodes 1 and 5 extends substantially along the axis of the chamber 2, that is to say parallel to the outlet slot 4 of the nozzle, and the inert gas is introduced into the chamber in several directions distributed in particular along and around the chamber and which converge radially and not coaxially towards the axis of the electric arc and along it.
  • the body 3a of the ejection nozzle 3 comprises two additional outlet slots 4 ′ which extend substantially over the entire length of the outlet slot 4.
  • These two slots 4 ′ are located on either side of the slot 4, and they each form the outlet orifice of a cavity 13 formed inside the body 3a of the ejection nozzle 3.
  • In these two cavities 13 open respectively two rows 12a and 12b of conduits 12 of arrival of the material to be projected onto the substrate, so as to eject the material through these slots 4 ′ in a direction F3 substantially parallel to the direction F2 of the plasma flow at the outlet of the slot 4 of the ejection nozzle 3.
  • the particles of the material are no longer mixed with the plasma inside the ejection nozzle 3, but at the outlet of the latter, that is to say in an area where the temperature of the plasma is lower. This avoids subjecting the materials intended to form the coating to very high plasma temperatures inside the ejection nozzle 3. It is then possible to be able to use materials, such as plastics and polymers by example, that is to say materials which are not sufficiently heat resistant to be introduced inside the nozzle 3.
  • the invention is in no way limited to the embodiment described above and given only by way of example in the case of the deposition of a coating on a substrate.
  • the plasma flow at the outlet of the ejection nozzle constitutes a heat source which can be used to carry out surface treatments without necessarily projecting a material onto the surfaces to be treated.

Description

La présente Invention concerne un procédé pour traiter par exemple la surface d'un substrat par projection d'un flux de plasma, du type consistant à créer un arc électrique dans une chambre entre une cathode et une anode, à introduire un gaz inerte dans la chambre afin qu'il soit ionisé à son passage au travers de l'arc électrique pour former un plasma à haute température, et à éjecter à l'extérieur de la chambre le plasma au travers d'une buse d'éjection dont l'orifice de sortie est en forme de fente.The present invention relates to a method for treating for example the surface of a substrate by projection of a plasma flow, of the type consisting in creating an electric arc in a chamber between a cathode and an anode, in introducing an inert gas into the chamber so that it is ionized as it passes through the electric arc to form a plasma at high temperature, and to eject the plasma outside the chamber through an ejection nozzle whose orifice outlet is slotted.

Dans le cas où le traitement de surface consiste à déposer un revêtement sur un substrat, le matériau constitutif de ce revêtement est généralement sous forme pulvérulente, et les particules du matériau sont mélangées au flux de plasma pour passer à l'état fondu avant d'être projetées sur le substrat.In the case where the surface treatment consists in depositing a coating on a substrate, the material constituting this coating is generally in powder form, and the particles of the material are mixed with the plasma flow to pass in the molten state before be projected onto the substrate.

Parmi les techniques de pulvérisation utilisées pour former le dépôt d'un revêtement sur un substrat, la technique précitée par projection au plasma offre certains avantages, notamment celui de pouvoir atteindre de hautes températures (de l'ordre de 5 000 à 15 000 °C) et d'obtenir des densités d'énergie spécifiques qui permettent de faire fondre tout matériau qui a une phase de fusion stable. Il est ainsi possible d'appliquer notamment cette technique aux céramiques qui ont des points de fusion élevés.Among the spraying techniques used to form the deposit of a coating on a substrate, the aforementioned technique by plasma spraying offers certain advantages, in particular that of being able to reach high temperatures (of the order of 5,000 to 15,000 ° C ) and to obtain specific energy densities which make it possible to melt any material which has a stable melting phase. It is thus possible to apply in particular this technique to ceramics which have high melting points.

Toutefois, les dispositifs de projection au plasma actuellement utilisés ont des possibilités limitées du fait des contraintes inhérentes au principe de leur fonctionnement, qui ne permettent d'obtenir que certaines formes de projection, essentiellement coniques, entre la sortie de la buse et le substrat à revêtir.However, the plasma projection devices currently used have limited possibilities due to the constraints inherent in the principle of their operation, which allow only certain forms of projection, essentially conical, to be obtained between the outlet of the nozzle and the substrate to be put on.

Il en résulte que la surface projetée sur le substrat ne peut pas avoir une forme polygonale, en particulier rectangulaire. En outre, pour certaines applications et dans le but de limiter le nombre de passes nécessaires au dépôt d'un revêtement d'une épaisseur déterminée, il serait souhaitable de pouvoir élargir la couche déposée à chaque passe.As a result, the surface projected onto the substrate cannot have a polygonal, in particular rectangular, shape. In addition, for certain applications and in order to limit the number of passes necessary for depositing a coating of a determined thickness, it would be desirable to be able to widen the layer deposited on each pass.

