DE69402042T2 - Verfahren und Vorrichtung zur Verdampfung von flüssigen Reaktionsmitteln - Google Patents

Verfahren und Vorrichtung zur Verdampfung von flüssigen Reaktionsmitteln

Info

Publication number
DE69402042T2
DE69402042T2 DE69402042T DE69402042T DE69402042T2 DE 69402042 T2 DE69402042 T2 DE 69402042T2 DE 69402042 T DE69402042 T DE 69402042T DE 69402042 T DE69402042 T DE 69402042T DE 69402042 T2 DE69402042 T2 DE 69402042T2
Authority
DE
Germany
Prior art keywords
evaporating liquid
liquid reactants
reactants
evaporating
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69402042T
Other languages
English (en)
Other versions
DE69402042D1 (de
Inventor
Michael Bruce Cain
Michael Sean Dobbins
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of DE69402042D1 publication Critical patent/DE69402042D1/de
Application granted granted Critical
Publication of DE69402042T2 publication Critical patent/DE69402042T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/0011—Heating features
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/008—Feed or outlet control devices
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
DE69402042T 1993-12-20 1994-12-09 Verfahren und Vorrichtung zur Verdampfung von flüssigen Reaktionsmitteln Expired - Fee Related DE69402042T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/169,037 US5356451A (en) 1993-12-20 1993-12-20 Method and apparatus for vaporization of liquid reactants

Publications (2)

Publication Number Publication Date
DE69402042D1 DE69402042D1 (de) 1997-04-17
DE69402042T2 true DE69402042T2 (de) 1997-09-11

Family

ID=22614021

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69402042T Expired - Fee Related DE69402042T2 (de) 1993-12-20 1994-12-09 Verfahren und Vorrichtung zur Verdampfung von flüssigen Reaktionsmitteln

Country Status (6)

Country Link
US (1) US5356451A (de)
EP (1) EP0659698B1 (de)
JP (1) JP3680220B2 (de)
AU (1) AU8036794A (de)
CA (1) CA2132885A1 (de)
DE (1) DE69402042T2 (de)

