EA201490183A1 - Закаливаемые и незакаливаемые прозрачные нанокомпозитные слои - Google Patents

Закаливаемые и незакаливаемые прозрачные нанокомпозитные слои

Info

Publication number
EA201490183A1
EA201490183A1 EA201490183A EA201490183A EA201490183A1 EA 201490183 A1 EA201490183 A1 EA 201490183A1 EA 201490183 A EA201490183 A EA 201490183A EA 201490183 A EA201490183 A EA 201490183A EA 201490183 A1 EA201490183 A1 EA 201490183A1
Authority
EA
Eurasian Patent Office
Prior art keywords
oxides
uncleared
heated
nitrides
nanocomposite layers
Prior art date
Application number
EA201490183A
Other languages
English (en)
Inventor
Барт Балле
Гетан Ди Стефано
Original Assignee
Агк Гласс Юроп
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Агк Гласс Юроп filed Critical Агк Гласс Юроп
Publication of EA201490183A1 publication Critical patent/EA201490183A1/ru

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering
    • C23C14/0057Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C03C17/366Low-emissivity or solar control coatings
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/40Coatings comprising at least one inhomogeneous layer
    • C03C2217/43Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/45Inorganic continuous phases
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/40Coatings comprising at least one inhomogeneous layer
    • C03C2217/43Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475Inorganic materials
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/154Deposition methods from the vapour phase by sputtering
    • C03C2218/156Deposition methods from the vapour phase by sputtering by magnetron sputtering

Abstract

Изобретение относится к прозрачной подложке, несущей слой прозрачного диэлектрического нанокомпозита, содержащего матрицу SiNO, причем у находится в интервале от 0 до 4/3, z находится в интервале от 0 до 2 и у и z не равны 0 одновременно, причем указанная матрица включает наночастицы, выбираемые из группы, состоящей из нитридов алюминия, нитридов циркония, нитридов титана, оксидов алюминия, оксидов циркония, оксидов цинка, оксидов титана, оксидов олова, оксидов тантала и их смесей.
EA201490183A 2011-06-30 2012-06-28 Закаливаемые и незакаливаемые прозрачные нанокомпозитные слои EA201490183A1 (ru)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP11172135 2011-06-30
PCT/EP2012/062606 WO2013001023A1 (en) 2011-06-30 2012-06-28 Temperable and non-temperable transparent nanocomposite layers

Publications (1)

Publication Number Publication Date
EA201490183A1 true EA201490183A1 (ru) 2014-06-30

Family

ID=44971137

Family Applications (1)

Application Number Title Priority Date Filing Date
EA201490183A EA201490183A1 (ru) 2011-06-30 2012-06-28 Закаливаемые и незакаливаемые прозрачные нанокомпозитные слои

Country Status (7)

Country Link
US (1) US20140090974A1 (ru)
EP (1) EP2726427A1 (ru)
JP (1) JP6045043B2 (ru)
CN (1) CN103619771A (ru)
BR (1) BR112013033726A2 (ru)
EA (1) EA201490183A1 (ru)
WO (1) WO2013001023A1 (ru)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9366784B2 (en) 2013-05-07 2016-06-14 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US9359261B2 (en) 2013-05-07 2016-06-07 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US9703011B2 (en) 2013-05-07 2017-07-11 Corning Incorporated Scratch-resistant articles with a gradient layer
US9684097B2 (en) 2013-05-07 2017-06-20 Corning Incorporated Scratch-resistant articles with retained optical properties
US9110230B2 (en) 2013-05-07 2015-08-18 Corning Incorporated Scratch-resistant articles with retained optical properties
DE102014104799B4 (de) * 2014-04-03 2021-03-18 Schott Ag Substrat mit einer Beschichtung zur Erhöhung der Kratzfestigkeit, Verfahren zu dessen Herstellung und dessen Verwendung
US11267973B2 (en) 2014-05-12 2022-03-08 Corning Incorporated Durable anti-reflective articles
US9335444B2 (en) 2014-05-12 2016-05-10 Corning Incorporated Durable and scratch-resistant anti-reflective articles
US9790593B2 (en) 2014-08-01 2017-10-17 Corning Incorporated Scratch-resistant materials and articles including the same
KR102591067B1 (ko) 2015-09-14 2023-10-18 코닝 인코포레이티드 높은 광 투과율 및 내-스크래치성 반사-방지 제품
US20210087404A1 (en) * 2017-12-19 2021-03-25 Nisshin Engineering Inc. Composite particles and method for producing composite particles
CN111699430B (zh) * 2018-01-29 2022-07-22 应用材料公司 用于光学器件增强的润湿层
KR102591065B1 (ko) 2018-08-17 2023-10-19 코닝 인코포레이티드 얇고, 내구성 있는 반사-방지 구조를 갖는 무기산화물 물품
CN110129745A (zh) * 2019-05-20 2019-08-16 信利光电股份有限公司 折射率可变的介质膜的镀膜方法及含有该介质膜的颜色膜
WO2022154026A1 (ja) * 2021-01-13 2022-07-21 公益財団法人電磁材料研究所 磁気光学材料およびその製造方法