On a donc cherché à pallier ces limitations pour essayer d'obtenir d'autres formes de projection avec, si possible, augmentation de la largeur de la couche déposée après chaque passe.We therefore sought to overcome these limitations in order to try to obtain other forms of projection with, if possible, increasing the width of the layer deposited after each pass.

Or, dans un article intitulé "BUSE DE PROJECTION AU PLASMA AVEC ORIFICE DE SORTIE EN FORME DE FENTE" paru en 1979 dans la revue anglaise "WELDING PRODUCTION", vol. 26, N° 12, pages 35-37, une étude tend à montrer qu'une augmentation du diamètre de l'orifice de sortie de la buse d'éjection n'entraîne en réalité qu'une très légère augmentation de la largeur de la couche déposée, à condition toutefois de prévoir au moins deux entrées diamétralement opposées d'injection du matériau pulvérulent dans la buse. En outre, l'augmentation du diamètre de l'orifice de sortie de la buse est de toute manière limitée, car elle entraîne un abaissement de la température du jet de plasma qui peut être nuisible au passage à l'état fondu des particules du matériau injectées dans le plasma. En conclusion, cet article propose un compromis qui consiste à donner une forme de fente à l'orifice de sortie de la buse d'éjection et à prévoir deux entrées diamétralement opposées d'injection du matériau pulvérulent à l'intérieur de la buse.However, in an article entitled "PLASMA SPRAY NOZZLE WITH SLIT SHAPED OUTLET" published in 1979 in the English review "WELDING PRODUCTION", vol. 26, No. 12, pages 35-37, a study tends to show that an increase in the diameter of the outlet orifice of the ejection nozzle actually results in only a very slight increase in the width of the deposited layer, provided, however, that at least two diametrically opposite inlets are provided for injecting the pulverulent material into the nozzle. In addition, the increase in the diameter of the nozzle outlet orifice is in any case limited, since it results in a lowering of the temperature of the plasma jet which can be detrimental to the passage of the particles of the material in the molten state. injected into the plasma. In conclusion, this article proposes a compromise which consists in giving a form of slit to the outlet orifice of the ejection nozzle and in providing two diametrically opposite inlets for injecting the pulverulent material inside the nozzle.

Néanmoins, selon la Demanderesse, une telle solution n'est pas sans présenter des inconvénients. En effet, le passage d'une forme cylindrique à une forme tronconique entre la sortie de la chambre et l'entrée de la buse d'éjection, entraîne des modifications dans la vitesse d'écoulement du plasma qui ne permettent pas d'obtenir le dépôt d'une couche ayant en tout point des caractéristiques uniformes. Concrètement, la Demanderesse considère que ces inconvénients sont inhérents au fait que le gaz inerte introduit dans la chambre s'écoule coaxialement à l'arc électrique créé entre la cathode et l'anode.However, according to the Applicant, such a solution is not without its drawbacks. Indeed, the passage from a cylindrical shape to a frustoconical shape between the outlet of the chamber and the inlet of the ejection nozzle, causes modifications in the plasma flow speed which do not allow obtaining the deposition of a layer having at all points uniform characteristics. Concretely, the Applicant considers that these drawbacks are inherent in the fact that the inert gas introduced into the chamber flows coaxially with the electric arc created between the cathode and the anode.

D'une manière générale, l'Invention a notamment pour but de perfectionner un tel procédé de projection au plasma afin de pallier les inconvénients précités tout en procurant d'autres avantages.In general, the invention aims in particular to perfect such a plasma spraying process in order to overcome the aforementioned drawbacks while providing other advantages.

A cet effet, l'Invention propose un procédé du type précité qui se caractérise en ce qu'il consiste à créer un arc électrique entre l'anode et la cathode suivant un axe sensiblement parallèle à l'axe de la fente de sortie de la buse d'éjection.To this end, the invention provides a method of the aforementioned type which is characterized in that it consists in creating an electric arc between the anode and the cathode along an axis substantially parallel to the axis of the outlet slot of the ejection nozzle.

Selon une autre caractéristique du procédé suivant l'Invention, le gaz inerte est introduit dans la chambre suivant plusieurs directions radiales par rapport à l'axe de l'arc électrique.According to another characteristic of the process according to the invention, the inert gas is introduced into the chamber in several radial directions relative to the axis of the electric arc.

