EP0139039A1 - Stripping bath and process for the electrolytical stripping of metals from titanium as a base metal - Google Patents
Stripping bath and process for the electrolytical stripping of metals from titanium as a base metal Download PDFInfo
- Publication number
- EP0139039A1 EP0139039A1 EP83110698A EP83110698A EP0139039A1 EP 0139039 A1 EP0139039 A1 EP 0139039A1 EP 83110698 A EP83110698 A EP 83110698A EP 83110698 A EP83110698 A EP 83110698A EP 0139039 A1 EP0139039 A1 EP 0139039A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- titanium
- metals
- sulfonic acids
- base metal
- bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 27
- 239000002184 metal Substances 0.000 title claims abstract description 27
- 239000010936 titanium Substances 0.000 title claims abstract description 27
- 229910052719 titanium Inorganic materials 0.000 title claims abstract description 27
- 150000002739 metals Chemical class 0.000 title claims abstract description 19
- 239000010953 base metal Substances 0.000 title claims abstract description 13
- 238000000034 method Methods 0.000 title claims abstract description 12
- 229910052718 tin Inorganic materials 0.000 claims abstract description 12
- -1 alkyl sulfonic acids Chemical class 0.000 claims abstract description 11
- 229910052802 copper Inorganic materials 0.000 claims abstract description 10
- 239000010949 copper Substances 0.000 claims abstract description 10
- 229910052745 lead Inorganic materials 0.000 claims abstract description 8
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 8
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 5
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 4
- 229910052793 cadmium Inorganic materials 0.000 claims abstract description 4
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 3
- 238000009835 boiling Methods 0.000 claims abstract description 3
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 3
- 239000000243 solution Substances 0.000 claims description 16
- 239000012190 activator Substances 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 claims 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 claims 1
- 150000003460 sulfonic acids Chemical class 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 9
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 9
- 238000000576 coating method Methods 0.000 description 7
- 239000011135 tin Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 4
- 229910001128 Sn alloy Inorganic materials 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 229940098779 methanesulfonic acid Drugs 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 3
- WLXGQMVCYPUOLM-UHFFFAOYSA-N 1-hydroxyethanesulfonic acid Chemical compound CC(O)S(O)(=O)=O WLXGQMVCYPUOLM-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 238000001784 detoxification Methods 0.000 description 2
- 239000011133 lead Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000009419 refurbishment Methods 0.000 description 1
- 238000012958 reprocessing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910001174 tin-lead alloy Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F5/00—Electrolytic stripping of metallic layers or coatings
Definitions
- the invention relates to a demetallization bath for the electrolytic removal of metals from titanium as the base metal.
- the invention also relates to the use of the bath in a process for the electrolytic removal of metals from titanium as the base metal in an electrolytic process.
- metals also deposit on the frame, over time a metal layer builds up on the frames, which negatively influences the functioning of the contact. Therefore, the frames have to be cleaned of the separated metals after a certain period of operation. This takes several hours or even days.
- demetallization baths also contain aromatic nitro compounds as oxidizing agents, which interfere with the reprocessing of the solutions used.
- the object of the invention is to provide a demetallizing bath and a method for demetallizing titanium base metal provided with metal coatings, which enables simple removal of the metals from the titanium base metal by electrolytic means. Associated with this task is to show a stable oxidizing agent-free demetallizing bath and its use in the electrolytic removal of metals from titanium as the base metal.
- a demetallization bath for the electrolytic removal of Cd, Cr, Cu, Cu alloys, Ni, Pb, Pb / Sn, Sn and Zn from titanium as the base metal, which contains an aqueous solution of one or more alkylsulfonic acids in a concentration of 1 g / 1 contains up to the solubility limit.
- Alkyl sulfonic acids for the aforementioned purpose are preferably those with 1 to 4 carbon atoms.
- the alkyl groups can optionally be hydroxy-substituted.
- Examples of preferred alkyl sulfonic acids are CH 2 (SO 3 H) 2 , CH 3 S 0 3 H and HOCH 2 -C H 2 S0 3 H.
- the demetallization baths according to the invention can contain customary auxiliaries, such as activators, which accelerate the dissolution of the metals, gates, such as non-ionic surfactants, which favor the compact deposition of the dissolved metals in the alkyl sulfonic acid-containing solution on the cathode. This prevents metal powders from accumulating in the work containers.
