EP0442894A1 - Aus einer lösung niedergeschlagene boride und boridvorläufer - Google Patents
Aus einer lösung niedergeschlagene boride und boridvorläuferInfo
- Publication number
- EP0442894A1 EP0442894A1 EP19890910280 EP89910280A EP0442894A1 EP 0442894 A1 EP0442894 A1 EP 0442894A1 EP 19890910280 EP19890910280 EP 19890910280 EP 89910280 A EP89910280 A EP 89910280A EP 0442894 A1 EP0442894 A1 EP 0442894A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- zirconium
- complex
- hafnium
- metal boride
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000002243 precursor Substances 0.000 title claims abstract description 28
- 229910052751 metal Inorganic materials 0.000 claims abstract description 36
- 239000002184 metal Substances 0.000 claims abstract description 36
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 17
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 14
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 11
- 239000007787 solid Substances 0.000 claims description 32
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical group C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 claims description 24
- 239000002879 Lewis base Substances 0.000 claims description 19
- 150000007527 lewis bases Chemical group 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 17
- 238000006243 chemical reaction Methods 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 11
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 8
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 5
- 239000002244 precipitate Substances 0.000 claims description 5
- 238000001149 thermolysis Methods 0.000 claims description 5
- -1 alkyl phosphine Chemical compound 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- 239000004215 Carbon black (E152) Substances 0.000 claims description 2
- 229930195733 hydrocarbon Natural products 0.000 claims description 2
- 150000002430 hydrocarbons Chemical class 0.000 claims description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 230000008021 deposition Effects 0.000 abstract description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 60
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 15
- 238000002411 thermogravimetry Methods 0.000 description 12
- 229910008117 Zr(BH4)4 Inorganic materials 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000000151 deposition Methods 0.000 description 6
- 238000000921 elemental analysis Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 5
- 229910000085 borane Inorganic materials 0.000 description 5
- 229910052796 boron Inorganic materials 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 208000016261 weight loss Diseases 0.000 description 5
- 230000004580 weight loss Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 241000894007 species Species 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 238000005979 thermal decomposition reaction Methods 0.000 description 4
- 238000012565 NMR experiment Methods 0.000 description 3
- 229910007948 ZrB2 Inorganic materials 0.000 description 3
- LRTTZMZPZHBOPO-UHFFFAOYSA-N [B].[B].[Hf] Chemical compound [B].[B].[Hf] LRTTZMZPZHBOPO-UHFFFAOYSA-N 0.000 description 3
- VWZIXVXBCBBRGP-UHFFFAOYSA-N boron;zirconium Chemical compound B#[Zr]#B VWZIXVXBCBBRGP-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 3
- 150000003003 phosphines Chemical class 0.000 description 3
- 238000004679 31P NMR spectroscopy Methods 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RHXMBUGJMREJIM-UHFFFAOYSA-N B.[Zr] Chemical compound B.[Zr] RHXMBUGJMREJIM-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000001182 laser chemical vapour deposition Methods 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 208000020442 loss of weight Diseases 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- BWHDROKFUHTORW-UHFFFAOYSA-N tritert-butylphosphane Chemical compound CC(C)(C)P(C(C)(C)C)C(C)(C)C BWHDROKFUHTORW-UHFFFAOYSA-N 0.000 description 2
- 238000010792 warming Methods 0.000 description 2
- OWJZRKILDKBNMJ-UHFFFAOYSA-N 1-bis(4-methylphenyl)phosphanylethyl-bis(4-methylphenyl)phosphane Chemical compound C=1C=C(C)C=CC=1P(C=1C=CC(C)=CC=1)C(C)P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 OWJZRKILDKBNMJ-UHFFFAOYSA-N 0.000 description 1
- UAXNXOMKCGKNCI-UHFFFAOYSA-N 1-diphenylphosphanylethyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 UAXNXOMKCGKNCI-UHFFFAOYSA-N 0.000 description 1
- 238000004607 11B NMR spectroscopy Methods 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- LRLQQERNMXHASR-UHFFFAOYSA-N 2-diphenylphosphanylpropan-2-yl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 LRLQQERNMXHASR-UHFFFAOYSA-N 0.000 description 1
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 description 1
- 229910052580 B4C Inorganic materials 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 229910033181 TiB2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000010420 art technique Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 238000001897 boron-11 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- IGNTWNVBGLNYDV-UHFFFAOYSA-N triisopropylphosphine Chemical compound CC(C)P(C(C)C)C(C)C IGNTWNVBGLNYDV-UHFFFAOYSA-N 0.000 description 1
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B35/00—Boron; Compounds thereof
- C01B35/02—Boron; Borides
- C01B35/04—Metal borides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/06—Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
- C01B6/10—Monoborane; Diborane; Addition complexes thereof
Definitions
- Metal borides are hard, refractory, highly conductive and chemically inert materials which have many potential applications in the ceramic, electronic and optical industries. Obstacles to the development of uses for the borides have been that high temperatures or vacuum conditions have been required for their synthesis.