Selon encore une autre caractéristique du procédé suivant l'Invention dans le cas du dépôt d'un revêtement sur un substrat, le matériau constitutif du revêtement à déposer sur le substrat est véhiculé par un gaz porteur, et il est, soit injecté à l'intérieur de la buse d'éjection, soit éjecté à la sortie de la buse suivant une direction sensiblement parallèle à la direction du flux de plasma en sortie de la buse d'éjection.According to yet another characteristic of the process according to the invention in the case of the deposition of a coating on a substrate, the material constituting the coating to be deposited on the substrate is conveyed by a carrier gas, and it is either injected with the inside the ejection nozzle, or ejected at the outlet of the nozzle in a direction substantially parallel to the direction of the plasma flow at the outlet of the ejection nozzle.

L'Invention concerne également un dispositif de mise en oeuvre du procédé conforme à l'Invention du type comprenant au moins une chambre avec une cathode et une anode, des moyens pour créer un arc électrique à l'intérieur de la chambre entre la cathode et l'anode, au moins un conduit d'arrivée d'un gaz inerte ionisable par l'arc électrique pour former un plasma à haute température, une buse d'éjection avec un orifice de sortie en forme de fente et un orifice d'entrée qui communique avec la chambre, dispositif caractérisé en ce que la chambre est de forme allongée avec deux surfaces d'extrémité par lesquelles font respectivement saillie la cathode et l'anode axialement alignées l'une avec l'autre pour créer un arc électrique suivant un axe sensiblement parallèle à l'axe de la fente de sortie de la buse d'éjection.The invention also relates to a device for implementing the method according to the invention of the type comprising at least one chamber with a cathode and an anode, means for creating an electric arc inside the chamber between the cathode and the anode, at least one inlet duct for an inert gas ionizable by the electric arc to form a high temperature plasma, an ejection nozzle with a slit-shaped outlet orifice and an inlet orifice which communicates with the room, device characterized in that the room is elongated with two end surfaces by which the cathode and the anode respectively protrude axially aligned with each other to create an electric arc along an axis substantially parallel to the axis of the outlet slot of the ejection nozzle.

Selon une autre caractéristique du dispositif de mise en oeuvre du procédé suivant l'Invention, plusieurs conduits d'arrivée de gaz inerte débouchent à l'intérieur de la chambre suivant plusieurs directions radiales par rapport à l'axe de l'arc électrique créé entre la cathode et l'anode, ces conduits débouchant dans la chambre par des orifices qui sont répartis sur plusieurs rangées alignées suivant l'axe de l'arc électrique.According to another characteristic of the device for implementing the method according to the invention, several inert gas inlet conduits open inside the chamber in several radial directions relative to the axis of the electric arc created between the cathode and the anode, these conduits opening into the chamber through orifices which are distributed over several rows aligned along the axis of the electric arc.

Selon une autre caractéristique du dispositif, la chambre s'étend parallèlement à la fente de sortie de la buse d'éjection et sensiblement sur toute la longueur de celle-ci, la buse comportant un orifice d'entrée également en forme de fente qui communique avec la chambre sur toute la longueur de celle-ci.According to another characteristic of the device, the chamber extends parallel to the outlet slot of the ejection nozzle and substantially over the entire length of the latter, the nozzle comprising an inlet orifice also in the form of a slot which communicates with the chamber along its entire length.

Selon encore une autre caractéristique du dispositif appliqué au dépôt d'un revêtement sur un substrat par exemple, au moins un conduit d'arrivée du matériau sous forme pulvérulente débouche soit à l'intérieur de la buse d'éjection, soit à l'extérieur de celle-ci suivant une direction sensiblement parallèle à la direction du flux de plasma en sortie de la buse d'éjection.According to yet another characteristic of the device applied to the deposition of a coating on a substrate for example, at least one inlet duct for the material in powder form opens either inside the ejection nozzle or outside of the latter in a direction substantially parallel to the direction of the plasma flow at the outlet of the ejection nozzle.

Ainsi, avec un tel procédé perfectionné de projection au plasma, il est notamment possible de déposer des bandes de revêtement plus larges que celles obtenues auparavant, avec des qualités de dépôt uniformes en tout point de la surface de chaque bande déposée.Thus, with such an improved plasma spraying process, it is in particular possible to deposit coating strips which are wider than those obtained previously, with uniform deposit qualities at any point on the surface of each deposited strip.

Les revêtements ainsi réalisés assurent le plus souvent une fonction de protection du substrat contre l'environnement ambiant. A l'heure actuelle, bon nombre d'applications dans la plupart des domines de l'industrie (aérospatiale, automobile, électronique,...) nécessitent la fabrication de matériels et/ou composants qui doivent fonctionner dans un environnement protégé.The coatings thus produced most often provide a protective function of the substrate against the ambient environment. At present, a good number of applications in most of the domines of industry (aerospace, automotive, electronics, ...) requires the manufacture of equipment and / or components which must operate in a protected environment.