- auxiliaries such as activators, which accelerate the dissolution of the metals
- gates such as non-ionic surfactants, which favor the compact deposition of the dissolved metals in the alkyl sulfonic acid-containing solution on the cathode. This prevents metal powders from accumulating in the work containers.
- the titanium base metal with the metal coatings to be removed is switched as an anode and the electrolysis is carried out at a current density of 0.1 to 100 A / dm 2 , a voltage of 0.1 to 25 V and at a temperature between 15 ° C and the boiling point of the solution carried out taking care that the breakdown voltage for titanium is not exceeded under the given conditions.
- a particular advantage of the demetallization bath according to the invention and its use for the electrolytic removal of metals from titanium as the base metal can be seen in the fact that the titanium is not attacked by the demetallization bath.
- the attack on titanium is immeasurably small and the base metal can be freed from the metal or metals deposited thereon with practically no damage.
- Another advantage can also be seen in the fact that the detached metals that have gone anodically in solution are simple can be deposited cathodically. It is therefore not necessary, as is the case with conventional stripper solutions, to discard the stripper solution after saturation.
- a titanium sheet of 100 x 20 x 2 mm alternately a 20 / um thick shiny copper layer and then a 10 / um thick lead-tin layer are deposited and this is repeated several times until there is an approximately 1 mm thick layer on the titanium sheet.
- a solution is prepared from 250 g / 1 hydroxyethanesulfonic acid and 750 g / 1 water.
- the titanium sheet coated with copper and tin is immersed in this solution and switched anodically.
- the electrolysis is carried out until the copper and lead-tin coatings are completely detached. This takes about 200 minutes. It is then electrolyzed for a further 60 minutes under the same conditions.
- the lead tin alloy and the metals copper, tin, silver and zinc are deposited on titanium sheet.
- the metal is then anodically detached in an electrolyte containing 175 g / 1 methanesulfonic acid at 25 ° C. and the current yield is determined.
- the lead tin alloy is deposited on titanium sheet.
- the alloy is then removed from the titanium surface in an electrolyte which contains 175 g / 1 methanesulfonic acid and 40 g / 1 fine-grain additive.
- an electrolyte which contains 175 g / 1 methanesulfonic acid and 40 g / 1 fine-grain additive.
- By varying the temperature, stirring motion and cathodic current density it is determined whether lead tin can be cathodically compact again. With moderate stirring, compact, smooth and firmly adhering lead tin coatings are obtained on the cathode at 60 ° C. and a cathodic current density of 10 A / dm 2 . At room temperature, compact and adherent coatings can be obtained up to a cathodic current density of 5 A / dm2 and otherwise the same conditions.
- Bright nickel and semi-gloss nickel are cathodically deposited on titanium sheet. These coatings are then anodically dissolved in an electrolyte.
- the electrolyte contains 100 g / 1 methanesulfonic acid and various concentrations of halides.
- the anodic current yield is determined at 20 A / dm 2 (anodic) and a temperature of 25 to 30 ° C. The results are shown in the table below.
- Titanium anodized, is not attacked under these conditions.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrolytic Production Of Metals (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
Die Erfindung betrifft ein Entmetallisierungsbad zum elektrolytischen Abziehen von Metallen von Titan als Grundmetall. Die Erfindung betrifft auch die Anwendung des Bades in einem Verfahren zum elektrolytischen Abziehen von Metallen von Titan als Grundmetall in einem elektrolytischen Verfahren.The invention relates to a demetallization bath for the electrolytic removal of metals from titanium as the base metal. The invention also relates to the use of the bath in a process for the electrolytic removal of metals from titanium as the base metal in an electrolytic process.
