DE69525891D1 - Direkt nach der Belichtung verwendbares Druckmaterial - Google Patents

Direkt nach der Belichtung verwendbares Druckmaterial

Info

Publication number
DE69525891D1
DE69525891D1 DE69525891T DE69525891T DE69525891D1 DE 69525891 D1 DE69525891 D1 DE 69525891D1 DE 69525891 T DE69525891 T DE 69525891T DE 69525891 T DE69525891 T DE 69525891T DE 69525891 D1 DE69525891 D1 DE 69525891D1
Authority
DE
Germany
Prior art keywords
exposure
media
used immediately
immediately
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69525891T
Other languages
English (en)
Other versions
DE69525891T2 (de
Inventor
Gardner, Jr
Richard A Johnson
Leonard J Stulc
Dennis E Vogel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Graphics Holding Inc
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of DE69525891D1 publication Critical patent/DE69525891D1/de
Application granted granted Critical
Publication of DE69525891T2 publication Critical patent/DE69525891T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE69525891T 1994-09-23 1995-09-21 Direkt nach der Belichtung verwendbares Druckmaterial Expired - Fee Related DE69525891T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/311,510 US5506090A (en) 1994-09-23 1994-09-23 Process for making shoot and run printing plates

Publications (2)

Publication Number Publication Date
DE69525891D1 true DE69525891D1 (de) 2002-04-25
DE69525891T2 DE69525891T2 (de) 2002-09-05

Family

ID=23207226

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69525891T Expired - Fee Related DE69525891T2 (de) 1994-09-23 1995-09-21 Direkt nach der Belichtung verwendbares Druckmaterial

Country Status (5)

Country Link
US (2) US5506090A (de)
EP (1) EP0703499B1 (de)
JP (1) JP3827755B2 (de)
CN (1) CN1141444A (de)
DE (1) DE69525891T2 (de)

