DE69727658D1 - Kontinuierlicher Ofen mit hohem Durchsatz für Diffusionsbehandlung mit verschiedenen Diffusionsquellen - Google Patents
Kontinuierlicher Ofen mit hohem Durchsatz für Diffusionsbehandlung mit verschiedenen DiffusionsquellenInfo
- Publication number
- DE69727658D1 DE69727658D1 DE69727658T DE69727658T DE69727658D1 DE 69727658 D1 DE69727658 D1 DE 69727658D1 DE 69727658 T DE69727658 T DE 69727658T DE 69727658 T DE69727658 T DE 69727658T DE 69727658 D1 DE69727658 D1 DE 69727658D1
- Authority
- DE
- Germany
- Prior art keywords
- diffusion
- high throughput
- continuous high
- sources
- different
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4459697P | 1997-04-22 | 1997-04-22 | |
US44596P | 1997-04-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69727658D1 true DE69727658D1 (de) | 2004-03-25 |
DE69727658T2 DE69727658T2 (de) | 2005-04-28 |
Family
ID=21933235
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69727658T Expired - Lifetime DE69727658T2 (de) | 1997-04-22 | 1997-12-24 | Kontinuierlicher Ofen mit hohem Durchsatz für Diffusionsbehandlung mit verschiedenen Diffusionsquellen |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0874387B1 (de) |
DE (1) | DE69727658T2 (de) |
ES (1) | ES2216104T3 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6878213B1 (en) | 1998-12-07 | 2005-04-12 | Scp Global Technologies, Inc. | Process and system for rinsing of semiconductor substrates |
US6331212B1 (en) * | 2000-04-17 | 2001-12-18 | Avansys, Llc | Methods and apparatus for thermally processing wafers |
DE102006006473A1 (de) * | 2006-02-10 | 2007-08-23 | Centrotherm Photovoltaics Ag | Vorrichtung zur Behandlung von dünnen scheibenförmigen Objekten im Durchlaufverfahren |
DE102008030679B4 (de) * | 2008-04-17 | 2016-01-28 | Von Ardenne Gmbh | Vorrichtung zur Diffusionsbehandlung von Werkstücken |
DE102008044485A1 (de) * | 2008-08-28 | 2010-04-01 | Schott Solar Ag | Verfahren und Anordnung zum Herstellen einer Funktionsschicht auf einem Halbleiterbauelement |
DE102008055515A1 (de) * | 2008-12-12 | 2010-07-15 | Schott Solar Ag | Verfahren zum Ausbilden eines Dotierstoffprofils |
US20120085281A1 (en) * | 2010-10-07 | 2012-04-12 | Sandvik Thermal Process, Inc. | Apparatus with multiple heating systems for in-line thermal treatment of substrates |
DE202011051801U1 (de) | 2011-10-28 | 2011-11-15 | Schott Solar Ag | Waferstapel-Transportträger |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3656720A (en) * | 1970-03-16 | 1972-04-18 | Hayes Inc C I | Heat treating furnace with walking beam drive |
JPS61191015A (ja) * | 1985-02-20 | 1986-08-25 | Hitachi Ltd | 半導体の気相成長方法及びその装置 |
US4985113A (en) * | 1989-03-10 | 1991-01-15 | Hitachi, Ltd. | Sample treating method and apparatus |
US4950156A (en) * | 1989-06-28 | 1990-08-21 | Digital Equipment Corporation | Inert gas curtain for a thermal processing furnace |
KR950010044B1 (ko) * | 1990-06-27 | 1995-09-06 | 후지쓰 가부시끼가이샤 | 반도체 집적회로의 제조방법 및 그에 사용된 제조장치 |
US5270248A (en) * | 1992-08-07 | 1993-12-14 | Mobil Solar Energy Corporation | Method for forming diffusion junctions in solar cell substrates |
-
1997
- 1997-12-24 DE DE69727658T patent/DE69727658T2/de not_active Expired - Lifetime
- 1997-12-24 ES ES97122885T patent/ES2216104T3/es not_active Expired - Lifetime
- 1997-12-24 EP EP19970122885 patent/EP0874387B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69727658T2 (de) | 2005-04-28 |
EP0874387B1 (de) | 2004-02-18 |
ES2216104T3 (es) | 2004-10-16 |
EP0874387A1 (de) | 1998-10-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de | ||
8370 | Indication of lapse of patent is to be deleted | ||
8363 | Opposition against the patent |