EA201800434A1 - VACUUM INSTALLATION FOR APPLYING THIN-FILM COATINGS AND METHOD OF APPLYING OPTICAL COATINGS ON IT - Google Patents

VACUUM INSTALLATION FOR APPLYING THIN-FILM COATINGS AND METHOD OF APPLYING OPTICAL COATINGS ON IT

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Publication number
EA201800434A1
EA201800434A1 EA201800434A EA201800434A EA201800434A1 EA 201800434 A1 EA201800434 A1 EA 201800434A1 EA 201800434 A EA201800434 A EA 201800434A EA 201800434 A EA201800434 A EA 201800434A EA 201800434 A1 EA201800434 A1 EA 201800434A1
Authority
EA
Eurasian Patent Office
Prior art keywords
coatings
vacuum
applying
thin
process chamber
Prior art date
Application number
EA201800434A
Other languages
Russian (ru)
Other versions
EA035003B1 (en
Inventor
Владимир Яковлевич ШИРИПОВ
Евгений Александрович ХОХЛОВ
Александр Алексеевич Ясюнас
Константин Евгеньевич МЯСНИКОВ
Сергей Михайлович НАСТОЧКИН
Original Assignee
Общество С Ограниченной Ответственностью "Изовак Технологии"
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Общество С Ограниченной Ответственностью "Изовак Технологии" filed Critical Общество С Ограниченной Ответственностью "Изовак Технологии"
Publication of EA201800434A1 publication Critical patent/EA201800434A1/en
Publication of EA035003B1 publication Critical patent/EA035003B1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Группа изобретений относится к вакуумной технологической установке и способу нанесения на ней тонкопленочных покрытий с заданными оптическими характеристиками. Указанная вакуумная установка включает шлюзовую камеру, закрепленную на транспортной системе и выполненную с возможностью перемещения с вертикально расположенным подложкодержателем барабанного типа внутри или без него и стыковки с технологической камерой через горизонтальный высоковакуумный затвор, расположенный под технологической камерой. Нанесение тонкопленочных оптических покрытий проводится в рабочих зонах технологической камеры методом химического осаждения в плазме высокой плотности, при этом для нанесения покрытий используют систему генерации плазмы, в которой источники индукционного разряда расположены вдоль вертикальной оси, а разделение рабочего пространства на рабочие зоны выполнено посредством высоковакуумных средств откачки и защитных экранов. Обеспечивается возможность компактного размещения оборудования и осуществления высокопроизводительного и экономичного способа нанесения тонкопленочных оптических покрытий с высокими потребительскими свойствами на гибкие и твердые подложки различных типоразмеров.The group of inventions relates to a vacuum processing unit and a method for applying thin-film coatings on it with specified optical characteristics. The specified vacuum unit includes a lock chamber mounted on the transport system and configured to move with a vertically located substrate holder of the drum type, with or without a dock and dock with the process chamber through a horizontal high vacuum shutter located under the process chamber. The application of thin-film optical coatings is carried out in the working areas of the process chamber by chemical deposition in a high-density plasma, while using a plasma generation system in which the sources of inductive discharge are located along the vertical axis, and the working space is divided into working areas by means of high-vacuum pumping facilities and protective screens. The possibility of compact placement of equipment and implementation of a high-performance and cost-effective method of applying thin-film optical coatings with high consumer properties on flexible and solid substrates of various sizes.

EA201800434A 2016-03-16 2016-03-16 Vacuum assembly for applying thin-film coatings and method for applying optical coatings to same EA035003B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/BY2016/000002 WO2017156614A1 (en) 2016-03-16 2016-03-16 Vacuum assembly for applying thin-film coatings and method for applying optical coatings to same

Publications (2)

Publication Number Publication Date
EA201800434A1 true EA201800434A1 (en) 2019-01-31
EA035003B1 EA035003B1 (en) 2020-04-16

Family

ID=59850779

Family Applications (1)

Application Number Title Priority Date Filing Date
EA201800434A EA035003B1 (en) 2016-03-16 2016-03-16 Vacuum assembly for applying thin-film coatings and method for applying optical coatings to same

Country Status (4)

Country Link
KR (1) KR20180124015A (en)
CN (1) CN109642320B (en)
EA (1) EA035003B1 (en)
WO (1) WO2017156614A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU192228U1 (en) * 2018-08-29 2019-09-09 Общество С Ограниченной Ответственностью "Изовак Технологии" VACUUM INSTALLATION FOR APPLICATION OF THIN FILM COATINGS ON THE SUBSTRATE
US20220033958A1 (en) * 2020-07-31 2022-02-03 Applied Materials, Inc. Evaporation source, vapor deposition apparatus, and method for coating a substrate in a vacuum chamber

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU901356A1 (en) * 1980-01-25 1982-01-30 Предприятие П/Я А-3531 Vacuum unit
US6174377B1 (en) * 1997-03-03 2001-01-16 Genus, Inc. Processing chamber for atomic layer deposition processes
TW200532043A (en) * 2004-02-10 2005-10-01 Ulvac Inc Thin film forming apparatus
WO2008106812A1 (en) * 2007-03-02 2008-09-12 Oerlikon Trading Ag, Trübbach Vacuum coating apparatus
CN103002649B (en) * 2011-09-13 2016-09-14 中微半导体设备(上海)有限公司 The plasma processing apparatus of a kind of inductive coupling and processing method for substrate thereof
RU2507308C1 (en) * 2012-07-19 2014-02-20 Айрат Хамитович Хисамов Application method of thin-film coatings, and process line for its implementation

Also Published As

Publication number Publication date
WO2017156614A1 (en) 2017-09-21
CN109642320B (en) 2021-04-06
CN109642320A (en) 2019-04-16
KR20180124015A (en) 2018-11-20
EA035003B1 (en) 2020-04-16

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Designated state(s): AM AZ BY KZ KG TJ TM RU