DK644074A - - Google Patents

Info

Publication number
DK644074A
DK644074A DK644074A DK644074A DK644074A DK 644074 A DK644074 A DK 644074A DK 644074 A DK644074 A DK 644074A DK 644074 A DK644074 A DK 644074A DK 644074 A DK644074 A DK 644074A
Authority
DK
Denmark
Application number
DK644074A
Inventor
J F Jordan
C M Lampkin
Original Assignee
Baldwin Co D H
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Baldwin Co D H filed Critical Baldwin Co D H
Publication of DK644074A publication Critical patent/DK644074A/da

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876—Particular processes or apparatus for batch treatment of the devices
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3464—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a chalcogenide
    • C03C17/347—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a chalcogenide comprising a sulfide or oxysulfide
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02422—Non-crystalline insulating materials, e.g. glass, polymers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02436—Intermediate layers between substrates and deposited layers
    • H01L21/02439—Materials
    • H01L21/02469—Group 12/16 materials
    • H01L21/02474—Sulfides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02436—Intermediate layers between substrates and deposited layers
    • H01L21/02439—Materials
    • H01L21/02491—Conductive materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02623—Liquid deposition
    • H01L21/02628—Liquid deposition using solutions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264—Inorganic materials
    • H01L31/0328—Inorganic materials including, apart from doping materials or other impurities, semiconductor materials provided for in two or more of groups H01L31/0272 - H01L31/032
    • H01L31/0336—Inorganic materials including, apart from doping materials or other impurities, semiconductor materials provided for in two or more of groups H01L31/0272 - H01L31/032 in different semiconductor regions, e.g. Cu2X/CdX hetero- junctions, X being an element of Group VI of the Periodic Table
    • H01L31/03365—Inorganic materials including, apart from doping materials or other impurities, semiconductor materials provided for in two or more of groups H01L31/0272 - H01L31/032 in different semiconductor regions, e.g. Cu2X/CdX hetero- junctions, X being an element of Group VI of the Periodic Table comprising only Cu2X / CdX heterojunctions, X being an element of Group VI of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/211—SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/228—Other specific oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/112—Deposition methods from solutions or suspensions by spraying
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Electromagnetism (AREA)
  • Inorganic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Surface Treatment Of Glass (AREA)
DK644074A 1974-01-08 1974-12-11 DK644074A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US431705A US3880633A (en) 1974-01-08 1974-01-08 Method of coating a glass ribbon on a liquid float bath

Publications (1)

Publication Number Publication Date
DK644074A true DK644074A (da) 1975-09-08

Family

ID=23713084

Family Applications (1)

Application Number Title Priority Date Filing Date
DK644074A DK644074A (da) 1974-01-08 1974-12-11

Country Status (14)

Country Link
US (1) US3880633A (da)
JP (1) JPS5144394B2 (da)
BE (1) BE824199A (da)
BR (1) BR7500052A (da)
CA (1) CA1039394A (da)
DE (1) DE2500398A1 (da)
DK (1) DK644074A (da)
FR (1) FR2257151B1 (da)
GB (2) GB1506159A (da)
IN (1) IN144895B (da)
IT (1) IT1029371B (da)
NL (1) NL7500237A (da)
SE (2) SE411039B (da)
ZA (1) ZA747963B (da)

Families Citing this family (61)

* Cited by examiner, † Cited by third party
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US4047917A (en) * 1975-01-15 1977-09-13 Saint-Gobain Industries Apparatus for the manufacture of plastics film by casting on a floating glass ribbon
US3971672A (en) * 1975-02-03 1976-07-27 D. H. Baldwin Company Light diffuser for photovoltaic cell
US4104420A (en) * 1975-08-25 1978-08-01 Photon Power, Inc. Photovoltaic cell
DK126876A (da) * 1975-11-14 1977-05-15 Photon Power Inc Fremgangsmade ved fremstilling af et fotoelement
US4095006A (en) * 1976-03-26 1978-06-13 Photon Power, Inc. Cadmium sulfide film
US4042418A (en) * 1976-08-02 1977-08-16 Westinghouse Electric Corporation Photovoltaic device and method of making same
US4082569A (en) * 1977-02-22 1978-04-04 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Solar cell collector
GB1575888A (en) * 1977-09-08 1980-10-01 Photon Power Inc Solar cell array
US4262411A (en) * 1977-09-08 1981-04-21 Photon Power, Inc. Method of making a solar cell array
US4143235A (en) * 1977-12-30 1979-03-06 Chevron Research Company Cadmium sulfide photovoltaic cell and method of fabrication
US4224355A (en) * 1978-03-15 1980-09-23 Photon Power, Inc. Method for quality film formation
US4239809A (en) * 1978-03-15 1980-12-16 Photon Power, Inc. Method for quality film formation
US4307681A (en) * 1978-03-15 1981-12-29 Photon Power, Inc. Apparatus for quality film formation
GB2016802B (en) * 1978-03-16 1982-09-08 Chevron Res Thin film photovoltaic cells
US4304607A (en) * 1978-03-31 1981-12-08 Photon Power, Inc. Photovoltaic cell
US4313022A (en) * 1978-09-25 1982-01-26 Photon Power, Inc. Solar cell array
DE2901954C2 (de) * 1979-01-19 1986-05-15 Chevron Research Co., San Francisco, Calif. Verfahren zur Herstellung einer photovoltaischen Zelle
US4240816A (en) * 1979-02-09 1980-12-23 Mcmaster Harold Method and apparatus for forming tempered sheet glass with a pyrolytic film in a continuous process
US4233085A (en) * 1979-03-21 1980-11-11 Photon Power, Inc. Solar panel module
US4371740A (en) * 1980-07-23 1983-02-01 Eastman Kodak Company Conductive elements for photovoltaic cells
CA1171505A (en) * 1980-07-23 1984-07-24 Katherine V. Clem Conductive elements for photovoltaic cells
US4502917A (en) * 1980-09-15 1985-03-05 Cherry Electrical Products Corporation Process for forming patterned films
US4344817A (en) * 1980-09-15 1982-08-17 Photon Power, Inc. Process for forming tin oxide conductive pattern
US4362896A (en) * 1980-10-28 1982-12-07 Photon Power, Inc. Polycrystalline photovoltaic cell
US4404734A (en) * 1980-10-28 1983-09-20 Photon Power, Inc. Method of making a CdS/Cux S photovoltaic cell
US4414252A (en) * 1980-11-24 1983-11-08 Photon Power, Inc. Spray forming thin films
DE3172382D1 (en) * 1980-12-12 1985-10-24 Prutec Ltd Method of manufacturing photo-voltaic devices
US4547259A (en) * 1981-03-10 1985-10-15 Silicon Electro-Physics, Inc. Manufacture of sheets of controlled thickness from meltable material
US4419530A (en) * 1982-02-11 1983-12-06 Energy Conversion Devices, Inc. Solar cell and method for producing same
FR2536686A1 (fr) * 1982-11-26 1984-06-01 Renault Procede de soudure et d'etancheite pour la realisation de capteurs
DE3312052C2 (de) * 1983-04-02 1986-03-13 Nukem Gmbh, 6450 Hanau Verfahren zum Herstellen von großflächigen Dünnschicht-Solarzellen
DE3312053C2 (de) * 1983-04-02 1985-03-28 Nukem Gmbh, 6450 Hanau Verfahren zum Verhindern von Kurz- oder Nebenschlüssen in einer großflächigen Dünnschicht-Solarzelle
FR2548443B2 (fr) * 1983-06-30 1987-05-07 Telemecanique Electrique Perfectionnement aux interrupteurs electriques utilisant un ecran isolant qui cisaille l'arc apparaissant entre les contacts
US4510344A (en) * 1983-12-19 1985-04-09 Atlantic Richfield Company Thin film solar cell substrate
US4542255A (en) * 1984-01-03 1985-09-17 Atlantic Richfield Company Gridded thin film solar cell
US4595790A (en) * 1984-12-28 1986-06-17 Sohio Commercial Development Co. Method of making current collector grid and materials therefor
US4686761A (en) * 1985-03-21 1987-08-18 The United States Of America As Represented By The Secretary Of The Army Method of fabrication of low crosstalk photodiode array
US4795500A (en) * 1985-07-02 1989-01-03 Sanyo Electric Co., Ltd. Photovoltaic device
JPS6292485A (ja) * 1985-10-18 1987-04-27 Sanyo Electric Co Ltd 太陽電池の製造方法
US4675468A (en) * 1985-12-20 1987-06-23 The Standard Oil Company Stable contact between current collector grid and transparent conductive layer
US4689247A (en) * 1986-05-15 1987-08-25 Ametek, Inc. Process and apparatus for forming thin films
US4865999A (en) * 1987-07-08 1989-09-12 Glasstech Solar, Inc. Solar cell fabrication method
JPS6424466U (da) * 1987-07-31 1989-02-09
US5278442A (en) * 1991-07-15 1994-01-11 Prinz Fritz B Electronic packages and smart structures formed by thermal spray deposition
US5762674A (en) * 1995-09-27 1998-06-09 Glasstech, Inc. Apparatus for coating glass sheet ribbon
US6413579B1 (en) 2000-01-27 2002-07-02 Libbey-Owens-Ford Co. Temperature control of CVD method for reduced haze
US6537845B1 (en) * 2001-08-30 2003-03-25 Mccandless Brian E. Chemical surface deposition of ultra-thin semiconductors
EP1684362A3 (en) * 2004-12-02 2006-08-02 Technische Universiteit Delft Process for the production of thin layers, preferably for a photovoltaic cell
EP1675186B1 (en) 2004-12-22 2012-08-22 Thin Film Factory B.V. Production process for a photovoltaic device
US8677782B2 (en) * 2006-07-25 2014-03-25 Guardian Industries Corp. Method of making glass including surface treatment with aluminum chloride at or just prior to annealing LEHR
US20080022721A1 (en) * 2006-07-25 2008-01-31 Bernd Disteldorf Method of making glass including surface treatment with aluminum chloride at or just prior to annealing lehr
US20090214770A1 (en) * 2008-02-21 2009-08-27 Dilip Kumar Chatterjee Conductive film formation during glass draw
US8334455B2 (en) * 2008-07-24 2012-12-18 First Solar, Inc. Photovoltaic devices including Mg-doped semiconductor films
US20100126227A1 (en) * 2008-11-24 2010-05-27 Curtis Robert Fekety Electrostatically depositing conductive films during glass draw
KR101353525B1 (ko) * 2010-02-09 2014-01-21 주식회사 엘지화학 유리판 제조 시스템용 레이-아웃 및 유리판 처리 방법 및 그에 따른 유리판
US8252619B2 (en) * 2010-04-23 2012-08-28 Primestar Solar, Inc. Treatment of thin film layers photovoltaic module manufacture
DE102010028277B4 (de) * 2010-04-27 2013-04-18 Calyxo Gmbh Verfahren und Vorrichtung zur Herstellung einer mit einem Halbleitermaterial beschichteten Glasscheibe und nach dem Verfahren erhältliche Solarzelle oder Solarmodul
JP5664119B2 (ja) * 2010-10-25 2015-02-04 ソニー株式会社 透明導電膜、透明導電膜の製造方法、光電変換装置および電子機器
CN103228584B (zh) * 2010-11-29 2015-04-22 旭硝子株式会社 浮法平板玻璃的制造装置及浮法平板玻璃的制造方法
US9093599B2 (en) 2013-07-26 2015-07-28 First Solar, Inc. Vapor deposition apparatus for continuous deposition of multiple thin film layers on a substrate
CN110683604B (zh) * 2019-10-30 2022-05-13 徐州工程学院 一种基于太阳能的废水利用和烟气的减排系统

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* Cited by examiner, † Cited by third party
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BE637954A (da) * 1962-09-28 1900-01-01
GB1151853A (en) * 1965-07-09 1969-05-14 Pilkington Brothers Ltd Improvements in or relating to the Manufacture of Flat Glass.
FR1596613A (da) * 1967-11-20 1970-06-22
GB1265796A (da) * 1968-06-24 1972-03-08

Also Published As

Publication number Publication date
FR2257151A1 (da) 1975-08-01
DE2500398A1 (de) 1975-12-04
SE7710119L (sv) 1977-09-09
IN144895B (da) 1978-07-22
CA1039394A (en) 1978-09-26
BR7500052A (pt) 1975-11-04
IT1029371B (it) 1979-03-10
AU7698674A (en) 1976-07-01
SE411039B (sv) 1979-11-26
JPS5144394B2 (da) 1976-11-27
FR2257151B1 (da) 1980-08-29
ZA747963B (en) 1975-12-31
GB1506158A (en) 1978-04-05
NL7500237A (nl) 1975-07-10
GB1506159A (en) 1978-04-05
SE7500112L (da) 1975-07-09
JPS50119585A (da) 1975-09-19
BE824199A (fr) 1975-05-02
US3880633A (en) 1975-04-29

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