DE69417170D1 - Verfahren zur Diffusionsmusterung und Sieb dafür - Google Patents
Verfahren zur Diffusionsmusterung und Sieb dafürInfo
- Publication number
- DE69417170D1 DE69417170D1 DE69417170T DE69417170T DE69417170D1 DE 69417170 D1 DE69417170 D1 DE 69417170D1 DE 69417170 T DE69417170 T DE 69417170T DE 69417170 T DE69417170 T DE 69417170T DE 69417170 D1 DE69417170 D1 DE 69417170D1
- Authority
- DE
- Germany
- Prior art keywords
- patterning method
- screen therefor
- diffusion patterning
- diffusion
- therefor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000009792 diffusion process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000000059 patterning Methods 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/12—Stencil printing; Silk-screen printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/4867—Applying pastes or inks, e.g. screen printing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/26—Printing on other surfaces than ordinary paper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Power Engineering (AREA)
- Printing Methods (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/139,442 US5411628A (en) | 1993-10-21 | 1993-10-21 | Diffusion patterning process and screen therefor |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69417170D1 true DE69417170D1 (de) | 1999-04-22 |
DE69417170T2 DE69417170T2 (de) | 1999-07-22 |
Family
ID=22486671
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69417170T Expired - Fee Related DE69417170T2 (de) | 1993-10-21 | 1994-09-28 | Verfahren zur Diffusionsmusterung und Sieb dafür |
Country Status (7)
Country | Link |
---|---|
US (2) | US5411628A (de) |
EP (1) | EP0658436B1 (de) |
JP (1) | JP2900800B2 (de) |
KR (1) | KR0132699B1 (de) |
CN (1) | CN1065182C (de) |
DE (1) | DE69417170T2 (de) |
TW (1) | TW297801B (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0742585A1 (de) * | 1995-05-08 | 1996-11-13 | E.I. Du Pont De Nemours And Company | Verfahren und Zusammensetzung zur Diffusionsmusterung eines Bandes auf einem Substrat |
US6376346B1 (en) | 2000-09-28 | 2002-04-23 | Fabtech, Inc. | High voltage device and method for making the same |
TWI268813B (en) * | 2002-04-24 | 2006-12-21 | Sipix Imaging Inc | Process for forming a patterned thin film conductive structure on a substrate |
US7134395B2 (en) * | 2004-01-20 | 2006-11-14 | Southern Lithoplate, Inc. | Acid inkjet imaging of lithographic printing plates |
NL1025774A1 (nl) * | 2004-03-19 | 2004-05-03 | Stork Prints Bv | Werkwijze voor het vervaardigen van een basismateriaal voor zeefdrukken alsmede dergelijk basismateriaal. |
KR100808555B1 (ko) * | 2006-05-12 | 2008-02-29 | 이범문 | 스프레이 분사방법을 이용한 실크스크린 인쇄방법 및 실크스크린 인쇄용 잉크 |
JP4656140B2 (ja) * | 2007-12-27 | 2011-03-23 | 富士電機システムズ株式会社 | 半導体装置の製造方法 |
FR2969957B1 (fr) * | 2010-12-29 | 2013-01-04 | Saint Gobain | Procede de fabrication d'un vitrage feuillete imprime par serigraphie a l'aide d'un ecran de serigraphie double tissage |
KR102081158B1 (ko) * | 2012-10-22 | 2020-02-25 | 엘지디스플레이 주식회사 | 와이어 메시 타입 확산판과 그 제조방법, 및 이를 구비한 액정표시장치 |
US10071537B2 (en) * | 2013-12-06 | 2018-09-11 | The Boeing Company | Ceramic matrix composite component and method of forming thereof |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1804508A (en) * | 1926-10-11 | 1931-05-12 | John T Nicholson | Transparent tile and method of making same |
US5032216A (en) * | 1989-10-20 | 1991-07-16 | E. I. Du Pont De Nemours And Company | Non-photographic method for patterning organic polymer films |
US5209814A (en) * | 1991-09-30 | 1993-05-11 | E. I. Du Pont De Nemours And Company | Method for diffusion patterning |
US5275689A (en) * | 1991-11-14 | 1994-01-04 | E. I. Du Pont De Nemours And Company | Method and compositions for diffusion patterning |
US5260163A (en) * | 1992-05-07 | 1993-11-09 | E. I. Du Pont De Nemours And Company | Photoenhanced diffusion patterning for organic polymer films |
-
1993
- 1993-10-21 US US08/139,442 patent/US5411628A/en not_active Expired - Lifetime
-
1994
- 1994-09-28 EP EP94115263A patent/EP0658436B1/de not_active Expired - Lifetime
- 1994-09-28 DE DE69417170T patent/DE69417170T2/de not_active Expired - Fee Related
- 1994-10-01 TW TW083109089A patent/TW297801B/zh active
- 1994-10-20 JP JP6255012A patent/JP2900800B2/ja not_active Expired - Fee Related
- 1994-10-20 KR KR94026814A patent/KR0132699B1/ko not_active IP Right Cessation
- 1994-10-21 CN CN94117200A patent/CN1065182C/zh not_active Expired - Fee Related
- 1994-12-27 US US08/363,848 patent/US5520986A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN1065182C (zh) | 2001-05-02 |
JP2900800B2 (ja) | 1999-06-02 |
KR950012143A (ko) | 1995-05-16 |
JPH07179015A (ja) | 1995-07-18 |
EP0658436A1 (de) | 1995-06-21 |
CN1117441A (zh) | 1996-02-28 |
TW297801B (de) | 1997-02-11 |
DE69417170T2 (de) | 1999-07-22 |
KR0132699B1 (en) | 1998-04-14 |
US5411628A (en) | 1995-05-02 |
EP0658436B1 (de) | 1999-03-17 |
US5520986A (en) | 1996-05-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8339 | Ceased/non-payment of the annual fee |