Or, les perfectionnements apportés par l'Invention sont de nature à améliorer en particulier cette fonction de protection, notamment grâce à la possibilité qui est offerte d'appliquer cette technique de pulvérisation à des matériaux à point de fusion élevé. En outre, selon l'Invention, il est possible d'obtenir des formes de projection qui ne sont pas des surfaces de révolution, tout en conférant au revêtement des propriétés uniformes en tout point de sa surface et correspondant aux paramètres caractéristiques suivants donnés à titre d'exemple : la microstructure, l'épaisseur, la dureté, la ténacité, la résistance d'adhésion, la porosité, la résistance à l'usure la rigidité diélectrique, l'isolation thermique, la résistance à la corrosion, à l'abrasion,... Des revêtements avec au moins certaines de ces caractéristiques satisfaites de manière précise et uniforme, sont de plus en plus demandés, notamment dans l'industrie aérospatiale, et de manière plus générale dans la plupart des domaines de l'industrie, le mot industrie étant pris dans son sens le plus large.However, the improvements brought by the invention are capable of improving in particular this protective function, in particular thanks to the possibility which is offered to apply this spraying technique to materials with a high melting point. Furthermore, according to the invention, it is possible to obtain projection forms which are not surfaces of revolution, while giving the coating uniform properties at all points of its surface and corresponding to the following characteristic parameters given as example: microstructure, thickness, hardness, toughness, adhesion strength, porosity, wear resistance dielectric strength, thermal insulation, corrosion resistance, abrasion, ... Coatings with at least some of these characteristics satisfied in a precise and uniform manner, are more and more in demand, in particular in the aerospace industry, and more generally in most fields of industry, the word industry being taken in its broadest sense.

La technique de pulvérisation telle que perfectionnée par l'Invention n'est pas limitée au dépôt d'un revêtement sur un substrat, mais elle peut être également utilisée pour modifier les propriétés de surface de divers matériaux, comme par exemple pour enlever une couche d'oxyde à la surface d'un matériau par un traitement à chaud de cette surface. En particulier, il est possible de remplacer le fréon utilisé comme moyen de décontamination de surfaces, sachant que le fréon est un agent destructeur de la couche d'ozone. Enfin, il est possible d'utiliser le dispositif de mise en oeuvre du procédé comme source de chaleur dans des appareils de soudage ou dans des souffleries à plasma par exemple.The spraying technique as perfected by the invention is not limited to depositing a coating on a substrate, but it can also be used to modify the surface properties of various materials, such as for example to remove a layer of oxide on the surface of a material by a hot treatment of this surface. In particular, it is possible to replace the freon used as a means of decontaminating surfaces, knowing that the freon is a destructive agent of the ozone layer. Finally, it is possible to use the device for implementing the method as a heat source in welding devices or in plasma blowers for example.

D'autres avantages, caractéristiques et détails de l'Invention ressortiront de la description explicative qui va suivre faite en référence au dessin annexé donné uniquement à titre d'exemple et dans lequel :

  • la figure 1 est une vue en coupe schématique d'un dispositif de pulvérisation fonctionnant suivant un procédé classique de projection au plasma pour déposer un revêtement sur un substrat,
  • la figure 2 est une vue en perspective schématique d'un dispositif de mise en oeuvre du procédé conforme à l'Invention également appliqué au dépôt d'un revêtement sur un substrat,
  • la figure 3 est une vue de principe schématique montrant, de façon explicite, les différentes directions d'introduction du gaz inerte ionisable dans la chambre du dispositif représenté à la figure 2,
  • et la figure 4 est une vue en perspective schématique d'une variante du dispositif de mise en oeuvre du procédé illustré aux figures 2 et 3.
Other advantages, characteristics and details of the invention will emerge from the explanatory description which follows, given with reference to the appended drawing given solely by way of example and in which:
  • FIG. 1 is a schematic sectional view of a spraying device operating according to a conventional plasma spraying method for depositing a coating on a substrate,
  • FIG. 2 is a schematic perspective view of a device for implementing the method according to the invention also applied to the deposition of a coating on a substrate,
  • FIG. 3 is a schematic principle view showing, in an explicit manner, the different directions of introduction of the ionizable inert gas into the chamber of the device shown in FIG. 2,
  • and FIG. 4 is a schematic perspective view of a variant of the device for implementing the method illustrated in FIGS. 2 and 3.

