EP0227517B1 - Verfahren und Vorrichtung zur Kontrolle der Metall-Abscheidungsmenge auf elektrolytischem Weg auf einem kontinuierlich laufenden Band - Google Patents
Verfahren und Vorrichtung zur Kontrolle der Metall-Abscheidungsmenge auf elektrolytischem Weg auf einem kontinuierlich laufenden Band Download PDFInfo
- Publication number
- EP0227517B1 EP0227517B1 EP86402522A EP86402522A EP0227517B1 EP 0227517 B1 EP0227517 B1 EP 0227517B1 EP 86402522 A EP86402522 A EP 86402522A EP 86402522 A EP86402522 A EP 86402522A EP 0227517 B1 EP0227517 B1 EP 0227517B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- metal
- bridge
- band
- bridges
- gauge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 34
- 239000002184 metal Substances 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims abstract description 15
- 230000008569 process Effects 0.000 title claims abstract description 11
- 238000000576 coating method Methods 0.000 claims abstract description 17
- 239000011248 coating agent Substances 0.000 claims abstract description 15
- 239000003792 electrolyte Substances 0.000 claims abstract description 6
- 230000001105 regulatory effect Effects 0.000 claims abstract description 6
- 230000000737 periodic effect Effects 0.000 claims abstract description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 45
- 229910052718 tin Inorganic materials 0.000 claims description 45
- 238000005259 measurement Methods 0.000 claims description 15
- 238000000151 deposition Methods 0.000 claims description 11
- 230000008021 deposition Effects 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 238000010200 validation analysis Methods 0.000 claims description 5
- 238000012546 transfer Methods 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 238000006073 displacement reaction Methods 0.000 claims description 2
- 239000011135 tin Substances 0.000 claims 1
- 238000009434 installation Methods 0.000 description 26
- 238000004364 calculation method Methods 0.000 description 9
- 238000012937 correction Methods 0.000 description 9
- 230000008859 change Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000010276 construction Methods 0.000 description 3
- NIWWFAAXEMMFMS-OIOBTWANSA-N curium-244 Chemical compound [244Cm] NIWWFAAXEMMFMS-OIOBTWANSA-N 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 230000001052 transient effect Effects 0.000 description 2
- 240000008042 Zea mays Species 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000013479 data entry Methods 0.000 description 1
- 238000009658 destructive testing Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- JFRJCQJVFMHZOO-QZHHGCDDSA-N n-(2-aminoethyl)-2-[4-[[2-[4-[[9-[(2r,3r,4s,5r)-3,4-dihydroxy-5-(hydroxymethyl)oxolan-2-yl]purin-6-yl]amino]phenyl]acetyl]amino]phenyl]acetamide Chemical compound C1=CC(CC(=O)NCCN)=CC=C1NC(=O)CC(C=C1)=CC=C1NC1=NC=NC2=C1N=CN2[C@H]1[C@H](O)[C@H](O)[C@@H](CO)O1 JFRJCQJVFMHZOO-QZHHGCDDSA-N 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
Definitions
- the present invention relates to the technique of depositing an electrolytic coating on a continuously moving metal strip and relates more particularly to the regulation of metal deposition using a microprocessor.
- the tin is supplied to the tinning installation in the form of bars placed on a copper support serving as an anode.
- the number of tin bars on each support depends on the width of the strip to be tinned.
- tin bars which are in fact consumable electrodes are mounted on conductive slides, which makes it possible to replace them when they are worn, continuously and without stopping the line.
- each tray In each tray are placed a lower rubber roller and a chromed upper roller between which the band is stretched. Together, they form the cathode of the corresponding tank.
- the bridges are supplied with a direct voltage of 24V and receive a current limited to 4500 A.
- the rate of tin deposited is a function of the width of the strip, the speed of travel thereof and the overall current which is distributed over the various bridges in service.
- the intensity of the current is given by the following relation taken from Faraday's law.
- the operator adjusts the target tin rate by acting directly on the overall current (1 G). It must first display the width of the strip.
- the tinning rate is kept constant by regulating the current to a value proportional to the line speed.
- this regulation does not prevent under-tinning and over-tinning during intermediate states (speed change, rate change, cut or addition of a bridge).
- the. quantity of tin deposited is equal to: i being the serial number of the bridge.
- the measurement is based on the principle of X-ray fluorescence.
- the gauge uses two sources of curium 244 with a radioactive period of 17.6 years. The energy released by the source causes an emission of fluorescent rays from iron, part of which is absorbed by tin. It is by determining the quantity of radiation remaining that the tin deposited is calculated.
- the gauge scans approximately every 30 seconds. Simultaneously, the transverse profiles of the coating appear, the instantaneous average measured values and those of the last scan, and the minimum threshold authorized by the standards in force for tinning operations such as EURONORM. For comparison, the last saved profile remains on the screen.
- the invention therefore aims to create a method and a device for regulating the electrolytic deposition of a metal coating on a continuously moving strip of metal enabling these drawbacks to be remedied by taking into account the quantities of metal deposited by each bridge and by adapting the settings on the deposit line according to these quantities.
- It therefore relates to a method of regulating the quantity of a metal deposited electrolytically on a strip to be coated continuously scrolling in a deposition installation comprising several reservoirs filled with electrolyte, the strip passing over a conductive roller forming cathode associated with each reservoir and the coating metal being supplied by bars of said metal carried by conductive bridges forming anodes arranged in each reservoir on part of the path of the strip in said reservoir, characterized in that it consists in calculating at each displacement of the strip between two successive bridges, the deposition of metal on each bridge as a function of the intensity of the supply current of this bridge, the speed of the strip and the efficiency of the bridge, to be followed separately for each length of strip equal to the distance between two successive bridges by accumulating successive metal deposits, to establish the balance sheet of the deposit under the last bridge delivering current in order to determine the intensity required under this bridge in order to complete the metal deposition, to determine the overall intensity necessary to obtain the desired intensity under this last bridge, and each time a measurement is acquired average over the entire width
- the process defined above also comprises the phases consisting in determining experimental curves of the yield as a function of the intensity of the supply current of each bridge of the installation, in collecting indications relating to bridges in service or out of service, to establish the analog values of the intensity on each bridge and of the maximum current intensity on all the bridges, to measure the speed of travel of the strip, to establish, set values relating to the quantity of metal to be deposited, to measure the overall quantity of metal deposited using a periodic scanning gauge, to determine the lower and upper averages of the quantity of metal measured by the gauge to each scan and to establish from the above data a regulation model.
- tinning tank used in the construction of a tinning installation to which the invention is applied.
- the invention also applies to installations for the electrolytic deposition of coatings of metals other than tin such as chromium, copper or the like.
- the tank comprises a reservoir 1 containing electrolyte not shown.
- a roller 2 In the bottom of the tank is rotatably mounted a roller 2 on which passes continuously a strip B to be coated with a layer of tin.
- the roller 2 is made for example of rubber.
- a second roller 3 Above the reservoir 1 is disposed a second roller 3, for example chrome-plated, of conductive material which ensures the tension of the strip and its transfer into the reservoir 1 from an identical reservoir, not shown, which, with other reservoirs of the same type, arranged upstream and downstream of the tank 1, is part of the tinning installation.
- the roller 3 acts as a cathode associated with the reservoir 1.
- a wringing roller presses the strip B against the roller 3 in order to avoid the formation of electric arcs.
- the strip B passes into the tank 1 between two pairs of supports 4 and 5 (Fig. 2) constituted by copper bars on which are placed side by side vertical tin bars 6 whose feet are engaged in a guide 7 U-shaped.
- the copper bars 4 and 5 form slides for the tin bars and are connected to a corresponding bar 7 for supplying current.
- the strip B therefore passes through two passages formed by the tin bars 6 carried by their corresponding supports 4 and 5, formed respectively on its descent and ascent path in the reservoir 1 filled with electrolyte.
- the supports or bridges 4,5 and the tin bars 6 act as the anode of the device.
- the container thus formed is carried by a frame 10 which also supports the other containers of the installation (not shown).
- a gasket 11 made of insulating material is interposed between the frame and the connection 12 of the supports 4,5 to the current supply bar 7
- a gauge formed by two cells arranged as shown in Fig.3.
- the strip B on the two faces of which a coating of tin has just been deposited passes over a deflector roller 15 opposite which is disposed a first cell 16 intended to measure the coating of tin of a first face of the loop B.
- the cell 16 comprises a source 17 of curium 244 placed on a support 18 mounted oscillating on a base 19 and movable around its axis of oscillation 20 by a pneumatic cylinder 21.
- the strip B then passes over a second deflector roller 22 opposite which is disposed a second cell 23 similar to the cell 16 and intended to measure the coating of tin on the opposite face of the strip B.
- This cell also includes a source 24 of curium 244 placed on a support 25 mounted oscillating on a base 26 and actuated by a pneumatic cylinder 27.
- This circuit includes an analog-digital and digital-analog converter 30, for example of the ADAC 735 type which comprises, for an installation with twelve tinning tanks forty eight analog inputs 31 relating to the intensities of the currents applied to the supports of all the tanks, such as the bridges 4,5 of the tank in Fig. 1 and 2.