- the present invention relates to novel zirconium and hafnium boride precursor complexes and processes for their preparation by deposition from solution.
- the present invention further relates to the metal borides obtained upon heating the novel precursors at mild temperatures and ambient pressure.
- metal borides Several methods for the preparation of metal borides are known including direct synthesis from the elements, reduction of mixtures of metal oxides and boron oxide by carbon, reduction of metal oxides wit boron carbide and carbon, and reduction of mixtures of metal halide and boron trihalide by hydrogen. Each of these requires high temperatures, in excess of about 1200°C, usually near 2000°C. More recently metal borides have been synthesized by thermal decomposition of gaseous meta borohydrides at lower temperatures.
- Titanium diboride, zirconium diboride and hafnium diboride thin films were obtained by using gaseous chemical vapor deposition at about 200°C of the respective tetrahydroborate precursors; see Jensen, J. A., et al., .T. Am. Ch ⁇ m. Soc.. ___&, 1643-1544 (1988).
- the synthesis of zirconium boride, ZrB 2 / from zirconium borohydride, Zr(BH 4 ) 4 was explored by a variety of methods including gaseous chemical vapor deposition in a hot tube, laser chemical vapor deposition with both continuous-wave and pulsed lasers, and continuous-wave laser synthesis of fine powders.
- FIGURES Figure 1 is a thermogravimetric analysis (TGA) of the product of Example 2.
- FIG. 1 is a thermogravimetric analysis (TGA) of the product of Example 8.
- One aspect of the present invention relates to novel metal boride precursor complexes.
- One such complex obtained by the thermolysis of the appropriate metal borohydride comprises
- M is zirconium or hafnium; x is from about 0.5 to about 2; y is from 0 to about 3, provided that
- the boron to metal ratio in this complex is about 4.
- This complex is generated by a process of the present invention, the liquid phase thermolysis of the corresponding metal borohydride, M(BH 4 ) 4 .
- the borohydride is heated neat, or in a hydrocarbon solvent, such as toluene or heptane, to a temperature of at least about 100°C in an inert atmosphere. Suitable inert atmospheres include argon, nitrogen or helium. At about 100°C, heating for several days (5 to 10) is required. At higher temperatures a shorter heating period is required.
- the complex is obtained as a mixture of a soluble intermediate and a black insoluble solid according to the following reaction:
- the soluble intermediate (BH 4 ) 3 M(B 2 H 6 )M(BH 4 ) 3 has been characterized.
- the conversion of (BH 4 ) ⁇ ligands into (B 2 H 6 ) 2 ⁇ bridges leads to a mixture of oligomers having the empirical formula (I), [M(B 2 Hg) ⁇ (BH 4 ) y ] n . Heating this mixture above about 200°C liberates more hydrogen with formation of the metal borides MB Z wherein z is about 4.
- a further metal boride precursor complex of the present invention comprises a mixture of oligomers of formula (II), obtained by reaction of the appropriate metal borohydride with a Lewis base,
- M zirconium or hafnium; and x is from 0 to 9; and n is at least 4.
- This complex has a boron to metal ratio of about 2.
- Another aspect of the present invention is a process for the generation of the above complex of formula (II) from solution comprising contacting a solution of M(BH 4 ) 4 wherein M is zirconium or hafnium with a Lewis base (LB) to yield the desired precursor complex as a solid precipitate or film.
- This reaction is as follows:
- the metal borane complex of formula (II) precipitates as a black solid. Heating the solid of formula (II) above about 200°C yields the metal boride MB ⁇ wherein x is about 2.
- Suitable Lewis bases for use in this reaction sequence include phosphines, arsines, amines and ethers. Preferred are the phosphines, especially aryl- or alkylphosphines having a cone angle greater than 135°. For further discussion of cone angle, see Rahman et al., Orqanometallics, £, 650-658 (1987). Most preferred are the arylphosphines.
- phosphines useful herein include tri-t-butylphosphine, tricyclohexylphosphine, triphenylphosphine, tri-p-tolylphosphine, methyldiphenylphosphine, triisopropylphosphine, bis(diphenylphosphino)ethane, bis(diphenylphosphino)propane, bis(diphenylphos- phino)butane, or bis(di-p-tolylphosphino)ethane.
- the above reactions using the Lewis base are conducted at a temperature of from about -20°C to about 25°C for a period of from about 1 to about 24 hours.