Bei der Herstellung von Leiterplatten werden Gestelle, an denen die Leiterplatten befestigt werden, verwendet. Diese Gestelle dienen zur Übertragung des elektrischen Stromes auf die Leiterplatten. Bei der praktischen Anwendung scheiden sich auf den Gestellkontakten, d.h. an den Verbindungsstellen zwischen dem Gestell zur Leiterplatte die bei der Herstellung der Leiterplatten verwendeten Metalle ab. Bei der Metall-Resist-Technik wendet man üblicherweise die Reihenfolge Kupfer, Zinn oder Bleizinn oder Nickel an. Dabei dienen die Metalle Zinn, Blei- zinn oder Nickel als Ätzresiste. Da sich dieseIn the manufacture of printed circuit boards, racks to which the printed circuit boards are attached are used. These frames are used to transfer the electrical current to the circuit boards. In practical use, the metals used in the manufacture of the printed circuit boards separate out on the frame contacts, ie at the connection points between the frame and the printed circuit board. The order of copper, tin or lead tin or nickel is usually used in the metal resist technique. The metals tin, lead tin or nickel serve as etching resists. Because this
Metalle zwangsläufig auch auf dem Gestell abscheiden, baut sich im Laufe der Zeit auf den Gestellen eine Metallschicht auf, wodurch die Funktionsweise der Kontaktierung negativ beeinflußt wird. Daher muß man die Gestelle nach einer gewissen Betriebszeit von den abgeschiedenen Metallen reinigen. Hierfür sind mehrere Stunden oder sogar Tage notwendig.Inevitably, metals also deposit on the frame, over time a metal layer builds up on the frames, which negatively influences the functioning of the contact. Therefore, the frames have to be cleaned of the separated metals after a certain period of operation. This takes several hours or even days.
Aus der europäischen Patentanmeldung 0 077 582 ist es bekannt, Zinn oder Legierungen aus Zinn-Blei von einem Substrat unter Verwendung einer Lösung, die Alkylsulfonsäuren oder Oxycarbonsäuren sowie organische Oxidationsmittel enthält, zu entfernen. Nachteile dieser Lösungen sind:
- (a) Verwendung irreversibler, teurer Oxidationsmittel,
- (b) Die Lösungen sind erschöpft, wenn ca 40 bis 60 g/1 Metall abgezogen worden sind. Die Lösung muß dann verworfen werden. Eine Wiederaufarbeitung ist nicht möglich.
- (c) Die nicht mehr brauchbaren Lösungen müssen einem besonderen Standentgiftungsverfahren unterworfen werden, da sie Komplexbildner, wie Thioharnstoff, enthalten. Diese Entgiftungsverfahren sind sehr kostspielig.
- (a) use of irreversible, expensive oxidizing agents,
- (b) The solutions are exhausted when approx. 40 to 60 g / 1 metal has been removed. The solution must then be discarded. Refurbishment is not possible.
- (c) The no longer usable solutions have to be subjected to a special detoxification process because they contain complexing agents such as thiourea. These detoxification procedures are very expensive.
Außerdem enthalten diese Entmetallisierungsbäder als Oxidationsmittel aromatische Nitroverbindungen, die bei der Wiederaufarbeitung der verwendeten Lösungen stören.These demetallization baths also contain aromatic nitro compounds as oxidizing agents, which interfere with the reprocessing of the solutions used.
Aufgabe der Erfindung ist es, ein Entmetallisierungsbad und ein Verfahren zum Entmetallisieren von mit Metallüberzügen versehenem Titan-Grundmetall zur Verfügung zu stellen, das ein einfaches elektrolytisches Abziehen der Metalle von dem Titan-Grundmetall ermöglicht. Verbunden mit dieser Aufgabe ist es, ein stabiles Oxidationsmittel-freies Entmetallisierungsbad und dessen Verwendung beim elektrolytischen Abziehen von Metallen von Titan als Grundmetall zu zeigen.The object of the invention is to provide a demetallizing bath and a method for demetallizing titanium base metal provided with metal coatings, which enables simple removal of the metals from the titanium base metal by electrolytic means. Associated with this task is to show a stable oxidizing agent-free demetallizing bath and its use in the electrolytic removal of metals from titanium as the base metal.
Diese Aufgabe wird durch ein Entmetallisierungsbad zum elektrolytischen Abziehen von Cd, Cr, Cu, Cu-Legierungen, Ni, Pb, Pb/Sn, Sn und Zn von Titan als Grundmetall gelöst, das eine wäßrige Lösung einer oder mehrerer Alkylsulfonsäuren in einer Konzentration von 1 g/1 bis zur Löslichkeitsgrenze enthält.This object is achieved by a demetallization bath for the electrolytic removal of Cd, Cr, Cu, Cu alloys, Ni, Pb, Pb / Sn, Sn and Zn from titanium as the base metal, which contains an aqueous solution of one or more alkylsulfonic acids in a concentration of 1 g / 1 contains up to the solubility limit.
