EP0308636A3 - Method for matching the component currents in an electrolytic bath - Google Patents
Method for matching the component currents in an electrolytic bath Download PDFInfo
- Publication number
- EP0308636A3 EP0308636A3 EP88112599A EP88112599A EP0308636A3 EP 0308636 A3 EP0308636 A3 EP 0308636A3 EP 88112599 A EP88112599 A EP 88112599A EP 88112599 A EP88112599 A EP 88112599A EP 0308636 A3 EP0308636 A3 EP 0308636A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- matching
- electrolytic bath
- component currents
- currents
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3732476 | 1987-09-24 | ||
DE19873732476 DE3732476A1 (en) | 1987-09-24 | 1987-09-24 | METHOD FOR ADJUSTING THE PARTIAL FLOWS IN AN ELECTROLYTIC BATH |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0308636A2 EP0308636A2 (en) | 1989-03-29 |
EP0308636A3 true EP0308636A3 (en) | 1989-12-06 |
EP0308636B1 EP0308636B1 (en) | 1995-05-10 |
Family
ID=6336948
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP88112599A Expired - Lifetime EP0308636B1 (en) | 1987-09-24 | 1988-08-03 | Method for matching the component currents in an electrolytic bath |
Country Status (5)
Country | Link |
---|---|
US (1) | US5024732A (en) |
EP (1) | EP0308636B1 (en) |
JP (1) | JPH01119699A (en) |
AT (1) | AT394736B (en) |
DE (2) | DE3732476A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109468677A (en) * | 2018-12-05 | 2019-03-15 | 珠海杰赛科技有限公司 | A kind of vertical continuous electro-plating method |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4041598C1 (en) * | 1990-12-22 | 1992-06-25 | Schering Ag Berlin Und Bergkamen, 1000 Berlin, De | |
JPH05239698A (en) * | 1992-02-28 | 1993-09-17 | Nec Corp | Electroplating method |
DE19726510C2 (en) * | 1997-06-23 | 2000-12-28 | Georg Hesse | Device and method for electrolytic metal deposition using pulse current |
DE19736351C1 (en) * | 1997-08-21 | 1998-10-01 | Atotech Deutschland Gmbh | Precision galvanising of workpieces |
US6267860B1 (en) | 1999-07-27 | 2001-07-31 | International Business Machines Corporation | Method and apparatus for electroplating |
WO2001027358A1 (en) | 1999-10-12 | 2001-04-19 | Atotech Deutschland Gmbh | Carrier serving for supplying current to workpieces or counter-electrodes that are to be treated electrolytically and a method for electrolytically treating workpieces |
DE10007799C1 (en) * | 1999-10-12 | 2001-06-07 | Atotech Deutschland Gmbh | For supplying current to workpieces to be treated electrolytically or supports serving as counter electrodes and method for the electrolytic treatment of workpieces |
US6224721B1 (en) | 1999-11-30 | 2001-05-01 | Nelson Solid Temp, Inc. | Electroplating apparatus |
DE10141056C2 (en) * | 2001-08-22 | 2003-12-24 | Atotech Deutschland Gmbh | Method and device for the electrolytic treatment of electrically conductive layers in continuous systems |
DE10215463C1 (en) * | 2002-03-28 | 2003-07-24 | Atotech Deutschland Gmbh | Continuous plant for electrolytic metallization of printed circuit boards, includes precautions reducing electrical potential between adjacent workpieces |
DE102012014985B4 (en) | 2012-07-27 | 2014-08-21 | GalvaConsult GmbH | Method and device for monitoring galvanizing currents |
CN106435701A (en) * | 2016-12-14 | 2017-02-22 | 陕西宝光真空电器股份有限公司 | Plating hanger with equalizing resistance values |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1042059A (en) * | 1963-07-12 | 1966-09-07 | Harold Martin Harmer | Improvements relating to the electro-deposition of metals |
US3470082A (en) * | 1965-09-22 | 1969-09-30 | Louis W Raymond | Electroplating method and system |
DE1800954A1 (en) * | 1968-10-03 | 1970-06-11 | Siemens Ag | Copper plating baths |
DE2951708A1 (en) * | 1979-12-19 | 1981-07-02 | Schering Ag Berlin Und Bergkamen, 1000 Berlin | METHOD AND DEVICE FOR AUTOMATICALLY CONTROLLING PARTIAL CURRENTS OF A RECTIFIER |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3592754A (en) * | 1968-10-28 | 1971-07-13 | Kosaku Aihara | Apparatus for the anodic oxidation of a plurality of aluminum workpieces |
US4490230A (en) * | 1983-03-10 | 1984-12-25 | At&T Technologies, Inc. | Electroplating apparatus |
DE3640020C1 (en) * | 1986-11-24 | 1988-02-18 | Heraeus Elektroden | Electrolysis cell for the electrolytic deposition of metals |
-
1987
- 1987-09-24 DE DE19873732476 patent/DE3732476A1/en not_active Withdrawn
-
1988
- 1988-08-03 EP EP88112599A patent/EP0308636B1/en not_active Expired - Lifetime
- 1988-08-03 DE DE3853757T patent/DE3853757D1/en not_active Expired - Fee Related
- 1988-09-07 US US07/241,595 patent/US5024732A/en not_active Expired - Fee Related
- 1988-09-22 AT AT0233988A patent/AT394736B/en not_active IP Right Cessation