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FR2695944B1 (fr) * 1992-09-24 1994-11-18 Onera (Off Nat Aerospatiale) Appareil de dépôt chimique en phase vapeur activé par un plasma micro-ondes.
DE4430619A1 (de) * 1994-08-17 1996-02-22 Eduard Kirschmann Verdampfungsanlage
US5599371A (en) * 1994-12-30 1997-02-04 Corning Incorporated Method of using precision burners for oxidizing halide-free, silicon-containing compounds
US5632797A (en) * 1994-12-30 1997-05-27 Corning Incorporated Method of providing vaporized halide-free, silicon-containing compounds
US5558687A (en) * 1994-12-30 1996-09-24 Corning Incorporated Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds
US5703191A (en) * 1995-09-01 1997-12-30 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
US5838866A (en) 1995-11-03 1998-11-17 Corning Incorporated Optical fiber resistant to hydrogen-induced attenuation
US5879649A (en) * 1995-12-19 1999-03-09 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
GB9600211D0 (en) * 1996-01-05 1996-03-06 Jem Smoke Machine Company Limi Improvements in or relating to a vaporiser
US5951923A (en) * 1996-05-23 1999-09-14 Ebara Corporation Vaporizer apparatus and film deposition apparatus therewith
US6094940A (en) * 1997-10-09 2000-08-01 Nikon Corporation Manufacturing method of synthetic silica glass
US6546757B1 (en) 1998-07-28 2003-04-15 Brown University Research Foundation Liquid spray pyrolysis method for the fabrication of optical fiber preforms, with reactant mixing
US20030101938A1 (en) * 1998-10-27 2003-06-05 Applied Materials, Inc. Apparatus for the deposition of high dielectric constant films
US8679233B1 (en) * 2002-01-02 2014-03-25 The United States Of America As Represented By The Secretary Of The Air Force Modification of the degree of liquid contact with a solid by control of surface and micro-channel capillary geometry
US10502448B1 (en) 2002-01-02 2019-12-10 United States Of America As Represented By The Secretary Of The Air Force Self-clearing vents based on droplet expulsion
JP3826072B2 (ja) * 2002-06-03 2006-09-27 アドバンスド エナジー ジャパン株式会社 液体材料気化供給装置
US7730747B2 (en) * 2002-06-28 2010-06-08 Prysmian Cavi E Sistemi Energia S.R.L. Method for vaporizing a liquid reactant in manufacturing a glass preform
US20050205215A1 (en) * 2004-03-17 2005-09-22 General Electric Company Apparatus for the evaporation of aqueous organic liquids and the production of powder pre-forms in flame hydrolysis processes
US20120276291A1 (en) * 2011-04-28 2012-11-01 Bird Chester D Methods and Apparatuses for Reducing Gelation of Glass Precursor Materials During Vaporization
US9302291B2 (en) 2011-08-05 2016-04-05 3M Innovative Properties Company Systems and methods for processing vapor
DE102011119339A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas
DE102011119373A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119374A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119341A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode
JP5973178B2 (ja) * 2012-02-01 2016-08-23 Ckd株式会社 液体制御装置
RU2488421C1 (ru) * 2012-03-07 2013-07-27 Виталий Алексеевич Узиков Способ концентрирования жидких растворов
DE102013209673B3 (de) * 2013-05-24 2014-05-22 Heraeus Quarzglas Gmbh & Co. Kg Verfahren und Verdampfer zur Herstellung von synthetischem Quarzglas
US8945281B1 (en) * 2014-01-30 2015-02-03 Msp Corporation Method and apparatus for vapor generation and wafer cleaning
US10107490B2 (en) 2014-06-30 2018-10-23 Lam Research Corporation Configurable liquid precursor vaporizer
US9982341B2 (en) 2015-01-30 2018-05-29 Lam Research Corporation Modular vaporizer
US9818888B2 (en) 2015-03-12 2017-11-14 Vitro, S.A.B. De C.V. Article with buffer layer and method of making the same
WO2016144869A1 (en) 2015-03-12 2016-09-15 Ppg Industries Ohio, Inc. Optoelectronic device and method of making the same
US20180141080A1 (en) 2015-06-30 2018-05-24 3M Innovative Properties Company Discontinuous coatings and methods of forming the same
EP3380786B1 (de) * 2015-11-26 2019-04-17 Koninklijke Philips N.V. Vorrichtung zur dampferzeugung und verfahren zur dampferzeugung
US10112208B2 (en) 2015-12-11 2018-10-30 VITRO S.A.B. de C.V. Glass articles with nanoparticle regions
WO2017100607A1 (en) 2015-12-11 2017-06-15 Vitro, S.A.B. De C.V. Coating system and articles made thereby
WO2017172531A1 (en) 2016-04-01 2017-10-05 3M Innovative Properties Company Roll-to-roll atomic layer deposition apparatus and method
RU2619768C1 (ru) * 2016-06-08 2017-05-18 Виталий Алексеевич Узиков Выпарная установка для концентрирования жидких растворов
WO2020167426A1 (en) 2019-02-13 2020-08-20 Corning Incorporated Vaporizers and apparatuses for forming glass optical fiber preforms comprising the same
CN110965046B (zh) * 2019-12-31 2024-05-28 威海中玻新材料技术研发有限公司 超薄液膜旋离式汽化装置
RU2761207C1 (ru) * 2021-02-07 2021-12-06 Виталий Алексеевич Узиков Барабан пленочного испарения

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4529427A (en) * 1977-05-19 1985-07-16 At&T Bell Laboratories Method for making low-loss optical waveguides on an industrial scale
US4314837A (en) * 1979-03-01 1982-02-09 Corning Glass Works Reactant delivery system method
EP0058571A1 (de) * 1981-02-18 1982-08-25 National Research Development Corporation Verfahren und Vorrichtung zum Zuführen einer kontrollierten Menge eines Reaktanten bei einem Dampfphasen-Abscheidungsverfahren
JPS58125633A (ja) * 1982-01-18 1983-07-26 Nippon Telegr & Teleph Corp <Ntt> ガラス微粒子製造におけるガス供給方法
JPS61254242A (ja) * 1985-05-01 1986-11-12 Sumitomo Electric Ind Ltd 原料供給装置
DE3929604A1 (de) * 1988-09-12 1990-03-15 Schott Glaswerke Innenbeschichtung eines rohres
JPH0354130A (ja) * 1989-07-20 1991-03-08 Fujikura Ltd 原料ガス供給装置
US5090985A (en) * 1989-10-17 1992-02-25 Libbey-Owens-Ford Co. Method for preparing vaporized reactants for chemical vapor deposition
US5078092A (en) * 1989-12-22 1992-01-07 Corning Incorporated Flash vaporizer system for use in manufacturing optical waveguide fiber
US5043002A (en) * 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes

Also Published As

Publication number Publication date
JP3680220B2 (ja) 2005-08-10
EP0659698B1 (de) 1997-03-12
JPH07204401A (ja) 1995-08-08
DE69402042D1 (de) 1997-04-17
EP0659698A1 (de) 1995-06-28
CA2132885A1 (en) 1995-06-21
US5356451A (en) 1994-10-18
AU8036794A (en) 1995-06-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee