DE69603599D1 - Hochleistung-verzoegerungentladungskavitaet im hochfrequenzbereich - Google Patents
Hochleistung-verzoegerungentladungskavitaet im hochfrequenzbereichInfo
- Publication number
- DE69603599D1 DE69603599D1 DE69603599T DE69603599T DE69603599D1 DE 69603599 D1 DE69603599 D1 DE 69603599D1 DE 69603599 T DE69603599 T DE 69603599T DE 69603599 T DE69603599 T DE 69603599T DE 69603599 D1 DE69603599 D1 DE 69603599D1
- Authority
- DE
- Germany
- Prior art keywords
- frequency range
- discharge cavity
- high frequency
- delay discharge
- performance delay
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9506301A FR2734979B1 (fr) | 1995-05-29 | 1995-05-29 | Cavite de decharge forte puissance a onde lente dans le domaine des radiofrequences |
PCT/FR1996/000714 WO1996039011A1 (fr) | 1995-05-29 | 1996-05-10 | Cavite de decharge forte puissance a onde lente dans le domaine des radiofrequences |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69603599D1 true DE69603599D1 (de) | 1999-09-09 |
Family
ID=9479418
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69603599T Expired - Lifetime DE69603599D1 (de) | 1995-05-29 | 1996-05-10 | Hochleistung-verzoegerungentladungskavitaet im hochfrequenzbereich |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0829185B1 (de) |
AU (1) | AU5903596A (de) |
DE (1) | DE69603599D1 (de) |
FR (1) | FR2734979B1 (de) |
WO (1) | WO1996039011A1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19918790A1 (de) * | 1999-04-26 | 2000-11-02 | Aurion Anlagentechnik Gmbh | Hochfrequenz-Anpassung mit Helikon-Wellen |
US7183514B2 (en) * | 2003-01-30 | 2007-02-27 | Axcelis Technologies, Inc. | Helix coupled remote plasma source |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1091498A (en) * | 1965-06-02 | 1967-11-15 | British Titan Products | Gas heating apparatus |
US4918031A (en) * | 1988-12-28 | 1990-04-17 | American Telephone And Telegraph Company,At&T Bell Laboratories | Processes depending on plasma generation using a helical resonator |
US5304282A (en) * | 1991-04-17 | 1994-04-19 | Flamm Daniel L | Processes depending on plasma discharges sustained in a helical resonator |
US5288971A (en) * | 1991-08-09 | 1994-02-22 | Advanced Energy Industries, Inc. | System for igniting a plasma for thin film processing |
US5234529A (en) * | 1991-10-10 | 1993-08-10 | Johnson Wayne L | Plasma generating apparatus employing capacitive shielding and process for using such apparatus |
FR2702328B1 (fr) * | 1993-03-05 | 1995-05-12 | Univ Lille Sciences Tech | Dispositif de production d'un plasma. |
-
1995
- 1995-05-29 FR FR9506301A patent/FR2734979B1/fr not_active Expired - Fee Related
-
1996
- 1996-05-10 WO PCT/FR1996/000714 patent/WO1996039011A1/fr active IP Right Grant
- 1996-05-10 EP EP96916190A patent/EP0829185B1/de not_active Expired - Lifetime
- 1996-05-10 DE DE69603599T patent/DE69603599D1/de not_active Expired - Lifetime
- 1996-05-10 AU AU59035/96A patent/AU5903596A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP0829185A1 (de) | 1998-03-18 |
AU5903596A (en) | 1996-12-18 |
WO1996039011A1 (fr) | 1996-12-05 |
FR2734979A1 (fr) | 1996-12-06 |
FR2734979B1 (fr) | 1997-08-01 |
EP0829185B1 (de) | 1999-08-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de |