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US5516620A (en) * 1993-11-01 1996-05-14 Polaroid Corporation Method of on-press developing lithographic plates utilizing microencapsulated developers
US5599650A (en) * 1995-04-28 1997-02-04 Polaroid Corporation Photoreaction quenchers in on-press developable lithographic printing plates
US5677108A (en) * 1995-04-28 1997-10-14 Polaroid Corporation On-press removable quenching overcoat for lithographic plates
EP0769724B1 (de) * 1995-10-11 2000-07-12 Agfa-Gevaert N.V. Entwicklung von lithographischen Diazodruckplatten auf der Druckpresse
EP0768172B1 (de) * 1995-10-11 2001-04-04 Agfa-Gevaert N.V. Druckpressentwicklung von lithographischen Diazodruckplatten
DE69517174T2 (de) * 1995-10-24 2000-11-09 Agfa Gevaert Nv Verfahren zur Herstellung einer lithographische Druckplatte mit auf der Druckpresse stattfindenden Entwicklung
EP0771645B1 (de) * 1995-10-31 2000-08-23 Agfa-Gevaert N.V. Auf der Druckpressentwicklung von lithographischen Druckplatten bestehend aus lichtempfindlichem Schichten mit Aryldiazosulphonatharzen
GB9612233D0 (en) * 1996-06-12 1996-08-14 Horsell Graphic Ind Ltd Lithographic plate
EP0816070B1 (de) * 1996-06-24 2000-10-18 Agfa-Gevaert N.V. Wärmeempfindliches Aufzeichnungselement und Verfahren zur Herstellung einer lithographischen Druckform damit
US5786127A (en) * 1996-08-15 1998-07-28 Western Litho Plate & Supply Co. Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
CA2221922C (en) * 1996-08-20 2004-01-27 Presstek, Inc. Self-cleaning, abrasion-resistant, laser-imageable lithographic printing constructions
US5811220A (en) * 1996-10-10 1998-09-22 Polaroid Corporation On-press lithographic development methodology facilitated by the use of a disperse hydrophilic microgel
GB9709404D0 (en) * 1997-05-10 1997-07-02 Du Pont Uk Improvements in or relating to the formation of images
EP0908779B1 (de) * 1997-10-08 2002-06-19 Agfa-Gevaert Verfahren zur Herstellung positiv arbeitender Druckplatten aus einem wärmeempfindlichen Bildaufzeichnungselement
US6083663A (en) * 1997-10-08 2000-07-04 Agfa-Gevaert, N.V. Method for making positive working printing plates from a heat mode sensitive image element
US6153352A (en) * 1997-12-10 2000-11-28 Fuji Photo Film Co., Ltd. Planographic printing plate precursor and a method for producing a planographic printing plate
US6331375B1 (en) 1998-02-27 2001-12-18 Fuji Photo Film Co., Ltd. Photosensitive lithographic form plate using an image-forming material
US6014929A (en) * 1998-03-09 2000-01-18 Teng; Gary Ganghui Lithographic printing plates having a thin releasable interlayer overlying a rough substrate
US6095048A (en) * 1998-09-11 2000-08-01 Presstek, Inc. Lithographic imaging and plate cleaning using single-fluid ink systems
KR100401116B1 (ko) * 1999-06-03 2003-10-10 주식회사 하이닉스반도체 아민오염방지 물질 및 이를 이용한 미세패턴 형성방법
US6984482B2 (en) 1999-06-03 2006-01-10 Hynix Semiconductor Inc. Top-coating composition for photoresist and process for forming fine pattern using the same
US6503684B1 (en) 1999-06-29 2003-01-07 Agfa-Gevaert Processless thermal printing plate with cover layer containing compounds with cationic groups
EP1065049B1 (de) * 1999-06-29 2004-11-10 Agfa-Gevaert Wärmeempfindliches Aufzeichnungselement mit einer Deckschicht zur Herstellung lithographischer Druckplatten
DE60015656T2 (de) * 1999-06-29 2005-12-08 Agfa-Gevaert Wärmeempfindliches Aufzeichnungselement mit einer Deckschicht zur Herstellung lithographischer Druckplatten
DE60014526T2 (de) * 1999-07-26 2005-11-17 Fuji Photo Film Co., Ltd., Minami-Ashigara Wärmeempfindlicher Vorläufer für eine Flachdruckplatte
JP2001080226A (ja) * 1999-09-17 2001-03-27 Fuji Photo Film Co Ltd 感熱性平版印刷版用原板
US6245481B1 (en) 1999-10-12 2001-06-12 Gary Ganghui Teng On-press process of lithographic plates having a laser sensitive mask layer
JP3741353B2 (ja) * 1999-12-22 2006-02-01 富士写真フイルム株式会社 感熱性平版印刷用原板
US6740464B2 (en) * 2000-01-14 2004-05-25 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
US6632589B2 (en) * 2000-04-21 2003-10-14 Fuji Photo Film Co., Ltd. Lithographic printing process
US6482571B1 (en) * 2000-09-06 2002-11-19 Gary Ganghui Teng On-press development of thermosensitive lithographic plates
US6387595B1 (en) * 2000-10-30 2002-05-14 Gary Ganghui Teng On-press developable lithographic printing plate having an ultrathin overcoat
JP4098964B2 (ja) * 2001-03-06 2008-06-11 富士フイルム株式会社 平版印刷版原版
US6846608B2 (en) 2001-11-29 2005-01-25 Kodak Polychrome Graphics Llc Method to reduce imaging effluence in processless thermal printing plates
WO2004047166A2 (en) * 2002-11-15 2004-06-03 E.I. Du Pont De Nemours And Company Process for using protective layers in the fabrication of electronic devices
US7238462B2 (en) * 2002-11-27 2007-07-03 Tokyo Ohka Kogyo Co., Ltd. Undercoating material for wiring, embedded material, and wiring formation method
US20040170925A1 (en) * 2002-12-06 2004-09-02 Roach David Herbert Positive imageable thick film compositions
US6899996B2 (en) 2003-05-20 2005-05-31 Eastman Kodak Company Method of preparing imaging member with microgel protective layer
US6838226B2 (en) * 2003-05-20 2005-01-04 Eastman Kodak Company Imaging member with microgel protective layer
US20050164122A1 (en) * 2004-01-26 2005-07-28 Matsushita Electric Industrial Co., Ltd. Chemically amplified resist and pattern formation method
US7402373B2 (en) * 2004-02-05 2008-07-22 E.I. Du Pont De Nemours And Company UV radiation blocking protective layers compatible with thick film pastes
US20050247224A1 (en) * 2004-05-10 2005-11-10 Xante Corporation Computer-to-conductive anodized and grained plate platesetting system and apparatus
ATE389900T1 (de) * 2004-08-24 2008-04-15 Fujifilm Corp Verfahren zur herstellung einer lithographischen druckplatte
US7288362B2 (en) * 2005-02-23 2007-10-30 International Business Machines Corporation Immersion topcoat materials with improved performance
WO2007016109A2 (en) 2005-07-29 2007-02-08 Anocoil Corporation Imageable printing plate for on-press development
JP2008058406A (ja) * 2006-08-29 2008-03-13 Fujifilm Corp 画像記録材料
CN104325802B (zh) * 2014-10-27 2017-05-17 中国科学院化学研究所 一种使用水性印刷油墨的新型版材
JP7378613B2 (ja) * 2020-05-29 2023-11-13 富士フイルム株式会社 機上現像型平版印刷版原版、平版印刷版の作製方法、及び平版印刷方法

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BE516716A (de) * 1952-01-05 1900-01-01
US3615446A (en) * 1968-01-15 1971-10-26 Itek Corp Photographic copy medium comprising a semiconductor layer with a photopolymerizable layer thereover
FR2186674A1 (en) * 1972-06-02 1974-01-11 Eastman Kodak Co Direct positive image prodn - using diazo photographic products with top PVA layer
US3793033A (en) * 1972-09-05 1974-02-19 Minnesota Mining & Mfg Development-free printing plate
JPS50150501A (de) * 1974-05-23 1975-12-03
CA1090189A (en) * 1976-05-03 1980-11-25 American Hoechst Corporation Lithographic plate finisher comprising a solvent phase and an aqueous phase containing tapioca dextrin
GB1577258A (en) * 1976-07-30 1980-10-22 Kansai Paint Co Ltd Planographic printing
AU589722B2 (en) * 1986-01-28 1989-10-19 Minnesota Mining And Manufacturing Company Imageable material and process
JPS62195665A (ja) * 1986-02-21 1987-08-28 Nippon Foil Mfg Co Ltd 感光性平版印刷版材の製造方法
DE3715790A1 (de) * 1987-05-12 1988-11-24 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial
CA2090039A1 (en) * 1990-09-18 1992-03-19 Willard Earl Conley Top coat and acid catalyzed resists
US5225316A (en) * 1990-11-26 1993-07-06 Minnesota Mining And Manufacturing Company An imagable article comprising a photosensitive composition comprising a polymer having acid labile pendant groups
US5102771A (en) * 1990-11-26 1992-04-07 Minnesota Mining And Manufacturing Company Photosensitive materials
JPH04204848A (ja) * 1990-11-30 1992-07-27 Matsushita Electric Ind Co Ltd 微細パターン形成方法
US5258263A (en) * 1991-09-10 1993-11-02 Polaroid Corporation Printing plate and methods of making and use same
JP3009010B2 (ja) * 1992-05-08 2000-02-14 東洋紡績株式会社 感光性樹脂積層体
US5395734A (en) * 1992-11-30 1995-03-07 Minnesota Mining And Manufacturing Company Shoot and run printing materials
US5516620A (en) * 1993-11-01 1996-05-14 Polaroid Corporation Method of on-press developing lithographic plates utilizing microencapsulated developers
US5514522A (en) * 1993-11-01 1996-05-07 Polaroid Corporation Synthesis of photoreactive polymeric binders
US5616449A (en) * 1993-11-01 1997-04-01 Polaroid Corporation Lithographic printing plates with dispersed rubber additives
US5607816A (en) * 1993-11-01 1997-03-04 Polaroid Corporation On-press developable lithographic printing plates with high plasticizer content photoresists
DK0678201T3 (da) * 1993-11-01 1997-08-18 Polaroid Corp Litografiske trykplader med fotoreaktive, polymere bindemidler
US5677108A (en) * 1995-04-28 1997-10-14 Polaroid Corporation On-press removable quenching overcoat for lithographic plates
US5599650A (en) * 1995-04-28 1997-02-04 Polaroid Corporation Photoreaction quenchers in on-press developable lithographic printing plates
US5561029A (en) * 1995-04-28 1996-10-01 Polaroid Corporation Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates
WO1997012759A1 (en) * 1995-10-06 1997-04-10 Polaroid Corporation On-press developable printing plates with hydrogen bond forming developability stabilizer

Also Published As

Publication number Publication date
CN1141444A (zh) 1997-01-29
EP0703499A1 (de) 1996-03-27
JPH08114922A (ja) 1996-05-07
EP0703499B1 (de) 2002-03-20
JP3827755B2 (ja) 2006-09-27
US5506090A (en) 1996-04-09
US5939237A (en) 1999-08-17
DE69525891T2 (de) 2002-09-05

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: KODAK POLYCHROME GRAPHICS, NORWALK, CONN., US

8339 Ceased/non-payment of the annual fee