Alkylsulfonsäuren für den vorgenannten Zweck sind vorzugsweise solche mit 1 bis 4 C-Atomen. Gegebenenfalls können die Alkylgruppen hydroxysubstituiert sein. Beispiele für bevorzugte Alkylsulfonsäuren sind CH2(SO3H)2, CH3S0 3 H und HOCH2-CH 2 S0 3 H. Alkyl sulfonic acids for the aforementioned purpose are preferably those with 1 to 4 carbon atoms. The alkyl groups can optionally be hydroxy-substituted. Examples of preferred alkyl sulfonic acids are CH 2 (SO 3 H) 2 , CH 3 S 0 3 H and HOCH 2 -C H 2 S0 3 H.
Die erfindungsgemäßen Entmetallisierungsbäder können übliche Hilfsstoffe,wie Aktivatoren, welche die Auflösung der Metalle beschleunigen, toren, z.B. nicht-ionogene Tenside, die die kompakte Abscheidung der gelösten Metalle in der alkylsulfonsäurehaltigen Lösung auf der Kathode begünstigen, enthalten. Dadurch kann die Ansammlung von Metallpulvern in den Arbeitsbehältern vermieden werden.The demetallization baths according to the invention can contain customary auxiliaries, such as activators, which accelerate the dissolution of the metals, gates, such as non-ionic surfactants, which favor the compact deposition of the dissolved metals in the alkyl sulfonic acid-containing solution on the cathode. This prevents metal powders from accumulating in the work containers.
Beim erfindungsgemäßen Verfahren wird das Titan-Grundmetall mit den zu entfernenden Metallüberzügen als Anode geschaltet und die Elektrolyse wird bei einer Stromdichte von 0,1 bis 100 A/dm2, einer Spannung von 0,1 bis 25 V und bei einer Temperatur zwischen 15°C und dem Siedepunkt der Lösung durchgeführt wobei darauf zu achten ist, daß die Durchschlagsspannung für Titan unter den gegebenen Bedingungen nicht überschritten wird.In the method according to the invention, the titanium base metal with the metal coatings to be removed is switched as an anode and the electrolysis is carried out at a current density of 0.1 to 100 A / dm 2 , a voltage of 0.1 to 25 V and at a temperature between 15 ° C and the boiling point of the solution carried out taking care that the breakdown voltage for titanium is not exceeded under the given conditions.
Ein besonderer Vorteil des erfindungsgemäßen Entmetallisierungsbades und dessen Verwendung zum elektrolytischen Abziehen von Metallen von Titan als Grundmetall ist darin zu sehen, daß das Titan durch das Entmetallisierungsbad nicht angegriffen wird. Während beispielsweise Edelstahl, sofern er nicht hoch legiert ist, durch eine alkylsulfonsäurehaltige Lösung angegriffen wird, ist der Angriff auf das Titan unmeßbar klein und das Grundmetall kann praktisch ohne jede Schädigung von dem darauf abgeschiedenen Metall oder Metallen befreit werden. Ein weiterer Vorteil ist auch darin zu sehen, daß die anodisch in Lösung gegangenen abgelösten Metalle in einfacher Weise kathodisch abgeschieden werden können. Es ist deshalb nicht erforderlich, wie dies bei üblichen Stripperlösungen der Fall ist, nach Sättigung der Stripperlösung diese zu verwerfen.A particular advantage of the demetallization bath according to the invention and its use for the electrolytic removal of metals from titanium as the base metal can be seen in the fact that the titanium is not attacked by the demetallization bath. For example, while stainless steel, if it is not high alloyed, is attacked by a solution containing alkyl sulfonic acid, the attack on titanium is immeasurably small and the base metal can be freed from the metal or metals deposited thereon with practically no damage. Another advantage can also be seen in the fact that the detached metals that have gone anodically in solution are simple can be deposited cathodically. It is therefore not necessary, as is the case with conventional stripper solutions, to discard the stripper solution after saturation.
Auf ein Titanblech von 100 x 20 x 2 mm werden abwechselnd eine 20 /um dicke Glanzkupferschicht und darauf eine 10 /um dicke Blei-Zinn-Schicht abgeschieden und dies wird mehrfach wiederholt, bis eine etwa 1 mm starke Auflage auf dem Titanblech vorhanden ist.On a titanium sheet of 100 x 20 x 2 mm alternately a 20 / um thick shiny copper layer and then a 10 / um thick lead-tin layer are deposited and this is repeated several times until there is an approximately 1 mm thick layer on the titanium sheet.