Le dispositif tel que schématiquement représenté à la figure 1 permet de mettre en oeuvre un procédé de pulvérisation classique de dépôt d'un revêtement sur un substrat par projection au plasma.The device as schematically represented in FIG. 1 makes it possible to implement a conventional spraying process for depositing a coating on a substrate by plasma spraying.

Une anode 1 en cuivre par exemple de forme annulaire délimite une chambre 2 dont les deux surfaces d'extrémité forment respectivement l'entrée et la sortie de la chambre. L'entrée de la chambre 2 est évasée vers l'extérieur, et sa sortie se prolonge par une buse d'éjection 3 avec un orifice de sortie 4 de section circulaire.A copper anode 1, for example of annular shape, delimits a chamber 2, the two end surfaces of which form the inlet and the outlet of the chamber respectively. The inlet of chamber 2 is flared outwards, and its outlet is extended by an ejection nozzle 3 with an outlet orifice 4 of circular section.

Une cathode 5 sous la forme d'un bâton généralement en tungstène thorié est axialement alignée avec l'anode 1, avec une extrémité libre qui pénètre dans la partie évasée formant l'entrée de la chambre 2.A cathode 5 in the form of a stick generally made of thoriated tungsten is axially aligned with the anode 1, with a free end which penetrates into the flared part forming the entrance to chamber 2.

Un conduit 10 débouche au voisinage de la cathode 5 pour introduire suivant l'axe de la chambre 2 un gaz inerte ionisable, tel que l'Argon par exemple.A conduit 10 opens in the vicinity of the cathode 5 to introduce along the axis of chamber 2 an ionizable inert gas, such as Argon for example.

Un conduit 12 débouche radialement dans la buse d'éjection 3 pour injecter à l'intérieur de celle-ci un matériau sous forme pulvérulente véhiculé par un gaz porteur.A conduit 12 opens radially into the ejection nozzle 3 to inject inside thereof a material in powder form conveyed by a carrier gas.

Le dispositif est complété par une source de courant continu 14 reliée aux électrodes 1 et 5, des moyens de refroidissement (non représentés) de l'anode 1, et des moyens complémentaires pour satisfaire et optimiser les conditions de fonctionnement nécessaires à la mise en oeuvre d'un tel procédé de pulvérisation, comme par exemple la présence d'un champ magnétique pour positionner, stabiliser et resserrer le jet de plasma à l'intérieur de la chambre 2, ce champ magnétique étant par exemple obtenu au moyen d'une bobine 15 montée autour de l'anode 1.The device is supplemented by a direct current source 14 connected to the electrodes 1 and 5, cooling means (not shown) of the anode 1, and additional means for satisfying and optimizing the operating conditions necessary for the implementation. of such a spraying process, such as for example the presence of a magnetic field to position, stabilize and tighten the plasma jet inside the chamber 2, this magnetic field being for example obtained by means of a coil 15 mounted around anode 1.

Selon le procédé mis en oeuvre par un tel dispositif, on crée un arc électrique entre la cathode 5 et l'anode 1, on introduit le gaz inerte coaxialement à l'arc électrique et son passage à travers celui-ci entraîne son ionisation créant ainsi un plasma à haute température à l'intérieur de la chambre 2. Ce plasma s'écoule à l'intérieur de la chambre 2 et est accéléré au travers de la buse d'éjection 3. Les particules du matériau pulvérulent amenées par le conduit 12 sont injectées dans le jet de plasma s'écoulant à l'intérieur de la buse 3, et elles fondent sous l'action de la haute température du jet de plasma. Les particules ainsi fondues sont éjectées par l'orifice de sortie de la buse et projetées sur le substrat 17 pour former une couche de revêtement 18.According to the process implemented by such a device, an electric arc is created between the cathode 5 and the anode 1, the inert gas is introduced coaxially with the electric arc and its passage through the latter causes its ionization thus creating a high temperature plasma inside the chamber 2. This plasma flows inside the chamber 2 and is accelerated through the ejection nozzle 3. The particles of the pulverulent material brought in through the conduit 12 are injected into the plasma jet flowing inside the nozzle 3, and they melt under the action of the high temperature of the plasma jet. The particles thus melted are ejected through the outlet orifice of the nozzle and projected onto the substrate 17 to form a coating layer 18.

Les perfectionnements apportés selon l'Invention sont schématiquement illustrés aux figures 2 et 3.The improvements made according to the invention are schematically illustrated in FIGS. 2 and 3.

