EP0360655B1 - Vorrichtung zur beidseitigen Bestrahlung eines Produktes - Google Patents

Vorrichtung zur beidseitigen Bestrahlung eines Produktes Download PDF

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Publication number
EP0360655B1
EP0360655B1 EP89402442A EP89402442A EP0360655B1 EP 0360655 B1 EP0360655 B1 EP 0360655B1 EP 89402442 A EP89402442 A EP 89402442A EP 89402442 A EP89402442 A EP 89402442A EP 0360655 B1 EP0360655 B1 EP 0360655B1
Authority
EP
European Patent Office
Prior art keywords
scanning
product
chamber
coil
magnet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP89402442A
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English (en)
French (fr)
Other versions
EP0360655A1 (de
Inventor
Michel Cabinet Ballot-Schmit Vassenaix
Jacques Cabinet Ballot-Schmit Milcamps
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CGR MEV SA
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CGR MEV SA
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Publication date
Application filed by CGR MEV SA filed Critical CGR MEV SA
Publication of EP0360655A1 publication Critical patent/EP0360655A1/de
Application granted granted Critical
Publication of EP0360655B1 publication Critical patent/EP0360655B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means

Definitions

  • the invention relates to devices which allow the irradiation of both sides of a product by means of a charged particle accelerator.
  • French patent 2396392 a two-sided irradiation device for a target having two opposite faces which comprises an accelerator of charged particles, for example electrons, associated with a microwave generator so as to provide high frequency pulses of charged particles.
  • the beam of charged particles is applied to a cone-shaped scanning chamber where it is subjected to its entry to a variable magnetic field to obtain a deflection of the beam by an angle on either side of the axis of symmetry of the cornet.
  • In the wide part of the horn is made an opening which covers, on one side of the axis of symmetry, half of the opening of the horn and which is provided with two windows transparent to the beam between which the product to be irradiated is moved .
  • the beam is subjected to a continuous magnetic field which achieves a slightly more than 180 ° reversal of the beam when it scans the other half of the horn relative to the opening.
  • the beam irradiates one of the faces of the product when it scans the part of the horn having the opening and the other face when it scans the other part as a result of the reversal of the beam.
  • the device described in the aforementioned patent has the following drawbacks. It is very large in height since the accelerator producing the electrons and the scanning and magnetic deflection devices are superimposed in height.
  • a second drawback is that it does not allow control of the energy of the flow of electrons delivered by the accelerator and this results in a lack of uniformity in the ionizing treatment.
  • a third drawback is that the flow of electrons striking the upper face of the product to be ionized is divergent and, therefore, a large part of the available energy is not used.
  • a fourth drawback is that the ionization intensity of the part of the product close to the axis cannot be controlled.
  • the object of the present invention is therefore to produce a double-sided irradiation device for a product which does not have the abovementioned drawbacks.
  • a double-sided irradiation device 10 for a product 22 comprises a particle accelerator 11 which provides a beam of charged particles, a scanning chamber 12 under vacuum to receive the beam of charged particles and a magnet system 13 to 20 which makes various angular modifications of said particle beam inside the scanning chamber 12.
  • the particle accelerator is for example an electron accelerator which emits pulses with a duration of ten microseconds and a power of ten Mev for example.
  • the scanning chamber 12 has the general shape of a horn, the narrow part constituting the entry of the beam is disposed at the exit of the accelerator 11.
  • the magnet system comprises a magnetic focusing lens 13, of the lens type. Glazer, which is intended to converge the electron beam which is divergent at the output of the accelerator.
  • This lens 13 is followed by centering magnets 14 which are used to adjust the direction of the electron beam on the entry of a magnet 15 materialized by a slot 8.
  • This magnet 15 has two functions, one of deflecting the direction of the beam to give it a vertical direction and the other to focus the electron beam in the axial plane in order to obtain a radially narrower beam.
  • the electron beam is directed towards a scanning magnet 17 by means of correction magnets 16, the latter serving to precisely adjust the direction of the beam towards the input of the magnet 17.
