DE69604751D1 - Negativarbeitendes Bildaufzeichnungsmaterial - Google Patents

Negativarbeitendes Bildaufzeichnungsmaterial

Info

Publication number
DE69604751D1
DE69604751D1 DE69604751T DE69604751T DE69604751D1 DE 69604751 D1 DE69604751 D1 DE 69604751D1 DE 69604751 T DE69604751 T DE 69604751T DE 69604751 T DE69604751 T DE 69604751T DE 69604751 D1 DE69604751 D1 DE 69604751D1
Authority
DE
Germany
Prior art keywords
imaging material
negative imaging
negative
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69604751T
Other languages
English (en)
Other versions
DE69604751T2 (de
Inventor
Fumikazu Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69604751D1 publication Critical patent/DE69604751D1/de
Application granted granted Critical
Publication of DE69604751T2 publication Critical patent/DE69604751T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165—Thermal imaging composition

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
DE69604751T 1995-07-31 1996-07-23 Negativarbeitendes Bildaufzeichnungsmaterial Expired - Lifetime DE69604751T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7214112A JPH0943845A (ja) 1995-07-31 1995-07-31 ネガ型画像記録材料

Publications (2)

Publication Number Publication Date
DE69604751D1 true DE69604751D1 (de) 1999-11-25
DE69604751T2 DE69604751T2 (de) 2000-04-06

Family

ID=16650437

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69604751T Expired - Lifetime DE69604751T2 (de) 1995-07-31 1996-07-23 Negativarbeitendes Bildaufzeichnungsmaterial

Country Status (4)

Country Link
US (1) US5733707A (de)
EP (1) EP0761429B1 (de)
JP (1) JPH0943845A (de)
DE (1) DE69604751T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0901902A3 (de) * 1997-09-12 1999-03-24 Fuji Photo Film Co., Ltd. Positiv arbeitende lichtempfindliche Zusammensetzung für Infrarot Bebilderung
DE69905959T2 (de) * 1998-04-06 2003-12-04 Fuji Photo Film Co., Ltd. Lichtempfindliche Harzzusammensetzung
JP4327360B2 (ja) * 1998-09-23 2009-09-09 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー ホトレジスト、ポリマーおよびマイクロリソグラフィの方法
US6849377B2 (en) 1998-09-23 2005-02-01 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
US6489079B1 (en) * 1998-10-26 2002-12-03 Agfa-Gevaert Heat mode sensitive imaging element for making positive working printing plates
US6420082B1 (en) * 1998-11-13 2002-07-16 Fuji Photo Film Co., Ltd. Positive resist fluid and positive resist composition
ATE362846T1 (de) 2000-08-21 2007-06-15 Fujifilm Corp Bildaufzeichnungsmaterial
EP1332870A3 (de) 2002-02-05 2005-01-12 Fuji Photo Film Co., Ltd. Infrarot-empfindliche Zusammensetzung
JP2004012706A (ja) 2002-06-05 2004-01-15 Fuji Photo Film Co Ltd 平版印刷版原版
EP1757982A4 (de) * 2004-05-25 2007-10-31 Kodak Polychrome Graphics Jp Negativ lichtempfindliche zusammensetzung und negativ lichtempfindliche lithographieplatte

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52113219A (en) * 1976-03-19 1977-09-22 Hidekazu Inoue Flash image recording material
JPH0723030B2 (ja) * 1986-01-16 1995-03-15 株式会社巴川製紙所 平版印刷原版およびその製版方法
US5360836A (en) * 1986-10-02 1994-11-01 Societe Nationale Des Poudres Et Explosifs Process for the production of coatings by radiation cross-linking
JPH041762A (ja) * 1990-04-19 1992-01-07 Canon Inc 光重合性樹脂組成物および記録媒体
EP0573092A1 (de) * 1992-06-05 1993-12-08 Agfa-Gevaert N.V. Verfahren zur Herstellung eines Bildes unter Verwendung von einem Aufzeichnungsmaterial nach dem Wärmeverfahren
JPH061088A (ja) * 1992-06-17 1994-01-11 Canon Inc 印刷用原版、それを用いた印刷版の製造方法、その印刷版を用いた印刷方法及び印刷装置
GB2273366B (en) * 1992-11-18 1996-03-27 Du Pont Forming images on radiation-sensitive plates
JP3019176B2 (ja) * 1992-12-01 2000-03-13 第一工業製薬株式会社 放射線硬化性ポリウレタンエマルジョン組成物の製造方法
JP3078152B2 (ja) * 1993-07-07 2000-08-21 富士写真フイルム株式会社 感光性組成物

Also Published As

Publication number Publication date
US5733707A (en) 1998-03-31
DE69604751T2 (de) 2000-04-06
EP0761429A1 (de) 1997-03-12
JPH0943845A (ja) 1997-02-14
EP0761429B1 (de) 1999-10-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP