EP0224582A1 - Appareil de calibrage pour circuits integres - Google Patents
Appareil de calibrage pour circuits integresInfo
- Publication number
- EP0224582A1 EP0224582A1 EP19860904232 EP86904232A EP0224582A1 EP 0224582 A1 EP0224582 A1 EP 0224582A1 EP 19860904232 EP19860904232 EP 19860904232 EP 86904232 A EP86904232 A EP 86904232A EP 0224582 A1 EP0224582 A1 EP 0224582A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- thin film
- resistive layer
- components
- film components
- termination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Definitions
- the present invention relates to calibration apparatus for the automated on-wafer testing of integrated circuits and in particular for the automated on-wafer testing of Gallium Arsenide (Ga As) integrated circuits.
- Ga As Gallium Arsenide
- Network analysis in a coaxial or waveguide medium is, conventially, achieved by using a wide range of calibration and verification components.
- a variety of such components e.g. matched load, short circuit, open circuit etc.
- error models for the measurement ports and thus remove the error terms from subsequent measurements.
- This technique is known as 8 to 12 term error and is described in "Error Models " for Systems Measurements", Microwave Journal, May 1978 by J. Fitzpatrick.
- no such components are available for variable geometry microwave probe measurements and furthermore, such components would not permit an automated calibration/test procedure to be achieved, resulting in higher production costs of the devices under test.
- apparatus for calibrating an integrated circuit test system comprising a substrate having a substantially planar array of thin film components formed thereon, at least one of the components having contact pads arranged such that they can be engaged by a coplanar waveguide probe of the integrated circuit test system.
- the substrate may comprise alumina and the thin film components may comprise a resistive layer haying an overlay of metallised conductors.
- the resistive layer may comprise nichrome and the metallised conductors may comprise gold.
- the resistive layer may be deposited to a thickness to provide a sheet resistance of 50.ilper square for the resistive layer.
- low inductance ground connections for the components are provided by via holes containing conductive meterial, such as conductive epoxy or metal.
- the thin film components 1 to 9 are formed on an alumina substrate, typically 1 inch square, with a thin resistive layer - NiCr for example - and plated gold conductors.
- the resistive layer is deposited to a thickness which provides sheet resistance of 50 per square.
- the components 1 to 9 comprise as follows:- (1) 50- ⁇ terminations for alignment check,
- Offset short circuits low inductance short circuits displaced by a length of 50-i2-transmission line;
- the components 1 to 9 achieve low inductance local grounding by the use of via holes which may be filled with conductive material, such as conductive epoxy or metal or a metal plating on the wall of the via holes.
- conductive material such as conductive epoxy or metal or a metal plating on the wall of the via holes.
- the components are arranged to have the same width as the IC to be tested to remove the need for adjustment of the measuring probes between calibration and measurement and to permit auto-stepped execution of the calibration procedure.
- the particular example illustrated is designed for an IC having one input and two output RF ports, but other designs may be used for alternative input/output port combinations.
- Calibration using such a substrate allows the use of error correction under computer control resulting in S-parameter measurements with reference planes at the •probe tips, i.e. the IC RF contact pads. This removes the need for sophisticated but error-prone de-embedding techniques and is particularly valuable in individual IC component element characterisation.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Measurement Of Resistance Or Impedance (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
- Measuring Leads Or Probes (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB858515025A GB8515025D0 (en) | 1985-06-13 | 1985-06-13 | Calibration apparatus |
GB8515025 | 1985-06-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
EP0224582A1 true EP0224582A1 (fr) | 1987-06-10 |
Family
ID=10580709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19860904232 Withdrawn EP0224582A1 (fr) | 1985-06-13 | 1986-06-13 | Appareil de calibrage pour circuits integres |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0224582A1 (fr) |
JP (1) | JPS63500907A (fr) |
GB (2) | GB8515025D0 (fr) |
WO (1) | WO1986007493A1 (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6445202B1 (en) | 1999-06-30 | 2002-09-03 | Cascade Microtech, Inc. | Probe station thermal chuck with shielding for capacitive current |
JP4183859B2 (ja) * | 1999-09-02 | 2008-11-19 | 株式会社アドバンテスト | 半導体基板試験装置 |
DE10056882C2 (de) * | 2000-11-16 | 2003-06-05 | Infineon Technologies Ag | Verfahren zum Kalibrieren eines Testsystems für Halbleiterbauelemente und Testsubstrat |
US7492172B2 (en) | 2003-05-23 | 2009-02-17 | Cascade Microtech, Inc. | Chuck for holding a device under test |
US7250626B2 (en) * | 2003-10-22 | 2007-07-31 | Cascade Microtech, Inc. | Probe testing structure |
CN103954927B (zh) * | 2014-05-21 | 2016-03-23 | 常州天合光能有限公司 | 体积电阻与方块电阻转换校准装置及其校准方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4349792A (en) * | 1978-07-14 | 1982-09-14 | Kings Electronics Co., Inc. | Pi pad attenuator |
US4272739A (en) * | 1979-10-18 | 1981-06-09 | Morton Nesses | High-precision electrical signal attenuator structures |
DE3382183D1 (de) * | 1982-12-23 | 1991-04-04 | Sumitomo Electric Industries | Monolithische integrierte mikrowellenschaltung und verfahren zum auswaehlen derselben. |
-
1985
- 1985-06-13 GB GB858515025A patent/GB8515025D0/en active Pending
-
1986
- 1986-06-13 JP JP50355186A patent/JPS63500907A/ja active Pending
- 1986-06-13 GB GB08614398A patent/GB2184849A/en not_active Withdrawn
- 1986-06-13 EP EP19860904232 patent/EP0224582A1/fr not_active Withdrawn
- 1986-06-13 WO PCT/GB1986/000346 patent/WO1986007493A1/fr not_active Application Discontinuation
Non-Patent Citations (1)
Title |
---|
See references of WO8607493A1 * |
Also Published As
Publication number | Publication date |
---|---|
GB2184849A (en) | 1987-07-01 |
GB8614398D0 (en) | 1986-07-16 |
JPS63500907A (ja) | 1988-03-31 |
WO1986007493A1 (fr) | 1986-12-18 |
GB8515025D0 (en) | 1985-07-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19870310 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH DE FR IT LI LU NL SE |
|
17Q | First examination report despatched |
Effective date: 19881020 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 19900103 |
|
EUG | Se: european patent has lapsed |
Ref document number: 86904232.5 Effective date: 19920227 |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: SPARROW, JOHN Inventor name: BUCK, BRIAN, JEFFREY Inventor name: EDDISON, IAN, GREGORY |