- the concentration of the Lewis base is determined so as to prevent precipitation of colorless H3B-LB.
- the product of formula (II) precipitates as a black film or solid and is washed extensively with fresh solvent to ensure removal of any H3B-LB.
- the composition of the solid has an empirical formula MB ⁇ .8-2.0 H 3-6• Heating the solid above 200°C yields a metal boride coating of approximate composition MB Z wherein z is about 1.6-1.9.
- the complexes of the present invention are useful as precursors to metal borides.
- the metal borides have many uses in the ceramic, electronic and optical industries. Examples include their use as films for microelectronic applications, ceramic powders, coatings for electrodes or metal cutting tools, or coatings in nozzles, valves and the like, in the aerospace industry.
- EXAMPLE 1 The following Example describes the formation of a Zr boride precursor via thermolysis of neat Zr(BH 4 ) 4 at 100°C.
- EXAMPLE 2 This example describes the isolation of a white, volatile intermediate formed in the thermal decomposition of Hf(BH 4 ) 4 , and a reddish-brown, non-volatile precursor of hafnium boride, and includes a thermogravimetric analysis.
- Hf(BH 4 ) 4 1.0 g was heated in a closed 10 mL stainless steel pressure vessel for 3 hr at 120°C. At ambient temperature, the vessel was opened and gases were allowed to escape. The remaining products were washed out of the vessel with toluene. Under a pressure of ca. 0.1 millitorr, toluene was evaporated from the mixture at ambient temperature to leave a residue of 0.330 g of solids.
- EXAMPLE 6 The following Example describes the reaction of Zr(BH 4 ) 4 and 2 equivalents of P(t-Bu) 3 and shows- that little B is lost upon heating the precursor to 200°C.
- a solution of 2.69 g (13.3 mmol) P(t-Bu) 3 in 10 mL of toluene was added to a solution of 1.00 g (6.65 mmol) Zr(BH ) in 20 mL of toluene at -100°C.
- the solution turned from yellow to amber to dark brown.
- the resulting blac : x solid was filtered off and dried in vacuo for 10 hr to yield 814 mg.
- Example 7 The following Example is a repeat of Example 5 and includes the Thermogravimetric Analysis (TGA) which shows little weight loss at 200-750°C.
- TGA Thermogravimetric Analysis
- EXAMPLE 8 The following Example describes the reaction of Zr(BH 4 ) 4 with 2 equivalents of PPh 3 and includes a thermogravimetric analysis (TGA) which showed only 7% weight loss, which all occurred below 200°C.
- TGA thermogravimetric analysis
- EXAMPLE 9 Using a cold well inside a nitrogen glove box, a solution of 539 mg (2.05 mmol) PPh 3 in 20 mL of toluene was added to a solution of 151 mg (1 mmol) Zr(BH 4 ) 4 in 10 mL of toluene at -100°C. The reaction vessel was then sealed, removed from the glove box and attached to the high vacuum line. After three freeze-pump-thaw cycles the reaction was warmed to 0°C using an ice bath. After 20 hr the non-condensable gases were measured using a Toepler pump and determined to be 0.45 mmol H 2 /Zr.
- Example 10 The following Example taken together with Example 9 shows that the black solid precursor loses H 2 at 25°C (this example at 25°C gives 0.85 mmol H 2 /mmol Zr while the Example 9 kept at 0°C only gave 0.45 mmol H /mmol Zr) .
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/US1989/003883 WO1991003420A1 (en) | 1989-09-08 | 1989-09-08 | Borides and boride precursors deposited from solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP0442894A1 true EP0442894A1 (de) | 1991-08-28 |
Family
ID=22215217
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP19890910280 Withdrawn EP0442894A1 (de) | 1989-09-08 | 1989-09-08 | Aus einer lösung niedergeschlagene boride und boridvorläufer |
Country Status (2)
| Country | Link |
|---|---|
| EP (1) | EP0442894A1 (de) |
| WO (1) | WO1991003420A1 (de) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1431701A1 (de) * | 1965-07-06 | 1968-11-28 | Kloeckner Werke Ag | Fahrbarer Gabel- und Hubstapler |
| US4282195A (en) * | 1975-02-03 | 1981-08-04 | Ppg Industries, Inc. | Submicron titanium boride powder and method for preparing same |
-
1989
- 1989-09-08 EP EP19890910280 patent/EP0442894A1/de not_active Withdrawn
- 1989-09-08 WO PCT/US1989/003883 patent/WO1991003420A1/en not_active Ceased
Non-Patent Citations (1)
| Title |
|---|
| See references of WO9103420A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO1991003420A1 (en) | 1991-03-21 |
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