DE69937867D1 - Trägerstruktur für Gaslaserkammer und -Optik - Google Patents
Trägerstruktur für Gaslaserkammer und -OptikInfo
- Publication number
- DE69937867D1 DE69937867D1 DE69937867T DE69937867T DE69937867D1 DE 69937867 D1 DE69937867 D1 DE 69937867D1 DE 69937867 T DE69937867 T DE 69937867T DE 69937867 T DE69937867 T DE 69937867T DE 69937867 D1 DE69937867 D1 DE 69937867D1
- Authority
- DE
- Germany
- Prior art keywords
- optics
- carrier structure
- gas laser
- laser chamber
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Lasers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US174155 | 1998-10-16 | ||
US09/174,155 US6109574A (en) | 1996-01-05 | 1998-10-16 | Gas laser chamber/optics support structure |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69937867D1 true DE69937867D1 (de) | 2008-02-14 |
DE69937867T2 DE69937867T2 (de) | 2009-01-02 |
Family
ID=22635066
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69937867T Expired - Lifetime DE69937867T2 (de) | 1998-10-16 | 1999-10-14 | Trägerstruktur für Gaslaserkammer und -Optik |
Country Status (4)
Country | Link |
---|---|
US (1) | US6109574A (de) |
EP (1) | EP0994541B1 (de) |
JP (1) | JP2000183426A (de) |
DE (1) | DE69937867T2 (de) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6586757B2 (en) | 1997-05-12 | 2003-07-01 | Cymer, Inc. | Plasma focus light source with active and buffer gas control |
US6757316B2 (en) | 1999-12-27 | 2004-06-29 | Cymer, Inc. | Four KHz gas discharge laser |
US6801560B2 (en) | 1999-05-10 | 2004-10-05 | Cymer, Inc. | Line selected F2 two chamber laser system |
US6590922B2 (en) | 1999-09-27 | 2003-07-08 | Cymer, Inc. | Injection seeded F2 laser with line selection and discrimination |
US7856044B2 (en) * | 1999-05-10 | 2010-12-21 | Cymer, Inc. | Extendable electrode for gas discharge laser |
US6795474B2 (en) * | 2000-11-17 | 2004-09-21 | Cymer, Inc. | Gas discharge laser with improved beam path |
US6556600B2 (en) | 1999-09-27 | 2003-04-29 | Cymer, Inc. | Injection seeded F2 laser with centerline wavelength control |
US6466601B1 (en) | 2001-04-13 | 2002-10-15 | Cymer, Inc. | Beam seal for line narrowed production laser |
US7180081B2 (en) * | 2000-06-09 | 2007-02-20 | Cymer, Inc. | Discharge produced plasma EUV light source |
US6425559B1 (en) | 2000-09-29 | 2002-07-30 | Cymer, Inc. | Gas laser chamber with vertical vibration isolator |
US6839372B2 (en) * | 2000-11-17 | 2005-01-04 | Cymer, Inc. | Gas discharge ultraviolet laser with enclosed beam path with added oxidizer |
US6928093B2 (en) * | 2002-05-07 | 2005-08-09 | Cymer, Inc. | Long delay and high TIS pulse stretcher |
US7671349B2 (en) * | 2003-04-08 | 2010-03-02 | Cymer, Inc. | Laser produced plasma EUV light source |
US20040101018A1 (en) * | 2002-08-28 | 2004-05-27 | Syb Leijenaar | Suspension system for laser discharge unit |
US20050271110A1 (en) * | 2003-08-22 | 2005-12-08 | Rainer Paetzel | Excimer laser system with stable beam output |
US7064908B2 (en) * | 2004-04-21 | 2006-06-20 | The Boeing Company | Laser beam jitter reduction device on a laser optical bench |
US20050286599A1 (en) * | 2004-06-29 | 2005-12-29 | Rafac Robert J | Method and apparatus for gas discharge laser output light coherency reduction |
US8379687B2 (en) | 2005-06-30 | 2013-02-19 | Cymer, Inc. | Gas discharge laser line narrowing module |
US7321607B2 (en) * | 2005-11-01 | 2008-01-22 | Cymer, Inc. | External optics and chamber support system |
US7812329B2 (en) * | 2007-12-14 | 2010-10-12 | Cymer, Inc. | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus |
US7655925B2 (en) * | 2007-08-31 | 2010-02-02 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
US8519366B2 (en) * | 2008-08-06 | 2013-08-27 | Cymer, Inc. | Debris protection system having a magnetic field for an EUV light source |
JP5687488B2 (ja) | 2010-02-22 | 2015-03-18 | ギガフォトン株式会社 | 極端紫外光生成装置 |
CN103259159B (zh) * | 2013-04-26 | 2016-05-04 | 中国科学院光电研究院 | 光机分离式双腔准分子激光器整机框架系统 |
CN104595642B (zh) * | 2015-01-06 | 2016-05-04 | 山东大学 | 一种二自由度压电驱动纳米定位平台 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4760583A (en) * | 1983-05-06 | 1988-07-26 | Coherent, Inc. | Laser delivery system |
US4534047A (en) * | 1984-01-06 | 1985-08-06 | The Perkin-Elmer Corporation | Mask ring assembly for X-ray lithography |
US4719641A (en) * | 1985-11-08 | 1988-01-12 | Summit Technology, Inc. | Multiple chamber laser containment system |
US4818089A (en) * | 1987-04-24 | 1989-04-04 | Coherent, Inc. | Kinematic resonator support |
DE3917408A1 (de) * | 1988-06-06 | 1989-12-07 | Takenaka Corp | Daempfungssockel |
US5040953A (en) * | 1988-09-19 | 1991-08-20 | Copeland Corporation | Mounting system |
DE4313675C1 (de) * | 1993-04-22 | 1994-05-26 | Mannesmann Ag | Lichtsetzgerät |
US5863017A (en) * | 1996-01-05 | 1999-01-26 | Cymer, Inc. | Stabilized laser platform and module interface |
-
1998
- 1998-10-16 US US09/174,155 patent/US6109574A/en not_active Expired - Lifetime
-
1999
- 1999-10-14 DE DE69937867T patent/DE69937867T2/de not_active Expired - Lifetime
- 1999-10-14 EP EP99120466A patent/EP0994541B1/de not_active Expired - Lifetime
- 1999-10-18 JP JP11331723A patent/JP2000183426A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP0994541A2 (de) | 2000-04-19 |
EP0994541B1 (de) | 2008-01-02 |
US6109574A (en) | 2000-08-29 |
EP0994541A3 (de) | 2002-09-25 |
JP2000183426A (ja) | 2000-06-30 |
DE69937867T2 (de) | 2009-01-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |