DE69840073D1 - Im raum regelmässig verteilter niederschlag von polymerpartikeln wärend der herstellung einer gitterelektrode - Google Patents

Im raum regelmässig verteilter niederschlag von polymerpartikeln wärend der herstellung einer gitterelektrode

Info

Publication number
DE69840073D1
DE69840073D1 DE69840073T DE69840073T DE69840073D1 DE 69840073 D1 DE69840073 D1 DE 69840073D1 DE 69840073 T DE69840073 T DE 69840073T DE 69840073 T DE69840073 T DE 69840073T DE 69840073 D1 DE69840073 D1 DE 69840073D1
Authority
DE
Germany
Prior art keywords
manufacture
polymer particles
grid electrode
regularly distributed
room during
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69840073T
Other languages
English (en)
Inventor
Philip J Elizondo
Kishore K Chakravorty
David Caudillo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69840073D1 publication Critical patent/DE69840073D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/022Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2329/00Electron emission display panels, e.g. field emission display panels

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrodes Of Semiconductors (AREA)
DE69840073T 1997-11-03 1998-07-21 Im raum regelmässig verteilter niederschlag von polymerpartikeln wärend der herstellung einer gitterelektrode Expired - Lifetime DE69840073D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/963,010 US6095883A (en) 1997-07-07 1997-11-03 Spatially uniform deposition of polymer particles during gate electrode formation
PCT/US1998/015095 WO1999023681A1 (en) 1997-11-03 1998-07-21 Spatially uniform deposition of polymer particles during gate electrode formation

Publications (1)

Publication Number Publication Date
DE69840073D1 true DE69840073D1 (de) 2008-11-13

Family

ID=25506620

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69840073T Expired - Lifetime DE69840073D1 (de) 1997-11-03 1998-07-21 Im raum regelmässig verteilter niederschlag von polymerpartikeln wärend der herstellung einer gitterelektrode

Country Status (6)

Country Link
US (1) US6095883A (de)
EP (1) EP1029337B1 (de)
JP (1) JP2001522127A (de)
KR (1) KR100479985B1 (de)
DE (1) DE69840073D1 (de)
WO (1) WO1999023681A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003089990A2 (en) * 2002-04-19 2003-10-30 Applied Materials, Inc. Process for etching photomasks
KR101037488B1 (ko) * 2003-12-15 2011-05-26 주식회사 하이닉스반도체 반도체 공정에 이용되는 레티클
JP2007087605A (ja) * 2005-09-16 2007-04-05 Fujifilm Corp 電子放出素子、その製造方法および表示素子
JP2009170280A (ja) * 2008-01-17 2009-07-30 Sony Corp 冷陰極電界電子放出素子の製造方法及び冷陰極電界電子放出表示装置の製造方法
US10340143B1 (en) * 2018-06-12 2019-07-02 Lam Research Corporation Anodic aluminum oxide as hard mask for plasma etching
US11584900B2 (en) 2020-05-14 2023-02-21 Corrosion Innovations, Llc Method for removing one or more of: coating, corrosion, salt from a surface

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3116398B2 (ja) * 1991-03-13 2000-12-11 ソニー株式会社 平面型電子放出素子の製造方法及び平面型電子放出素子
US5199917A (en) * 1991-12-09 1993-04-06 Cornell Research Foundation, Inc. Silicon tip field emission cathode arrays and fabrication thereof
JP2940360B2 (ja) * 1993-09-14 1999-08-25 双葉電子工業株式会社 電界放出素子アレイの製造方法
US5504385A (en) * 1994-08-31 1996-04-02 At&T Corp. Spaced-gate emission device and method for making same
US5601466A (en) * 1995-04-19 1997-02-11 Texas Instruments Incorporated Method for fabricating field emission device metallization
US5865657A (en) * 1996-06-07 1999-02-02 Candescent Technologies Corporation Fabrication of gated electron-emitting device utilizing distributed particles to form gate openings typically beveled and/or combined with lift-off or electrochemical removal of excess emitter material
US5865659A (en) * 1996-06-07 1999-02-02 Candescent Technologies Corporation Fabrication of gated electron-emitting device utilizing distributed particles to define gate openings and utilizing spacer material to control spacing between gate layer and electron-emissive elements
US5755944A (en) * 1996-06-07 1998-05-26 Candescent Technologies Corporation Formation of layer having openings produced by utilizing particles deposited under influence of electric field
US6039621A (en) * 1997-07-07 2000-03-21 Candescent Technologies Corporation Gate electrode formation method

Also Published As

Publication number Publication date
WO1999023681A1 (en) 1999-05-14
US6095883A (en) 2000-08-01
KR100479985B1 (ko) 2005-03-30
KR20010031751A (ko) 2001-04-16
EP1029337A1 (de) 2000-08-23
EP1029337B1 (de) 2008-10-01
JP2001522127A (ja) 2001-11-13
EP1029337A4 (de) 2005-04-06

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Legal Events

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8364 No opposition during term of opposition