DK1723402T3 - Prövning af tætheden af pladevedhæftningsforbindelser og teststruktur til gennemförelse af fremgangsmåden - Google Patents

Prövning af tætheden af pladevedhæftningsforbindelser og teststruktur til gennemförelse af fremgangsmåden

Info

Publication number
DK1723402T3
DK1723402T3 DK05729617T DK05729617T DK1723402T3 DK 1723402 T3 DK1723402 T3 DK 1723402T3 DK 05729617 T DK05729617 T DK 05729617T DK 05729617 T DK05729617 T DK 05729617T DK 1723402 T3 DK1723402 T3 DK 1723402T3
Authority
DK
Denmark
Prior art keywords
testing
test structure
density
carrying
cavity
Prior art date
Application number
DK05729617T
Other languages
English (en)
Inventor
Ronald Kumst
Original Assignee
X Fab Semiconductor Foundries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by X Fab Semiconductor Foundries filed Critical X Fab Semiconductor Foundries
Application granted granted Critical
Publication of DK1723402T3 publication Critical patent/DK1723402T3/da

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/26—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors
    • G01M3/28—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for pipes, cables or tubes; for pipe joints or seals; for valves ; for welds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0035—Testing
    • B81C99/004—Testing during manufacturing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/26—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors
    • G01M3/28—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for pipes, cables or tubes; for pipe joints or seals; for valves ; for welds
    • G01M3/2853—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for pipes, cables or tubes; for pipe joints or seals; for valves ; for welds for pipe joints or seals
    • G01M3/2869—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for pipes, cables or tubes; for pipe joints or seals; for valves ; for welds for pipe joints or seals for seals not incorporated in a pipe joint

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Micromachines (AREA)
  • Pressure Sensors (AREA)
  • Measuring Fluid Pressure (AREA)
  • Investigating Or Analysing Biological Materials (AREA)
  • Sealing Material Composition (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Adhesives Or Adhesive Processes (AREA)
DK05729617T 2004-03-06 2005-03-05 Prövning af tætheden af pladevedhæftningsforbindelser og teststruktur til gennemförelse af fremgangsmåden DK1723402T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004011035A DE102004011035B4 (de) 2004-03-06 2004-03-06 Verfahren zur Prüfung der Dichtigkeit von Scheibenbondverbindungen und Anordnung zur Durchführung des Verfahrens
PCT/EP2005/050993 WO2005085791A1 (de) 2004-03-06 2005-03-05 Pruefung der dichtigkeit von scheibenbondverbindungen und teststruktur zur durchführung des verfahrens

Publications (1)

Publication Number Publication Date
DK1723402T3 true DK1723402T3 (da) 2007-10-15

Family

ID=34877487

Family Applications (1)

Application Number Title Priority Date Filing Date
DK05729617T DK1723402T3 (da) 2004-03-06 2005-03-05 Prövning af tætheden af pladevedhæftningsforbindelser og teststruktur til gennemförelse af fremgangsmåden

Country Status (6)

Country Link
US (1) US7520161B2 (da)
EP (1) EP1723402B1 (da)
AT (1) ATE367574T1 (da)
DE (2) DE102004011035B4 (da)
DK (1) DK1723402T3 (da)
WO (1) WO2005085791A1 (da)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011218462A (ja) * 2010-04-06 2011-11-04 Seiko Epson Corp Ｍｅｍｓ装置
US8921128B2 (en) * 2013-05-29 2014-12-30 Analog Devices, Inc. Method of manufacturing MEMS devices with reliable hermetic seal
US9054223B2 (en) * 2013-06-17 2015-06-09 Knowles Electronics, Llc Varistor in base for MEMS microphones
CN106449269B (zh) * 2016-10-12 2018-09-14 厦门大学 一种压力敏感结构以及制备该压力敏感结构的方法
CN111762754B (zh) * 2020-06-30 2024-06-18 上海华虹宏力半导体制造有限公司 测量共晶键合对准偏差的测试结构
CN112504546B (zh) * 2020-11-11 2022-09-06 中国电子产品可靠性与环境试验研究所（（工业和信息化部电子第五研究所）（中国赛宝实验室）） 晶圆级气密封装的微小腔体内部气压测试方法和系统
CN116072563A (zh) * 2021-10-29 2023-05-05 长鑫存储技术有限公司 半导体结构及其制备方法、测试系统
CN116852399B (zh) * 2023-09-05 2023-11-17 陕西能控安远智能技术有限公司 一种多用途防爆机器人

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19638666C1 (de) * 1996-01-08 1997-11-20 Siemens Ag Schmelzsicherung mit einer Schutzschicht in einer integrierten Halbleiterschaltung sowie zugehöriges Herstellungsverfahren
US5837935A (en) * 1996-02-26 1998-11-17 Ford Motor Company Hermetic seal for an electronic component having a secondary chamber
DE19700734B4 (de) * 1997-01-11 2006-06-01 Robert Bosch Gmbh Verfahren zur Herstellung von Sensoren sowie nicht-vereinzelter Waferstapel
DE19739961C1 (de) * 1997-09-11 1999-04-15 Siemens Ag Verfahren zur Bestimmung des Gasdruckes in einem Hohlraum mit verformbarer Wandung eines Halbleiterbauelementes
EP0951068A1 (en) * 1998-04-17 1999-10-20 Interuniversitair Micro-Elektronica Centrum Vzw Method of fabrication of a microstructure having an inside cavity
US6232150B1 (en) * 1998-12-03 2001-05-15 The Regents Of The University Of Michigan Process for making microstructures and microstructures made thereby
US6638784B2 (en) * 1999-06-24 2003-10-28 Rockwell Collins, Inc. Hermetic chip scale packaging means and method including self test
DE10136219A1 (de) * 2001-07-25 2003-02-06 Conti Temic Microelectronic Verfahren zur Dichtigkeitsprüfung von kapazitiven Sensoren

Also Published As

Publication number Publication date
WO2005085791A1 (de) 2005-09-15
ATE367574T1 (de) 2007-08-15
DE502005001067D1 (de) 2007-08-30
US20070196943A1 (en) 2007-08-23
DE102004011035A1 (de) 2005-09-22
EP1723402A1 (de) 2006-11-22
EP1723402B1 (de) 2007-07-18
US7520161B2 (en) 2009-04-21
DE102004011035B4 (de) 2006-05-04

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