  • the magnet scanning 17, with circular pole pieces serves to deflect the direction of the beam by a certain determined angle, for example 20 ° to 25 ° approximately, for the duration of the pulse of ten microseconds.
  • the beam is directed towards a magnet 18 or a magnet 19 which each has the effect of transforming the beam made divergent by the scanning into a parallel beam.
  • a deflection magnet 20 has the effect of deflecting an angle of 180 ° the parallel beam leaving the magnet 18 so as to obtain its complete reversal.
  • the products to be irradiated 22 are moved using a conveyor 27 transparent to the electron beam.
  • This conveyor is disposed between the magnet 20 and the magnet 19 in a direction perpendicular to the plane of Figure 1.
  • the latter has a notch 24 which is formed between the magnets 19 and 20 and this notch serves as a passage for the products to be irradiated there.
  • the enclosure 23 of the scanning chamber 12 has an upper window 25 and a lower window 26, both transparent to the electron beam while the rest of the scanning chamber is opaque to said beam.
  • Only the coil 28 of the magnet 17 is supplied with a variable current over time so as to obtain the scanning of the electron beam during the duration of the pulse.
  • Figure 2 is a block diagram of a current control circuit in the coil 28. It includes a DC power source 29, a capacitor 30 of capacity C in parallel on the source 29, a switch 31 in series with the coil 28 with inductance L and resistance R.
  • the switch 31 is controlled by a synchronization circuit 32 which also controls a modulator 33 of the accelerator 11
  • the circuit comprising the capacitor 30 and the coil 28 is a resonant circuit such that the current flowing there is of the form: when the switch 31 is closed, the capacitor 30 having been previously charged to the voltage Va of the power source 29.
  • the diagram in Figure 3 represents 1 (t) ; it is a sinusoid whose period has been chosen equal to eighty microseconds so as to define four substantially linear zones A, B, C and D of duration ten microseconds each, the duration of the pulse of the electron beam. It is by choosing one of these zones A, B, C or D that the electron beam is deflected on either side of the vertical axis and from the right to the left or vice versa . More precisely, as the triggering of the sinusoid of FIG. 3 is determined by the closing of the switch 31, this closing instant determines the instant of triggering of the beam pulses so that said pulses coincide with the zones A, B, C or D depending on the type of scan chosen.
  • the pulses of the beam begin with a certain delay 0 after the passage of the sinusoid at the zero amplitude or finish a certain time 0 before said passage.
  • the magnetic field is never zero in the presence of the electron beam.
  • FIGS. 4a and 4b show the synchronism between the beam pulses (FIG. 4b) and the zones A, B, C or D of the sinusoids (FIG. 4a).
  • part 1 of figure 4 corresponds to a deflection of the beam from the axis to the right, i.e. a scan of the product 22 through the lower window 26; the part It corresponds to a deflection of the beam from the axis to the left, that is to say a scanning of the product 22 by the upper window 25; part III corresponds to a deflection of the beam from the right towards the axis, ie a scanning of the product 22 by the lower window 26; finally part IV corresponds to a deviation of the left beam towards the axis, that is to say a scanning of the product 22 by the upper window 25.
  • the irradiation device which has just been described has the following advantages.
  • the irradiation is carried out by a scan, which makes it possible to ionize a relatively large surface of the product during a single pulse while using a narrow beam.
  • Each side of the product is scanned successively in both directions and this results in better homogeneity of the dose received by the product taking into account the distribution of the beam intensity during the duration of the pulse.
  • This homogeneity of the dose received is further improved by the combination of the deflection magnet 15 and the energy definition slot 9, which makes it possible to eliminate the electrons which do not have the energy corresponding to the magnetic field. of the magnet 15.
  • the invention has been described in its application to the irradiation of a product by a flow of electrons; however, it is applicable to any irradiation system from a pulse source of charged particles, particles which can be deflected by a magnetic field.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Particle Accelerators (AREA)
  • Food Preservation Except Freezing, Refrigeration, And Drying (AREA)