Man stellt eine Lösung aus 250 g/1 Hydroxyäthansulfonsäure und 750 g/1 Wasser her. Das mit Kupfer und Bleizinn beschichtete Titanblech wird in diese Lösung eingetaucht und anodisch geschaltet. Bei einer anodischen Stromdichte von 20 A/dm2 und bei einer Temperatur von 20°C wird die Elektrolyse bis zur vollständigen Ablösung der Kupfer und Bleizinn-Überzüge durchgeführt. Hierzu benötigt man etwa 200 Minuten. Anschließend wird weitere 60 Minuten unter den gleichen Bedingungen elektrolysiert. Durch Auswiegen des Titanbleches vor der Beschichtung mit Kupfer und Bleizinn und nach dem anodischen Ablösen der Metalle und der zusätzlichen Elektrolysezeit von 60 Minuten stellt man fest, daß sich das Gewicht praktisch nicht verändert hat, und daß ein Abtrag von Titan nicht oder nur in unmeßbar geringem Maße erfolgte.A solution is prepared from 250 g / 1 hydroxyethanesulfonic acid and 750 g / 1 water. The titanium sheet coated with copper and tin is immersed in this solution and switched anodically. At an anodic current density of 20 A / dm 2 and at a temperature of 20 ° C, the electrolysis is carried out until the copper and lead-tin coatings are completely detached. This takes about 200 minutes. It is then electrolyzed for a further 60 minutes under the same conditions. By weighing the titanium sheet before coating with copper and lead tin and after the anodic detachment of the metals and the additional electrolysis time of 60 minutes, it is found that the weight has practically not changed, and that removal of titanium does not, or only to an immeasurably small extent Dimensions took place.
Die Legierung Bleizinn und die Metalle Kupfer, Zinn, Silber und Zink werden auf Titanblech abgeschieden. Anschließend wird in einem Elektrolyten, der 175 g/1 Methansulfonsäure enthält, bei 25 °C das Metall anodisch abgelöst und die Stromausbeute ermittelt.The lead tin alloy and the metals copper, tin, silver and zinc are deposited on titanium sheet. The metal is then anodically detached in an electrolyte containing 175 g / 1 methanesulfonic acid at 25 ° C. and the current yield is determined.
Folgende Werte wurden gefunden:
Die Legierung Bleizinn wird auf Titanblech abgeschieden. Anschließend löst man die Legierung von der Titanoberfläche in einem Elektrolyten ab, der 175 g/1 Methansulfonsäure und 40 g/1 Feinkornzusatz enthält. Durch Variation von Temperatur, Rührbewegung und kathodische Stromdichte wird ermittelt, ob sich Bleizinn kathodisch wieder kompakt abscheiden läßt. Bei mäßiger Rührung erhält man bei 60 °C und einer kathodischen Stromdichte von 10 A/dm2 kompakte, glatte und festhaftende Bleizinnüberzüge auf der Kathode. Bei Raumtemperatur sind bis zu einer kathodischen Stromdichte von 5 A/dm2 und sonst gleichen Bedingungen noch kompakte und festhaftende Überzüge zu erhalten.The lead tin alloy is deposited on titanium sheet. The alloy is then removed from the titanium surface in an electrolyte which contains 175 g / 1 methanesulfonic acid and 40 g / 1 fine-grain additive. By varying the temperature, stirring motion and cathodic current density, it is determined whether lead tin can be cathodically compact again. With moderate stirring, compact, smooth and firmly adhering lead tin coatings are obtained on the cathode at 60 ° C. and a cathodic current density of 10 A / dm 2 . At room temperature, compact and adherent coatings can be obtained up to a cathodic current density of 5 A / dm2 and otherwise the same conditions.
Glanznickel und Halbglanznickel wird auf Titanblech kathodisch abgeschieden. Anschließend werden diese Überzüge in einem Elektrolyten wieder anodisch aufgelöst. Der Elektrolyt enthält 100 g/1 Methansulfonsäure und verschiedene Konzentrationen an Halogeniden. Bei 20 A/dm2 (anodisch) und einer Temperatur von 25 bis 30 °C wird die anodische Stromausbeute ermittelt. Die Ergebnisse sind in der folgenden Tabelle enthalten.