La chambre 2 et la buse d'éjection 3 ne sont plus coaxialement alignées comme précédemment, et l'orifice de sortie 4 de la buse est en forme de fente. Plus précisément, la chambre 2 s'étend parallèlement à la fente de sortie 4 de la buse d'éjection 3 et sur une longueur sensiblement égale à celle de la fente. La buse d'éjection 3 est divergente et présente en section transversale une forme en tronc de cône, avec une fente d'entrée 6 qui débouche dans la chambre 2 sur toute la longueur de celle-ci.The chamber 2 and the ejection nozzle 3 are no longer coaxially aligned as before, and the outlet orifice 4 of the nozzle is in the form of a slot. More specifically, the chamber 2 extends parallel to the outlet slot 4 of the ejection nozzle 3 and over a length substantially equal to that of the slot. The ejection nozzle 3 is divergent and has in cross section a frusto-conical shape, with an inlet slot 6 which opens into the chamber 2 over the entire length thereof.

La chambre présente deux surfaces d'extrémité ou parois 2a et 2b respectivement traversées par l'anode 1 et la cathode 5. Ces deux électrodes 1 et 5 sont chacune en forme de bâton, et elles sont axialement alignées l'une avec l'autre. D'une manière similaire au dispositif représenté à la figure 1, les électrodes 1 et 5 sont reliées à une source de courant continu, la chambre 2 est entourée par une bobine 15 et des moyens de refroidissement (non représentés) entourent la chambre 2.The chamber has two end surfaces or walls 2a and 2b respectively crossed by the anode 1 and the cathode 5. These two electrodes 1 and 5 are each in the form of a stick, and they are axially aligned with each other . In a similar way to the device represented in FIG. 1, the electrodes 1 and 5 are connected to a source of direct current, the chamber 2 is surrounded by a coil 15 and cooling means (not shown) surround the chamber 2.

Le gaz inerte est introduit dans la chambre 2 par un ensemble d'orifices 20 répartis autour et le long de la chambre. Plus précisément, dans l'exemple considéré ici, il est prévu au moins trois rangées 20a, 20b et 20c d'orifices 20. Les rangées 20a et 20b sont diamétralement opposées et situées respectivement de part et d'autre de la fente d'entrée 6 de la buse d'éjection 3, alors que la rangée 20c est diamétralement opposée à cette fente d'entrée.The inert gas is introduced into the chamber 2 through a set of orifices 20 distributed around and along the chamber. More specifically, in the example considered here, at least three rows 20a, 20b and 20c of holes 20 are provided. The rows 20a and 20b are diametrically opposite and located respectively on either side of the entry slot 6 of the ejection nozzle 3, while the row 20c is diametrically opposite this inlet slot.

Ainsi, d'une manière imagée, les directions d'introduction F1 du gaz inerte dans la chambre 2 et la direction F2 de sortie du plasma forment globalement une croix grecque à quatre branches (figure 3).Thus, in a pictorial manner, the directions of introduction F1 of the inert gas into the chamber 2 and the direction F2 of the plasma outlet generally form a Greek cross with four branches (FIG. 3).

Chaque orifice 20 d'une même rangée 20a, 20b et 20c est relié par un conduit de liaison 21 à un conduit intermédiaire 22 qui communique avec un conduit principal 23 relié à une source d'alimentation (non représentée) en gaz inerte.Each orifice 20 of the same row 20a, 20b and 20c is connected by a connecting conduit 21 to an intermediate conduit 22 which communicates with a main conduit 23 connected to a supply source (not shown) of inert gas.

Selon le dispositif conforme à l'Invention, il peut être avantageusement prévu l'utilisation d'électrodes tubulaires 1 et 5, de manière à introduire également le gaz inerte au travers de ces électrodes.According to the device according to the invention, it can advantageously be provided the use of tubular electrodes 1 and 5, so as to also introduce the inert gas through these electrodes.

Enfin, dans le cas d'un dépôt d'un revêtement sur un substrat, le dispositif est complété par plusieurs conduits 12 qui débouchent dans la buse d'éjection 3 pour y injecter le matériau pulvérulent. Ces conduits 12 sont par exemple alignés suivant deux rangées opposées 12a et 12b qui s'étendent parallèlement à la fente de sortie 4 de la buse d'éjection 4 (figure 2).Finally, in the case of a coating being deposited on a substrate, the device is completed by several conduits 12 which open into the ejection nozzle 3 to inject the pulverulent material there. These conduits 12 are for example aligned in two opposite rows 12a and 12b which extend parallel to the outlet slot 4 of the ejection nozzle 4 (FIG. 2).

Le dispositif conforme à l'Invention reprend d'une manière générale l'ensemble des moyens nécessaires à la mise en oeuvre d'un procédé de pulvérisation classique par projection au plasma, mais selon des dispositions et des formes différentes.The device according to the invention generally uses all of the means necessary for implementing a conventional spraying process by plasma spraying, but according to different arrangements and forms.