Claims (3)

1. Vorrichtung zur zweiseitigen Bestrahlung eines Produktes (22), mit einem Beschleuniger (11) für geladene Teilchen, dem ein Modulator (33) in solcher Weise zugeordnet ist, daß er ein Bündel geladener Teilchen in Form von Impulsen aussendet, einer vakuumdichten, hornförmigen Abtastkammer (12), Abtastmitteln (17), die der Abtastkammer (12) zugeordnet sind, um das Teilchenbündel während der Dauer des Impulses des Bündels beiderseits der Bündelachse über einen Winkel abzulenken, wobei diese Kammer an ihrem größten Ende eine Öffnung (24) aufweist, welche eine Hälfte des Hornes einnimmt und mit zwei für das Bündel durchlässigen Fenstern (25, 26) versehen ist, wobei diese Öffnung für den Durchtritt des zu bestrahlenden Produktes (22) vorgesehen ist, dadurch gekennzeichnet, daß sie umfaßt:
- erste magnetische Ablenkmittel (18, 19), die der Abtastkammer (12) zugeordnet sind, um die divergierende Winkelabtastung in eine parallele Abtastung umzuformen, und
- zweite magnetische Ablenkmittel (20), die der Abtastkammer (12) zugeordnet sind, um eine 1800-Ablenkung des Parallelabtastungsbündels zu erreichen, das demjenigen Teil der Abtastkammer entspricht, welcher die Öffnung (24) nicht aufweist.
2. Bestrahlungsvorrichtung nach Anspruch 1, dadurch gekennzeichnet, daß die magnetischen Abtastmittel (17) einen Magnet mit kreisrunden Polstücken umfassen, dessen Wicklung (28) mit einem Strom gespeist wird, der sich im Verlauf der Dauer eines Impulses ändert.
3. Bestrahlungsvorrichtung nach Anspruch 2, dadurch gekennzeichnet, daß die Wicklung (28) Bestandteil eines Schwingkreises ist, der einen Kondensator (30) in Parallelschaltung zu einer Gleichstrom-Versorgungsquelle (29) und einen Unterbrecher (31) in Reihe mit der Wicklung (28) aufweist, wobei dieser Unterbrecher (31) und der Modulator (33) des Beschleunigers für geladene Teilchen (11) durch eine Synchronisationsschaltung (32) in solcherweise gesteuert werden, daß der Unterbrecher (31) zunächst geschlossen ist, um die Wicklung (28) zu speisen, und der Modulator (33) anschließend angesteuert wird, damit das Teilchenbündel zu einer bestimmten zeit nach dem Beginn der Schwingung in dem Schwingkreis auftritt.
EP89402442A 1988-09-16 1989-09-07 Vorrichtung zur beidseitigen Bestrahlung eines Produktes Expired - Lifetime EP0360655B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8812118 1988-09-16
FR8812118A FR2636773B1 (fr) 1988-09-16 1988-09-16 Dispositif d'irradiation double face d'un produit

Publications (2)

Publication Number Publication Date
EP0360655A1 EP0360655A1 (de) 1990-03-28
EP0360655B1 true EP0360655B1 (de) 1993-03-17

Family

ID=9370077

Family Applications (1)

Application Number Title Priority Date Filing Date
EP89402442A Expired - Lifetime EP0360655B1 (de) 1988-09-16 1989-09-07 Vorrichtung zur beidseitigen Bestrahlung eines Produktes

Country Status (6)

Country Link
US (1) US5004926A (de)
EP (1) EP0360655B1 (de)
JP (1) JP2958028B2 (de)
CA (1) CA1303258C (de)
DE (1) DE68905417T2 (de)
FR (1) FR2636773B1 (de)