- the converter 30 also comprises two analog inputs 32 intended to receive information on the position of the cells 16, 23 from the gauges and two analog inputs 33 intended to receive information relating to the average values of the deposits of tin on the two faces of the strip. .
- the converter 30 further comprises an analog input 34 intended to receive signals relating to the width of the band B processed, two analog inputs 35 relating to the maximum upper and lower intensities and two analog outputs relating to the overall lower and upper intensity to be distributed on the bridges of the installation.
- the converter 30 is connected to a multi-conductor bus 36.
- the circuit of Fig.4 further includes a counter 37 whose input is connected to the output of a band B pulse generator (not shown) and which is also connected to bus 36, a circuit interface 38 of the SBC 519 type manufactured and sold by Intel, with thirty two digital inputs 39 relating to the lower and upper set values of the tin rate to be obtained, thirty two digital inputs 40 relating to the commercial set values, one input 41 for validation of automatic / manual operation and an input 42 for setpoint validation. Circuit 38 is also connected to bus 36.
- circuit in Fig. 4 includes a microprocessor 43 of the Intel 8088 type for example, connected to bus 36 and intended to control changes in the level of tin to be deposited in the various tanks of the installation as a function of the information qu 'he receives.
- a first phase of operation of the installation is the phase of acquiring information relating to the operation in progress.
- the converter 30 receives on its forty-eight inputs measurements of the intensities on the bridges 4.5 of the twelve tanks of the installation.
- the converter 30 reads the currents on each of the bridges. This intensity information is transmitted to the microprocessor 43 which, during phase 51, calculates the values of the tin deposits under each bridge, taking into account the information on the speed of travel of the strip which is supplied to it by the counter 37, of the efficiency of each bridge and of the position of the gauge materializing the width of the strip, these two pieces of information being delivered by the converter 30.
- the microprocessor 43 cumulates information relating to the deposit in progress with the previous deposit.
- the information relating to the last bridge depositing tin during a sweep of the gauge is received on the analog inputs 31 of the converter 30.
- the quantity of tin to be deposited by the last bridge is calculated from the information on set point rates, lower and higher to be obtained, entered by the operator on the inputs 39 of the interface circuit 38. Then, during phase 55, the microprocessor 43 calculates the approximate intensity necessary as a function of the information on the quantity of tin to be deposited by the last bridge and the information on bandwidth, the value of the coating measured by the gauge and the speed of travel of the strip it receives by the bus 36, coming from the converter 30 and the counter 37.
- the microprocessor 43 calculates the efficiency of the bridge from the intensity calculated during phase 55 and this from pre-established curves shown in FIG. 8.
- the microprocessor calculates the necessary intensity corresponding to the yield determined during phase 56, taking into account the value of the coating measured by the gauge and the speed of travel of the strip.
- phase 58 there is a question about the difference between the intensity required and the intensity actually applied to the last bridge.
- phase 60 the strip is brought forward by one step.
- phase 58 If the answer to the interrogation of phase 58 is no, the calculations of phases 56 and 57 are repeated on the data relating to the deposit of tin by a bridge located downstream until the difference in intensity is low.
- the flowchart in Fig.7 is a "slow loop" flowchart which controls drift corrections.
- the acquisition of a measurement made during phase 61 is the reading of the average tin deposit value made by the converter 30 of FIG. 4 at each end of scanning of the gauge of FIG. 3.
- This phase is followed by an interrogation phase 62 relating to the transition from installation to automatic.
- the microprocessor 43 proceeds during phase 65, to the calculation of a gauge yield, that is to say of the ratio between the deposit of tin measured by the gauge and the deposit to be obtained.
- phase 64 The affirmative response to the interrogation of phase 64 causes the setpoint to be validated via the interface circuit 38.
- a regulation current (IC) will be calculated which will be applied to the last bridge.
- step 4 the calculated rate (TC - 2 g / mz) is higher than the rate targeted TV.