En fonctionnement, l'arc électrique créé entre les électrodes 1 et 5 s'étend sensiblement suivant l'axe de la chambre 2, c'est-à-dire parallèlement à la fente de sortie 4 de la buse, et le gaz inerte est introduit dans la chambre suivant plusieurs directions réparties notamment le long et autour de la chambre et qui convergent radialement et non coaxialement vers l'axe de l'arc électrique et le long de celui-ci.In operation, the electric arc created between the electrodes 1 and 5 extends substantially along the axis of the chamber 2, that is to say parallel to the outlet slot 4 of the nozzle, and the inert gas is introduced into the chamber in several directions distributed in particular along and around the chamber and which converge radially and not coaxially towards the axis of the electric arc and along it.

En variante du dispositif de mise en oeuvre illustré aux figures 2 et 3, le matériau destiné à former le revêtement 18 sur le substrat 17 n'est pas injecté à l'intérieur de la buse d'éjection 3.As a variant of the implementation device illustrated in FIGS. 2 and 3, the material intended to form the coating 18 on the substrate 17 is not injected inside the ejection nozzle 3.

Plus précisément, en se reportant à la figure 4, le corps 3a de la buse d'éjection 3 comporte deux fentes de sortie supplémentaires 4′ qui s'étendent sensiblement sur toute la longueur de la fente de sortie 4. Ces deux fentes 4′ sont situées de part et d'autre de la fente 4, et elles forment chacune l'orifice de sortie d'une cavité 13 ménagée à l'intérieur du corps 3a de la buse d'éjection 3. Dans ces deux cavités 13 débouchent respectivement deux rangées 12a et 12b de conduits 12 d'arrivée du matériau à projeter sur le substrat, de manière à éjecter le matériau au travers de ces fentes 4′ suivant une direction F3 sensiblement parallèle à la direction F2 du flux de plasma en sortie de la fente 4 de la buse d'éjection 3.More specifically, with reference to FIG. 4, the body 3a of the ejection nozzle 3 comprises two additional outlet slots 4 ′ which extend substantially over the entire length of the outlet slot 4. These two slots 4 ′ are located on either side of the slot 4, and they each form the outlet orifice of a cavity 13 formed inside the body 3a of the ejection nozzle 3. In these two cavities 13 open respectively two rows 12a and 12b of conduits 12 of arrival of the material to be projected onto the substrate, so as to eject the material through these slots 4 ′ in a direction F3 substantially parallel to the direction F2 of the plasma flow at the outlet of the slot 4 of the ejection nozzle 3.

Selon cette variante les particules du matériau ne sont plus mélangées au plasma à l'intérieur de la buse d'éjection 3, mais à la sortie de celle-ci, c'est-à-dire dans une zone où la température du plasma est moins élevée. Ainsi, on évite de soumettre les matériaux destinés à former le revêtement aux très hautes températures du plasma à l'intérieur de la buse d'éjection 3. Il est alors possible de pouvoir utiliser des matériaux, tels que des matières plastiques et des polymères par exemple, c'est-à-dire des matériaux pas suffisamment résistants à la chaleur pour être introduits à l'intérieur de la buse 3.According to this variant, the particles of the material are no longer mixed with the plasma inside the ejection nozzle 3, but at the outlet of the latter, that is to say in an area where the temperature of the plasma is lower. This avoids subjecting the materials intended to form the coating to very high plasma temperatures inside the ejection nozzle 3. It is then possible to be able to use materials, such as plastics and polymers by example, that is to say materials which are not sufficiently heat resistant to be introduced inside the nozzle 3.

Bien entendu, l'Invention n'est nullement limitée au mode de réalisation décrit précédemment et donné uniquement à titre d'exemple dans le cas du dépôt d'un revêtement sur un substrat. En particulier le flux de plasma en sortie de la buse d'éjection constitue une source de chaleur qui peut être utilisée pour réaliser des traitements de surface sans nécessairement projeter un matériau sur les surfaces à traiter.Of course, the invention is in no way limited to the embodiment described above and given only by way of example in the case of the deposition of a coating on a substrate. In particular, the plasma flow at the outlet of the ejection nozzle constitutes a heat source which can be used to carry out surface treatments without necessarily projecting a material onto the surfaces to be treated.

