DE69701129D1 - VERFAHREN ZUR HERSTELLUNG VON Ti 1-xAlxN BESCHICHTUNGEN - Google Patents

VERFAHREN ZUR HERSTELLUNG VON Ti 1-xAlxN BESCHICHTUNGEN

Info

Publication number
DE69701129D1
DE69701129D1 DE69701129T DE69701129T DE69701129D1 DE 69701129 D1 DE69701129 D1 DE 69701129D1 DE 69701129 T DE69701129 T DE 69701129T DE 69701129 T DE69701129 T DE 69701129T DE 69701129 D1 DE69701129 D1 DE 69701129D1
Authority
DE
Germany
Prior art keywords
xalxn
coatings
producing
xalxn coatings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69701129T
Other languages
English (en)
Other versions
DE69701129T2 (de
Inventor
Roland Madar
Alain Rouault
Elisabeth Blanquet
Claude Bernard
Anne-Marie Dutron
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Original Assignee
Centre National de la Recherche Scientifique CNRS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS filed Critical Centre National de la Recherche Scientifique CNRS
Application granted granted Critical
Publication of DE69701129D1 publication Critical patent/DE69701129D1/de
Publication of DE69701129T2 publication Critical patent/DE69701129T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DE69701129T 1996-02-27 1997-02-25 VERFAHREN ZUR HERSTELLUNG VON Ti 1-xAlxN BESCHICHTUNGEN Expired - Lifetime DE69701129T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9602699A FR2745299B1 (fr) 1996-02-27 1996-02-27 Procede de formation de revetements de ti1-xalxn
PCT/FR1997/000336 WO1997032057A1 (fr) 1996-02-27 1997-02-25 PROCEDE DE FORMATION DE REVETEMENTS DE Ti1-xAlxN

Publications (2)

Publication Number Publication Date
DE69701129D1 true DE69701129D1 (de) 2000-02-17
DE69701129T2 DE69701129T2 (de) 2000-09-21

Family

ID=9489831

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69701129T Expired - Lifetime DE69701129T2 (de) 1996-02-27 1997-02-25 VERFAHREN ZUR HERSTELLUNG VON Ti 1-xAlxN BESCHICHTUNGEN

Country Status (6)