- TC - 2 g / mz the calculated rate
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Automation & Control Theory (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Metals (AREA)
- Contacts (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT86402522T ATE52546T1 (de) | 1985-11-19 | 1986-11-13 | Verfahren und vorrichtung zur kontrolle der metall-abscheidungsmenge auf elektrolytischem weg auf einem kontinuierlich laufenden band. |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8517095A FR2590278B1 (fr) | 1985-11-19 | 1985-11-19 | Procede et dispositif de regulation de la quantite d'un metal depose par voie electrolytique sur une bande defilant en continu |
FR8517095 | 1985-11-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0227517A1 EP0227517A1 (de) | 1987-07-01 |
EP0227517B1 true EP0227517B1 (de) | 1990-05-09 |
Family
ID=9324962
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP86402522A Expired - Lifetime EP0227517B1 (de) | 1985-11-19 | 1986-11-13 | Verfahren und Vorrichtung zur Kontrolle der Metall-Abscheidungsmenge auf elektrolytischem Weg auf einem kontinuierlich laufenden Band |
Country Status (9)
Country | Link |
---|---|
US (1) | US4699694A (de) |
EP (1) | EP0227517B1 (de) |
JP (1) | JPH0765238B2 (de) |
AT (1) | ATE52546T1 (de) |
CA (1) | CA1308686C (de) |
DE (1) | DE3671045D1 (de) |
ES (1) | ES2016270B3 (de) |
FR (1) | FR2590278B1 (de) |
GR (1) | GR3000694T3 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2704241B1 (fr) * | 1993-04-22 | 1995-06-30 | Lorraine Laminage | Procede de regulation d'electro-deposition sur une bande de metal. |
US5668570A (en) * | 1993-06-29 | 1997-09-16 | Ditzik; Richard J. | Desktop computer with adjustable flat panel screen |
US5914022A (en) * | 1996-01-05 | 1999-06-22 | Lowry; Patrick Ross | Method and apparatus for monitoring and controlling electrodeposition of paint |
EP0834604B1 (de) * | 1996-09-17 | 2002-07-10 | Texas Instruments Incorporated | Elektroplattierungsverfahren |
US6187153B1 (en) * | 1997-09-16 | 2001-02-13 | Texas Instruments Incorporated | Comparator for monitoring the deposition of an electrically conductive material on a leadframe to warn of improper operation of a leadframe electroplating process |
JP5884169B2 (ja) * | 2012-03-01 | 2016-03-15 | Jfeスチール株式会社 | 電気めっき鋼板の製造ラインの自溶性電極の消費量自動監視システム及び方法 |
AT516722B1 (de) * | 2015-07-27 | 2016-08-15 | Berndorf Band Gmbh | Verfahren und Vorrichtung zur Herstellung eines Metallbands gleichmäßiger Dicke |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB688189A (en) * | 1950-12-13 | 1953-02-25 | United States Steel Corp | Electrical measuring instrument |
DE2347759C3 (de) * | 1973-09-22 | 1981-10-08 | Fernsteuergeräte Kurt Oelsch KG, 1000 Berlin | Verfahren zur Bestimmung der Schichtdicke von elektrolytisch erzeugten Überzügen |
US4240881A (en) * | 1979-02-02 | 1980-12-23 | Republic Steel Corporation | Electroplating current control |
JPH0233800B2 (ja) * | 1983-08-23 | 1990-07-30 | Nippon Steel Corp | Renzokudenkimetsukiniokerumetsukidenryuseigyohoho |
-
1985
- 1985-11-19 FR FR8517095A patent/FR2590278B1/fr not_active Expired
-
1986
- 1986-11-13 ES ES86402522T patent/ES2016270B3/es not_active Expired - Lifetime
- 1986-11-13 EP EP86402522A patent/EP0227517B1/de not_active Expired - Lifetime
- 1986-11-13 AT AT86402522T patent/ATE52546T1/de not_active IP Right Cessation
- 1986-11-13 DE DE8686402522T patent/DE3671045D1/de not_active Expired - Lifetime
- 1986-11-18 CA CA000523178A patent/CA1308686C/en not_active Expired - Lifetime
- 1986-11-18 US US06/932,013 patent/US4699694A/en not_active Expired - Lifetime
- 1986-11-19 JP JP61276404A patent/JPH0765238B2/ja not_active Expired - Fee Related
-
1990
- 1990-08-03 GR GR90400556T patent/GR3000694T3/el unknown
Also Published As
Publication number | Publication date |
---|---|
GR3000694T3 (en) | 1991-09-27 |
EP0227517A1 (de) | 1987-07-01 |
FR2590278A1 (fr) | 1987-05-22 |
US4699694A (en) | 1987-10-13 |
DE3671045D1 (de) | 1990-06-13 |
FR2590278B1 (fr) | 1988-02-05 |
ATE52546T1 (de) | 1990-05-15 |
ES2016270B3 (es) | 1990-11-01 |
JPH0765238B2 (ja) | 1995-07-12 |
JPS62260099A (ja) | 1987-11-12 |
CA1308686C (en) | 1992-10-13 |
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