Claims (13)

  1. A method of treating the surface of a substrate by plasma flux spraying, the method being of the type consisting in establishing an electric arc in a chamber between a cathode and an anode, in injecting an inert gas into the chamber so that the gas is ionized on passing through the electric arc, thereby forming a high temperature plasma, and in ejecting the plasma from the chamber through an ejection nozzle whose outlet orifice is slit-shaped, characterized in that the method consists in establishing an electric arc between the anode and the cathode along an axis that is substantially parallel to the axis of the outlet slit of the ejection nozzle.
  2. A method according to claim 1, characterized in that the method consists in injecting the inert gas into the chamber along a plurality of radial directions relative to the axis of the electric arc.
  3. A method according to claim 2, characterized in that the inert gas is injected into the chamber along radial directions distributed along and around the chamber which extends parallel to the slit, and over a length substantially equal to the length of the slit.
  4. A method according to claim 3, characterized in that, when depositing a coating on a substrate, the method consists in injecting the coating-constituting material into the ejection nozzle.
  5. A method according to claim 3, characterized in that, when depositing a coating on a substrate, the method consists in ejecting the coating-constituting material at the outlet of the ejection nozzle in a direction substantially parallel to the direction of the plasma flux at the outlet of the nozzle.
  6. Apparatus for implementing the method as defined by any preceding claim, the apparatus being of the type comprising at least one chamber (2) having a cathode (5) and an anode (1), means for establishing an electric arc inside the chamber (2) between the cathode (5) and the anode (1), at least one feed duct for conveying an inert gas ionizable by the electric arc to form a high temperature plasma, an ejection nozzle (3) having an outlet orifice in the form of a slit (4) and an inlet orifice (6) in communication with the chamber (2), characterized in that the chamber (2) is elongate in shape having two end surfaces (2a, 2b) through which the cathode (5) and the anode (1) project respectively in axial alignment with each other to create an electric arc along an axis (A) substantially parallel to the axis of the outlet slit (4) of the ejection nozzle (3).
  7. Apparatus according to claim 6, characterized in that it comprises a plurality of inert gas inlet ducts (21) opening out inside the chamber (2) along a plurality of radial directions (F1) relative to the axis (A) of the electric arc established between the cathode (5) and the anode (1).
  8. Apparatus according to claim 7, characterized in that the inert gas feed ducts (21) open out into the chamber via orifices (20) which are distributed in a plurality of rows (20a, 20b, 20c).
  9. Apparatus according to claim 8, characterized in that it comprises three rows of orifices (20), the first and second rows (20a, 20b) being diametrically opposite to each other and being situated on opposite sides of the inlet slit (6) of the ejection nozzle (3), while the third row (20c) is diametrically opposite to said inlet slit (6).
  10. Apparatus according to claim 7, characterized in that the cathode (5) and the anode (1) are hollow, and they form inlet ducts for the inert gas to be ionized.
  11. Apparatus according to claim 6, for depositing a coating on a substrate, characterized in that the apparatus comprises at least one inlet duct (12) for material that is to form the coating (18), which duct opens out inside the ejection nozzle (3).
  12. Apparatus according to claim 6, for depositing a coating on the substrate, characterized in that the apparatus comprises at least one inlet duct (12) for material that is to form the coating (18) on the substrate (17), which duct opens out at the outlet of the ejection nozzle (3) via at least one slit (4') parallel to the outlet slit (4) of the ejection nozzle (3).
  13. Apparatus according to claim 6, characterized in that the chamber (2) extends parallel to and over substantially the same length as the outlet slit (4) of the ejection nozzle (3), the inlet orifice (6) of the chamber extending substantially along the entire length of the chamber (2).
EP92400803A 1991-03-26 1992-03-25 Method of treating for instance a substrate surface by projecting a plasma flow and apparatus for carrying out the method Expired - Lifetime EP0506552B1 (en)

Applications Claiming Priority (2)

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FR9103621 1991-03-26
FR9103621A FR2674450B1 (en) 1991-03-26 1991-03-26 METHOD FOR DEPOSITING A COATING ON A SUBSTRATE BY PLASMA SPRAYING, AND DEVICE FOR IMPLEMENTING THE METHOD.

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EP0506552A1 EP0506552A1 (en) 1992-09-30
EP0506552B1 true EP0506552B1 (en) 1995-06-28

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US8997687B2 (en) 2006-12-28 2015-04-07 Exatec Llc Apparatus and method for plasma arc coating
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US5239161A (en) 1993-08-24
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CA2063899A1 (en) 1992-09-27
FR2674450B1 (en) 1994-01-21
ES2076703T3 (en) 1995-11-01
JPH0657397A (en) 1994-03-01
DE69203127D1 (en) 1995-08-03
EP0506552A1 (en) 1992-09-30
FR2674450A1 (en) 1992-10-02

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