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3139031B2 (ja) * 1991-02-21 2001-02-26 日本板硝子株式会社 熱線遮蔽ガラス
GB9417112D0 (en) 1994-08-24 1994-10-12 Glaverbel Coated substrate and process for its formation
FR2759362B1 (fr) * 1997-02-10 1999-03-12 Saint Gobain Vitrage Substrat transparent muni d'au moins une couche mince a base de nitrure ou d'oxynitrure de silicium et son procede d'obtention
DE19756588A1 (de) * 1997-12-18 1999-07-01 Hartec Ges Fuer Hartstoffe Und Schichtsystem, Verfahren zu seiner Herstellung sowie seine Verwendung
JP2001019494A (ja) * 1999-07-02 2001-01-23 Nippon Sheet Glass Co Ltd 防曇ガラス物品
US6896968B2 (en) * 2001-04-06 2005-05-24 Honeywell International Inc. Coatings and method for protecting carbon-containing components from oxidation
DE10141696A1 (de) * 2001-08-25 2003-03-13 Bosch Gmbh Robert Verfahren zur Erzeugung einer nanostruktuierten Funktionsbeschichtung und damit herstellbare Beschichtung
AU2002350883A1 (en) 2002-11-07 2004-06-03 Saint-Gobain Glass France System of layers for transparent substrates and coated substrate
US7001669B2 (en) * 2002-12-23 2006-02-21 The Administration Of The Tulane Educational Fund Process for the preparation of metal-containing nanostructured films
JP2004217973A (ja) * 2003-01-14 2004-08-05 Gunze Ltd 薄膜および薄膜製造方法
EP1594812B1 (en) 2003-02-14 2008-04-09 AGC Flat Glass Europe SA Glazing panel carrying a coating stack
EP1867614B1 (en) 2003-09-02 2010-03-17 Guardian Industries Corp. Method of making a coated article coated with a hard protective highly transparent layer
US7537801B2 (en) 2003-11-04 2009-05-26 Guardian Industries Corp. Heat treatable coated article with diamond-like carbon (DLC) and/or zirconium in coating
WO2006009881A2 (en) * 2004-06-18 2006-01-26 Innovalight, Inc. Process and apparatus for forming nanoparticles using radiofrequency plasmas
US20090258222A1 (en) 2004-11-08 2009-10-15 Agc Flat Glass Europe S.A. Glazing panel
US7153578B2 (en) * 2004-12-06 2006-12-26 Guardian Industries Corp Coated article with low-E coating including zirconium silicon oxynitride and methods of making same
UA96581C2 (ru) * 2005-10-21 2011-11-25 Сен-Гобен Гласс Франс Незагрязняемый материал (варианты), его применение, способ его получения и стекло, содержащее такой материал
CN1804113A (zh) * 2006-01-19 2006-07-19 上海交通大学 调节磁控溅射反应气体分压制备Ti-Si-N膜的方法
US8273407B2 (en) * 2006-01-30 2012-09-25 Bergendahl Albert S Systems and methods for forming magnetic nanocomposite materials
CN101234854A (zh) * 2006-02-01 2008-08-06 旭硝子株式会社 附有红外线阻挡层的玻璃板及其制造方法
US20070178317A1 (en) * 2006-02-01 2007-08-02 Asahi Glass Company, Limited Infrared shielding film-coated glass plate and process for its production
AU2007360138B2 (en) * 2007-10-18 2013-09-19 Midwest Research Institue High temperature solar selective coatings
WO2009115599A1 (fr) 2008-03-20 2009-09-24 Agc Flat Glass Europe Sa Vitrage revetu de couches minces
EA020277B1 (ru) * 2008-03-20 2014-10-30 Агк Гласс Юроп Остекление с защитными слоями
US8470459B2 (en) * 2008-03-25 2013-06-25 The Curators Of The University Of Missouri Nanocomposite dielectric coatings
JP2010030792A (ja) * 2008-07-25 2010-02-12 Asahi Glass Co Ltd 紫外線遮蔽膜付きガラス板およびその製造方法
US8524337B2 (en) * 2010-02-26 2013-09-03 Guardian Industries Corp. Heat treated coated article having glass substrate(s) and indium-tin-oxide (ITO) inclusive coating
WO2012125324A1 (en) * 2011-03-14 2012-09-20 3M Innovative Properties Company Nanostructured articles

Also Published As

Publication number Publication date
JP2014523390A (ja) 2014-09-11
BR112013033726A2 (pt) 2017-01-31
US20140090974A1 (en) 2014-04-03
WO2013001023A1 (en) 2013-01-03
JP6045043B2 (ja) 2016-12-14
CN103619771A (zh) 2014-03-05
EP2726427A1 (en) 2014-05-07

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