EP0342650A3 - Druckplatte - Google Patents

Druckplatte Download PDF

Info

Publication number
EP0342650A3
EP0342650A3 EP19890108875 EP89108875A EP0342650A3 EP 0342650 A3 EP0342650 A3 EP 0342650A3 EP 19890108875 EP19890108875 EP 19890108875 EP 89108875 A EP89108875 A EP 89108875A EP 0342650 A3 EP0342650 A3 EP 0342650A3
Authority
EP
European Patent Office
Prior art keywords
printing plate
photoirradiation
peelable
concerned
done
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP19890108875
Other languages
English (en)
French (fr)
Other versions
EP0342650A2 (de
EP0342650B1 (de
Inventor
Masanao Isono
Ken Kawamura
Masaya Asano
Shigeo Abiko
Tetuo Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Publication of EP0342650A2 publication Critical patent/EP0342650A2/de
Publication of EP0342650A3 publication Critical patent/EP0342650A3/de
Application granted granted Critical
Publication of EP0342650B1 publication Critical patent/EP0342650B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
EP89108875A 1988-05-18 1989-05-17 Druckplatte Expired - Lifetime EP0342650B1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP12133088 1988-05-18
JP121330/88 1988-05-18
JP124684/88 1988-05-20
JP12468488 1988-05-20

Publications (3)

Publication Number Publication Date
EP0342650A2 EP0342650A2 (de) 1989-11-23
EP0342650A3 true EP0342650A3 (de) 1991-03-13
EP0342650B1 EP0342650B1 (de) 1998-08-19

Family

ID=26458726

Family Applications (1)

Application Number Title Priority Date Filing Date
EP89108875A Expired - Lifetime EP0342650B1 (de) 1988-05-18 1989-05-17 Druckplatte

Country Status (4)

Country Link
US (1) US4957845A (de)
EP (1) EP0342650B1 (de)
CA (1) CA1320388C (de)
DE (1) DE68928789T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4126836A1 (de) * 1991-08-14 1993-02-18 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial aus schichttraeger und positiv arbeitender, strahlungsempfindlicher schicht mit rauher oberflaeche
DE69206802T2 (de) * 1992-09-30 1996-07-18 Agfa Gevaert Nv Wärmeempfindliches Aufzeichnungsmaterial zur Herstellung von Bildern oder driographischen Druckplatten
US5563023A (en) * 1994-11-02 1996-10-08 Minnesota Mining And Manufacturing Co. Photoimageable elements
US5597677A (en) * 1994-11-02 1997-01-28 Minnesota Mining And Manufacturing Company Photoimageable elements
JP3859849B2 (ja) * 1997-11-28 2006-12-20 旭化成ケミカルズ株式会社 凸版印刷用感光性樹脂版
CN1318774A (zh) * 2000-04-18 2001-10-24 富士胶片株式会社 光敏影像记录材料
EP1483624B1 (de) * 2002-03-14 2008-07-09 E.I. Du Pont De Nemours And Company Lichtempfindliches element zur benutzung als flexodruckplatte
US20040234886A1 (en) * 2003-03-12 2004-11-25 Rudolph Michael Lee Photosensitive element for use as flexographic printing plate
US7736836B2 (en) * 2004-09-22 2010-06-15 Jonghan Choi Slip film compositions containing layered silicates

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0110165A2 (de) * 1982-11-01 1984-06-13 MicroSi, Inc. (a Delaware corporation) Verfahren zur Bildkontrasterhöhung und Materialien dazu
EP0130222A1 (de) * 1983-06-16 1985-01-09 Toray Industries, Inc. Deckblatt für Druckplatte
EP0225676A2 (de) * 1985-12-09 1987-06-16 Nippon Paint Co., Ltd. Druckmaterial auf der Basis eines lichtempfindlichen Harzes
EP0249941A2 (de) * 1986-06-20 1987-12-23 Tosoh Corporation Verfahren zur Herstellung von Feinstrukturen

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2702243A (en) * 1950-06-17 1955-02-15 Azoplate Corp Light-sensitive photographic element and process of producing printing plates
US3933499A (en) * 1972-09-11 1976-01-20 Lith-Kem Corporation Printing plate comprising diazo-borofluoride and diazo resin layers
JPS5555343A (en) * 1978-10-20 1980-04-23 Toray Ind Inc Waterless lithographic printing original plate
US4804614A (en) * 1984-10-01 1989-02-14 The Aerospace Corporation Photoresist process of fabricating microelectronic circuits using water processable diazonium compound containing contrast enhancement layer
JPS6263930A (ja) * 1985-09-17 1987-03-20 Fuji Photo Film Co Ltd 画像形成材料

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0110165A2 (de) * 1982-11-01 1984-06-13 MicroSi, Inc. (a Delaware corporation) Verfahren zur Bildkontrasterhöhung und Materialien dazu
EP0130222A1 (de) * 1983-06-16 1985-01-09 Toray Industries, Inc. Deckblatt für Druckplatte
EP0225676A2 (de) * 1985-12-09 1987-06-16 Nippon Paint Co., Ltd. Druckmaterial auf der Basis eines lichtempfindlichen Harzes
EP0249941A2 (de) * 1986-06-20 1987-12-23 Tosoh Corporation Verfahren zur Herstellung von Feinstrukturen

Also Published As

Publication number Publication date
DE68928789T2 (de) 1998-12-24
DE68928789D1 (de) 1998-09-24
EP0342650A2 (de) 1989-11-23
CA1320388C (en) 1993-07-20
EP0342650B1 (de) 1998-08-19
US4957845A (en) 1990-09-18

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