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Publication number Priority date Publication date Assignee Title
JP3394602B2 (ja) * 1993-07-05 2003-04-07 株式会社荏原製作所 高速原子線を用いた加工方法
AU3871697A (en) 1996-06-17 1999-01-19 Scanditronix Medical Ab Irradiation equipment
US5847401A (en) * 1996-11-01 1998-12-08 Atomic Energy Of Canada Limited Simultaneous double sided irradiation
US6576915B1 (en) 1998-02-12 2003-06-10 Mcintyre Peter M. Method and system for electronic pasteurization
JP2000167029A (ja) * 1998-12-01 2000-06-20 Mitsubishi Electric Corp 放射線照射装置
US6713773B1 (en) 1999-10-07 2004-03-30 Mitec, Inc. Irradiation system and method
US6429608B1 (en) 2000-02-18 2002-08-06 Mitec Incorporated Direct injection accelerator method and system
US6653641B2 (en) 2000-02-24 2003-11-25 Mitec Incorporated Bulk material irradiation system and method
US6459089B1 (en) * 2000-03-03 2002-10-01 Steris Inc. Single accelerator/two-treatment vault system
US6707049B1 (en) 2000-03-21 2004-03-16 Mitec Incorporated Irradiation system with compact shield
US6628750B1 (en) * 2000-11-09 2003-09-30 Steris Inc. System for electron and x-ray irradiation of product
WO2002080213A2 (en) * 2001-04-02 2002-10-10 Mitec Incorporated Irradiation system and method
US7154103B2 (en) * 2001-04-02 2006-12-26 Mitec Incorporated Method of providing extended shelf life fresh meat products
US6575084B2 (en) * 2001-06-01 2003-06-10 Surebeam Corporation, Inc. System for, and method of, irradiating food products
US6683319B1 (en) 2001-07-17 2004-01-27 Mitec Incorporated System and method for irradiation with improved dosage uniformity
US6763085B2 (en) 2001-10-22 2004-07-13 Cleaner Food, Inc. Irradiation apparatus and method
US20030174810A1 (en) * 2002-03-12 2003-09-18 Steris Inc. Method and apparatus for destroying microbial contamination of mail
US6844557B2 (en) * 2002-08-20 2005-01-18 Robert Bruce Miller System for, and method of, irradiating opposite sides of an article
DE10354806A1 (de) * 2003-11-21 2005-06-02 Boehringer Ingelheim Microparts Gmbh Probenträger
US20050112248A1 (en) * 2003-11-26 2005-05-26 Galloway Richard A. Electron beam carcass irradiation system
US20070237866A1 (en) * 2006-03-10 2007-10-11 Mitec Incorporated Process for the extension of microbial life and color life of fresh meat products
WO2007107211A1 (de) * 2006-03-20 2007-09-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur eigenschaftsänderung dreidimensionaler formteile mittels elektronen
CN113409981B (zh) * 2021-06-18 2023-05-05 中国科学院近代物理研究所 一种用于电子束辐照加工的多面辐照方法及系统

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US2816231A (en) * 1953-09-29 1957-12-10 High Voltage Engineering Corp Method and apparatus for imparting a scanning movement to a beam of charged particles
US2824969A (en) * 1954-02-01 1958-02-25 Vickers Electrical Co Ltd Treatment of materials by electronic bombardment
FR1149703A (fr) * 1955-02-28 1957-12-31 British Dielectric Res Ltd Procédé perfectionné pour traiter des matières à l'aide de particules à grande énergie
US3193717A (en) * 1959-03-09 1965-07-06 Varian Associates Beam scanning method and apparatus
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JPS57500571A (de) * 1980-04-25 1982-04-01

Also Published As

Publication number Publication date
US5004926A (en) 1991-04-02
JPH02115800A (ja) 1990-04-27
CA1303258C (fr) 1992-06-09
FR2636773B1 (fr) 1990-10-26
DE68905417D1 (de) 1993-04-22
JP2958028B2 (ja) 1999-10-06
FR2636773A1 (fr) 1990-03-23
EP0360655A1 (de) 1990-03-28
DE68905417T2 (de) 1993-06-24

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