DE69733544D1 - Konische prallflache zur reduzierung des aufladungsdrifts in einem teilchenstrahlgerat - Google Patents

Konische prallflache zur reduzierung des aufladungsdrifts in einem teilchenstrahlgerat

Info

Publication number
DE69733544D1
DE69733544D1 DE69733544T DE69733544T DE69733544D1 DE 69733544 D1 DE69733544 D1 DE 69733544D1 DE 69733544 T DE69733544 T DE 69733544T DE 69733544 T DE69733544 T DE 69733544T DE 69733544 D1 DE69733544 D1 DE 69733544D1
Authority
DE
Germany
Prior art keywords
reducing
conical floor
particular radiator
load drift
drift
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69733544T
Other languages
English (en)
Other versions
DE69733544T2 (de
Inventor
H Veneklasen
J Young
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of DE69733544D1 publication Critical patent/DE69733544D1/de
Publication of DE69733544T2 publication Critical patent/DE69733544T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/024—Moving components not otherwise provided for
    • H01J2237/0245—Moving whole optical system relatively to object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Particle Accelerators (AREA)
DE69733544T 1996-10-17 1997-10-07 Konische prallflache zur reduzierung des aufladungsdrifts in einem teilchenstrahlgerat Expired - Lifetime DE69733544T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US733673 1985-05-10
US08/733,673 US5838006A (en) 1996-10-17 1996-10-17 Conical baffle for reducing charging drift in a particle beam system
PCT/US1997/017315 WO1998016946A2 (en) 1996-10-17 1997-10-07 Conical baffle for reducing charging drift in a particle beam system

Publications (2)

Publication Number Publication Date
DE69733544D1 true DE69733544D1 (de) 2005-07-21
DE69733544T2 DE69733544T2 (de) 2006-05-11

Family

ID=24948656

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69733544T Expired - Lifetime DE69733544T2 (de) 1996-10-17 1997-10-07 Konische prallflache zur reduzierung des aufladungsdrifts in einem teilchenstrahlgerat

Country Status (7)

Country Link
US (1) US5838006A (de)
EP (1) EP0875072B1 (de)
JP (1) JP2000502501A (de)
KR (1) KR100306678B1 (de)
CA (1) CA2240531A1 (de)
DE (1) DE69733544T2 (de)
WO (1) WO1998016946A2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2341720A (en) * 1998-09-16 2000-03-22 Leica Microsys Lithography Ltd Electron beam aperture element with beam sheilding
WO2000067291A2 (en) * 1999-05-03 2000-11-09 Etec Systems, Inc. Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography
US6326635B1 (en) * 1999-07-30 2001-12-04 Etec Systems, Inc. Minimization of electron fogging in electron beam lithography
US6300630B1 (en) * 1999-12-09 2001-10-09 Etec Systems, Inc. Annular differential seal for electron beam apparatus using isolation valve and additional differential pumping
EP1182510B1 (de) * 2000-08-25 2006-04-12 ASML Netherlands B.V. Lithographischer Projektionsapparat
DE60118669T2 (de) 2000-08-25 2007-01-11 Asml Netherlands B.V. Lithographischer Projektionsapparat
DE60116967T2 (de) 2000-08-25 2006-09-21 Asml Netherlands B.V. Lithographischer Apparat
US7514682B2 (en) * 2005-09-30 2009-04-07 Applied Materials, Inc. Electron anti-fogging baffle used as a detector
EP2270835B1 (de) * 2005-11-28 2012-10-10 Carl Zeiss SMT GmbH Teilchenoptische Komponente
GB2455121A (en) * 2007-11-29 2009-06-03 Univ Sheffield Hallam Particle beam apparatus with means for reducing contamination in the particle beam column
JP6900026B2 (ja) * 2017-03-27 2021-07-07 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
JP6913344B2 (ja) * 2017-03-27 2021-08-04 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7906633A (nl) * 1979-09-05 1981-03-09 Philips Nv Anti-contaminatie diafragma voor elektronen- straalapparaat.
FR2520553A1 (fr) * 1982-01-22 1983-07-29 Cameca Appareil d'optique electronique comportant des elements en graphite pyrolytique
US4524261A (en) * 1983-09-19 1985-06-18 Varian Associates, Inc. Localized vacuum processing apparatus
GB2215907B (en) * 1987-07-14 1992-04-15 Jeol Ltd Apparatus using a charged-particle beam
US4837443A (en) * 1987-10-15 1989-06-06 The Perkin-Elmer Corporation Guard ring for a differentially pumped seal apparatus
FR2660485B1 (fr) * 1990-03-30 1992-07-31 Orsay Physics Dispositif de focalisation d'un faisceau de particules chargees.
US5185530A (en) * 1990-11-05 1993-02-09 Jeol Ltd. Electron beam instrument
US5362964A (en) * 1993-07-30 1994-11-08 Electroscan Corporation Environmental scanning electron microscope

Also Published As

Publication number Publication date
DE69733544T2 (de) 2006-05-11
WO1998016946A2 (en) 1998-04-23
KR19990072186A (ko) 1999-09-27
JP2000502501A (ja) 2000-02-29
EP0875072B1 (de) 2005-06-15
WO1998016946A3 (en) 1998-07-02
CA2240531A1 (en) 1998-04-23
KR100306678B1 (ko) 2001-11-15
EP0875072A2 (de) 1998-11-04
US5838006A (en) 1998-11-17

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Legal Events

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