Country Link
US (1) US6238739B1 (de)
EP (1) EP0883698B1 (de)
JP (1) JP4000601B2 (de)
DE (1) DE69701129T2 (de)
FR (1) FR2745299B1 (de)
WO (1) WO1997032057A1 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2767841B1 (fr) * 1997-08-29 1999-10-01 Commissariat Energie Atomique PROCEDE DE PREPARATION PAR DEPOT CHIMIQUE EN PHASE VAPEUR (CVD) D'UN REVETEMENT MULTICOUCHE A BASE DE Ti-Al-N
US9255329B2 (en) * 2000-12-06 2016-02-09 Novellus Systems, Inc. Modulated ion-induced atomic layer deposition (MII-ALD)
KR100387259B1 (ko) * 2000-12-29 2003-06-12 주식회사 하이닉스반도체 반도체 소자의 제조 방법
GB0108782D0 (en) 2001-04-07 2001-05-30 Trikon Holdings Ltd Methods and apparatus for forming precursors
US6627268B1 (en) * 2001-05-03 2003-09-30 Novellus Systems, Inc. Sequential ion, UV, and electron induced chemical vapor deposition
TWI253478B (en) * 2001-11-14 2006-04-21 Mitsubishi Heavy Ind Ltd Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
US7659209B2 (en) * 2001-11-14 2010-02-09 Canon Anelva Corporation Barrier metal film production method
FR2839730B1 (fr) * 2002-05-15 2004-08-27 Centre Nat Rech Scient Formation de carbure de silicium monocristallin
KR20060024421A (ko) * 2003-06-30 2006-03-16 켄이치로 미야하라 박막 형성용 기판, 박막 기판, 및 발광소자
DE102005032860B4 (de) * 2005-07-04 2007-08-09 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hartstoffbeschichtete Körper und Verfahren zu deren Herstellung
US7871678B1 (en) 2006-09-12 2011-01-18 Novellus Systems, Inc. Method of increasing the reactivity of a precursor in a cyclic deposition process
US8053372B1 (en) 2006-09-12 2011-11-08 Novellus Systems, Inc. Method of reducing plasma stabilization time in a cyclic deposition process
DE102007000512B3 (de) 2007-10-16 2009-01-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hartstoffbeschichtete Körper und Verfahren zu deren Herstellung
DE102008013965A1 (de) 2008-03-12 2009-09-17 Kennametal Inc. Hartstoffbeschichteter Körper
DE102008013966A1 (de) 2008-03-12 2009-09-17 Kennametal Inc. Hartstoffbeschichteter Körper
DE102008013964A1 (de) 2008-03-12 2009-09-17 Kennametal Inc. Hartstoffbeschichteter Körper
US8747964B2 (en) 2010-11-04 2014-06-10 Novellus Systems, Inc. Ion-induced atomic layer deposition of tantalum
FR2970977A1 (fr) * 2011-01-27 2012-08-03 Acerde Reacteur de depot sur un substrat d'un materiau issu de la decomposition d'un gaz a haute temperature
AT510963B1 (de) 2011-03-18 2012-08-15 Boehlerit Gmbh & Co Kg Beschichteter körper und verfahren zu dessen herstellung
AT510713B1 (de) * 2011-03-18 2012-06-15 Boehlerit Gmbh & Co Kg Schneidwerkzeug oder schneideinsatz hierfür sowie verwendung dieser
JP6024981B2 (ja) * 2012-03-09 2016-11-16 三菱マテリアル株式会社 高速断続切削加工で硬質被覆層がすぐれた耐チッピング性を発揮する表面被覆切削工具
AT511950B1 (de) 2012-03-14 2013-04-15 Boehlerit Gmbh & Co Kg Beschichteter Körper und Verfahren zum Beschichten eines Körpers
DE102013104254A1 (de) * 2013-04-26 2014-10-30 Walter Ag Werkzeug mit CVD-Beschichtung
AT516062B1 (de) 2015-01-15 2016-02-15 Boehlerit Gmbh & Co Kg Verfahren zum Beschichten eines Gegenstandes und damit hergestellte Beschichtung
CN109112500B (zh) * 2017-06-22 2022-01-28 肯纳金属公司 Cvd复合材料耐火涂层及其应用
AT525425B1 (de) 2022-03-03 2023-04-15 Boehlerit Gmbh & Co Kg Verfahren zur Herstellung einer Beschichtung auf einem Objekt und entsprechend hergestellter beschichteter Körper

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4138512A (en) * 1977-10-17 1979-02-06 The United States Of America As Represented By The Secretary Of The Army Process for chemical vapor deposition of a homogeneous alloy of refractory metals
US4842710A (en) * 1987-03-23 1989-06-27 Siemens Aktiengesellschaft Method of making mixed nitride films with at least two metals
DE3825399C5 (de) * 1988-07-23 2005-05-12 Cemecon Ag PVD- oder Plasma- CVD-Beschichtung
EP0417253A1 (de) * 1989-04-04 1991-03-20 Sri International Niedrigtemperaturverfahren zur herstellung von material aus einem oder mehreren metallreagenzien und halogen enthaltendes reagens zur herstellung reaktiver zwischenprodukte
CA2024987C (en) * 1989-09-11 1994-04-12 Jiinjen Albert Sue Multilayer coating of a nitride-containing compound and method for producing it
US5252360A (en) * 1990-03-15 1993-10-12 Huettl Wolfgang Process for the protection of an engraved roll or plate by coating an engraved surface with an interlayer and thereafter applying a wear-resistant layer to the interlayer by PVD

Also Published As

Publication number Publication date
FR2745299A1 (fr) 1997-08-29
FR2745299B1 (fr) 1998-06-19
WO1997032057A1 (fr) 1997-09-04
DE69701129T2 (de) 2000-09-21
EP0883698B1 (de) 2000-01-12
EP0883698A1 (de) 1998-12-16
JP4000601B2 (ja) 2007-10-31
JP2000505507A (ja) 2000-05-09
US6238739B1 (en) 2001-05-29

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Legal Events

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8327 Change in the person/name/address of the patent owner

Owner name: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, PARI