DE9300956U1 - Anordnung zum Bestimmen chrakteristischer Größen transparenter Schichten mit Hilfe der Ellipsometrie - Google Patents
Anordnung zum Bestimmen chrakteristischer Größen transparenter Schichten mit Hilfe der EllipsometrieInfo
- Publication number
- DE9300956U1 DE9300956U1 DE9300956U DE9300956U DE9300956U1 DE 9300956 U1 DE9300956 U1 DE 9300956U1 DE 9300956 U DE9300956 U DE 9300956U DE 9300956 U DE9300956 U DE 9300956U DE 9300956 U1 DE9300956 U1 DE 9300956U1
- Authority
- DE
- Germany
- Prior art keywords
- sample
- arrangement
- ellipsometry
- sen103
- optical component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000572 ellipsometry Methods 0.000 title claims description 5
- 230000003287 optical effect Effects 0.000 claims description 11
- 230000005855 radiation Effects 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000012545 processing Methods 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 claims 1
- 238000005259 measurement Methods 0.000 description 11
- 230000003595 spectral effect Effects 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000005375 photometry Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE9300956U DE9300956U1 (de) | 1993-01-14 | 1993-01-14 | Anordnung zum Bestimmen chrakteristischer Größen transparenter Schichten mit Hilfe der Ellipsometrie |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE9300956U DE9300956U1 (de) | 1993-01-14 | 1993-01-14 | Anordnung zum Bestimmen chrakteristischer Größen transparenter Schichten mit Hilfe der Ellipsometrie |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE9300956U1 true DE9300956U1 (de) | 1993-04-08 |
Family
ID=6888532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE9300956U Expired - Lifetime DE9300956U1 (de) | 1993-01-14 | 1993-01-14 | Anordnung zum Bestimmen chrakteristischer Größen transparenter Schichten mit Hilfe der Ellipsometrie |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE9300956U1 (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5596406A (en) * | 1993-07-16 | 1997-01-21 | Therma-Wave, Inc. | Sample characteristic analysis utilizing multi wavelength and multi angle polarization and magnitude change detection |
| US6278519B1 (en) | 1998-01-29 | 2001-08-21 | Therma-Wave, Inc. | Apparatus for analyzing multi-layer thin film stacks on semiconductors |
| US6304326B1 (en) | 1997-07-11 | 2001-10-16 | Therma-Wave, Inc. | Thin film optical measurement system and method with calibrating ellipsometer |
-
1993
- 1993-01-14 DE DE9300956U patent/DE9300956U1/de not_active Expired - Lifetime
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5596406A (en) * | 1993-07-16 | 1997-01-21 | Therma-Wave, Inc. | Sample characteristic analysis utilizing multi wavelength and multi angle polarization and magnitude change detection |
| US6304326B1 (en) | 1997-07-11 | 2001-10-16 | Therma-Wave, Inc. | Thin film optical measurement system and method with calibrating ellipsometer |
| US6411385B2 (en) | 1997-07-11 | 2002-06-25 | Therma-Wave, Inc. | Thin film optical measurement system and method with calibrating ellipsometer |
| US6515746B2 (en) | 1997-07-11 | 2003-02-04 | Therma-Wave, Inc. | Thin film optical measurement system and method with calibrating ellipsometer |
| US6753962B2 (en) | 1997-07-11 | 2004-06-22 | Therma-Wave, Inc. | Thin film optical measurement system and method with calibrating ellipsometer |
| US6934025B2 (en) | 1997-07-11 | 2005-08-23 | Therma-Wave, Inc. | Thin film optical measurement system and method with calibrating ellipsometer |
| US6278519B1 (en) | 1998-01-29 | 2001-08-21 | Therma-Wave, Inc. | Apparatus for analyzing multi-layer thin film stacks on semiconductors |
| US6297880B1 (en) | 1998-01-29 | 2001-10-02 | Therma-Wave, Inc. | Apparatus for analyzing multi-layer thin film stacks on semiconductors |
| US6417921B2 (en) | 1998-01-29 | 2002-07-09 | Therma-Wave, Inc. | Apparatus for analyzing multi-layer thin film stacks on semiconductors |
| US6567213B2 (en) | 1998-01-29 | 2003-05-20 | Therma-Wave, Inc. | Apparatus for analyzing multi-layer thin film stacks on semiconductors |
| US6774997B2 (en) | 1998-01-29 | 2004-08-10 | Therma-Wave, Inc. | Apparatus for analyzing multi-layer thin film stacks on semiconductors |
| US6922244B2 (en) | 1998-01-29 | 2005-07-26 | Therma-Wave, Inc. | Thin film optical measurement system and method with calibrating ellipsometer |
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