Titan, anodisch geschaltet, wird unter diesen Bedingungen nicht angegriffen.Titanium, anodized, is not attacked under these conditions.
Claims (8)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AT83110698T ATE30344T1 (en) | 1983-10-26 | 1983-10-26 | DEMETALLIZING BATH AND PROCESS FOR ELECTROLYTIC DRAWING METALS FROM TITANIUM AS BASE METAL. |
| DE8383110698T DE3374140D1 (en) | 1983-10-26 | 1983-10-26 | Stripping bath and process for the electrolytical stripping of metals from titanium as a base metal |
| EP83110698A EP0139039B1 (en) | 1983-10-26 | 1983-10-26 | Stripping bath and process for the electrolytical stripping of metals from titanium as a base metal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP83110698A EP0139039B1 (en) | 1983-10-26 | 1983-10-26 | Stripping bath and process for the electrolytical stripping of metals from titanium as a base metal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0139039A1 true EP0139039A1 (en) | 1985-05-02 |
| EP0139039B1 EP0139039B1 (en) | 1987-10-21 |
Family
ID=8190779
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP83110698A Expired EP0139039B1 (en) | 1983-10-26 | 1983-10-26 | Stripping bath and process for the electrolytical stripping of metals from titanium as a base metal |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0139039B1 (en) |
| AT (1) | ATE30344T1 (en) |
| DE (1) | DE3374140D1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4678552A (en) * | 1986-04-22 | 1987-07-07 | Pennwalt Corporation | Selective electrolytic stripping of metal coatings from base metal substrates |
| EP1302569A2 (en) * | 2001-10-11 | 2003-04-16 | Shipley Co. L.L.C. | Stripping solution |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0077582A1 (en) * | 1981-10-14 | 1983-04-27 | ALFACHIMICI S.p.A. | Composition for stripping tin or tin-lead alloys from substrates by spraying, and process for using it |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| LU88603I2 (en) * | 1980-10-31 | 1995-07-10 | Warner Lambert Co | Trimetrexate glucuronate and its pharmaceutically acceptable derivatives (NEUTREXIN R) |
| DE3266452D1 (en) * | 1981-03-30 | 1985-10-31 | Pennwalt Corp | Process for the preparation of anhydrous alkane sulfonic acids |
-
1983
- 1983-10-26 EP EP83110698A patent/EP0139039B1/en not_active Expired
- 1983-10-26 AT AT83110698T patent/ATE30344T1/en not_active IP Right Cessation
- 1983-10-26 DE DE8383110698T patent/DE3374140D1/en not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0077582A1 (en) * | 1981-10-14 | 1983-04-27 | ALFACHIMICI S.p.A. | Composition for stripping tin or tin-lead alloys from substrates by spraying, and process for using it |
Non-Patent Citations (2)
| Title |
|---|
| CHEMICAL ABSTRACTS, Band 96, Nr. 14, April 1982, Seite 545, Nr. 112284j, Columbus, Ohio, USA; & JP - A - 81 152 999 (KINKI YAKUHIN KOGYO K.K.) 26.11.1981 * |
| METAL FINISHING GUIDEBOOK, 1983, Seiten 487,488; N. HALL et al.: "Stripping metallic coatings" * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4678552A (en) * | 1986-04-22 | 1987-07-07 | Pennwalt Corporation | Selective electrolytic stripping of metal coatings from base metal substrates |
| EP0242583A1 (en) * | 1986-04-22 | 1987-10-28 | Pennwalt Corporation | Selective electrolytic stripping of metal coatings from base metal substrates |
| AU592630B2 (en) * | 1986-04-22 | 1990-01-18 | Atochem North America, Inc. | Selective electrolytic stripping of metal coatings from base metal substrates |
| EP1302569A2 (en) * | 2001-10-11 | 2003-04-16 | Shipley Co. L.L.C. | Stripping solution |
| EP1302569A3 (en) * | 2001-10-11 | 2004-03-03 | Shipley Co. L.L.C. | Stripping solution |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0139039B1 (en) | 1987-10-21 |
| DE3374140D1 (en) | 1987-11-26 |
| ATE30344T1 (en) | 1987-11-15 |
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