EP0410794A2 - Photoréserve de type négatif sensible dans l'UV lointain, contenant des groupes maléimides - Google Patents

Photoréserve de type négatif sensible dans l'UV lointain, contenant des groupes maléimides Download PDF

Info

Publication number
EP0410794A2
EP0410794A2 EP90308280A EP90308280A EP0410794A2 EP 0410794 A2 EP0410794 A2 EP 0410794A2 EP 90308280 A EP90308280 A EP 90308280A EP 90308280 A EP90308280 A EP 90308280A EP 0410794 A2 EP0410794 A2 EP 0410794A2
Authority
EP
European Patent Office
Prior art keywords
alkyl
composition
resin
maleimide
poly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP90308280A
Other languages
German (de)
English (en)
Other versions
EP0410794A3 (en
Inventor
Sangya Jain
Dinesh N. Khanna
Robert E. Potvin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of EP0410794A2 publication Critical patent/EP0410794A2/fr
Publication of EP0410794A3 publication Critical patent/EP0410794A3/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
EP19900308280 1989-07-28 1990-07-27 Maleimide containing, negative working deep uv photoresist Withdrawn EP0410794A3 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US38649089A 1989-07-28 1989-07-28
US386490 1989-07-28

Publications (2)

Publication Number Publication Date
EP0410794A2 true EP0410794A2 (fr) 1991-01-30
EP0410794A3 EP0410794A3 (en) 1991-09-25

Family

ID=23525802

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19900308280 Withdrawn EP0410794A3 (en) 1989-07-28 1990-07-27 Maleimide containing, negative working deep uv photoresist

Country Status (4)

Country Link
EP (1) EP0410794A3 (fr)
JP (1) JPH03192260A (fr)
KR (1) KR910003448A (fr)
CA (1) CA2020378A1 (fr)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0499271A1 (fr) * 1991-02-15 1992-08-19 Kawasaki Steel Corporation Résine photosensible
EP0601974A1 (fr) * 1992-12-04 1994-06-15 OCG Microelectronic Materials Inc. Photoréserve positive avec des propriétés améliorés
EP0652485A1 (fr) * 1993-11-08 1995-05-10 AT&T Corp. Procédé de fabrication d'un dispositif
US5558978A (en) * 1993-12-21 1996-09-24 Ocg Microelectronic Materials, Inc. Photoresist compositions containing copolymers having acid-labile groups and recurring units derived from either N-(hydroxymethyl)maleimide or N-(acetoxymethyl)maleimide or both
WO1997033206A1 (fr) * 1996-03-07 1997-09-12 Clariant International, Ltd. Processus de traitement thermique de composition de photoresine positive
WO1998007759A1 (fr) * 1996-08-23 1998-02-26 First Chemical Corporation Procedes de polymerisation a l'aide de maleimides aliphatiques
US6150431A (en) * 1997-05-27 2000-11-21 First Chemical Corporation Aromatic maleimides and methods of using the same
US6555593B1 (en) 1998-01-30 2003-04-29 Albemarle Corporation Photopolymerization compositions including maleimides and processes for using the same

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5206117A (en) * 1991-08-14 1993-04-27 Labadie Jeffrey W Photosensitive polyamic alkyl ester composition and process for its use
KR101927829B1 (ko) * 2011-03-29 2018-12-11 닛산 가가쿠 가부시키가이샤 네가티브형 감광성 수지 조성물

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6269262A (ja) * 1985-09-24 1987-03-30 Toshiba Corp 感光性組成物
JPS62229140A (ja) * 1986-03-31 1987-10-07 Toshiba Corp 感光性組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6269262A (ja) * 1985-09-24 1987-03-30 Toshiba Corp 感光性組成物
JPS62229140A (ja) * 1986-03-31 1987-10-07 Toshiba Corp 感光性組成物

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 11, no. 264 (P-610)(2711) 27 August 1987, & JP-A-62 69262 (TOSHIBA CORP.) 30 March 1987, *
PATENT ABSTRACTS OF JAPAN vol. 12, no. 95 (P-681)(2942) 29 March 1988, & JP-A-62 229140 (TOSHIBA CORP.) 07 October 1987, *

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0499271A1 (fr) * 1991-02-15 1992-08-19 Kawasaki Steel Corporation Résine photosensible
EP0601974A1 (fr) * 1992-12-04 1994-06-15 OCG Microelectronic Materials Inc. Photoréserve positive avec des propriétés améliorés
US5369200A (en) * 1992-12-04 1994-11-29 Ciba-Geigy Ag Positive photoresist having improved processing properties
US5397680A (en) * 1992-12-04 1995-03-14 Ciba-Geigy Ag Positive photoresist having improved processing properties
EP0652485A1 (fr) * 1993-11-08 1995-05-10 AT&T Corp. Procédé de fabrication d'un dispositif
US5558978A (en) * 1993-12-21 1996-09-24 Ocg Microelectronic Materials, Inc. Photoresist compositions containing copolymers having acid-labile groups and recurring units derived from either N-(hydroxymethyl)maleimide or N-(acetoxymethyl)maleimide or both
WO1997033206A1 (fr) * 1996-03-07 1997-09-12 Clariant International, Ltd. Processus de traitement thermique de composition de photoresine positive
WO1998007759A1 (fr) * 1996-08-23 1998-02-26 First Chemical Corporation Procedes de polymerisation a l'aide de maleimides aliphatiques
US6034150A (en) * 1996-08-23 2000-03-07 University Of Southern Mississippi Polymerization processes using aliphatic maleimides
US6369124B1 (en) 1996-08-23 2002-04-09 First Chemical Corporation Polymerization processes using aliphatic maleimides
US6855745B2 (en) 1996-08-23 2005-02-15 Albemarle Corporation Polymerization processes using aliphatic maleimides
US6150431A (en) * 1997-05-27 2000-11-21 First Chemical Corporation Aromatic maleimides and methods of using the same
US6153662A (en) * 1997-05-27 2000-11-28 University Of Southern Mississippi Aromatic maleimides and methods of using the same
US6555593B1 (en) 1998-01-30 2003-04-29 Albemarle Corporation Photopolymerization compositions including maleimides and processes for using the same

Also Published As

Publication number Publication date
CA2020378A1 (fr) 1991-01-29
KR910003448A (ko) 1991-02-27
EP0410794A3 (en) 1991-09-25
JPH03192260A (ja) 1991-08-22

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