- 1988-09-22 JP JP63236603A patent/JPH01119699A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1042059A (en) * | 1963-07-12 | 1966-09-07 | Harold Martin Harmer | Improvements relating to the electro-deposition of metals |
US3470082A (en) * | 1965-09-22 | 1969-09-30 | Louis W Raymond | Electroplating method and system |
DE1800954A1 (en) * | 1968-10-03 | 1970-06-11 | Siemens Ag | Copper plating baths |
DE2951708A1 (en) * | 1979-12-19 | 1981-07-02 | Schering Ag Berlin Und Bergkamen, 1000 Berlin | METHOD AND DEVICE FOR AUTOMATICALLY CONTROLLING PARTIAL CURRENTS OF A RECTIFIER |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109468677A (en) * | 2018-12-05 | 2019-03-15 | 珠海杰赛科技有限公司 | A kind of vertical continuous electro-plating method |
Also Published As
Publication number | Publication date |
---|---|
DE3732476A1 (en) | 1989-04-13 |
EP0308636A2 (en) | 1989-03-29 |
DE3853757D1 (en) | 1995-06-14 |
ATA233988A (en) | 1991-11-15 |
US5024732A (en) | 1991-06-18 |
EP0308636B1 (en) | 1995-05-10 |
AT394736B (en) | 1992-06-10 |
JPH01119699A (en) | 1989-05-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS6465292A (en) | Electroplating method | |
EP0315976A3 (en) | Superconducting current limiting apparatus | |
DE3765566D1 (en) | METHOD FOR ELECTRIC PLATING. | |
GB9002638D0 (en) | Electrolytic process | |
EP0308636A3 (en) | Method for matching the component currents in an electrolytic bath | |
DE3479824D1 (en) | Electrolytic treatment method | |
GB8717288D0 (en) | Electrochemical method | |
GB2189258B (en) | Zinc-nickel alloy electrolyte and process | |
EP0255268A3 (en) | Method for electrodeposition coating | |
GB2207685B (en) | Electrolytic cell apparatus | |
JPS5751299A (en) | Electrolytic peeling bath and method | |
IL84480A0 (en) | Photo-selective plating method | |
GB8306395D0 (en) | Electrolytic stripping process and bath | |
GB8708883D0 (en) | Electroplating bath | |
GB2202177B (en) | Method for the electro-chemical processing of work-pieces. | |
DE3477679D1 (en) | Method for electrolytic treatment | |
GB2203756B (en) | Electrolytic treatment | |
EP0314498A3 (en) | Electrolytic finishing method | |
GB2178058B (en) | Improvements in electrolytic galvanizing processes | |
GB8913561D0 (en) | Method of stabilising an organic additive in an electroplating solution | |
EP0389639A4 (en) | Centering method in an electrolytic finishing apparatus | |
GB8703996D0 (en) | Electrolytic colouring method | |
GB8603618D0 (en) | Electrolytic apparatus | |
GB8724086D0 (en) | Electrolytic bath | |
GB8706922D0 (en) | Electroplating method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19880803 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): BE CH DE ES FR GB IT LI LU NL SE |
|
PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): BE CH DE ES FR GB IT LI LU NL SE |
|
17Q | First examination report despatched |
Effective date: 19920311 |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: ATOTECH DEUTSCHLAND GMBH |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): BE CH DE ES FR GB IT LI LU NL SE |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRE;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED.SCRIBED TIME-LIMIT Effective date: 19950510 Ref country code: ES Free format text: THE PATENT HAS BEEN ANNULLED BY A DECISION OF A NATIONAL AUTHORITY Effective date: 19950510 Ref country code: BE Effective date: 19950510 Ref country code: NL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 19950510 |
|
REF | Corresponds to: |
Ref document number: 3853757 Country of ref document: DE Date of ref document: 19950614 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Effective date: 19950810 |
|
ET | Fr: translation filed | ||
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 19950831 Ref country code: LI Effective date: 19950831 Ref country code: CH Effective date: 19950831 |
|
GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 19950821 |
|
NLV1 | Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents act | ||
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
26N | No opposition filed | ||
REG | Reference to a national code |
Ref country code: GB Ref legal event code: IF02 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20020708 Year of fee payment: 15 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20020712 Year of fee payment: 15 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20020724 Year of fee payment: 15 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20030803 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20040302 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20030803 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20040430 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST |