DE9321091U1 - Zentrifugale Reinigungsvorrichtung für Halbleiterscheibenträger - Google Patents

Zentrifugale Reinigungsvorrichtung für Halbleiterscheibenträger

Info

Publication number
DE9321091U1
DE9321091U1 DE9321091U DE9321091U DE9321091U1 DE 9321091 U1 DE9321091 U1 DE 9321091U1 DE 9321091 U DE9321091 U DE 9321091U DE 9321091 U DE9321091 U DE 9321091U DE 9321091 U1 DE9321091 U1 DE 9321091U1
Authority
DE
Germany
Prior art keywords
cleaning device
semiconductor wafer
wafer carriers
centrifugal cleaning
centrifugal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE9321091U
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semitool Inc
Original Assignee
Semitool Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US07/901,614 external-priority patent/US5224503A/en
Application filed by Semitool Inc filed Critical Semitool Inc
Publication of DE9321091U1 publication Critical patent/DE9321091U1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
DE9321091U 1992-06-15 1993-06-03 Zentrifugale Reinigungsvorrichtung für Halbleiterscheibenträger Expired - Lifetime DE9321091U1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/901,614 US5224503A (en) 1992-06-15 1992-06-15 Centrifugal wafer carrier cleaning apparatus
EP93915207A EP0641483B1 (de) 1992-06-15 1993-06-03 Zentrifugal-reinigungsvorrichtung für waferbehälter

Publications (1)

Publication Number Publication Date
DE9321091U1 true DE9321091U1 (de) 1996-01-04

Family

ID=26135228

Family Applications (1)

Application Number Title Priority Date Filing Date
DE9321091U Expired - Lifetime DE9321091U1 (de) 1992-06-15 1993-06-03 Zentrifugale Reinigungsvorrichtung für Halbleiterscheibenträger

Country Status (1)

Country Link
DE (1) DE9321091U1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115254841A (zh) * 2022-08-24 2022-11-01 四川普锐特药业有限公司 一种容器用洗吹装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115254841A (zh) * 2022-08-24 2022-11-01 四川普锐特药业有限公司 一种容器用洗吹装置

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